JP2004048035A - Substrate-rotating/holding device and rotary type substrate processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate rotating/holding device which is capable of holding a substrate in a horizontal position with a strong holding power at all times and a rotary type substrate processing apparatus using the same. <P>SOLUTION: A plurality of stationary rotating/holding members 2 and two rotary holding members 5 are fitted on the top surface of a rotating member 1, along the circumference of a circle whose center coincides with a rotating axis 1a. The two rotary holding members 5 are arranged at positions, which are not point-symmetrical to each other about the rotation axis 1a, and the stationary holding members 2 are arranged at positions so as to confront the rotary holding members 5, respectively. The rotary holding members 5 are each composed of a columnar support 6 and a columnar holder 7, whose diameter is smaller than that of the support 6. The support 6 is fitted turnably on the rotating member 1 about its rotation axis as the center axis. The holder 7 is provided on the top surface of the support 6, while its center axis is located off the rotation axis of the support 6. The outer peripheral surfaces of the holders 7 are made to bear with respect to the peripheral edge of a substrate 100 with the rotation of the supports 6, so that the substrate 100 can be held in the horizontal direction. <P>COPYRIGHT: (C)2004,JPO

Description

{Circle around (1)} The present invention relates to a substrate rotation holding device for rotating a substrate while holding it horizontally, and a rotary substrate processing apparatus provided with the same.

In a rotary substrate processing apparatus such as a rotary coating apparatus and a rotary developing apparatus, it is necessary to rotate a substrate such as a semiconductor wafer while holding the substrate horizontally. Generally, a suction-type spin chuck that sucks and holds the back surface of a substrate by vacuum suction is used. However, in the suction-type spin chuck, since strong suction is performed in order to surely hold the substrate during rotation, the back surface of the substrate is contaminated by the suction.

Therefore, there has been proposed an outer peripheral edge holding type substrate rotation holding device (mechanical spin chuck) that supports the outer peripheral edge of the back surface of the substrate and transmits the rotational force to the substrate while holding the outer peripheral edge of the substrate. In such a substrate rotation holding device, it is required to minimize the slip between the substrate and a member that comes into contact with the outer peripheral edge of the substrate during the rotation of the substrate.

FIG. 17 is a plan view of a conventional outer peripheral edge holding type substrate rotation holding device. FIGS. 18A and 18B are a plan view and a side view, respectively, of a conventional rotary holding member (chuck pin) used in the substrate rotation holding device.

複数 As shown in FIG. 17, a plurality of fixed holding members 2 and a plurality of rotating holding members 2a are mounted on the upper surface of a circular rotating member 1. Each fixed holding member 2 includes a columnar substrate support portion 3 and a columnar horizontal position regulating portion 4 having a smaller diameter than the substrate support portion 3. The upper surface of the substrate supporting portion 3 of the fixed holding member 2 abuts on the peripheral edge of the back surface of the substrate 100, and the outer peripheral surface of the horizontal position restricting portion 4 abuts on the outer peripheral edge of the substrate 100, so that the substrate 100 is horizontal. While being supported in the posture, the horizontal position of the substrate 100 is regulated.

On the other hand, the rotary holding member 2a includes a columnar supporting portion 3 and a quarter columnar holding portion 4a. As shown in FIG. 18, the rotary holding member 2a is attached to the rotary member 1 (see FIG. 17) so as to be rotatable around the rotary shaft 40 in directions indicated by arrows x and y. When the rotary holding member 2a rotates in the direction of the arrow x, the outer edge 41 of the holding portion 4a contacts the outer peripheral edge of the substrate 100, and the substrate 100 is held in the horizontal direction. Conversely, when the rotary holding member 2a rotates in the direction of arrow y, the holding of the substrate 100 is released.

FIG. 19 is a plan view showing another example of the rotary holding member used in the conventional rotary substrate holding device.

回 転 The rotary holding member 2b shown in FIG. 19 includes a columnar supporting portion 3 and an arc-shaped holding portion 4b. Two projections 42 are provided at a central portion inside the holding portion 4b. When the rotary holding member 2b rotates in the direction of the arrow x, one of the protrusions 42 comes into contact with the outer peripheral edge of the substrate 100, and the substrate 100 is held in the horizontal direction. Conversely, when the rotary holding member 2b rotates in the direction of arrow y, the holding of the substrate 100 is released.

When the notch (concave notch) of the substrate 100 is located at the position of the protrusion 42 and the protrusion 42 enters the notch, the end 43 of the holding portion 4b contacts the outer peripheral edge of the substrate 100, 100 is held horizontally.

回 転 In the rotary holding members 2a and 2b as described above, the holding force becomes weaker as the distance between the contact portions of the holding portions 4a and 4b contacting the substrate 100 and the rotating shaft becomes longer. This will be described with reference to FIG.

を As shown in FIG. 20, consider a case in which a rotational force P is applied to a central portion 201 of a rod 200, and the rod 200 is rotated about a rotation axis O to hold an object. FIG. 20A shows a case where the object is held at the end 202 of the bar 200, and FIG. 20B shows a case where the object is held at the center 201 of the bar 200. Assuming that the rotational force P is 2A, the holding force H is A in the case of FIG. 20A and the holding force H is 2A in the case of FIG. As described above, as the distance between the rotation axis O and the holding portion (contact portion) increases, the holding force decreases.

In the rotary holding member 2a of FIG. 18, since the edge 41 present on the outer peripheral portion of the holding portion 4a contacts the outer peripheral edge of the substrate 100, the distance between the rotating shaft 40 and the contact portion is long, Poor holding force against rotational force.

On the other hand, in the rotary holding member 2b of FIG. 19, since the protrusion 42 near the rotation axis abuts on the outer peripheral edge of the substrate 100, the distance between the rotation axis and the contact portion is short, and the rotational force is reduced. Strong holding power. However, when the notch portion of the substrate 100 is located at the position of the protrusion 42, the end 43 of the holding portion 4b contacts the outer peripheral edge of the substrate 100, so that the distance between the rotating shaft and the contact portion increases. Thus, the holding force against the rotational force is weaker than in the case where the projections 42 abut.

Therefore, in the conventional substrate rotation holding device using the rotary holding members 2a and 2b, there is a possibility that a slip may occur between the substrate and the holding member when the substrate is rotated.

An object of the present invention is to provide a substrate rotation holding device capable of always holding a substrate in a horizontal direction with a strong holding force, and a rotary substrate processing device using the same.

A substrate rotation holding device according to a first aspect of the present invention is a substrate rotation holding device for rotating a substrate while horizontally holding the substrate, wherein the rotation member is driven to rotate in a horizontal posture, and the substrate is held in contact with an outer peripheral edge of the substrate. A plurality of fixed holding members and a plurality of rotary holding members for regulating a horizontal position of the plurality of rotary holding members, wherein the plurality of rotary holding members are supported on the rotating member so as to be rotatable around a predetermined rotation axis. And a holder having a convex curved surface, and are disposed at positions asymmetric with respect to the rotation center of the substrate, and the curved surface of the holder abuts on the outer peripheral edge of the substrate as the support rotates. When the substrate is provided eccentrically with respect to the rotation axis so as to be in contact with the rotating shaft, and the substrate has an orientation flat portion, and the central portion of the orientation flat portion is positioned so as to face the rotary holding member, Song There is a plurality of rotary holding member so as not to contact is provided in the center of the orientation flat portion.

The substrate rotation holding device according to a second aspect of the present invention is the substrate rotation holding device according to the first aspect of the invention, wherein the fixed rotation members are respectively arranged at positions facing the plurality of rotation rotation members with respect to the rotation center of the substrate. It is a thing.

基板 A substrate rotation holding device according to a third aspect of the present invention is the substrate rotation holding device according to the first or second aspect, wherein a plurality of rotary holding members are rotatable independently of each other.

A substrate rotation holding device according to a fourth aspect of the present invention is the substrate rotation holding device according to any one of the first to third aspects, wherein the support portion has an upper surface portion that supports a peripheral portion of the back surface of the substrate. The holding portion is formed of a columnar body provided eccentrically with respect to the rotation axis on the upper surface of the support portion.

A substrate rotation holding device according to a fifth aspect of the present invention is the substrate rotation holding device according to any one of the first to third aspects, wherein the support portion has an upper surface portion that supports a peripheral portion of the back surface of the substrate. The curved surface of the holding portion is formed on the upper surface of the supporting portion substantially from the rotation axis to the outer peripheral edge.

A substrate rotation holding device according to a sixth aspect is the substrate rotation holding device according to any one of the first to fifth aspects, wherein the support portions of the plurality of rotary holding members are rotationally driven by magnetic force. is there.

In the substrate rotation holding device according to the first to sixth inventions, by rotating the support portions of the plurality of rotary holding members in one direction around the rotation axis, the convex curved surface of the holding portion becomes the outer periphery of the substrate. The convex curved surface is separated from the outer peripheral edge of the substrate by abutting on the edge and rotating the support portion in the opposite direction about the rotation axis. In this case, the contact portion with the outer peripheral edge of the substrate is the top of the convex curved surface, and the distance between the rotating shaft and the contact portion is short. Therefore, the holding force against the rotational force increases. As a result, the substrate can be held in the horizontal direction with a strong holding force, and no slippage occurs between the substrate and the holding member.

In addition, since the plurality of rotary holding members are arranged at positions that are asymmetric with respect to the rotation center of the substrate, the holding members do not cancel out the holding force, and the substrate can be reliably held.

Further, since the plurality of rotary holding members hold the substrate, even if one rotary holding member is located at the orientation flat portion (straight cutout) of the substrate, another rotary holding member holds the substrate. be able to. Therefore, the substrate can be securely held regardless of the position of the orientation flat portion. When a substrate having no orientation flat portion is held, the center of the substrate and the center of rotation can be matched.

Furthermore, when the substrate has an orientation flat portion, a plurality of rotary holding members are arranged so that the curved surface of the holding portion does not abut against the central portion of the orientation flat portion. Even if it is located in the orientation flat portion, the curved surface of the holding portion does not abut on the central portion of the orientation flat portion. Therefore, when the substrate surface is processed, the holding portion of the rotary holding member does not hinder the processing, and the processing can be performed to a region closer to the outer peripheral edge of the substrate surface.

In particular, in the substrate rotation holding device according to the second invention, since the rotary holding member and the fixed holding member are arranged to face each other with respect to the rotation center of the substrate, the rotary holding members face each other. Even when the substrate is held with a weak force as compared with the case in which it is arranged, no slip occurs between the substrate and the holding portion.

Further, in the substrate rotation holding device according to the fourth invention, the upper surface of the support portion abuts on the peripheral edge of the back surface of the substrate, and the outer peripheral surface of the cylindrical holding portion abuts on the outer peripheral edge of the substrate. Thus, the substrate is supported in a horizontal posture and held in a horizontal direction. In this case, since the amount of displacement of the holding portion in the direction toward the outer peripheral edge of the substrate is smaller than the amount of rotation displacement of the support portion, the holding force against the rotating force is further increased.

Further, in the substrate rotation holding device according to the fifth invention, the upper surface of the support portion abuts on the peripheral edge of the back surface of the substrate, and the curved surface of the holding portion abuts on the outer peripheral edge of the substrate. It is supported in a horizontal position and held in a horizontal direction. In this case, since the contact portion to the substrate exists between the rotation axis of the support portion and the outer peripheral edge, the distance between the rotation shaft and the contact portion is short, and the holding force against the rotation force is stronger. .

Further, in the substrate rotation holding device according to the sixth aspect of the present invention, since the holding portion of the rotary holding member is driven to rotate by the magnetic force, no particles (particles) are generated due to friction between the members.

回 転 A rotary substrate processing apparatus according to a seventh aspect includes the substrate rotation holding apparatus according to any one of the first to sixth aspects.

In the rotary substrate processing apparatus according to the seventh aspect, since the substrate rotation holding apparatus according to any one of the first to sixth aspects is provided, the substrate is horizontally rotated with a strong holding force and rotated. Can be done. Therefore, no slip occurs between the substrate and the holding member when the substrate rotates.

FIG. 1 is a perspective view of a substrate rotation holding device according to a first embodiment of the present invention, and FIG. 2 is a plan view of the substrate rotation holding device of FIG.

In FIGS. 1 and 2, the circular rotating member 1 is driven to rotate around the rotating shaft 1a. A ring-shaped magnet 11 is disposed below the rotating member 1 coaxially with the rotating shaft 1a. A plurality of fixed rotation holding members 2 and two rotation holding members 5 are mounted on the upper surface of the rotation member 1 along a circumference coaxial with the rotation shaft 1a. The configuration of the fixed holding member 2 is the same as the configuration of the fixed holding member 2 shown in FIG.

Particularly, the two rotary holding members 5 are arranged at positions that are not point-symmetric with respect to the rotation axis 1 a, and the fixed holding members 2 are arranged at positions facing the respective rotary holding members 5. In this embodiment, two rotary holding members 5 are arranged at adjacent positions.

FIGS. 3A and 3B are a plan view and a side view of the rotary holding member 5, respectively. As shown in FIG. 3, the rotary holding member 5 includes a columnar supporting portion 6 and a columnar holding portion 7 having a smaller diameter than the supporting portion 6. The support portion 6 is attached to the rotary member 1 (see FIGS. 1 and 2) so as to be rotatable around a rotary shaft 6a coaxial with the center axis. The holding unit 7 is provided on the upper surface of the support unit 6 so as to be eccentric with respect to the rotation shaft 6a. That is, the rotation axis 6a of the support 6 and the center axis 7a of the holder 7 are shifted by a predetermined distance.

FIG. 4 is a perspective view showing a rotary holding member and a magnet holding portion attached to a lower portion thereof. As shown in FIG. 4, a circular magnet holding portion 9 is attached to a lower portion of the support portion 6 of the rotary holding member 5 via a rotating shaft 8 coaxial with the rotating shaft 6a. A rod-shaped permanent magnet 10 is built in the center of the magnet holding portion 9.

5 and 6 are views for explaining the configuration and operation of the substrate rotation holding device of FIG. 1, wherein (a) is a partial cross-sectional view of a rotary holding member and its peripheral portion, and (b) is a rotary holding member. It is a top view of a member.

As shown in FIGS. 5A and 6A, the rotary shaft 8 of the rotary holding member 5 is rotatably supported by the rotary member 1 via the rotary bearing 12. The rotating bearing 12 is provided with, for example, a bearing mechanism to suppress the rotating friction.

(5) Before and after the processing of the substrate 100, the ring-shaped magnet 11 is positioned below the rotating member 1 as shown in FIG. At this time, the line of magnetic force B formed by the ring-shaped magnet 11 is directed in a direction from the outside of the rotating member 1 toward the center at the height where the permanent magnet 10 is installed. Therefore, the N pole of the permanent magnet 10 is attracted in the direction toward the center of the rotating member 1. Thereby, as shown in FIG. 5B, the rotary holding member 5 rotates in the direction of the arrow X, and the outer peripheral surface of the holding unit 7 is separated from the outer peripheral edge of the substrate 100.

6) When processing the substrate 100, the ring-shaped magnet 11 rises and approaches the rotating member 1, as shown in FIG. Therefore, the S pole of the permanent magnet 10 is attracted to the N pole of the ring-shaped magnet 11. Thereby, as shown in FIG. 6B, the rotary holding member 5 rotates in the direction of arrow Y, the outer peripheral surface of the holding portion 7 comes into contact with the outer peripheral edge of the substrate 100, and the substrate 100 is moved in the horizontal direction. Is held.

In the rotary holding member 5 of this embodiment, since the outer peripheral surface of the holding portion 7 near the rotating shaft 6a (see FIG. 3) of the supporting portion 6 contacts the outer peripheral edge of the substrate 100, the permanent magnet 10 Thus, the holding force of the substrate 100 with respect to the rotational force of the ring-shaped magnet 11 is increased.

Further, as shown in FIG. 7, since the displacement L of the holding portion 7 with respect to the rotational displacement R of the support portion 6 is small, a large holding force with respect to the rotating force can be obtained. As a result, the substrate 100 is securely held without slipping with respect to the holding unit 7.

As shown in FIG. 8, when the substrate 100 has the notch 101, and the size of the opening of the notch 101 is, for example, 3 mm, the diameter of the support 6 of the rotary holding member 5 is set to, for example, 16 mm. Then, the diameter of the holding unit 7 is set to, for example, 10 mm. Thus, even if the notch portion 101 is located at the position of the holding portion 7, the holding portion 7 does not enter the notch portion 101. Therefore, regardless of the position of the notch 101 of the substrate 100, the substrate 100 can be held at substantially the same position with the same holding force.

As shown in FIG. 9, each rotation holding member 5 moves in the direction toward the outer peripheral edge of the substrate 100 by a minimum amount necessary for the holding portion 7 to hold the circular outer peripheral edge of the substrate 100. Moving.

Therefore, when the substrate 100 has the orientation flat portion (straight cutout) 102, the holding portion 7 enters the direction toward the orientation flat portion 102 even if the orientation flat portion 102 is located at the position of the rotary holding member 5. Therefore, the holding section 7 does not abut on the orientation flat section 102. Therefore, when cleaning the region 103 of the substrate 100 with the brush, the rotary holding member 5 does not hinder the cleaning.

In particular, when the substrate 100 having no orientation flat portion is held, the center of the substrate 100 and the rotation center can be matched.

(4) Further, since the holding portion 7 abuts on the outer peripheral edge of the substrate 100 with a curved surface instead of a projection, there is little possibility that the holding portion 7 is damaged.

Further, since two rotary holding members 5 are provided, even if one rotary holding member 5 is located on the orientation flat portion 102 of the substrate 100, the other rotary holding member 5 holds the substrate 100. can do. Therefore, the substrate 100 can be reliably held regardless of the position of the orientation flat portion.

Next, the effect of the arrangement of the two rotary holding members 5 will be described with reference to FIGS.

In the substrate rotation holding device of the present embodiment, as shown in FIG. 10, two rotary holding members 5 are arranged at adjacent positions, that is, the two rotary holding members 5 are at positions that are asymmetric with respect to the rotation axis 1a. Are located. When the substrate 100 is rotated together with the rotating member 1 in the direction of arrow C, the rotary holding member 5 is rotated in the direction of arrow D, and the outer peripheral edge of the substrate 100 is held by the holding unit 7. At this time, since the two rotary holding members 5 are arranged at positions that are asymmetric with respect to the rotation axis 1a, the holding force by the rotary holding members 5 is effectively applied to the substrate 100.

In addition, since the fixed holding member 2 is arranged at a position facing the rotary holding member 5, even if the holding force is weak, no slip occurs between the holding portion 7 and the substrate 100.

On the other hand, as shown in FIG. 11, when the two rotary holding members 5 are arranged to face each other on a straight line passing through the rotary shaft 1a, the rotary holding members 5 move in the direction indicated by the arrow D. , The holding forces due to the rotation of the two rotary holding members 5 cancel each other out, and no effective holding force is applied to the substrate 100.

Therefore, when the substrate 100 is held by two or more rotary holding members 5, it is necessary to arrange the rotary holding members 5 at asymmetric positions with respect to the rotation axis 1a of the substrate 100.

FIG. 12 is a plan view showing another arrangement example of the rotation holding member 5 in the substrate rotation holding device of the present embodiment.

In the example of FIG. 12, two rotary holding members 5 are arranged with one fixed holding member 2 interposed therebetween. Also in this case, since the two rotary holding members 5 are provided at asymmetric positions with respect to the rotation center 1a of the substrate 100, the holding force by the two rotary holding members 5 is effectively applied to the substrate 100. Therefore, the substrate 100 can be reliably held.

The number and arrangement of the rotary holding members 5 are not limited to the examples shown in FIGS. 10 and 12, and any number of rotary holding members 5 may be provided in an arbitrary arrangement.

In this case also, by arranging the plurality of rotary holding members 5 at asymmetric positions with respect to the rotation center 1a of the substrate 100, the holding force of the rotary holding members 5 can be effectively applied to the substrate 100. As a result, the substrate 100 can be reliably held.

FIGS. 13 and 14 are views showing a rotary holding member used in the substrate rotation holding device according to the second embodiment of the present invention, wherein FIG. 13 (a) is a plan view and FIG. 13 (b) is a side view.

As shown in FIGS. 13 and 14, the rotary holding member 15 includes a columnar supporting portion 16 and a holding portion 17 having a curved surface portion 17a. The support part 16 is attached to the rotating member so as to be rotatable around a rotation axis 16a coaxial with the center axis. The holding portion 17 is provided on an upper surface portion of the support portion 16, and the curved surface portion 17 a is formed so that a substantially central portion is convex from the rotation shaft 16 a of the support portion 16 to the outer peripheral surface.

As shown in FIGS. 13A and 13B, when the rotary holding member 15 rotates in the direction of arrow X around the rotation shaft 16a, the curved surface portion 17a of the holding portion 17 moves from the outer peripheral edge of the substrate 100. Leave. Conversely, as shown in FIGS. 14A and 14B, when the rotary holding member 15 rotates around the rotation axis 16a in the direction of arrow Y, the substantially central portion of the curved surface portion 17a of the holding portion 17 is moved. It contacts the outer peripheral edge of the substrate 100. Thereby, the substrate 100 is held in the horizontal direction.

In the rotary holding member 15 of this embodiment, a strong holding force is obtained because the top of the curved surface portion 17a near the rotation shaft 16a abuts on the outer peripheral edge of the substrate 100.

FIG. 15 is a schematic perspective view of the entire substrate processing apparatus to which the substrate rotation holding apparatuses of the first and second embodiments can be applied.

The substrate processing apparatus shown in FIG. 15 is an apparatus for performing a series of processes such as a cleaning process, a coating process, a developing process, an adhesion strengthening process, a heating process, and a cooling process on the substrate 100. It has an area 301, has a second substrate processing area 302 on the rear side, and has a transport area 303 between the first substrate processing area 301 and the second substrate processing area 302.

In the first substrate processing region 301, a rotary cleaning unit (spin scrubber) SS for performing a substrate cleaning process, a rotary coating unit (spin coater) SC for performing a processing liquid coating process, and a rotary developing unit for performing a development process are provided. (Spin developer) SD is arranged. Further, in the second substrate processing region 302, an adhesion strengthening portion AH for performing an adhesion strengthening process, a substrate heating portion (hot plate) HP for performing a heating process, and a substrate cooling portion (cooling plate) CP for performing a cooling process are arranged. ing. In the transfer area 303, the substrate transfer device 60 is movably provided.

Furthermore, an indexer IND for loading and unloading the substrate 100 is provided on the side of the substrate processing apparatus. The transfer robot 61 of the indexer IND takes out the substrate 100 from the cassette 62 and sends it out to the substrate transfer device 60, and conversely, returns the substrate 100 subjected to a series of processing from the substrate transfer device 60 to the cassette 62.

The substrate transfer device 60 is capable of moving forward and backward toward the first substrate processing area 301 and the second substrate processing area 302, and processes the processed substrate 100 and the unprocessed substrate 100 with each processing unit. Exchange with

In the substrate processing apparatus of FIG. 15, the rotary cleaning unit SS, the rotary coating unit SC, and the rotary developing unit SD are provided with the substrate rotation holding device of the first or second embodiment. Thus, in the rotary cleaning section SS, the rotary coating section SC, and the rotary developing section SD, it is possible to perform predetermined processing while reliably rotating and holding the substrate 100 without causing slippage.

Particularly, when the present invention is applied to the rotary cleaning unit SS, the following effects are produced. That is, in the rotary cleaning section SS, as shown in FIG. 16, the substrate 100 is held in the direction of arrow R1 together with the rotary holding member 5 while the substrate 100 is held in the direction of arrow Y by the holding section 7 of the rotary holding member 5. It is assumed that it is rotating. At this time, when a cleaning tool (not shown) such as a brush comes into contact with the rotating substrate 100, the substrate 100 tries to slide in the direction opposite to the rotation direction (the direction of arrow R2) with respect to the rotary holding member 5. However, the sliding direction is the direction in which the substrate 100 is held by the holding unit 7. Therefore, while the cleaning tool is in contact with the rotating substrate 100, the holding force of the rotary holding member 5 is increased. As described above, according to the present invention, it is possible to increase the holding force only when necessary, in addition to simply increasing the holding force.

The substrate rotation holding device of the present invention is not limited to the above embodiment, and can be applied to various types of rotary substrate processing devices. For example, by applying the substrate rotation holding device of the present invention to a rotary edge exposure device, edge exposure of the substrate can be performed while reliably rotating and holding the substrate without causing slippage.

1 is a schematic perspective view of a substrate rotation holding device according to a first embodiment of the present invention. It is a top view of the board | substrate rotation holding device of FIG. FIG. 2 is a plan view and a side view of a rotary holding member used in the substrate rotation holding device of FIG. 1. FIG. 2 is a perspective view of a rotary holding member and a magnet holding member used in the substrate rotation holding device of FIG. 1. It is the fragmentary sectional view and the top view which show the state where the holding section of the rotary holding member is separated from the outer peripheral edge of the substrate. It is the fragmentary sectional view and the top view which show the state where the holding section of the rotary type holding component abuts the outer peripheral edge of the substrate. It is a top view which shows the relationship between the rotational displacement of the support part of a rotary holding member, and the displacement of a holding part. It is a top view showing the relation between the holding part of a rotary type holding member, and the notch part of a substrate. FIG. 4 is a plan view illustrating a relationship between a rotary holding member and an orientation flat portion of a substrate. It is a top view for explaining an effect by arrangement of two rotary type holding members in a substrate rotation holding device. It is a top view for explaining an effect by arrangement of two rotary type holding members in a substrate rotation holding device. It is a top view which shows the other example of arrangement | positioning of the rotary holding member in a board | substrate rotation holding device. It is the top view and side view which show the state where the holding part of the rotary holding member in the 2nd Example of this invention was separated from the outer peripheral edge of the board | substrate. It is the top view and side view which show the state where the holding part of the rotary holding member in the 2nd Example of this invention was contacting the outer peripheral edge of the board | substrate. FIG. 1 is a schematic perspective view of an entire substrate processing apparatus to which a substrate rotation holding device according to first and second embodiments of the present invention is applied. It is a figure for explaining an effect at the time of applying the present invention to a rotary washing part. It is a top view of the conventional substrate rotation holding device. FIG. 17 is a plan view and a side view of a rotary holding member used in the substrate rotation holding device of FIG. 16. It is a top view which shows the other example of the conventional rotary holding member. It is a figure for explaining the relation between the torque and the holding power of the rotary holding member.

Explanation of reference numerals

DESCRIPTION OF SYMBOLS 1 Rotating member 2 Fixed holding member 3 Substrate support part 4 Horizontal position regulating part 5, 15 Rotary holding member 6, 16 Support part 7, 17 Holding part 7a Center axis 6a, 16a Rotation axis 17a Curved surface part

Claims (7)

A substrate rotation holding device that rotates while holding the substrate horizontally,
A rotating member that is driven to rotate in a horizontal posture,
It is provided with one or more fixed holding members and a plurality of rotating holding members that contact the outer peripheral edge of the substrate to regulate the horizontal position of the substrate,
The plurality of rotary holding members include a supporting portion rotatably attached to the rotating member around a predetermined rotation axis, and a holding portion having a convex curved surface, and with respect to a rotation center of the substrate. Placed in asymmetrical positions with each other,
The curved surface of the holding portion is provided eccentrically with respect to the rotation axis on the support portion so as to contact the outer peripheral edge of the substrate with the rotation of the support portion,
When the substrate has an orientation flat portion and the central portion of the orientation flat portion is positioned so as to face the rotary holding member, the curved surface of the holding portion abuts on the central portion of the orientation flat portion. A substrate rotation holding device, wherein the plurality of rotation holding members are provided so as not to prevent the rotation. 2. The substrate rotation holding device according to claim 1, wherein fixed holding members are respectively arranged at positions facing the plurality of rotation holding members with respect to the rotation center of the substrate. 3. The substrate rotation holding device according to claim 1, wherein the rotation holding members are rotatable independently of each other. The support portion has an upper surface portion that supports a peripheral portion of a back surface of the substrate,
The substrate rotation holding device according to any one of claims 1 to 3, wherein the holding portion is formed of a cylindrical body provided eccentrically with respect to the rotation axis on the upper surface of the support portion. The support portion has an upper surface portion that supports a peripheral portion of a back surface of the substrate,
The substrate rotation holding device according to any one of claims 1 to 3, wherein the curved surface of the holding portion is formed on the upper surface portion of the support portion substantially from the rotation axis to an outer peripheral edge. The substrate rotation holding device according to any one of claims 1 to 5, wherein the support portions of the plurality of rotation holding members are driven to rotate by a magnetic force. A rotary substrate processing apparatus comprising the substrate rotation holding device according to claim 1.

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