JPH10503322A - マルチウィンドウの電子銃 - Google Patents
マルチウィンドウの電子銃Info
- Publication number
- JPH10503322A JPH10503322A JP8505852A JP50585296A JPH10503322A JP H10503322 A JPH10503322 A JP H10503322A JP 8505852 A JP8505852 A JP 8505852A JP 50585296 A JP50585296 A JP 50585296A JP H10503322 A JPH10503322 A JP H10503322A
- Authority
- JP
- Japan
- Prior art keywords
- window
- electrons
- windows
- electron
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims abstract description 25
- 239000013078 crystal Substances 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims description 23
- 239000010408 film Substances 0.000 claims description 12
- 239000010409 thin film Substances 0.000 claims description 12
- 239000003574 free electron Substances 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims description 5
- 230000001133 acceleration Effects 0.000 claims description 3
- 230000003213 activating effect Effects 0.000 claims description 2
- 238000005259 measurement Methods 0.000 claims description 2
- 238000000407 epitaxy Methods 0.000 claims 1
- 210000004761 scalp Anatomy 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 5
- 239000000565 sealant Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 230000004913 activation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000008713 feedback mechanism Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
- H01J33/02—Details
- H01J33/04—Windows
Landscapes
- Electron Sources, Ion Sources (AREA)
- Measurement Of Radiation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US278,804 | 1994-07-22 | ||
| US08/278,804 US5557163A (en) | 1994-07-22 | 1994-07-22 | Multiple window electron gun providing redundant scan paths for an electron beam |
| PCT/US1995/009167 WO1996003767A1 (en) | 1994-07-22 | 1995-07-18 | Multiple window electron gun |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004152086A Division JP2004239920A (ja) | 1994-07-22 | 2004-05-21 | マルチウィンドウの電子銃 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10503322A true JPH10503322A (ja) | 1998-03-24 |
Family
ID=23066440
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8505852A Pending JPH10503322A (ja) | 1994-07-22 | 1995-07-18 | マルチウィンドウの電子銃 |
| JP2004152086A Pending JP2004239920A (ja) | 1994-07-22 | 2004-05-21 | マルチウィンドウの電子銃 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004152086A Pending JP2004239920A (ja) | 1994-07-22 | 2004-05-21 | マルチウィンドウの電子銃 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5557163A (enExample) |
| EP (1) | EP0801808A1 (enExample) |
| JP (2) | JPH10503322A (enExample) |
| KR (1) | KR970705165A (enExample) |
| CA (1) | CA2194570A1 (enExample) |
| TW (1) | TW311232B (enExample) |
| WO (1) | WO1996003767A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008062666A1 (en) * | 2006-11-24 | 2008-05-29 | Hamamatsu Photonics K.K. | Electron beam irradiation device |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997048114A1 (en) | 1996-06-12 | 1997-12-18 | American International Technologies, Inc. | Actinic radiation source having anode that includes a window area formed by a thin, monolithic silicon membrane |
| US7264771B2 (en) * | 1999-04-20 | 2007-09-04 | Baxter International Inc. | Method and apparatus for manipulating pre-sterilized components in an active sterile field |
| US7424764B2 (en) * | 1999-09-01 | 2008-09-16 | Hagleitner Hygiene International Gmbh | Brush with locking and detaching structure for disposable head |
| US6750461B2 (en) * | 2001-10-03 | 2004-06-15 | Si Diamond Technology, Inc. | Large area electron source |
| US7148613B2 (en) | 2004-04-13 | 2006-12-12 | Valence Corporation | Source for energetic electrons |
| SE529241C2 (sv) * | 2005-10-26 | 2007-06-05 | Tetra Laval Holdings & Finance | Sensor samt system för avkänning av en elektronstråle |
| WO2008050321A2 (en) * | 2006-10-24 | 2008-05-02 | B-Nano Ltd. | An interface, a methof for observing an object within a non-vacuum environment and a scanning electron microscope |
| JP4620034B2 (ja) * | 2006-11-24 | 2011-01-26 | 浜松ホトニクス株式会社 | 電子線照射装置 |
| US7656236B2 (en) | 2007-05-15 | 2010-02-02 | Teledyne Wireless, Llc | Noise canceling technique for frequency synthesizer |
| US8179045B2 (en) | 2008-04-22 | 2012-05-15 | Teledyne Wireless, Llc | Slow wave structure having offset projections comprised of a metal-dielectric composite stack |
| US8981294B2 (en) | 2008-07-03 | 2015-03-17 | B-Nano Ltd. | Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment |
| WO2014128699A1 (en) | 2013-02-20 | 2014-08-28 | B-Nano Ltd. | Scanning electron microscope |
| US9202660B2 (en) | 2013-03-13 | 2015-12-01 | Teledyne Wireless, Llc | Asymmetrical slow wave structures to eliminate backward wave oscillations in wideband traveling wave tubes |
| DE102017001968A1 (de) * | 2016-10-12 | 2018-04-12 | Hydac Process Technology Gmbh | Filtervorrichtung |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE934002C (de) * | 1952-02-20 | 1955-10-06 | Licentia Gmbh | Strahlenaustrittsfenster fuer Roentgenroehren, Elektronenroehren und andere elektrische Entladungsgefaesse |
| NL234550A (enExample) * | 1957-12-23 | |||
| US3319318A (en) * | 1964-02-24 | 1967-05-16 | Stanford Research Inst | Thin gas tight window assembly |
| US3611418A (en) * | 1967-10-03 | 1971-10-05 | Matsushita Electric Industrial Co Ltd | Electrostatic recording device |
| US3788892A (en) * | 1970-05-01 | 1974-01-29 | Rca Corp | Method of producing a window device |
| DE2501885A1 (de) * | 1975-01-18 | 1976-07-22 | Licentia Gmbh | Elektronendurchlaessiges fenster und verfahren zu dessen herstellung |
| US4455561A (en) * | 1982-11-22 | 1984-06-19 | Hewlett-Packard Company | Electron beam driven ink jet printer |
| US4494036A (en) * | 1982-11-22 | 1985-01-15 | Hewlett-Packard Company | Electron beam window |
| US4468282A (en) * | 1982-11-22 | 1984-08-28 | Hewlett-Packard Company | Method of making an electron beam window |
| FR2581212B1 (fr) * | 1985-04-26 | 1988-06-17 | Commissariat Energie Atomique | Imprimante a canon a electrons |
-
1994
- 1994-07-22 US US08/278,804 patent/US5557163A/en not_active Expired - Fee Related
-
1995
- 1995-07-18 EP EP95927311A patent/EP0801808A1/en not_active Ceased
- 1995-07-18 KR KR1019970700366A patent/KR970705165A/ko not_active Withdrawn
- 1995-07-18 WO PCT/US1995/009167 patent/WO1996003767A1/en not_active Ceased
- 1995-07-18 CA CA002194570A patent/CA2194570A1/en not_active Abandoned
- 1995-07-18 JP JP8505852A patent/JPH10503322A/ja active Pending
- 1995-07-31 TW TW084107922A patent/TW311232B/zh active
-
2004
- 2004-05-21 JP JP2004152086A patent/JP2004239920A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008062666A1 (en) * | 2006-11-24 | 2008-05-29 | Hamamatsu Photonics K.K. | Electron beam irradiation device |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0801808A1 (en) | 1997-10-22 |
| WO1996003767A1 (en) | 1996-02-08 |
| KR970705165A (ko) | 1997-09-06 |
| JP2004239920A (ja) | 2004-08-26 |
| EP0801808A4 (enExample) | 1997-11-05 |
| CA2194570A1 (en) | 1996-02-08 |
| US5557163A (en) | 1996-09-17 |
| TW311232B (enExample) | 1997-07-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20040216 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20040405 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040521 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20050906 |