JPH10153403A - 補正装置および補正方法 - Google Patents

補正装置および補正方法

Info

Publication number
JPH10153403A
JPH10153403A JP9310319A JP31031997A JPH10153403A JP H10153403 A JPH10153403 A JP H10153403A JP 9310319 A JP9310319 A JP 9310319A JP 31031997 A JP31031997 A JP 31031997A JP H10153403 A JPH10153403 A JP H10153403A
Authority
JP
Japan
Prior art keywords
harmonic
frequency
laser
light beam
beam splitter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9310319A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10153403A5 (enExample
Inventor
Paul Zorabedian
ポール・ゾラベディアン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HP Inc
Original Assignee
Hewlett Packard Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hewlett Packard Co filed Critical Hewlett Packard Co
Publication of JPH10153403A publication Critical patent/JPH10153403A/ja
Publication of JPH10153403A5 publication Critical patent/JPH10153403A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/0201—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal phase variation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/60—Reference interferometer, i.e. additional interferometer not interacting with object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Indication And Recording Devices For Special Purposes And Tariff Metering Devices (AREA)
JP9310319A 1996-11-14 1997-11-12 補正装置および補正方法 Pending JPH10153403A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/746,683 US5748313A (en) 1996-11-14 1996-11-14 Signal-to-noise ratio of second harmonic interferometers
US746,683 1996-11-14

Publications (2)

Publication Number Publication Date
JPH10153403A true JPH10153403A (ja) 1998-06-09
JPH10153403A5 JPH10153403A5 (enExample) 2005-05-19

Family

ID=25001886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9310319A Pending JPH10153403A (ja) 1996-11-14 1997-11-12 補正装置および補正方法

Country Status (5)

Country Link
US (1) US5748313A (enExample)
EP (1) EP0843152B1 (enExample)
JP (1) JPH10153403A (enExample)
DE (1) DE69735148T2 (enExample)
SG (1) SG54508A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007258749A (ja) * 2002-11-27 2007-10-04 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2010507804A (ja) * 2006-10-25 2010-03-11 ザイゴ コーポレーション 光学測定における大気摂動の影響の補正
CN101413783B (zh) 2008-07-23 2012-06-27 中国航空工业第一集团公司北京长城计量测试技术研究所 双频激光干涉测量装置

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6157458A (en) * 1998-04-30 2000-12-05 Agilent Technologies Achromatic quarter wave plate for an air turbulence compensating inteferometer
US6014216A (en) * 1999-01-08 2000-01-11 Hewlett-Packard Company Architecture for air-turbulence-compensated dual-wavelength heterodyne interferometer
US6256102B1 (en) 1999-04-27 2001-07-03 University Of Central Florida Dual-beam low-coherence interferometer with improved signal-to-noise ratio
US6724486B1 (en) 1999-04-28 2004-04-20 Zygo Corporation Helium- Neon laser light source generating two harmonically related, single- frequency wavelengths for use in displacement and dispersion measuring interferometry
US6417927B2 (en) * 1999-04-28 2002-07-09 Zygo Corporation Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer
EP1160627A3 (en) * 2000-06-01 2004-08-18 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7508487B2 (en) 2000-06-01 2009-03-24 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6816264B1 (en) * 2001-12-21 2004-11-09 Itt Manufacturing Enterprises, Inc. Systems and methods for amplified optical metrology
US7826063B2 (en) 2005-04-29 2010-11-02 Zygo Corporation Compensation of effects of atmospheric perturbations in optical metrology
US20070077071A1 (en) * 2005-09-30 2007-04-05 Mikhail Belenkiy System for measuring atmospheric turbulence
JP5276595B2 (ja) 2006-11-15 2013-08-28 ザイゴ コーポレーション リソグラフィツールにおいて使用される距離測定干渉計及びエンコーダ測定システム
US7894075B2 (en) 2006-12-11 2011-02-22 Zygo Corporation Multiple-degree of freedom interferometer with compensation for gas effects
WO2008073454A2 (en) 2006-12-11 2008-06-19 Zygo Corporation Multiple-degree of freedom interferometer with compensation for gas effects
CN101614523B (zh) * 2009-08-10 2010-10-27 中国科学院长春光学精密机械与物理研究所 一种检测掠射筒状离轴非球面镜的多光束长轨干涉仪
GB201411206D0 (en) * 2014-06-24 2014-08-06 Sec Dep For Business Innovation & Skills The And Usw Commercial Services Ltd Dual laser frequency sweep interferometry system and method
DE102022120607B4 (de) 2022-08-16 2024-08-01 Deutsches Zentrum für Luft- und Raumfahrt e.V. Optische Vorrichtung, System und Verfahren zur Dispersionsinterferometrie

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5404222A (en) * 1994-01-14 1995-04-04 Sparta, Inc. Interferametric measuring system with air turbulence compensation

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007258749A (ja) * 2002-11-27 2007-10-04 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2010507804A (ja) * 2006-10-25 2010-03-11 ザイゴ コーポレーション 光学測定における大気摂動の影響の補正
CN101413783B (zh) 2008-07-23 2012-06-27 中国航空工业第一集团公司北京长城计量测试技术研究所 双频激光干涉测量装置

Also Published As

Publication number Publication date
EP0843152B1 (en) 2006-01-25
EP0843152A3 (en) 2000-02-23
EP0843152A2 (en) 1998-05-20
US5748313A (en) 1998-05-05
DE69735148T2 (de) 2006-07-20
SG54508A1 (en) 1998-11-16
DE69735148D1 (de) 2006-04-13

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