JP3604242B2 - Substrate holding mechanism - Google Patents

Substrate holding mechanism Download PDF

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JP3604242B2
JP3604242B2 JP30692496A JP30692496A JP3604242B2 JP 3604242 B2 JP3604242 B2 JP 3604242B2 JP 30692496 A JP30692496 A JP 30692496A JP 30692496 A JP30692496 A JP 30692496A JP 3604242 B2 JP3604242 B2 JP 3604242B2
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substrate
holding
swing
spin base
axis
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JPH10146557A (en
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秀喜 足立
幸宏 高村
邦夫 山田
芳弘 小山
純 渡辺
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Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
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Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
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【０００１】
【発明の属する技術分野】
本発明は、半導体ウエハ、液晶表示器用のガラス基板、フォトマスク用のガラス基板、
光ディスク用の基板などの基板を鉛直軸回りに回転して、レジスト塗布処理、現像処理、
洗浄処理などの適宜の処理を施す回転式基板処理装置に備えられた基板保持機構に関する。
【０００２】
【従来の技術】
従来のこの種の回転式基板処理装置の基板保持機構として、例えば、図１３、図１４に示すようなものがある。図１３は、回転式基板処理装置に備えられた従来の基板保持機構の構成を示す平面図であり、図１４（ａ）は、基板を保持した状態を示す要部平面図、図１４（ｂ）は、基板の保持が解除された状態を示す要部平面図である。
【０００３】
鉛直軸Ｊ１回りに回転可能に立設された図示しない回転軸の上端部にスピンベース１００が設けられ、スピンベース１００が軸Ｊ１回りに回転可能に構成されている。スピンベース１００は、３本以上のアーム部１０１が放射状に設けられて構成され、各アーム部１０１の先端部に基板保持部２００が設けられている。図では、全ての基板保持部２００を可動保持部として構成している。
【０００４】
基板保持部２００は、保持部材２０１と揺動部材２０２とを備えている。保持部材２０１は、アーム部１０１に鉛直軸Ｊ２回りに回動可能に設けられた円柱状の基板載置部２０３と、基板載置部２０３の上面を段付きにして切り欠き状に設けられた保持部２０４とが一体に形成されている。揺動部材２０２は、保持部材２０１の側方に延出され、基板載置部２０３の軸Ｊ２を支点として揺動可能に基板載置部２０３に設けられている。揺動部材２０２の先端部側には、リンク部材２０５の先端部側が回動可能に連結されていて、この揺動部材２０２とリンク部材２０５との連結部分が揺動部材２０２の揺動作用点となっている。各リンク部材２０５の基端部側は、駆動軸２１０の上端部に回動可能に連結されている。
【０００５】
スピンベース１００を軸Ｊ１回りに回転させる回転軸は円筒状に構成され、この回転軸の中空部に駆動軸２１０が、軸Ｊ１回りに回転軸と相対回転可能に貫通されている。そして、図示しない付勢手段は、回転軸に対して駆動軸２１０を、軸Ｊ１を回転中心軸として時計回り（図１３の実線の矢印回り）に回転付勢するように設けられている。この付勢手段の付勢により、リンク部材２０５を介して揺動部材２０２の揺動作用点がスピンベース１００の回転中心（Ｊ１）から離れる方向に揺動部材２０２が揺動付勢され、これに伴って保持部材２０１が軸Ｊ２を回転中心軸として反時計回りに回転付勢され、図１３、図１４（ａ）に示すように、保持部２０４が基板Ｗの外周端縁を押圧付勢して基板Ｗが保持される。
【０００６】
一方、図示しない解除手段は、付勢手段に抗して、回転軸に対して駆動軸２１０を、軸Ｊ１を回転中心軸として反時計回り（図１３の二点鎖線の矢印回り）に回転させるように設けられている。この解除手段による駆動軸２１０の回転により、リンク部材２０５を介して揺動部材２０２の揺動作用点がスピンベース１００の回転中心（Ｊ１）側に引き戻される方向に揺動部材２０２が揺動され、これに伴って保持部材２０１が軸Ｊ２を回転中心軸として時計回りに回転され、図１４（ｂ）に示すように、保持部２０４が基板Ｗの外周端縁から離れて基板Ｗの保持が解除される。
【０００７】
上述したように基板Ｗが保持された状態で、スピンベース１００を軸Ｊ１回りに回転させることで、保持された基板Ｗが軸Ｊ１回りに回転され、この基板Ｗに対して適宜の処理が施される。
【０００８】
【発明が解決しようとする課題】
しかしながら、このような構成を有する従来例の場合には、次のような問題がある。
従来例の基板保持機構によって基板Ｗを保持して基板Ｗを軸Ｊ１回りに回転させると、
遠心力によって揺動部材２０２の揺動作用点（揺動部材２０２とリンク部材２０５との連結部分）に、図１３の矢印Ｆ方向に作用する力が働き、回転停止時よりも揺動部材２０２が、スピンベース１００の回転中心（Ｊ１）からさらに離れる方向に揺動され、回転停止時に比べて保持部２０４が基板Ｗの外周端部をさらに強く押圧することになる。
【０００９】
保持部２０４の押圧力が強くなり過ぎると、基板Ｗ自身の座屈荷重を越えて保持した基板Ｗを破損することになる。また、スピンベース１００や保持部材２００などを炭化珪素（ＳｉＣ）などの耐薬材料で制作した場合には、炭化珪素の曲げ強度が低いので、基板Ｗの代わりにスピンベース１００（特に、アーム部１０１）が破損したり、保持部材２００が根元から折れることになる。
【００１０】
保持部２０４の押圧力は、基板Ｗ、スピンベース１００の回転数を上げるに従って強くなるので、基板Ｗやスピンベース１００、保持部材２００の破損を招かないようにするために、従来例の構成では、基板Ｗの回転数を一定以上に上げることができず、基板Ｗの回転数に制限があり、その制限の回転数以上に基板Ｗを高速回転させて処理することができなかった。
【００１１】
また、基板Ｗのサイズが大型になるに従って、遠心力によって揺動部材２０２の揺動作用点、すなわち、揺動部材２０２とリンク部材２０５との連結部分に働く力が強くなるので、基板Ｗやスピンベース１００、保持部材２００の破損を招かないようにするための制限となる基板Ｗの回転数がより低くなり、基板Ｗが大型になるに従って基板Ｗを高速回転させて処理することが行い難くなっていた。
【００１２】
本発明は、このような事情に鑑みてなされたものであって、基板のサイズにかかわらず、基板やスピンベースなどの破損を招かずに基板を高速回転させることができる基板保持機構を提供することを目的とする。
【００１３】
【課題を解決するための手段】
本発明は、このような目的を達成するために、次のような構成をとる。
すなわち、請求項１に記載の発明は、基板を保持する基板保持機構において、鉛直軸回りに回転可能なスピンベースと、基板の外周端部を３箇所以上で保持するために３つ以上有しており、その３つ以上のうち少なくとも１つが可動保持部である基板保持部と、基板を保持する側に前記可動保持部を変位させるため付勢する第１変位手段と、基板の保持を解除する側に前記可動保持部を変位させるための第２変位手段と、前記可動保持部と前記第１変位手段および前記第２変位手段とを連結させる連結手段と、を備え、前記可動保持部は、前記スピンベースに設けられ、鉛直軸回りに回動可能な回動部材と、前記回動部材の側方に延出され、前記回動部材の回動軸芯を支点として揺動可能に前記回動部材に設けられて、前記連結手段に連結された揺動部材と、前記回動部材を挟んで前記揺動部材とは反対側の側方に延出され、前記回動部材の回動軸芯を支点として揺動可能に前記回動部材に設けられ、かつ基板の外周端部に当接する保持面を有する保持部材と、を備え、前記第１変位手段により前記連結手段と前記揺動部材と前記回動部材を介して前記保持部材の保持面を基板の外周端部に当接した状態で付勢し、前記基板保持部に基板を保持した状態で前記基板保持機構が回転されると、遠心力により前記連結手段と前記保持部材に作用する力が前記回動部材を挟んで相殺されることを特徴とするものである。
【００１４】
また、請求項２に記載の発明は、基板を保持する基板保持機構において、基板を保持する基板保持機構において、鉛直軸回りに回転可能なスピンベースと、基板の外周端部を３箇所以上で保持するために３つ以上有しており、その３つ以上のうち少なくとも１つが可動保持部である基板保持部と、基板を保持する側に前記可動保持部を変位させるため付勢する第１変位手段と、基板の保持を解除する側に前記可動保持部を変位させるための第２変位手段と、前記可動保持部と前記第１変位手段および前記第２変位手段とを連結させる連結手段と、を備え、前記可動保持部は、前記スピンベースに設けられ、鉛直軸回りに回動可能な回動部材と、前記回動部材の側方に延出され、前記回動部材の回動軸芯を揺動支点として揺動可能に前記回動部材に設けられて、前記連結手段に連結された揺動部材と、前記回動部材の回動軸芯を回転支点として回転可能に前記回動部材に設けられ、前記回動部材の正逆回転に応じて基板の保持および解除が可能である保持部材と、を備え、前記保持部材が基板を保持したとき、前記揺動部材の揺動作用点と前記揺動支点とが、前記スピンベースの回転中心を中心とした仮想円の半径方向に沿って一直線上に並ぶように構成し、 前記第１変位手段により前記連結手段と前記揺動部材と前記回動部材を介して前記保持部材を付勢し、前記基板保持部に基板を保持した状態で前記基板保持機構が回転されると、遠心力により前記連結手段に作用する力が前記揺動部材を揺動しないことを特徴とするものである。
【００１５】
また、請求項３に記載の発明は、基板を保持する基板保持機構において、鉛直軸回りに回転可能なスピンベースと、基板の外周端部を３箇所以上で保持するために３つ以上有しており、その３つ以上のうち少なくとも１つが可動保持部である基板保持部と、基板を保持する側に前記可動保持部を変位させるため付勢する第１変位手段と、基板の保持を解除する側に前記可動保持部を変位させるための第２変位手段と、前記可動保持部と前記第１変位手段および前記第２変位手段とを連結させる連結手段と、を備え、前記可動保持部は、前記スピンベースに設けられ、鉛直軸回りに回動可能な回動部材と、前記回動部材を挟んで両側に延出され、一方側が揺動作用点であるとともに他方側にカウンタウエイトを有し、前記回動部材の回動軸芯を支点として揺動可能に前記回動部材に設けられて、前記連結手段に連結された揺動部材と、前記回動部材の回動軸芯を支点として回転可能に前記回動部材に設けられ、前記回動部材の正逆回転に応じて基板の保持および解除が可能である保持部材と、を備え、前記第１変位手段により前記連結手段と前記揺動部材と前記回動部材を介して前記保持部材を付勢し、前記基板保持部に基板を保持した状態で前記基板保持機構が回転されると、遠心力により前記連結手段と前記カウンタウエイトに作用する力が前記回動部材を挟んで相殺されることを特徴とするものである。
【００１６】
また、請求項４に記載の発明は、請求項１ないし請求項３のいずれかに記載の基板保持機構において、前記連結手段は、前記スピンベースに沿って配置され、揺動部材に連結されているリンク部材と、前記リンク部材に設けられ、前記スピンベースの回転軸に挿通されている駆動軸と、前記駆動軸に設けられた回転部材と、を備え、前記第１変位手段は、
前記保持部材により基板を保持させるように、回転部材を一方向に回転させ、前記第２変位手段は、前記保持部材による基板の保持を解除させるように、回転部材を他方向に回転させることを特徴とするものである。
【００１７】
また、請求項５に記載の発明は、請求項４に記載の基板保持機構において、前記第１変位手段は、バネ機構を備え、前記第２変位手段は、エアシリンダを備えることを特徴とするものである。
【００１８】
【作用】
請求項１に記載の発明の作用は次のとおりである。
第１変位手段によって連結手段を介して可動保持部の揺動部材が一方向に揺動されると、回動部材を挟んで揺動部材とは反対側の側方に延出された保持部材が回動部材の回動軸芯を支点として揺動し、保持部材の保持面が基板の外周端部に当接して基板が付勢保持される。基板が基板保持部に保持された状態で、スピンベースを鉛直軸周りに回転させると、遠心力により揺動部材がスピンベースの回転中心から離れる方向に変位する力が働き、それとともに保持部材にもスピンベースの回転中心から離れる方向に変位する力が働く。
従って、揺動部材に働く力と保持部材に働く力とが互いに相殺され、回動部材はほとんど回転しない。これにより、保持部材の保持面が基板の外周端縁に当接する力は、スピンベース停止時と略同じであり、第１変位手段の付勢による変位力に応じた力で、基板を保持することになる。そして、スピンベースの回転が停止され、第２変位手段によって揺動部材が他方向に揺動されると、保持部材が回動部材の回動軸芯を支点として揺動し、保持部材の保持面が基板の外周端部から離れて基板の保持が解除される。
【００１９】
請求項２に記載の発明の作用は次のとおりである。
第１変位手段によって連結手段を介して可動保持部の揺動部材が一方向に揺動されると、回動部材の回動軸芯を回転支点として回転可能に回動部材に設けられた保持部材が、回動部材の正回転に応じて基板を保持する。このとき、スピンベースの回転中心を中心した仮想円の半径方向に沿って揺動部材の揺動作用点と揺動支点とが一直線上に並ぶ。基板が基板保持部に保持された状態で、スピンベースを鉛直軸周りに回転させると、揺動部材の揺動作用点と揺動支点が一直線上に並んでいるので、遠心力によって、揺動部材の揺動作用点に働く力は、揺動支点方向に働き、揺動部材は揺動されず、回動部材および保持部材は回転しない。これにより、保持部材の基板を保持する力は、スピンベース停止時と略同じであり、第１変位手段の付勢による変位力に応じた力で、基板を保持することになる。
そして、スピンベースの回転が停止すると、第２変位手段によって揺動部材が他方向に揺動され、回動部材の逆回転に応じて保持部材が回動部材の回動軸芯を回転支点として回転し、保持部材による基板の保持が解除される。
【００２０】
請求項３に記載の発明の作用は次のとおりである。
第１変位手段によって連結手段を介して可動保持部の揺動部材が一方向に揺動されると、回動部材の回動軸芯を支点として回転可能に回動部材に設けられた保持部材が、回動部材の正回転に応じて基板を保持する。基板が基板保持部に保持された状態で、スピンベースを鉛直軸周りに回転させると、遠心力により、揺動部材の揺動作用点がスピンベースの回転中心から離れる方向に変位する力が働くが、揺動部材は揺動作用点とは反対側にカウンタウエイトを有するので、揺動部材は揺動しない。これにより、保持部材の基板を保持する力は、スピンベース停止時と略同じであり、第１変位手段の付勢による変位力に応じた力で、基板を保持することになる。そして、スピンベースの回転が停止すると、第２変位手段によって揺動部材が他方向に揺動され、回動部材の逆回転に応じて保持部材が回動部材の回動軸芯を支点として回転し、保持部材による基板の保持が解除される。
【００２１】
請求項４に記載の発明の作用は次のとおりである。
第１変位手段と第２変位手段とによる変位力は回転部材を一方向または他方向に回転させ、スピンベースの回転軸に挿通されている駆動軸およびリンク部材を介して揺動部材に伝えられる。
【００２２】
請求項５に記載の発明の作用は次のとおりである。
基板を保持する側への可動保持部の変位はバネ機構で行い、基板の保持を解除する側への可動保持部の変位はエアシリンダで行っている。
【００２３】
【発明の実施の形態】
以下、図面を参照して本発明の実施の形態を説明する。
図１は、本発明の第１実施例に係る回転式基板処理装置の基板保持機構の構成を示す平面図であり、図１（ａ）は、基板が保持された状態を示し、図１（ｂ）は、基板の保持が解除された状態を示している。図２は、可動保持部の構成を示す斜視図であり、図３は、第１変位手段、第２変位手段の一例の構成を示す図である。
【００２４】
円筒状の回転軸１は、ベルト伝動機構２などによってモーター３に伝動連結され、鉛直軸Ｊ１回りに回転可能に立設されている。この回転軸１の上端部にスピンベース４が設けられ、スピンベース４が軸Ｊ１回りに回転可能に構成されている。スピンベース４は、３本以上のアーム部５が放射状に設けられて構成され、各アーム部５の先端部に基板保持部１０が設けられている。図では、全ての基板保持部１０を可動保持部として構成している。
【００２５】
基板保持部１０は、回動部材１１、揺動部材１２、保持部材としての保持アーム１３、保持部１４を備えている。
【００２６】
回動部材１１は、鉛直軸Ｊ２回りに回動可能にスピンベース４のアーム部５に設けられている。この実施例では、回動部材１１を基板載置部としても用いており、保持する基板Ｗの外周端部の下面を回動部材１１の上面に載置するようにしている。
【００２７】
揺動部材１２は、回動部材１１の側方に延出され、回動部材１１の回動軸芯Ｊ２を揺動支点として揺動可能に回動部材１１に設けられている。この揺動部材の先端部側に、リンク部材１６の先端部側が回動可能に連結されていて、この揺動部材１２とリンク部材１６との連結部分が揺動部材１２の揺動作用点となっている。
【００２８】
保持アーム１３は、回動部材１１を挟んで揺動部材１２の揺動作用点（揺動部材１２とリンク部材１６との連結部分）と反対側の側方に延出され、回動部材１１の回動軸芯Ｊ２を揺動支点として揺動可能に回動部材１１に設けられている。なお、揺動部材１２とこの保持アーム１３とは、図２（ａ）に示すように別個の部材で構成してもよいし、図２（ｂ）に示すように一体の部材１５で構成してもよい。
【００２９】
保持部１４は、保持アーム１３の先端部側上面に設けられ、基板Ｗの外周端縁に当接する保持面１４ａを備えている。
【００３０】
第１変位手段と第２変位手段は例えば図３のように構成されている。
回転軸１の中空部には、軸Ｊ１回りに回転軸１と相対回転可能に駆動軸２０が挿通されている。回転軸１にはフランジ部２１が設けられ、このフランジ部２１に対向するように駆動軸２０にも回転部材としてのフランジ部２２が設けられている。フランジ部２１にはピン２３がフランジ部２２に向けて設けられ、フランジ部２２にはフランジ部２１に向けてピン２４が設けられている。これらピン２３、２４の間に第１変位手段としてのコイルバネ２５が架けられていて、回転軸１に対して駆動軸２０が、軸Ｊ１を回転中心軸として図の時計回りに回転付勢されるようになっている。
【００３１】
なお、コイルバネ２５による回転軸１に対する駆動軸２０の時計回りの回転を適宜の位置で停止させるためにストッパー２６が設けられている。このストッパー２６による駆動軸２０の回転停止位置は、後述するように、コイルバネ２５によって保持部１４が基板Ｗの外周端縁を押圧付勢する際の保持部１４の位置よりも、保持部１４が若干スピンベース４の回転中心（Ｊ１）側に引き戻された位置に設定されている。これにより、後述するように、コイルバネ２５によって保持部１４がスピンベース４の回転中心（Ｊ１）側に引き戻されると、基板Ｗが有る状態では保持部１４は基板Ｗの外周端縁を押圧付勢し、基板Ｗが無い状態ではストッパー２６によって保持部１４は適宜の位置で停止されることになる。
【００３２】
また、フランジ部２２の近傍には第２変位手段としてのエアシリンダ２７が設けられ、エアシリンダ２７のロッド２７ａを伸長させてフランジ部２２に設けられた部材２８を、図３（ｂ）の二点鎖線に示すように変位させることで、コイルバネ２５に抗して回転軸１に対して駆動軸２０を、軸Ｊ１を回転中心軸として図の反時計回りに回転させるように構成している。
【００３３】
駆動軸２０の上端部にはリンク部材１６の基端部側が回動可能に連結されていて、リンク部材１６を介してコイルバネ２５による揺動部材１２の揺動付勢や、エアシリンダ２７によるその解除を行うように構成している。
【００３４】
エアシリンダ２７のロッド２７ａを伸長すると、駆動軸２０が回転軸１に対して、軸Ｊ
１を回転中心軸として反時計回りに回転され、これに連動して、図１（ａ）の二点鎖線、図１（ｂ）に示すように、リンク部材１６を介して揺動部材１２の揺動作用点（揺動部材１２とリンク部材１６との連結部分）がスピンベース４の回転中心（Ｊ１）側に引き戻される方向に揺動部材１２が揺動される。これにより、回動部材１１を挟んで揺動部材１２の揺動作用点と反対側の側方に延出され、回動部材１１の回動軸芯Ｊ２を揺動支点として揺動可能に回動部材１１に設けられた保持アーム１３がスピンベース４の回転中心（Ｊ１）から離れる方向に揺動され、保持アーム１３に設けられた保持部１４の保持面１４ａが基板Ｗの外周端縁から離れて基板Ｗの保持が解除される。
【００３５】
また、上述したように、エアシリンダ２７のロッド２７ａを伸長させて基板Ｗの保持が解除され、回動部材１１の上面に基板Ｗの外周端部の下面が載置された状態で、エアシリンダ２７のロッド２７ａを収縮すると、コイルバネ２５の復元力によって駆動軸２０が回転軸１に対して、軸Ｊ１を回転中心軸として時計回りに回転され、これに連動して、図１（ａ）の実線に示すように、リンク部材１６を介して揺動部材１２の揺動作用点がスピンベース４の回転中心（Ｊ１）から離れる方向に揺動部材１２が揺動付勢される。これにより、回動部材１１を挟んで揺動部材１２の揺動作用点と反対側の側方に延出され、回動部材１１の回動軸芯Ｊ２を揺動支点として揺動可能に回動部材１１に設けられた保持アーム１３がスピンベース４の回転中心（Ｊ１）側に引き戻される方向に揺動付勢され、保持部１４の保持面１４ａが基板Ｗの外周端縁を押圧付勢して基板Ｗが保持される。
【００３６】
そして、基板Ｗが保持された状態で、モーター３が回転軸１を軸Ｊ１回りに回転させることで、保持された基板Ｗが軸Ｊ１回りに回転され、この基板Ｗに対して所定の処理が施される。
【００３７】
基板Ｗを保持して軸Ｊ１回りに回転させると、遠心力によって揺動部材１２の揺動作用点（揺動部材１２とリンク部材１６との連結部分）に図１（ａ）の矢印Ｆ１方向に作用する力が働くが、同時に、回動部材１１を挟んで揺動部材１２の揺動作用点と反対側の側方に延出され、回動部材１１の回動軸芯Ｊ２を揺動支点として揺動可能に回動部材１１に設けられた保持アーム１３にも、遠心力によって図１（ａ）の矢印Ｆ２方向に作用する力が働くので、揺動部材１２の揺動作用点に働く力は、保持アーム１３に働く力によって相殺され、揺動部材１２、保持アーム１３は回転停止時の状態から揺動変位せず、回動部材１１は回転しない。従って、基板Ｗを軸Ｊ１回りに回転させても保持アーム１３に設けられた保持部１４の保持面１４ａが基板Ｗの外周端縁を押圧する力は回転停止時と同じであり、基板Ｗのサイズ、回転数にかかわらず、保持面１４ａは常にコイルバネ２５による付勢力に応じた力で基板Ｗの外周端縁を押圧付勢し、それ以上の力で押圧することはない。よって、基板Ｗのサイズにかかわらず、基板Ｗやスピンベース４（特に、アーム部５）などの破損を招かず、また、回動部材１１が根元から折れるようなこともなく、基板Ｗを高速回転させることができる。
【００３８】
以下の変形例は後述する第２〜第４実施例装置にも同様に適用できる。
上記実施例では、全ての基板保持部１０を可動保持部として構成したが、少なくとも１個の基板保持部１０を可動保持部とし、残りを固定保持部としてもよい。基板保持部１０は、例えば、図４（ａ）、（ｂ）に示すように、スピンベース４のアーム部５の先端部に固定立設された基板載置部１７と、基板載置部１７の上面を段付きにして設けられた保持部１８とで構成される。基板Ｗは基板保持部１０の回動部材１１の上面、および、基板保持部１０の基板載置部１７の上面の段付き部分に載置され、基板保持部１０の保持部１４が基板Ｗの外周端縁を押圧付勢すると、基板Ｗの外周端縁の他の部分が保持部１８に押圧され、基板Ｗが保持される。
【００３９】
また、図４（ｃ）、（ｄ）に示すように、基板保持部１０を、基板載置ピン１９と保持部１８とで構成してもよい。
【００４０】
上記実施例では、基板保持部１０を３個設けているが、基板保持部１０を３個以上にし、そのうちの１個以上の基板保持部１０を可動保持部としてもよい。
【００４１】
また、上記実施例では、回動部材１１を基板載置部として構成したが、図４（ｃ）、（ｄ）と同様に、基板Ｗの下面を載置する基板載置ピン１９を別途設けて、回動部材１１に基板Ｗを載置せずに、この基板載置ピン１９に基板Ｗの下面を載置するように構成してもよい。
【００４２】
上記実施例のスピンベース４は、アーム部５を放射状に設けて構成しているが、図５に示すように、スピンベース４を円板状に構成してもよい。
【００４３】
次に、本発明の第２実施例装置の構成を図６ないし図８を参照して説明する。図６は、本発明の第２実施例に係る回転式基板処理装置の基板保持機構の構成を示す平面図であり、図７は、基板保持部の構成を示す図、図８（ａ）は、基板が保持された状態を示す要部平面図、図８（ｂ）は、基板の保持が解除された状態を示す要部平面図である。
【００４４】
スピンベース４の構成およびスピンベース４を軸Ｊ１回りに回転させる構成は上記第１実施例装置と同様であるのでその詳述は省略する。また、第１変位手段、第２変位手段などの構成、すなわち、駆動軸２０、フランジ部２１、２２、ピン２３、２４、コイルバネ２５、ストッパー２６、エアシリンダ２７、部材２８などの構成も、上記第１実施例と同様の構成（図３参照）であるのでその詳述は省略する。
【００４５】
スピンベース４の各アーム部５の先端部に基板保持部４０が設けられている。図では、全ての基板保持部４０を可動保持部として構成している。
【００４６】
基板保持部４０は、回動部材４１、揺動部材４２、保持部４３を備えている。
【００４７】
回動部材４１は、鉛直軸Ｊ２回りに回動可能にスピンベース４のアーム部５に設けられている。保持部４３は回動部材４１の上面に段付き部４１ａを形成するように、回動部材４１の上面に設けられている。回動部材４１と保持部４３とは別個の部材を接合してもよいが、一体の部材で構成、例えば、円柱状の部材の上部を切り欠いて保持部４３と段付き部４１ａとを形成してもよい。この実施例では、回動部材４１の段付き部４１ａを基板載置部として用いるようしている。
【００４８】
揺動部材４２は、回動部材４１の側方に延出され、回動部材４１の回動軸芯Ｊ２を揺動支点として揺動可能に回動部材４１に設けられている。
【００４９】
揺動部材４２の先端部側にはピン４２ａが設けられ、このピン４２ａがリンク部材５０の先端部側の切り欠き部５１に係止されて連結されている。この実施例では、ピン４２ａが揺動部材４２の揺動作用点となる。
【００５０】
各リンク部材５０は、スピンベースの回転中心（Ｊ１）を中心とした仮想円の半径方向に配置されている。また、各リンク部材５０の基端部側は駆動軸２０の上端部に固定されて連結されていて、スピンベース４の回転中心軸Ｊ１と同軸回りに回動されるようになっている。
【００５１】
なお、各リンク部材５０は、図６（ａ）に示すように別体の部材で構成してもよいし、図６（ｂ）に示すように一体の部材で構成してもよい。
【００５２】
そして、後述するように、基板Ｗが保持された状態で、スピンベース４の回転中心（Ｊ１）を中心とした仮想円の半径方向に沿って、揺動部材４２の揺動支点（Ｊ２）と揺動作用点（ピン４２ａ）が一直線上に並ぶように構成されている（図６、図８（ａ）参照）。
【００５３】
エアシリンダ２７のロッド２７ａを伸長すると、駆動軸２０が回転軸１に対して、軸Ｊ１を回転中心軸として反時計回りに回転され、これに連動して、リンク部材５０はスピンベース４の回転中心（Ｊ１）を回転中心軸として反時計回りに回転される。これに伴って、揺動部材４２が揺動支点（Ｊ２）回りに逆方向（時計回り）に揺動され、回動部材４１が軸Ｊ２回りに逆方向（時計回り）に回転される。この回動部材４１の逆方向への回転によって、図８（ｂ）に示すように、保持部４３が基板Ｗの外周端縁から離れて基板Ｗの保持が解除される。
【００５４】
また、エアシリンダ２７のロッド２７ａを伸長させて基板Ｗの保持が解除され、回動部材４１の上面の段付き部４１ａに基板Ｗの外周端部の下面が載置された状態で、エアシリンダ２７のロッド２７ａを収縮すると、コイルバネ２５の復元力によって駆動軸２０が回転軸１に対して、軸Ｊ１を回転中心軸として時計回りに回転付勢され、これに連動して、リンク部材５０がスピンベース４の回転中心（Ｊ１）を回転中心軸として時計回りに回転付勢される。これに伴って、揺動部材４２が揺動支点（Ｊ２）回りに正方向（反時計回り）に揺動付勢され、回動部材４１が軸Ｊ２回りに正方向（反時計回り）に回転付勢される。この回動部材４１の正方向への回転付勢によって、図６、図８（ａ）に示すように、保持部４３が基板Ｗの外周端縁を押圧付勢して基板Ｗが保持される。このとき、図６、図８（ａ）に示すように、スピンベース４の回転中心（Ｊ１）を中心とした仮想円の半径方向に沿って、揺動部材４２の揺動支点（Ｊ２）と揺動作用点（ピン４２ａ）が一直線上に並ぶ。
【００５５】
そして、基板Ｗが保持された状態で、モーター３が回転軸１を軸Ｊ１回りに回転させることで、保持された基板Ｗが軸Ｊ１回りに回転され、この基板Ｗに対して所定の処理が施される。
【００５６】
基板Ｗを保持して軸Ｊ１回りに回転させると、揺動部材４２の揺動作用点（ピン４２ａ）に遠心力が働くが、揺動部材４２の揺動支点と揺動作用点は、スピンベース４の回転中心（Ｊ１）を中心とした仮想円の半径方向に沿って一直線上に並んでいるので、遠心力によって揺動部材４２の揺動作用点に働く力は、揺動支点（Ｊ２）方向に働き、揺動部材４２は揺動せず、回動部材４１は回転しない。従って、基板Ｗを軸Ｊ１回りに回転させても保持部４３が基板Ｗの外周端縁を押圧する力は回転停止時と同じであり、基板Ｗのサイズ、回転数にかかわらず、保持部４３は常にコイルバネ２５よる付勢力に応じた力で基板Ｗの外周端縁を押圧付勢し、それ以上の力で押圧することはない。よって、基板Ｗのサイズにかかわらず、基板Ｗやスピンベース４（特に、アーム部５）などの破損を招かず、また、回動部材４１が根元から折れるようなこともなく、基板Ｗを高速回転させることができる。
【００５７】
次に、本発明の第３実施例装置の構成を図９、図１０を参照して説明する。図９は、本発明の第３実施例に係る回転式基板処理装置の基板保持機構の構成を示す平面図であり、図１０（ａ）は、基板が保持された状態を示す要部平面図、図１０（ｂ）は、基板の保持が解除された状態を示す要部平面図である。
【００５８】
スピンベース４の構成およびスピンベース４を軸Ｊ１回りに回転させる構成は上記第１実施例装置と同様であるのでその詳述は省略する。また、第１変位手段、第２変位手段などの構成、すなわち、駆動軸２０、フランジ部２１、２２、ピン２３、２４、コイルバネ２５、ストッパー２６、エアシリンダ２７、部材２８などの構成も、上記第１実施例と同様の構成（図３参照）であるのでその詳述は省略する。
【００５９】
スピンベース４の各アーム部５の先端部に基板保持部６０が設けられている。図では、全ての基板保持部６０を可動保持部として構成している。
【００６０】
基板保持部６０は、回動部材６１、揺動部材６２、カウンタウエイト６３、保持部６４を備えている。
【００６１】
回動部材６１、保持部６４は、上述した第２実施例の回動部材４１、保持部４３と同様の構成であるのでその詳述は省略する。
【００６２】
揺動部材６２は、回動部材６１を挟んで左右の側方に延出され、回動部材６１の回動軸芯Ｊ２を揺動支点として揺動可能に回動部材６１に設けられている。この揺動部材６２の一方の側方には、リンク部材７０の先端部側が回動可能に連結されていて、この揺動部材６２とリンク部材７０との連結部分が揺動作用点になっている。また、揺動部材６２の他方の側面（回動部材６１を挟んで揺動部材６２の揺動作用点と反対側の側面）には、回動部材６１と連結されてカウンタウエイト６３が設けられている。
【００６３】
なお、図面では、揺動部材６２にカウンタウエイト６３を設けるように構成しているが、揺動部材６２を第１実施例のように構成し、第１実施例の保持アーム１３と同様の部材を回動部材６１に設け、この部材にカウンタウエイト６３を設けるように構成してもよい。
【００６４】
各リンク部材７０の基端部側は、駆動軸２０の上端部に回動可能に連結されていて、第１実施例と同様に、このリンク部材７０を介して、コイルバネ２５の付勢やエアシリンダ２７の付勢の解除を揺動部材６２の揺動作用点に作用させるように構成している。
【００６５】
エアシリンダ２７のロッド２７ａを伸長すると、駆動軸２０が回転軸１に対して、軸Ｊ
１を回転中心軸として反時計回りに回転され、これに連動して、リンク部材７０を介して揺動部材６２の揺動作用点（揺動部材６２とリンク部材７０との連結部分）がスピンベース４の回転中心（Ｊ１）側に引き戻される方向に揺動部材６２が揺動され、回動部材６１が軸Ｊ２回りに逆方向（時計回り）に回転される。この回動部材６１の逆方向への回転によって、図１０（ｂ）に示すように、保持部６４が基板Ｗの外周端縁から離れて基板Ｗの保持が解除される。
【００６６】
また、上述したように、エアシリンダ２７のロッド２７ａを伸長させて基板Ｗの保持が解除され、回動部材６１の上面の段付き部分に基板Ｗの外周端部の下面が載置された状態で、エアシリンダ２７のロッド２７ａを収縮すると、コイルバネ２５の復元力によって駆動軸２０が回転軸１に対して、軸Ｊ１を回転中心軸として時計回りに回転され、これに連動して、リンク部材７０を介して揺動部材６２の揺動作用点がスピンベース４の回転中心（Ｊ１）から離れる方向に揺動部材６２が揺動付勢され、回動部材６１が軸Ｊ２回りに正方向（反時計回り）に回転される。この回動部材６１の正方向への回転によって、図９、図１０（ａ）に示すように、保持部６４が基板Ｗの外周端縁を押圧付勢して基板Ｗが保持される。
【００６７】
そして、基板Ｗが保持された状態で、モーター３が回転軸１を軸Ｊ１回りに回転させることで、保持された基板Ｗが軸Ｊ１回りに回転され、この基板Ｗに対して所定の処理が施される。
【００６８】
基板Ｗを保持して軸Ｊ１回りに回転させると、遠心力によって揺動部材６２の揺動作用点（揺動部材６２とリンク部材７０との連結部分）に図９の矢印Ｆ方向に作用する力が働くが、回動部材６１を挟んで揺動部材６２の揺動作用点と反対側の側方に回動部材６１に連結されてカウンタウエイト６３を設けているので、揺動部材６２の揺動作用点（揺動部材６２とリンク部材７０との連結部分）に働く力Ｆは、カウントウエイト６３によって相殺され、揺動部材６２は回転停止時の状態から揺動変位せず、回動部材６１は回転しない。従って、基板Ｗを回転させても回動部材６１に設けられた保持部６４が基板Ｗの外周端縁を押圧する力は回転停止時と同じであり、基板Ｗのサイズ、回転数にかかわらず、保持部６４は常にコイルバネ２５による付勢力に応じた力で基板Ｗの外周端縁を押圧付勢し、それ以上の力で押圧することはない。よって、基板Ｗのサイズにかかわらず、基板Ｗやスピンベース４（特に、アーム部５）などの破損を招かず、また、回動部材６１が根元から折れるようなこともなく、基板Ｗを高速回転させることができる。
【００６９】
次に、本発明の参考実施例装置の構成を図１１、図１２を参照して説明する。図１１は、本発明の参考実施例装置の第１変位手段と第２変位手段の構成を示す図であり、図１２（ａ）は、基板が保持された状態を示す要部平面図、図１２（ｂ）は、基板の保持が解除された状態を示す要部平面図である。
【００７０】
上記第３実施例装置では、揺動部材６２の揺動作用点がスピンベース４の回転中心（Ｊ１）から離れる方向に揺動部材６２が揺動されるようにコイルバネ２５が付勢することで、保持部６４が基板Ｗの外周端縁を押圧付勢し、エアシリンダ２７によって、コイルバネ２５の付勢に抗して揺動部材６２の揺動作用点がスピンベース４の回転中心（Ｊ１）側に引き戻される方向に揺動部材６２が揺動されることで、基板Ｗの保持を解除するように構成したが、この参考実施例装置では、揺動部材６２の揺動作用点がスピンベース４の回転中心（Ｊ１）側に引き戻される方向に揺動部材６２が揺動されるようにコイルバネ２５が付勢することで、保持部６４が基板Ｗの外周端縁を押圧付勢し、エアシリンダ２７によって、コイルバネ２５の付勢に抗して揺動部材６２の揺動作用点がスピンベース４の回転中心（Ｊ１）から離れる方向に揺動部材６２が揺動されることで、基板Ｗの保持を解除するように構成している。
【００７１】
具体的には、例えば、図１１に示すように、フランジ部２１、２２に設けるピン２３、２４の取り付け位置を、図３の構成と逆にすることで、コイルバネ２５によって、駆動軸２０が回転軸１に対して、軸Ｊ１を回転中心軸として反時計回りに回転付勢され、これに伴って、揺動部材６２の揺動作用点（揺動部材６２とリンク部材７０との連結部分）がスピンベース４の回転中心（Ｊ１）側に引き戻される方向に揺動部材６２が揺動されるように付勢される。
【００７２】
そして、回動部材６１に設ける保持部６４の位置を、第３実施例装置に比べて、軸Ｊ２を中心として時計回りにずらせれば、図１２（ａ）に示すように、コイルバネ２５の復元力によって、揺動部材６２の揺動作用点がスピンベース４の回転中心（Ｊ１）側に引き戻される方向に揺動部材６２が揺動付勢されることで、保持部６４が基板Ｗの外周端縁を押圧付勢することができる。
【００７３】
また、エアシリンダ２７、部材２８の取り付け位置を図３の構成と逆にすることで、エアシリンダ２７のロッド２７ａを伸長すれば、コイルバネ２５の付勢に抗して駆動軸２０が回転軸１に対して、軸Ｊ１を回転中心軸として時計回りに回転され、これに伴って、揺動部材６２の揺動作用点がスピンベース４の回転中心（Ｊ１）から離れる方向に揺動部材６２が揺動され、基板Ｗの保持を解除することができる（図１２（ｂ）参照）。
【００７４】
なお、この参考実施例装置における回動部材６１の回転の正方向（逆方向）は、第３実施例装置と逆に、軸Ｊ２を中心に時計回り（反時計回り）に回転される方向に設定されている。その他の構成は第３実施例と同様であるのでその詳述は省略する。
【００７５】
この参考実施例装置で基板Ｗを保持して軸Ｊ１回りに回転させると、遠心力によって揺動部材６２の揺動作用点（揺動部材６２とリンク部材７０との連結部分）がスピンベース４の回転中心（Ｊ１）から離れる方向に揺動部材６２が揺動するような力が働くが、これは揺動部材６２がコイルバネ２５によって付勢されている方向と逆の方向であるので、保持部６４が基板Ｗを保持する押圧力が遠心力によって増すことはなく、基板Ｗのサイズ、回転数にかかわらず、基板Ｗやスピンベース４（特に、アーム部５）などを破損せず、回動部材６１が根元から折れることなどもない。
【００７６】
しかしながら、遠心力によって揺動部材６２が付勢されている方向と逆の方向に揺動されることにより、回動部材６１は基板を解除する側の逆方向に回転されることになり、基板Ｗを軸Ｊ１回りに回転することに伴って保持部６４による基板Ｗの保持が弱められ、高速回転させると基板Ｗの保持が解除されることにもなる。しかしながら、この参考実施例装置では、回動部材６１を挟んで揺動部材６２の揺動作用点と反対側の側方に回動部材６１に連結されてカウンタウエイト６３を設けているので、遠心力によって揺動部材６２の揺動作用点に働く力は、カウンタウエイト６３によって相殺され、揺動部材６２は回転停止時の状態から揺動変位せず、回動部材６１は回転しない。従って、基板Ｗを軸Ｊ１回りに回転させても保持部６４が基板Ｗの外周端縁を押圧する力は回転停止時と同じであり、
保持部６４による基板Ｗの保持が弱められることはない。
【００７７】
【発明の効果】
以上の説明から明らかなように、請求項１に記載の発明によれば、基板の外周端部に当接する保持面を、回動部材を挟んで揺動部材とは反対側の側方に延出され、回動部材の回動軸芯を支点として揺動可能に回動部材に設けられた保持部材に設けているので、基板を保持して鉛直軸回りに回転させたときに、遠心力によって揺動部材の揺動作用点に働く力は、遠心力によって保持部材に働く力によって相殺され、基板のサイズ、回転数にかかわらず保持面が基板の外周端部に当接する力を常に一定にできる。従って、基板のサイズにかかわらず、基板やスピンベースなどの破損を招かずに基板を高速回転させることができる。
【００７８】
請求項２に記載の発明によれば、基板が保持された状態で、スピンベースの回転中心を中心とした仮想円の半径方向に沿って、揺動部材の揺動支点と揺動作用点が一直線上に並ぶように構成したので、基板を保持して鉛直軸回りに回転させたときに、揺動部材の揺動作用点に働く遠心力は揺動支点方向に働き、揺動部材は揺動せず、揺動部材の揺動で回動される回動部材は回転しない。従って、基板のサイズ、回転数にかかわらず回動部材に設けられた保持部材が基板を保持する力を常に一定にでき、基板のサイズにかかわらず、基板やスピンベースなどの破損を招かずに基板を高速回転させることができる。
【００７９】
請求項３に記載の発明によれば、回動部材を挟んで揺動部材の揺動作用点と反対側の側方に回動部材に連結されてカウンタウエイトと設けているので、基板を保持して鉛直軸回りに回転させたときに、遠心力によって揺動部材の揺動作用点に働く力は、カウンタウエイトによって相殺され、基板のサイズ、回転数にかかわらず保持部材が基板を保持する力を常に一定にできる。従って、基板のサイズにかかわらず、基板やスピンベースなどの破損を招かずに、または、基板の保持を弱めることなく、基板を高速回転させることができる。
【００８０】
請求項４に記載の発明によれば、第１変位手段と第２変位手段とによる変位力は回転部材を回転させ、スピンベースの回転軸に挿通されている駆動軸およびリンク部材を介して揺動部材に伝えているので、第１変位手段と第２変位手段とによる変位力が基板を保持する保持部材に確実に伝えることができる。
【００８１】
請求項５に記載の発明によれば、基板を保持する側への可動保持部の変位はバネ機構で行い、基板の保持を解除する側への可動保持部の変位はエアシリンダで行っているので、保持部材による基板の保持および解除を簡単な駆動系で行うことができる。
【図面の簡単な説明】
【図１】本発明の第１実施例に係る回転式基板処理装置の基板保持機構の構成を示す平面図であり、基板が保持された状態と基板の保持が解除された状態とを示す図である。
【図２】第１実施例装置の可動保持部の構成を示す斜視図である。
【図３】第１変位手段、第２変位手段の一例の構成を示す図である。
【図４】固定保持部の一例の構成を示す図である。
【図５】スピンベースを円板状に構成した変形例の構成を示す図である。
【図６】本発明の第２実施例に係る回転式基板処理装置の基板保持機構の構成を示す平面図である。
【図７】第２実施例装置の基板保持部の構成を示す図である。
【図８】第２実施例装置によって基板が保持された状態と基板の保持が解除された状態を示す要部平面図である。
【図９】本発明の第３実施例に係る回転式基板処理装置の基板保持機構の構成を示す平面図である。
【図１０】第３実施例装置によって基板が保持された状態と基板の保持が解除された状態を示す要部平面図である。
【図１１】参考実施例装置の第１変位手段と第２変位手段の構成を示す図である。
【図１２】参考実施例装置によって基板が保持された状態と基板の保持が解除された状態を示す要部平面図である。
【図１３】従来例に係る回転式基板処理装置の基板保持機構の構成を示す平面図である。
【図１４】従来装置によって基板を保持した状態と基板の保持が解除された状態を示す要部平面図である。
【符号の説明】
４：スピンベース
１０、４０、６０：基板保持部
１１、４１、６１：回動部材
１２、４２、６２：揺動部材
１３：保持アーム
１４、４３、６４：保持部
１４ａ：保持部の保持面
１６、５０、７０：リンク部材
２０：駆動軸
２５：コイルバネ
２７：エアシリンダ
６３：カウンタウエイト
Ｗ：基板
Ｊ１：基板の回転中心軸
Ｊ２：回動部材の回動中心軸（揺動部材の揺動支点）[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention is a semiconductor wafer, a glass substrate for a liquid crystal display, a glass substrate for a photomask,
A substrate such as a substrate for an optical disk is rotated around a vertical axis, and a resist coating process, a developing process,
The present invention relates to a substrate holding mechanism provided in a rotary substrate processing apparatus that performs an appropriate process such as a cleaning process.
[0002]
[Prior art]
As a substrate holding mechanism of this kind of conventional rotary substrate processing apparatus, for example, there is one as shown in FIGS. FIG. 13 is a plan view showing a configuration of a conventional substrate holding mechanism provided in a rotary type substrate processing apparatus. FIG. 14 (a) is a main part plan view showing a state where a substrate is held, and FIG. () Is a main part plan view showing a state where the holding of the substrate is released.
[0003]
A spin base 100 is provided at an upper end of a rotation shaft (not shown) that is rotatably provided upright about the vertical axis J1, and the spin base 100 is configured to be rotatable about the axis J1. The spin base 100 has three or more arm units 101 provided radially, and a substrate holding unit 200 is provided at the tip of each arm unit 101. In the figure, all the substrate holders 200 are configured as movable holders.
[0004]
The substrate holding section 200 includes a holding member 201 and a swing member 202. The holding member 201 is provided in a notched shape with a columnar substrate mounting portion 203 provided on the arm portion 101 so as to be rotatable around a vertical axis J2, and a stepped upper surface of the substrate mounting portion 203. The holding part 204 is formed integrally. The swing member 202 extends to the side of the holding member 201, and is provided on the substrate placing portion 203 so as to be swingable about the axis J2 of the substrate placing portion 203 as a fulcrum. A tip end side of a link member 205 is rotatably connected to a tip end side of the swing member 202, and a connecting portion between the swing member 202 and the link member 205 is a point for swing operation of the swing member 202. It has become. The base end of each link member 205 is rotatably connected to the upper end of the drive shaft 210.
[0005]
A rotating shaft for rotating the spin base 100 around the axis J1 is formed in a cylindrical shape, and a drive shaft 210 is penetrated through the hollow portion of the rotating shaft so as to be rotatable relative to the rotating shaft around the axis J1. The urging means (not shown) is provided so as to rotationally urge the drive shaft 210 in the clockwise direction (around the solid arrow in FIG. 13) with respect to the rotation shaft with the axis J1 as the rotation center axis. By the urging of the urging means, the rocking member 202 is rocked and biased via the link member 205 in a direction in which the rocking operation point of the rocking member 202 moves away from the rotation center (J1) of the spin base 100. Accordingly, the holding member 201 is urged to rotate counterclockwise about the axis J2 as the rotation center axis, and the holding portion 204 presses and urges the outer peripheral edge of the substrate W as shown in FIGS. Thus, the substrate W is held.
[0006]
On the other hand, a release unit (not shown) rotates the drive shaft 210 counterclockwise (around an arrow indicated by a two-dot chain line in FIG. 13) with respect to the rotation axis with respect to the rotation axis, against the urging unit. It is provided as follows. By the rotation of the drive shaft 210 by the release means, the swing member 202 is swung in a direction in which the swing operation point of the swing member 202 is pulled back to the rotation center (J1) side of the spin base 100 via the link member 205. Accordingly, the holding member 201 is rotated clockwise around the axis J2 as the rotation center axis, and the holding portion 204 separates from the outer peripheral edge of the substrate W to hold the substrate W as shown in FIG. It is released.
[0007]
By rotating the spin base 100 around the axis J1 while holding the substrate W as described above, the held substrate W is rotated around the axis J1, and an appropriate process is performed on the substrate W. Is done.
[0008]
[Problems to be solved by the invention]
However, the conventional example having such a configuration has the following problem.
When the substrate W is rotated around the axis J1 by holding the substrate W by the conventional substrate holding mechanism,
Due to the centrifugal force, a force acting in the direction of the arrow F in FIG. 13 acts on the swinging operation point of the swinging member 202 (the connecting portion between the swinging member 202 and the link member 205), and the swinging member 202 is more rotated than when the rotation is stopped. Is pivoted further away from the center of rotation (J1) of the spin base 100, and the holder 204 presses the outer peripheral end of the substrate W more strongly than when the rotation is stopped.
[0009]
If the pressing force of the holding portion 204 is too strong, the substrate W held above the buckling load of the substrate W itself will be damaged. Further, when the spin base 100 and the holding member 200 are made of a chemical resistant material such as silicon carbide (SiC), the bending strength of silicon carbide is low, so that the spin base 100 (particularly, the arm portion 101) is used instead of the substrate W. ) Is damaged or the holding member 200 is broken from the base.
[0010]
The pressing force of the holding unit 204 increases as the number of rotations of the substrate W and the spin base 100 increases. Therefore, in order to prevent the substrate W, the spin base 100, and the holding member 200 from being damaged, in the configuration of the conventional example, In addition, the number of rotations of the substrate W cannot be increased beyond a certain value, and the number of rotations of the substrate W is limited.
[0011]
Further, as the size of the substrate W increases, the force acting on the swing operation point of the swing member 202, that is, the force acting on the connecting portion between the swing member 202 and the link member 205 increases due to the centrifugal force. The rotation speed of the substrate W, which is a limit for preventing the spin base 100 and the holding member 200 from being damaged, becomes lower, and it becomes difficult to perform the processing by rotating the substrate W at a high speed as the substrate W becomes larger. Had become.
[0012]
The present invention has been made in view of such circumstances, and provides a substrate holding mechanism that can rotate a substrate at high speed without causing damage to the substrate, the spin base, and the like, regardless of the size of the substrate. The purpose is to:
[0013]
[Means for Solving the Problems]
The present invention has the following configuration to achieve such an object.
That is, the invention according to claim 1 is a substrate holding mechanism for holding a substrate, comprising a spin base rotatable around a vertical axis, and three or more spin holders for holding the outer peripheral end of the substrate at three or more places. And at least one of the three or more is a movable holding part, and the movable holding part is displaced to a side for holding the substrate.EnergizeA first displacement unit, a second displacement unit for displacing the movable holding unit to a side where the holding of the substrate is released, and a connection for connecting the movable holding unit to the first displacement unit and the second displacement unit. Means, wherein the movable holding portion is provided on the spin base and is rotatable about a vertical axis. The movable holding portion extends to the side of the rotatable member and rotates the rotatable member. A swing member is provided on the rotating member so as to be swingable with a moving shaft center as a fulcrum, and a swing member connected to the connecting means, and a side opposite to the swing member across the rotating member. A holding member that is extended and is provided on the rotating member so as to be swingable about a rotation axis of the rotating member as a fulcrum, and has a holding surface that abuts on an outer peripheral end of the substrate.The first displacement means urges the holding surface of the holding member in contact with the outer peripheral end of the substrate via the connecting means, the swinging member, and the rotating member, and pushes the holding member against the substrate holding portion. When the substrate holding mechanism is rotated while holding the substrate, the force acting on the connecting means and the holding member due to centrifugal force is offset across the rotating member.It is characterized by that.
[0014]
According to a second aspect of the present invention, in the substrate holding mechanism for holding a substrate, the substrate holding mechanism for holding the substrate includes a spin base rotatable around a vertical axis and an outer peripheral end of the substrate at three or more locations. To hold the substrate, wherein at least one of the three or more is a movable holding unit, and the movable holding unit is displaced to the side for holding the substrate.EnergizeA first displacement unit, a second displacement unit for displacing the movable holding unit to a side where the holding of the substrate is released, and a connection for connecting the movable holding unit to the first displacement unit and the second displacement unit. Means, wherein the movable holding portion is provided on the spin base and is rotatable about a vertical axis. The movable holding portion extends to the side of the rotatable member and rotates the rotatable member. A swing member that is swingably provided with a moving shaft center as a swing fulcrum, and is swingably connected to the connecting means; A holding member provided on the rotating member and capable of holding and releasing the substrate in accordance with the forward and reverse rotation of the rotating member, wherein the swing member swings when the holding member holds the substrate. The operating point and the swing fulcrum are centered on the rotation center of the spin base. Configured so as to be aligned in a straight line along the radial direction of the virtual circle,  When the holding member is urged by the first displacement means via the connecting means, the swinging member, and the rotating member, and the substrate holding mechanism is rotated with the substrate held by the substrate holding portion, The force acting on the connecting means due to centrifugal force does not swing the swing memberIt is characterized by the following.
[0015]
According to a third aspect of the present invention, there is provided a substrate holding mechanism for holding a substrate, comprising: a spin base rotatable around a vertical axis; and three or more spin holders for holding an outer peripheral end of the substrate at three or more places. And at least one of the three or more is a movable holding part, and the movable holding part is displaced to a side for holding the substrate.EnergizeA first displacement unit, a second displacement unit for displacing the movable holding unit to a side where the holding of the substrate is released, and a connection for connecting the movable holding unit to the first displacement unit and the second displacement unit. Means, the movable holding part is provided on the spin base, a rotating member rotatable around a vertical axis, and extends on both sides with the rotating member interposed therebetween, one side for swinging operation A pivot member having a counterweight on the other side as a point, the pivot member being pivotally provided about the pivot axis of the pivot member as a fulcrum, the pivot member being coupled to the coupling means, A holding member provided on the rotating member so as to be rotatable around a rotation axis of the rotating member as a fulcrum, and capable of holding and releasing the substrate according to forward and reverse rotation of the rotating member.The holding means is urged by the first displacement means via the connecting means, the swinging member and the rotating member, and the substrate holding mechanism is rotated while the substrate is held by the substrate holding portion. And the force acting on the connecting means and the counterweight due to centrifugal force is offset across the rotating member.It is characterized by the following.
[0016]
According to a fourth aspect of the present invention, in the substrate holding mechanism according to any one of the first to third aspects, the connecting means is arranged along the spin base and connected to a swing member. A link member, a drive shaft provided on the link member, inserted through the rotation shaft of the spin base, and a rotation member provided on the drive shaft, wherein the first displacement means,
The rotation member rotates in one direction so that the substrate is held by the holding member, and the second displacement unit rotates the rotation member in the other direction so as to release the holding of the substrate by the holding member. It is a feature.
[0017]
According to a fifth aspect of the present invention, in the substrate holding mechanism according to the fourth aspect, the first displacement means includes a spring mechanism, and the second displacement means includes an air cylinder. Things.
[0018]
[Action]
The operation of the invention described in claim 1 is as follows.
When the swinging member of the movable holding unit is swung in one direction by the first displacement means via the connecting means, the holding member extended to the side opposite to the swinging member across the rotating member. Swings around the rotation axis of the rotation member as a fulcrum, and the holding surface of the holding member comes into contact with the outer peripheral end of the substrate, so that the substrate isUrgingWill be retained. When the spin base is rotated around the vertical axis while the substrate is held by the substrate holding part, a force is exerted to displace the rocking member away from the center of rotation of the spin base due to centrifugal force, and the holding member also Also, a force acting in a direction away from the rotation center of the spin base acts.
Therefore, the force acting on the swing member and the force acting on the holding member cancel each other, and the rotating member hardly rotates. Accordingly, the force with which the holding surface of the holding member abuts on the outer peripheral edge of the substrate is substantially the same as when the spin base is stopped, and the force of the first displacement means is reduced.By biasThe substrate is held by a force corresponding to the displacement force. When the rotation of the spin base is stopped and the swinging member is swung in the other direction by the second displacement means, the holding member swings around the rotation axis of the rotation member as a fulcrum, thereby holding the holding member. The surface is separated from the outer peripheral edge of the substrate and the holding of the substrate is released.
[0019]
The operation of the invention described in claim 2 is as follows.
When the swinging member of the movable holding portion is swung in one direction by the first displacement means via the connecting means, the holding member rotatably provided on the rotating member with the rotating shaft center of the rotating member as the rotation fulcrum. A member holds the substrate in accordance with the forward rotation of the rotating member. At this time, the swing operation point of the swing member and the swing fulcrum are aligned on a straight line along the radial direction of the virtual circle centered on the rotation center of the spin base. When the spin base is rotated around a vertical axis while the substrate is held by the substrate holding unit, the swinging point of the swinging member and the swing fulcrum are aligned, so that the swinging is performed by centrifugal force. The force acting on the swing operation point of the member acts in the direction of the swing fulcrum, the swing member is not swung, and the rotating member and the holding member do not rotate. Accordingly, the force of the holding member for holding the substrate is substantially the same as when the spin base is stopped, and the force of the first displacement means is reduced.By biasThe substrate is held by a force corresponding to the displacement force.
When the rotation of the spin base is stopped, the swinging member is swung in the other direction by the second displacement means, and the holding member is caused to rotate around the rotation axis of the rotation member in response to the reverse rotation of the rotation member. It rotates, and the holding of the substrate by the holding member is released.
[0020]
The operation of the invention described in claim 3 is as follows.
When the swinging member of the movable holding unit is swung in one direction by the first displacement means via the connecting means, the holding member rotatably provided on the turning member with the turning axis of the turning member as a fulcrum. Holds the substrate according to the forward rotation of the rotating member. When the spin base is rotated around a vertical axis while the substrate is held by the substrate holding unit, a force acts by the centrifugal force to displace the swinging point of the swing member in a direction away from the center of rotation of the spin base. However, since the swing member has a counterweight on the side opposite to the swing operation point, the swing member does not swing. Accordingly, the force of the holding member for holding the substrate is substantially the same as when the spin base is stopped, and the force of the first displacement means is reduced.By biasThe substrate is held by a force corresponding to the displacement force. Then, when the rotation of the spin base is stopped, the swinging member is swung in the other direction by the second displacement means, and the holding member rotates around the rotation axis of the rotation member in accordance with the reverse rotation of the rotation member. Then, the holding of the substrate by the holding member is released.
[0021]
The operation of the invention described in claim 4 is as follows.
The displacement force generated by the first displacement means and the second displacement means rotates the rotating member in one direction or the other direction, and is transmitted to the swing member via a drive shaft and a link member inserted through the rotation shaft of the spin base. .
[0022]
The operation of the invention described in claim 5 is as follows.
The displacement of the movable holding unit to the side for holding the substrate is performed by a spring mechanism, and the displacement of the movable holding unit to the side for releasing the holding of the substrate is performed by an air cylinder.
[0023]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a plan view showing a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a first embodiment of the present invention. FIG. 1A shows a state where a substrate is held, and FIG. (b) shows a state where the holding of the substrate is released. FIG. 2 is a perspective view illustrating a configuration of the movable holding unit, and FIG. 3 is a diagram illustrating an exemplary configuration of the first displacement unit and the second displacement unit.
[0024]
The cylindrical rotary shaft 1 is operatively connected to a motor 3 by a belt transmission mechanism 2 and the like, and is erected so as to be rotatable about a vertical axis J1. A spin base 4 is provided at the upper end of the rotating shaft 1, and the spin base 4 is configured to be rotatable around an axis J1. The spin base 4 includes three or more arm parts 5 provided radially, and a substrate holding part 10 is provided at the tip of each arm part 5. In the figure, all the substrate holding units 10 are configured as movable holding units.
[0025]
The substrate holding unit 10 includes a rotating member 11, a swinging member 12, a holding arm 13 as a holding member, and a holding unit 14.
[0026]
The rotating member 11 is provided on the arm 5 of the spin base 4 so as to be rotatable around a vertical axis J2. In this embodiment, the rotating member 11 is also used as a substrate placing portion, and the lower surface of the outer peripheral end of the substrate W to be held is placed on the upper surface of the rotating member 11.
[0027]
The swing member 12 extends to the side of the swing member 11 and is swingably provided on the swing member 11 with the swing axis J2 of the swing member 11 as a swing fulcrum. A distal end side of a link member 16 is rotatably connected to a distal end side of the swing member, and a connecting portion between the swing member 12 and the link member 16 serves as a swing operation point of the swing member 12. Has become.
[0028]
The holding arm 13 extends to the side opposite to the swinging operation point of the swinging member 12 (the connecting portion between the swinging member 12 and the link member 16) with the rotating member 11 interposed therebetween. The pivot member J2 is pivotally provided on the pivot member 11 with the pivot axis J2 as a pivot point. The swinging member 12 and the holding arm 13 may be formed as separate members as shown in FIG. 2A, or may be formed as an integral member 15 as shown in FIG. You may.
[0029]
The holding unit 14 is provided on the upper surface on the distal end side of the holding arm 13, and includes a holding surface 14 a that contacts the outer peripheral edge of the substrate W.
[0030]
The first displacement means and the second displacement means are configured, for example, as shown in FIG.
A drive shaft 20 is inserted through the hollow portion of the rotation shaft 1 so as to be rotatable relative to the rotation shaft 1 around the axis J1. The rotating shaft 1 is provided with a flange portion 21, and the driving shaft 20 is also provided with a flange portion 22 as a rotating member so as to face the flange portion 21. A pin 23 is provided on the flange portion 21 toward the flange portion 22, and a pin 24 is provided on the flange portion 22 toward the flange portion 21. A coil spring 25 as first displacement means is bridged between the pins 23 and 24, and the drive shaft 20 is urged to rotate in the clockwise direction in FIG. It has become.
[0031]
A stopper 26 is provided to stop the clockwise rotation of the drive shaft 20 with respect to the rotation shaft 1 by the coil spring 25 at an appropriate position. As will be described later, the position at which the rotation of the drive shaft 20 is stopped by the stopper 26 is smaller than the position of the holder 14 when the holder 14 presses the outer peripheral edge of the substrate W by the coil spring 25. It is set at a position slightly pulled back toward the rotation center (J1) of the spin base 4. Accordingly, as described later, when the holding portion 14 is pulled back to the rotation center (J1) side of the spin base 4 by the coil spring 25, the holding portion 14 presses and biases the outer peripheral edge of the substrate W when the substrate W is present. However, when there is no substrate W, the holding unit 14 is stopped at an appropriate position by the stopper 26.
[0032]
An air cylinder 27 as a second displacement means is provided in the vicinity of the flange portion 22, and a rod 28a of the air cylinder 27 is extended so that a member 28 provided on the flange portion 22 is connected to the two cylinders shown in FIG. By displacing as shown by the dashed line, the drive shaft 20 is configured to rotate counterclockwise in the figure with the axis J1 as the rotation center axis with respect to the rotation shaft 1 against the coil spring 25.
[0033]
The base end of the link member 16 is rotatably connected to the upper end of the drive shaft 20, and the swing biasing of the swing member 12 by the coil spring 25 via the link member 16 and the air cylinder 27 It is configured to cancel.
[0034]
When the rod 27a of the air cylinder 27 is extended, the drive shaft 20
1 is rotated counterclockwise about the rotation center axis, and in conjunction therewith, as shown in a two-dot chain line in FIG. 1A and a link member 16 as shown in FIG. The rocking member 12 is rocked in a direction in which the rocking operation point (the connecting portion between the rocking member 12 and the link member 16) is pulled back toward the rotation center (J1) of the spin base 4. As a result, the pivoting member 11 is extended to the side opposite to the pivoting point of the pivoting member 12 with the pivoting member 11 interposed therebetween, and pivotally pivotable about the pivot axis J2 of the pivoting member 11 as a pivoting fulcrum. The holding arm 13 provided on the moving member 11 is swung in a direction away from the rotation center (J1) of the spin base 4, and the holding surface 14 a of the holding unit 14 provided on the holding arm 13 is moved from the outer peripheral edge of the substrate W. The holding of the substrate W is released.
[0035]
In addition, as described above, the holding of the substrate W is released by extending the rod 27 a of the air cylinder 27, and the lower surface of the outer peripheral end of the substrate W is placed on the upper surface of the rotating member 11. When the rod 27a is contracted, the drive shaft 20 is rotated clockwise around the rotation shaft 1 by the restoring force of the coil spring 25 around the axis J1 as a rotation center axis. As shown by the solid line, the swing member 12 is biased through the link member 16 such that the swing operation point of the swing member 12 moves away from the rotation center (J1) of the spin base 4. As a result, the pivoting member 11 is extended to the side opposite to the pivoting point of the pivoting member 12 with the pivoting member 11 interposed therebetween, and pivotally pivotable about the pivot axis J2 of the pivoting member 11 as a pivoting fulcrum. The holding arm 13 provided on the moving member 11 is oscillated and urged in the direction of being pulled back to the rotation center (J1) side of the spin base 4, and the holding surface 14a of the holding portion 14 urges the outer peripheral edge of the substrate W. Thus, the substrate W is held.
[0036]
Then, while the substrate W is held, the motor 3 rotates the rotating shaft 1 around the axis J1, so that the held substrate W is rotated around the axis J1, and a predetermined process is performed on the substrate W. Will be applied.
[0037]
When the substrate W is held and rotated about the axis J1, the point of the swinging operation of the swinging member 12 (the connecting portion between the swinging member 12 and the link member 16) is caused by the centrifugal force in the direction of the arrow F1 in FIG. At the same time, it extends to the side opposite to the swinging point of the swinging member 12 with the rotating member 11 interposed therebetween, and swings the rotating shaft center J2 of the rotating member 11. The force acting in the direction of arrow F2 in FIG. 1A also acts on the holding arm 13 pivotally provided on the rotating member 11 as a fulcrum. The acting force is offset by the force acting on the holding arm 13, the swing member 12 and the holding arm 13 do not swing from the state at the time of the rotation stop, and the rotating member 11 does not rotate. Therefore, even when the substrate W is rotated around the axis J1, the force by which the holding surface 14a of the holding portion 14 provided on the holding arm 13 presses the outer peripheral edge of the substrate W is the same as when the rotation is stopped. Regardless of the size and the number of rotations, the holding surface 14a always presses and urges the outer peripheral edge of the substrate W with a force corresponding to the urging force of the coil spring 25, and does not press with more force. Therefore, regardless of the size of the substrate W, the substrate W and the spin base 4 (particularly, the arm portion 5) are not damaged, and the rotating member 11 is not broken from the base, and the substrate W can be moved at a high speed. Can be rotated.
[0038]
The following modified examples can be similarly applied to the second to fourth embodiment devices described later.
In the above embodiment, all the substrate holding units 10 are configured as movable holding units. However, at least one substrate holding unit 10 may be configured as a movable holding unit, and the rest may be configured as fixed holding units. As shown in FIGS. 4A and 4B, for example, the substrate holding unit 10 includes a substrate mounting unit 17 fixedly installed at the tip of the arm unit 5 of the spin base 4 and a substrate mounting unit 17. And a holding portion 18 provided with a stepped upper surface. The substrate W is placed on the upper surface of the rotating member 11 of the substrate holding unit 10 and on the stepped portion of the upper surface of the substrate placing unit 17 of the substrate holding unit 10, and the holding unit 14 of the substrate holding unit 10 When the outer peripheral edge is pressed and urged, another portion of the outer peripheral edge of the substrate W is pressed by the holding portion 18 and the substrate W is held.
[0039]
Further, as shown in FIGS. 4C and 4D, the substrate holding unit 10 may be configured by the substrate mounting pins 19 and the holding unit 18.
[0040]
In the above embodiment, three substrate holding units 10 are provided. However, three or more substrate holding units 10 may be provided, and one or more of the substrate holding units 10 may be a movable holding unit.
[0041]
Further, in the above-described embodiment, the rotating member 11 is configured as the substrate mounting portion, but the substrate mounting pins 19 for mounting the lower surface of the substrate W are separately provided as in FIGS. Thus, the lower surface of the substrate W may be mounted on the substrate mounting pins 19 without mounting the substrate W on the rotating member 11.
[0042]
The spin base 4 of the above embodiment is configured by providing the arm portions 5 radially, but the spin base 4 may be configured in a disk shape as shown in FIG.
[0043]
Next, the configuration of the second embodiment of the present invention will be described with reference to FIGS. FIG. 6 is a plan view showing a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a second embodiment of the present invention, FIG. 7 is a diagram showing a configuration of a substrate holding unit, and FIG. FIG. 8B is a plan view of a main part showing a state where the substrate is held, and FIG. 8B is a plan view of a main part showing a state where the holding of the substrate is released.
[0044]
The configuration of the spin base 4 and the configuration for rotating the spin base 4 about the axis J1 are the same as those of the first embodiment, and therefore, detailed description thereof is omitted. In addition, the configuration of the first displacement unit, the second displacement unit, and the like, that is, the configurations of the drive shaft 20, the flange portions 21, 22, the pins 23, 24, the coil spring 25, the stopper 26, the air cylinder 27, the member 28, and the like are also described above. Since the configuration is the same as that of the first embodiment (see FIG. 3), its detailed description is omitted.
[0045]
A substrate holding section 40 is provided at the tip of each arm section 5 of the spin base 4. In the figure, all the substrate holders 40 are configured as movable holders.
[0046]
The substrate holding unit 40 includes a rotating member 41, a swing member 42, and a holding unit 43.
[0047]
The rotating member 41 is provided on the arm 5 of the spin base 4 so as to be rotatable around the vertical axis J2. The holding portion 43 is provided on the upper surface of the rotating member 41 so as to form a stepped portion 41 a on the upper surface of the rotating member 41. Although the rotating member 41 and the holding portion 43 may be joined to separate members, they are formed as an integral member, for example, the holding portion 43 and the stepped portion 41a are formed by cutting out the upper part of a columnar member. May be. In this embodiment, the stepped portion 41a of the rotating member 41 is used as a substrate placing portion.
[0048]
The swing member 42 extends to the side of the swing member 41 and is swingably provided on the swing member 41 with the swing axis J2 of the swing member 41 as a swing fulcrum.
[0049]
A pin 42 a is provided on the tip end side of the swing member 42, and the pin 42 a is locked and connected to the notch 51 on the tip end side of the link member 50. In this embodiment, the pin 42a serves as a pivot point for the pivot member 42.
[0050]
Each link member 50 is arranged in the radial direction of an imaginary circle centered on the rotation center (J1) of the spin base. The base end of each link member 50 is fixedly connected to the upper end of the drive shaft 20 so that the link member 50 can be rotated coaxially with the rotation center axis J1 of the spin base 4.
[0051]
Note that each link member 50 may be formed as a separate member as shown in FIG. 6A, or may be formed as an integral member as shown in FIG. 6B.
[0052]
Then, as will be described later, in a state where the substrate W is held, the swing fulcrum (J2) of the swing member 42 and the swing fulcrum (J2) of the swing member 42 along the radial direction of the virtual circle centered on the rotation center (J1) of the spin base 4. The swing operation points (pins 42a) are configured to be aligned on a straight line (see FIGS. 6 and 8A).
[0053]
When the rod 27a of the air cylinder 27 is extended, the drive shaft 20 is rotated counterclockwise with respect to the rotation shaft 1 around the axis J1 as the rotation center axis, and in conjunction with this, the link member 50 rotates the spin base 4 It is rotated counterclockwise about the center (J1) as the rotation center axis. Accordingly, the swing member 42 swings in the opposite direction (clockwise) around the swing fulcrum (J2), and the rotating member 41 rotates in the opposite direction (clockwise) around the axis J2. By the rotation of the rotating member 41 in the reverse direction, the holding portion 43 is separated from the outer peripheral edge of the substrate W, and the holding of the substrate W is released, as shown in FIG.
[0054]
Further, the holding of the substrate W is released by extending the rod 27 a of the air cylinder 27, and the air cylinder is held in a state where the lower surface of the outer peripheral end of the substrate W is placed on the stepped portion 41 a on the upper surface of the rotating member 41. When the rod 27a of the coil spring 27 contracts, the drive shaft 20 is urged to rotate clockwise about the rotation axis 1 with respect to the rotation axis 1 by the restoring force of the coil spring 25, and the link member 50 is interlocked with the rotation. The rotation is urged clockwise about the rotation center (J1) of the spin base 4 as the rotation center axis. Accordingly, the swing member 42 is urged to swing in the forward direction (counterclockwise) around the swing fulcrum (J2), and the rotating member 41 rotates in the forward direction (counterclockwise) around the axis J2. Be energized. As shown in FIGS. 6 and 8A, the holding portion 43 presses and biases the outer peripheral edge of the substrate W to hold the substrate W by the rotational bias of the rotating member 41 in the forward direction. . At this time, as shown in FIG. 6 and FIG. 8A, the swing fulcrum (J2) of the swing member 42 and the swing fulcrum (J2) of the swing member 42 along the radial direction of the virtual circle centered on the rotation center (J1) of the spin base 4. The swing operation points (pins 42a) are aligned on a straight line.
[0055]
Then, while the substrate W is held, the motor 3 rotates the rotating shaft 1 around the axis J1, so that the held substrate W is rotated around the axis J1, and a predetermined process is performed on the substrate W. Will be applied.
[0056]
When the substrate W is held and rotated about the axis J1, centrifugal force acts on the swinging point (pin 42a) of the swinging member 42, but the swinging fulcrum and the swinging point of the swinging member 42 Since they are aligned in a straight line along the radial direction of the virtual circle centered on the rotation center (J1) of the base 4, the force acting on the rocking operation point of the rocking member 42 by the centrifugal force is the rocking fulcrum (J2 ), The swing member 42 does not swing, and the rotating member 41 does not rotate. Therefore, even when the substrate W is rotated around the axis J1, the force by which the holding unit 43 presses the outer peripheral edge of the substrate W is the same as when the rotation is stopped, and regardless of the size and the number of rotations of the substrate W, the holding unit 43 Always presses and urges the outer peripheral edge of the substrate W with a force corresponding to the urging force of the coil spring 25, and does not press with a force greater than that. Therefore, regardless of the size of the substrate W, the substrate W and the spin base 4 (particularly, the arm portion 5) are not damaged, the rotating member 41 is not broken from the base, and the substrate W can be moved at a high speed. Can be rotated.
[0057]
Next, the configuration of a device according to a third embodiment of the present invention will be described with reference to FIGS. FIG. 9 is a plan view showing a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a third embodiment of the present invention, and FIG. 10A is a plan view of a main part showing a state where a substrate is held. FIG. 10B is a main part plan view showing a state where the holding of the substrate is released.
[0058]
The configuration of the spin base 4 and the configuration for rotating the spin base 4 about the axis J1 are the same as those of the first embodiment, and therefore, detailed description thereof is omitted. In addition, the configuration of the first displacement unit, the second displacement unit, and the like, that is, the configurations of the drive shaft 20, the flange portions 21, 22, the pins 23, 24, the coil spring 25, the stopper 26, the air cylinder 27, the member 28, and the like are also described above. Since the configuration is the same as that of the first embodiment (see FIG. 3), its detailed description is omitted.
[0059]
A substrate holding section 60 is provided at the tip of each arm section 5 of the spin base 4. In the figure, all the substrate holders 60 are configured as movable holders.
[0060]
The substrate holding unit 60 includes a rotating member 61, a swinging member 62, a counterweight 63, and a holding unit 64.
[0061]
Since the rotating member 61 and the holding portion 64 have the same configuration as the rotating member 41 and the holding portion 43 of the above-described second embodiment, detailed description thereof will be omitted.
[0062]
The swing member 62 extends to the left and right sides with the swing member 61 interposed therebetween, and is swingably provided on the swing member 61 with the swing axis J2 of the swing member 61 as a swing fulcrum. . A tip end side of a link member 70 is rotatably connected to one side of the swing member 62, and a connecting portion between the swing member 62 and the link member 70 serves as a swing operation point. I have. A counter weight 63 is provided on the other side surface of the swing member 62 (the side surface opposite to the swing operation point of the swing member 62 across the swing member 61) and connected to the swing member 61. ing.
[0063]
Although the counterweight 63 is provided on the oscillating member 62 in the drawing, the oscillating member 62 is configured as in the first embodiment, and is similar to the holding arm 13 of the first embodiment. May be provided on the rotating member 61, and the counterweight 63 may be provided on this member.
[0064]
The base end side of each link member 70 is rotatably connected to the upper end of the drive shaft 20. Like the first embodiment, the bias of the coil spring 25 and the air The release of the urging of the cylinder 27 is made to act on the swing operation point of the swing member 62.
[0065]
When the rod 27a of the air cylinder 27 is extended, the drive shaft 20
1 is rotated counterclockwise around the rotation center axis, and in conjunction with this, the point for the swing operation of the swing member 62 (the connection portion between the swing member 62 and the link member 70) is spun through the link member 70. The swing member 62 swings in the direction of being pulled back to the rotation center (J1) side of the base 4, and the rotating member 61 is rotated around the axis J2 in the opposite direction (clockwise). By the rotation of the rotating member 61 in the reverse direction, the holding portion 64 is separated from the outer peripheral edge of the substrate W, and the holding of the substrate W is released, as shown in FIG.
[0066]
Further, as described above, the holding of the substrate W is released by extending the rod 27a of the air cylinder 27, and the lower surface of the outer peripheral end of the substrate W is placed on the stepped portion of the upper surface of the rotating member 61. When the rod 27a of the air cylinder 27 is contracted, the drive shaft 20 is rotated clockwise about the rotation shaft 1 with the axis J1 as the rotation center axis by the restoring force of the coil spring 25. The swing member 62 is urged to swing in a direction in which the swing operation point of the swing member 62 moves away from the center of rotation (J1) of the spin base 4 via 70, and the swing member 61 moves in the forward direction around the axis J2 ( (Counterclockwise). By the rotation of the rotating member 61 in the forward direction, the holding portion 64 presses and biases the outer peripheral edge of the substrate W to hold the substrate W, as shown in FIGS.
[0067]
Then, while the substrate W is held, the motor 3 rotates the rotating shaft 1 around the axis J1, so that the held substrate W is rotated around the axis J1, and a predetermined process is performed on the substrate W. Will be applied.
[0068]
When the substrate W is held and rotated around the axis J1, a centrifugal force acts on the rocking operation point of the rocking member 62 (the connecting portion between the rocking member 62 and the link member 70) in the direction of arrow F in FIG. Although a force acts, the counterweight 63 is provided by being connected to the pivoting member 61 on the side opposite to the pivoting point of the pivoting member 62 with the pivoting member 61 interposed therebetween. The force F acting on the oscillating operation point (the connecting portion between the oscillating member 62 and the link member 70) is canceled by the count weight 63, and the oscillating member 62 does not oscillate from the state at the time of the rotation stop, but rotates. The member 61 does not rotate. Therefore, even when the substrate W is rotated, the force with which the holding portion 64 provided on the rotating member 61 presses the outer peripheral edge of the substrate W is the same as when the rotation is stopped, regardless of the size and the number of rotations of the substrate W. The holding portion 64 always presses and urges the outer peripheral edge of the substrate W with a force corresponding to the urging force of the coil spring 25, and does not press with any more force. Therefore, regardless of the size of the substrate W, the substrate W and the spin base 4 (particularly, the arm portion 5) are not damaged, and the rotating member 61 is not broken from the root. Can be rotated.
[0069]
Next, the present inventionreferenceThe configuration of the apparatus according to the embodiment will be described with reference to FIGS. FIG.referenceFIG. 12A is a diagram illustrating a configuration of a first displacement unit and a second displacement unit of the embodiment device. FIG. 12A is a main part plan view illustrating a state where the substrate is held, and FIG. It is a principal part top view which shows the state by which holding was cancelled.
[0070]
In the device of the third embodiment, the coil spring 25 biases the swing member 62 so that the swing operation point of the swing member 62 moves away from the rotation center (J1) of the spin base 4. The holding portion 64 presses and urges the outer peripheral edge of the substrate W, and the swinging point of the swinging member 62 is rotated by the air cylinder 27 against the biasing of the coil spring 25 by the rotation center (J1) of the spin base 4. The holding of the substrate W is released by swinging the swing member 62 in the direction of being pulled back to the side.referenceIn the embodiment, the coil spring 25 is urged so that the swing member 62 swings in a direction in which the swing operation point of the swing member 62 is pulled back to the rotation center (J1) side of the spin base 4. The holding portion 64 presses and biases the outer peripheral edge of the substrate W, and the air cylinder 27 moves the swinging point of the swinging member 62 from the rotation center (J1) of the spin base 4 against the biasing of the coil spring 25. The holding of the substrate W is released by the swinging member 62 being swung in the direction in which it is separated.
[0071]
Specifically, for example, as shown in FIG. 11, the drive shaft 20 is rotated by the coil spring 25 by reversing the mounting positions of the pins 23 and 24 provided on the flange portions 21 and 22 from the configuration of FIG. 3. The shaft 1 is rotationally urged counterclockwise with respect to the shaft 1 around the shaft J1 as a rotation center axis, and accordingly, the swinging operation point of the swinging member 62 (the connecting portion between the swinging member 62 and the link member 70). Is urged to swing the swing member 62 in a direction in which the swing member 62 is pulled back toward the rotation center (J1) of the spin base 4.
[0072]
Then, if the position of the holding portion 64 provided on the rotating member 61 is shifted clockwise about the axis J2 as compared with the device of the third embodiment, as shown in FIG. By the force, the swing member 62 is urged to swing in the direction in which the swing operation point of the swing member 62 is pulled back toward the rotation center (J1) of the spin base 4, so that the holding portion 64 causes the outer periphery of the substrate W to move. The edge can be biased.
[0073]
In addition, if the mounting position of the air cylinder 27 and the member 28 is reversed from the configuration shown in FIG. 3, the rod 27 a of the air cylinder 27 is extended, and the drive shaft 20 is rotated against the bias of the coil spring 25. On the other hand, the swing member 62 is rotated clockwise about the axis J1 as the rotation center axis, and accordingly, the swing member 62 is moved in a direction in which the swing operation point of the swing member 62 moves away from the rotation center (J1) of the spin base 4. The wafer W is swung to release the holding of the substrate W (see FIG. 12B).
[0074]
Note that thisreferenceThe forward direction (reverse direction) of the rotation of the rotating member 61 in the embodiment device is set to a direction in which the rotation is performed clockwise (counterclockwise) about the axis J2, contrary to the third embodiment device. . The other configuration is the same as that of the third embodiment, and the detailed description is omitted.
[0075]
thisreferenceWhen the substrate W is held and rotated around the axis J1 by the apparatus of the embodiment, the point of the swing operation of the swing member 62 (the connecting portion between the swing member 62 and the link member 70) is rotated by the centrifugal force. A force is exerted such that the swing member 62 swings in a direction away from the center (J1). However, since this is the direction opposite to the direction in which the swing member 62 is urged by the coil spring 25, the holding portion 64 Does not increase the pressing force for holding the substrate W due to the centrifugal force, and does not damage the substrate W or the spin base 4 (particularly, the arm portion 5) regardless of the size and the number of rotations of the substrate W. 61 does not break from the root.
[0076]
However, when the swinging member 62 is swung in the direction opposite to the direction in which the swinging member 62 is biased by the centrifugal force, the rotating member 61 is rotated in the opposite direction to the side where the substrate is released, and As the W is rotated about the axis J1, the holding of the substrate W by the holding unit 64 is weakened, and when the W is rotated at a high speed, the holding of the substrate W is released. However, thisreferenceIn the apparatus of the embodiment, the counterweight 63 is provided by being connected to the pivoting member 61 on the side opposite to the pivoting point of the pivoting member 62 with the pivoting member 61 interposed therebetween. The force acting on the swing operation point of the member 62 is canceled by the counterweight 63, so that the swing member 62 does not swing from the state at the time of the rotation stop, and the rotating member 61 does not rotate. Therefore, even when the substrate W is rotated around the axis J1, the force with which the holding portion 64 presses the outer peripheral edge of the substrate W is the same as when the rotation is stopped,
The holding of the substrate W by the holding section 64 is not weakened.
[0077]
【The invention's effect】
As is apparent from the above description, according to the first aspect of the present invention, the holding surface abutting the outer peripheral end of the substrate extends to the side opposite to the swing member with the rotating member interposed therebetween. Since the substrate is held on the holding member provided on the rotating member so as to be swingable about the rotation axis of the rotating member as a fulcrum, when the substrate is held and rotated about the vertical axis, centrifugal force is generated. The force acting on the swinging point of the swinging member is offset by the force acting on the holding member due to centrifugal force, and the force at which the holding surface abuts the outer peripheral edge of the substrate is always constant regardless of the size and number of rotations of the substrate. Can be. Therefore, regardless of the size of the substrate, the substrate can be rotated at high speed without damaging the substrate or the spin base.
[0078]
According to the second aspect of the present invention, while the substrate is held, the swing fulcrum and the swing operation point of the swing member are set along the radial direction of the virtual circle centered on the rotation center of the spin base. Since the structure is arranged in a straight line, when the substrate is held and rotated about a vertical axis, the centrifugal force acting on the rocking operation point of the rocking member acts in the direction of the rocking fulcrum, and the rocking member is rocked. The rotating member that is not moved and is rotated by the swing of the swing member does not rotate. Therefore, regardless of the size of the substrate and the number of rotations, the holding member provided on the rotating member can always maintain a constant force for holding the substrate, regardless of the size of the substrate without causing damage to the substrate or the spin base. The substrate can be rotated at high speed.
[0079]
According to the third aspect of the present invention, the counter weight is provided on the side opposite to the swing operation point of the swing member with the counter weight provided therebetween, thereby holding the substrate. When rotated about the vertical axis, the force acting on the swinging point of the swinging member due to the centrifugal force is offset by the counterweight, and the holding member holds the substrate regardless of the size and number of rotations of the substrate. The power can always be constant. Therefore, regardless of the size of the substrate, the substrate can be rotated at a high speed without causing damage to the substrate or the spin base, or without weakening the holding of the substrate.
[0080]
According to the fourth aspect of the present invention, the displacement force by the first displacement means and the second displacement means rotates the rotating member, and swings via the driving shaft and the link member inserted through the rotating shaft of the spin base. Since the force is transmitted to the moving member, the displacement force by the first displacement means and the second displacement means can be reliably transmitted to the holding member that holds the substrate.
[0081]
According to the fifth aspect of the invention, the displacement of the movable holding portion toward the side for holding the substrate is performed by a spring mechanism, and the displacement of the movable holding portion toward the side for releasing the holding of the substrate is performed by an air cylinder. Therefore, the holding and release of the substrate by the holding member can be performed by a simple driving system.
[Brief description of the drawings]
FIG. 1 is a plan view showing a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a first embodiment of the present invention, showing a state in which a substrate is held and a state in which the holding of the substrate is released. It is.
FIG. 2 is a perspective view illustrating a configuration of a movable holding unit of the first embodiment.
FIG. 3 is a diagram illustrating a configuration of an example of a first displacement unit and a second displacement unit.
FIG. 4 is a diagram illustrating a configuration of an example of a fixed holding unit.
FIG. 5 is a diagram showing a configuration of a modification in which the spin base is formed in a disk shape.
FIG. 6 is a plan view illustrating a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a second embodiment of the present invention.
FIG. 7 is a diagram illustrating a configuration of a substrate holding unit of the second embodiment apparatus.
FIG. 8 is a main part plan view showing a state in which the substrate is held by the device of the second embodiment and a state in which the holding of the substrate is released.
FIG. 9 is a plan view showing a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a third embodiment of the present invention.
FIG. 10 is a main part plan view showing a state where the substrate is held by the device of the third embodiment and a state where the holding of the substrate is released.
FIG. 11referenceIt is a figure showing composition of the 1st displacement means and the 2nd displacement means of an example device.
FIG.referenceIt is a principal part top view which shows the state in which the board | substrate was hold | maintained by the Example apparatus, and the state where holding | maintenance of the board | substrate was cancelled | released.
FIG. 13 is a plan view illustrating a configuration of a substrate holding mechanism of a rotary substrate processing apparatus according to a conventional example.
FIG. 14 is a plan view of a main part showing a state where the substrate is held by the conventional device and a state where the holding of the substrate is released.
[Explanation of symbols]
4: Spin base
10, 40, 60: substrate holding unit
11, 41, 61: rotating member
12, 42, 62: swing member
13: Holding arm
14, 43, 64: holding unit
14a: holding surface of holding unit
16, 50, 70: link member
20: drive shaft
25: Coil spring
27: Air cylinder
63: Counter weight
W: Substrate
J1: Center axis of rotation of substrate
J2: center axis of rotation of the rotation member (oscillation fulcrum of the oscillation member)

Claims (5)

基板を保持する基板保持機構において、
鉛直軸回りに回転可能なスピンベースと、
基板の外周端部を３箇所以上で保持するために３つ以上有しており、その３つ以上のう
ち少なくとも１つが可動保持部である基板保持部と、 基板を保持する側に前記可動保持部を変位させるため付勢する第１変位手段と、
基板の保持を解除する側に前記可動保持部を変位させるための第２変位手段と、
前記可動保持部と前記第１変位手段および前記第２変位手段とを連結させる連結手段と、を備え、
前記可動保持部は、
前記スピンベースに設けられ、鉛直軸回りに回動可能な回動部材と、
前記回動部材の側方に延出され、前記回動部材の回動軸芯を支点として揺動可能に前記回動部材に設けられて、前記連結手段に連結された揺動部材と、
前記回動部材を挟んで前記揺動部材とは反対側の側方に延出され、前記回動部材の回動軸芯を支点として揺動可能に前記回動部材に設けられ、かつ基板の外周端部に当接する保持面を有する保持部材と、を備え、
前記第１変位手段により前記連結手段と前記揺動部材と前記回動部材を介して前記保持部材の保持面を基板の外周端部に当接した状態で付勢し、前記基板保持部に基板を保持した状態で前記基板保持機構が回転されると、
遠心力により前記連結手段と前記保持部材に作用する力が前記回動部材を挟んで相殺される
ことを特徴とする基板保持機構。In a substrate holding mechanism for holding a substrate,
A spin base rotatable about a vertical axis,
A substrate holding portion having at least three of the outer peripheral ends of the substrate at three or more positions, at least one of the three or more being a movable holding portion; First displacing means for biasing to displace the portion,
Second displacement means for displacing the movable holding portion to a side where the holding of the substrate is released,
Connecting means for connecting the movable holding unit to the first displacement means and the second displacement means,
The movable holding section,
A rotating member provided on the spin base and rotatable about a vertical axis;
A swinging member that extends to the side of the rotating member, is provided on the rotating member so as to be swingable around a rotation axis of the rotating member as a fulcrum, and is connected to the connecting means;
The pivot member is extended to the side opposite to the pivot member, and is provided on the pivot member so as to pivot about the pivot axis of the pivot member, and A holding member having a holding surface in contact with the outer peripheral end portion ,
The first displacement means urges the holding surface of the holding member in contact with the outer peripheral end of the substrate via the connecting means, the swinging member, and the rotating member, and applies the substrate to the substrate holding portion. When the substrate holding mechanism is rotated while holding the
Substrate holding mechanism forces acting on the retaining member and the connecting means by centrifugal force and said Rukoto offset across the rotating member. 基板を保持する基板保持機構において、
鉛直軸回りに回転可能なスピンベースと、
基板の外周端部を３箇所以上で保持するために３つ以上有しており、その３つ以上のうち少なくとも１つが可動保持部である基板保持部と、
基板を保持する側に前記可動保持部を変位させるため付勢する第１変位手段と、
基板の保持を解除する側に前記可動保持部を変位させるための第２変位手段と、
前記可動保持部と前記第１変位手段および前記第２変位手段とを連結させる連結手段と、を備え、
前記可動保持部は、
前記スピンベースに設けられ、鉛直軸回りに回動可能な回動部材と、
前記回動部材の側方に延出され、前記回動部材の回動軸芯を揺動支点として揺動可能に前記回動部材に設けられて、前記連結手段に連結された揺動部材と、
前記回動部材の回動軸芯を回転支点として回転可能に前記回動部材に設けられ、前記回動部材の正逆回転に応じて基板の保持および解除が可能である保持部材と、を備え、
前記保持部材が基板を保持したとき、前記揺動部材の揺動作用点と前記揺動支点とが、
前記スピンベースの回転中心を中心とした仮想円の半径方向に沿って一直線上に並ぶように構成し、
前記第１変位手段により前記連結手段と前記揺動部材と前記回動部材を介して前記保持部材を付勢し、前記基板保持部に基板を保持した状態で前記基板保持機構が回転されると、
遠心力により前記連結手段に作用する力が前記揺動部材を揺動しない
ことを特徴とする基板保持機構。In a substrate holding mechanism for holding a substrate,
A spin base rotatable about a vertical axis,
A substrate holding portion having three or more in order to hold the outer peripheral end of the substrate at three or more positions, at least one of the three or more being a movable holding portion;
A first displacement means for biasing to displace the movable holding portion on the side which holds the substrate,
Second displacement means for displacing the movable holding portion to a side where the holding of the substrate is released,
Connecting means for connecting the movable holding unit to the first displacement means and the second displacement means,
The movable holding section,
A rotating member provided on the spin base and rotatable about a vertical axis;
A swing member extending to the side of the swing member, swingably provided on the swing member with the swing axis of the swing member as a swing fulcrum, and connected to the connecting means; ,
A holding member rotatably provided on the turning member with a turning axis of the turning member as a rotation fulcrum, and capable of holding and releasing the substrate in accordance with forward and reverse rotation of the turning member. ,
When the holding member holds the substrate, the swing operation point of the swing member and the swing fulcrum,
It is configured to be aligned on a straight line along the radial direction of the virtual circle centered on the rotation center of the spin base ,
When the holding member is urged by the first displacement means via the connecting means, the swinging member, and the rotating member, and the substrate holding mechanism is rotated with the substrate held by the substrate holding portion, ,
The substrate holding mechanism, wherein a force acting on the connecting means by centrifugal force does not swing the swing member . 基板を保持する基板保持機構において、
鉛直軸回りに回転可能なスピンベースと、
基板の外周端部を３箇所以上で保持するために３つ以上有しており、その３つ以上のうち少なくとも１つが可動保持部である基板保持部と、
基板を保持する側に前記可動保持部を変位させるため付勢する第１変位手段と、
基板の保持を解除する側に前記可動保持部を変位させるための第２変位手段と、
前記可動保持部と前記第１変位手段および前記第２変位手段とを連結させる連結手段と、を備え、
前記可動保持部は、
前記スピンベースに設けられ、鉛直軸回りに回動可能な回動部材と、
前記回動部材を挟んで両側に延出され、一方側が揺動作用点であるとともに他方側にカウンタウエイトを有し、前記回動部材の回動軸芯を支点として揺動可能に前記回動部材に設けられて、前記連結手段に連結された揺動部材と、
前記回動部材の回動軸芯を支点として回転可能に前記回動部材に設けられ、前記回動部材の正逆回転に応じて基板の保持および解除が可能である保持部材と、を備え、
前記第１変位手段により前記連結手段と前記揺動部材と前記回動部材を介して前記保持部材を付勢し、前記基板保持部に基板を保持した状態で前記基板保持機構が回転されると、
遠心力により前記連結手段と前記カウンタウエイトに作用する力が前記回動部材を挟んで相殺される
ことを特徴とする基板保持機構。In a substrate holding mechanism for holding a substrate,
A spin base rotatable about a vertical axis,
A substrate holding portion having three or more in order to hold the outer peripheral end of the substrate at three or more positions, at least one of the three or more being a movable holding portion;
A first displacement means for biasing to displace the movable holding portion on the side which holds the substrate,
Second displacement means for displacing the movable holding portion to a side where the holding of the substrate is released,
Connecting means for connecting the movable holding unit to the first displacement means and the second displacement means,
The movable holding section,
A rotating member provided on the spin base and rotatable about a vertical axis;
The pivot member extends to both sides with the pivot member therebetween, one side is a pivot point, and the other side has a counter weight, and the pivot member is pivotable about a pivot axis of the pivot member. A swinging member provided on the member and connected to the connecting means,
A holding member rotatably provided on the turning member with the turning axis of the turning member as a fulcrum, and capable of holding and releasing the substrate in accordance with forward and reverse rotation of the turning member ;
When the holding member is urged by the first displacement means via the connecting means, the swinging member, and the rotating member, and the substrate holding mechanism is rotated with the substrate held by the substrate holding portion, ,
A substrate holding mechanism, wherein a force acting on the connecting means and the counterweight due to a centrifugal force is offset across the rotating member . 請求項１ないし請求項３のいずれかに記載の基板保持機構において、
前記連結手段は、
前記スピンベースに沿って配置され、揺動部材に連結されているリンク部材と、
前記リンク部材に設けられ、前記スピンベースの回転軸に挿通されている駆動軸と、
前記駆動軸に設けられた回転部材と、を備え、
前記第１変位手段は、前記保持部材により基板を保持させるように、回転部材を一方向に回転させ、
前記第２変位手段は、前記保持部材による基板の保持を解除させるように、回転部材を他方向に回転させることを特徴とする基板保持機構。The substrate holding mechanism according to any one of claims 1 to 3,
The connecting means,
A link member arranged along the spin base and connected to a swing member;
A drive shaft provided on the link member and inserted through a rotation shaft of the spin base;
A rotating member provided on the drive shaft,
The first displacement means rotates a rotating member in one direction so as to hold the substrate by the holding member,
The substrate holding mechanism, wherein the second displacement means rotates a rotating member in another direction so as to release the holding of the substrate by the holding member. 請求項４に記載の基板保持機構において、
前記第１変位手段は、バネ機構を備え、
前記第２変位手段は、エアシリンダを備えることを特徴とする基板保持機構。The substrate holding mechanism according to claim 4,
The first displacement means includes a spring mechanism,
The second holding means includes an air cylinder.
JP30692496A 1996-11-19 1996-11-19 Substrate holding mechanism Expired - Fee Related JP3604242B2 (en)

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JP4482212B2 (en) * 2000-09-27 2010-06-16 芝浦メカトロニクス株式会社 Spin processing apparatus and substrate processing method
JP2002164318A (en) * 2000-11-27 2002-06-07 Ishii Hyoki Corp Substrate-spinning apparatus
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JP6294793B2 (en) * 2014-08-19 2018-03-14 株式会社ディスコ Edge clamp transport mechanism
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