JPH11271965A - パターン形成方法 - Google Patents

パターン形成方法

Info

Publication number
JPH11271965A
JPH11271965A JP10078895A JP7889598A JPH11271965A JP H11271965 A JPH11271965 A JP H11271965A JP 10078895 A JP10078895 A JP 10078895A JP 7889598 A JP7889598 A JP 7889598A JP H11271965 A JPH11271965 A JP H11271965A
Authority
JP
Japan
Prior art keywords
resist film
pattern
resist
acid
acetal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10078895A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11271965A5 (enExample
Inventor
Masataka Endo
政孝 遠藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP10078895A priority Critical patent/JPH11271965A/ja
Publication of JPH11271965A publication Critical patent/JPH11271965A/ja
Publication of JPH11271965A5 publication Critical patent/JPH11271965A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP10078895A 1998-03-26 1998-03-26 パターン形成方法 Pending JPH11271965A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10078895A JPH11271965A (ja) 1998-03-26 1998-03-26 パターン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10078895A JPH11271965A (ja) 1998-03-26 1998-03-26 パターン形成方法

Publications (2)

Publication Number Publication Date
JPH11271965A true JPH11271965A (ja) 1999-10-08
JPH11271965A5 JPH11271965A5 (enExample) 2004-07-08

Family

ID=13674558

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10078895A Pending JPH11271965A (ja) 1998-03-26 1998-03-26 パターン形成方法

Country Status (1)

Country Link
JP (1) JPH11271965A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003140342A (ja) * 2001-10-31 2003-05-14 Matsushita Electric Ind Co Ltd パターン形成方法
US6660455B2 (en) 2000-03-22 2003-12-09 Kabushiki Kaisha Toshiba Pattern formation material, pattern formation method, and exposure mask fabrication method
US7090963B2 (en) 2003-06-25 2006-08-15 International Business Machines Corporation Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging
US7300741B2 (en) 2006-04-25 2007-11-27 International Business Machines Corporation Advanced chemically amplified resist for sub 30 nm dense feature resolution

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6660455B2 (en) 2000-03-22 2003-12-09 Kabushiki Kaisha Toshiba Pattern formation material, pattern formation method, and exposure mask fabrication method
JP2003140342A (ja) * 2001-10-31 2003-05-14 Matsushita Electric Ind Co Ltd パターン形成方法
US7090963B2 (en) 2003-06-25 2006-08-15 International Business Machines Corporation Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging
US7300741B2 (en) 2006-04-25 2007-11-27 International Business Machines Corporation Advanced chemically amplified resist for sub 30 nm dense feature resolution

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