JPH09107021A - Substrate rotary holder and rotary substrate treater - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate rotary holder capable of holding a substrate in a horizontal direction always by a strong holding force, and a rotary substrate treater using it. SOLUTION: A rotary holding member 5 comprises a columnar support part 6 and a columnar holding part 7 having a smaller diameter than the support part 6. The support 6 is fitted on to a rotary member 1 which can be pivoted around a rotary shaft of the coaxial shaft with the center shaft. The holding part 7 is provided eccentrically with respect to the rotary shaft in an upper face part of the support part 6. An outer peripheral face of the holding part 7 is abutted against an outer peripheral end edge of the substrate 100 with rotation of the support part 6, and the substrate 100 is held in a horizontal direction.

Description

Detailed Description of the Invention

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a substrate rotation holding device for rotating a substrate while horizontally holding the substrate, and a rotary substrate processing apparatus provided with the same.

[0002]

2. Description of the Related Art In a rotary substrate processing apparatus such as a rotary coating apparatus and a rotary developing apparatus, it is necessary to rotate a substrate such as a semiconductor wafer while holding it horizontally. In general, a suction type spin chuck that holds the back surface of the substrate by vacuum suction is used. However, in the suction type spin chuck, strong suction is performed in order to securely suck and hold the substrate during rotation, so that the back surface of the substrate is contaminated by the suction.

Therefore, an outer peripheral edge holding type substrate rotation holding device (mechanical spin chuck) that supports the peripheral portion of the back surface of the substrate and transmits the rotational force to the substrate while holding the outer peripheral edge of the substrate has been proposed. ing. In such a substrate rotation holding device, when the substrate is rotated, it is required to suppress slippage between the member that abuts on the outer peripheral edge of the substrate and the substrate as much as possible.

FIG. 14 is a plan view of a conventional peripheral edge holding type substrate rotation holding device. FIGS. 15A and 15B
FIG. 3A is a plan view and a side view of a conventional rotary holding member (chuck pin) used in a substrate rotation holding device.

As shown in FIG. 14, a plurality of fixed holding members 2 and a plurality of rotary holding members 2 are provided on the upper surface of a circular rotating member 1.
a is attached. Each fixed holding member 2 is composed of a cylindrical substrate supporting portion 3 and a cylindrical horizontal position regulating portion 4 having a diameter smaller than that of the substrate supporting portion 3. The upper surface of the substrate support portion 3 of the fixed holding member 2 abuts on the peripheral portion of the back surface of the substrate 100, and the outer peripheral surface of the horizontal position regulating portion 4 abuts on the outer peripheral edge of the substrate 100, so that the substrate 100 becomes horizontal. The substrate 100 is supported in a posture and the horizontal position of the substrate 100 is regulated.

On the other hand, the rotary holding member 2a comprises a columnar supporting portion 3 and a quarter columnar holding portion 4a.
As shown in FIG. 15, the rotary holding member 2 a includes the rotary shaft 4
It is attached to the rotating member 1 (see FIG. 14) so as to be rotatable around 0 in the directions indicated by arrows x and y. When the rotary holding member 2a rotates in the direction of arrow x, the outer edge 41 of the holding portion 4a abuts on the outer peripheral edge of the substrate 100, and the substrate 10
0 is held horizontally. On the contrary, the rotary holding member 2a
When is rotated in the direction of arrow y, the holding of the substrate 100 is released.

FIG. 16 is a plan view showing another example of the rotary type holding member used in the conventional rotary substrate holding device. FIG.
The rotary holding member 2b shown in FIG. 6 includes a cylindrical support portion 3 and an arc-shaped holding portion 4b. Two protrusions 42 are provided in the center portion inside the holding portion 4b. When the rotary holding member 2b rotates in the direction of arrow x, one of the protrusions 42 abuts on the outer peripheral edge of the substrate 100, and the substrate 100 is held horizontally. On the contrary, the rotary holding member 2b indicates the arrow y.
When the substrate 100 is turned in the direction of, the holding of the substrate 100 is released.

Further, when the notch (concave cutout) of the substrate 100 is located at the position of the protrusion 42 and the protrusion 42 enters the notch, the end portion 43 of the holding portion 4b is placed on the substrate 10.
The substrate 100 is held in the horizontal direction by abutting on the outer peripheral edge of 0.

[0009]

In the rotary holding members 2a and 2b as described above, the holding force is increased as the distance between the abutting portions of the holding portions 4a and 4b abutting on the substrate 100 and the rotating shaft is increased. Becomes weak. This will be described with reference to FIG.

As shown in FIG. 17, the central portion 2 of the rod 200
01 is applied with the rotational force P, and the rod 200 is rotated about the rotation axis O.
Consider a case where the object is held by rotating. FIG.
17A shows a case where the end portion 202 of the rod 200 holds an object, and FIG. 17B shows a case where the center portion 201 of the rod 200 holds an object. Assuming that the rotational force P is 2A, FIG.
In the case of (a), the holding force H is A, and FIG.
In the case of, the holding force H is 2A. Thus, the longer the distance between the rotation axis O and the holding portion (contact portion), the weaker the holding force.

In the rotary holding member 2a shown in FIG.
Since the edge 41 existing on the outer peripheral portion of the holding portion 4a contacts the outer peripheral edge of the substrate 100, the distance between the rotating shaft 40 and the contact portion is long, and the holding force against the rotational force is weak.

On the other hand, in the rotary holding member 2b of FIG. 16, the projection 42 existing near the rotary shaft abuts on the outer peripheral edge of the substrate 100, so that the distance between the rotary shaft and the abutting portion is short. , Retaining power against rotating force is strong. However, when the notch portion of the substrate 100 is located at the location of the protrusion 42, the end portion 43 of the holding portion 4b abuts on the outer peripheral edge of the substrate 100, so that the distance between the rotating shaft and the abutting portion becomes long. As compared with the case where the protrusions 42 are in contact with each other, the holding force against the rotational force is weakened.

Therefore, the conventional rotary holding member 2a,
In the substrate rotation holding device using 2b, there is a possibility that slippage may occur between the substrate and the holding member when the substrate is rotated. An object of the present invention is to provide a substrate rotation holding device that can always hold a substrate in a horizontal direction with a strong holding force, and a rotary substrate processing apparatus using the same.

[0014]

A substrate rotation holding device according to a first aspect of the present invention is a substrate rotation holding device for rotating a substrate while holding it horizontally, and is a rotation driven in a horizontal posture. And a plurality of holding members that contact the outer peripheral edge of the substrate to regulate the horizontal position of the substrate, and at least one holding member of the plurality of holding members is rotatable about a predetermined rotation axis. The support part is attached to the rotating member, and the holding part has a convex curved surface. The curved surface of the holding part is attached to the support part so as to come into contact with the outer peripheral edge of the substrate as the support part rotates. It is provided eccentrically with respect to the rotating shaft.

A substrate rotation holding device according to a second aspect of the present invention is the substrate rotation holding device according to the first aspect of the present invention, wherein the support portion has an upper surface portion that supports a peripheral portion of the back surface of the substrate, and the holding portion. Is a columnar body provided on the upper surface of the support portion so as to be eccentric with respect to the rotation axis.

A substrate rotation holding device according to a third aspect of the invention is the substrate rotation holding device according to the first or second aspect of the invention, wherein the diameter of the holding portion is larger than the size of the notch portion of the substrate.

A substrate rotation holding device according to a fourth aspect of the present invention is the substrate rotation holding device according to the first aspect of the present invention, wherein the support portion has an upper surface portion that supports a peripheral portion of the back surface of the substrate, and the holding portion. The curved surface is formed on the upper surface of the support portion substantially from the rotation axis to the outer peripheral edge.

In the substrate rotation holding device according to the first to fourth aspects of the invention, the convex curved surface of the holding portion is formed by rotating the support portion of the at least one holding member in one direction around the rotation axis. The convex curved surface is separated from the outer peripheral edge of the substrate by contacting the outer peripheral edge of the substrate and rotating the support portion in the opposite direction around the rotation axis. In this case, the contact portion of the substrate with the outer peripheral edge becomes the top of the convex curved surface, and the distance between the rotating shaft and the contact portion is short. Therefore, the holding force against the rotational force becomes stronger. As a result, the substrate can be held in the horizontal direction with a strong holding force, and slippage does not occur between the substrate and the holding member.

Particularly, in the substrate rotation holding device according to the second aspect of the present invention, the upper surface of the supporting portion abuts the peripheral portion of the back surface of the substrate, and the outer peripheral surface of the cylindrical holding portion has the outer peripheral edge of the substrate. The substrate is supported in a horizontal posture and held in the horizontal direction by abutting against. In this case, since the displacement amount of the holding portion in the direction toward the outer peripheral edge of the substrate is smaller than the rotation displacement amount of the supporting portion, the holding force with respect to the rotational force becomes stronger.

Further, in the substrate rotation holding device according to the third aspect of the invention, since the diameter of the holding portion is larger than the dimension of the notch portion of the substrate, holding is performed even when the notch portion of the substrate is located at the holding portion. Part does not enter the notch part. Therefore, it is possible to always hold the substrate at the same position and with the same holding force regardless of the position of the notch portion.

In the substrate rotation holding device according to the fourth aspect of the present invention, the upper surface of the support portion abuts on the peripheral edge of the back surface of the substrate, and the curved surface of the holding portion abuts on the outer peripheral edge of the substrate. The substrate is supported in a horizontal posture and is held in the horizontal direction. In this case, since the contact portion with the substrate exists between the rotating shaft and the outer peripheral edge of the supporting portion, the distance between the rotating shaft and the contact portion becomes shorter, and the holding force against the rotating force becomes stronger. .

A rotary substrate processing apparatus according to the fifth invention is
It is provided with the substrate rotation holding device according to the first, second, third or fourth invention. In the rotary substrate processing apparatus according to the fifth aspect of the present invention, since the substrate rotation holding apparatus according to the first, second, third or fourth aspect of the invention is provided, the substrate is held horizontally with a strong holding force. It can be rotated. Therefore, no slippage occurs between the substrate and the holding member when the substrate rotates.

[0023]

1 is a perspective view of a substrate rotation holding device according to a first embodiment of the present invention, and FIG. 2 is a plan view of the substrate rotation holding device of FIG.

In FIGS. 1 and 2, the circular rotary member 1 is rotationally driven around the rotary shaft 1a. Below the rotary member 1, a ring-shaped magnet 11 is arranged coaxially with the rotary shaft 1a. A plurality of fixed rotary holding members 2 and two rotary holding members 5 are attached to the upper surface of the rotary member 1 along a circumference coaxial with the rotary shaft 1a. The structure of the fixed holding member 2 is similar to that of the fixed holding member 2 shown in FIG.

3A and 3B are a plan view and a side view of the rotary holding member 5, respectively. As shown in FIG. 3, the rotary holding member 5 includes a columnar supporting portion 6 and a columnar holding portion 7 having a diameter smaller than that of the supporting portion 6. The supporting portion 6 is attached to the rotating member 1 (see FIGS. 1 and 2) so as to be rotatable around a rotating shaft 6a that is coaxial with the central axis thereof. The holding portion 7 is provided on the upper surface of the support portion 6 so as to be eccentric with respect to the rotation shaft 6a. That is, the rotation shaft 6a of the support portion 6 and the central axis 7a of the holding portion 7 are displaced by a predetermined distance.

FIG. 4 is a perspective view showing the rotary holding member and the magnet holding portion attached to the lower portion thereof. As shown in FIG. 4, a circular magnet holding portion 9 is attached to a lower portion of the support portion 6 of the rotary holding member 5 via a rotating shaft body 8 coaxial with the rotating shaft 6a. A rod-shaped permanent magnet 10 is built in the center of the magnet holding portion 9.

5 and 6 are views for explaining the structure and operation of the substrate rotation holding device of FIG. 1, (a) is a partial sectional view of the rotary holding member and its peripheral portion, (b).
[Fig. 4] is a plan view of a rotary holding member.

As shown in FIGS. 5A and 6A, the rotary shaft body 8 of the rotary holding member 5 is rotatably supported by the rotary member 1 via a rotary bearing 12. The rotary bearing 12 is provided with, for example, a bearing mechanism in order to suppress rotary friction.

Before and after processing the substrate 100, as shown in FIG.
It is located below and apart from. At this time, the ring-shaped magnet 11
The line of magnetic force B formed by is oriented in the direction from the outside of the rotating member 1 toward the center at the height at which the permanent magnet 10 is installed. Therefore, the N pole of the permanent magnet 10 is attracted in the direction toward the center of the rotating member 1. Thereby,
As shown in FIG. 5B, the rotary holding member 5 rotates in the direction of the arrow X, and the outer peripheral surface of the holding portion 7 separates from the outer peripheral edge of the substrate 100.

When processing the substrate 100, as shown in FIG.
As shown in FIG.
Approach. Therefore, the south pole of the permanent magnet 10 is attracted to the north pole of the ring-shaped magnet 11. As a result, FIG.
As shown in (b), the rotary holding member 5 rotates in the direction of the arrow Y, the outer peripheral surface of the holding portion 7 contacts the outer peripheral edge of the substrate 100, and the substrate 100 is held in the horizontal direction.

In the rotary holding member 5 of this embodiment,
Since the outer peripheral surface of the holding portion 7 existing near the rotation axis 6a (see FIG. 3) of the support portion 6 abuts on the outer peripheral edge of the substrate 100, the rotation force of the substrate 100 against the rotational force of the permanent magnet 10 and the ring-shaped magnet 11 is increased. The holding power becomes stronger.

Moreover, as shown in FIG. 7, since the displacement amount L of the holding portion 7 relative to the rotational displacement amount R of the supporting portion 6 is small,
A large holding force can be obtained against the rotating force. As a result, the substrate 100 is securely held on the holding unit 7 without slipping.

Further, as shown in FIG. 8, when the substrate 100 has a notch portion 101, and the size of the opening of the notch portion 101 is, for example, 3 mm, the diameter of the support portion 6 of the rotary holding member 5 is For example, it is set to 16 mm, and the diameter of the holding portion 7 is set to 10 mm, for example. Thereby, even if the notch portion 101 is located at the holding portion 7, the holding portion 7
Does not enter the notch 101. Therefore, substrate 1
The substrate 100 can be held at almost the same position with the same holding force regardless of the position of the notch portion 101 of 00.

Further, as shown in FIG. 9, when the substrate 100 has an orientation flat portion (linear cutout) 102, even if the orientation flat portion 102 is located at the rotary holding member 5, the holding portion 7 is formed. Does not enter the direction toward the orientation flat portion 102, and the holding portion 7 does not abut on the orientation flat portion 102. Therefore, when cleaning the region 103 of the substrate 100 with the brush, the rotary holding member 5 does not hinder the cleaning.

Further, since the holding portion 7 is in contact with the outer peripheral edge of the substrate 100 not by the projection but by the curved surface, the holding portion 7 is less likely to be damaged. 10 and 11 show a second embodiment of the present invention.
FIGS. 3A and 3B are diagrams showing a rotary holding member used in the substrate rotation holding device in the embodiment of the present invention, in which FIG.

As shown in FIGS. 10 and 11, the rotary holding member 15 includes a cylindrical support portion 16 and a curved surface portion 17a.
And a holding unit 17 having a. The support portion 16 is attached to the rotating member so as to be rotatable around a rotating shaft 16a that is coaxial with the central axis thereof. The holding portion 17 is provided on the upper surface of the support portion 16, and the curved surface portion 17 a is the rotation shaft 16 a of the support portion 16.
To the outer peripheral surface, the central portion is formed to be convex.

As shown in FIGS. 10 (a) and 10 (b), when the rotary holding member 15 rotates around the rotation shaft 16a in the direction of the arrow X, the curved surface portion 17a of the holding portion 17 causes the outer circumference of the substrate 100. Move away from the edge. On the contrary, as shown in FIGS. 11A and 11B, when the rotary holding member 15 rotates around the rotation shaft 16a in the direction of the arrow Y, the curved surface portion 17a of the holding portion 17 is formed.
The substantially central portion of the abuts on the outer peripheral edge of the substrate 100. Thereby, the substrate 100 is held in the horizontal direction.

In the rotary holding member 15 of this embodiment, since the top of the curved surface portion 17a existing near the rotary shaft 16a abuts on the outer peripheral edge of the substrate 100, a strong holding force can be obtained.

FIG. 12 is a schematic perspective view of the whole substrate processing apparatus to which the substrate rotation holding device of the first and second embodiments can be applied. In the substrate processing apparatus of FIG. 12, a cleaning process, a coating process, a developing process, an adhesion strengthening process, a heating process,
An apparatus for performing a series of processes such as a cooling process, which has a first substrate processing region 301 on the front side and a second substrate processing region 302 on the rear side, and the first substrate processing region 301.
And a second substrate processing area 302, a transfer area 303 is provided.

In the first substrate processing area 301, a rotary cleaning unit (spin scrubber) SS for cleaning the substrate,
Rotating coating unit (spin coater) for coating the processing liquid
SC and a rotary developing unit (spin developer) SD for performing a developing process are arranged. Further, in the second substrate processing area 302, the adhesion strengthening part AH for performing the adhesion strengthening process,
A substrate heating unit (hot plate) HP that performs heat treatment and a substrate cooling unit (cooling plate) C that performs cooling treatment
P is arranged. A substrate transfer device 60 is movably provided in the transfer region 303.

Further, on the side of this substrate processing apparatus,
An indexer IND for loading and unloading the substrate 100 is provided. Indexer IND transfer robot 61
Removes the substrate 100 from the cassette 62 and sends it to the substrate transfer device 60, and conversely returns the substrate 100, which has been subjected to a series of processes, from the substrate transfer device 60 to the cassette 62.

The substrate transfer device 60 is movable back and forth toward the first substrate processing region 301 and the second substrate processing region 302, and the substrate 1 that has been processed with each processing unit is processed.
00 and the untreated substrate 100 are exchanged.

In the substrate processing apparatus of FIG. 12, the rotary cleaning unit SS, the rotary coating unit SC and the rotary developing unit SD are provided with the substrate rotation holding device of the first or second embodiment. As a result, the rotary cleaning unit SS and the rotary coating unit SC
Also, in the rotary developing section SD, it is possible to perform the predetermined processing while surely rotating and holding the substrate 100 without causing slippage.

In particular, when the present invention is applied to the rotary cleaning section SS, the following effects are produced. That is, in the rotary cleaning unit SS, as shown in FIG. 13, the substrate 100 is held by the holding unit 7 of the rotary holding member 5 in the direction of arrow Y and together with the rotary holding member 5 in the direction of arrow R1. It is assumed to be rotating. At this time, when a cleaning tool (not shown) such as a brush comes into contact with the rotating substrate 100, the substrate 1
00 tries to slide with respect to the rotary holding member 5 in a direction opposite to the rotation direction (direction of arrow R2), and the sliding direction is the direction in which the holding unit 7 holds the substrate 100. Therefore, the holding force of the rotary holding member 5 becomes strong while the cleaning tool is in contact with the rotating substrate 100. As described above, according to the present invention, it is possible not only to increase the holding force to a constant level but also to increase the holding force only when necessary.

The substrate rotation holding device of the present invention is not limited to the above embodiment and can be applied to various rotary substrate processing apparatuses. For example, by applying the substrate rotation holding device of the present invention to a rotary edge exposure device, it is possible to perform edge exposure of the substrate while reliably rotating and holding the substrate without causing slippage.

[Brief description of the drawings]

FIG. 1 is a schematic perspective view of a substrate rotation holding device according to a first embodiment of the present invention.

FIG. 2 is a plan view of the substrate rotation holding device of FIG.

3A and 3B are a plan view and a side view of a rotary holding member used in the substrate rotation holding device of FIG.

FIG. 4 is a perspective view of a rotary holding member and a magnet holding member used in the substrate rotation holding device of FIG.

5A and 5B are a partial cross-sectional view and a plan view showing a state where the holding portion of the rotary holding member is separated from the outer peripheral edge of the substrate.

6A and 6B are a partial cross-sectional view and a plan view showing a state where the holding portion of the rotary holding member is in contact with the outer peripheral edge of the substrate.

FIG. 7 is a plan view showing a relationship between a rotational displacement amount of a support portion of a rotary holding member and a displacement amount of a holding portion.

FIG. 8 is a plan view showing the relationship between the holding portion of the rotary holding member and the notch portion of the substrate.

FIG. 9 is a plan view showing the relationship between the rotary holding member and the orientation flat portion of the substrate.

10A and 10B are a plan view and a side view showing a state where the holding portion of the rotary holding member according to the second embodiment of the present invention is separated from the outer peripheral edge of the substrate.

11A and 11B are a plan view and a side view showing a state where the holding portion of the rotary holding member according to the second embodiment of the present invention is in contact with the outer peripheral edge of the substrate.

FIG. 12 is a schematic perspective view of an entire substrate processing apparatus to which the substrate rotation holding device according to the first and second embodiments of the present invention is applied.

FIG. 13 is a diagram for explaining an effect when the present invention is applied to a rotary cleaning unit.

FIG. 14 is a plan view of a conventional substrate rotation holding device.

15A and 15B are a plan view and a side view of a rotary holding member used in the substrate rotation holding device of FIG.

FIG. 16 is a plan view showing another example of a conventional rotary holding member.

FIG. 17 is a diagram for explaining the relationship between the rotational force and the holding force of the rotary holding member.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Rotating member 2 Fixed holding member 3 Substrate supporting part 4 Horizontal position regulating part 5,15 Rotating holding member 6,16 Supporting part 7,17 Holding part 7a Central shaft 6a, 16a Rotating shaft 17a Curved part

Claims (5)

[Claims] 1. A substrate rotation holding device for rotating a substrate while holding it horizontally, wherein a rotating member that is rotationally driven in a horizontal position and an outer peripheral edge of the substrate are in contact with each other to regulate a horizontal position of the substrate. At least one of the plurality of holding members includes a support portion rotatably attached to the rotating member about a predetermined rotation axis, and a convex curved surface. And a curved surface of the holding portion, the curved surface of the holding portion is provided eccentrically with respect to the rotation axis in the supporting portion so as to come into contact with the outer peripheral edge of the substrate as the supporting portion rotates. A substrate rotation holding device characterized by the above. 2. The support portion has an upper surface portion that supports a peripheral portion of the back surface of the substrate, and the holding portion is provided on the upper surface portion of the support portion eccentrically with respect to the rotation axis. The substrate rotation holding device according to claim 1, wherein the substrate rotation holding device comprises a columnar body. 3. The substrate rotation holding device according to claim 2, wherein a diameter of the holding portion is larger than a dimension of a notch portion of the substrate. 4. The support portion has an upper surface portion that supports a peripheral edge portion of the back surface of the substrate, and the curved surface of the holding portion extends from the rotary shaft to the outer peripheral edge of the upper surface portion of the support portion. The substrate rotation holding device according to claim 1, wherein the substrate rotation holding device is formed. 5. A rotary substrate processing apparatus comprising the substrate rotation holding device according to claim 1.