JPH10287795A - Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith - Google Patents
Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewithInfo
- Publication number
- JPH10287795A JPH10287795A JP9855097A JP9855097A JPH10287795A JP H10287795 A JPH10287795 A JP H10287795A JP 9855097 A JP9855097 A JP 9855097A JP 9855097 A JP9855097 A JP 9855097A JP H10287795 A JPH10287795 A JP H10287795A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- desirably
- flame retardant
- inorganic filler
- red phosphorus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、難燃性、成形性、
信頼性に優れた封止材及びそれを用いた半導体装置に関
する。The present invention relates to flame retardancy, moldability,
The present invention relates to a sealing material excellent in reliability and a semiconductor device using the same.
【0002】[0002]
【従来の技術】半導体素子の封止は、生産性、コスト等
の面から樹脂封止が主流となっている。この封止用樹脂
は、電気的特性、コスト、作業性等に優れるエポキシ樹
脂組成物が主に用いられている。しかし、エポキシ樹脂
は難燃性が不充分なので通常、臭素化エポキシ樹脂を添
加して難燃性を向上させている。また、臭素系難燃剤と
相乗効果のあるアンチモン化合物(三酸化アンチモン、
五酸化アンチモン等)を併用している。近年、環境保護
の観点から、燃焼時にダイオキシンの生成が疑われる臭
素系難燃剤、及び発癌性の可能性が指摘されているアン
チモンに対する使用規制の要求が強まりつつある。この
要求に対し、種々の代替難燃剤が検討されてきた。例え
ば、水酸化アルミニウム、水酸化マグネシウム等の金属
水和物は充分な難燃性を発揮させるためには多量に添加
せねばならず、樹脂組成物の硬化性、強度等の劣化を招
いてしまう。また、燐酸エステル系難燃剤(窒素との併
用も含む)も種々の製品が提案されているが、成形性、
信頼性において半導体封止用途の要求に堪えるものはな
いのが実状である。2. Description of the Related Art Resin encapsulation is mainly used for encapsulating semiconductor devices in terms of productivity and cost. As this sealing resin, an epoxy resin composition excellent in electrical characteristics, cost, workability and the like is mainly used. However, since epoxy resins have insufficient flame retardancy, brominated epoxy resins are usually added to improve flame retardancy. In addition, antimony compounds that have a synergistic effect with brominated flame retardants (antimony trioxide,
Antimony pentoxide). In recent years, from the viewpoint of environmental protection, the use of brominated flame retardants suspected of producing dioxins during combustion and antimony, which has been pointed out as a potential carcinogen, has been increasingly required. To meet this demand, various alternative flame retardants have been studied. For example, metal hydrates such as aluminum hydroxide and magnesium hydroxide must be added in a large amount in order to exhibit sufficient flame retardancy, which causes deterioration of the curability, strength, etc. of the resin composition. . Various products have also been proposed for phosphate ester-based flame retardants (including those used in combination with nitrogen).
The reality is that there is no one that can meet the demands of semiconductor sealing applications in terms of reliability.
【0003】[0003]
【発明が解決しようとする課題】本発明は、臭素系難燃
剤、アンチモンを含有しない、成形性、信頼性、難燃性
に優れた半導体封止用エポキシ樹脂組成物及びそれを用
いた半導体装置を提供することを目的とする。SUMMARY OF THE INVENTION The present invention relates to an epoxy resin composition for semiconductor encapsulation which does not contain a bromine-based flame retardant or antimony, is excellent in moldability, reliability and flame retardancy, and a semiconductor device using the same. The purpose is to provide.
【0004】[0004]
【課題を解決するための手段】すなわち本発明は、エポ
キシ樹脂、フェノール硬化剤及び無機充填材を主成分と
する封止材において、難燃剤として赤燐を必須成分とし
て配合したことを特徴とする半導体封止用エポキシ樹脂
組成物及びそれを用いた半導体装置に関する。That is, the present invention is characterized in that in a sealing material mainly composed of an epoxy resin, a phenol curing agent and an inorganic filler, red phosphorus is blended as an essential component as a flame retardant. The present invention relates to an epoxy resin composition for semiconductor encapsulation and a semiconductor device using the same.
【0005】[0005]
【発明の実施の形態】本発明で用いられるエポキシ樹脂
としては、特に制限はないが、オルソクレゾールノボラ
ック型、ビフェニル型、ジシクロ型、等を単独又は併用
して用いることが出来るが、特にビフェニル型が好適で
ある。硬化剤としては、特に制限はないが、フェノール
ノボラック型、アラルキル型、テルペン型等を単独又は
併用して用いることができるが、特にアラルキル型が好
適である。硬化促進剤としては、特に制限はないが、テ
トラフェニルホスホニウム−テトラフェニルボレート、
トリフェニルホスフィン、トリフェニルホスフィンとベ
ンゾキノンの付加物、1,8−ジアザ−ビシクロ(5,
4,0)−ウンデセン−7,2−フェニル−4メチル−
イミダゾール、トリフェニルホスホニウム−トリフェニ
ルボラン等を単独又は併用して用いることができるが、
特にトリフェニルホスフィンとベンゾキノンの付加物が
好適である。カップリング剤は、エポキシシランとアル
キルシランとメルカプトシランを必須成分として用い
る。離型剤は、特に制限はないが、高級脂肪酸例えばカ
ルナバワックス等とポリエチレン系ワックスを単独又は
併用して用いることができるが、特に併用が好適であ
る。無機充填材は、80〜95wt%配合され、充填材
形状は50%以上球状であれば、特に制限はないが、溶
融シリカ、結晶シリカ、アルミナ等を単独及び併用して
用いることができる。特に球状溶融シリカが好適であ
る。充填材量が80重量%以下では難燃性が低下する
し、95重量%以上では流動性に問題が出易い。BEST MODE FOR CARRYING OUT THE INVENTION The epoxy resin used in the present invention is not particularly limited, and orthocresol novolak type, biphenyl type, dicyclo type and the like can be used alone or in combination. Is preferred. The curing agent is not particularly limited, and a phenol novolak type, an aralkyl type, a terpene type or the like can be used alone or in combination, and an aralkyl type is particularly preferable. Although there is no particular limitation on the curing accelerator, tetraphenylphosphonium-tetraphenylborate,
Triphenylphosphine, an adduct of triphenylphosphine and benzoquinone, 1,8-diaza-bicyclo (5,
(4,0) -undecene-7,2-phenyl-4methyl-
Imidazole, triphenylphosphonium-triphenylborane and the like can be used alone or in combination,
Particularly, an adduct of triphenylphosphine and benzoquinone is preferable. As the coupling agent, epoxysilane, alkylsilane and mercaptosilane are used as essential components. The release agent is not particularly limited, but a higher fatty acid such as carnauba wax and a polyethylene wax can be used alone or in combination, but the combination is particularly preferred. The inorganic filler is blended in an amount of 80 to 95% by weight and the shape of the filler is not particularly limited as long as it is 50% or more spherical, but fused silica, crystalline silica, alumina, and the like can be used alone or in combination. Particularly, spherical fused silica is preferred. When the amount of the filler is less than 80% by weight, the flame retardancy is lowered, and when the amount is more than 95% by weight, a problem tends to occur in the fluidity.
【0006】難燃剤としては赤燐を用いる。特に赤燐の
表面を樹脂コートして安定性を高めたものが好適に用い
られる。樹脂の種類、被覆の厚さについて特に限定はな
いが、樹脂としてはベース樹脂であるエポキシ樹脂との
親和性が高いものが好ましい。また、被覆の厚さは、赤
燐の平均粒径の1%以上が好ましい。1%よりも薄い場
合には、安定性に問題が出易い。樹脂組成物中の赤燐の
含有量としては、0.1〜0.5%が好ましい。0.1
%よりも少なければ難燃性が不足するし、0.5%より
も多ければ耐湿信頼性に問題が出易い。その他の添加物
としては、着色剤(カーボンブラック等)、改質剤(シ
リコーン、シリコーンゴム等)を用いることが出来る。
以上のような原材料を用いて、成形材料を作製する一般
的な方法としては、所定の配合量の原材料混合物をミキ
サー等によって充分混合した後、熱ロール、押出機等に
よって混練し、冷却、粉砕することによって成形材料を
得ることができる。Red phosphorus is used as a flame retardant. In particular, those obtained by coating the surface of red phosphorus with a resin to enhance the stability are preferably used. The type of the resin and the thickness of the coating are not particularly limited, but a resin having a high affinity with the epoxy resin as the base resin is preferable. The thickness of the coating is preferably 1% or more of the average particle diameter of red phosphorus. When the thickness is less than 1%, a problem tends to occur in stability. The content of red phosphorus in the resin composition is preferably from 0.1 to 0.5%. 0.1
When the amount is less than 0.5%, the flame retardancy is insufficient. When the amount is more than 0.5%, a problem is likely to occur in the moisture resistance reliability. As other additives, a colorant (eg, carbon black) and a modifier (eg, silicone, silicone rubber) can be used.
As a general method for producing a molding material using the above-described raw materials, a raw material mixture having a predetermined compounding amount is sufficiently mixed by a mixer or the like, and then kneaded by a hot roll, an extruder, etc., cooled, and pulverized. By doing so, a molding material can be obtained.
【0007】本発明で得られるエポキシ樹脂組成物を用
いて、電子部品を封止する方法としては、低圧トランス
ファ成形法が最も一般的であるが、インジェクション成
形、圧縮成形、注型等の方法によっても可能である。上
記した手段を用いて製造したエポキシ樹脂組成物は、臭
素系難燃剤、アンチモン化合物を含有しないため環境に
優しく、かつ成形性、信頼性に優れておりトランジス
タ、IC、LSI等の封止に好適に用いることができ
る。[0007] As a method for sealing electronic parts using the epoxy resin composition obtained by the present invention, a low pressure transfer molding method is the most common, but it is performed by a method such as injection molding, compression molding and casting. Is also possible. The epoxy resin composition manufactured using the above-described means is environmentally friendly because it does not contain a brominated flame retardant or an antimony compound, and has excellent moldability and reliability, and is suitable for sealing of transistors, ICs, LSIs, and the like. Can be used.
【0008】[0008]
【実施例】以下、本発明を実施例に基づいて詳細に説明
するが、本発明はこれに限定されるものではない。 実施例1〜3 比較例1〜5 まず、表1に示す各種の素材を用い、実施例1、2及び
比較例1〜5は、各素材を予備混合(ドライブレンド)
した後、二軸ロール(ロール表面温度約80℃)で10
分間混練し、冷却粉砕して製造した。The present invention will be described below in detail with reference to examples, but the present invention is not limited to these examples. Examples 1 to 3 Comparative Examples 1 to 5 First, using various materials shown in Table 1, in Examples 1 and 2 and Comparative Examples 1 to 5, the respective materials were premixed (dry blending).
After that, 10 rolls with a biaxial roll (roll surface temperature about 80 ° C)
The mixture was kneaded for 5 minutes, cooled and pulverized to produce the product.
【0009】[0009]
【表1】 *燐化学株式会社製[Table 1] * Rin Chemical Co., Ltd.
【0010】[0010]
【表2】 [Table 2]
【0011】この封止材を用い、トランスファー成形機
を用い、金型温度180℃、成形圧力70kgf/cm
2、硬化時間90秒の条件で各試験を行った。スパイラ
ルフローは、EMMI1−66により測定した。熱時硬
度はショア硬度計にて測定した。また、この封止材を用
いて、半導体素子をトランスファー成形機で同様の条件
で成形し、ポストキュア(175℃/5h)後、耐湿性
と半田耐熱性を評価した。耐湿性に用いた半導体装置
は、SOP−28ピンであり、85℃/85RH%72
時間吸湿+215℃/90秒(VPS)の前処理後、P
CT(121℃/2気圧)に放置してChip上配線の
有無を評価した。半田耐熱性に用いた半導体装置は、Q
FP80ピンの樹脂封止型半導体装置(外形寸法20×
14×2.0mm)であり、リードフレームは42アロ
イ材(加工なし)で、8×10mmのチップサイズを有
するものである。このようにして得られた樹脂封止型半
導体装置について、半田耐熱性を以下に示す方法で測定
した。125℃/24hベーキング後、85℃/85%
RHで所定の時間吸湿した後、240℃/10secの
処理を行った時の樹脂封止型半導体装置のクラック発生
率を求めた。上記の試験結果をまとめて表3に示す。Using this sealing material and a transfer molding machine, a mold temperature of 180 ° C. and a molding pressure of 70 kgf / cm.
2. Each test was conducted under the condition of a curing time of 90 seconds. Spiral flow was measured by EMMI1-66. Hot hardness was measured by a Shore hardness tester. Further, using this sealing material, a semiconductor element was molded by a transfer molding machine under the same conditions, and after post-curing (175 ° C./5 h), the moisture resistance and the solder heat resistance were evaluated. The semiconductor device used for the moisture resistance is an SOP-28 pin, which is 85 ° C./85 RH% 72.
Time moisture absorption + 215 ° C / 90 seconds (VPS)
It was left at CT (121 ° C./2 atm) to evaluate the presence or absence of wiring on the chip. The semiconductor device used for solder heat resistance is Q
FP80 pin resin-encapsulated semiconductor device (external dimensions 20 ×
14 × 2.0 mm), and the lead frame is made of 42 alloy material (no processing) and has a chip size of 8 × 10 mm. The solder heat resistance of the resin-encapsulated semiconductor device thus obtained was measured by the following method. 85 ° C / 85% after baking at 125 ° C / 24h
After absorbing moisture for a predetermined period of time at RH, the crack occurrence rate of the resin-encapsulated semiconductor device when a process at 240 ° C./10 sec was performed was determined. Table 3 summarizes the above test results.
【0012】[0012]
【表3】 *1 耐熱性:断線不良が50%に達するまでの時間。 *2 半田耐熱性:外観クラックが発生するまでの吸湿時間。[Table 3] * 1 Heat resistance: Time until the disconnection failure reaches 50%. * 2 Solder heat resistance: Moisture absorption time until appearance cracks occur.
【0013】[0013]
【発明の効果】エポキシ樹脂、フェノール硬化剤及び無
機充填材を主成分とする半導体素子封止用エポキシ樹脂
組成物において、難燃剤として赤燐を必須成分として配
合することにより、信頼性に優れ、且つ環境に対する影
響が極めて小さい成形材料を得ることができる。また、
この成形材料を用いて半導体素子を封止することで、信
頼性、難燃性に優れた半導体装置を得ることができる。EFFECT OF THE INVENTION In an epoxy resin composition for encapsulating a semiconductor element containing an epoxy resin, a phenol curing agent and an inorganic filler as main components, by blending red phosphorus as a flame retardant as an essential component, excellent reliability is obtained. In addition, it is possible to obtain a molding material having an extremely small effect on the environment. Also,
By sealing a semiconductor element using this molding material, a semiconductor device having excellent reliability and flame retardancy can be obtained.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI C08K 3/02 C08K 3/02 H01L 23/29 H01L 23/30 R 23/31 (72)発明者 山本 祐二 茨城県結城市大字鹿窪1772−1 日立化成 工業株式会社下館工場内 (72)発明者 遠藤 由則 茨城県結城市大字鹿窪1772−1 日立化成 工業株式会社下館工場内────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. 6 Identification symbol FI C08K 3/02 C08K 3/02 H01L 23/29 H01L 23/30 R 23/31 (72) Inventor Yuji Yamamoto Yuki-shi, Ibaraki Pref. 1772-1 Shikabo, Shimodate Plant, Hitachi Chemical Industry Co., Ltd. (72) Inventor, Yoshinori Endo, 172-1 Shikadate, Oki, Yuki City, Ibaraki Prefecture, Shimodate Plant, Hitachi Chemical Co., Ltd.
Claims (4)
化促進剤(D)赤燐系難燃剤(E)無機充填材を必須成
分とし、(E)成分の無機充填材の含有量が80〜95
重量%で、かつ(D)成分の赤燐系難燃剤の含有量が、
0.1〜0.5重量%であることを特徴とする半導体封
止用エポキシ樹脂組成物。1. An epoxy resin (B) a curing agent (C) a curing accelerator (D) a red phosphorus flame retardant (E) an inorganic filler as an essential component, and an inorganic filler (E). 80-95
% By weight, and the content of the (D) component red phosphorus-based flame retardant is
An epoxy resin composition for semiconductor encapsulation, which is 0.1 to 0.5% by weight.
エポキシ化合物である請求項1記載の半導体封止用エポ
キシ樹脂組成物。2. The epoxy resin composition according to claim 1, wherein the epoxy resin (A) is a biphenyl type epoxy compound.
フェノール樹脂である請求項1または2に記載の半導体
封止用エポキシ樹脂組成物。3. The epoxy resin composition for semiconductor encapsulation according to claim 1, wherein the curing agent (B) is a paraxylylene-modified phenol resin.
エポキシ樹脂組成物を用いて半導体素子を封止してなる
ことを特徴とする樹脂封止型半導体装置。4. A resin-encapsulated semiconductor device wherein a semiconductor element is encapsulated with the epoxy resin composition for encapsulating a semiconductor according to claim 1, 2 or 3.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9855097A JPH10287795A (en) | 1997-04-16 | 1997-04-16 | Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9855097A JPH10287795A (en) | 1997-04-16 | 1997-04-16 | Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH10287795A true JPH10287795A (en) | 1998-10-27 |
Family
ID=14222807
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9855097A Pending JPH10287795A (en) | 1997-04-16 | 1997-04-16 | Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH10287795A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001279057A (en) * | 1999-03-09 | 2001-10-10 | Hitachi Chem Co Ltd | Sealing material composition and electronic part device |
EP2123712A1 (en) | 2008-05-19 | 2009-11-25 | Evonik Degussa GmbH | Epoxy resin composition and electronic part |
US8715454B2 (en) | 2007-01-26 | 2014-05-06 | Hitachi Chemical Company, Ltd. | Sealing film and a semiconductor device using the same |
-
1997
- 1997-04-16 JP JP9855097A patent/JPH10287795A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001279057A (en) * | 1999-03-09 | 2001-10-10 | Hitachi Chem Co Ltd | Sealing material composition and electronic part device |
US8715454B2 (en) | 2007-01-26 | 2014-05-06 | Hitachi Chemical Company, Ltd. | Sealing film and a semiconductor device using the same |
US8771828B2 (en) | 2007-01-26 | 2014-07-08 | Hitachi Chemical Company, Ltd. | Sealing film and a semiconductor device using the same |
EP2123712A1 (en) | 2008-05-19 | 2009-11-25 | Evonik Degussa GmbH | Epoxy resin composition and electronic part |
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