JP3763619B2

JP3763619B2 - Substrate rotation holding device and rotary substrate processing apparatus

Info

Publication number: JP3763619B2
Application number: JP28523496A
Authority: JP
Inventors: 靖中村; 学矢部
Original assignee: Screen Holdings Co Ltd; Dainippon Screen Manufacturing Co Ltd
Current assignee: Screen Holdings Co Ltd; Dainippon Screen Manufacturing Co Ltd
Priority date: 1996-10-28
Filing date: 1996-10-28
Publication date: 2006-04-05
Anticipated expiration: 2016-10-28
Also published as: JPH10135311A

Description

【０００１】
【発明の属する技術分野】
本発明は、基板を水平に保持しつつ回転させる基板回転保持装置およびそれを備えた回転式基板処理装置に関する。
【０００２】
【従来の技術】
回転式塗布装置、回転式現像装置等の回転式基板処理装置においては、半導体ウェハ等の基板を水平に保持しながら回転させる必要がある。一般的には、基板の裏面を真空吸着により吸引保持する吸引式スピンチャックが用いられている。しかしながら、吸引式スピンチャックでは、基板を確実に吸着保持するために強力な吸引を行っているので、基板の裏面に吸着跡が残る。基板裏面の吸着跡は、露光処理時のフォーカス異常を引き起こすという問題がある。
【０００３】
そこで、基板の裏面を支持するとともに基板の外周端面を保持しつつ基板に回転力を伝達するメカ式スピンチャックが提案されている。メカ式スピンチャックは、水平姿勢で回転駆動される回転ステージ上に、基板の裏面を垂直に支持する複数の支持ピンと、基板の外周端面に当接して基板の水平位置を規制しかつ基板に回転力を伝達する複数の保持ピンとが設けられてなる。
【０００４】
各保持ピンと基板の外周端面との間には、基板の搬入および搬出を容易にするために僅かな隙間が設けられている。スピンチャックが鉛直方向の軸の周りで回転駆動されると、複数の保持ピンのいくつかが基板の外周端面に圧接され、基板の中心が回転中心からやや偏心した状態で基板がスピンチャックとともに回転する。
【０００５】
【発明が解決しようとする課題】
しかしながら、上記のメカ式スピンチャックでは、基板の中心が回転中心からやや偏心した状態で基板が回転するので、負荷の不平衡による振動が発生し、その振動が他の基板処理ユニットに影響を与える可能性がある。
【０００６】
一方、特公平３−９６０７号公報、特開平６−３７００３号公報、特開平６−３７０７７号公報等に複数の可動爪（可動式保持部材）を用いたメカ式スピンチャックが開示されている。
【０００７】
例えば、特公平３−９６０７号公報に開示された基板回転保持装置では、筒状回転軸の上端部に回転板が設けられ、回転板上に基板の外周端面を挟持する複数の可動爪が配設され、筒状回転軸内に相対回転または相対移動可能に爪駆動軸が貫通されている。この爪駆動軸の上端部に可動爪操作リンクを介して可動爪が連結され、可動爪を基板挟持側へ付勢するように付勢ばねが設けられている。そして、付勢ばねに抗して可動爪を基板開放側へ解除するように可動爪解除手段が設けられている。
【０００８】
このような複数の可動爪を用いたメカ式スピンチャックにおいて、基板の中心を回転中心と正確に一致させるためには、少なくとも３本以上の可動爪を基板の回転中心から等距離の位置に分散配置するとともに、それらの３本以上の可動爪を等しい駆動力で回転中心へ向かって同時に移動させる求心機構が必要となる。
【０００９】
特に、オリエンテーションフラット（直線状切り欠き）、ノッチ（円弧状切り欠き）等の切り欠き部が設けられた基板を用いた場合、このような切り欠き部が任意の方向を向いた状態で基板の中心を回転中心と正確に一致させるためには、回転中心に向けて同時に移動可能な５本以上の可動爪が必要となる。
【００１０】
このように、従来のメカ式スピンチャックでは、３本以上または５本以上の可動爪を回転中心に向かって等しい駆動力で同時に移動させる求心機構が必要となり、構造が複雑になるという問題がある。
【００１１】
本発明の目的は、簡単な構成で基板の中心を回転中心と一致させた状態で基板を回転させることができる基板回転保持装置およびそれを備えた回転式基板処理装置を提供することである。
【００１２】
【課題を解決するための手段および発明の効果】
第１の発明に係る基板回転保持装置は、基板を水平に保持しつつ回転させる基板回転保持装置であって、水平姿勢で回転駆動される回転部材と、基板の外周端面に当接して基板を水平方向に保持する基板保持位置と基板の外周端面から離間する基板開放位置との間で移動可能に回転部材に取り付けられた複数の可動式保持部材と、回転部材に固定され、基板の外周端面に当接して基板の水平位置を規制する少なくとも２つの固定式保持部材とを備え、複数の可動式保持部材は、回転部材の回転中心を通る水平方向の仮想線で区分された回転部材上の２つの領域のうち一方の領域内に配設され、固定式保持部材は、基板が当接した状態で基板の中心が回転部材の回転中心に一致するように回転部材上の２つの領域のうち他方の領域内に配設され、複数の可動式保持部材の各々は、鉛直方向の回転軸の周りで回動可能に回転部材に取り付けられた支持部と、支持部の回動に伴って基板の外周端面に当接するように支持部の回転軸に対して偏心して設けられた保持部とを含み、複数の可動式保持部材の各々は磁石を有し、磁力により駆動され、基板がオリエンテーションフラットを有しかつそのオリエンテーションフラットの中央部が可動式保持部材に対向するように位置した場合に、可動式保持部材は、保持位置において保持部がオリエンテーションフラットの中央部に当接しないように設けられたものである。
【００１３】
第１の発明に係る基板回転保持装置においては、基板の搬入時に、可動式保持部材が基板開放位置に移動する。この状態で、基板が可動式保持部材および固定式保持部材で囲まれる回転部材上の領域に載置される。このとき、基板の外周端面と固定式保持部材および可動式保持部材との間に隙間が存在し、基板の中心は回転部材の回転中心と一致しない。
【００１４】
基板処理時には、可動式保持部材が基板の外周端面に当接して基板を水平方向に保持する基板保持位置に移動する。この場合、磁力により支持部を回動させることにより保持部を基板保持位置と基板開放位置との間で容易に移動させることができる。それにより、基板は、可動式保持部材により固定式保持部材に向かう方向に押し進められ、基板の外周端面が少なくとも２つの固定式保持部材に当接する。その結果、基板の中心が回転部材の回転中心と一致する。この状態で、回転部材が水平姿勢で回転駆動され、基板に所定の処理が行われる。
【００１５】
このように、基板の回転時に基板の中心と回転中心とが正確に一致するので、負荷の不平衡による振動を発生しない。したがって、安定した回転処理が行われる。
【００１６】
また、可動式保持部材および固定式保持部材により基板の中心を回転中心に正確に一致させる求心機構が構成されるので、求心機構の構造が簡単になる。
【００１７】
さらに、基板のオリエンテーションフラットの中央部が可動式保持部材に対向するように位置した場合でも、可動式保持部材が保持位置においてオリエンテーションフラットの中央部に当接しない。
【００１８】
第２の発明に係る基板回転保持装置は、第１の発明に係る基板回転保持装置の構成において、可動式保持部材が、回転部材の回転中心を挟んで固定式保持部材とほぼ対向する位置に配置されたものである。この場合、基板の中心が回転部材の回転中心に安定かつ確実に一致する。
【００１９】
第３の発明に係る基板回転保持装置は、第１または第２の発明に係る基板回転保持装置の構成において、可動式保持部材が、回転部材の回転中心を通って上記仮想線にほぼ直交する水平方向の中心線に関して対称に配置され、固定式保持部材が、回転部材上で中心線に関して対称に配置されたものである。これにより、安定かつ確実な求心機構が得られる。
【００２０】
第４の発明に係る基板回転保持装置は、第１、第２または第３の発明に係る基板回転保持装置の構成において、固定式保持部材が３つ以上の固定式保持部材からなるものである。
【００２１】
この場合、基板の切り欠き部がどの方向を向いていても、基板の外周端面が可動式保持部材および固定式保持部材により保持される。したがって、基板を回転部材上に載置する前に、基板の切り欠き部の向きを位置決めする必要がない。
【００２２】
第５の発明に係る回転式基板処理装置は、第１〜第４のいずれかの発明に係る基板回転保持装置と、基板回転保持装置を鉛直方向の軸の周りで回転駆動する回転駆動手段と、基板回転保持装置に保持された基板に所定の処理を行う処理手段とを備えたものである。
【００２３】
この場合、基板の回転時に基板の中心と回転中心とが正確に一致するので、負荷の不平衡による振動が発生しない。したがって、安定した回転処理が行われる。
【００２４】
また、基板の中心を回転中心に正確に一致させる求心機構が少なくとも１つの可動式保持部材および少なくとも２つの固定式保持部材により構成されるので、求心機構の構造が簡単になる。
【００２５】
【発明の実施の形態】
図１は参考例における回転式基板処理装置の断面図である。また、図２は図１の回転式基板処理装置の主要部の平面図である。
【００２６】
図１および図２において、基板回転保持装置１は円形板状の回転部材２を備える。回転部材２は、モータ３のシャフト４の先端部に水平に固定され、鉛直方向の軸の周りで回転駆動される。回転部材２の上面には基板１００の裏面を支持する複数の基板支持ピン６が設けられている。
【００２７】
また、回転部材２上には、基板１００の水平位置を規制する２つの固定式保持ピン７が固定され、かつ１つの回転式保持ピン８が軸受９により鉛直方向の軸の周りで回動可能に取り付けられている。回転式保持ピン８の下部には後述する棒状の永久磁石１０が取り付けられている。
【００２８】
回転部材２の下方には環状磁石１１が配設されている。この環状磁石１１は、駆動装置（図示せず）により上下動自在に設けられた磁石支持部材１２に固定されている。
【００２９】
回転部材２の上方には、フォトレジスト等の処理液を吐出するノズル５が上下方向および水平方向に移動可能に設けられている。このノズル５は、処理前および処理後に基板１００の上方から外れた位置に待機し、処理時に基板１００の中心部の上方に移動する。基板回転保持装置１の周囲には、処理液の飛散を防止するカップ１３が上下動自在に配設されている。
【００３０】
図２に示すように、固定式保持ピン８は回転部材２の回転中心Ｐを通る水平方向の仮想線Ｌ１で二分される領域Ａ，Ｂのうち一方の領域Ａ内に配置され、２つの固定式保持ピン７は他方の領域Ｂ内に配置されている。特に、回転式保持ピン８は、回転中心Ｐを通って上記の仮想線Ｌ１に直交する水平方向の中心線Ｌ２上に配置され、２つの固定式保持ピン７は中心線Ｌ２に関して互いに対称な位置に配置されている。また、２つの固定式保持ピン７は、基板１００と同じ径を有するそれらの内接円の中心が回転部材２の回転中心Ｐに位置するように配置される。すなわち、２つの固定式保持ピン７は回転中心Ｐから基板１００の半径と等しい距離だけ離れた位置に配置される。
【００３１】
本参考例では、モータ３が回転駆動手段に相当し、ノズル５が処理手段に相当する。また、固定式保持ピン７が固定式保持部材に相当し、回転式保持ピン８が可動式保持ピンに相当する。さらに、永久磁石１０および環状磁石１１が駆動手段を構成する。
【００３２】
図３は回転式保持ピン８の斜視図である。図３に示すように、回転式保持ピン８は、円柱状の支持部２１、円柱状（棒状）のピン部材２２、連結シャフト部２３および磁石収納部２４からなる。ピン部材２２は、支持部２１の上面に支持部２１の中心に対して偏心して設けられている。磁石収納部２４は、支持部２１の下部に連結シャフト２３を介して固定されている。磁石収納部２４内には、棒状の永久磁石１０が収納されている。
【００３３】
図４および図５は回転式保持ピン８の動作を説明するための図であり、（ａ）は回転式保持ピン８およびその周辺部の部分断面図、（ｂ）は回転式保持ピン８の平面図である。
【００３４】
基板１００の受け渡し時には、図４（ａ）に示すように、環状磁石１１が回転部材２の下方に離れて位置する。このとき、環状磁石１１が形成する磁力線Ｇは永久磁石１０が設置される高さにおいて、回転部材２の外側から中心部に向かう方向に向いている。したがって、永久磁石１０のＮ極が回転部材２の中心部に向かう方向に吸引される。それにより、図４（ｂ）に示すように、回転式保持ピン８が矢印Ｘの方向に回動し、ピン部材２２の外周面が基板１００の外周端面から離れる。このときのピン部材２２の位置を基板開放位置と呼ぶ。
【００３５】
基板１００の回転時には、図５（ａ）に示すように、環状磁石１１が上昇して回転部材２に接近する。したがって、永久磁石１０のＳ極が環状磁石１１のＮ極に吸引される。それにより、図５（ｂ）に示すように、回転式保持ピン８が矢印Ｙの方向に回動し、ピン部材２２の外周面が基板１００の外周端面に当接し、基板１００が水平方向に保持される。このときのピン部材２２の位置を基板保持位置と呼ぶ。
【００３６】
図６は基板回転保持装置１における基板搬入時の状態を示す平面図、図７は基板回転保持装置１における基板の保持状態を示す平面図である。次に、図６および図７を参照しながら図１の回転式基板処理装置における基板回転保持装置１の動作を説明する。
【００３７】
基板１００の搬入時には、図６に示すように、回転式保持ピン８が矢印Ｘの方向に回動し、ピン部材２２が基板開放位置に移動する。この状態で、基板搬送装置（図示せず）のアームに保持された基板１００が２つの固定式保持ピン７および１つの回転式保持ピン８で囲まれる領域内の基板支持ピン６上に載置される。
【００３８】
このとき、基板１００は、切り欠き部１０１が固定式保持ピン７および回転式保持ピン８から外れた方向を向くように予め位置決めされている。基板１００の外周端面と固定式保持ピン７および回転式保持ピン８のピン部材２２との間には隙間が存在し、基板１００の中心Ｒは回転部材２の回転中心Ｐからずれている。
【００３９】
次に、基板１００の処理時には、図７に示すように、回転式保持ピン８が矢印Ｙの方向に回動し、ピン部材２２が基板１００の外周端面に当接する基板保持位置に移動する。これにより、基板１００は、回転式保持ピン８のピン部材２２により固定式保持ピン７に向かう方向に押し進められ、基板１００の外周端面が２つの固定式保持ピン７の外周面に当接する。その結果、基板１００の中心Ｒが回転部材２の回転中心Ｐと一致する。
【００４０】
上記のように、参考例の回転式基板処理装置においては、基板１００の回転時に基板１００の中心Ｒと回転中心Ｐとが正確に一致するので、負荷の不平衡による振動が発生しない。したがって、安定した回転処理が行われる。
【００４１】
また、基板１００の中心Ｒを回転中心Ｐに正確に一致させる求心機構が２つの固定式保持ピン７および１つの回転式保持ピン８により構成されるので、求心機構の構造が簡単になる。
【００４２】
なお、図８に示すように、回転部材２上の領域Ｂ内に３つ以上の固定式保持ピン７を配置してもよい。この場合には、３つ以上の固定式保持ピン７の内接円が基板１００の外周に一致し、かつその内接円の中心が回転部材２の回転中心Ｐに一致するようにそれらの固定式保持ピン７を配置する。すなわち、３つ以上の固定式保持ピン７を回転部材２の回転中心Ｐから基板１００の半径に等しい距離だけ離れた位置に配置する。
【００４３】
図９は本発明の実施例における基板回転保持装置の主要部の平面図である。
本実施例の基板回転保持装置１は、以下の点を除いて上記参考例と同様の構成を有する。本実施例の基板回転保持装置１においては、回転部材２上に３つの固定式保持ピン７および２つの回転式保持ピン８が配設されている。
【００４４】
２つの回転式保持ピン８は回転部材１の回転中心Ｐを通る水平方向の仮想線Ｌ１で二分される領域Ａ，Ｂのうち一方の領域Ａに配置され、３つの固定式保持ピン７は他方の領域Ｂ内に配置されている。特に、２つの回転式保持ピン８は、回転中心Ｐを通って仮想線Ｌ１に直交する水平方向の中心線Ｌ２に関して互いに対称な位置に配置され、３つの固定式保持ピン７は、中心線Ｌ２上および中心線Ｌ２に関して対称な位置に配置されている。また、３つの固定式保持ピン７は、それらの固定式保持ピン７の内接円が基板１００の外周に一致し、かつその内接円の中心が回転部材２の回転中心Ｐに一致するように配置されている。
【００４５】
本実施例の基板回転保持装置１においては、基板１００の切り欠き部１０１がどの方向を向いていても、基板１００の外周端面が少なくとも１つの回転式保持ピン８および少なくとも２つの固定式保持ピン７により保持される。したがって、基板１００を基板回転保持装置１に載置する前に、基板１００の切り欠き部１０１の向きを位置決めする必要がない。
【００４６】
本実施例の基板回転保持装置１においても、基板１００の回転時に基板１００の中心と回転中心とが正確に一致するので、負荷の不平衡による振動が発生しない。したがって、安定した回転処理が行われる。
【００４７】
また、基板１００の中心を回転中心に正確に一致させる求心機構が３つの固定式保持ピン７および２つの回転式保持ピン８により構成されるので、求心機構の構造が簡単になる。
【００４８】
図１０に示すように、回転部材２上の領域Ｂ内に４つ以上の固定式保持ピン７を配設してもよい。この場合には、４つ以上の固定式保持ピン７の内接円が基板１００の外周に一致し、かつその内接円の中心が回転部材２の回転中心Ｐに一致するようにそれらの固定式保持ピン７を配置する。
【００４９】
なお、固定式保持ピン７および回転式保持ピン８の数は上記実施例に限定されない。基板１００の切り欠き部１０１が所定の方向を向くように予め位置決めされる場合には、２つ以上の任意の数の固定式保持ピン７および１つ以上の任意の数の回転式保持ピン８を設け、基板１００の切り欠き部１０１の方向が予め位置決めされない場合には、３つ以上の任意の数の固定式保持ピン７および２つ以上の任意の数の回転式保持ピン８を設ければよい。
【００５０】
なお、本発明の基板回転保持装置は、回転式塗布装置、回転式現像装置に限らず、種々の回転式基板処理装置に適用することができる。例えば、本発明の基板回転保持装置を回転式エッジ露光装置に適用することにより、基板の中心と回転中心とを正確に一致させつつ基板のエッジ露光を正確に行うことが可能となる。
【００５１】
また、本発明の基板回転保持装置を液晶表示装置用ガラス基板、フォトマスク用ガラス基板、光ディスク用基板等を処理する回転式基板処理装置に適用してもよい。
【図面の簡単な説明】
【図１】本発明の参考例における回転式基板処理装置の断面図である。
【図２】図１の回転式基板処理装置の主要部の平面図である。
【図３】図１に示される基板回転保持装置における回転式保持ピンの斜視図である。
【図４】回転式保持ピンのピン部材が基板の外周端面から離れた状態を示す部分断面図および平面図である。
【図５】回転式保持ピンのピン部材が基板の外周端面に当接した状態を示す部分断面図および平面図である。
【図６】図１に示される基板回転保持装置における基板搬入時の状態を示す平面図である。
【図７】図１に示される基板回転保持装置における基板の保持状態を示す平面図である。
【図８】基板回転保持装置における固定式保持ピンの他の配置例を示す平面図である。
【図９】本発明の実施例における基板回転保持装置の主要部の平面図である。
【図１０】実施例の基板回転保持装置における固定式保持ピンの他の配置例を示す平面図である。
【符号の説明】
１基板回転保持装置
２回転部材
３モータ
４シャフト
５ノズル
６基板支持ピン
７固定式保持ピン
９回転式保持ピン
１０永久磁石
１１環状磁石
２１支持部
２２ピン部材[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate rotation holding device that rotates a substrate while holding the substrate horizontally, and a rotary substrate processing apparatus including the substrate rotation holding device.
[0002]
[Prior art]
In a rotary substrate processing apparatus such as a rotary coating apparatus or a rotary developing apparatus, it is necessary to rotate a substrate such as a semiconductor wafer while holding it horizontally. Generally, a suction spin chuck that sucks and holds the back surface of the substrate by vacuum suction is used. However, in the suction type spin chuck, strong suction is performed in order to securely hold the substrate by suction, so that a suction mark remains on the back surface of the substrate. The suction mark on the back surface of the substrate has a problem of causing a focus abnormality during the exposure process.
[0003]
Therefore, a mechanical spin chuck that supports the back surface of the substrate and transmits the rotational force to the substrate while holding the outer peripheral end surface of the substrate has been proposed. The mechanical spin chuck controls a horizontal position of the substrate by contacting a plurality of support pins that vertically support the back surface of the substrate and a peripheral end surface of the substrate on a rotating stage that is rotationally driven in a horizontal posture and rotates to the substrate. A plurality of holding pins for transmitting the force are provided.
[0004]
A slight gap is provided between each holding pin and the outer peripheral end surface of the substrate in order to facilitate loading and unloading of the substrate. When the spin chuck is driven to rotate around the vertical axis, some of the holding pins are pressed against the outer peripheral edge of the substrate, and the substrate rotates with the spin chuck with the center of the substrate slightly decentered from the center of rotation. To do.
[0005]
[Problems to be solved by the invention]
However, in the mechanical spin chuck described above, the substrate rotates with the center of the substrate slightly decentered from the center of rotation, so that vibration due to load imbalance occurs, and the vibration affects other substrate processing units. there is a possibility.
[0006]
On the other hand, a mechanical spin chuck using a plurality of movable claws (movable holding members) is disclosed in Japanese Patent Publication No. 3-9607 , Japanese Patent Laid- Open No. 6-37003 , Japanese Patent Laid-Open No. 6-37077, and the like.
[0007]
For example, in the substrate rotation holding device disclosed in Japanese Examined Patent Publication No. 3-9607, a rotating plate is provided at the upper end of a cylindrical rotating shaft, and a plurality of movable claws that sandwich the outer peripheral end surface of the substrate are arranged on the rotating plate. The claw drive shaft is penetrated through the cylindrical rotation shaft so as to be capable of relative rotation or relative movement. A movable claw is connected to the upper end of the claw drive shaft via a movable claw operation link, and a biasing spring is provided so as to bias the movable claw toward the substrate clamping side. A movable claw release means is provided so as to release the movable claw to the substrate opening side against the biasing spring.
[0008]
In such a mechanical spin chuck using a plurality of movable claws, in order to accurately align the center of the substrate with the rotation center, at least three or more movable claws are distributed at equal distances from the rotation center of the substrate. A centripetal mechanism is required which is arranged and simultaneously moves the three or more movable claws toward the center of rotation with equal driving force.
[0009]
In particular, when a substrate provided with notches such as an orientation flat (linear notch) and notch (arc notch) is used, the notch is oriented in any direction. In order to make the center coincide with the center of rotation accurately, five or more movable claws that can move simultaneously toward the center of rotation are required.
[0010]
As described above, the conventional mechanical spin chuck requires a centripetal mechanism that simultaneously moves three or more or five or more movable claws toward the center of rotation with the same driving force, resulting in a complicated structure. .
[0011]
An object of the present invention is to provide a substrate rotation holding device capable of rotating a substrate in a state where the center of the substrate coincides with the rotation center with a simple configuration, and a rotary substrate processing apparatus including the substrate rotation holding device.
[0012]
[Means for Solving the Problems and Effects of the Invention]
A substrate rotation holding device according to a first aspect of the present invention is a substrate rotation holding device for rotating a substrate while holding the substrate horizontally, and a rotating member that is rotationally driven in a horizontal posture and an outer peripheral end surface of the substrate in contact with the substrate. A plurality of movable holding members attached to the rotating member so as to be movable between a substrate holding position for holding in the horizontal direction and a substrate opening position spaced apart from the outer peripheral end surface of the substrate, and an outer peripheral end surface of the substrate fixed to the rotating member And at least two fixed holding members that regulate the horizontal position of the substrate, and the plurality of movable holding members are on a rotating member that is partitioned by a horizontal imaginary line that passes through the rotation center of the rotating member. The fixed holding member is disposed in one of the two regions, and the fixed holding member is in the two regions on the rotating member so that the center of the substrate coincides with the rotation center of the rotating member in a state where the substrate is in contact with the fixed holding member. In the other area Each of the plurality of movable holding member is supported so as to abut against the vertical support part attached to the rotatable rotary member about the axis of rotation, the outer peripheral edge surface of the substrate in accordance with the rotation of the support section Each of the plurality of movable holding members has a magnet, is driven by magnetic force, the substrate has an orientation flat, and the center of the orientation flat When the portion is positioned so as to face the movable holding member, the movable holding member is provided so that the holding portion does not contact the central portion of the orientation flat at the holding position.
[0013]
In the substrate rotation holding device according to the first aspect of the invention, the movable holding member moves to the substrate opening position when the substrate is carried in. In this state, the substrate is placed on a region on the rotating member surrounded by the movable holding member and the fixed holding member. At this time, a gap exists between the outer peripheral end surface of the substrate and the fixed holding member and the movable holding member, and the center of the substrate does not coincide with the rotation center of the rotating member.
[0014]
At the time of substrate processing, the movable holding member moves to a substrate holding position that holds the substrate in the horizontal direction by contacting the outer peripheral end surface of the substrate. In this case, the holding portion can be easily moved between the substrate holding position and the substrate opening position by rotating the support portion by the magnetic force. Thereby, the substrate is pushed forward by the movable holding member in the direction toward the fixed holding member, and the outer peripheral end surface of the substrate contacts at least two fixed holding members. As a result, the center of the substrate coincides with the rotation center of the rotating member. In this state, the rotating member is rotationally driven in a horizontal posture, and a predetermined process is performed on the substrate.
[0015]
Thus, since the center of the substrate and the center of rotation exactly coincide with each other when the substrate is rotated, vibration due to load imbalance does not occur. Therefore, stable rotation processing is performed.
[0016]
Further, since the centripetal mechanism for precisely aligning the center of the substrate with the center of rotation is constituted by the movable holding member and the fixed holding member, the structure of the centripetal mechanism is simplified.
[0017]
Furthermore, even when the center portion of the orientation flat of the substrate is positioned so as to face the movable holding member, the movable holding member does not contact the center portion of the orientation flat at the holding position.
[0018]
The substrate rotation holding device according to the second invention is the substrate rotation holding device according to the first invention, wherein the movable holding member is positioned substantially opposite the fixed holding member across the rotation center of the rotation member. It is arranged. In this case, the center of the substrate coincides with the rotation center of the rotating member stably and reliably.
[0019]
A substrate rotation holding device according to a third invention is the substrate rotation holding device according to the first or second invention, wherein the movable holding member is substantially orthogonal to the imaginary line through the rotation center of the rotation member. They are arranged symmetrically with respect to the horizontal center line, a fixed holding member, in which are arranged symmetrically with respect to the center line on the rotating member. Thereby, a stable and reliable centripetal mechanism is obtained.
[0020]
Fourth substrate rotation holding device according to the present invention, the first, in the configuration of the substrate rotating holding device according to the second or third invention, wherein the solid formulation holding member is made of three or more fixed retaining member .
[0021]
In this case, the outer peripheral end surface of the substrate is held by the movable holding member and the fixed holding member regardless of the direction in which the cutout portion of the substrate faces. Therefore, it is not necessary to position the direction of the notch portion of the substrate before placing the substrate on the rotating member.
[0022]
Rotary substrate processing apparatus according to the fifth invention, a substrate rotating holding device according to the first to fourth invention of any one of the rotary drive means for rotating the substrate rotation holding device about a vertical axis And a processing means for performing a predetermined process on the substrate held by the substrate rotation holding device.
[0023]
In this case, since the center of the substrate and the center of rotation exactly coincide with each other when the substrate is rotated, vibration due to load imbalance does not occur. Therefore, stable rotation processing is performed.
[0024]
Further, since the centripetal mechanism that exactly matches the center of the substrate with the center of rotation is constituted by at least one movable holding member and at least two fixed holding members, the structure of the centripetal mechanism is simplified.
[0025]
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 is a sectional view of a rotary substrate processing apparatus in a reference example . FIG. 2 is a plan view of the main part of the rotary substrate processing apparatus of FIG.
[0026]
1 and 2, the substrate rotation holding device 1 includes a circular plate-shaped rotation member 2. The rotating member 2 is horizontally fixed to the tip portion of the shaft 4 of the motor 3 and is driven to rotate around a vertical axis. A plurality of substrate support pins 6 that support the back surface of the substrate 100 are provided on the upper surface of the rotating member 2.
[0027]
Further, two fixed holding pins 7 for regulating the horizontal position of the substrate 100 are fixed on the rotating member 2, and one rotary holding pin 8 can be rotated around a vertical axis by a bearing 9. Is attached. A rod-shaped permanent magnet 10 to be described later is attached to the lower part of the rotary holding pin 8.
[0028]
An annular magnet 11 is disposed below the rotating member 2. The annular magnet 11 is fixed to a magnet support member 12 provided so as to be movable up and down by a driving device (not shown).
[0029]
Above the rotating member 2, a nozzle 5 for discharging a processing liquid such as a photoresist is provided so as to be movable in the vertical direction and the horizontal direction. This nozzle 5 stands by at a position deviated from above the substrate 100 before and after processing, and moves above the central portion of the substrate 100 during processing. Around the substrate rotation holding device 1, a cup 13 for preventing the processing liquid from scattering is disposed so as to be movable up and down.
[0030]
As shown in FIG. 2, the fixed holding pin 8 is disposed in one area A of the areas A and B divided by a horizontal imaginary line L1 passing through the rotation center P of the rotating member 2 and is fixed to two. The expression holding pin 7 is disposed in the other region B. In particular, the rotary holding pin 8 is disposed on a horizontal center line L2 that passes through the rotation center P and is orthogonal to the imaginary line L1, and the two fixed holding pins 7 are symmetrical with respect to the center line L2. Is arranged. The two fixed holding pins 7 are arranged such that the centers of their inscribed circles having the same diameter as the substrate 100 are positioned at the rotation center P of the rotating member 2. That is, the two fixed holding pins 7 are arranged at a position away from the rotation center P by a distance equal to the radius of the substrate 100.
[0031]
In this reference example, the motor 3 corresponds to a rotation driving unit, and the nozzle 5 corresponds to a processing unit. The fixed holding pin 7 corresponds to a fixed holding member, and the rotary holding pin 8 corresponds to a movable holding pin. Further, the permanent magnet 10 and the annular magnet 11 constitute a driving means.
[0032]
FIG. 3 is a perspective view of the rotary holding pin 8. As shown in FIG. 3, the rotary holding pin 8 includes a columnar support portion 21, a columnar (rod-shaped) pin member 22, a connecting shaft portion 23, and a magnet storage portion 24. The pin member 22 is provided on the upper surface of the support portion 21 so as to be eccentric with respect to the center of the support portion 21. The magnet storage part 24 is fixed to the lower part of the support part 21 via a connecting shaft 23. A rod-shaped permanent magnet 10 is stored in the magnet storage unit 24.
[0033]
4 and 5 are diagrams for explaining the operation of the rotary holding pin 8, (a) is a partial cross-sectional view of the rotary holding pin 8 and its peripheral portion, and (b) is a view of the rotary holding pin 8. It is a top view.
[0034]
When the substrate 100 is delivered, the annular magnet 11 is positioned below the rotating member 2 as shown in FIG. At this time, the lines of magnetic force G formed by the annular magnet 11 are directed in the direction from the outside of the rotating member 2 toward the center at the height at which the permanent magnet 10 is installed. Therefore, the N pole of the permanent magnet 10 is attracted in the direction toward the center of the rotating member 2. As a result, as shown in FIG. 4B, the rotary holding pin 8 rotates in the direction of the arrow X, and the outer peripheral surface of the pin member 22 is separated from the outer peripheral end surface of the substrate 100. The position of the pin member 22 at this time is called a substrate open position.
[0035]
When the substrate 100 rotates, the annular magnet 11 rises and approaches the rotating member 2 as shown in FIG. Therefore, the south pole of the permanent magnet 10 is attracted to the north pole of the annular magnet 11. As a result, as shown in FIG. 5B, the rotary holding pin 8 rotates in the direction of arrow Y, the outer peripheral surface of the pin member 22 abuts on the outer peripheral end surface of the substrate 100, and the substrate 100 becomes horizontal. Retained. The position of the pin member 22 at this time is called a substrate holding position.
[0036]
6 is a plan view showing a state when the substrate is carried in the substrate rotation holding device 1, and FIG. 7 is a plan view showing a substrate holding state in the substrate rotation holding device 1. FIG. Next, the operation of the substrate rotation holding device 1 in the rotary substrate processing apparatus of FIG. 1 will be described with reference to FIGS.
[0037]
When the substrate 100 is carried in, as shown in FIG. 6, the rotary holding pin 8 rotates in the direction of the arrow X, and the pin member 22 moves to the substrate open position. In this state, the substrate 100 held by the arm of the substrate transfer device (not shown) is placed on the substrate support pin 6 in the area surrounded by the two fixed holding pins 7 and the one rotary holding pin 8. Is done.
[0038]
At this time, the substrate 100 is positioned in advance so that the cutout portion 101 faces the direction away from the fixed holding pin 7 and the rotary holding pin 8. There is a gap between the outer peripheral end face of the substrate 100 and the pin member 22 of the fixed holding pin 7 and the rotary holding pin 8, and the center R of the substrate 100 is shifted from the rotation center P of the rotating member 2.
[0039]
Next, at the time of processing the substrate 100, as shown in FIG. 7, the rotary holding pin 8 rotates in the direction of the arrow Y, and the pin member 22 moves to the substrate holding position where it abuts on the outer peripheral end surface of the substrate 100. As a result, the substrate 100 is pushed in the direction toward the fixed holding pin 7 by the pin member 22 of the rotary holding pin 8, and the outer peripheral end surface of the substrate 100 abuts on the outer peripheral surface of the two fixed holding pins 7. As a result, the center R of the substrate 100 coincides with the rotation center P of the rotating member 2.
[0040]
As described above, in the rotary substrate processing apparatus of the reference example , when the substrate 100 is rotated, the center R and the rotation center P of the substrate 100 accurately coincide with each other, so that vibration due to load imbalance does not occur. Therefore, stable rotation processing is performed.
[0041]
In addition, the centripetal mechanism that exactly matches the center R of the substrate 100 with the rotation center P is constituted by the two fixed holding pins 7 and the one rotary holding pin 8, so that the structure of the centripetal mechanism is simplified.
[0042]
As shown in FIG. 8, three or more fixed holding pins 7 may be arranged in the region B on the rotating member 2. In this case, the inscribed circles of the three or more fixed holding pins 7 are fixed so that the inscribed circle coincides with the outer periphery of the substrate 100 and the center of the inscribed circle coincides with the rotation center P of the rotating member 2. An expression holding pin 7 is arranged. That is, the three or more fixed holding pins 7 are arranged at positions separated from the rotation center P of the rotating member 2 by a distance equal to the radius of the substrate 100.
[0043]
Figure 9 is a plan view of a main portion of the substrate rotating holding device in the real施例of the present invention.
The substrate rotation holding device 1 of the present embodiment has the same configuration as that of the reference example except for the following points. In the substrate rotation holding device 1 of the present embodiment, three fixed holding pins 7 and two rotary holding pins 8 are disposed on the rotating member 2.
[0044]
The two rotary holding pins 8 are arranged in one of the areas A and B divided by a horizontal imaginary line L1 passing through the rotation center P of the rotary member 1, and the three fixed holding pins 7 are the other. In the region B. In particular, the two rotary holding pins 8 are arranged at positions symmetrical to each other with respect to the horizontal center line L2 orthogonal to the imaginary line L1 through the rotation center P, and the three fixed holding pins 7 are connected to the center line L2. They are arranged at symmetrical positions with respect to the upper and center lines L2. Further, the three fixed holding pins 7 are arranged such that the inscribed circles of the fixed holding pins 7 coincide with the outer periphery of the substrate 100 and the center of the inscribed circle coincides with the rotation center P of the rotating member 2. Is arranged.
[0045]
In the substrate rotation holding device 1 of the present embodiment, the outer peripheral end surface of the substrate 100 has at least one rotary holding pin 8 and at least two fixed holding pins, regardless of which direction the notch 101 of the substrate 100 faces. 7 is held. Therefore, it is not necessary to position the orientation of the notch 101 of the substrate 100 before placing the substrate 100 on the substrate rotation holding device 1.
[0046]
Also in the substrate rotation holding device 1 of the present embodiment, the center of the substrate 100 and the center of rotation exactly coincide with each other when the substrate 100 rotates, so that vibration due to load imbalance does not occur. Therefore, stable rotation processing is performed.
[0047]
In addition, the centripetal mechanism for precisely matching the center of the substrate 100 with the center of rotation is constituted by the three fixed holding pins 7 and the two rotary holding pins 8, so that the structure of the centripetal mechanism is simplified.
[0048]
As shown in FIG. 10, four or more fixed holding pins 7 may be disposed in the region B on the rotating member 2. In this case, the inscribed circles of the four or more fixed holding pins 7 are fixed to each other so that the inscribed circle coincides with the outer periphery of the substrate 100 and the center of the inscribed circle coincides with the rotation center P of the rotating member 2. An expression holding pin 7 is arranged.
[0049]
The numbers of the fixed holding pins 7 and the rotary holding pins 8 are not limited to the above embodiment. When the notch portion 101 of the substrate 100 is positioned in advance so as to face a predetermined direction, two or more arbitrary numbers of fixed holding pins 7 and one or more arbitrary numbers of rotary holding pins 8 are used. If the direction of the notch 101 of the substrate 100 is not previously positioned, three or more arbitrary numbers of fixed holding pins 7 and two or more arbitrary numbers of rotary holding pins 8 can be provided. That's fine.
[0050]
The substrate rotation holding device of the present invention can be applied not only to the rotary coating device and the rotary developing device but also to various rotary substrate processing apparatuses. For example, by applying the substrate rotation holding device of the present invention to a rotary edge exposure apparatus, it is possible to accurately perform edge exposure of the substrate while accurately matching the center of the substrate and the rotation center.
[0051]
The substrate rotation holding device of the present invention may be applied to a rotary substrate processing apparatus for processing a glass substrate for a liquid crystal display device, a glass substrate for a photomask, a substrate for an optical disk, and the like.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view of a rotary substrate processing apparatus in a reference example of the present invention.
FIG. 2 is a plan view of a main part of the rotary substrate processing apparatus of FIG.
FIG. 3 is a perspective view of a rotary holding pin in the substrate rotation holding device shown in FIG.
FIGS. 4A and 4B are a partial cross-sectional view and a plan view showing a state where the pin member of the rotary holding pin is separated from the outer peripheral end surface of the substrate. FIGS.
FIGS. 5A and 5B are a partial cross-sectional view and a plan view showing a state where a pin member of a rotary holding pin is in contact with an outer peripheral end surface of a substrate.
6 is a plan view showing a state when a substrate is carried in the substrate rotation holding device shown in FIG. 1. FIG.
7 is a plan view showing a holding state of the substrate in the substrate rotation holding device shown in FIG. 1. FIG.
FIG. 8 is a plan view showing another arrangement example of the fixed holding pins in the substrate rotation holding device.
9 is a plan view of a main portion of the substrate rotating holding device in the real施例of the present invention.
10 is a plan view showing another arrangement example of the fixed holding pin in the substrate rotation holding device real施例.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Substrate rotation holding device 2 Rotating member 3 Motor 4 Shaft 5 Nozzle 6 Substrate support pin 7 Fixed holding pin 9 Rotating holding pin 10 Permanent magnet 11 Ring magnet 21 Support part 22 Pin member

Claims

A substrate rotation holding device that rotates while holding a substrate horizontally,
A rotating member that is rotationally driven in a horizontal position;
A plurality of movable types attached to the rotating member so as to be movable between a substrate holding position that contacts the outer peripheral end surface of the substrate and holds the substrate in a horizontal direction and a substrate open position that is separated from the outer peripheral end surface of the substrate. A holding member;
And at least two fixed holding members that are fixed to the rotating member and abut against an outer peripheral end surface of the substrate to regulate a horizontal position of the substrate,
The plurality of movable holding members are disposed in one of the two regions on the rotating member divided by a virtual imaginary line passing through the rotation center of the rotating member,
The fixed holding member is disposed in the other region of the two regions on the rotating member so that the center of the substrate coincides with the rotation center of the rotating member in a state where the substrate is in contact. ,
Each of the plurality of movable holding members abuts against a support portion attached to the rotation member so as to be rotatable around a vertical rotation axis, and an outer peripheral end surface of the substrate as the support portion rotates. A holding portion provided eccentrically with respect to the rotation shaft of the support portion so as to contact,
Each of the plurality of movable holding members has a magnet and is driven by a magnetic force.
When the substrate has an orientation flat and the center portion of the orientation flat is positioned so as to oppose the movable holding member, the movable holding member has the holding portion in the orientation flat at the holding position. A substrate rotation holding device provided so as not to contact the central portion.

2. The substrate rotation holding device according to claim 1, wherein the movable holding member is disposed at a position substantially opposite to the fixed holding member with the rotation center of the rotation member interposed therebetween.

It said movable holding member is arranged symmetrically related to the horizontal center line substantially perpendicular to the imaginary line through the center of rotation of the rotary member,
The substrate rotation holding device according to claim 1, wherein the fixed holding member is arranged symmetrically with respect to the center line on the rotation member.

4. The substrate rotation holding apparatus according to claim 1, wherein the fixed holding member includes three or more fixed holding members.

The substrate rotation holding device according to any one of claims 1 to 4,
Rotation driving means for driving the substrate rotation holding device to rotate about a vertical axis;
A rotary substrate processing apparatus comprising: processing means for performing predetermined processing on the substrate held by the substrate rotation holding device.