JPH11162831A5 - - Google Patents

Info

Publication number
JPH11162831A5
JPH11162831A5 JP1997338109A JP33810997A JPH11162831A5 JP H11162831 A5 JPH11162831 A5 JP H11162831A5 JP 1997338109 A JP1997338109 A JP 1997338109A JP 33810997 A JP33810997 A JP 33810997A JP H11162831 A5 JPH11162831 A5 JP H11162831A5
Authority
JP
Japan
Prior art keywords
cleaning
optical
optical element
projection exposure
contamination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997338109A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11162831A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9338109A priority Critical patent/JPH11162831A/ja
Priority claimed from JP9338109A external-priority patent/JPH11162831A/ja
Priority to PCT/JP1998/005258 priority patent/WO1999027568A1/ja
Priority to AU11757/99A priority patent/AU1175799A/en
Publication of JPH11162831A publication Critical patent/JPH11162831A/ja
Priority to US09/577,020 priority patent/US6496257B1/en
Priority to US10/212,278 priority patent/US20030011763A1/en
Priority to US11/008,166 priority patent/US7061575B2/en
Publication of JPH11162831A5 publication Critical patent/JPH11162831A5/ja
Pending legal-status Critical Current

Links

JP9338109A 1997-11-21 1997-11-21 投影露光装置及び投影露光方法 Pending JPH11162831A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP9338109A JPH11162831A (ja) 1997-11-21 1997-11-21 投影露光装置及び投影露光方法
PCT/JP1998/005258 WO1999027568A1 (en) 1997-11-21 1998-11-20 Projection aligner and projection exposure method
AU11757/99A AU1175799A (en) 1997-11-21 1998-11-20 Projection aligner and projection exposure method
US09/577,020 US6496257B1 (en) 1997-11-21 2000-05-22 Projection exposure apparatus and method
US10/212,278 US20030011763A1 (en) 1997-11-21 2002-08-06 Projection exposure apparatus and method
US11/008,166 US7061575B2 (en) 1997-11-21 2004-12-10 Projection exposure apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9338109A JPH11162831A (ja) 1997-11-21 1997-11-21 投影露光装置及び投影露光方法

Publications (2)

Publication Number Publication Date
JPH11162831A JPH11162831A (ja) 1999-06-18
JPH11162831A5 true JPH11162831A5 (enExample) 2006-04-27

Family

ID=18315004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9338109A Pending JPH11162831A (ja) 1997-11-21 1997-11-21 投影露光装置及び投影露光方法

Country Status (1)

Country Link
JP (1) JPH11162831A (enExample)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW484039B (en) * 1999-10-12 2002-04-21 Asm Lithography Bv Lithographic projection apparatus and method
KR101139266B1 (ko) * 2002-12-03 2012-05-15 가부시키가이샤 니콘 오염 물질 제거 방법 및 장치, 그리고 노광 방법 및 장치
EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
SG185136A1 (en) * 2003-04-11 2012-11-29 Nikon Corp Cleanup method for optics in immersion lithography
TWI474380B (zh) * 2003-05-23 2015-02-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI614795B (zh) 2004-02-06 2018-02-11 Nikon Corporation 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
CN103605262B (zh) 2004-06-09 2016-06-29 株式会社尼康 曝光装置及其维护方法、以及元件制造方法
JP4677833B2 (ja) * 2004-06-21 2011-04-27 株式会社ニコン 露光装置、及びその部材の洗浄方法、露光装置のメンテナンス方法、メンテナンス機器、並びにデバイス製造方法
US8698998B2 (en) 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
JP4772306B2 (ja) 2004-09-06 2011-09-14 株式会社東芝 液浸光学装置及び洗浄方法
JP4961709B2 (ja) * 2004-10-13 2012-06-27 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
US20070285634A1 (en) 2004-11-19 2007-12-13 Nikon Corporation Maintenance Method, Exposure Method, Exposure Apparatus, And Method For Producing Device
KR101339887B1 (ko) * 2004-12-06 2013-12-10 가부시키가이샤 니콘 메인터넌스 방법, 메인터넌스 기기, 노광 장치, 및디바이스 제조 방법
GB0427104D0 (en) 2004-12-10 2005-01-12 Exitech Ltd Positioning device
US7880860B2 (en) * 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528931B2 (en) 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101504765B1 (ko) 2005-05-12 2015-03-30 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7262422B2 (en) * 2005-07-01 2007-08-28 Spansion Llc Use of supercritical fluid to dry wafer and clean lens in immersion lithography
JP4525559B2 (ja) * 2005-11-08 2010-08-18 セイコーエプソン株式会社 液滴吐出装置
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
WO2008026593A1 (en) * 2006-08-30 2008-03-06 Nikon Corporation Exposure apparatus, device production method, cleaning method, and cleaning member
US8947629B2 (en) 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US7841352B2 (en) * 2007-05-04 2010-11-30 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
WO2008146819A1 (ja) 2007-05-28 2008-12-04 Nikon Corporation 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法
US20090014030A1 (en) * 2007-07-09 2009-01-15 Asml Netherlands B.V. Substrates and methods of using those substrates
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
NL1036273A1 (nl) * 2007-12-18 2009-06-19 Asml Netherlands Bv Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus.
US20100039628A1 (en) * 2008-03-19 2010-02-18 Nikon Corporation Cleaning tool, cleaning method, and device fabricating method
JP4553037B2 (ja) * 2008-06-27 2010-09-29 株式会社ニコン 光学部品の洗浄機構を備えた液浸投影露光装置および液浸光学部品洗浄方法
JP6183720B2 (ja) * 2015-04-10 2017-08-23 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
US12014901B2 (en) 2018-10-25 2024-06-18 Tokyo Electron Limited Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma
US11205562B2 (en) 2018-10-25 2021-12-21 Tokyo Electron Limited Hybrid electron beam and RF plasma system for controlled content of radicals and ions
DE102020206249A1 (de) * 2020-05-18 2021-11-18 Carl Zeiss Smt Gmbh Verfahren zur Instandhaltung einer Projektionsbelichtungsanlage, Servicemodul und Anordnung für die Halbleiterlithographie

Similar Documents

Publication Publication Date Title
EP2161619B1 (en) Cleanup method and immersion lithography apparatus
US7061575B2 (en) Projection exposure apparatus and method
JP2950371B2 (ja) 半導体装置製造用のスクラバ装備
JPH11162831A (ja) 投影露光装置及び投影露光方法
TWI325339B (en) Substrate processing apparatus
CN108735630B (zh) 基片处理装置和基片处理方法
KR20080013709A (ko) 노광장치
JP3853685B2 (ja) 基板処理装置
US6724476B1 (en) Low defect metrology approach on clean track using integrated metrology
KR20080034935A (ko) 포토레지스트를 현상하는 장치 및 그 장치를 동작시키는방법
KR102405151B1 (ko) 접액 노즐의 세정 방법 및 세정 장치
JP2000042472A (ja) 塗布異常検出手段を有す薄膜塗布装置と露光装置及び薄膜塗布方法
WO2006062074A1 (ja) 基板処理方法、露光方法、露光装置及びデバイス製造方法
JPS6323539B2 (enExample)
KR100567236B1 (ko) 기판처리장치
WO2024157387A1 (ja) スクリーン印刷方法、及びスクリーン印刷装置
JP2009081241A (ja) 露光装置の洗浄方法および洗浄装置
JP2000065506A (ja) 厚さ測定用治具
JP2014075379A (ja) 異物除去方法、異物除去用の工具、並びに露光方法及び装置
JPH08273219A (ja) 光ディスクの製造装置
KR100563485B1 (ko) 에지 비드 제거 장치 및 방법
TW200844681A (en) Immersion exposure apparatus and method of manufacturing device
KR200155167Y1 (ko) 이물질 검출 및 제거장치
JPH05234870A (ja) 薬液塗布方法及び装置
KR20060074769A (ko) 반도체 소자의 제조 장치 및 그 방법