JPH11167714A - 磁気ディスク基板の製造方法 - Google Patents
磁気ディスク基板の製造方法Info
- Publication number
- JPH11167714A JPH11167714A JP34854097A JP34854097A JPH11167714A JP H11167714 A JPH11167714 A JP H11167714A JP 34854097 A JP34854097 A JP 34854097A JP 34854097 A JP34854097 A JP 34854097A JP H11167714 A JPH11167714 A JP H11167714A
- Authority
- JP
- Japan
- Prior art keywords
- less
- magnetic disk
- rmax
- polishing
- disk substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 238000005498 polishing Methods 0.000 claims abstract description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 21
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000002245 particle Substances 0.000 claims abstract description 15
- 229910018104 Ni-P Inorganic materials 0.000 claims abstract description 8
- 229910018536 Ni—P Inorganic materials 0.000 claims abstract description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 6
- 238000007747 plating Methods 0.000 claims abstract description 6
- 238000012545 processing Methods 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 11
- 239000006061 abrasive grain Substances 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 238000007517 polishing process Methods 0.000 claims 1
- 238000003860 storage Methods 0.000 abstract description 2
- 230000007547 defect Effects 0.000 abstract 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34854097A JPH11167714A (ja) | 1997-12-03 | 1997-12-03 | 磁気ディスク基板の製造方法 |
| MYPI98002606A MY124578A (en) | 1997-06-17 | 1998-06-11 | Magnetic hard disc substrate and process for manufacturing the same |
| US09/094,915 US6123603A (en) | 1997-06-17 | 1998-06-12 | Magnetic hard disc substrate and process for manufacturing the same |
| US09/631,575 US6426155B1 (en) | 1997-06-17 | 2000-08-04 | Magnetic hard disc substrate and process for manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34854097A JPH11167714A (ja) | 1997-12-03 | 1997-12-03 | 磁気ディスク基板の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11167714A true JPH11167714A (ja) | 1999-06-22 |
| JPH11167714A5 JPH11167714A5 (enExample) | 2005-01-20 |
Family
ID=18397705
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34854097A Pending JPH11167714A (ja) | 1997-06-17 | 1997-12-03 | 磁気ディスク基板の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11167714A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001085868A1 (en) * | 2000-05-12 | 2001-11-15 | Nissan Chemical Industries, Ltd. | Polishing composition |
| JP2003041377A (ja) * | 2001-08-02 | 2003-02-13 | Showa Denko Kk | Ｎｉ−Ｐめっき基材の洗浄方法、ならびに磁気ディスク基板のの製造方法および磁気ディスク基板 |
-
1997
- 1997-12-03 JP JP34854097A patent/JPH11167714A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001085868A1 (en) * | 2000-05-12 | 2001-11-15 | Nissan Chemical Industries, Ltd. | Polishing composition |
| US6719819B2 (en) | 2000-05-12 | 2004-04-13 | Nissan Chemical Industries, Ltd. | Polishing composition |
| KR100803876B1 (ko) * | 2000-05-12 | 2008-02-14 | 닛산 가가쿠 고교 가부시키 가이샤 | 연마용 조성물 |
| JP2003041377A (ja) * | 2001-08-02 | 2003-02-13 | Showa Denko Kk | Ｎｉ−Ｐめっき基材の洗浄方法、ならびに磁気ディスク基板のの製造方法および磁気ディスク基板 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104647156B (zh) | 磁盘用玻璃衬底的制造方法和磁盘的制造方法 | |
| US6123603A (en) | Magnetic hard disc substrate and process for manufacturing the same | |
| US6280490B1 (en) | Polishing composition and method for producing a memory hard disk | |
| US6193790B1 (en) | Polishing composition | |
| CN108428460B (zh) | 磁盘用基板 | |
| US6328774B1 (en) | Polishing composition and method for producing a memory hard disk | |
| JPH07240025A (ja) | 超研摩方法およびそのためのスラリ | |
| JP6820723B2 (ja) | 磁気ディスク基板用研磨液組成物 | |
| CN1213118C (zh) | 一种用于存储器硬盘的磁盘基片抛光浆料 | |
| GB2359558A (en) | Polishing Composition for Memory Hard Disk Substrates | |
| JP2001167430A (ja) | 磁気ディスク用基板およびその製造方法 | |
| WO2017038201A1 (ja) | 情報記録媒体用ガラス基板の製造方法、情報記録媒体の製造方法、情報記録媒体用ガラス基板、並びに磁気記録媒体 | |
| CN105590638A (zh) | 磁盘用玻璃基板及磁盘 | |
| JP3472687B2 (ja) | 磁気ディスク基板の製造方法 | |
| JPH11167714A (ja) | 磁気ディスク基板の製造方法 | |
| JP3531906B2 (ja) | 磁気記録媒体用結晶化ガラス基板の製造方法 | |
| JPH07134823A (ja) | 磁気記録媒体用ガラス基板及び磁気記録媒体の製造方法 | |
| JPH11167715A (ja) | 磁気ディスク基板の製造方法 | |
| JPH11167711A (ja) | 磁気ディスク基板の製造方法 | |
| JPH11167712A (ja) | 磁気ディスク基板の製造方法 | |
| JPH11167713A (ja) | 磁気ディスク基板の製造方法 | |
| JPH0346264B2 (enExample) | ||
| CN105074823B (zh) | 磁盘用玻璃基板的制造方法、磁盘用玻璃基板和磁盘的制造方法 | |
| JP2004055128A (ja) | 磁気記録媒体用ガラスディスク基板の製造方法 | |
| JP5759171B2 (ja) | ハードディスク用ガラス基板の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040220 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040220 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20040716 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20040824 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20041221 |