JPH10232185A5 - - Google Patents

Info

Publication number
JPH10232185A5
JPH10232185A5 JP1997350375A JP35037597A JPH10232185A5 JP H10232185 A5 JPH10232185 A5 JP H10232185A5 JP 1997350375 A JP1997350375 A JP 1997350375A JP 35037597 A JP35037597 A JP 35037597A JP H10232185 A5 JPH10232185 A5 JP H10232185A5
Authority
JP
Japan
Prior art keywords
line
aberration
pattern
optical system
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997350375A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10232185A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9350375A priority Critical patent/JPH10232185A/ja
Priority claimed from JP9350375A external-priority patent/JPH10232185A/ja
Publication of JPH10232185A publication Critical patent/JPH10232185A/ja
Publication of JPH10232185A5 publication Critical patent/JPH10232185A5/ja
Pending legal-status Critical Current

Links

JP9350375A 1996-12-19 1997-12-19 投影光学系の収差測定方法 Pending JPH10232185A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9350375A JPH10232185A (ja) 1996-12-19 1997-12-19 投影光学系の収差測定方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP33970496 1996-12-19
JP8-339704 1996-12-19
JP9350375A JPH10232185A (ja) 1996-12-19 1997-12-19 投影光学系の収差測定方法

Publications (2)

Publication Number Publication Date
JPH10232185A JPH10232185A (ja) 1998-09-02
JPH10232185A5 true JPH10232185A5 (enrdf_load_stackoverflow) 2005-09-08

Family

ID=26576502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9350375A Pending JPH10232185A (ja) 1996-12-19 1997-12-19 投影光学系の収差測定方法

Country Status (1)

Country Link
JP (1) JPH10232185A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000180302A (ja) 1998-12-15 2000-06-30 Nec Corp コマ収差自動計測用マークと計測方法
JP4497569B2 (ja) * 1998-12-17 2010-07-07 キヤノン株式会社 投影光学系のコマ収差の評価方法
JP3267272B2 (ja) * 1999-01-26 2002-03-18 日本電気株式会社 投影光学系の収差量の測定方法
JP3339051B2 (ja) 1999-04-19 2002-10-28 日本電気株式会社 投影光学系の球面収差測定方法
JP2003077814A (ja) * 2001-09-05 2003-03-14 Nikon Corp 荷電粒子線露光装置の結像性能の計測方法及びその計測装置、荷電粒子線露光装置
EP2131245A3 (en) * 2008-06-02 2012-08-01 ASML Netherlands BV Lithographic apparatus and its focus determination method

Similar Documents

Publication Publication Date Title
JP6532479B2 (ja) スキャタロメトリ計測法を用いた焦点測定
TW357262B (en) Method for the measurement of aberration of optical projection system, a mask and a exposure device for optical project system
JP3371852B2 (ja) レチクル
TW200839433A (en) DUV scanner linewidth control by mask error factor compensation
WO2001050523A3 (en) Method to measure alignment using latent image grating structures
JP2005517282A5 (enrdf_load_stackoverflow)
JPH1145846A5 (enrdf_load_stackoverflow)
GB2287328A (en) Method for fabricating a photomask
JPH10232185A5 (enrdf_load_stackoverflow)
JPH1012544A5 (enrdf_load_stackoverflow)
JPS6018983B2 (ja) 露光方法
JPH09320945A5 (enrdf_load_stackoverflow)
US11520225B2 (en) Mask and method for correcting mask patterns
JP3442007B2 (ja) ステッパレンズの収差測定パターンおよびステッパレンズの収差特性評価方法
JP2797362B2 (ja) 半導体装置のパターン形成方法
US5552251A (en) Reticle and method for measuring rotation error of reticle by use of the reticle
JPH11258776A (ja) 重ね合わせ測定パターン、フォトマスク、重ね合わせ測定方法及び重ね合わせ測定装置
KR0144082B1 (ko) 레티클 및 그 레티클을 사용한 가림막 세팅 방법
JPH09330862A5 (enrdf_load_stackoverflow)
JPS58193545A (ja) ホトマスク
JPS6311642B2 (enrdf_load_stackoverflow)
JP2995061B2 (ja) フォトマスク
JP2004170947A (ja) 露光マスク、フォーカス測定方法、露光装置管理方法及び電子デバイスの製造方法
JP3961707B2 (ja) 露光方法
US20240096813A1 (en) Alignment-overlay mark and method using the same