JPH11162831A5 - - Google Patents

Info

Publication number
JPH11162831A5
JPH11162831A5 JP1997338109A JP33810997A JPH11162831A5 JP H11162831 A5 JPH11162831 A5 JP H11162831A5 JP 1997338109 A JP1997338109 A JP 1997338109A JP 33810997 A JP33810997 A JP 33810997A JP H11162831 A5 JPH11162831 A5 JP H11162831A5
Authority
JP
Japan
Prior art keywords
cleaning
optical
optical element
projection exposure
contamination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997338109A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11162831A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9338109A priority Critical patent/JPH11162831A/ja
Priority claimed from JP9338109A external-priority patent/JPH11162831A/ja
Priority to PCT/JP1998/005258 priority patent/WO1999027568A1/ja
Priority to AU11757/99A priority patent/AU1175799A/en
Publication of JPH11162831A publication Critical patent/JPH11162831A/ja
Priority to US09/577,020 priority patent/US6496257B1/en
Priority to US10/212,278 priority patent/US20030011763A1/en
Priority to US11/008,166 priority patent/US7061575B2/en
Publication of JPH11162831A5 publication Critical patent/JPH11162831A5/ja
Pending legal-status Critical Current

Links

JP9338109A 1997-11-21 1997-11-21 投影露光装置及び投影露光方法 Pending JPH11162831A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP9338109A JPH11162831A (ja) 1997-11-21 1997-11-21 投影露光装置及び投影露光方法
PCT/JP1998/005258 WO1999027568A1 (en) 1997-11-21 1998-11-20 Projection aligner and projection exposure method
AU11757/99A AU1175799A (en) 1997-11-21 1998-11-20 Projection aligner and projection exposure method
US09/577,020 US6496257B1 (en) 1997-11-21 2000-05-22 Projection exposure apparatus and method
US10/212,278 US20030011763A1 (en) 1997-11-21 2002-08-06 Projection exposure apparatus and method
US11/008,166 US7061575B2 (en) 1997-11-21 2004-12-10 Projection exposure apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9338109A JPH11162831A (ja) 1997-11-21 1997-11-21 投影露光装置及び投影露光方法

Publications (2)

Publication Number Publication Date
JPH11162831A JPH11162831A (ja) 1999-06-18
JPH11162831A5 true JPH11162831A5 (enExample) 2006-04-27

Family

ID=18315004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9338109A Pending JPH11162831A (ja) 1997-11-21 1997-11-21 投影露光装置及び投影露光方法

Country Status (1)

Country Link
JP (1) JPH11162831A (enExample)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW484039B (en) * 1999-10-12 2002-04-21 Asm Lithography Bv Lithographic projection apparatus and method
EP1586386A4 (en) * 2002-12-03 2010-04-21 Nikon Corp METHOD AND DEVICE FOR REMOVING CONTAMINATION AND EXPOSURE METHOD AND DEVICE
KR101547077B1 (ko) 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
EP2161621B1 (en) * 2003-04-11 2018-10-24 Nikon Corporation Cleanup method for optics in an immersion lithography apparatus, and corresponding immersion lithography apparatus
TWI424470B (zh) * 2003-05-23 2014-01-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
WO2005122218A1 (ja) 2004-06-09 2005-12-22 Nikon Corporation 露光装置及びデバイス製造方法
JP4677833B2 (ja) * 2004-06-21 2011-04-27 株式会社ニコン 露光装置、及びその部材の洗浄方法、露光装置のメンテナンス方法、メンテナンス機器、並びにデバイス製造方法
US8698998B2 (en) 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
JP4772306B2 (ja) * 2004-09-06 2011-09-14 株式会社東芝 液浸光学装置及び洗浄方法
JP4961709B2 (ja) * 2004-10-13 2012-06-27 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
KR101191056B1 (ko) 2004-11-19 2012-10-15 가부시키가이샤 니콘 메인터넌스 방법, 노광 방법, 노광 장치 및 디바이스 제조 방법
WO2006062065A1 (ja) * 2004-12-06 2006-06-15 Nikon Corporation メンテナンス方法、メンテナンス機器、露光装置、及びデバイス製造方法
GB0427104D0 (en) * 2004-12-10 2005-01-12 Exitech Ltd Positioning device
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528931B2 (en) * 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101762083B1 (ko) 2005-05-12 2017-07-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7262422B2 (en) * 2005-07-01 2007-08-28 Spansion Llc Use of supercritical fluid to dry wafer and clean lens in immersion lithography
JP4525559B2 (ja) * 2005-11-08 2010-08-18 セイコーエプソン株式会社 液滴吐出装置
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
US8570484B2 (en) 2006-08-30 2013-10-29 Nikon Corporation Immersion exposure apparatus, device manufacturing method, cleaning method, and cleaning member to remove foreign substance using liquid
US7900641B2 (en) * 2007-05-04 2011-03-08 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
US8947629B2 (en) 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
JP2009033111A (ja) * 2007-05-28 2009-02-12 Nikon Corp 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法
US20090014030A1 (en) * 2007-07-09 2009-01-15 Asml Netherlands B.V. Substrates and methods of using those substrates
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
NL1036273A1 (nl) * 2007-12-18 2009-06-19 Asml Netherlands Bv Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus.
US20100039628A1 (en) * 2008-03-19 2010-02-18 Nikon Corporation Cleaning tool, cleaning method, and device fabricating method
JP4553037B2 (ja) * 2008-06-27 2010-09-29 株式会社ニコン 光学部品の洗浄機構を備えた液浸投影露光装置および液浸光学部品洗浄方法
JP6183720B2 (ja) * 2015-04-10 2017-08-23 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
US12014901B2 (en) 2018-10-25 2024-06-18 Tokyo Electron Limited Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma
US11205562B2 (en) 2018-10-25 2021-12-21 Tokyo Electron Limited Hybrid electron beam and RF plasma system for controlled content of radicals and ions
DE102020206249A1 (de) * 2020-05-18 2021-11-18 Carl Zeiss Smt Gmbh Verfahren zur Instandhaltung einer Projektionsbelichtungsanlage, Servicemodul und Anordnung für die Halbleiterlithographie

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