JPH11103671A - Method for generating siitake mushroom bed - Google Patents

Method for generating siitake mushroom bed

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Publication number
JPH11103671A
JPH11103671A JP9290386A JP29038697A JPH11103671A JP H11103671 A JPH11103671 A JP H11103671A JP 9290386 A JP9290386 A JP 9290386A JP 29038697 A JP29038697 A JP 29038697A JP H11103671 A JPH11103671 A JP H11103671A
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JP
Japan
Prior art keywords
temperature
mushrooms
generation
mushroom
bed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9290386A
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Japanese (ja)
Other versions
JP3087170B2 (en
Inventor
Sadayuki Inoue
貞行 井上
Sumio Ayusawa
澄夫 鮎沢
Shigeo Takano
茂雄 高野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hokken KK
Original Assignee
Hokken KK
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Abstract

PROBLEM TO BE SOLVED: To provide a method for continuously generating mushrooms having good quality even under an environment of low temperature or high temperature. SOLUTION: In the process for generating mushrooms in the mushroom bed culture of SIITAKE (Lentinus edodes), the germination process after the second turn is carried out as follows: the temperature of the water which is used for immersing mushroom beds or for spraying it on mushroom beds is controlled at 16-23 deg.C, or/and the mushroom beds are managed for 0.5-3 days under an environment kept at almost saturated humidity and a temperature of 13-22 deg.C after immersing in water or the spraying of water. Thus, the germination of mushrooms is accelerated and mushrooms are continuously generated. Further, during the above-mentioned management of 0.5-3 days, a mild ventilation is carried out continuously or with an interval of at least one time every a half day in such a degree that the temperature does not get out of the maintenance temperature range.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、しいたけ菌床栽培
の発生工程において、きのこの発生数を極端に低下させ
ることなく、優良品質のきのこを継続的に発生させるし
いたけ菌床の発生方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a shiitake mushroom bed which continuously produces excellent quality mushrooms without significantly reducing the number of mushrooms produced in a step of cultivating a shiitake mushroom bed.

【0002】[0002]

【従来の技術】これまでの常法である2番以降のしいた
け菌床の発生を目的とした発芽方法には、おもに次の方
式が採用されている。この方式は、前回の発生が完了し
た後に菌床を水に一定時間浸水し、次のきのこの発生を
待つという方式で「浸水方式」と呼ばれている。この場
合浸水に使用する水の水温は気温に比例して冬期は15
℃以下の低温に、夏期は20℃以上の高温になるが、発
生初期の菌床活力のある時期は比較的まとまった数のき
のこが発生する。
2. Description of the Related Art The germination method for the purpose of generating a second or subsequent Shiitake mushroom bed, which has been a conventional method, mainly employs the following method. This method is called a "water immersion method", in which a bacterial bed is immersed in water for a certain period of time after the previous outbreak is completed, and the next mushroom is waited for. In this case, the temperature of the water used for flooding is 15 in winter in proportion to the temperature.
In summer, the temperature is 20 ° C. or higher, but at a low temperature of 20 ° C. or lower, a relatively large number of mushrooms are generated in the early stage of the active period.

【0003】しかしながらこの浸水方式では、中温系品
種を使用した場合、発生温度をきのこの生育に適した1
0〜15℃程度とすると芽数が急激に減少し、発生期間
が長期間にわたる傾向があり、特に冬期の低温時期にお
いては10℃以下の低温になる場合が多く、合わせて浸
水温度が気温と同様に15℃以下に低下するとほとんど
きのこが発生しないという問題がある。
However, in this flooding method, when a medium-temperature variety is used, the temperature at which it is generated is suitable for growing mushrooms.
When the temperature is about 0 to 15 ° C., the number of buds sharply decreases, and the development period tends to extend over a long period of time. In particular, the temperature often drops to 10 ° C. or less in the low temperature season in winter. Similarly, when the temperature is lowered to 15 ° C. or lower, there is a problem that mushrooms hardly occur.

【0004】そこできのこを継続的に発生させるために
暖房機を使用して15〜20℃に、発生環境としてはや
や高めの温度を保持する方法が一般に行われている。し
かし、暖房の影響で乾燥しやすいため環境管理が難し
く、経費も多くかかるなどの問題点がある。
In order to continuously generate mushrooms, a method of using a heater to maintain the temperature at 15 to 20 ° C. and a somewhat higher temperature as an environment for generating the mushrooms is generally used. However, there are problems such as difficulty in environmental management and high cost due to easy drying due to heating.

【0005】また夏期の高温時期においては、高温系品
種を使用しても気温が25℃以上と高く、浸水温度も気
温と同様に高い場合は浸水操作後の発芽が正常になされ
ず、きのこの形状的な品質が低下したり、発生が停止す
るなどの問題点がある。
[0005] In the high temperature season in summer, even when a high temperature variety is used, the temperature is as high as 25 ° C or more, and when the flooding temperature is as high as the temperature, germination after the flooding operation is not normal, and mushrooms are not obtained. There are problems such as a decrease in shape quality and a stop of generation.

【0006】[0006]

【発明が解決しようとする課題】本発明は従来のかかる
問題点を解消するためになされたもので、低温あるいは
高温の環境下においても継続的に優良な品質のきのこを
発生させる方法を提供する。
SUMMARY OF THE INVENTION The present invention has been made to solve the conventional problems, and provides a method for continuously producing excellent quality mushrooms even in a low-temperature or high-temperature environment. .

【0007】[0007]

【課題を解決するための手段】上記目的を達成するた
め、本発明は、しいたけ菌床を浸水する水温を16〜2
3℃とする。または、浸水後の発生工程に入る前段階に
おいて、菌床を飽和に近い湿度環境下で13〜22℃の
温度を0.5〜3日間保持する。あるいはそれらの温度
保持工程を併用することにより、きのこの芽切りを促進
させて継続的な発生をさせることを特徴とするしいたけ
菌床の発生方法である。
In order to achieve the above-mentioned object, the present invention provides a method for controlling the temperature of water for immersing a bed of shiitake mushrooms to 16 to 2 hours.
3 ° C. Alternatively, at a stage before entering the generation step after flooding, the bacterial bed is kept at a temperature of 13 to 22 ° C. for 0.5 to 3 days in a humidity environment close to saturation. Alternatively, it is a method of generating a mushroom bed of mushrooms, characterized in that the mushroom bud cutting is promoted and the mushroom is continuously generated by using those temperature holding steps in combination.

【0008】また上記構成において、0.5〜3日間管
理している期間中に、継続的あるいは少なくとも0.5
日間に一回の間隔で保持温度から外れない程度のゆるや
かな換気を行うことで、菌床の呼吸を確保し、優良な品
質のきのことなる芽の生育を促すしいたけ菌床の発生方
法である。
[0008] In the above configuration, during the period of 0.5 to 3 days of management, continuous or at least 0.5
It is a method of generating a shiitake mushroom bed that ensures respiration of the bacterial bed and promotes the growth of mushrooms of excellent quality by performing gentle ventilation so that the temperature does not deviate from the holding temperature once a day. .

【0009】上記のような方法で発芽を促進したしいた
け菌床は、低温あるいは高温の環境下においても継続的
に優良な品質のきのこを発生させることができる。
[0009] The Shiitake mushroom bed, which promotes germination by the method described above, can continuously produce excellent quality mushrooms even in a low or high temperature environment.

【0010】[0010]

【試験例】[Test example]

(その1)培養管理の終了した中温系品種のしいたけ菌
床を12℃定温の発生室で発生管理を行い、きのこの発
生終了後に18℃の水温で浸水を行って直後に発生室へ
移動して発生管理を行った。この操作を5回繰り返して
行った。
(Part 1) Control the generation of the medium-temperature cultivar Shiitake mushroom bed in which the cultivation has been completed in the generation room at a constant temperature of 12 ° C, and after the end of the mushroom generation, inundate at a water temperature of 18 ° C and move to the generation room immediately after. Outbreak management. This operation was repeated five times.

【0011】(その2)培養管理の終了した中温系品種
のしいたけ菌床を、12℃定温の発生室で発生管理を行
い、きのこの発生終了後に12℃の水温で浸水を行って
直後に18℃定温で順次換気のできる飽和に近い湿度の
小部屋で2日間管理し、それを発生室へ移動して発生管
理を行った。この操作を5回繰り返して行った。
(Part 2) The control of the growth of the shiitake mushroom bed of the mesophilic cultivar whose culture management has been completed is performed in a generating room at a constant temperature of 12 ° C., and after the completion of the mushroom, the bed is submerged at a water temperature of 12 ° C. It was controlled for two days in a small room with near-saturated humidity at which it could be ventilated at a constant temperature of ° C., and was moved to the generation room for generation control. This operation was repeated five times.

【0012】(その3)培養管理の終了した中温系品種
のしいたけ菌床を、12℃定温の発生室で発生管理を行
い、きのこの発生終了後に18℃の水温で浸水を行って
直後に18℃定温で密閉された飽和に近い湿度の小部屋
で2日間管理し、それを発生室へ移動して発生管理を行
った。この操作を5回繰り返して行った。
(Part 3) The control of the growth of the shiitake mushroom bed of the mesophilic cultivar whose culture management has been completed is performed in a generating room at a constant temperature of 12 ° C., and after the completion of the mushroom, the bed is submerged at a water temperature of 18 ° C. It was controlled for 2 days in a small room closed at a constant temperature of ℃ and close to saturation humidity, and moved to a generation room to control generation. This operation was repeated five times.

【0013】(その4)培養管理の終了した中温系品種
のしいたけ菌床を、12℃定温の発生室で発生管理を行
い、きのこの発生終了後に18℃の水温で浸水を行って
直後に18℃定温で順次換気のできる飽和に近い湿度の
小部屋で2日間管理し、それを発生室へ移動して発生管
理を行った。この操作を5回繰り返して行った。
(Part 4) The control of the generation of the shiitake mushroom bed of the mesophilic cultivar whose culture management has been completed is performed in a generating room at a constant temperature of 12 ° C., and after the completion of the mushroom, the bed is submerged at a water temperature of 18 ° C. It was controlled for two days in a small room with near-saturated humidity at which it could be ventilated at a constant temperature of ° C., and was moved to the generation room for generation control. This operation was repeated five times.

【0014】(対照例)培養管理の終了した中温系品種
のしいたけ菌床を、12℃定温の発生室で発生管理を行
い、きのこの発生終了後に12℃の水温で浸水を行って
直後に発生室へ移動して発生管理を行った。この操作を
5回繰り返して行った。
(Control Example) The control of the growth of the shiitake mushroom bed of the mesophilic cultivar whose culture has been completed is performed in a generating room at a constant temperature of 12 ° C., and after the mushroom generation is completed, the bed is submerged at a water temperature of 12 ° C. and immediately generated. We moved to the room and managed outbreak. This operation was repeated five times.

【0015】その結果を下記の表1に示す。The results are shown in Table 1 below.

【0016】[0016]

【表1】 [Table 1]

【0017】上記の結果から明らかなように、試験例は
対照例に比べ大幅に発生量が増加しており、発生回数を
重ねても急激な発生量の低下は見られない。また、実施
態様の比較では、その1<その2<その3<その4の順
に発生量が多くなっている。さらに、きのこの品質は
(その3)を除いて優良であり、前記した手法の著しい
効果を示している。
As is clear from the above results, the amount of generation in the test example is significantly increased as compared with the control example, and no rapid decrease in the amount of generation is observed even if the number of occurrences is increased. Further, in the comparison of the embodiments, the generation amount increases in the order of 1 <the 2 <the 3 <the 4. Furthermore, the quality of the mushrooms was excellent except for (Part 3), indicating the remarkable effect of the above-mentioned method.

【0018】[0018]

【再び試験例】[Test example again]

(その5)培養管理の終了した高温系品種のしいたけ菌
床を23℃定温の発生室で発生管理を行い、きのこの発
生終了後に18℃の水温で浸水を行って直後に発生室へ
移動して発生管理を行った。この操作を5回繰り返して
行った。
(Part 5) The generation of the shiitake mushroom bed of the high-temperature cultivar whose culture management has been completed is controlled in a generation room at a constant temperature of 23 ° C., and after the mushroom generation is completed, the mushroom is flooded at a water temperature of 18 ° C. and immediately moved to the generation room. Outbreak management. This operation was repeated five times.

【0019】(その6)培養管理の終了した高温系品種
のしいたけ菌床を23℃定温の発生室で発生管理を行
い、きのこの発生終了後に23℃の水温で浸水を行って
直後に18℃定温で順次換気のできる飽和に近い湿度の
小部屋で2日間管理し、それを発生室へ移動して発生管
理を行った。この操作を5回繰り返して行った。
(Part 6) The generation of the shiitake mushroom bed of the high-temperature cultivar whose culture management has been completed is controlled in a generation room at a constant temperature of 23 ° C., and after completion of the mushroom, the mushroom is submerged at a water temperature of 23 ° C. and immediately thereafter, the temperature is adjusted to 18 ° C. It was controlled for two days in a small room with near-saturated humidity that can be ventilated at a constant temperature and moved to the generation room for generation control. This operation was repeated five times.

【0020】(その7)培養管理の終了した高温系品種
のしいたけ菌床を23℃定温の発生室で発生管理を行
い、きのこの発生終了後に18℃の水温で浸水を行って
直後に18℃定温で密閉された飽和に近い湿度の小部屋
で2日間管理し、それを発生室へ移動して発生管理を行
った。この操作を5回繰り返して行った。
(Part 7) The generation of the shiitake mushroom bed of the high-temperature variety whose culture management has been completed is controlled in a generation room at a constant temperature of 23 ° C. It was controlled for two days in a small room that was sealed at a constant temperature and had a humidity close to saturation, and was moved to the generation room to perform generation control. This operation was repeated five times.

【0021】(その8)培養管理の終了した高温系品種
のしいたけ菌床を23℃定温の発生室で発生管理を行
い、きのこの発生終了後に18℃の水温で浸水を行って
直後に18℃定温で順次換気のできる飽和に近い湿度の
小部屋で2日間管理し、それを発生室へ移動して発生管
理を行った。この操作を5回繰り返して行った。
(Part 8) The generation of the shiitake mushroom bed of the high-temperature cultivar whose culture management has been completed is controlled in a generation room at a constant temperature of 23 ° C., and after completion of the mushroom, the mushroom is submerged at a water temperature of 18 ° C. and immediately thereafter, the temperature is adjusted to 18 ° C. It was controlled for two days in a small room with near-saturated humidity that can be ventilated at a constant temperature and moved to the generation room for generation control. This operation was repeated five times.

【0022】(対照例)培養管理の終了した高温系品種
のしいたけ菌床を23℃定温の発生室で発生管理を行
い、きのこの発生終了後に23℃の水温で浸水を行って
直後に発生室へ移動して発生管理を行った。この操作を
5回繰り返して行った。
(Comparative Example) The generation of a shiitake mushroom bed of a high-temperature cultivar whose culture has been completed is controlled in a generation room at a constant temperature of 23 ° C., and after completion of the mushroom, the plant is submerged at a water temperature of 23 ° C. and immediately after the mushroom generation. Moved to and managed outbreak. This operation was repeated five times.

【0023】その結果を下記の表2に示す。The results are shown in Table 2 below.

【0024】[0024]

【表2】 [Table 2]

【0025】上記の結果から明らかなように、試験例は
対照例に比べて大幅に発生量が増加しており、発生回数
を重ねても急激な発生量の低下は見られない。また、実
施形態の比較では、その5<その6<その7<その8の
順に発生量が多くなっている。さらに、きのこの品質は
その6及びその8を除いて不良であり、前記した手法の
効果を示している。
As is clear from the above results, the amount of generation in the test example is significantly increased as compared with the control example, and no rapid decrease in the amount of generation is observed even when the number of occurrences is increased. Further, in the comparison of the embodiments, the generation amount increases in the order of 5 <6 <7 <8. Furthermore, the quality of the mushrooms was poor except for the 6 and 8, indicating the effect of the method described above.

【0026】[0026]

【発明の効果】本発明は、以上のように構成されている
ので、低温あるいは高温の条件で発生管理をしている菌
床に対して、浸水の水温及び浸水後の発芽初期の温湿度
とガス環境などをコントロールすることで、試験例その
1、その2、その4、その6、その8の成果に見られる
ように、継続的に優良な品質のきのこを発生させること
ができるものである。
According to the present invention, since the present invention is constructed as described above, the temperature of the submerged water and the temperature and humidity of the initial germination after the submergence can be controlled with respect to the bacterial bed which is controlled under low or high temperature conditions. By controlling the gas environment, etc., as shown in the results of Test Examples 1, 2, 4, 6, and 8, it is possible to continuously generate high quality mushrooms. .

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 しいたけ菌床栽培の発生工程において、
2番以降のきのこの発芽操作として菌床の浸水あるいは
散水を行う水の温度を16〜23℃とし、又は/及び浸
水あるいは散水を行った後に、飽和に近い湿度と13〜
22℃の温度を保持した環境で、0.5〜3日間管理す
ることで、きのこの発芽を促進し、きのこを継続的に発
生させることを特徴とするしいたけ菌床の発生方法。
Claims: 1. In the occurrence process of Shiitake mushroom bed cultivation,
As the germination operation of the second and subsequent mushrooms, the temperature of the water for immersing or watering the bacterial bed is set to 16 to 23 ° C., and / or after the immersion or watering is performed, a humidity close to saturation and 13 to
A method for generating a bed of Shiitake mushrooms, characterized in that germination of mushrooms is promoted and mushrooms are continuously generated by controlling for 0.5 to 3 days in an environment in which a temperature of 22 ° C is maintained.
【請求項2】 0.5〜3日間管理している間に、継続
的あるいは少なくとも0.5日間に1回の間隔で保持温
度から外れない程度のゆるやかな換気を行う請求項1記
載のしいたけ菌床の発生方法。
2. The shiitake mushroom according to claim 1, wherein, during the control for 0.5 to 3 days, gentle ventilation is performed continuously or at least once every 0.5 days so as not to deviate from the holding temperature. How the bed is generated.
JP09290386A 1997-10-06 1997-10-06 Generation method of Shiitake mushroom bed Expired - Lifetime JP3087170B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP09290386A JP3087170B2 (en) 1997-10-06 1997-10-06 Generation method of Shiitake mushroom bed

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09290386A JP3087170B2 (en) 1997-10-06 1997-10-06 Generation method of Shiitake mushroom bed

Publications (2)

Publication Number Publication Date
JPH11103671A true JPH11103671A (en) 1999-04-20
JP3087170B2 JP3087170B2 (en) 2000-09-11

Family

ID=17755351

Family Applications (1)

Application Number Title Priority Date Filing Date
JP09290386A Expired - Lifetime JP3087170B2 (en) 1997-10-06 1997-10-06 Generation method of Shiitake mushroom bed

Country Status (1)

Country Link
JP (1) JP3087170B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005287459A (en) * 2004-04-05 2005-10-20 Hokken Co Ltd Method for mushroom cultivation by mushroom bed and apparatus for carrying out the method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005287459A (en) * 2004-04-05 2005-10-20 Hokken Co Ltd Method for mushroom cultivation by mushroom bed and apparatus for carrying out the method
JP4727163B2 (en) * 2004-04-05 2011-07-20 株式会社北研 Cultivation method of fungus bed mushroom and apparatus for carrying out the method

Also Published As

Publication number Publication date
JP3087170B2 (en) 2000-09-11

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