JPH10287797A - Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith - Google Patents

Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith

Info

Publication number
JPH10287797A
JPH10287797A JP9855297A JP9855297A JPH10287797A JP H10287797 A JPH10287797 A JP H10287797A JP 9855297 A JP9855297 A JP 9855297A JP 9855297 A JP9855297 A JP 9855297A JP H10287797 A JPH10287797 A JP H10287797A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
semiconductor
inorganic filler
desirably
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9855297A
Other languages
Japanese (ja)
Inventor
Masanobu Fujii
昌信 藤井
Hiroyuki Saito
裕之 斎藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP9855297A priority Critical patent/JPH10287797A/en
Publication of JPH10287797A publication Critical patent/JPH10287797A/en
Pending legal-status Critical Current

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a composition excellent in moldability, reliability and flame retardancy by using an epoxy resin, a phenolic curing agent, molybdenum oxide and an inorganic filler as the essential components and specifying the amount of the inorganic filler used. SOLUTION: The inorganic filler is used in an amount of 85-95 wt.%. The epoxy resin is particularly desirably a biphenyl-derived one. The curing agent is particularly desirably of an aralkyl type. The cure accelerator use is particularly desirably an adduct of triphenylphosphine with benzoquinone. The inorganic filler is particularly desirably spherical fused silica. The molybdenum oxide is desirably molybdenum trioxide. The molybdenum oxide content of the composition is desirably 0.1-10.0%. This composition is freed from a bromine-containing flame retardant and an antimony compound, so that it is friendly to the environment and can be desirably used for sealing transistors, ICs, LSIs, etc.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、難燃性、成形性、
信頼性に優れた封止材及びそれを用いた半導体装置に関
する。
The present invention relates to flame retardancy, moldability,
The present invention relates to a sealing material excellent in reliability and a semiconductor device using the same.

【0002】[0002]

【従来の技術】半導体素子の封止は、生産性、コスト等
の面から樹脂封止が主流となっている。この封止用樹脂
は、電気的特性、コスト、作業性等に優れるエポキシ樹
脂組成物が主に用いられている。しかし、エポキシ樹脂
は難燃性が不充分なので通常、臭素化エポキシ樹脂を添
加して難燃性を向上させている。また、臭素系難燃剤と
相乗効果のあるアンチモン化合物(三酸化アンチモン、
五酸化アンチモン等)を併用している。近年、環境保護
の観点から、燃焼時にダイオキシンの生成が疑われる臭
素系難燃剤、及び発癌性の可能性が指摘されているアン
チモンに対する使用規制の要求が強まりつつある。この
要求に対し、種々の代替難燃剤が検討されてきた。例え
ば、水酸化アルミニウム、水酸化マグネシウム等の金属
水和物は充分な難燃性を発揮させるためには多量に添加
せねばならず、樹脂組成物の硬化性、強度等の劣化を招
いてしまう。また、燐酸エステル系難燃剤(窒素との併
用も含む)も種々の製品が提案されているが、成形性、
信頼性において半導体封止用途の要求に堪えるものはな
いのが実状である。
2. Description of the Related Art Resin encapsulation is mainly used for encapsulating semiconductor devices in terms of productivity and cost. As this sealing resin, an epoxy resin composition excellent in electrical characteristics, cost, workability and the like is mainly used. However, since epoxy resins have insufficient flame retardancy, brominated epoxy resins are usually added to improve flame retardancy. In addition, antimony compounds that have a synergistic effect with brominated flame retardants (antimony trioxide,
Antimony pentoxide). In recent years, from the viewpoint of environmental protection, the use of brominated flame retardants suspected of producing dioxins during combustion and antimony, which has been pointed out as a potential carcinogen, has been increasingly required. To meet this demand, various alternative flame retardants have been studied. For example, metal hydrates such as aluminum hydroxide and magnesium hydroxide must be added in a large amount in order to exhibit sufficient flame retardancy, which causes deterioration of the curability, strength, etc. of the resin composition. . Various products have also been proposed for phosphate ester-based flame retardants (including those used in combination with nitrogen).
The reality is that there is no one that can meet the demands of semiconductor sealing applications in terms of reliability.

【0003】[0003]

【発明が解決しようとする課題】本発明は、臭素系難燃
剤、アンチモン化合物を含有しない、成形性、信頼性、
難燃性に優れた半導体封止用エポキシ樹脂組成物及びそ
れを用いた半導体装置を提供することを目的とする。
DISCLOSURE OF THE INVENTION The present invention relates to a bromine-based flame retardant and an antimony compound-free moldability, reliability,
An object of the present invention is to provide an epoxy resin composition for semiconductor encapsulation excellent in flame retardancy and a semiconductor device using the same.

【0004】[0004]

【課題を解決するための手段】すなわち本発明は、エポ
キシ樹脂、フェノール硬化剤及び無機充填材を主成分と
する封止材において、難燃剤として酸化モリブデンを必
須成分として配合してなる半導体封止用エポキシ樹脂組
成物及びそれを用いた半導体装置に関する。これまでに
も酸化モリブデンは、発煙抑制剤として知られている
(特開昭59−182546、特表平7−506623
号公報)。しかし、これらはその他の難燃剤(特に臭素
系難燃剤)の助剤あるいは発煙抑制剤としてであり、酸
化モリブデン単独でUL94V−0を達成した例は報告
されていない。筆者らは鋭意検討を重ねた結果、驚くべ
きことに上記組成にて製造されたエポキシ樹脂組成物
は、難燃剤として少量の酸化モリブデンを添加するだけ
で、UL94V−0を達成することを発見した。以下、
詳細について説明する。
That is, the present invention is directed to a semiconductor encapsulating material containing a molybdenum oxide as an essential component as a flame retardant in a sealing material containing an epoxy resin, a phenol curing agent and an inorganic filler as main components. The present invention relates to an epoxy resin composition for use and a semiconductor device using the same. Molybdenum oxide has been known as a smoke suppressant (JP-A-59-182546, JP-T-7-506623).
No.). However, these are auxiliaries for other flame retardants (especially bromine-based flame retardants) or as smoke suppressants, and no examples have been reported in which molybdenum oxide alone achieves UL94V-0. As a result of intensive studies, the present inventors have surprisingly discovered that the epoxy resin composition produced with the above composition achieves UL94V-0 only by adding a small amount of molybdenum oxide as a flame retardant. . Less than,
Details will be described.

【0005】[0005]

【発明の実施の形態】本発明で用いられるエポキシ樹脂
としては、特に制限はないが、オルソクレゾールノボラ
ック型、ビフェニル型、ジシクロ型、等を単独又は併用
して用いることができるが、特にビフェニル型が好適で
ある。硬化剤としては、特に制限はないが、フェノール
ノボラック型、アラルキル型、テルペン型等を単独又は
併用して用いることができるが、特にアラルキル型が好
適である。硬化促進剤としては、特に制限はないが、テ
トラフェニルホスホニウム−テトラフェニルボレート、
トリフェニルホスフィン、トリフェニルホスフィンとベ
ンゾキノンの付加物、1,8−ジアザ−ビシクロ(5,
4,0)−ウンデセン−7,2−フェニル−4メチル−
イミダゾール、トリフェニルホスホニウム−トリフェニ
ルボラン等を単独又は併用して用いることができるが、
特にトリフェニルホスフィンとベンゾキノンの付加物が
好適である。カップリング剤は、特に制限はないが、エ
ポキシシランが好適に用いられる。離型剤は、特に制限
はないが、高級脂肪酸例えばカルナバワックス等とポリ
エチレン系ワックスを単独又は併用して用いることがで
きるが、特に併用が好適である。
BEST MODE FOR CARRYING OUT THE INVENTION The epoxy resin used in the present invention is not particularly limited. Orthocresol novolak type, biphenyl type, dicyclo type and the like can be used alone or in combination. Is preferred. The curing agent is not particularly limited, and a phenol novolak type, an aralkyl type, a terpene type or the like can be used alone or in combination, and an aralkyl type is particularly preferable. Although there is no particular limitation on the curing accelerator, tetraphenylphosphonium-tetraphenylborate,
Triphenylphosphine, an adduct of triphenylphosphine and benzoquinone, 1,8-diaza-bicyclo (5,
(4,0) -undecene-7,2-phenyl-4methyl-
Imidazole, triphenylphosphonium-triphenylborane and the like can be used alone or in combination,
Particularly, an adduct of triphenylphosphine and benzoquinone is preferable. The coupling agent is not particularly limited, but epoxy silane is preferably used. The release agent is not particularly limited, but a higher fatty acid such as carnauba wax and a polyethylene wax can be used alone or in combination, but the combination is particularly preferred.

【0006】無機充填材は、85〜95wt%配合さ
れ、充填材形状は50%以上球状であれば特に制限はな
いが、溶融シリカ、結晶シリカ、アルミナ等を単独及び
併用して用いることができる。特に球状溶融シリカが好
適である。充填材量が85重量%以下では難燃性が低下
するし、95重量%以上では流動性に問題が出易い。特
に89〜95重量%の範囲が好適である。難燃剤として
は酸化モリブデンを用いる。好ましくは三酸化モリブデ
ンを用いる。樹脂組成物中の酸化モリブデンの含有量と
しては、0.1〜10.0%が好ましい。0.1%より
も少なければ難燃性が不足するし、10.0%よりも多
ければ成形性に問題が出易い。特に0.4〜5.0%の
範囲が好適に用いられる。その他の添加物としては、着
色剤(カーボンブラック等)、改質剤(シリコーン、シ
リコーンゴム等)、イオントラッパー(ハイドロタルサ
イト、アンチモン−ビスマス等)を用いることができ
る。以上のような原材料を用いて、成形材料を作製する
一般的な方法としては、所定の配合量の原材料混合物を
ミキサー等によって充分混合した後、熱ロール、押出機
等によって混練し、冷却、粉砕することによって成形材
料を得ることが出来る。本発明で得られるエポキシ樹脂
組成物を用いて、電子部品を封止する方法としては、低
圧トランスファ成形法が最も一般的であるが、インジェ
クション成形、圧縮成形、注型等の方法によっても可能
である。上記した手段を用いて製造したエポキシ樹脂組
成物は、臭素系難燃剤、アンチモン化合物を含有しない
ため環境に優しく、かつ成形性、信頼性に優れておりト
ランジスタ、IC、LSI等の封止に好適に用いること
ができる。
The inorganic filler is blended in an amount of 85 to 95% by weight, and the shape of the filler is not particularly limited as long as it is 50% or more spherical, but fused silica, crystalline silica, alumina and the like can be used alone or in combination. . Particularly, spherical fused silica is preferred. When the amount of the filler is less than 85% by weight, the flame retardancy is lowered, and when the amount is more than 95% by weight, a problem tends to occur in the fluidity. Particularly, the range of 89 to 95% by weight is suitable. Molybdenum oxide is used as the flame retardant. Preferably, molybdenum trioxide is used. The content of molybdenum oxide in the resin composition is preferably from 0.1 to 10.0%. If it is less than 0.1%, the flame retardancy will be insufficient, and if it is more than 10.0%, there will be a problem in formability. In particular, the range of 0.4 to 5.0% is suitably used. As other additives, colorants (such as carbon black), modifiers (such as silicone and silicone rubber), and ion trappers (such as hydrotalcite and antimony-bismuth) can be used. As a general method for producing a molding material using the above-described raw materials, a raw material mixture having a predetermined compounding amount is sufficiently mixed by a mixer or the like, and then kneaded by a hot roll, an extruder, and the like, cooled, and crushed. By doing so, a molding material can be obtained. As a method for sealing an electronic component using the epoxy resin composition obtained in the present invention, a low-pressure transfer molding method is the most common, but injection molding, compression molding, casting, and other methods are also possible. is there. The epoxy resin composition manufactured using the above-described means is environmentally friendly because it does not contain a brominated flame retardant or an antimony compound, and has excellent moldability and reliability, and is suitable for sealing of transistors, ICs, LSIs, and the like. Can be used.

【0007】[0007]

【実施例】以下、本発明を実施例に基づいて詳細に説明
するが、本発明はこれに限定されるものではない。 実施例1、2 比較例1〜5 まず、表1に示す各種の素材を用い、実施例1、2及び
比較例1〜5は、各素材を予備混合(ドライブレンド)
した後、二軸ロール(ロール表面温度約80℃)で10
分間混練し、冷却粉砕して製造した。
The present invention will be described below in detail with reference to examples, but the present invention is not limited to these examples. Examples 1 and 2 Comparative Examples 1 to 5 First, using various materials shown in Table 1, in Examples 1 and 2 and Comparative Examples 1 to 5, each material was premixed (dry blending).
After that, 10 rolls with a biaxial roll (roll surface temperature about 80 ° C)
The mixture was kneaded for 5 minutes, cooled and pulverized to produce the product.

【0008】[0008]

【表1】 [Table 1]

【0009】[0009]

【表2】 [Table 2]

【0010】この封止材を用い、トランスファー成形機
を用い、金型温度180℃、成形圧力70kgf/cm
2 、硬化時間90秒の条件で各試験を行った。スパイラ
ルフローは、EMMI1−66により測定した。熱時硬
度はショア硬度計にて測定した。また、この封止材を用
いて、半導体素子をトランスファー成形機で同様の条件
で成形し、ポストキュア(175℃/5h)後、耐湿性
と半田耐熱性を評価した。耐湿性に用いた半導体装置
は、SOP−28ピンであり、85℃/85RH%72
時間吸湿+215℃/90秒(VPS)の前処理後、P
CT(121℃/2気圧)に放置してChip上配線の
有無を評価した。半田耐熱性に用いた半導体装置は、Q
FP80ピンの樹脂封止型半導体装置(外形寸法20×
14×2.0mm)であり、リードフレームは42アロ
イ材(加工なし)で、8×10mmのチップサイズを有
するものである。このようにして得られた樹脂封止型半
導体装置について、半田耐熱性を以下に示す方法で測定
した。125℃/24hベーキング後、85℃/85%
RHで所定の時間吸湿した後、240℃/10secの
処理を行った時の樹脂封止型半導体装置のクラック発生
率を求めた。上記の試験結果をまとめて表3に示す。
Using this sealing material, using a transfer molding machine, a mold temperature of 180 ° C. and a molding pressure of 70 kgf / cm.
2. Each test was conducted under the condition of a curing time of 90 seconds. Spiral flow was measured by EMMI1-66. Hot hardness was measured by a Shore hardness tester. Further, using this sealing material, a semiconductor element was molded by a transfer molding machine under the same conditions, and after post-curing (175 ° C./5 h), the moisture resistance and the solder heat resistance were evaluated. The semiconductor device used for the moisture resistance is an SOP-28 pin, which is 85 ° C./85 RH% 72.
Time moisture absorption + 215 ° C / 90 seconds (VPS)
It was left at CT (121 ° C./2 atm) to evaluate the presence or absence of wiring on the chip. The semiconductor device used for solder heat resistance is Q
FP80 pin resin-encapsulated semiconductor device (external dimensions 20 ×
14 × 2.0 mm), and the lead frame is made of 42 alloy material (no processing) and has a chip size of 8 × 10 mm. The solder heat resistance of the resin-encapsulated semiconductor device thus obtained was measured by the following method. 85 ° C / 85% after baking at 125 ° C / 24h
After absorbing moisture for a predetermined period of time at RH, the crack occurrence rate of the resin-encapsulated semiconductor device when a process at 240 ° C./10 sec was performed was determined. Table 3 summarizes the above test results.

【0011】[0011]

【表3】 *1 耐熱性:断線不良率が50%に達するまでの時
間。 *2 半田耐熱性:外観クラックが発生するまでの吸湿
時間。
[Table 3] * 1 Heat resistance: Time required for the disconnection failure rate to reach 50%. * 2 Solder heat resistance: Moisture absorption time until appearance cracks occur.

【0012】[0012]

【発明の効果】エポキシ樹脂、フェノール硬化剤及び無
機充填材を主成分とする半導体素子封止用エポキシ樹脂
組成物において、難燃剤として酸化モリブデンを必須成
分として配合することにより、臭素系難燃剤、アンチモ
ン化合物を含有することなく難燃性UL94V−0を満
足し、信頼性、成形性に優れ、且つ環境に対する影響が
極めて小さい成形材料を得ることができる。また、この
成形材料を用いて半導体素子を封止することで、信頼
性、難燃性に優れた半導体装置を得ることができる。
According to the epoxy resin composition for encapsulating a semiconductor element containing an epoxy resin, a phenol curing agent and an inorganic filler as main components, a bromine-based flame retardant can be obtained by blending molybdenum oxide as an essential component as a flame retardant. It is possible to obtain a molding material which satisfies the flame retardancy UL94V-0 without containing an antimony compound, has excellent reliability and moldability, and has an extremely small influence on the environment. By sealing a semiconductor element using this molding material, a semiconductor device having excellent reliability and flame retardancy can be obtained.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI H01L 23/29 H01L 23/30 R 23/31 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification code FI H01L 23/29 H01L 23/30 R 23/31

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】(A)エポキシ樹脂(B)硬化剤(C)酸
化モリブデン(D)無機充填材を必須成分とし、(D)
成分の無機充填材の含有量が樹脂組成物に対して、85
〜95重量%であることを特徴とする半導体封止用エポ
キシ樹脂組成物。
(1) an epoxy resin (B) a curing agent (C) molybdenum oxide (D) an inorganic filler as an essential component;
The content of the inorganic filler component is 85 to the resin composition.
An epoxy resin composition for encapsulating a semiconductor, wherein the content is about 95% by weight.
【請求項2】(C)成分の酸化モリブデンの含有量が樹
脂組成物全体に対して、0.1〜10.0重量%である
請求項1記載の半導体封止用エポキシ樹脂組成物。
2. The epoxy resin composition for semiconductor encapsulation according to claim 1, wherein the content of molybdenum oxide as the component (C) is 0.1 to 10.0% by weight based on the whole resin composition.
【請求項3】(A)成分のエポキシ樹脂がビフェニル型
エポキシ化合物である請求項1又は2記載の半導体封止
用エポキシ樹脂組成物。
3. The epoxy resin composition for semiconductor encapsulation according to claim 1, wherein the epoxy resin as the component (A) is a biphenyl type epoxy compound.
【請求項4】(B)成分の硬化剤がパラキシリレン変性
フェノール樹脂である請求項1、2又は3記載の半導体
封止用エポキシ樹脂組成物。
4. The epoxy resin composition for semiconductor encapsulation according to claim 1, wherein the curing agent as the component (B) is a paraxylylene-modified phenol resin.
【請求項5】(D)成分の無機充填材の含有量が89〜
95重量%である請求項1、2、3又は4記載の半導体
封止用エポキシ樹脂組成物。
5. The content of the inorganic filler of component (D) is 89 to 90.
The epoxy resin composition for semiconductor encapsulation according to claim 1, wherein the content is 95% by weight.
【請求項6】請求項1、2、3、4又は5のいずれかに
記載の半導体封止用エポキシ樹脂組成物を用いて、半導
体素子を封止してなることを特徴とする樹脂封止型半導
体装置。
6. A resin encapsulation obtained by encapsulating a semiconductor element using the epoxy resin composition for encapsulating a semiconductor according to any one of claims 1, 2, 3, 4 and 5. Type semiconductor device.
JP9855297A 1997-04-16 1997-04-16 Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith Pending JPH10287797A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9855297A JPH10287797A (en) 1997-04-16 1997-04-16 Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9855297A JPH10287797A (en) 1997-04-16 1997-04-16 Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith

Publications (1)

Publication Number Publication Date
JPH10287797A true JPH10287797A (en) 1998-10-27

Family

ID=14222861

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9855297A Pending JPH10287797A (en) 1997-04-16 1997-04-16 Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith

Country Status (1)

Country Link
JP (1) JPH10287797A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7095125B2 (en) 1999-04-26 2006-08-22 Shin-Etsu Chemical Co., Ltd. Semiconductor encapsulating epoxy resin composition and semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7095125B2 (en) 1999-04-26 2006-08-22 Shin-Etsu Chemical Co., Ltd. Semiconductor encapsulating epoxy resin composition and semiconductor device

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