JPH10308374A - 洗浄方法及び洗浄装置 - Google Patents
洗浄方法及び洗浄装置Info
- Publication number
- JPH10308374A JPH10308374A JP10073255A JP7325598A JPH10308374A JP H10308374 A JPH10308374 A JP H10308374A JP 10073255 A JP10073255 A JP 10073255A JP 7325598 A JP7325598 A JP 7325598A JP H10308374 A JPH10308374 A JP H10308374A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- wafer
- nozzle
- cleaned
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 176
- 238000000034 method Methods 0.000 title claims abstract description 33
- 239000007788 liquid Substances 0.000 claims abstract description 85
- 239000000428 dust Substances 0.000 claims description 16
- 238000005507 spraying Methods 0.000 claims description 13
- 239000000463 material Substances 0.000 claims 1
- 238000002347 injection Methods 0.000 abstract description 32
- 239000007924 injection Substances 0.000 abstract description 32
- 230000015556 catabolic process Effects 0.000 abstract description 4
- 238000013459 approach Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 131
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 33
- 229910021642 ultra pure water Inorganic materials 0.000 description 27
- 239000012498 ultrapure water Substances 0.000 description 27
- 239000004065 semiconductor Substances 0.000 description 22
- 238000004506 ultrasonic cleaning Methods 0.000 description 14
- 238000005201 scrubbing Methods 0.000 description 9
- 230000005611 electricity Effects 0.000 description 8
- 230000003068 static effect Effects 0.000 description 8
- 239000007921 spray Substances 0.000 description 7
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 239000006061 abrasive grain Substances 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 210000000078 claw Anatomy 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000003957 anion exchange resin Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 210000000050 mohair Anatomy 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10073255A JPH10308374A (ja) | 1997-03-06 | 1998-03-06 | 洗浄方法及び洗浄装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6916797 | 1997-03-06 | ||
| JP9-69167 | 1997-03-06 | ||
| JP10073255A JPH10308374A (ja) | 1997-03-06 | 1998-03-06 | 洗浄方法及び洗浄装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10308374A true JPH10308374A (ja) | 1998-11-17 |
| JPH10308374A5 JPH10308374A5 (enExample) | 2005-07-14 |
Family
ID=26410364
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10073255A Pending JPH10308374A (ja) | 1997-03-06 | 1998-03-06 | 洗浄方法及び洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10308374A (enExample) |
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100345258C (zh) * | 2002-12-25 | 2007-10-24 | 株式会社瑞萨科技 | 半导体器件的制造方法 |
| WO2008111205A1 (ja) * | 2007-03-15 | 2008-09-18 | Fujitsu Microelectronics Limited | 半導体装置の製造方法、ウエハ、及びウエハの洗浄装置 |
| JP2011066301A (ja) * | 2009-09-18 | 2011-03-31 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置および基板洗浄方法 |
| CN102140669A (zh) * | 2011-03-17 | 2011-08-03 | 上海集成电路研发中心有限公司 | 硅片电镀铜后的清洗方法 |
| JP2011181644A (ja) * | 2010-03-01 | 2011-09-15 | Ebara Corp | 基板洗浄方法及び基板洗浄装置 |
| CN102574169A (zh) * | 2009-08-26 | 2012-07-11 | 南安普敦大学 | 清洁装置和方法及其监测 |
| KR20130043071A (ko) | 2011-10-19 | 2013-04-29 | 가부시키가이샤 에바라 세이사꾸쇼 | 기판 세정 방법 및 기판 세정 장치 |
| JP2015020323A (ja) * | 2013-07-18 | 2015-02-02 | キヤノン株式会社 | 記録ヘッド用基板の洗浄方法 |
| US9011605B2 (en) | 2011-05-25 | 2015-04-21 | Ebara Corporation | Substrate cleaning method and roll cleaning member |
| US9058977B2 (en) | 2012-12-06 | 2015-06-16 | Ebara Corporation | Substrate cleaning apparatus and substrate cleaning method |
| TWI501342B (zh) * | 2011-06-10 | 2015-09-21 | Ebara Corp | 洗淨性能預測方法及基板洗淨方法 |
| US9640384B2 (en) | 2012-12-28 | 2017-05-02 | Ebara Corporation | Substrate cleaning apparatus and substrate cleaning method |
| US10737301B2 (en) | 2012-12-28 | 2020-08-11 | Ebara Corporation | Substrate cleaning apparatus |
| CN112815247A (zh) * | 2020-12-28 | 2021-05-18 | 安徽明威照明器材有限公司 | 具有自动除尘功能的筒灯 |
| CN112879829A (zh) * | 2020-12-28 | 2021-06-01 | 安徽明威照明器材有限公司 | 具有自动除尘功能的插地式景观灯 |
| JP2022103614A (ja) * | 2020-12-28 | 2022-07-08 | 株式会社荏原製作所 | 基板洗浄装置、基板の洗浄方法 |
| CN115090596A (zh) * | 2022-07-12 | 2022-09-23 | 江苏芯梦半导体设备有限公司 | 基于兆声波技术的晶圆清洗设备及清洗方法 |
-
1998
- 1998-03-06 JP JP10073255A patent/JPH10308374A/ja active Pending
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100345258C (zh) * | 2002-12-25 | 2007-10-24 | 株式会社瑞萨科技 | 半导体器件的制造方法 |
| WO2008111205A1 (ja) * | 2007-03-15 | 2008-09-18 | Fujitsu Microelectronics Limited | 半導体装置の製造方法、ウエハ、及びウエハの洗浄装置 |
| CN102574169A (zh) * | 2009-08-26 | 2012-07-11 | 南安普敦大学 | 清洁装置和方法及其监测 |
| JP2011066301A (ja) * | 2009-09-18 | 2011-03-31 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置および基板洗浄方法 |
| JP2011181644A (ja) * | 2010-03-01 | 2011-09-15 | Ebara Corp | 基板洗浄方法及び基板洗浄装置 |
| CN102140669A (zh) * | 2011-03-17 | 2011-08-03 | 上海集成电路研发中心有限公司 | 硅片电镀铜后的清洗方法 |
| US9011605B2 (en) | 2011-05-25 | 2015-04-21 | Ebara Corporation | Substrate cleaning method and roll cleaning member |
| TWI501342B (zh) * | 2011-06-10 | 2015-09-21 | Ebara Corp | 洗淨性能預測方法及基板洗淨方法 |
| KR20130043071A (ko) | 2011-10-19 | 2013-04-29 | 가부시키가이샤 에바라 세이사꾸쇼 | 기판 세정 방법 및 기판 세정 장치 |
| US9058977B2 (en) | 2012-12-06 | 2015-06-16 | Ebara Corporation | Substrate cleaning apparatus and substrate cleaning method |
| US9640384B2 (en) | 2012-12-28 | 2017-05-02 | Ebara Corporation | Substrate cleaning apparatus and substrate cleaning method |
| US10737301B2 (en) | 2012-12-28 | 2020-08-11 | Ebara Corporation | Substrate cleaning apparatus |
| JP2015020323A (ja) * | 2013-07-18 | 2015-02-02 | キヤノン株式会社 | 記録ヘッド用基板の洗浄方法 |
| CN112815247A (zh) * | 2020-12-28 | 2021-05-18 | 安徽明威照明器材有限公司 | 具有自动除尘功能的筒灯 |
| CN112879829A (zh) * | 2020-12-28 | 2021-06-01 | 安徽明威照明器材有限公司 | 具有自动除尘功能的插地式景观灯 |
| JP2022103614A (ja) * | 2020-12-28 | 2022-07-08 | 株式会社荏原製作所 | 基板洗浄装置、基板の洗浄方法 |
| CN112879829B (zh) * | 2020-12-28 | 2024-04-19 | 安徽明威照明器材有限公司 | 具有自动除尘功能的插地式景观灯 |
| CN112815247B (zh) * | 2020-12-28 | 2024-04-26 | 安徽明威照明器材有限公司 | 具有自动除尘功能的筒灯 |
| CN115090596A (zh) * | 2022-07-12 | 2022-09-23 | 江苏芯梦半导体设备有限公司 | 基于兆声波技术的晶圆清洗设备及清洗方法 |
| CN115090596B (zh) * | 2022-07-12 | 2023-09-05 | 江苏芯梦半导体设备有限公司 | 基于兆声波技术的晶圆清洗设备及清洗方法 |
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Legal Events
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