JPH10146557A - Substrate-holding system - Google Patents

Substrate-holding system

Info

Publication number
JPH10146557A
JPH10146557A JP30692496A JP30692496A JPH10146557A JP H10146557 A JPH10146557 A JP H10146557A JP 30692496 A JP30692496 A JP 30692496A JP 30692496 A JP30692496 A JP 30692496A JP H10146557 A JPH10146557 A JP H10146557A
Authority
JP
Japan
Prior art keywords
substrate
holding
rotation
spin base
swing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30692496A
Other languages
Japanese (ja)
Other versions
JP3604242B2 (en
Inventor
Hideki Adachi
秀喜 足立
Yukihiro Takamura
幸宏 高村
Kunio Yamada
邦夫 山田
Yoshihiro Koyama
芳弘 小山
Jun Watanabe
純 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP30692496A priority Critical patent/JP3604242B2/en
Publication of JPH10146557A publication Critical patent/JPH10146557A/en
Application granted granted Critical
Publication of JP3604242B2 publication Critical patent/JP3604242B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manipulator (AREA)

Abstract

PROBLEM TO BE SOLVED: To hold a substrate which is rotated at high speed without occurring breakage in the substrate or a spin base. SOLUTION: A substrate holding part 10 is attached on a spin base 4 capable of taking a turn around a vertical axis J1. Movable holding parts 10 are provided with rotary members 11 set on the spin base 4 rotatably around vertical axes J2, swinging members 12, holding arms 13, and holding parts 14 attached on the holding arms 13, wherein the swinging members 12 are extended toward a side way inserting and facing the rotary members 11, set swingably on the rotary members 11, having rotary axis centers J2 of the rotary members 11 as swinging fulcrums. When the swinging members 12 are urged for swinging to the direction that the points of swinging actin of the swinging members 12 are separated from the rotation center J1 of the spin base 4, a substrate W is held by the holding parts 14. When the swinging members 12 are swung so that the point of swinging actin is returned to the side of the rotation center J1, the holding of the substrate is released.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体ウエハ、液
晶表示器用のガラス基板、フォトマスク用のガラス基
板、光ディスク用の基板などの基板を鉛直軸回りに回転
して、レジスト塗布処理、現像処理、洗浄処理などの適
宜の処理を施す回転式基板処理装置に備えられた基板保
持機構に関する。
The present invention relates to a resist coating process and a developing process in which substrates such as a semiconductor wafer, a glass substrate for a liquid crystal display, a glass substrate for a photomask, and a substrate for an optical disk are rotated about a vertical axis. The present invention relates to a substrate holding mechanism provided in a rotary substrate processing apparatus that performs an appropriate process such as a cleaning process.

【0002】[0002]

【従来の技術】従来のこの種の回転式基板処理装置の基
板保持機構として、例えば、図13、図14に示すよう
なものがある。図13は、回転式基板処理装置に備えら
れた従来の基板保持機構の構成を示す平面図であり、図
14(a)は、基板を保持した状態を示す要部平面図、
図14(b)は、基板の保持が解除された状態を示す要
部平面図である。
2. Description of the Related Art As a conventional substrate holding mechanism of a rotary type substrate processing apparatus of this kind, there is, for example, one shown in FIGS. FIG. 13 is a plan view showing a configuration of a conventional substrate holding mechanism provided in a rotary substrate processing apparatus. FIG. 14A is a plan view of a main part showing a state where a substrate is held.
FIG. 14B is a main part plan view showing a state where the holding of the substrate is released.

【0003】鉛直軸J1回りに回転可能に立設された図
示しない回転軸の上端部にスピンベース100が設けら
れ、スピンベース100が軸J1回りに回転可能に構成
されている。スピンベース100は、3本以上のアーム
部101が放射状に設けられて構成され、各アーム部1
01の先端部に基板保持部200が設けられている。図
では、全ての基板保持部200を可動保持部として構成
している。
[0003] A spin base 100 is provided at the upper end of a rotating shaft (not shown) that stands upright so as to be rotatable about a vertical axis J1, and the spin base 100 is configured to be rotatable about the axis J1. The spin base 100 includes three or more arm portions 101 provided radially.
The substrate holding unit 200 is provided at the tip of the device 01. In the figure, all the substrate holding units 200 are configured as movable holding units.

【0004】基板保持部200は、保持部材201と揺
動部材202とを備えている。保持部材201は、アー
ム部101に鉛直軸J2回りに回動可能に設けられた円
柱状の基板載置部203と、基板載置部203の上面を
段付きにして切り欠き状に設けられた保持部204とが
一体に形成されている。揺動部材202は、保持部材2
01の側方に延出され、基板載置部203の軸J2を支
点として揺動可能に基板載置部203に設けられてい
る。揺動部材202の先端部側には、リンク部材205
の先端部側が回動可能に連結されていて、この揺動部材
202とリンク部材205との連結部分が揺動部材20
2の揺動作用点となっている。各リンク部材205の基
端部側は、駆動軸210の上端部に回動可能に連結され
ている。
[0004] The substrate holding section 200 includes a holding member 201 and a swing member 202. The holding member 201 is provided in a notch shape with a columnar substrate mounting portion 203 provided on the arm portion 101 so as to be rotatable around a vertical axis J2, and a stepped upper surface of the substrate mounting portion 203. The holding part 204 is formed integrally. The swing member 202 includes the holding member 2
01, and is provided on the substrate mounting portion 203 so as to be swingable about the axis J2 of the substrate mounting portion 203 as a fulcrum. A link member 205 is provided at the tip end side of the swinging member 202.
Of the swing member 202 and the link member 205 is connected to the swing member 20 in a pivotable manner.
2 are the points for the swing operation. The base end of each link member 205 is rotatably connected to the upper end of the drive shaft 210.

【0005】スピンベース100を軸J1回りに回転さ
せる回転軸は円筒状に構成され、この回転軸の中空部に
駆動軸210が、軸J1回りに回転軸と相対回転可能に
貫通されている。そして、図示しない付勢手段は、回転
軸に対して駆動軸210を、軸J1を回転中心軸として
時計回り(図13の実線の矢印回り)に回転付勢するよ
うに設けられている。この付勢手段の付勢により、リン
ク部材205を介して揺動部材202の揺動作用点がス
ピンベース100の回転中心(J1)から離れる方向に
揺動部材202が揺動付勢され、これに伴って保持部材
201が軸J2を回転中心軸として反時計回りに回転付
勢され、図13、図14(a)に示すように、保持部2
04が基板Wの外周端縁を押圧付勢して基板Wが保持さ
れる。
A rotating shaft for rotating the spin base 100 around the axis J1 is formed in a cylindrical shape, and a driving shaft 210 is penetrated through a hollow portion of the rotating shaft so as to be rotatable relative to the rotating shaft around the axis J1. The urging means (not shown) is provided so as to rotationally urge the drive shaft 210 clockwise (around the solid arrow in FIG. 13) with respect to the rotation shaft with the axis J1 as the rotation center axis. By the urging of the urging means, the rocking member 202 is rocked and biased via the link member 205 in a direction in which the rocking operation point of the rocking member 202 moves away from the rotation center (J1) of the spin base 100. As a result, the holding member 201 is urged to rotate counterclockwise about the axis J2 as the rotation center axis, and as shown in FIG. 13 and FIG.
04 presses and urges the outer peripheral edge of the substrate W to hold the substrate W.

【0006】一方、図示しない解除手段は、付勢手段に
抗して、回転軸に対して駆動軸210を、軸J1を回転
中心軸として反時計回り(図13の二点鎖線の矢印回
り)に回転させるように設けられている。この解除手段
による駆動軸210の回転により、リンク部材205を
介して揺動部材202の揺動作用点がスピンベース10
0の回転中心(J1)側に引き戻される方向に揺動部材
202が揺動され、これに伴って保持部材201が軸J
2を回転中心軸として時計回りに回転され、図14
(b)に示すように、保持部204が基板Wの外周端縁
から離れて基板Wの保持が解除される。
[0006] On the other hand, a releasing means (not shown) counterclockwise rotates the driving shaft 210 with respect to the rotating shaft and the axis J1 as a rotation center axis (around the arrow indicated by the two-dot chain line in FIG. 13) against the urging means. It is provided so as to be rotated. Due to the rotation of the drive shaft 210 by the releasing means, the swinging point of the swinging member 202 is set via the link member 205 to the spin base 10.
The swing member 202 is swung in a direction in which the swing member 202 is pulled back to the rotation center (J1) side of the shaft 0, and the holding member 201 is moved along the axis J.
14 is rotated clockwise around the rotation center axis 2 as shown in FIG.
As shown in (b), the holding unit 204 is separated from the outer peripheral edge of the substrate W, and the holding of the substrate W is released.

【0007】上述したように基板Wが保持された状態
で、スピンベース100を軸J1回りに回転させること
で、保持された基板Wが軸J1回りに回転され、この基
板Wに対して適宜の処理が施される。
By rotating the spin base 100 about the axis J1 while holding the substrate W as described above, the held substrate W is rotated about the axis J1, and an appropriate Processing is performed.

【0008】[0008]

【発明が解決しようとする課題】しかしながら、このよ
うな構成を有する従来例の場合には、次のような問題が
ある。従来例の基板保持機構によって基板Wを保持して
基板Wを軸J1回りに回転させると、遠心力によって揺
動部材202の揺動作用点(揺動部材202とリンク部
材205との連結部分)に、図13の矢印F方向に作用
する力が働き、回転停止時よりも揺動部材202が、ス
ピンベース100の回転中心(J1)からさらに離れる
方向に揺動され、回転停止時に比べて保持部204が基
板Wの外周端部をさらに強く押圧することになる。
However, the prior art having such a structure has the following problems. When the substrate W is rotated around the axis J1 by holding the substrate W by the conventional substrate holding mechanism, the swinging operation point of the swinging member 202 due to centrifugal force (the connecting portion between the swinging member 202 and the link member 205) In addition, the force acting in the direction of arrow F in FIG. 13 acts, and the swing member 202 is swung in a direction further away from the rotation center (J1) of the spin base 100 than when the rotation is stopped, and is held as compared with when the rotation is stopped. The part 204 presses the outer peripheral edge of the substrate W more strongly.

【0009】保持部204の押圧力が強くなり過ぎる
と、基板W自身の座屈荷重を越えて保持した基板Wを破
損することになる。また、スピンベース100や保持部
材200などを炭化珪素(SiC)などの耐薬材料で制
作した場合には、炭化珪素の曲げ強度が低いので、基板
Wの代わりにスピンベース100(特に、アーム部10
1)が破損したり、保持部材200が根元から折れるこ
とになる。
If the pressing force of the holding section 204 becomes too strong, the substrate W held above the buckling load of the substrate W itself will be damaged. Further, when the spin base 100 and the holding member 200 are made of a chemical resistant material such as silicon carbide (SiC), the bending strength of the silicon carbide is low.
1) is damaged or the holding member 200 is broken from the root.

【0010】保持部204の押圧力は、基板W、スピン
ベース100の回転数を上げるに従って強くなるので、
基板Wやスピンベース100、保持部材200の破損を
招かないようにするために、従来例の構成では、基板W
の回転数を一定以上に上げることができず、基板Wの回
転数に制限があり、その制限の回転数以上に基板Wを高
速回転させて処理することができなかった。
The pressing force of the holding section 204 increases as the number of rotations of the substrate W and the spin base 100 increases.
In order to prevent the substrate W, the spin base 100 and the holding member 200 from being damaged, the structure of the conventional example
Cannot be increased to a certain value or more, the number of rotations of the substrate W is limited, and it is not possible to rotate the substrate W at a speed higher than the limited number of rotations for processing.

【0011】また、基板Wのサイズが大型になるに従っ
て、遠心力によって揺動部材202の揺動作用点、すな
わち、揺動部材202とリンク部材205との連結部分
に働く力が強くなるので、基板Wやスピンベース10
0、保持部材200の破損を招かないようにするための
制限となる基板Wの回転数がより低くなり、基板Wが大
型になるに従って基板Wを高速回転させて処理すること
が行い難くなっていた。
Further, as the size of the substrate W increases, the force acting on the swinging point of the swinging member 202, that is, the force acting on the connecting portion between the swinging member 202 and the link member 205, increases due to the centrifugal force. Substrate W and spin base 10
0, the number of rotations of the substrate W, which is a limit for preventing the holding member 200 from being damaged, becomes lower, and as the substrate W becomes larger, it is difficult to perform the processing by rotating the substrate W at a high speed. Was.

【0012】本発明は、このような事情に鑑みてなされ
たものであって、基板のサイズにかかわらず、基板やス
ピンベースなどの破損を招かずに基板を高速回転させる
ことができる基板保持機構を提供することを目的とす
る。
The present invention has been made in view of such circumstances, and a substrate holding mechanism capable of rotating a substrate at a high speed without causing damage to the substrate or a spin base regardless of the size of the substrate. The purpose is to provide.

【0013】[0013]

【課題を解決するための手段】本発明は、このような目
的を達成するために、次のような構成をとる。すなわ
ち、請求項1に記載の発明は、基板を保持する基板保持
機構において、鉛直軸回りに回転可能なスピンベース
と、基板の外周端部を3箇所以上で保持するために3つ
以上有しており、その3つ以上のうち少なくとも1つが
可動保持部である基板保持部と、基板を保持する側に前
記可動保持部を変位させるための第1変位手段と、基板
の保持を解除する側に前記可動保持部を変位させるため
の第2変位手段と、前記可動保持部と前記第1変位手段
および前記第2変位手段とを連結させる連結手段と、を
備え、前記可動保持部は、前記スピンベースに設けら
れ、鉛直軸回りに回動可能な回動部材と、前記回動部材
の側方に延出され、前記回動部材の回動軸芯を支点とし
て揺動可能に前記回動部材に設けられて、前記連結手段
に連結された揺動部材と、前記回動部材を挟んで前記揺
動部材とは反対側の側方に延出され、前記回動部材の回
動軸芯を支点として揺動可能に前記回動部材に設けら
れ、かつ基板の外周端部に当接する保持面を有する保持
部材と、を備えることを特徴とするものである。
The present invention has the following configuration in order to achieve the above object. That is, the invention according to claim 1 is a substrate holding mechanism for holding a substrate, comprising a spin base rotatable around a vertical axis, and three or more spin holders for holding the outer peripheral end of the substrate at three or more places. A substrate holding unit in which at least one of the three or more is a movable holding unit; first displacement means for displacing the movable holding unit to a side for holding the substrate; and a side for releasing the holding of the substrate. A second displacement unit for displacing the movable holding unit; and a connecting unit for connecting the movable holding unit to the first displacement unit and the second displacement unit. A rotating member provided on the spin base and rotatable about a vertical axis; and a rotating member extending to the side of the rotating member and swingably pivotable about a rotating shaft center of the rotating member. A swing provided on the member and connected to the connecting means. A member, extending to the side opposite to the swing member with the rotating member interposed therebetween, and provided on the rotating member so as to be swingable around a rotation axis of the rotating member as a fulcrum; And a holding member having a holding surface in contact with an outer peripheral end of the substrate.

【0014】また、請求項2に記載の発明は、基板を保
持する基板保持機構において、鉛直軸回りに回転可能な
スピンベースと、基板の外周端部を3箇所以上で保持す
るために3つ以上有しており、その3つ以上のうち少な
くとも1つが可動保持部である基板保持部と、基板を保
持する側に前記可動保持部を変位させるための第1変位
手段と、基板の保持を解除する側に前記可動保持部を変
位させるための第2変位手段と、前記可動保持部と前記
第1変位手段および前記第2変位手段とを連結させる連
結手段と、を備え、前記可動保持部は、前記スピンベー
スに設けられ、鉛直軸回りに回動可能な回動部材と、前
記回動部材の側方に延出され、前記回動部材の回動軸芯
を揺動支点として揺動可能に前記回動部材に設けられ
て、前記連結手段に連結された揺動部材と、前記回動部
材の回動軸芯を回転支点として回転可能に前記回動部材
に設けられ、前記回動部材の正逆回転に応じて基板の保
持および解除が可能である保持部材と、を備え、前記保
持部材が基板を保持したとき、前記揺動部材の揺動作用
点と前記揺動支点とが、前記スピンベースの回転中心を
中心とした仮想円の半径方向に沿って一直線上に並ぶよ
うに構成したことを特徴とするものである。
According to a second aspect of the present invention, in a substrate holding mechanism for holding a substrate, three spin bases rotatable around a vertical axis and three spin holders for holding an outer peripheral end of the substrate at three or more locations are provided. A substrate holding unit in which at least one of the three or more is a movable holding unit, first displacement means for displacing the movable holding unit to a side for holding the substrate, and holding of the substrate. A second displacement unit for displacing the movable holding unit to a side to be released; and a connecting unit for connecting the movable holding unit to the first displacement unit and the second displacement unit; A pivot member provided on the spin base and rotatable about a vertical axis, and extending to the side of the pivot member, pivoting about a pivot axis of the pivot member as a pivot point. Is provided on the rotating member so as to be connected to the connecting means. The oscillating member and the rotation member are rotatably provided on the rotation member with the rotation axis of the rotation member serving as a rotation fulcrum, and the substrate can be held and released in accordance with forward and reverse rotation of the rotation member. Wherein the holding member holds the substrate, and the swing operation point of the swing member and the swing fulcrum are the radius of an imaginary circle centered on the rotation center of the spin base. It is characterized in that it is arranged so as to be aligned on a straight line along the direction.

【0015】また、請求項3に記載の発明は、基板を保
持する基板保持機構において、鉛直軸回りに回転可能な
スピンベースと、基板の外周端部を3箇所以上で保持す
るために3つ以上有しており、その3つ以上のうち少な
くとも1つが可動保持部である基板保持部と、基板を保
持する側に前記可動保持部を変位させるための第1変位
手段と、基板の保持を解除する側に前記可動保持部を変
位させるための第2変位手段と、前記可動保持部と前記
第1変位手段および前記第2変位手段とを連結させる連
結手段と、を備え、前記可動保持部は、前記スピンベー
スに設けられ、鉛直軸回りに回動可能な回動部材と、前
記回動部材を挟んで両側に延出され、一方側が揺動作用
点であるとともに他方側にカウンタウエイトを有し、前
記回動部材の回動軸芯を支点として揺動可能に前記回動
部材に設けられて、前記連結手段に連結された揺動部材
と、前記回動部材の回動軸芯を支点として回転可能に前
記回動部材に設けられ、前記回動部材の正逆回転に応じ
て基板の保持および解除が可能である保持部材と、を備
えることを特徴とするものである。
According to a third aspect of the present invention, in the substrate holding mechanism for holding a substrate, three spin bases rotatable around a vertical axis and three spin holders for holding the outer peripheral end of the substrate at three or more locations are provided. A substrate holding unit in which at least one of the three or more is a movable holding unit, first displacement means for displacing the movable holding unit to a side for holding the substrate, and holding of the substrate. A second displacement unit for displacing the movable holding unit to a side to be released; and a connecting unit for connecting the movable holding unit to the first displacement unit and the second displacement unit; A rotating member provided on the spin base and rotatable about a vertical axis, and extending to both sides with the rotating member interposed therebetween, one side serving as a swing operation point and a counterweight provided on the other side. Having the rotation of the rotation member A swing member that is swingably provided about a core as a fulcrum, and is provided on the swing member so as to be swingable about a swing axis of the swing member, the swing member being connected to the connecting means; And a holding member capable of holding and releasing the substrate according to the forward / reverse rotation of the rotating member.

【0016】また、請求項4に記載の発明は、請求項1
ないし請求項3のいずれかに記載の基板保持機構におい
て、前記連結手段は、前記スピンベースに沿って配置さ
れ、揺動部材に連結されているリンク部材と、前記リン
ク部材に設けられ、前記スピンベースの回転軸に挿通さ
れている駆動軸と、前記駆動軸に設けられた回転部材
と、を備え、前記第1変位手段は、前記保持部材により
基板を保持させるように、回転部材を一方向に回転さ
せ、前記第2変位手段は、前記保持部材による基板の保
持を解除させるように、回転部材を他方向に回転させる
ことを特徴とするものである。
The invention described in claim 4 is the first invention.
4. The substrate holding mechanism according to claim 3, wherein the connection unit is provided along the spin base, and is provided on the link member and a link member connected to a swing member. A drive shaft inserted through the rotation shaft of the base; and a rotation member provided on the drive shaft, wherein the first displacement unit moves the rotation member in one direction so that the substrate is held by the holding member. , And the second displacement means rotates the rotating member in the other direction so as to release the holding of the substrate by the holding member.

【0017】また、請求項5に記載の発明は、請求項4
に記載の基板保持機構において、前記第1変位手段は、
バネ機構を備え、前記第2変位手段は、エアシリンダを
備えることを特徴とするものである。
The invention described in claim 5 is the same as the invention in claim 4.
In the substrate holding mechanism described in the above, the first displacement means,
A spring mechanism is provided, and the second displacement means is provided with an air cylinder.

【0018】[0018]

【作用】請求項1に記載の発明の作用は次のとおりであ
る。第1変位手段によって連結手段を介して可動保持部
の揺動部材が一方向に揺動されると、回動部材を挟んで
揺動部材とは反対側の側方に延出された保持部材が回動
部材の回動軸芯を支点として揺動し、保持部材の保持面
が基板の外周端部に当接して基板が保持される。基板が
基板保持部に保持された状態で、スピンベースを鉛直軸
周りに回転させると、遠心力により揺動部材がスピンベ
ースの回転中心から離れる方向に変位する力が働き、そ
れとともに保持部材にもスピンベースの回転中心から離
れる方向に変位する力が働く。従って、揺動部材に働く
力と保持部材に働く力とが互いに相殺され、回動部材は
ほとんど回転しない。これにより、保持部材の保持面が
基板の外周端縁に当接する力は、スピンベース停止時と
略同じであり、第1変位手段の変位力に応じた力で、基
板を保持することになる。そして、スピンベースの回転
が停止され、第2変位手段によって揺動部材が他方向に
揺動されると、保持部材が回動部材の回動軸芯を支点と
して揺動し、保持部材の保持面が基板の外周端部から離
れて基板の保持が解除される。
The operation of the first aspect of the invention is as follows. When the swinging member of the movable holding unit is swung in one direction by the first displacement unit via the connecting unit, the holding member extended to the side opposite to the swinging member across the rotating member. Swings about the rotation axis of the rotation member as a fulcrum, and the holding surface of the holding member contacts the outer peripheral end of the substrate to hold the substrate. When the spin base is rotated around the vertical axis while the substrate is held by the substrate holding portion, a force is exerted to displace the swinging member away from the center of rotation of the spin base due to centrifugal force, and the holding member is also moved. Also, a force acting in a direction away from the rotation center of the spin base acts. Therefore, the force acting on the swing member and the force acting on the holding member cancel each other, and the rotating member hardly rotates. Accordingly, the force with which the holding surface of the holding member abuts on the outer peripheral edge of the substrate is substantially the same as when the spin base is stopped, and holds the substrate with a force corresponding to the displacement force of the first displacement means. . When the rotation of the spin base is stopped and the swinging member is swung in the other direction by the second displacement means, the holding member swings around the rotation axis of the rotation member as a fulcrum, thereby holding the holding member. The surface is separated from the outer peripheral edge of the substrate, and the holding of the substrate is released.

【0019】請求項2に記載の発明の作用は次のとおり
である。第1変位手段によって連結手段を介して可動保
持部の揺動部材が一方向に揺動されると、回動部材の回
動軸芯を回転支点として回転可能に回動部材に設けられ
た保持部材が、回動部材の正回転に応じて基板を保持す
る。このとき、スピンベースの回転中心を中心した仮想
円の半径方向に沿って揺動部材の揺動作用点と揺動支点
とが一直線上に並ぶ。基板が基板保持部に保持された状
態で、スピンベースを鉛直軸周りに回転させると、揺動
部材の揺動作用点と揺動支点が一直線上に並んでいるの
で、遠心力によって、揺動部材の揺動作用点に働く力
は、揺動支点方向に働き、揺動部材は揺動されず、回動
部材および保持部材は回転しない。これにより、保持部
材の基板を保持する力は、スピンベース停止時と略同じ
であり、第1変位手段の変位力に応じた力で、基板を保
持することになる。そして、スピンベースの回転が停止
すると、第2変位手段によって揺動部材が他方向に揺動
され、回動部材の逆回転に応じて保持部材が回動部材の
回動軸芯を回転支点として回転し、保持部材による基板
の保持が解除される。
The operation of the invention described in claim 2 is as follows. When the swinging member of the movable holding portion is swung in one direction by the first displacement means via the connecting means, the holding member rotatably provided on the rotating member with the rotating shaft center of the rotating member as a rotation fulcrum. A member holds the substrate according to the forward rotation of the rotating member. At this time, the swing operation point of the swing member and the swing fulcrum are aligned on a straight line along the radial direction of the virtual circle centered on the rotation center of the spin base. When the spin base is rotated about a vertical axis while the substrate is held by the substrate holding unit, the swinging point of the swinging member and the swinging fulcrum are aligned. The force acting on the pivot point of the member acts in the direction of the pivot point, the pivot member is not pivoted, and the rotating member and the holding member do not rotate. Thus, the force of the holding member for holding the substrate is substantially the same as when the spin base is stopped, and the substrate is held with a force corresponding to the displacement force of the first displacement means. Then, when the rotation of the spin base is stopped, the swing member is swung in the other direction by the second displacement means, and the holding member is caused to rotate around the rotation axis of the rotation member in accordance with the reverse rotation of the rotation member. It rotates, and the holding of the substrate by the holding member is released.

【0020】請求項3に記載の発明の作用は次のとおり
である。第1変位手段によって連結手段を介して可動保
持部の揺動部材が一方向に揺動されると、回動部材の回
動軸芯を支点として回転可能に回動部材に設けられた保
持部材が、回動部材の正回転に応じて基板を保持する。
基板が基板保持部に保持された状態で、スピンベースを
鉛直軸周りに回転させると、遠心力により、揺動部材の
揺動作用点がスピンベースの回転中心から離れる方向に
変位する力が働くが、揺動部材は揺動作用点とは反対側
にカウンタウエイトを有するので、揺動部材は揺動しな
い。これにより、保持部材の基板を保持する力は、スピ
ンベース停止時と略同じであり、第1変位手段の変位力
に応じた力で、基板を保持することになる。そして、ス
ピンベースの回転が停止すると、第2変位手段によって
揺動部材が他方向に揺動され、回動部材の逆回転に応じ
て保持部材が回動部材の回動軸芯を支点として回転し、
保持部材による基板の保持が解除される。
The operation of the invention described in claim 3 is as follows. When the swinging member of the movable holding unit is swung in one direction by the first displacement means via the connecting means, the holding member rotatably provided on the turning member with the turning axis of the turning member as a fulcrum. Holds the substrate in accordance with the forward rotation of the rotating member.
When the spin base is rotated around a vertical axis while the substrate is held by the substrate holding unit, a force acts by the centrifugal force to displace the swinging point of the swing member in a direction away from the rotation center of the spin base. However, since the swing member has a counterweight on the side opposite to the swing operation point, the swing member does not swing. Thus, the force of the holding member for holding the substrate is substantially the same as when the spin base is stopped, and the substrate is held with a force corresponding to the displacement force of the first displacement means. Then, when the rotation of the spin base is stopped, the swinging member is swung in the other direction by the second displacement means, and the holding member rotates around the rotation axis of the rotation member in accordance with the reverse rotation of the rotation member. And
The holding of the substrate by the holding member is released.

【0021】請求項4に記載の発明の作用は次のとおり
である。第1変位手段と第2変位手段とによる変位力は
回転部材を一方向または他方向に回転させ、スピンベー
スの回転軸に挿通されている駆動軸およびリンク部材を
介して揺動部材に伝えられる。
The operation of the invention described in claim 4 is as follows. The displacement force by the first displacement means and the second displacement means rotates the rotating member in one direction or the other direction, and is transmitted to the swinging member via the driving shaft and the link member inserted through the rotating shaft of the spin base. .

【0022】請求項5に記載の発明の作用は次のとおり
である。基板を保持する側への可動保持部の変位はバネ
機構で行い、基板の保持を解除する側への可動保持部の
変位はエアシリンダで行っている。
The operation of the invention described in claim 5 is as follows. The displacement of the movable holding unit to the side for holding the substrate is performed by a spring mechanism, and the displacement of the movable holding unit to the side for releasing the holding of the substrate is performed by an air cylinder.

【0023】[0023]

【発明の実施の形態】以下、図面を参照して本発明の実
施の形態を説明する。図1は、本発明の第1実施例に係
る回転式基板処理装置の基板保持機構の構成を示す平面
図であり、図1(a)は、基板が保持された状態を示
し、図1(b)は、基板の保持が解除された状態を示し
ている。図2は、可動保持部の構成を示す斜視図であ
り、図3は、第1変位手段、第2変位手段の一例の構成
を示す図である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a plan view showing a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a first embodiment of the present invention. FIG. 1A shows a state where a substrate is held, and FIG. (b) shows a state where the holding of the substrate is released. FIG. 2 is a perspective view illustrating a configuration of the movable holding unit, and FIG. 3 is a diagram illustrating an exemplary configuration of the first displacement unit and the second displacement unit.

【0024】円筒状の回転軸1は、ベルト伝動機構2な
どによってモーター3に伝動連結され、鉛直軸J1回り
に回転可能に立設されている。この回転軸1の上端部に
スピンベース4が設けられ、スピンベース4が軸J1回
りに回転可能に構成されている。スピンベース4は、3
本以上のアーム部5が放射状に設けられて構成され、各
アーム部5の先端部に基板保持部10が設けられてい
る。図では、全ての基板保持部10を可動保持部として
構成している。
The cylindrical rotary shaft 1 is operatively connected to a motor 3 by a belt transmission mechanism 2 or the like, and is erected so as to be rotatable about a vertical axis J1. A spin base 4 is provided at an upper end of the rotating shaft 1, and the spin base 4 is configured to be rotatable around an axis J1. Spin base 4 is 3
More than one arm 5 is provided radially, and a substrate holding unit 10 is provided at the tip of each arm 5. In the figure, all the substrate holding units 10 are configured as movable holding units.

【0025】基板保持部10は、回動部材11、揺動部
材12、保持部材としての保持アーム13、保持部14
を備えている。
The substrate holding unit 10 includes a rotating member 11, a swinging member 12, a holding arm 13 as a holding member, and a holding unit 14.
It has.

【0026】回動部材11は、鉛直軸J2回りに回動可
能にスピンベース4のアーム部5に設けられている。こ
の実施例では、回動部材11を基板載置部としても用い
ており、保持する基板Wの外周端部の下面を回動部材1
1の上面に載置するようにしている。
The rotating member 11 is provided on the arm 5 of the spin base 4 so as to be rotatable around a vertical axis J2. In this embodiment, the rotating member 11 is also used as a substrate mounting portion, and the lower surface of the outer peripheral end of the substrate W to be held is attached to the rotating member 1.
1 on the upper surface.

【0027】揺動部材12は、回動部材11の側方に延
出され、回動部材11の回動軸芯J2を揺動支点として
揺動可能に回動部材11に設けられている。この揺動部
材の先端部側に、リンク部材16の先端部側が回動可能
に連結されていて、この揺動部材12とリンク部材16
との連結部分が揺動部材12の揺動作用点となってい
る。
The swing member 12 extends to the side of the swing member 11, and is swingably provided on the swing member 11 with the swing axis J2 of the swing member 11 as a swing fulcrum. A distal end side of a link member 16 is rotatably connected to a distal end side of the swing member.
Is a point for the rocking operation of the rocking member 12.

【0028】保持アーム13は、回動部材11を挟んで
揺動部材12の揺動作用点(揺動部材12とリンク部材
16との連結部分)と反対側の側方に延出され、回動部
材11の回動軸芯J2を揺動支点として揺動可能に回動
部材11に設けられている。なお、揺動部材12とこの
保持アーム13とは、図2(a)に示すように別個の部
材で構成してもよいし、図2(b)に示すように一体の
部材15で構成してもよい。
The holding arm 13 extends to the side opposite to the swinging operation point of the swinging member 12 (the connecting portion between the swinging member 12 and the link member 16) with the rotating member 11 interposed therebetween. The pivot member 11 is pivotally provided on the pivot member 11 with the pivot axis J2 of the moving member 11 as a pivot point. The swinging member 12 and the holding arm 13 may be formed as separate members as shown in FIG. 2A, or may be formed as an integral member 15 as shown in FIG. You may.

【0029】保持部14は、保持アーム13の先端部側
上面に設けられ、基板Wの外周端縁に当接する保持面1
4aを備えている。
The holding portion 14 is provided on the upper surface of the holding arm 13 on the distal end side, and the holding surface 1 is in contact with the outer peripheral edge of the substrate W.
4a.

【0030】第1変位手段と第2変位手段は例えば図3
のように構成されている。回転軸1の中空部には、軸J
1回りに回転軸1と相対回転可能に駆動軸20が挿通さ
れている。回転軸1にはフランジ部21が設けられ、こ
のフランジ部21に対向するように駆動軸20にも回転
部材としてのフランジ部22が設けられている。フラン
ジ部21にはピン23がフランジ部22に向けて設けら
れ、フランジ部22にはフランジ部21に向けてピン2
4が設けられている。これらピン23、24の間に第1
変位手段としてのコイルバネ25が架けられていて、回
転軸1に対して駆動軸20が、軸J1を回転中心軸とし
て図の時計回りに回転付勢されるようになっている。
The first displacement means and the second displacement means are, for example, as shown in FIG.
It is configured as follows. In the hollow part of the rotating shaft 1, the shaft J
A drive shaft 20 is inserted so as to rotate relative to the rotation shaft 1 around one rotation. The rotating shaft 1 is provided with a flange portion 21, and the driving shaft 20 is also provided with a flange portion 22 as a rotating member so as to face the flange portion 21. A pin 23 is provided on the flange portion 21 toward the flange portion 22.
4 are provided. The first between these pins 23 and 24 is
A coil spring 25 as a displacement means is bridged, and the drive shaft 20 is urged to rotate clockwise with respect to the rotation shaft 1 about the shaft J1 as a rotation center axis.

【0031】なお、コイルバネ25による回転軸1に対
する駆動軸20の時計回りの回転を適宜の位置で停止さ
せるためにストッパー26が設けられている。このスト
ッパー26による駆動軸20の回転停止位置は、後述す
るように、コイルバネ25によって保持部14が基板W
の外周端縁を押圧付勢する際の保持部14の位置より
も、保持部14が若干スピンベース4の回転中心(J
1)側に引き戻された位置に設定されている。これによ
り、後述するように、コイルバネ25によって保持部1
4がスピンベース4の回転中心(J1)側に引き戻され
ると、基板Wが有る状態では保持部14は基板Wの外周
端縁を押圧付勢し、基板Wが無い状態ではストッパー2
6によって保持部14は適宜の位置で停止されることに
なる。
A stopper 26 is provided to stop the clockwise rotation of the drive shaft 20 with respect to the rotary shaft 1 by the coil spring 25 at an appropriate position. The position at which the rotation of the drive shaft 20 is stopped by the stopper 26 is determined by the coil spring 25 so that the holding portion 14
The holding portion 14 is slightly more than the position of the holding portion 14 when the outer peripheral edge of the spin base 4 is pressed and urged.
1) It is set to the position pulled back to the side. Thereby, as described later, the holding portion 1 is held by the coil spring 25.
When the substrate 4 is pulled back to the rotation center (J1) side of the spin base 4, the holding portion 14 urges the outer peripheral edge of the substrate W when the substrate W is present, and the stopper 2 when the substrate W is absent.
6, the holding unit 14 is stopped at an appropriate position.

【0032】また、フランジ部22の近傍には第2変位
手段としてのエアシリンダ27が設けられ、エアシリン
ダ27のロッド27aを伸長させてフランジ部22に設
けられた部材28を、図3(b)の二点鎖線に示すよう
に変位させることで、コイルバネ25に抗して回転軸1
に対して駆動軸20を、軸J1を回転中心軸として図の
反時計回りに回転させるように構成している。
An air cylinder 27 as a second displacement means is provided in the vicinity of the flange portion 22, and a member 28 provided on the flange portion 22 by extending a rod 27a of the air cylinder 27 is shown in FIG. ) Is displaced as indicated by the two-dot chain line, so that the rotating shaft 1 is opposed to the coil spring 25.
In contrast, the drive shaft 20 is configured to rotate counterclockwise in the figure with the axis J1 as the rotation center axis.

【0033】駆動軸20の上端部にはリンク部材16の
基端部側が回動可能に連結されていて、リンク部材16
を介してコイルバネ25による揺動部材12の揺動付勢
や、エアシリンダ27によるその解除を行うように構成
している。
A base end of the link member 16 is rotatably connected to the upper end of the drive shaft 20.
, The swinging bias of the swinging member 12 by the coil spring 25 and the release thereof by the air cylinder 27 are performed.

【0034】エアシリンダ27のロッド27aを伸長す
ると、駆動軸20が回転軸1に対して、軸J1を回転中
心軸として反時計回りに回転され、これに連動して、図
1(a)の二点鎖線、図1(b)に示すように、リンク
部材16を介して揺動部材12の揺動作用点(揺動部材
12とリンク部材16との連結部分)がスピンベース4
の回転中心(J1)側に引き戻される方向に揺動部材1
2が揺動される。これにより、回動部材11を挟んで揺
動部材12の揺動作用点と反対側の側方に延出され、回
動部材11の回動軸芯J2を揺動支点として揺動可能に
回動部材11に設けられた保持アーム13がスピンベー
ス4の回転中心(J1)から離れる方向に揺動され、保
持アーム13に設けられた保持部14の保持面14aが
基板Wの外周端縁から離れて基板Wの保持が解除され
る。
When the rod 27a of the air cylinder 27 is extended, the drive shaft 20 is rotated counterclockwise with respect to the rotary shaft 1 around the axis J1 as a rotation center axis. As shown by a two-dot chain line in FIG. 1B, the swing operation point of the swing member 12 (the connecting portion between the swing member 12 and the link member 16) is connected to the spin base 4 via the link member 16.
Swing member 1 in the direction of being pulled back to the rotation center (J1) side of
2 is rocked. As a result, the pivot member 11 extends to the side opposite to the pivot point for the pivot member 11 with the pivot member 11 therebetween, and pivots about the pivot axis J2 of the pivot member 11 as the pivot point. The holding arm 13 provided on the moving member 11 is swung in a direction away from the rotation center (J1) of the spin base 4, and the holding surface 14a of the holding unit 14 provided on the holding arm 13 is moved from the outer peripheral edge of the substrate W. The holding of the substrate W is released.

【0035】また、上述したように、エアシリンダ27
のロッド27aを伸長させて基板Wの保持が解除され、
回動部材11の上面に基板Wの外周端部の下面が載置さ
れた状態で、エアシリンダ27のロッド27aを収縮す
ると、コイルバネ25の復元力によって駆動軸20が回
転軸1に対して、軸J1を回転中心軸として時計回りに
回転され、これに連動して、図1(a)の実線に示すよ
うに、リンク部材16を介して揺動部材12の揺動作用
点がスピンベース4の回転中心(J1)から離れる方向
に揺動部材12が揺動付勢される。これにより、回動部
材11を挟んで揺動部材12の揺動作用点と反対側の側
方に延出され、回動部材11の回動軸芯J2を揺動支点
として揺動可能に回動部材11に設けられた保持アーム
13がスピンベース4の回転中心(J1)側に引き戻さ
れる方向に揺動付勢され、保持部14の保持面14aが
基板Wの外周端縁を押圧付勢して基板Wが保持される。
As described above, the air cylinder 27
The holding of the substrate W is released by extending the rod 27a of
When the rod 27a of the air cylinder 27 is contracted in a state where the lower surface of the outer peripheral end of the substrate W is placed on the upper surface of the rotating member 11, the driving shaft 20 is moved relative to the rotating shaft 1 by the restoring force of the coil spring 25. Rotating clockwise around the axis J1 as the rotation center axis, the point for the rocking operation of the rocking member 12 is linked via the link member 16 to the spin base 4 as shown by the solid line in FIG. The swinging member 12 is urged to swing away from the rotation center (J1) of the swinging member. As a result, the pivot member 11 extends to the side opposite to the pivot point for the pivot member 11 with the pivot member 11 therebetween, and pivots about the pivot axis J2 of the pivot member 11 as the pivot point. The holding arm 13 provided on the moving member 11 is oscillated in the direction of being pulled back toward the rotation center (J1) of the spin base 4, and the holding surface 14a of the holding portion 14 urges the outer peripheral edge of the substrate W. Thus, the substrate W is held.

【0036】そして、基板Wが保持された状態で、モー
ター3が回転軸1を軸J1回りに回転させることで、保
持された基板Wが軸J1回りに回転され、この基板Wに
対して所定の処理が施される。
When the motor 3 rotates the rotating shaft 1 about the axis J1 while the substrate W is held, the held substrate W is rotated about the axis J1, and a predetermined Is performed.

【0037】基板Wを保持して軸J1回りに回転させる
と、遠心力によって揺動部材12の揺動作用点(揺動部
材12とリンク部材16との連結部分)に図1(a)の
矢印F1方向に作用する力が働くが、同時に、回動部材
11を挟んで揺動部材12の揺動作用点と反対側の側方
に延出され、回動部材11の回動軸芯J2を揺動支点と
して揺動可能に回動部材11に設けられた保持アーム1
3にも、遠心力によって図1(a)の矢印F2方向に作
用する力が働くので、揺動部材12の揺動作用点に働く
力は、保持アーム13に働く力によって相殺され、揺動
部材12、保持アーム13は回転停止時の状態から揺動
変位せず、回動部材11は回転しない。従って、基板W
を軸J1回りに回転させても保持アーム13に設けられ
た保持部14の保持面14aが基板Wの外周端縁を押圧
する力は回転停止時と同じであり、基板Wのサイズ、回
転数にかかわらず、保持面14aは常にコイルバネ25
による付勢力に応じた力で基板Wの外周端縁を押圧付勢
し、それ以上の力で押圧することはない。よって、基板
Wのサイズにかかわらず、基板Wやスピンベース4(特
に、アーム部5)などの破損を招かず、また、回動部材
11が根元から折れるようなこともなく、基板Wを高速
回転させることができる。
When the substrate W is held and rotated about the axis J1, a centrifugal force causes the swinging member 12 to swing to the swinging point (the connecting portion between the swinging member 12 and the link member 16) as shown in FIG. A force acting in the direction of the arrow F1 acts, but at the same time, extends to the side opposite to the swinging operation point of the swinging member 12 with the rotating member 11 interposed therebetween. Arm 1 provided on pivoting member 11 so as to be pivotable with pivoting pivot
3 also exerts a force acting in the direction of arrow F2 in FIG. 1A due to the centrifugal force. Therefore, the force acting on the swing operation point of the swing member 12 is canceled by the force acting on the holding arm 13, and the swing is performed. The member 12 and the holding arm 13 do not swing from the state at the time of the rotation stop, and the rotating member 11 does not rotate. Therefore, the substrate W
Is rotated around the axis J1, the force by which the holding surface 14a of the holding portion 14 provided on the holding arm 13 presses the outer peripheral edge of the substrate W is the same as when the rotation is stopped, and the size and the number of rotations of the substrate W Irrespective of, the holding surface 14a is always the coil spring 25
Urges the outer peripheral edge of the substrate W with a force corresponding to the urging force of the substrate W, and does not press the outer peripheral edge with a force greater than that. Therefore, regardless of the size of the substrate W, the substrate W and the spin base 4 (particularly, the arm portion 5) are not damaged, and the rotating member 11 is not broken from the base, and the substrate W can be moved at a high speed. Can be rotated.

【0038】以下の変形例は後述する第2〜第4実施例
装置にも同様に適用できる。上記実施例では、全ての基
板保持部10を可動保持部として構成したが、少なくと
も1個の基板保持部10を可動保持部とし、残りを固定
保持部としてもよい。基板保持部10は、例えば、図4
(a)、(b)に示すように、スピンベース4のアーム
部5の先端部に固定立設された基板載置部17と、基板
載置部17の上面を段付きにして設けられた保持部18
とで構成される。基板Wは基板保持部10の回動部材1
1の上面、および、基板保持部10の基板載置部17の
上面の段付き部分に載置され、基板保持部10の保持部
14が基板Wの外周端縁を押圧付勢すると、基板Wの外
周端縁の他の部分が保持部18に押圧され、基板Wが保
持される。
The following modifications can be similarly applied to the devices of the second to fourth embodiments described later. In the above embodiment, all the substrate holding units 10 are configured as movable holding units. However, at least one substrate holding unit 10 may be configured as a movable holding unit, and the rest may be configured as fixed holding units. The substrate holding unit 10 is, for example, as shown in FIG.
As shown in (a) and (b), the substrate mounting portion 17 fixedly provided to the tip of the arm portion 5 of the spin base 4 and the upper surface of the substrate mounting portion 17 are provided with steps. Holder 18
It is composed of The substrate W is a rotating member 1 of the substrate holding unit 10.
1 and on the stepped portion of the upper surface of the substrate mounting portion 17 of the substrate holding portion 10, and when the holding portion 14 of the substrate holding portion 10 presses and urges the outer peripheral edge of the substrate W, the substrate W The other part of the outer peripheral edge is pressed by the holding part 18 to hold the substrate W.

【0039】また、図4(c)、(d)に示すように、
基板保持部10を、基板載置ピン19と保持部18とで
構成してもよい。
As shown in FIGS. 4C and 4D,
The substrate holding unit 10 may be configured by the substrate mounting pins 19 and the holding unit 18.

【0040】上記実施例では、基板保持部10を3個設
けているが、基板保持部10を3個以上にし、そのうち
の1個以上の基板保持部10を可動保持部としてもよ
い。
In the above embodiment, three substrate holders 10 are provided. However, three or more substrate holders 10 may be provided, and one or more of the substrate holders 10 may be a movable holder.

【0041】また、上記実施例では、回動部材11を基
板載置部として構成したが、図4(c)、(d)と同様
に、基板Wの下面を載置する基板載置ピン19を別途設
けて、回動部材11に基板Wを載置せずに、この基板載
置ピン19に基板Wの下面を載置するように構成しても
よい。
In the above embodiment, the rotating member 11 is configured as a substrate mounting portion. However, as in FIGS. 4C and 4D, the substrate mounting pins 19 for mounting the lower surface of the substrate W are provided. May be separately provided so that the lower surface of the substrate W is mounted on the substrate mounting pins 19 without mounting the substrate W on the rotating member 11.

【0042】上記実施例のスピンベース4は、アーム部
5を放射状に設けて構成しているが、図5に示すよう
に、スピンベース4を円板状に構成してもよい。
Although the spin base 4 of the above embodiment has the arm portions 5 provided radially, the spin base 4 may be formed in a disk shape as shown in FIG.

【0043】次に、本発明の第2実施例装置の構成を図
6ないし図8を参照して説明する。図6は、本発明の第
2実施例に係る回転式基板処理装置の基板保持機構の構
成を示す平面図であり、図7は、基板保持部の構成を示
す図、図8(a)は、基板が保持された状態を示す要部
平面図、図8(b)は、基板の保持が解除された状態を
示す要部平面図である。
Next, the structure of the second embodiment of the present invention will be described with reference to FIGS. FIG. 6 is a plan view illustrating a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a second embodiment of the present invention, FIG. 7 is a diagram illustrating a configuration of a substrate holding unit, and FIG. 8B is a plan view of a main part showing a state where the substrate is held, and FIG. 8B is a plan view of a main part showing a state where the holding of the substrate is released.

【0044】スピンベース4の構成およびスピンベース
4を軸J1回りに回転させる構成は上記第1実施例装置
と同様であるのでその詳述は省略する。また、第1変位
手段、第2変位手段などの構成、すなわち、駆動軸2
0、フランジ部21、22、ピン23、24、コイルバ
ネ25、ストッパー26、エアシリンダ27、部材28
などの構成も、上記第1実施例と同様の構成(図3参
照)であるのでその詳述は省略する。
The structure of the spin base 4 and the structure for rotating the spin base 4 around the axis J1 are the same as those of the first embodiment, and therefore, the detailed description thereof is omitted. Further, the configuration of the first displacement means, the second displacement means, and the like, that is, the drive shaft 2
0, flange portions 21, 22, pins 23, 24, coil spring 25, stopper 26, air cylinder 27, member 28
The configuration such as that described above is the same as that of the first embodiment (see FIG. 3), and thus the detailed description is omitted.

【0045】スピンベース4の各アーム部5の先端部に
基板保持部40が設けられている。図では、全ての基板
保持部40を可動保持部として構成している。
A substrate holding section 40 is provided at the tip of each arm section 5 of the spin base 4. In the figure, all the substrate holders 40 are configured as movable holders.

【0046】基板保持部40は、回動部材41、揺動部
材42、保持部43を備えている。
The substrate holding section 40 includes a rotating member 41, a swing member 42, and a holding section 43.

【0047】回動部材41は、鉛直軸J2回りに回動可
能にスピンベース4のアーム部5に設けられている。保
持部43は回動部材41の上面に段付き部41aを形成
するように、回動部材41の上面に設けられている。回
動部材41と保持部43とは別個の部材を接合してもよ
いが、一体の部材で構成、例えば、円柱状の部材の上部
を切り欠いて保持部43と段付き部41aとを形成して
もよい。この実施例では、回動部材41の段付き部41
aを基板載置部として用いるようしている。
The rotating member 41 is provided on the arm 5 of the spin base 4 so as to be rotatable around the vertical axis J2. The holding portion 43 is provided on the upper surface of the rotating member 41 so as to form a stepped portion 41 a on the upper surface of the rotating member 41. Although the rotating member 41 and the holding portion 43 may be joined to separate members, they are formed as an integral member, for example, the holding portion 43 and the stepped portion 41a are formed by cutting out the upper part of a columnar member. May be. In this embodiment, the stepped portion 41 of the rotating member 41 is used.
a is used as a substrate mounting portion.

【0048】揺動部材42は、回動部材41の側方に延
出され、回動部材41の回動軸芯J2を揺動支点として
揺動可能に回動部材41に設けられている。
The swing member 42 extends to the side of the swing member 41 and is swingably provided on the swing member 41 with the swing axis J2 of the swing member 41 as a swing fulcrum.

【0049】揺動部材42の先端部側にはピン42aが
設けられ、このピン42aがリンク部材50の先端部側
の切り欠き部51に係止されて連結されている。この実
施例では、ピン42aが揺動部材42の揺動作用点とな
る。
A pin 42 a is provided at the tip end of the swing member 42, and the pin 42 a is locked and connected to the notch 51 at the tip end of the link member 50. In this embodiment, the pin 42a serves as a swing operation point of the swing member 42.

【0050】各リンク部材50は、スピンベースの回転
中心(J1)を中心とした仮想円の半径方向に配置され
ている。また、各リンク部材50の基端部側は駆動軸2
0の上端部に固定されて連結されていて、スピンベース
4の回転中心軸J1と同軸回りに回動されるようになっ
ている。
Each link member 50 is arranged in the radial direction of an imaginary circle centered on the rotation center (J1) of the spin base. In addition, the base end side of each link member 50 is a drive shaft 2.
The spin base 4 is fixedly connected to an upper end of the spin base 4 and is rotated coaxially with the rotation center axis J1 of the spin base 4.

【0051】なお、各リンク部材50は、図6(a)に
示すように別体の部材で構成してもよいし、図6(b)
に示すように一体の部材で構成してもよい。
Each link member 50 may be formed as a separate member as shown in FIG. 6A, or may be formed as a separate member as shown in FIG.
As shown in FIG.

【0052】そして、後述するように、基板Wが保持さ
れた状態で、スピンベース4の回転中心(J1)を中心
とした仮想円の半径方向に沿って、揺動部材42の揺動
支点(J2)と揺動作用点(ピン42a)が一直線上に
並ぶように構成されている(図6、図8(a)参照)。
Then, as will be described later, with the substrate W held, along the radial direction of the imaginary circle centered on the rotation center (J1) of the spin base 4, the swing fulcrum of the swing member 42 ( J2) and the swing operation point (pin 42a) are arranged in a straight line (see FIGS. 6 and 8A).

【0053】エアシリンダ27のロッド27aを伸長す
ると、駆動軸20が回転軸1に対して、軸J1を回転中
心軸として反時計回りに回転され、これに連動して、リ
ンク部材50はスピンベース4の回転中心(J1)を回
転中心軸として反時計回りに回転される。これに伴っ
て、揺動部材42が揺動支点(J2)回りに逆方向(時
計回り)に揺動され、回動部材41が軸J2回りに逆方
向(時計回り)に回転される。この回動部材41の逆方
向への回転によって、図8(b)に示すように、保持部
43が基板Wの外周端縁から離れて基板Wの保持が解除
される。
When the rod 27a of the air cylinder 27 is extended, the drive shaft 20 is rotated counterclockwise with respect to the rotation shaft 1 around the axis J1 as a rotation center axis. 4 is rotated counterclockwise about the rotation center (J1) as the rotation center axis. Accordingly, the swing member 42 swings in the opposite direction (clockwise) around the swing fulcrum (J2), and the rotating member 41 rotates in the opposite direction (clockwise) around the axis J2. By the rotation of the rotating member 41 in the reverse direction, the holding portion 43 is separated from the outer peripheral edge of the substrate W, and the holding of the substrate W is released, as shown in FIG.

【0054】また、エアシリンダ27のロッド27aを
伸長させて基板Wの保持が解除され、回動部材41の上
面の段付き部41aに基板Wの外周端部の下面が載置さ
れた状態で、エアシリンダ27のロッド27aを収縮す
ると、コイルバネ25の復元力によって駆動軸20が回
転軸1に対して、軸J1を回転中心軸として時計回りに
回転付勢され、これに連動して、リンク部材50がスピ
ンベース4の回転中心(J1)を回転中心軸として時計
回りに回転付勢される。これに伴って、揺動部材42が
揺動支点(J2)回りに正方向(反時計回り)に揺動付
勢され、回動部材41が軸J2回りに正方向(反時計回
り)に回転付勢される。この回動部材41の正方向への
回転付勢によって、図6、図8(a)に示すように、保
持部43が基板Wの外周端縁を押圧付勢して基板Wが保
持される。このとき、図6、図8(a)に示すように、
スピンベース4の回転中心(J1)を中心とした仮想円
の半径方向に沿って、揺動部材42の揺動支点(J2)
と揺動作用点(ピン42a)が一直線上に並ぶ。
Further, the holding of the substrate W is released by extending the rod 27a of the air cylinder 27, and the lower surface of the outer peripheral end of the substrate W is placed on the stepped portion 41a on the upper surface of the rotating member 41. When the rod 27a of the air cylinder 27 is contracted, the driving shaft 20 is urged to rotate clockwise about the rotation shaft 1 with the axis J1 as the rotation center axis by the restoring force of the coil spring 25. The member 50 is urged to rotate clockwise about the rotation center (J1) of the spin base 4 as the rotation center axis. Accordingly, the swing member 42 is urged to swing in the forward direction (counterclockwise) around the swing fulcrum (J2), and the rotating member 41 rotates in the forward direction (counterclockwise) around the axis J2. Be energized. As shown in FIGS. 6 and 8A, the holding portion 43 presses and urges the outer peripheral edge of the substrate W to hold the substrate W by the rotation of the rotating member 41 in the forward direction. . At this time, as shown in FIG. 6 and FIG.
The fulcrum (J2) of the oscillating member 42 along the radial direction of the virtual circle centered on the rotation center (J1) of the spin base 4
And the swing operation point (pin 42a) are aligned on a straight line.

【0055】そして、基板Wが保持された状態で、モー
ター3が回転軸1を軸J1回りに回転させることで、保
持された基板Wが軸J1回りに回転され、この基板Wに
対して所定の処理が施される。
When the motor 3 rotates the rotating shaft 1 about the axis J1 while the substrate W is held, the held substrate W is rotated about the axis J1, and a predetermined Is performed.

【0056】基板Wを保持して軸J1回りに回転させる
と、揺動部材42の揺動作用点(ピン42a)に遠心力
が働くが、揺動部材42の揺動支点と揺動作用点は、ス
ピンベース4の回転中心(J1)を中心とした仮想円の
半径方向に沿って一直線上に並んでいるので、遠心力に
よって揺動部材42の揺動作用点に働く力は、揺動支点
(J2)方向に働き、揺動部材42は揺動せず、回動部
材41は回転しない。従って、基板Wを軸J1回りに回
転させても保持部43が基板Wの外周端縁を押圧する力
は回転停止時と同じであり、基板Wのサイズ、回転数に
かかわらず、保持部43は常にコイルバネ25よる付勢
力に応じた力で基板Wの外周端縁を押圧付勢し、それ以
上の力で押圧することはない。よって、基板Wのサイズ
にかかわらず、基板Wやスピンベース4(特に、アーム
部5)などの破損を招かず、また、回動部材41が根元
から折れるようなこともなく、基板Wを高速回転させる
ことができる。
When the substrate W is held and rotated about the axis J1, a centrifugal force acts on the pivoting point (pin 42a) of the pivoting member 42. Are arranged in a straight line along the radial direction of the virtual circle centered on the rotation center (J1) of the spin base 4, so that the force acting on the swing operation point of the swing member 42 due to centrifugal force is Working in the direction of the fulcrum (J2), the swing member 42 does not swing, and the rotating member 41 does not rotate. Therefore, even when the substrate W is rotated around the axis J1, the force by which the holding unit 43 presses the outer peripheral edge of the substrate W is the same as when the rotation is stopped, and regardless of the size and the number of rotations of the substrate W, the holding unit 43 Always presses and urges the outer peripheral edge of the substrate W with a force corresponding to the urging force of the coil spring 25, and does not press with more force. Therefore, regardless of the size of the substrate W, the substrate W and the spin base 4 (particularly, the arm portion 5) are not damaged, and the rotating member 41 is not broken from the root, and the substrate W can be moved at a high speed. Can be rotated.

【0057】次に、本発明の第3実施例装置の構成を図
9、図10を参照して説明する。図9は、本発明の第3
実施例に係る回転式基板処理装置の基板保持機構の構成
を示す平面図であり、図10(a)は、基板が保持され
た状態を示す要部平面図、図10(b)は、基板の保持
が解除された状態を示す要部平面図である。
Next, the structure of a device according to a third embodiment of the present invention will be described with reference to FIGS. FIG. 9 shows a third embodiment of the present invention.
FIG. 10A is a plan view illustrating a configuration of a substrate holding mechanism of the rotary substrate processing apparatus according to the embodiment. FIG. 10A is a main part plan view illustrating a state where the substrate is held, and FIG. FIG. 6 is a plan view of a main part showing a state in which the holding of is released.

【0058】スピンベース4の構成およびスピンベース
4を軸J1回りに回転させる構成は上記第1実施例装置
と同様であるのでその詳述は省略する。また、第1変位
手段、第2変位手段などの構成、すなわち、駆動軸2
0、フランジ部21、22、ピン23、24、コイルバ
ネ25、ストッパー26、エアシリンダ27、部材28
などの構成も、上記第1実施例と同様の構成(図3参
照)であるのでその詳述は省略する。
The structure of the spin base 4 and the structure for rotating the spin base 4 about the axis J1 are the same as those in the first embodiment, and therefore, the detailed description thereof is omitted. Further, the configuration of the first displacement means, the second displacement means, and the like, that is, the drive shaft 2
0, flange portions 21, 22, pins 23, 24, coil spring 25, stopper 26, air cylinder 27, member 28
The configuration such as that described above is the same as that of the first embodiment (see FIG. 3), and thus the detailed description is omitted.

【0059】スピンベース4の各アーム部5の先端部に
基板保持部60が設けられている。図では、全ての基板
保持部60を可動保持部として構成している。
A substrate holder 60 is provided at the tip of each arm 5 of the spin base 4. In the figure, all the substrate holders 60 are configured as movable holders.

【0060】基板保持部60は、回動部材61、揺動部
材62、カウンタウエイト63、保持部64を備えてい
る。
The substrate holding section 60 includes a rotating member 61, a swinging member 62, a counterweight 63, and a holding section 64.

【0061】回動部材61、保持部64は、上述した第
2実施例の回動部材41、保持部43と同様の構成であ
るのでその詳述は省略する。
The rotating member 61 and the holding portion 64 have the same configuration as the rotating member 41 and the holding portion 43 of the above-described second embodiment, so that the detailed description is omitted.

【0062】揺動部材62は、回動部材61を挟んで左
右の側方に延出され、回動部材61の回動軸芯J2を揺
動支点として揺動可能に回動部材61に設けられてい
る。この揺動部材62の一方の側方には、リンク部材7
0の先端部側が回動可能に連結されていて、この揺動部
材62とリンク部材70との連結部分が揺動作用点にな
っている。また、揺動部材62の他方の側面(回動部材
61を挟んで揺動部材62の揺動作用点と反対側の側
面)には、回動部材61と連結されてカウンタウエイト
63が設けられている。
The swinging member 62 extends to the left and right with the rotating member 61 interposed therebetween, and is provided on the rotating member 61 so as to be swingable about the rotation axis J2 of the rotating member 61 as a swing fulcrum. Have been. A link member 7 is provided on one side of the swing member 62.
The leading end side of the pivot member 0 is rotatably connected, and the connecting portion between the swing member 62 and the link member 70 is a swing operation point. A counter weight 63 is provided on the other side surface of the swing member 62 (the side surface opposite to the swing operation point of the swing member 62 with the swing member 61 interposed therebetween) connected to the swing member 61. ing.

【0063】なお、図面では、揺動部材62にカウンタ
ウエイト63を設けるように構成しているが、揺動部材
62を第1実施例のように構成し、第1実施例の保持ア
ーム13と同様の部材を回動部材61に設け、この部材
にカウンタウエイト63を設けるように構成してもよ
い。
Although the counterweight 63 is provided on the swinging member 62 in the drawing, the swinging member 62 is formed as in the first embodiment, and the holding arm 13 of the first embodiment is connected to the counterweight 63. A similar member may be provided on the rotating member 61, and the counterweight 63 may be provided on this member.

【0064】各リンク部材70の基端部側は、駆動軸2
0の上端部に回動可能に連結されていて、第1実施例と
同様に、このリンク部材70を介して、コイルバネ25
の付勢やエアシリンダ27の付勢の解除を揺動部材62
の揺動作用点に作用させるように構成している。
The base end side of each link member 70 is
0, and is rotatably connected to the upper end of the coil spring 25 via the link member 70 as in the first embodiment.
Of the air cylinder 27 and the release of the
It is configured to act on the rocking operation point of.

【0065】エアシリンダ27のロッド27aを伸長す
ると、駆動軸20が回転軸1に対して、軸J1を回転中
心軸として反時計回りに回転され、これに連動して、リ
ンク部材70を介して揺動部材62の揺動作用点(揺動
部材62とリンク部材70との連結部分)がスピンベー
ス4の回転中心(J1)側に引き戻される方向に揺動部
材62が揺動され、回動部材61が軸J2回りに逆方向
(時計回り)に回転される。この回動部材61の逆方向
への回転によって、図10(b)に示すように、保持部
64が基板Wの外周端縁から離れて基板Wの保持が解除
される。
When the rod 27a of the air cylinder 27 is extended, the drive shaft 20 is rotated counterclockwise with respect to the rotary shaft 1 around the axis J1 as a rotation center axis. The rocking member 62 is rocked and turned in a direction in which the rocking operation point of the rocking member 62 (the connecting portion between the rocking member 62 and the link member 70) is pulled back toward the rotation center (J1) of the spin base 4. The member 61 is rotated in the opposite direction (clockwise) around the axis J2. By the rotation of the rotating member 61 in the reverse direction, the holding portion 64 is separated from the outer peripheral edge of the substrate W, and the holding of the substrate W is released, as shown in FIG.

【0066】また、上述したように、エアシリンダ27
のロッド27aを伸長させて基板Wの保持が解除され、
回動部材61の上面の段付き部分に基板Wの外周端部の
下面が載置された状態で、エアシリンダ27のロッド2
7aを収縮すると、コイルバネ25の復元力によって駆
動軸20が回転軸1に対して、軸J1を回転中心軸とし
て時計回りに回転され、これに連動して、リンク部材7
0を介して揺動部材62の揺動作用点がスピンベース4
の回転中心(J1)から離れる方向に揺動部材62が揺
動付勢され、回動部材61が軸J2回りに正方向(反時
計回り)に回転される。この回動部材61の正方向への
回転によって、図9、図10(a)に示すように、保持
部64が基板Wの外周端縁を押圧付勢して基板Wが保持
される。
As described above, the air cylinder 27
The holding of the substrate W is released by extending the rod 27a of
With the lower surface of the outer peripheral end of the substrate W placed on the stepped portion on the upper surface of the rotating member 61, the rod 2 of the air cylinder 27 is
When the coil spring 7a is contracted, the drive shaft 20 is rotated clockwise about the rotation shaft 1 with the axis J1 as the rotation center axis by the restoring force of the coil spring 25.
The pivoting point of the pivoting member 62 through the spin base 4
The swing member 62 is urged to swing away from the center of rotation (J1), and the rotating member 61 is rotated in the forward direction (counterclockwise) around the axis J2. By the rotation of the rotating member 61 in the forward direction, the holding portion 64 presses and biases the outer peripheral edge of the substrate W to hold the substrate W as shown in FIGS.

【0067】そして、基板Wが保持された状態で、モー
ター3が回転軸1を軸J1回りに回転させることで、保
持された基板Wが軸J1回りに回転され、この基板Wに
対して所定の処理が施される。
Then, while the substrate W is held, the motor 3 rotates the rotating shaft 1 about the axis J1, so that the held substrate W is rotated about the axis J1. Is performed.

【0068】基板Wを保持して軸J1回りに回転させる
と、遠心力によって揺動部材62の揺動作用点(揺動部
材62とリンク部材70との連結部分)に図9の矢印F
方向に作用する力が働くが、回動部材61を挟んで揺動
部材62の揺動作用点と反対側の側方に回動部材61に
連結されてカウンタウエイト63を設けているので、揺
動部材62の揺動作用点(揺動部材62とリンク部材7
0との連結部分)に働く力Fは、カウントウエイト63
によって相殺され、揺動部材62は回転停止時の状態か
ら揺動変位せず、回動部材61は回転しない。従って、
基板Wを回転させても回動部材61に設けられた保持部
64が基板Wの外周端縁を押圧する力は回転停止時と同
じであり、基板Wのサイズ、回転数にかかわらず、保持
部64は常にコイルバネ25による付勢力に応じた力で
基板Wの外周端縁を押圧付勢し、それ以上の力で押圧す
ることはない。よって、基板Wのサイズにかかわらず、
基板Wやスピンベース4(特に、アーム部5)などの破
損を招かず、また、回動部材61が根元から折れるよう
なこともなく、基板Wを高速回転させることができる。
When the substrate W is rotated around the axis J1 while holding the substrate W, the arrow F in FIG.
Although a force acting in the direction acts, the counterweight 63 is provided on the side opposite to the swinging point of the swinging member 62 with the counterweight 63 interposed therebetween. The point for the swing operation of the moving member 62 (the swing member 62 and the link member 7
The force F acting on the portion connected to 0) is the count weight 63
The swing member 62 does not swing displace from the state at the time of the rotation stop, and the rotating member 61 does not rotate. Therefore,
Even when the substrate W is rotated, the force with which the holding portion 64 provided on the rotating member 61 presses the outer peripheral edge of the substrate W is the same as when the rotation is stopped, and regardless of the size and the number of rotations of the substrate W, the holding force is maintained. The portion 64 always presses and urges the outer peripheral edge of the substrate W with a force corresponding to the urging force of the coil spring 25, and does not press with an excessive force. Therefore, regardless of the size of the substrate W,
The substrate W can be rotated at high speed without causing damage to the substrate W, the spin base 4 (particularly, the arm portion 5), and the like, and without causing the rotating member 61 to be broken from the root.

【0069】次に、本発明の第4実施例装置の構成を図
11、図12を参照して説明する。図11は、本発明の
第4実施例装置の第1変位手段と第2変位手段の構成を
示す図であり、図12(a)は、基板が保持された状態
を示す要部平面図、図12(b)は、基板の保持が解除
された状態を示す要部平面図である。
Next, the structure of a device according to a fourth embodiment of the present invention will be described with reference to FIGS. FIG. 11 is a view showing the configuration of the first displacement means and the second displacement means of the device of the fourth embodiment of the present invention, and FIG. 12 (a) is a plan view of a main part showing a state where the substrate is held, FIG. 12B is a main part plan view showing a state where the holding of the substrate is released.

【0070】上記第3実施例装置では、揺動部材62の
揺動作用点がスピンベース4の回転中心(J1)から離
れる方向に揺動部材62が揺動されるようにコイルバネ
25が付勢することで、保持部64が基板Wの外周端縁
を押圧付勢し、エアシリンダ27によって、コイルバネ
25の付勢に抗して揺動部材62の揺動作用点がスピン
ベース4の回転中心(J1)側に引き戻される方向に揺
動部材62が揺動されることで、基板Wの保持を解除す
るように構成したが、この第4実施例装置では、揺動部
材62の揺動作用点がスピンベース4の回転中心(J
1)側に引き戻される方向に揺動部材62が揺動される
ようにコイルバネ25が付勢することで、保持部64が
基板Wの外周端縁を押圧付勢し、エアシリンダ27によ
って、コイルバネ25の付勢に抗して揺動部材62の揺
動作用点がスピンベース4の回転中心(J1)から離れ
る方向に揺動部材62が揺動されることで、基板Wの保
持を解除するように構成している。
In the third embodiment, the coil spring 25 is urged so that the swinging point of the swinging member 62 moves away from the center of rotation (J1) of the spin base 4. Then, the holding portion 64 presses and urges the outer peripheral edge of the substrate W, and the air cylinder 27 causes the swinging point of the swinging member 62 to rotate against the rotation of the spin base 4 against the biasing of the coil spring 25. Although the holding of the substrate W is released by swinging the swinging member 62 in the direction of being pulled back to the (J1) side, in the fourth embodiment, the swinging member 62 swings. The point is the center of rotation (J
1) When the coil spring 25 is urged to swing the swing member 62 in the direction of being pulled back to the side, the holding portion 64 presses and urges the outer peripheral edge of the substrate W. The holding of the substrate W is released by the swing member 62 being swung in a direction in which the swing operation point of the swing member 62 is away from the rotation center (J1) of the spin base 4 against the bias of 25. It is configured as follows.

【0071】具体的には、例えば、図11に示すよう
に、フランジ部21、22に設けるピン23、24の取
り付け位置を、図3の構成と逆にすることで、コイルバ
ネ25によって、駆動軸20が回転軸1に対して、軸J
1を回転中心軸として反時計回りに回転付勢され、これ
に伴って、揺動部材62の揺動作用点(揺動部材62と
リンク部材70との連結部分)がスピンベース4の回転
中心(J1)側に引き戻される方向に揺動部材62が揺
動されるように付勢される。
More specifically, for example, as shown in FIG. 11, the mounting positions of the pins 23 and 24 provided on the flange portions 21 and 22 are reversed from those in FIG. 20 is the axis J with respect to the rotation axis 1.
1 is rotated counterclockwise about the rotation center axis, and accordingly, the swing operation point of the swing member 62 (the connecting portion between the swing member 62 and the link member 70) is rotated by the rotation center of the spin base 4. The swing member 62 is urged to swing in the direction of being pulled back to the (J1) side.

【0072】そして、回動部材61に設ける保持部64
の位置を、第3実施例装置に比べて、軸J2を中心とし
て時計回りにずらせれば、図12(a)に示すように、
コイルバネ25の復元力によって、揺動部材62の揺動
作用点がスピンベース4の回転中心(J1)側に引き戻
される方向に揺動部材62が揺動付勢されることで、保
持部64が基板Wの外周端縁を押圧付勢することができ
る。
The holding portion 64 provided on the rotating member 61
Is shifted clockwise about the axis J2 as compared with the device of the third embodiment, as shown in FIG.
By the restoring force of the coil spring 25, the swing member 62 is urged to swing in a direction in which the swing operation point of the swing member 62 is pulled back to the rotation center (J1) side of the spin base 4, whereby the holding portion 64 is moved. The outer peripheral edge of the substrate W can be pressed and urged.

【0073】また、エアシリンダ27、部材28の取り
付け位置を図3の構成と逆にすることで、エアシリンダ
27のロッド27aを伸長すれば、コイルバネ25の付
勢に抗して駆動軸20が回転軸1に対して、軸J1を回
転中心軸として時計回りに回転され、これに伴って、揺
動部材62の揺動作用点がスピンベース4の回転中心
(J1)から離れる方向に揺動部材62が揺動され、基
板Wの保持を解除することができる(図12(b)参
照)。
Also, by reversing the mounting position of the air cylinder 27 and the member 28 from the configuration shown in FIG. 3, if the rod 27 a of the air cylinder 27 is extended, the drive shaft 20 will resist the urging of the coil spring 25. With respect to the rotation shaft 1, the rotation member is rotated clockwise around the axis J1 as a rotation center axis, and accordingly, the swing operation point of the swing member 62 swings away from the rotation center (J1) of the spin base 4. The member 62 is swung, and the holding of the substrate W can be released (see FIG. 12B).

【0074】なお、この第4実施例装置における回動部
材61の回転の正方向(逆方向)は、第3実施例装置と
逆に、軸J2を中心に時計回り(反時計回り)に回転さ
れる方向に設定されている。その他の構成は第3実施例
と同様であるのでその詳述は省略する。
The forward direction (reverse direction) of the rotation of the rotating member 61 in the fourth embodiment is rotated clockwise (counterclockwise) about the axis J2, contrary to the third embodiment. Direction is set. The other configuration is the same as that of the third embodiment, and the detailed description is omitted.

【0075】この第4実施例装置で基板Wを保持して軸
J1回りに回転させると、遠心力によって揺動部材62
の揺動作用点(揺動部材62とリンク部材70との連結
部分)がスピンベース4の回転中心(J1)から離れる
方向に揺動部材62が揺動するような力が働くが、これ
は揺動部材62がコイルバネ25によって付勢されてい
る方向と逆の方向であるので、保持部64が基板Wを保
持する押圧力が遠心力によって増すことはなく、基板W
のサイズ、回転数にかかわらず、基板Wやスピンベース
4(特に、アーム部5)などを破損せず、回動部材61
が根元から折れることなどもない。
When the substrate W is held and rotated around the axis J1 by the apparatus of the fourth embodiment, the swing member 62 is rotated by centrifugal force.
A force acts such that the rocking member 62 rocks in a direction in which the rocking operation point (the connecting portion between the rocking member 62 and the link member 70) moves away from the rotation center (J1) of the spin base 4. Since the swinging member 62 is in the direction opposite to the direction in which the swinging member 62 is urged by the coil spring 25, the pressing force for holding the substrate W by the holding portion 64 does not increase due to the centrifugal force.
Irrespective of the size and the number of rotations, the rotation member 61 does not damage the substrate W or the spin base 4 (particularly, the arm portion 5).
Is not broken from the root.

【0076】しかしながら、遠心力によって揺動部材6
2が付勢されている方向と逆の方向に揺動されることに
より、回動部材61は基板を解除する側の逆方向に回転
されることになり、基板Wを軸J1回りに回転すること
に伴って保持部64による基板Wの保持が弱められ、高
速回転させると基板Wの保持が解除されることにもな
る。しかしながら、この第4実施例装置では、回動部材
61を挟んで揺動部材62の揺動作用点と反対側の側方
に回動部材61に連結されてカウンタウエイト63を設
けているので、遠心力によって揺動部材62の揺動作用
点に働く力は、カウンタウエイト63によって相殺さ
れ、揺動部材62は回転停止時の状態から揺動変位せ
ず、回動部材61は回転しない。従って、基板Wを軸J
1回りに回転させても保持部64が基板Wの外周端縁を
押圧する力は回転停止時と同じであり、保持部64によ
る基板Wの保持が弱められることはない。
However, due to the centrifugal force, the swing member 6
By swinging in the direction opposite to the direction in which the substrate 2 is biased, the rotating member 61 is rotated in the direction opposite to the direction in which the substrate is released, and rotates the substrate W around the axis J1. Accordingly, the holding of the substrate W by the holding unit 64 is weakened, and when the substrate W is rotated at a high speed, the holding of the substrate W is released. However, in the device of the fourth embodiment, the counterweight 63 is provided by being connected to the pivoting member 61 on the side opposite to the pivoting point of the pivoting member 62 with the pivoting member 61 interposed therebetween. The force acting on the rocking operation point of the rocking member 62 due to the centrifugal force is canceled by the counterweight 63, so that the rocking member 62 does not rock and displace from the state when the rotation is stopped, and the rotating member 61 does not rotate. Therefore, the substrate W is
Even if it rotates one turn, the force with which the holding unit 64 presses the outer peripheral edge of the substrate W is the same as when the rotation is stopped, and the holding of the substrate W by the holding unit 64 is not weakened.

【0077】[0077]

【発明の効果】以上の説明から明らかなように、請求項
1に記載の発明によれば、基板の外周端部に当接する保
持面を、回動部材を挟んで揺動部材とは反対側の側方に
延出され、回動部材の回動軸芯を支点として揺動可能に
回動部材に設けられた保持部材に設けているので、基板
を保持して鉛直軸回りに回転させたときに、遠心力によ
って揺動部材の揺動作用点に働く力は、遠心力によって
保持部材に働く力によって相殺され、基板のサイズ、回
転数にかかわらず保持面が基板の外周端部に当接する力
を常に一定にできる。従って、基板のサイズにかかわら
ず、基板やスピンベースなどの破損を招かずに基板を高
速回転させることができる。
As is apparent from the above description, according to the first aspect of the present invention, the holding surface that abuts on the outer peripheral end of the substrate is on the opposite side to the swing member with the rotating member interposed therebetween. Is provided on the holding member provided on the rotating member so as to be swingable with the rotation axis of the rotating member as a fulcrum, so that the substrate is held and rotated about the vertical axis. Sometimes, the force acting on the swinging point of the swinging member due to the centrifugal force is offset by the force acting on the holding member due to the centrifugal force, so that the holding surface contacts the outer peripheral end of the substrate regardless of the size and the number of rotations of the substrate. The contact force can always be constant. Therefore, regardless of the size of the substrate, the substrate can be rotated at high speed without damaging the substrate, the spin base, and the like.

【0078】請求項2に記載の発明によれば、基板が保
持された状態で、スピンベースの回転中心を中心とした
仮想円の半径方向に沿って、揺動部材の揺動支点と揺動
作用点が一直線上に並ぶように構成したので、基板を保
持して鉛直軸回りに回転させたときに、揺動部材の揺動
作用点に働く遠心力は揺動支点方向に働き、揺動部材は
揺動せず、揺動部材の揺動で回動される回動部材は回転
しない。従って、基板のサイズ、回転数にかかわらず回
動部材に設けられた保持部材が基板を保持する力を常に
一定にでき、基板のサイズにかかわらず、基板やスピン
ベースなどの破損を招かずに基板を高速回転させること
ができる。
According to the second aspect of the present invention, while the substrate is held, the swinging fulcrum of the swinging member and the swinging motion along the radial direction of the virtual circle centered on the rotation center of the spin base. Since the points of use are arranged in a straight line, when the substrate is held and rotated about a vertical axis, the centrifugal force acting on the point of the rocking motion of the rocking member acts in the direction of the rocking fulcrum, The member does not swing, and the rotating member rotated by the swing of the swing member does not rotate. Therefore, regardless of the size of the substrate and the number of rotations, the holding member provided on the rotating member can always maintain a constant force for holding the substrate, regardless of the size of the substrate without causing damage to the substrate or the spin base. The substrate can be rotated at high speed.

【0079】請求項3に記載の発明によれば、回動部材
を挟んで揺動部材の揺動作用点と反対側の側方に回動部
材に連結されてカウンタウエイトと設けているので、基
板を保持して鉛直軸回りに回転させたときに、遠心力に
よって揺動部材の揺動作用点に働く力は、カウンタウエ
イトによって相殺され、基板のサイズ、回転数にかかわ
らず保持部材が基板を保持する力を常に一定にできる。
従って、基板のサイズにかかわらず、基板やスピンベー
スなどの破損を招かずに、または、基板の保持を弱める
ことなく、基板を高速回転させることができる。
According to the third aspect of the present invention, the counterweight is provided on the side opposite to the swing operation point of the swing member with the counterweight interposed therebetween. When the substrate is held and rotated about a vertical axis, the force acting on the swinging point of the swinging member due to the centrifugal force is canceled by the counterweight, and the holding member is moved regardless of the size and the number of rotations of the substrate. Can be kept constant at all times.
Therefore, regardless of the size of the substrate, the substrate can be rotated at a high speed without causing damage to the substrate or the spin base, or without weakening the holding of the substrate.

【0080】請求項4に記載の発明によれば、第1変位
手段と第2変位手段とによる変位力は回転部材を回転さ
せ、スピンベースの回転軸に挿通されている駆動軸およ
びリンク部材を介して揺動部材に伝えているので、第1
変位手段と第2変位手段とによる変位力が基板を保持す
る保持部材に確実に伝えることができる。
According to the fourth aspect of the present invention, the displacement force generated by the first displacement means and the second displacement means rotates the rotating member, and causes the driving shaft and the link member inserted through the rotating shaft of the spin base to rotate. To the swinging member via
The displacement force by the displacement means and the second displacement means can be reliably transmitted to the holding member that holds the substrate.

【0081】請求項5に記載の発明によれば、基板を保
持する側への可動保持部の変位はバネ機構で行い、基板
の保持を解除する側への可動保持部の変位はエアシリン
ダで行っているので、保持部材による基板の保持および
解除を簡単な駆動系で行うことができる。
According to the fifth aspect of the present invention, the displacement of the movable holding portion toward the side for holding the substrate is performed by the spring mechanism, and the displacement of the movable holding portion toward the side for releasing the holding of the substrate is performed by the air cylinder. Because of this, the holding and release of the substrate by the holding member can be performed by a simple drive system.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1実施例に係る回転式基板処理装置
の基板保持機構の構成を示す平面図であり、基板が保持
された状態と基板の保持が解除された状態とを示す図で
ある。
FIG. 1 is a plan view showing a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a first embodiment of the present invention, showing a state where a substrate is held and a state where the holding of a substrate is released. It is.

【図2】第1実施例装置の可動保持部の構成を示す斜視
図である。
FIG. 2 is a perspective view illustrating a configuration of a movable holding unit of the first embodiment.

【図3】第1変位手段、第2変位手段の一例の構成を示
す図である。
FIG. 3 is a diagram illustrating a configuration of an example of a first displacement unit and a second displacement unit.

【図4】固定保持部の一例の構成を示す図である。FIG. 4 is a diagram illustrating a configuration of an example of a fixed holding unit.

【図5】スピンベースを円板状に構成した変形例の構成
を示す図である。
FIG. 5 is a diagram showing a configuration of a modification in which the spin base is formed in a disk shape.

【図6】本発明の第2実施例に係る回転式基板処理装置
の基板保持機構の構成を示す平面図である。
FIG. 6 is a plan view illustrating a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a second embodiment of the present invention.

【図7】第2実施例装置の基板保持部の構成を示す図で
ある。
FIG. 7 is a diagram illustrating a configuration of a substrate holding unit of the second embodiment apparatus.

【図8】第2実施例装置によって基板が保持された状態
と基板の保持が解除された状態を示す要部平面図であ
る。
FIG. 8 is a plan view of a main part showing a state where the substrate is held by the apparatus of the second embodiment and a state where the holding of the substrate is released.

【図9】本発明の第3実施例に係る回転式基板処理装置
の基板保持機構の構成を示す平面図である。
FIG. 9 is a plan view illustrating a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a third embodiment of the present invention.

【図10】第3実施例装置によって基板が保持された状
態と基板の保持が解除された状態を示す要部平面図であ
る。
FIG. 10 is a plan view of a main part showing a state where the substrate is held by the apparatus of the third embodiment and a state where the holding of the substrate is released.

【図11】本発明の第4実施例装置の第1変位手段と第
2変位手段の構成を示す図である。
FIG. 11 is a diagram showing a configuration of a first displacement unit and a second displacement unit of the device according to the fourth embodiment of the present invention.

【図12】第4実施例装置によって基板が保持された状
態と基板の保持が解除された状態を示す要部平面図であ
る。
FIG. 12 is a main part plan view showing a state where the substrate is held by the apparatus of the fourth embodiment and a state where the holding of the substrate is released.

【図13】従来例に係る回転式基板処理装置の基板保持
機構の構成を示す平面図である。
FIG. 13 is a plan view illustrating a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a conventional example.

【図14】従来装置によって基板を保持した状態と基板
の保持が解除された状態を示す要部平面図である。
FIG. 14 is a main part plan view showing a state where the substrate is held by the conventional device and a state where the holding of the substrate is released.

【符号の説明】[Explanation of symbols]

4:スピンベース 10、40、60:基板保持部 11、41、61:回動部材 12、42、62:揺動部材 13:保持アーム 14、43、64:保持部 14a:保持部の保持面 16、50、70:リンク部材 20:駆動軸 25:コイルバネ 27:エアシリンダ 63:カウンタウエイト W:基板 J1:基板の回転中心軸 J2:回動部材の回動中心軸(揺動部材の揺動支点) 4: spin base 10, 40, 60: substrate holding part 11, 41, 61: rotating member 12, 42, 62: swing member 13: holding arm 14, 43, 64: holding part 14a: holding surface of holding part 16, 50, 70: link member 20: drive shaft 25: coil spring 27: air cylinder 63: counterweight W: substrate J1: substrate rotation center axis J2: rotation member rotation center axis (swing member swing) fulcrum)

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI H01L 21/30 569C (72)発明者 山田 邦夫 京都府京都市伏見区羽束師古川町322 大 日本スクリーン製造株式会社洛西事業所内 (72)発明者 小山 芳弘 京都府京都市伏見区羽束師古川町322 大 日本スクリーン製造株式会社洛西事業所内 (72)発明者 渡辺 純 京都府京都市伏見区羽束師古川町322 大 日本スクリーン製造株式会社洛西事業所内────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. 6 Identification code FI H01L 21/30 569C (72) Inventor Kunio Yamada 322 Hashizushi Furukawa-cho, Fushimi-ku, Kyoto-shi, Kyoto Japan Nippon Screen Manufacturing Co., Ltd. (72) Inventor Yoshihiro Koyama 322, Hazushi Furukawacho, Fushimi-ku, Kyoto, Japan Nippon Screen Manufacturing Co., Ltd. (72) Inventor Jun Watanabe 322 Hashizushi Furukawa-cho, Fushimi-ku, Kyoto, Kyoto Nippon Screen Manufacturing Co., Ltd. Rakusai Office

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 基板を保持する基板保持機構において、 鉛直軸回りに回転可能なスピンベースと、 基板の外周端部を3箇所以上で保持するために3つ以上
有しており、その3つ以上のうち少なくとも1つが可動
保持部である基板保持部と、 基板を保持する側に前記可動保持部を変位させるための
第1変位手段と、 基板の保持を解除する側に前記可動保持部を変位させる
ための第2変位手段と、 前記可動保持部と前記第1変位手段および前記第2変位
手段とを連結させる連結手段と、を備え、 前記可動保持部は、 前記スピンベースに設けられ、鉛直軸回りに回動可能な
回動部材と、 前記回動部材の側方に延出され、前記回動部材の回動軸
芯を支点として揺動可能に前記回動部材に設けられて、
前記連結手段に連結された揺動部材と、 前記回動部材を挟んで前記揺動部材とは反対側の側方に
延出され、前記回動部材の回動軸芯を支点として揺動可
能に前記回動部材に設けられ、かつ基板の外周端部に当
接する保持面を有する保持部材と、を備えることを特徴
とする基板保持機構。
1. A substrate holding mechanism for holding a substrate, comprising: a spin base rotatable around a vertical axis; and three or more spin holders for holding an outer peripheral end of the substrate at three or more positions. A substrate holding unit, at least one of which is a movable holding unit; first displacement means for displacing the movable holding unit to a side for holding the substrate; and a movable holding unit on the side for releasing the holding of the substrate. A second displacing means for displacing; and a connecting means for connecting the movable holding part to the first displacing means and the second displacing means, wherein the movable holding part is provided on the spin base, A turning member rotatable around a vertical axis, and extending to the side of the turning member, provided on the turning member so as to be swingable about a turning axis of the turning member as a fulcrum,
A swinging member connected to the connecting means, and extending to the side opposite to the swinging member with the rotating member interposed therebetween, and capable of swinging about a rotation axis of the rotating member as a fulcrum. A holding member provided on the rotating member and having a holding surface in contact with an outer peripheral end of the substrate.
【請求項2】 基板を保持する基板保持機構において、 鉛直軸回りに回転可能なスピンベースと、 基板の外周端部を3箇所以上で保持するために3つ以上
有しており、その3つ以上のうち少なくとも1つが可動
保持部である基板保持部と、 基板を保持する側に前記可動保持部を変位させるための
第1変位手段と、 基板の保持を解除する側に前記可動保持部を変位させる
ための第2変位手段と、 前記可動保持部と前記第1変位手段および前記第2変位
手段とを連結させる連結手段と、を備え、 前記可動保持部は、 前記スピンベースに設けられ、鉛直軸回りに回動可能な
回動部材と、 前記回動部材の側方に延出され、前記回動部材の回動軸
芯を揺動支点として揺動可能に前記回動部材に設けられ
て、前記連結手段に連結された揺動部材と、 前記回動部材の回動軸芯を回転支点として回転可能に前
記回動部材に設けられ、前記回動部材の正逆回転に応じ
て基板の保持および解除が可能である保持部材と、を備
え、 前記保持部材が基板を保持したとき、前記揺動部材の揺
動作用点と前記揺動支点とが、前記スピンベースの回転
中心を中心とした仮想円の半径方向に沿って一直線上に
並ぶように構成したことを特徴とする基板保持機構。
2. A substrate holding mechanism for holding a substrate, comprising: a spin base rotatable around a vertical axis; and three or more spin holders for holding an outer peripheral end of the substrate at three or more positions. A substrate holding unit, at least one of which is a movable holding unit; first displacement means for displacing the movable holding unit to a side for holding the substrate; and a movable holding unit on the side for releasing the holding of the substrate. A second displacing means for displacing; and a connecting means for connecting the movable holding part to the first displacing means and the second displacing means, wherein the movable holding part is provided on the spin base, A rotating member rotatable around a vertical axis; a rotating member that extends to the side of the rotating member and is swingably provided on the rotating member with a rotating shaft center of the rotating member as a swing fulcrum. A swing member connected to the connecting means; A holding member rotatably provided on the turning member with the turning shaft center of the turning member as a rotation fulcrum, and capable of holding and releasing the substrate in accordance with forward and reverse rotation of the turning member. When the holding member holds the substrate, the swing operation point of the swing member and the swing fulcrum are aligned on a straight line along the radial direction of an imaginary circle centered on the rotation center of the spin base. A substrate holding mechanism configured as described above.
【請求項3】 基板を保持する基板保持機構において、 鉛直軸回りに回転可能なスピンベースと、 基板の外周端部を3箇所以上で保持するために3つ以上
有しており、その3つ以上のうち少なくとも1つが可動
保持部である基板保持部と、 基板を保持する側に前記可動保持部を変位させるための
第1変位手段と、 基板の保持を解除する側に前記可動保持部を変位させる
ための第2変位手段と、 前記可動保持部と前記第1変位手段および前記第2変位
手段とを連結させる連結手段と、を備え、 前記可動保持部は、 前記スピンベースに設けられ、鉛直軸回りに回動可能な
回動部材と、 前記回動部材を挟んで両側に延出され、一方側が揺動作
用点であるとともに他方側にカウンタウエイトを有し、
前記回動部材の回動軸芯を支点として揺動可能に前記回
動部材に設けられて、前記連結手段に連結された揺動部
材と、 前記回動部材の回動軸芯を支点として回転可能に前記回
動部材に設けられ、前記回動部材の正逆回転に応じて基
板の保持および解除が可能である保持部材と、を備える
ことを特徴とする基板保持機構。
3. A substrate holding mechanism for holding a substrate, comprising: a spin base rotatable around a vertical axis; and three or more spin holders for holding an outer peripheral end of the substrate at three or more positions. A substrate holding unit, at least one of which is a movable holding unit; first displacement means for displacing the movable holding unit to a side for holding the substrate; and a movable holding unit on the side for releasing the holding of the substrate. A second displacing means for displacing; and a connecting means for connecting the movable holding part to the first displacing means and the second displacing means, wherein the movable holding part is provided on the spin base, A rotating member rotatable around a vertical axis, extending on both sides with the rotating member interposed therebetween, one side being a swing operation point and having a counter weight on the other side,
A swinging member provided on the rotating member so as to be swingable about a rotation axis of the rotation member as a fulcrum, and a swinging member connected to the connecting means; and a rotation about the rotation axis of the rotation member as a fulcrum. A holding member provided on the rotating member so as to be able to hold and release the substrate in accordance with forward and reverse rotation of the rotating member.
【請求項4】 請求項1ないし請求項3のいずれかに記
載の基板保持機構において、 前記連結手段は、 前記スピンベースに沿って配置され、揺動部材に連結さ
れているリンク部材と、 前記リンク部材に設けられ、前記スピンベースの回転軸
に挿通されている駆動軸と、 前記駆動軸に設けられた回転部材と、を備え、 前記第1変位手段は、前記保持部材により基板を保持さ
せるように、回転部材を一方向に回転させ、 前記第2変位手段は、前記保持部材による基板の保持を
解除させるように、回転部材を他方向に回転させること
を特徴とする基板保持機構。
4. The substrate holding mechanism according to claim 1, wherein said connecting means is arranged along said spin base and connected to a swing member, said link member comprising: A drive shaft provided on the link member and inserted through the rotation shaft of the spin base; and a rotation member provided on the drive shaft, wherein the first displacement means causes the holding member to hold the substrate. Thus, the rotating member is rotated in one direction, and the second displacement means is configured to rotate the rotating member in another direction so as to release the holding of the substrate by the holding member.
【請求項5】 請求項4に記載の基板保持機構におい
て、 前記第1変位手段は、バネ機構を備え、 前記第2変位手段は、エアシリンダを備えることを特徴
とする基板保持機構。
5. The substrate holding mechanism according to claim 4, wherein said first displacement means comprises a spring mechanism, and said second displacement means comprises an air cylinder.
JP30692496A 1996-11-19 1996-11-19 Substrate holding mechanism Expired - Fee Related JP3604242B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30692496A JP3604242B2 (en) 1996-11-19 1996-11-19 Substrate holding mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30692496A JP3604242B2 (en) 1996-11-19 1996-11-19 Substrate holding mechanism

Publications (2)

Publication Number Publication Date
JPH10146557A true JPH10146557A (en) 1998-06-02
JP3604242B2 JP3604242B2 (en) 2004-12-22

Family

ID=17962919

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3604242B2 (en)

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