JPH10209008A - 荷電ビーム露光方法およびマスク - Google Patents

荷電ビーム露光方法およびマスク

Info

Publication number
JPH10209008A
JPH10209008A JP844397A JP844397A JPH10209008A JP H10209008 A JPH10209008 A JP H10209008A JP 844397 A JP844397 A JP 844397A JP 844397 A JP844397 A JP 844397A JP H10209008 A JPH10209008 A JP H10209008A
Authority
JP
Japan
Prior art keywords
mask
pattern
distortion
area
small
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP844397A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10209008A5 (enExample
Inventor
Noriyuki Hirayanagi
徳行 平柳
Teruaki Okino
輝昭 沖野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP844397A priority Critical patent/JPH10209008A/ja
Publication of JPH10209008A publication Critical patent/JPH10209008A/ja
Publication of JPH10209008A5 publication Critical patent/JPH10209008A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)
JP844397A 1997-01-21 1997-01-21 荷電ビーム露光方法およびマスク Pending JPH10209008A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP844397A JPH10209008A (ja) 1997-01-21 1997-01-21 荷電ビーム露光方法およびマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP844397A JPH10209008A (ja) 1997-01-21 1997-01-21 荷電ビーム露光方法およびマスク

Publications (2)

Publication Number Publication Date
JPH10209008A true JPH10209008A (ja) 1998-08-07
JPH10209008A5 JPH10209008A5 (enExample) 2004-12-24

Family

ID=11693278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP844397A Pending JPH10209008A (ja) 1997-01-21 1997-01-21 荷電ビーム露光方法およびマスク

Country Status (1)

Country Link
JP (1) JPH10209008A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002246298A (ja) * 2001-02-20 2002-08-30 Nikon Corp 荷電粒子線露光装置の結像性能の評価方法及び荷電粒子線露光装置
JP2005123337A (ja) * 2003-10-15 2005-05-12 Dainippon Printing Co Ltd 荷電粒子線用転写マスクとその製造方法
JP2006516065A (ja) * 2002-08-01 2006-06-15 モレキュラー・インプリンツ・インコーポレーテッド インプリント・リソグラフィの散乱計測アラインメント
JP2007078802A (ja) * 2005-09-12 2007-03-29 Toppan Printing Co Ltd フォトマスク及びその歪み検出装置及び半導体集積回路の製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002246298A (ja) * 2001-02-20 2002-08-30 Nikon Corp 荷電粒子線露光装置の結像性能の評価方法及び荷電粒子線露光装置
JP2006516065A (ja) * 2002-08-01 2006-06-15 モレキュラー・インプリンツ・インコーポレーテッド インプリント・リソグラフィの散乱計測アラインメント
JP2005123337A (ja) * 2003-10-15 2005-05-12 Dainippon Printing Co Ltd 荷電粒子線用転写マスクとその製造方法
JP2007078802A (ja) * 2005-09-12 2007-03-29 Toppan Printing Co Ltd フォトマスク及びその歪み検出装置及び半導体集積回路の製造方法

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