JPH10199805A5 - - Google Patents

Info

Publication number
JPH10199805A5
JPH10199805A5 JP1996358955A JP35895596A JPH10199805A5 JP H10199805 A5 JPH10199805 A5 JP H10199805A5 JP 1996358955 A JP1996358955 A JP 1996358955A JP 35895596 A JP35895596 A JP 35895596A JP H10199805 A5 JPH10199805 A5 JP H10199805A5
Authority
JP
Japan
Prior art keywords
metal element
crystalline silicon
silicon film
semiconductor device
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996358955A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10199805A (ja
JP4055831B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP35895596A priority Critical patent/JP4055831B2/ja
Priority claimed from JP35895596A external-priority patent/JP4055831B2/ja
Priority to US08/998,964 priority patent/US6011275A/en
Publication of JPH10199805A publication Critical patent/JPH10199805A/ja
Priority to US09/455,991 priority patent/US7026193B1/en
Publication of JPH10199805A5 publication Critical patent/JPH10199805A5/ja
Application granted granted Critical
Publication of JP4055831B2 publication Critical patent/JP4055831B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP35895596A 1996-12-30 1996-12-30 半導体装置の作製方法 Expired - Fee Related JP4055831B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP35895596A JP4055831B2 (ja) 1996-12-30 1996-12-30 半導体装置の作製方法
US08/998,964 US6011275A (en) 1996-12-30 1997-12-29 Semiconductor device and method of manufacturing the same
US09/455,991 US7026193B1 (en) 1996-12-30 1999-12-06 Method of manufacturing a semiconductor device having TFTs with uniform characteristics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35895596A JP4055831B2 (ja) 1996-12-30 1996-12-30 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JPH10199805A JPH10199805A (ja) 1998-07-31
JPH10199805A5 true JPH10199805A5 (cg-RX-API-DMAC7.html) 2004-12-09
JP4055831B2 JP4055831B2 (ja) 2008-03-05

Family

ID=18461980

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35895596A Expired - Fee Related JP4055831B2 (ja) 1996-12-30 1996-12-30 半導体装置の作製方法

Country Status (1)

Country Link
JP (1) JP4055831B2 (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4539041B2 (ja) * 2003-08-04 2010-09-08 セイコーエプソン株式会社 薄膜半導体装置の製造方法

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