JPH1036486A - Epoxy resin composition for semiconductor sealing - Google Patents

Epoxy resin composition for semiconductor sealing

Info

Publication number
JPH1036486A
JPH1036486A JP19462196A JP19462196A JPH1036486A JP H1036486 A JPH1036486 A JP H1036486A JP 19462196 A JP19462196 A JP 19462196A JP 19462196 A JP19462196 A JP 19462196A JP H1036486 A JPH1036486 A JP H1036486A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
resin
wax
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP19462196A
Other languages
Japanese (ja)
Inventor
Masaru Ota
賢 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP19462196A priority Critical patent/JPH1036486A/en
Publication of JPH1036486A publication Critical patent/JPH1036486A/en
Withdrawn legal-status Critical Current

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  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain an epoxy resin composition for semiconductor sealing, excellent in mold release and adhesion by mixing an epoxy resin with a phenolic resin curing agent, a cure accelerator, an inorganic filler and specified waxes in a specified mixing ratio. SOLUTION: This composition comprises an epoxy resin, a phenolic resin curing agent, a cure accelerator, an inorganic filler and waxes represented by formulas I and/or II (wherein R is H, a phenyl or a 1-50C alkyl; m>=1; and 1<=n<=300). The waxes should be each a copolymer of a polystyrene with maleic anhydride and should be used in an amount of 0.02-1wt.% based on the entire composition.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、離型性、密着性に
優れた半導体封止用エポキシ樹脂組成物に関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation which is excellent in releasability and adhesion.

【0002】[0002]

【従来の技術】トランジスター、コンデンサー、ダイオ
ード、IC、LSI等の半導体封止用エポキシ樹脂組成
物(以下、樹脂組成物という)の樹脂成分として熱硬化
性樹脂、充填材として無機充填材、離型剤成分として高
分子脂肪酸、高分子脂肪酸エステル、その他各種高級脂
肪族化合物が成形性、信頼性、量産性に適した原料とし
て採用されている。近年の電子機器の小型化、軽量化、
高性能化、低価格化の市場動向の中で、樹脂組成物への
要求は益々厳しくなり、半導体装置の生産性向上のため
に短時間成形と歩留まり向上等も必要とされてきてい
る。即ち、 半導体パッケージの小型化、薄型化は、樹
脂組成物の封止時の成形を著しく困難にしており、金型
からの離型性の大幅な改善が必要である。又、 半導体
装置の表面実装の採用によりパッケージは半田浸漬、或
いはリフロー工程で急激に200℃以上の高温にさらさ
れ、チップと封止樹脂との界面剥離が生じやすいため、
封止樹脂は各種基材と良好な密着性を有する必要があ
る。上記の 良好な離型性と、 良好な密着性を両立す
るために各種のワックスが検討されてきた。例えば、特
公平7−37041号公報では、酸化ポリエチレンワッ
クスを用いることにより、離型性と密着性を両立するこ
とを目的としているが、現在の薄型、小型パッケージに
対しては十分な効果を発揮することはできなかった。
2. Description of the Related Art A thermosetting resin as a resin component of an epoxy resin composition for semiconductor encapsulation of a transistor, a capacitor, a diode, an IC, an LSI or the like (hereinafter referred to as a resin composition), an inorganic filler as a filler, a mold release. As the agent component, a high-molecular fatty acid, a high-molecular fatty acid ester, and other various higher aliphatic compounds are used as raw materials suitable for moldability, reliability, and mass productivity. In recent years, electronic devices have become smaller and lighter,
In the market trend of higher performance and lower price, the demand for resin compositions has become more and more severe, and short-time molding and improvement in yield have been required to improve the productivity of semiconductor devices. That is, miniaturization and thinning of the semiconductor package make molding of the resin composition at the time of encapsulation extremely difficult, and it is necessary to greatly improve releasability from a mold. In addition, due to the adoption of the surface mounting of the semiconductor device, the package is rapidly exposed to a high temperature of 200 ° C. or more in the solder immersion or reflow process, and the interface between the chip and the sealing resin is easily peeled off.
The sealing resin needs to have good adhesion to various substrates. Various waxes have been studied to achieve both the above good releasability and good adhesion. For example, Japanese Patent Publication No. Hei 7-37041 aims to achieve both release properties and adhesiveness by using oxidized polyethylene wax, but it has a sufficient effect on current thin and small packages. I couldn't.

【0003】[0003]

【発明が解決しようとする課題】本発明は、成形時の金
型からの離型性を改善することにより、生産性を向上
し、各種基材に対する密着性も良好な、耐半田性等の信
頼性に優れた半導体封止用エポキシ樹脂組成物を提供す
ることにある。
SUMMARY OF THE INVENTION The present invention improves the productivity by improving the releasability from a mold at the time of molding, improves the adhesion to various base materials, and improves the solder resistance. An object of the present invention is to provide an epoxy resin composition for semiconductor encapsulation having excellent reliability.

【0004】[0004]

【課題を解決するための手段】本発明は、エポキシ樹
脂、フェノール樹脂硬化剤、硬化促進剤、無機充填材、
式(1)及び/又は式(2)のワックスからなり、且つ
該ワックスを全樹脂組成物中に0.02〜1重量%含む
ことを特徴とする半導体封止用エポキシ樹脂組成物であ
る。
The present invention provides an epoxy resin, a phenol resin curing agent, a curing accelerator, an inorganic filler,
An epoxy resin composition for semiconductor encapsulation, comprising a wax represented by the formula (1) and / or formula (2), wherein the wax is contained in the entire resin composition in an amount of 0.02 to 1% by weight.

【化2】 Embedded image

【0005】[0005]

【発明の実施の形態】本発明で用いられるエポキシ樹脂
としては、エポキシ基を有するポリマー全般をいう。例
えば、ビスフェノール型エポキシ樹脂、オルソクレゾー
ルノボラック型エポキシ樹脂、ビフェニル型エポキシ樹
脂、フェノールノボラック型エポキシ樹脂及びトリフェ
ノールメタン型エポキシ樹脂、アルキル変性トリフェノ
ールメタン型エポキシ樹脂、トリアジン核含有エポキシ
樹脂、ジシクロペンタジエン変性エポキシ樹脂、スチル
ベン型エポキシ樹脂等が挙げられる。エポキシ樹脂の軟
化点やエポキシ当量に関しては特に限定しない。又、こ
れらのエポキシ樹脂は単独でも混合して用いてもよい。
本発明で用いられるエポキシ樹脂は、耐湿信頼性向上の
ために、塩素イオンやナトリウムイオン等のイオン性不
純物が少ないことが望ましい。
BEST MODE FOR CARRYING OUT THE INVENTION The epoxy resin used in the present invention refers to all polymers having an epoxy group. For example, bisphenol type epoxy resin, orthocresol novolak type epoxy resin, biphenyl type epoxy resin, phenol novolak type epoxy resin and triphenolmethane type epoxy resin, alkyl-modified triphenolmethane type epoxy resin, epoxy resin containing triazine nucleus, dicyclopentadiene Modified epoxy resins, stilbene type epoxy resins, and the like are included. The softening point and epoxy equivalent of the epoxy resin are not particularly limited. These epoxy resins may be used alone or as a mixture.
It is desirable that the epoxy resin used in the present invention has few ionic impurities such as chlorine ions and sodium ions in order to improve moisture resistance reliability.

【0006】本発明で用いられるフェノール樹脂硬化剤
としては、フェノール性水酸基を有するポリマー全般を
いう。例えば、フェノールノボラック樹脂、クレゾール
ノボラック樹脂、ジシクロペンタジエン変性フェノール
樹脂、パラキシリレン変性フェノール樹脂、トリフェノ
ールメタン型のフェノール樹脂等が挙げられる。フェノ
ール樹脂の融点や、水酸基当量に関しては特に限定しな
い。又、これらのフェノール樹脂は単独でも混合して用
いてもよい。本発明で用いられるフェノール樹脂は、耐
湿信頼性向上のために、塩素イオンやナトリウムイオン
等のイオン性不純物が少ないことが望ましい。エポキシ
樹脂のエポキシ基数とフェノール樹脂の水酸基数は、当
量が望ましい。
[0006] The phenolic resin curing agent used in the present invention refers to all polymers having a phenolic hydroxyl group. For example, a phenol novolak resin, a cresol novolak resin, a dicyclopentadiene-modified phenol resin, a paraxylylene-modified phenol resin, a triphenolmethane-type phenol resin, and the like can be given. The melting point of the phenol resin and the hydroxyl equivalent are not particularly limited. Further, these phenol resins may be used alone or in combination. It is desirable that the phenolic resin used in the present invention has few ionic impurities such as chlorine ions and sodium ions in order to improve the moisture resistance reliability. The number of epoxy groups in the epoxy resin and the number of hydroxyl groups in the phenol resin are preferably equivalent.

【0007】本発明で用いられる無機充填材としては、
例えば、溶融シリカ粉末、球状溶融シリカ粉末、結晶シ
リカ粉末、二次凝集シリカ粉末、多孔質シリカ粉末、二
次凝集シリカ粉末又は多孔質シリカ粉末を粉砕したシリ
カ粉末、アルミナ等が挙げられる。又、無機充填材の形
状は、破砕状でも球状でも問題ない。又、これらの無機
充填材は単独でも混合して用いてもよい。なお、流動特
性と機械的強度、熱的特性のバランスのとれた球状溶融
シリカ粉末を用いることが好ましい。
The inorganic filler used in the present invention includes:
For example, a fused silica powder, a spherical fused silica powder, a crystalline silica powder, a secondary aggregated silica powder, a porous silica powder, a silica powder obtained by pulverizing a secondary aggregated silica powder or a porous silica powder, and alumina are exemplified. The shape of the inorganic filler may be crushed or spherical. Further, these inorganic fillers may be used alone or in combination. In addition, it is preferable to use spherical fused silica powder in which the flow characteristics, mechanical strength, and thermal characteristics are balanced.

【0008】本発明で用いられる硬化促進剤としては、
エポキシ樹脂とフェノール性水酸基との反応を促進させ
るものであればよく、一般に封止用材料に使用されてい
るものを広く使用することができる。例えば1,8−ジ
アザビシクロ(5,4,0)ウンデセン−7、トリフェ
ニルホスフィン、テトラフェニルホスホニウム・テトラ
フェニルボレート、ジメチルベンジルアミン、テトラフ
ェニルホスホニウム・テトラナフトイックアシッドボレ
ート等が挙げられる。これらの硬化促進剤は単独でも混
合して用いてもよい。これらの硬化促進剤は、樹脂中に
ドライブレンドされても、溶融ブレンドされても、又は
両者の併用でもよい。
The curing accelerator used in the present invention includes:
Any material that promotes the reaction between the epoxy resin and the phenolic hydroxyl group may be used, and those generally used as sealing materials can be widely used. For example, 1,8-diazabicyclo (5,4,0) undecene-7, triphenylphosphine, tetraphenylphosphonium / tetraphenylborate, dimethylbenzylamine, tetraphenylphosphonium / tetranaphthoic acid borate and the like can be mentioned. These curing accelerators may be used alone or as a mixture. These curing accelerators may be dry-blended, melt-blended, or a combination of both in the resin.

【0009】本発明で用いられる式(1)、式(2)で
示されるワックスについて、以下に詳細に説明する。本
発明で用いられるワックスは、ポリαオレフィン又はポ
リスチレンと、無水マレイン酸との共重合体である。親
水基の無水マレイン酸が含有されていることにより、エ
ポキシ樹脂との親和性が向上し、樹脂組成物中に良好に
分散できるため、これを用いることにより、成形時の金
型汚れが殆どなくなる。更に、無水マレイン酸部分は、
親水性である金属表面や、ポリイミド系のチップコート
材等に良好に密着する機能を有する。又、水分やアルコ
ール成分が揮発分として樹脂組成物内部に残っている
と、成形時にボイドの原因になることが分かっている
が、無水マレイン酸部分は、この水分やアルコール成分
と反応しトラップする効果を有するため、封止された半
導体装置中のボイドの数が減ることも分かっている。次
に、疎水基であるポリαオレフィン、又はポリスチレン
部分は、表面エネルギーが小さいため、成形品表面へわ
ずかににじみ出し、金型からの離型性の改善に効果があ
る。しかも、比較的分子量の大きいワックスであるた
め、金型表面に移行しにくく、金型汚れは殆どない。更
に、高温域(半田実装時の温度:200℃以上)でタッ
ク性を示し、封止樹脂と各種基材との密着性の改善に大
きな効果を発揮する。これらの特徴を有する本発明のワ
ックスを樹脂組成物に配合することにより、従来のワッ
クス系では達成できなかった、離型性と密着性の両立が
可能となった。式(1)、式(2)において、mは1以
上である。1未満だと、疎水性基が少ないため離型性が
低下する。nは1〜300である。1未満だと、分子量
が小さ過ぎ、離型性や密着性が発現しない。一方、30
0を越えると、融点が高くなり過ぎ、樹脂組成物中に均
一に分散できない。Rは、水素、フェニル基、又はアル
キル基であり、アルキル基の場合、xは1〜50であ
る。50を越えると、疎水性が強過ぎてワックスがブリ
ードアウトする。又、ワックスの合成が著しく困難とな
り、実用性がない。式(1)、式(2)のワックスは、
単独でも混合して用いても同じ効果を示す。
The waxes represented by the formulas (1) and (2) used in the present invention will be described in detail below. The wax used in the present invention is a copolymer of polyalphaolefin or polystyrene and maleic anhydride. By containing the maleic anhydride of a hydrophilic group, the affinity with the epoxy resin is improved, and the resin can be dispersed well in the resin composition. By using this, mold stains during molding are almost eliminated. . In addition, the maleic anhydride moiety
It has a function of satisfactorily adhering to a hydrophilic metal surface, a polyimide-based chip coat material, and the like. It is also known that if the water or alcohol components remain as volatile components in the resin composition, they cause voids during molding, but the maleic anhydride reacts with the water and alcohol components to trap. It has also been found that the effect reduces the number of voids in the sealed semiconductor device. Next, the poly-alpha olefin or polystyrene portion, which is a hydrophobic group, has a small surface energy, so that it slightly oozes out to the surface of the molded product, which is effective in improving the releasability from the mold. Moreover, since the wax has a relatively large molecular weight, it does not easily migrate to the surface of the mold, and there is almost no stain on the mold. Furthermore, it exhibits tackiness in a high temperature range (temperature at the time of solder mounting: 200 ° C. or more), and exhibits a great effect in improving the adhesion between the sealing resin and various base materials. By blending the wax of the present invention having these features into a resin composition, it has become possible to achieve both mold release and adhesion, which could not be achieved by a conventional wax system. In the formulas (1) and (2), m is 1 or more. If it is less than 1, the releasability is reduced due to a small number of hydrophobic groups. n is 1 to 300. If it is less than 1, the molecular weight is too small, and no releasability or adhesion is exhibited. On the other hand, 30
If it exceeds 0, the melting point becomes too high and it cannot be uniformly dispersed in the resin composition. R is hydrogen, a phenyl group, or an alkyl group. In the case of an alkyl group, x is 1 to 50. If it exceeds 50, the wax will bleed out due to too strong hydrophobicity. In addition, the synthesis of wax becomes extremely difficult and is not practical. The wax of the formulas (1) and (2)
The same effect is exhibited when used alone or as a mixture.

【0010】本発明で用いられるワックスは、全樹脂組
成物中に0.02〜1重量%添加することが望ましい。
0.02重量%未満だと、離型性や密着性の向上の効果
が少なく好ましくない。一方、1重量%を越えると、成
形品表面にブリードアウトし、成形品汚れ、金型汚れを
引き起こす上に、密着性が低下し、耐半田性が低下す
る。又、本発明のワックスはカルナバワックス等のエス
テル系ワックスや、ステアリン酸ワックス、ステアリン
酸鉛等の酸系ワックスと併用することもできる。
[0010] The wax used in the present invention is desirably added to the entire resin composition in an amount of 0.02 to 1% by weight.
If it is less than 0.02% by weight, the effect of improving the releasability and adhesion is small, which is not preferable. On the other hand, if it exceeds 1% by weight, it bleeds out to the surface of the molded article, causing stains on the molded article and mold, and also lowers the adhesiveness and the solder resistance. The wax of the present invention can be used in combination with an ester wax such as carnauba wax or an acid wax such as stearic acid wax and lead stearate.

【0011】本発明の樹脂組成物はエポキシ樹脂、フェ
ノール樹脂硬化剤、無機充填材、硬化促進剤、式(1)
及び/又は式(2)のワックスを必須成分とするが、必
要に応じてシランカップリング剤、ブロム化エポキシ樹
脂、三酸化アンチモン、ヘキサブロムベンゼン等の難燃
剤、カーボンブラック、ベンガラ等の着色剤、及びシリ
コーンオイル、ゴム等の低応力添加剤等の種々の添加剤
を適宜配合しても差し支えない。
The resin composition of the present invention comprises an epoxy resin, a phenol resin curing agent, an inorganic filler, a curing accelerator, and a compound represented by the formula (1):
And / or a wax of the formula (2) as an essential component, if necessary, a silane coupling agent, a brominated epoxy resin, a flame retardant such as antimony trioxide, hexabromobenzene, and a coloring agent such as carbon black and red iron. And various additives such as low-stress additives such as silicone oil and rubber.

【0012】本発明の樹脂組成物を成形材料として製造
するには、エポキシ樹脂、フェノール樹脂硬化剤、硬化
促進剤、無機充填材、式(1)及び/又は式(2)のワ
ックス、その他の添加剤をミキサー等により十分に均一
混合した後、更に熱ロール又はニーダー等で溶融混合
し、冷却後粉砕して成形材料とすることができる。これ
らの成形材料は電子部品或いは電気部品の封止、被覆、
絶縁等に適用することができる。
In order to produce the resin composition of the present invention as a molding material, epoxy resin, phenol resin curing agent, curing accelerator, inorganic filler, wax of formula (1) and / or formula (2), other After the additives are sufficiently and uniformly mixed by a mixer or the like, they are further melt-mixed by a hot roll or a kneader, cooled, and pulverized to obtain a molding material. These molding materials can be used for sealing or coating electronic or electrical components,
It can be applied to insulation and the like.

【0013】[0013]

【実施例】以下に本発明を実施例で示す。配合割合は重
量部とする。 実施例1 ビフェニル型エポキシ樹脂(油化シェルエポキシ(株)・製、YX4000H) 9.6重量部 フェノールアラルキル樹脂(三井東圧(株)・製、XL−225) 6.9重量部
The present invention will be described below by way of examples. The mixing ratio is by weight. Example 1 Biphenyl-type epoxy resin (YX4000H manufactured by Yuka Shell Epoxy Co., Ltd., 9.6 parts by weight) Phenol aralkyl resin (Mitsui Toatsu Co., Ltd., XL-225) 6.9 parts by weight

【0014】 ワックス(P−1) 0.5重量部Wax (P-1) 0.5 parts by weight

【化3】 1,8−ジアザビシクロ(5,4,0)ウンデセン−7(DBU) 0.2重量部 球状溶融シリカ(平均粒径15μm) 80.0重量部 カーボンブラック 0.3重量部 臭素化フェノールノボラック型エポキシ樹脂 1.0重量部 三酸化アンチモン 1.0重量部 エポキシシランカップリング剤 0.5重量部 をミキサーを用いて常温で混合し、50〜130℃で二
軸ロールを用いて混練し、冷却後粉砕し成形材料とし、
これをタブレット化して樹脂組成物を得た。この樹脂組
成物を低圧トランスファー成形機(成形条件:175
℃、70kg/cm2 、120秒)を用いて成形し、得られ
た成形品を175℃、8時間でポストキュアし評価し
た。評価結果を表1に示す。
Embedded image 1,8-diazabicyclo (5,4,0) undecene-7 (DBU) 0.2 parts by weight Spherical fused silica (average particle size 15 μm) 80.0 parts by weight Carbon black 0.3 part by weight Brominated phenol novolak epoxy Resin 1.0 part by weight Antimony trioxide 1.0 part by weight Epoxysilane coupling agent 0.5 part by weight is mixed at room temperature using a mixer, kneaded at 50 to 130 ° C. using a biaxial roll, and cooled. Crushed into molding material,
This was tableted to obtain a resin composition. This resin composition was transferred to a low-pressure transfer molding machine (molding conditions: 175).
(70 ° C., 70 kg / cm 2 , 120 seconds), and the obtained molded article was post-cured at 175 ° C. for 8 hours and evaluated. Table 1 shows the evaluation results.

【0015】《評価方法》 離型性及び金型汚れ性:低圧トランスファー成形機で、
160pQFP用金型を用いて、成形テストを行った。
成形温度175℃、硬化時間120秒で成形した成形品
の離型性を○、△、×の3段階で官能評価した。更に、
得られた成形品の表面の状態を目視で観察し、金型汚れ
性を○、△、×の3段階で判定した。 耐半田性:175℃、硬化時間120秒で80pQFP
(1.5mm厚)の成形品を得、175℃、8時間のポ
ストキュアを行ってサンプルとした。各サンプル毎に6
パッケージづつ得た。85℃、相対湿度85%の恒温恒
湿槽内に168時間投入した後、240℃のIRリフロ
ー処理を行った。処理後のパッケージの内部の剥離を超
音波探傷機を用いて観察し、チップ表面の剥離があるパ
ッケージの個数、パッド裏面の剥離があるパッケージの
個数をそれぞれカウントし、耐半田性(及び密着性)を
判定した。
<< Evaluation method >> Release property and mold fouling property: Low pressure transfer molding machine
A molding test was performed using a mold for 160 pQFP.
The mold releasability of a molded article molded at a molding temperature of 175 ° C. and a curing time of 120 seconds was organoleptically evaluated in three stages of ○, Δ, and ×. Furthermore,
The state of the surface of the obtained molded article was visually observed, and the stain on the mold was evaluated in three stages of ○, Δ, and ×. Solder resistance: 80pQFP at 175 ° C, curing time 120 seconds
A (1.5 mm thick) molded product was obtained and subjected to post-curing at 175 ° C. for 8 hours to obtain a sample. 6 for each sample
I got each package. After being charged in a thermo-hygrostat at 85 ° C. and a relative humidity of 85% for 168 hours, an IR reflow treatment at 240 ° C. was performed. Observe the peeling inside the package after processing using an ultrasonic flaw detector and count the number of packages with peeling on the chip surface and the number of packages with peeling on the back of the pad, respectively. ) Was determined.

【0016】実施例2〜14、比較例1〜4 表1〜表3の配合に従って、実施例1と同一の方法で成
形材料として、実施例1と同一の方法で評価した。以下
に実施例及び比較例で用いた(E−1)〜(E−4)、
(H−1)、(H−2)、(P−2)〜(P−8)の構
造式を示す。
Examples 2 to 14 and Comparative Examples 1 to 4 In accordance with the formulations shown in Tables 1 to 3, a molding material was evaluated in the same manner as in Example 1 and evaluated in the same manner as in Example 1. Hereinafter, (E-1) to (E-4) used in Examples and Comparative Examples,
The structural formulas of (H-1), (H-2), and (P-2) to (P-8) are shown.

【化4】 Embedded image

【0017】[0017]

【化5】 Embedded image

【0018】[0018]

【化6】 Embedded image

【0019】[0019]

【化7】 Embedded image

【0020】[0020]

【表1】 [Table 1]

【0021】[0021]

【表2】 [Table 2]

【0022】[0022]

【表3】 [Table 3]

【0023】[0023]

【発明の効果】本発明のエポキシ樹脂組成物は、成形時
の金型からの離型性に優れ、各種基材に対する密着性も
優れている。
The epoxy resin composition of the present invention has excellent releasability from a mold at the time of molding and excellent adhesion to various substrates.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/31 H01L 23/30 R // C08L 35/00 LHS (C08L 63/00 23:00) ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification number Agency reference number FI Technical display location H01L 23/31 H01L 23/30 R // C08L 35/00 LHS (C08L 63/00 23:00)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 エポキシ樹脂、フェノール樹脂硬化剤、
硬化促進剤、無機充填材、式(1)及び/又は式(2)
のワックスからなり、且つ該ワックスを全樹脂組成物中
に0.02〜1重量%含むことを特徴とする半導体封止
用エポキシ樹脂組成物。 【化1】
An epoxy resin, a phenol resin curing agent,
Curing accelerator, inorganic filler, formula (1) and / or formula (2)
An epoxy resin composition for encapsulating a semiconductor, comprising the wax described above, and containing 0.02 to 1% by weight of the total resin composition. Embedded image
JP19462196A 1996-07-24 1996-07-24 Epoxy resin composition for semiconductor sealing Withdrawn JPH1036486A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19462196A JPH1036486A (en) 1996-07-24 1996-07-24 Epoxy resin composition for semiconductor sealing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19462196A JPH1036486A (en) 1996-07-24 1996-07-24 Epoxy resin composition for semiconductor sealing

Publications (1)

Publication Number Publication Date
JPH1036486A true JPH1036486A (en) 1998-02-10

Family

ID=16327581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19462196A Withdrawn JPH1036486A (en) 1996-07-24 1996-07-24 Epoxy resin composition for semiconductor sealing

Country Status (1)

Country Link
JP (1) JPH1036486A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001214030A (en) * 2000-02-01 2001-08-07 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
KR100523621B1 (en) * 2003-02-11 2005-10-24 주식회사 케이씨씨 Epoxy resin composition for environmental frendly sealing semiconductor element
JP2006241307A (en) * 2005-03-03 2006-09-14 Hitachi Chem Co Ltd Epoxy resin molding material for sealing and electronic part device
JP2006241281A (en) * 2005-03-02 2006-09-14 Hitachi Chem Co Ltd Epoxy resin composition for sealing and electronic part device
JP2006316263A (en) * 2005-04-14 2006-11-24 Hitachi Chem Co Ltd Epoxy resin composition for sealing, and electronic component device
JP4524835B2 (en) * 2000-02-03 2010-08-18 住友ベークライト株式会社 Epoxy resin composition and semiconductor device
WO2021112142A1 (en) * 2019-12-06 2021-06-10 昭和電工マテリアルズ株式会社 Resin composition for sealing, electronic device, and method for producing electronic device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001214030A (en) * 2000-02-01 2001-08-07 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP4524832B2 (en) * 2000-02-01 2010-08-18 住友ベークライト株式会社 Epoxy resin composition and semiconductor device
JP4524835B2 (en) * 2000-02-03 2010-08-18 住友ベークライト株式会社 Epoxy resin composition and semiconductor device
KR100523621B1 (en) * 2003-02-11 2005-10-24 주식회사 케이씨씨 Epoxy resin composition for environmental frendly sealing semiconductor element
JP2006241281A (en) * 2005-03-02 2006-09-14 Hitachi Chem Co Ltd Epoxy resin composition for sealing and electronic part device
JP2006241307A (en) * 2005-03-03 2006-09-14 Hitachi Chem Co Ltd Epoxy resin molding material for sealing and electronic part device
JP2006316263A (en) * 2005-04-14 2006-11-24 Hitachi Chem Co Ltd Epoxy resin composition for sealing, and electronic component device
WO2021112142A1 (en) * 2019-12-06 2021-06-10 昭和電工マテリアルズ株式会社 Resin composition for sealing, electronic device, and method for producing electronic device

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