JPH11153858A5 - - Google Patents

Info

Publication number
JPH11153858A5
JPH11153858A5 JP1998263911A JP26391198A JPH11153858A5 JP H11153858 A5 JPH11153858 A5 JP H11153858A5 JP 1998263911 A JP1998263911 A JP 1998263911A JP 26391198 A JP26391198 A JP 26391198A JP H11153858 A5 JPH11153858 A5 JP H11153858A5
Authority
JP
Japan
Prior art keywords
group
compound
carbon atoms
formula
vinyl ether
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998263911A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11153858A (ja
JP4065064B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP26391198A priority Critical patent/JP4065064B2/ja
Priority claimed from JP26391198A external-priority patent/JP4065064B2/ja
Publication of JPH11153858A publication Critical patent/JPH11153858A/ja
Publication of JPH11153858A5 publication Critical patent/JPH11153858A5/ja
Application granted granted Critical
Publication of JP4065064B2 publication Critical patent/JP4065064B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP26391198A 1997-09-05 1998-09-03 可視光感光性組成物及びパターンの製造方法 Expired - Fee Related JP4065064B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26391198A JP4065064B2 (ja) 1997-09-05 1998-09-03 可視光感光性組成物及びパターンの製造方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP25623697 1997-09-05
JP9-256236 1997-09-05
JP9-257974 1997-09-08
JP25797497 1997-09-08
JP26391198A JP4065064B2 (ja) 1997-09-05 1998-09-03 可視光感光性組成物及びパターンの製造方法

Publications (3)

Publication Number Publication Date
JPH11153858A JPH11153858A (ja) 1999-06-08
JPH11153858A5 true JPH11153858A5 (https=) 2005-10-27
JP4065064B2 JP4065064B2 (ja) 2008-03-19

Family

ID=27334512

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26391198A Expired - Fee Related JP4065064B2 (ja) 1997-09-05 1998-09-03 可視光感光性組成物及びパターンの製造方法

Country Status (1)

Country Link
JP (1) JP4065064B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007031650A (ja) * 2005-07-29 2007-02-08 Japan Atomic Energy Agency 量子ビームにより着色する樹脂組成物とナノイメージング形成方法
JP5077526B2 (ja) * 2006-09-21 2012-11-21 日産化学工業株式会社 末端に不飽和基を有する化合物を含有するポジ型感光性樹脂組成物
JP5585796B2 (ja) * 2012-07-06 2014-09-10 日産化学工業株式会社 末端に不飽和基を有する化合物を含有するポジ型感光性樹脂組成物
JP6270024B2 (ja) * 2013-10-04 2018-01-31 日立化成株式会社 感光性接着剤組成物、それを用いる半導体装置の製造方法、及び半導体装置

Similar Documents

Publication Publication Date Title
US7390608B2 (en) Photoresists containing Si-polymers
TWI258637B (en) Multilayer photoresist systems that include a silicon-containing photoresist
US6048672A (en) Photoresist compositions and methods and articles of manufacture comprising same
US7306892B2 (en) Multilayer photoresist system
TW556047B (en) Coated substrate, method for forming photoresist relief image, and antireflective composition
JP2002049151A5 (https=)
JP2001330947A5 (https=)
JP2004117688A5 (https=)
EP0816925B1 (en) Ultraviolet-curable composition and method for curing or patterning
JP2004038142A (ja) ポリシロキサンを製造する方法及びそれを含むフォトレジスト組成物
KR890014431A (ko) 벤조페논 유도체 및 그 제조방법
JP2002090988A5 (https=)
JP4557497B2 (ja) シランモノマー及びポリマーを製造する方法及びそれを含むフォトレジスト組成物
KR100269513B1 (ko) 신규한 아크릴레이트 또는 메타크릴레이트 유도체 및 이들의 고분자중합체를 함유하는 포토레지스트(New acrylate or metacrylate derivatives and photoresist containing its polymer)
JPS6025061B2 (ja) 感光性シリコ−ン樹脂組成物
JPH11153858A5 (https=)
JPH11237731A5 (https=)
EP1276012A3 (en) Resist patterning process
JP2000267285A5 (https=)
KR890012191A (ko) 만니히 염기 및 요오드늄 염을 갖는 감광제 및 중합성 조성물
JP2001117232A5 (https=)
Bravo-Vasquez et al. Silicon backbone polymers as EUV resists
JP2004051785A5 (https=)
JP2000112130A5 (https=)
JPH05262812A (ja) 輻射線硬化性組成物