JPH11274060A - 照明光学装置および該照明光学装置を備えた露光装置 - Google Patents

照明光学装置および該照明光学装置を備えた露光装置

Info

Publication number
JPH11274060A
JPH11274060A JP10090958A JP9095898A JPH11274060A JP H11274060 A JPH11274060 A JP H11274060A JP 10090958 A JP10090958 A JP 10090958A JP 9095898 A JP9095898 A JP 9095898A JP H11274060 A JPH11274060 A JP H11274060A
Authority
JP
Japan
Prior art keywords
optical
prism
light source
illumination
optical axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10090958A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11274060A5 (enExample
Inventor
Osamu Tanitsu
修 谷津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10090958A priority Critical patent/JPH11274060A/ja
Publication of JPH11274060A publication Critical patent/JPH11274060A/ja
Publication of JPH11274060A5 publication Critical patent/JPH11274060A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10090958A 1998-03-19 1998-03-19 照明光学装置および該照明光学装置を備えた露光装置 Pending JPH11274060A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10090958A JPH11274060A (ja) 1998-03-19 1998-03-19 照明光学装置および該照明光学装置を備えた露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10090958A JPH11274060A (ja) 1998-03-19 1998-03-19 照明光学装置および該照明光学装置を備えた露光装置

Publications (2)

Publication Number Publication Date
JPH11274060A true JPH11274060A (ja) 1999-10-08
JPH11274060A5 JPH11274060A5 (enExample) 2005-10-06

Family

ID=14013011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10090958A Pending JPH11274060A (ja) 1998-03-19 1998-03-19 照明光学装置および該照明光学装置を備えた露光装置

Country Status (1)

Country Link
JP (1) JPH11274060A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG114513A1 (en) * 2000-11-29 2005-09-28 Nikon Corp Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus
JP2011243992A (ja) * 2005-01-14 2011-12-01 Nikon Corp 照明光学装置、露光装置、および電子デバイス製造方法
CN102736427A (zh) * 2011-04-07 2012-10-17 上海微电子装备有限公司 一种曝光装置及其方法
US8451430B2 (en) 2008-12-24 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
JP2015038975A (ja) * 2013-07-10 2015-02-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影リソグラフィのための照明光学ユニット
CN114243441A (zh) * 2021-12-16 2022-03-25 上海瑞柯恩激光技术有限公司 一种固体激光器及固体激光器系统

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG114513A1 (en) * 2000-11-29 2005-09-28 Nikon Corp Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus
JP2011243992A (ja) * 2005-01-14 2011-12-01 Nikon Corp 照明光学装置、露光装置、および電子デバイス製造方法
US8451430B2 (en) 2008-12-24 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
CN102736427A (zh) * 2011-04-07 2012-10-17 上海微电子装备有限公司 一种曝光装置及其方法
JP2015038975A (ja) * 2013-07-10 2015-02-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影リソグラフィのための照明光学ユニット
CN114243441A (zh) * 2021-12-16 2022-03-25 上海瑞柯恩激光技术有限公司 一种固体激光器及固体激光器系统

Similar Documents

Publication Publication Date Title
US6236449B1 (en) Illumination optical apparatus and exposure apparatus
JP3278896B2 (ja) 照明装置及びそれを用いた投影露光装置
JP3360686B2 (ja) 照明光学装置および投影露光装置並びに露光方法および素子製造方法
JP3264224B2 (ja) 照明装置及びそれを用いた投影露光装置
KR101470769B1 (ko) 마이크로리소그래픽 투영 노광 장치의 조명 시스템
JP3316937B2 (ja) 照明光学装置、露光装置、及び該露光装置を用いた転写方法
JP3316936B2 (ja) 照明光学装置、露光装置、及び該露光装置を用いた転写方法
JP3057998B2 (ja) 照明装置及びそれを用いた投影露光装置
JP2000058441A (ja) リソグラフィ装置と方法
JP2002203784A (ja) 照明の設定が変更可能な照明系
JPH10209028A (ja) 照明光学装置及び半導体素子の製造方法
JP3559694B2 (ja) 照明装置及びそれを用いた投影露光装置
JP2002184676A (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP4865270B2 (ja) 露光装置、及びそれを用いたデバイス製造方法
JP2001155993A (ja) 照明光学装置及び該装置を備える投影露光装置
JP4051473B2 (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP2002075835A (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP2001244168A (ja) 露光装置および該露光装置を用いてマイクロデバイスを製造する方法
JPH11274060A (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP2003068604A (ja) 照明光学装置および該照明光学装置を備えた露光装置
US20110117503A1 (en) Exposure apparatus and device fabrication method
JP3507459B2 (ja) 照明装置、露光装置及びデバイス製造方法
JP2004266259A (ja) 照明光学装置、露光装置および露光方法
JP2002057081A (ja) 照明光学装置並びに露光装置及び露光方法
JP2001035777A (ja) 照明光学装置および該照明光学装置を備えた露光装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050309

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050530

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20061026

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20061030

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20070302