JPH10232185A - 投影光学系の収差測定方法 - Google Patents

投影光学系の収差測定方法

Info

Publication number
JPH10232185A
JPH10232185A JP9350375A JP35037597A JPH10232185A JP H10232185 A JPH10232185 A JP H10232185A JP 9350375 A JP9350375 A JP 9350375A JP 35037597 A JP35037597 A JP 35037597A JP H10232185 A JPH10232185 A JP H10232185A
Authority
JP
Japan
Prior art keywords
optical system
line
aberration
projection optical
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9350375A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10232185A5 (enrdf_load_stackoverflow
Inventor
Koji Kaise
浩二 貝瀬
Toshio Tsukagoshi
敏雄 塚越
Tsunekimi Hayashi
恒仁 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9350375A priority Critical patent/JPH10232185A/ja
Publication of JPH10232185A publication Critical patent/JPH10232185A/ja
Publication of JPH10232185A5 publication Critical patent/JPH10232185A5/ja
Pending legal-status Critical Current

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Landscapes

  • Testing Of Optical Devices Or Fibers (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9350375A 1996-12-19 1997-12-19 投影光学系の収差測定方法 Pending JPH10232185A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9350375A JPH10232185A (ja) 1996-12-19 1997-12-19 投影光学系の収差測定方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP33970496 1996-12-19
JP8-339704 1996-12-19
JP9350375A JPH10232185A (ja) 1996-12-19 1997-12-19 投影光学系の収差測定方法

Publications (2)

Publication Number Publication Date
JPH10232185A true JPH10232185A (ja) 1998-09-02
JPH10232185A5 JPH10232185A5 (enrdf_load_stackoverflow) 2005-09-08

Family

ID=26576502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9350375A Pending JPH10232185A (ja) 1996-12-19 1997-12-19 投影光学系の収差測定方法

Country Status (1)

Country Link
JP (1) JPH10232185A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000181050A (ja) * 1998-12-17 2000-06-30 Canon Inc レチクル、及び露光方法、及び半導体露光装置
US6160623A (en) * 1999-01-26 2000-12-12 Nec Corporation Method for measuring an aberration of a projection optical system
US6310684B1 (en) 1999-04-19 2001-10-30 Nec Corporation Method of measuring spherical aberration in projection system
US6323945B1 (en) 1998-12-15 2001-11-27 Nec Corporation Coma aberration automatic measuring mark and measuring method
JP2003077814A (ja) * 2001-09-05 2003-03-14 Nikon Corp 荷電粒子線露光装置の結像性能の計測方法及びその計測装置、荷電粒子線露光装置
JP2009302532A (ja) * 2008-06-02 2009-12-24 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6323945B1 (en) 1998-12-15 2001-11-27 Nec Corporation Coma aberration automatic measuring mark and measuring method
JP2000181050A (ja) * 1998-12-17 2000-06-30 Canon Inc レチクル、及び露光方法、及び半導体露光装置
US6160623A (en) * 1999-01-26 2000-12-12 Nec Corporation Method for measuring an aberration of a projection optical system
US6310684B1 (en) 1999-04-19 2001-10-30 Nec Corporation Method of measuring spherical aberration in projection system
JP2003077814A (ja) * 2001-09-05 2003-03-14 Nikon Corp 荷電粒子線露光装置の結像性能の計測方法及びその計測装置、荷電粒子線露光装置
JP2009302532A (ja) * 2008-06-02 2009-12-24 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法

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