JPH10233370A5 - - Google Patents
Info
- Publication number
- JPH10233370A5 JPH10233370A5 JP1997052307A JP5230797A JPH10233370A5 JP H10233370 A5 JPH10233370 A5 JP H10233370A5 JP 1997052307 A JP1997052307 A JP 1997052307A JP 5230797 A JP5230797 A JP 5230797A JP H10233370 A5 JPH10233370 A5 JP H10233370A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- reflector
- processed
- required number
- lamp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5230797A JPH10233370A (ja) | 1997-02-20 | 1997-02-20 | 半導体基板の熱処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5230797A JPH10233370A (ja) | 1997-02-20 | 1997-02-20 | 半導体基板の熱処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10233370A JPH10233370A (ja) | 1998-09-02 |
| JPH10233370A5 true JPH10233370A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 2004-10-07 |
Family
ID=12911139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5230797A Pending JPH10233370A (ja) | 1997-02-20 | 1997-02-20 | 半導体基板の熱処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10233370A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6307184B1 (en) * | 1999-07-12 | 2001-10-23 | Fsi International, Inc. | Thermal processing chamber for heating and cooling wafer-like objects |
| US6838115B2 (en) | 2000-07-12 | 2005-01-04 | Fsi International, Inc. | Thermal processing system and methods for forming low-k dielectric films suitable for incorporation into microelectronic devices |
| WO2004025697A2 (en) | 2002-09-10 | 2004-03-25 | Fsi International, Inc. | Thermal process station with heated lid |
| KR100377011B1 (ko) * | 2002-11-01 | 2003-03-19 | 코닉 시스템 주식회사 | 급속 열처리 장치의 히터 모듈 |
| JP4618705B2 (ja) | 2003-09-18 | 2011-01-26 | 大日本スクリーン製造株式会社 | 熱処理装置 |
| JP5063995B2 (ja) | 2006-11-22 | 2012-10-31 | 大日本スクリーン製造株式会社 | 熱処理装置 |
| JP4879003B2 (ja) * | 2006-12-05 | 2012-02-15 | 大日本スクリーン製造株式会社 | 熱処理装置 |
| JP5169106B2 (ja) * | 2007-09-26 | 2013-03-27 | ウシオ電機株式会社 | 光照射式加熱処理装置 |
| JP5362251B2 (ja) * | 2008-04-16 | 2013-12-11 | 大日本スクリーン製造株式会社 | 熱処理装置 |
| US8298629B2 (en) | 2009-02-25 | 2012-10-30 | Crystal Solar Incorporated | High throughput multi-wafer epitaxial reactor |
| US8673081B2 (en) | 2009-02-25 | 2014-03-18 | Crystal Solar, Inc. | High throughput multi-wafer epitaxial reactor |
| US9255346B2 (en) | 2011-05-27 | 2016-02-09 | Crystal Solar, Incorporated | Silicon wafers by epitaxial deposition |
| JP6687436B2 (ja) * | 2015-04-30 | 2020-04-22 | 芝浦メカトロニクス株式会社 | 基板処理装置及び基板処理方法 |
| KR102161165B1 (ko) * | 2018-05-18 | 2020-09-29 | 에이피시스템 주식회사 | 히터 블록, 열 처리 장치 및 방법 |
| KR102102202B1 (ko) * | 2018-11-07 | 2020-04-21 | 세메스 주식회사 | 기판 처리 장치 및 시스템 |
| CN116698197B (zh) * | 2023-08-04 | 2024-05-03 | 盛吉盛半导体科技(北京)有限公司 | 一种具有应用于集成电路设备的反射部件的测温装置 |
-
1997
- 1997-02-20 JP JP5230797A patent/JPH10233370A/ja active Pending
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