JP2002192053A - Spin processor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a spin processor which can hold a substrate by reliably bringing a plurality of holding parts into contact with the peripheral surface of the substrate. SOLUTION: The spin processor has a motor 14 which rotationally drives a rotary table 1, at least three supports 31 rotatably provided on the peripheral part of a rotary table along a peripheral direction at prescribed intervals, a holding part 44 which is provided at the upper end of each support eccentrically from a center of rotation and holds the substrate in contact with the peripheral surface of the substrate by eccentrically rotating by the rotation of the support, an opening/closing cylindrical body 53 which rotates the support selectively in a lock direction where each holding part approaches the outer peripheral surface of the substrate, and in a release direction where the holding part breaks away from the outer peripheral surface of the substrate, and a torsional spring 62 which energizes each support in the lock direction separately, and brings each holding part into elastic contact with the outer peripheral surface of the substrate when the support is rotated in the lock direction by the opening/closing cylindrical body.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a spin processing apparatus for performing processing by spraying a processing liquid onto a rotated substrate.

[0002]

2. Description of the Related Art For example, in a process of manufacturing a semiconductor device or a liquid crystal display device, there are a film forming process and a photo process for forming a circuit pattern on a substrate such as a semiconductor wafer or a rectangular glass plate. In these processes, a chemical treatment with a chemical and a cleaning treatment with pure water are repeatedly performed on the substrate.

When processing is performed on the substrate, a spin processing apparatus is used. The spin processing apparatus has a rotary table for holding a substrate, and by injecting a processing liquid onto the substrate while rotating the rotary table at a high speed,
This substrate is to be processed.

A mechanism for holding a substrate on a rotary table supports a plurality of supports on the rotary table so as to be rotatable at predetermined intervals in a circumferential direction, and each support has an upper end at a position eccentric from the center of rotation of the support. A holding section is provided.

[0005] Then, the substrate is supplied onto the rotary table,
When the peripheral portion is engaged with the upper end surface of the support, each support is rotated to eccentrically rotate each holding portion, so that these holding portions contact the outer peripheral surface of the substrate, and the substrate is I keep it.

Conventionally, a gear mechanism has been used to simultaneously rotate a plurality of supports. That is, while the parent gear is provided on the lower surface side of the rotary table, a child gear meshing with the parent gear is provided on the lower end of each support protruding on the lower surface side of the rotary table. Then, by rotating the parent gear, the support is rotated together with the child gear, and the holding portion of each support holds the outer peripheral surface of the substrate.

[0007]

In the case where the support is rotated by the gear mechanism and the holding portion provided on the support is brought into contact with the outer peripheral surface of the substrate, each support rotates by the same angle. At this time, each holding portion is brought into contact with the outer peripheral surface of the substrate.

However, in the case of a configuration in which a plurality of supports are rotated by a gear mechanism, when the parent gear is rotated due to manufacturing accuracy of the gears, backlash generated between the parent gear and the child gear, or assembly precision of the support, etc. It is difficult to make the holding portions of the respective support members simultaneously contact the outer peripheral surface of the substrate via the child gear meshed with the parent gear.

For this reason, of the plurality of supports, the holding portions of some of the supports come into contact with the outer peripheral surface of the substrate, but the holding portions of the other supports do not contact the outer peripheral surface of the substrate. Since the substrate is held, the holding state of the substrate may not be stable.

[0010] For example, when the rotary table is provided with six supports, the substrate is held by the holders of three of the supports, and the holders of the remaining three supports are held by the substrates. May not be in contact with the outer peripheral surface of the substrate, and the holding state of the substrate may be unstable.

It is an object of the present invention to provide a spin processing apparatus capable of reliably holding a plurality of holding portions of a support against the outer peripheral surface of a substrate.

[0012]

According to a first aspect of the present invention, there is provided a spin processing apparatus for processing a substrate with a processing liquid while rotating the substrate, a rotary table, driving means for rotating the rotary table, At least three or more supports that are rotatably provided at predetermined intervals along the circumferential direction in the peripheral portion, and are provided eccentrically from the center of rotation at the upper end of each support and are eccentrically rotated by the rotation of the supports to achieve the above. A holding portion that abuts on the outer peripheral surface of the substrate and holds the substrate; and a lock direction in which the respective holding portions approach the outer peripheral surface of the substrate and a release in which the holding portions separate from the outer peripheral surface of the substrate. Opening / closing means for selectively rotating in the direction, and when the support is rotated in the locking direction by the opening / closing means, each support is separately biased in the locking direction to hold each of the supports. Some spin processing apparatus characterized by comprising a biasing means for resiliently abutting on the outer circumferential surface of the substrate.

According to a second aspect of the present invention, there is provided a spin processing apparatus for processing a substrate with a processing liquid while rotating the same, a rotary table, driving means for driving the rotary table to rotate, and a peripheral portion around the rotary table in a circumferential direction. At least three or more supports rotatably provided at predetermined intervals along the outer periphery of the substrate by being eccentrically provided at the upper end of each support from the center of rotation and being eccentrically rotated by the rotation of the supports. A holding portion that contacts and holds the substrate, a lever having one end attached to a lower end of the support that protrudes from the lower surface of the turntable, and is rotatable with the turntable and rotates integrally with the turntable. An engagement arm is provided on the outer peripheral surface for engaging with the other end of the lever, and prevents rotation with respect to the rotary table to hold the rotary table in a predetermined position. By selectively rotating the supporting members via the engaging arm and the lever, the respective supporting members can be selectively moved in a locking direction in which the respective holding portions approach the outer peripheral surface of the substrate and a releasing direction in which the respective supporting members separate from the outer peripheral surface of the substrate. An opening / closing cylinder to be rotated, and when the support is rotated in the locking direction by the opening / closing cylinder, the supports are separately biased in the locking direction to elastically hold the respective holding portions on the outer peripheral surface of the substrate. And a biasing means for causing the spin processing device to come into contact with the spin processing device.

According to a third aspect of the present invention, the support is provided such that the center of rotation is coincident with the outer peripheral surface of the substrate held by the holding portion of each support. Item 2 is the spin processing device.

According to a fourth aspect of the present invention, two of the plurality of supports that are adjacent to each other in the circumferential direction of the rotary table rotate in the locking direction at a position where these holding portions contact the outer peripheral surface of the substrate. The urging force of the urging means that urges the two supports in the locking direction is stronger than the urging force of the urging means that urges the other supports in the locking direction. 2. The setting is set.
Alternatively, the spin processing device according to claim 2 is provided.

According to a fifth aspect of the present invention, the biasing means is provided such that one end is connected to the lever and the other end is connected to the rotary table. 3. The spin processing device according to claim 2, wherein the device is a torsion spring whose biasing direction with respect to the body is reversed.

According to a sixth aspect of the present invention, the rotation of the support in the locking direction is prevented by a stopper at a position where the biasing force of the inverted torsion spring against the support does not become zero. A spin processing apparatus according to claim 5.

According to the first and second aspects of the present invention, when the supporting members are rotated in the locking direction in which the respective holding portions abut on the outer peripheral surface of the substrate, the respective supporting members are locked in the locking direction by the urging means. And the respective holding portions are elastically brought into contact with the outer peripheral surface of the substrate.

That is, since each support is separately urged in the locking direction by the urging means, the holding portion of each support can be reliably brought into contact with the outer peripheral surface of the substrate.

According to the third aspect of the present invention, the center of rotation of the support is made to coincide with the outer peripheral surface of the substrate held by the holding portion of the support. Since the holding force of the holding portion in contact with the substrate is in the normal direction toward the center of the substrate, the holding force generated in the holding portion acts as a force for holding the substrate without waste.

According to the fourth aspect of the present invention, the substrate is positioned by the holding portions of the two supports, and the holding portion of the other support presses the substrate against the holding portions of the two supports. Therefore, even in a configuration in which the holding portion of each support is brought into contact with the outer peripheral surface of the substrate by the urging force of the urging means,
The substrate can be accurately positioned and held at a predetermined position.

According to the sixth aspect of the present invention, the toggle mechanism is constituted by using a torsion spring as the urging means, and the support is elastically rotated in the lock direction and the release direction, and the support is moved in the lock direction. Since the rotation is prevented by the stopper at a position where the urging force of the torsion spring against the support does not become zero, the holding portion of the support can be gently brought into contact with the outer peripheral surface of the substrate. By the toggle action of the spring, the holding portion can be prevented from vigorously hitting the outer peripheral surface of the substrate.

[0023]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 is a longitudinal sectional view showing a spin processing apparatus according to the present invention.
It has. The turntable 1 is made of a chemical-resistant metal, such as stainless steel, or a synthetic resin, such as vinyl chloride. That is, the rotary table 1 has a circular planar shape and a hollow shape with an open lower surface, a central hole 2 is formed in a radially central portion, and a plurality of circumferentially spaced peripheral portions are formed in a peripheral portion. In the embodiment, 6
One support hole 3 is formed.

A lower plate 4 is joined to the lower surface of the turntable 1. The lower plate 4 has a first through-hole 5 at a portion corresponding to the central hole 2 at the center, and a second through-hole having a smaller diameter than the support hole 3 at a portion corresponding to the support hole 3. 6 are formed.

A step 7 is formed on the upper surface of the turntable 1 around the center hole 2, and a first upper plate 8 having an upper surface flush with the upper surface of the turntable 1 is formed on the step 7. A second upper plate 9 having substantially the same size as the turntable 1 is joined to the first upper plate 8 so as to be engaged with the peripheral portion. First through-holes 8a and 9a are formed in the central portions of the first upper plate 8 and the second upper plate 9, respectively, and the peripheral portions of the second upper plate 9 correspond to the support holes 3 respectively. A second through hole 9b is formed.

A flange 11 is provided radially inward on the inner periphery of the lower end of the center hole 2 of the rotary table 1. The upper end of the drive cylinder 12 is connected and fixed to the lower surface of the flange portion 11 with the screw 13 via the lower plate 4.

An upper end of a cylindrical rotor 15 of a motor 14 constituting a driving means is connected and fixed to a lower end of the driving cylinder 12 by a screw 17 via a ring member 16.
The rotor 15 is rotatably supported inside the stator 18. Accordingly, the motor 14 is energized and the rotor 15
Is rotated, the rotation of the rotary table 1
Is designed to rotate.

A fixed shaft 21 is inserted inside the rotor 15. At the upper end of the fixed shaft 21, a nozzle head 22 located in the center hole 2 of the rotary table 1 is provided. A mortar-shaped recess 22a is formed on the upper surface of the nozzle head 22, a gas outlet 23 is formed in the center of the recess 22a, and a plurality of processing liquid outlets 24 are formed in the peripheral wall. I have. Each spout 23, 2
4 are connected to gas and processing liquid supply pipes 25, respectively.

Therefore, from each of the jet ports 23 and 24,
A first through hole 8a formed between the first upper plate 8 and the second upper plate 9;
A gas or a processing liquid can be selectively jetted toward the lower surface of a substrate W such as a semiconductor wafer held on the turntable 1 as described later through 9a.

An annular groove 26 is formed around the lower surface of the nozzle head 22, and an annular wall 27 inserted into the annular groove 26 is provided on the flange 11 of the central hole 2. Thereby, by being injected from the ejection port 24,
The processing liquid reflected by the lower surface of the substrate W and dropped from the upper surface of the nozzle head 22 to the space outside the annular wall 26 flows through the central hole 2 by the annular wall 27 and flows out to the lower surface of the turntable 1. Is prevented.

As shown in FIGS. 4 and 5, a plurality of reinforcing ribs 28 are provided inside the rotary table 1 at predetermined intervals along the circumferential direction. The reinforcing rib 28 is provided with a first drain hole 29 that communicates the space on the outer peripheral side of the annular wall 27 with the outer peripheral surface of the turntable 1.

Therefore, the processing liquid dropped from the nozzle head 22 into the space outside the annular wall 26 is discharged radially outward of the turntable 1 through the first drain hole 29.

A support 31 is rotatably supported in each support hole 3 of the turntable 1. That is, the support 3
1 has a head portion 32 and a shaft portion 33 suspended from the lower surface of the head portion 32 as shown in FIG.

A housing 35 is provided in the support hole 3 through a seal cylinder 34. The housing 35 has an upper end and a lower end of the shaft portion 33 rotatably supported by bearings 36, respectively. I have.

An annular wall 3 is provided at the upper end of the seal cylinder 34.
An annular groove 38 into which the annular wall 37 enters is formed on the lower surface of the head 32 of the support 31.
The support hole 3 and the outer surface of the turntable 1 are connected to the second drain hole 3.
9 communicates. Thereby, the head 32
The processing liquid that has entered the support hole 3 from the gap between the support hole 3 and the support hole 3 is discharged radially outward of the turntable 1 through the second drain hole 39.

At the head 32 of each of the supports 31, a mounting hole 41 is formed at a position eccentric from the center of rotation of the support 31 by a predetermined dimension, and is opened on the upper surface. This amount of eccentricity is shown by e in FIG.

A support pin 42 is mounted in the mounting hole 41 in a non-rotatable state. This support pin 42 has
A slope 43 and a holding portion 44 formed of a circular projection are formed on the upper end of the slope 43.

The substrate W is supplied onto the turntable 1 in a state where the holding section 44 is located radially outward of the turntable 1 from the center of rotation of the support 31. As a result, the substrate W is placed on the lower surface of the peripheral portion by the slope 4 of the support pin 42.
3 and held.

In this state, when the support pins 31 are rotated to rotate the support pins 42 eccentrically, the substrate W rises along the slope 43 until the outer peripheral surface contacts the outer peripheral surface of the holding portion 44. Thus, the substrate W is held without moving in the radial direction of the turntable 1.

The lower end of the shaft 33 of the support 31 protrudes from the lower surface of the turntable 1. One end of a lever 51 is attached and fixed to the lower end of the shaft portion 33. At the other end of the lever 51, a roller 52 is rotatably provided.

On the other hand, an opening / closing cylinder 53 is rotatably mounted on an outer peripheral surface of the driving cylinder 12 attached to the upper end of the rotor 15 of the motor 14 by a bearing 54. Six engaging arms 55 are provided on the opening / closing cylinder 53 at predetermined intervals in the circumferential direction so as to protrude radially outward.

A U-shaped engagement groove 56 is formed at the tip of each engagement arm 55, and a roller 52 provided at the other end of each lever 51 is engaged with each engagement groove 56. ing. Therefore, by rotating the opening / closing cylinder 53 relative to the rotary table 1, the support 31 is interlocked with the rotation via the engagement arm 55 and the lever 51.

A pair of tension springs 57 are stretched between the opening / closing cylinder 53 and the stator 18. The tension spring 57 urges the opening / closing cylinder 53 against the rotary table 1 in a rotation direction indicated by an arrow A in FIG. The rotation of the opening / closing cylinder 53 by the tension spring 57 is controlled by the lower plate 4
Is restricted by the engagement of the engagement arm 55 with the stopper 60 provided in the first arm.

FIG. 2 shows a state in which the rotary cylinder 53 is urged in the direction of arrow A by the tension spring 57. In this state, the lever 51 is at the position shown by the solid line in FIG. The holding section 44 is separated from the outer peripheral surface of the substrate W. This state is referred to as a release state.

When the opening / closing cylinder 53 is rotated relative to the rotary table 1 in the direction opposite to the arrow Y against the urging force of the tension spring 57 from the release state, the lever 51 is moved by the engagement arm 55. It turns in the direction indicated by the middle arrow Z.
As a result, the holding portion 44 is eccentrically rotated in a direction in which the holding portion 44 comes into contact with the outer peripheral surface of the substrate W as shown by a chain line in FIG. A state in which the holding unit 44 is in contact with the outer peripheral surface of the substrate W is defined as a locked state.

To rotate the opening / closing cylinder 53 relative to the rotary table 1, the stopper pin 5 shown in FIG.
8 is used. The stopper pin 58 is attached to a movable member 59a driven up and down by a drive source 59 such as a cylinder. The stopper pin 58 is connected to the drive source 59
When it is driven to the ascending position as shown by the chain line in the same figure, it engages with the engagement arm 55 provided on the opening / closing cylinder 53.

In this state, if the rotor 15 of the motor 14 is rotated by a predetermined angle, the opening and closing cylinder 53 does not rotate, and the rotary table 1 connected to the rotor 15 via the driving cylinder 12 rotates. Therefore, the rotary table 53 rotates relatively to the opening / closing cylinder 53 against the biasing force of the tension spring 57.

As shown in FIG. 1, between each lever 51 and the lower plate 4 of the turntable 1, a torsion spring 62 constituting a toggle mechanism is provided. That is, one end of the torsion spring 62 is inserted into the first engagement hole 63 formed in the lower plate 4, and the other end is engaged with the second engagement hole 64 formed in the middle of the lever 51. It is provided together.

The torsion spring 62 is inverted between the state shown by the solid line and the state shown by the chain line in FIG. In the state shown by the torsion spring 62 is dashed line, the lever 51 is in the position indicated by the chain line L ₁ is in an open state in which separated from the outer peripheral surface of the substrate W as indicated by the time chain line holding portion 44 of the support 31 ing. In this state, since the torsion spring 62 is completely inverted in the opening direction, it has no force to bias the lever 51 in the rotation direction.

By rotating the rotary table 1 by stopping the rotation of the opening / closing cylinder 53 by the stopper pin 58, the lever 51 is rotated in the direction of the arrow X.
2 is compressed against the restoring force. When the lever 51 is rotated by a predetermined angle or more, the torsion spring 62 is inverted as shown by a solid line in FIG. At this time, the holding portion 44 of the support 31 is in a locked state in which the holding portion 44 elastically abuts on the outer peripheral surface of the substrate W as shown by a solid line.

[0052] When reversing the torsion spring 62 in the locking direction, by rotating to a position that indicates the lever 51 by a chain line L _2, there is no biasing force for rotating the lever 51 in the locking direction to the torsion spring 62 However, the lever 51 is positioned at the position shown by the solid line, that is, at the position where the urging force remains in the torsion spring 62, at the position of the lock-side stopper 6 provided on the rotary table 1.
5 prevents rotation.

That is, in the locked state where the holding portion 44 is in contact with the outer peripheral surface of the substrate W, the lever 51 is further urged in the locking direction by the urging force remaining in the torsion spring 62. The reference numeral 44 holds the substrate W in a state of elastically contacting the outer peripheral surface of the substrate W.

In addition, the substrate W is held in a state where the torsion spring 62 is not completely inverted in the locking direction.
The holding section 44 can be gently brought into contact with the outer peripheral surface of the substrate W.

In other words, when the torsion spring 62 is reversed in the locking direction so that the holding portion 44 is brought into contact with the outer peripheral surface of the substrate W, the holding portion 44 is strongly pressed by the reversing force of the torsion spring 62. Chipping may occur on the outer peripheral surface of the. However, if the holding portion 44 hits the outer peripheral surface of the substrate W before the torsion spring 62 is completely inverted, the holding portion 44 is controlled by controlling the relative rotation between the turntable 1 and the opening / closing cylinder 53. It is possible to make gentle contact with the outer peripheral surface of the substrate W.

As described above, the holding portions 4 of the six support members 31 are provided.
According to the configuration in which the torsional springs 4 are elastically and eccentrically rotated in the locking direction by the toggle action of the torsion springs 62, the respective holding portions 44 can be separately brought into contact with the outer peripheral surface of the substrate W by the urging force of the torsion springs 62. it can.

As a result, the six holding portions 44 reliably come into contact with the outer peripheral surface of the substrate W, so that the substrate W is held in a stable state. That is, as in the case where the six holding parts 44 are mechanically linked by using gears or the like as in the related art and positioned, one of the six holding parts 44 due to slight processing or assembly accuracy error. There is no instability of the holding state in which the substrate W is held only by the portion.

As shown in FIG. 2, the six supports 31
F, two support members A,
B is set to be a position calculated by the lock-side stopper 65 at a calculated position where these holding portions 44 come into contact with the outer peripheral surface of the substrate W held on the turntable 1 in the locked state.

Further, the torsion spring 62 provided on the two supports A and B has a higher spring force (biasing force) than the torsion spring 62 provided on the other supports C to F. I have. Note that the holding portions 44 of the C to F supports 31 are
A position radially inward of a position where the substrate W held on the turntable 1 comes into contact with the calculated outer peripheral surface, and the torsion spring 62
The displacement is restricted by the lock-side stopper 65 at a position where the rotation cannot be completely reversed.

As a result, the substrate W is positioned in the radial direction by the holding portions 44 of the two support members A and B,
In this state, the holding portions 44 of the four support members C to F press the substrate W against the holding portions 44 of the A and B support members 31, so that the positioning of the substrate W on the rotary table 1 can be precisely performed. It is possible to do.

The sum of the urging forces of the torsion springs 62 provided on the two support members A and B is equal to the four support members C to F.
Is set so as to be larger than the total of the urging forces of the torsion springs 62 provided in the torsion spring 62.

Thus, the substrate W positioned by the holding portions 44 of the two support members A and B is displaced in the radial direction even if pressed by the holding portions 44 of the four support members C to F. Nothing.

In FIG. 3, reference numeral 66 denotes an open side stopper. This open side stopper 66 is such that the lever 51
When in the position _1, the lever 51 is prevented from rotating to the open side.

As described above, in the spin processing apparatus in which the plurality of supports 31 are provided on the rotary table 1 and the holding portions 44 provided on the respective supports 31 are brought into contact with the outer peripheral surface of the substrate W to hold the substrate W. Each support 31 is provided with a torsion spring 62 constituting a toggle mechanism, and the holding portion 44 is brought into contact with the outer peripheral surface of the substrate W by an urging force when the torsion spring 62 is reversed.

For this reason, the substrate W
The urging force when coming into contact with the outer peripheral surface of the torsion spring 6
2, the six holding portions 44 can be reliably brought into contact with the outer peripheral surface of the substrate W when the substrate W is held on the turntable 1.

That is, since the substrate W can be reliably held in a stable state on the turntable 1 by the six holding portions 44, when the substrate W is processed with the processing liquid, the turntable 1 is rotated at a high speed. Even if it does, the substrate W does not rattle.

The center of rotation of the support 31 provided with the holding portion 44 for holding the substrate W in contact with the outer peripheral surface of the substrate W is made to coincide with the outer peripheral surface of the substrate W. For this reason, when the holding unit 44 is eccentrically rotated by the rotation of the support 31 and is brought into contact with the outer peripheral surface of the substrate W, the direction of the force pressing the substrate W by the holding unit 44 is indicated by an arrow S in FIG. Substrate W
The holding portion 44 presses the outer peripheral surface of the substrate W toward the center of the substrate W.

Therefore, the force by which the holding portion 44 presses the outer peripheral surface of the substrate W acts without waste as the holding force of the substrate W. Since the holding force of the holding portion 44 is not wasted, the torsion spring 6 that generates the holding force in the holding portion 44 is used.
2 can be reduced in size.

The holding portions 44 of two support members 31 adjacent to each other in the circumferential direction of the rotary table 1 among the plurality of support members 31 rotate in the locking direction at the position where they contact the outer peripheral surface of the substrate W on the lock side. The strength of the torsion springs 62 provided on the two support members A and B is made to be smaller than the strength of the torsion springs 62 provided on the remaining four support members C to F. Was also strong.

Therefore, the substrate W is pressed and held by the holding portions 44 of the remaining four support members 31 in a state where the substrate W is positioned by the holding portions 44 of the two support members 31. Positioned and securely held.

Further, each support 31 is restricted by the lock-side stopper 65 at a position where the biasing force for biasing the holding portion 44 in the locking direction remains without the torsion spring 62 being completely inverted. are doing.

Since the urging force of the torsion spring 62 acts on the substrate W held by the holding portion 44,
By the biasing force, the substrate W can be reliably held with a predetermined holding force.

Further, since the holding portion 44 is brought into contact with the outer peripheral surface of the substrate W before the torsion spring 62 is completely inverted,
The holding portion 44 can be eccentrically rotated by the relative rotation speed of the turntable 1 and the opening / closing cylinder 53 to make contact with the outer peripheral surface of the substrate W. That is, since the holding portion 44 can be gently brought into contact with the outer peripheral surface of the substrate W, the substrate W
The holding portion 44 can be prevented from vigorously hitting the outer peripheral surface by the reversing force of the torsion spring 62.

The rotary table 1 has a central hole 2 in which the nozzle head 22 is provided and a support hole 3 in which the support 31 is provided.
Is formed, and it is inevitable that the processing liquid enters the central hole 2 and the support hole 3.

However, the rotary table 1 has:
A first drain hole 29 having one end communicating with the center hole 2 and the other end communicating with the outer peripheral surface of the rotary table 1 is formed. Further, a first drain hole 29 communicating the support hole 3 with the outer peripheral surface of the rotary table 1 is formed. 2
Is formed, the processing liquid flowing into the central hole 2 and the support hole 3 is surely discharged to the outside of the turntable 1. That is, the processing liquid is supplied to the rotary table 1
And damage to the motor 14 and the like flowing to the lower surface side of the motor can be prevented.

The first drain holes 29 were formed in the reinforcing ribs 28 of the turntable 1. The reinforcing rib 28 is provided in the hollow portion of the turntable 1 along the radial direction. Therefore, the processing liquid flowing into the central hole 2 at the radial center portion of the turntable 1 can be made to flow out of the turntable 1 in the radial direction by using the reinforcing ribs 28.

In the above embodiment, the rotary table has 6
Although the case where one support is provided has been described, the number of supports is not limited to six, and the same operation and effect as those of the above-described embodiment can be obtained as long as three or more are provided.

Further, a torsion spring is used as a means for urging the holding portion of the support in the locking direction, and the holding portion is brought into contact with the outer peripheral surface of the substrate by utilizing the toggle action of the torsion spring. Alternatively, the holding portion may be urged in the locking direction by a tension spring instead of the torsion spring. In this case, the tension spring does not constitute a toggle mechanism, but if the plurality of holding portions can be independently biased in the locking direction by the tension springs, all of the plurality of holding portions can be securely attached to the outer peripheral surface of the substrate. Since the contact can be made, the object of the present invention can be achieved.

[0079]

According to the first and second aspects of the present invention, when the supports are rotated in the locking direction in which the respective holding portions abut on the outer peripheral surface of the substrate, the respective supports are biased by the urging means. Each of them is urged separately in the locking direction so that the holding portion of each support can be elastically brought into contact with the outer peripheral surface of the substrate.

Therefore, since each holding portion is separately urged by the urging means and comes into contact with the outer peripheral surface of the substrate, all of the plurality of holding portions can be reliably brought into contact with the outer peripheral surface of the substrate. That is, since the substrate can be held by all of the plurality of holding units, the holding state of the substrate is ensured.

According to the third aspect of the present invention, the center of rotation of the support is made to coincide with the outer peripheral surface of the substrate held by the holder of the support.

Therefore, the holding force of the holding portion abutting on the outer peripheral surface of the substrate due to the urging force of the urging means becomes a normal direction toward the center direction of the substrate. It will be used for holding the substrate without waste.

According to the fourth aspect of the present invention, the substrate is positioned by the holding portions of the two supports, and the substrate is pressed against the holding portions of the two supports by the holding portions of the other supports. .

Therefore, even if the holding portions of the respective supports are brought into contact with the outer peripheral surface of the substrate by the urging force of the urging means, the substrate is accurately positioned by the above-mentioned two holding portions. The substrate can be securely held by the one holding part and the remaining holding parts.

According to the sixth aspect of the present invention, the toggle mechanism is constituted by using a torsion spring as the urging means, and the support is elastically rotated in the locking direction and the release direction, and the support is moved in the locking direction. The rotation is prevented by a stopper at a position where the urging force of the torsion spring against the support does not become zero.

Therefore, the substrate can be locked by the holding portion before the biasing means is inverted, so that the locking speed of the substrate by the holding portion is controlled not by the inversion speed of the torsion spring but by the rotation speed of the support. it can. That is, since the holding portion can be gently brought into contact with the outer peripheral surface of the substrate, it is possible to prevent the outer peripheral surface of the substrate from being chipped even if the configuration of holding the substrate by the toggle mechanism is employed.

[Brief description of the drawings]

FIG. 1 is a longitudinal sectional view of a spin processing apparatus according to an embodiment of the present invention.

FIG. 2 is a view for explaining a schematic configuration of the turntable.

FIG. 3 is a view for explaining movement of a lever and movement of a torsion spring.

FIG. 4 is a plan view of the rotary table.

FIG. 5 is a sectional view taken along the line VV of FIG. 4;

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Rotary table 14 ... Motor (drive means) 31 ... Support body 44 ... Holder 51 ... Lever 53 ... Opening / closing cylinder (opening / closing means) 62 ... Torsion spring (biasing means)

Claims (6)

[Claims] 1. A spin processing apparatus for processing with a processing liquid while rotating a substrate, comprising: a rotary table; driving means for driving the rotary table to rotate; and a peripheral portion of the rotary table at predetermined intervals along a circumferential direction. At least three or more rotatably provided supports, and eccentrically provided at the upper end of each support from the center of rotation, and eccentrically rotated by the rotation of the supports to abut against the outer peripheral surface of the substrate and to place the substrate Holding means for holding, opening and closing means for selectively rotating the support in a locking direction in which each holding part approaches the outer peripheral surface of the substrate and a releasing direction in which the holding part separates from the outer peripheral surface of the substrate, When the support is rotated in the lock direction by the opening / closing means, each support is separately biased in the lock direction so that each holding portion is elastically attached to the outer peripheral surface of the substrate. A spin processing device comprising: an urging means for making contact with the spin processing device. 2. A spin processing apparatus for processing with a processing liquid while rotating a substrate, comprising: a rotary table; driving means for driving the rotary table to rotate; and a peripheral portion of the rotary table at predetermined intervals along a circumferential direction. At least three or more rotatably provided supports, and eccentrically provided at the upper end of each support from the center of rotation, and eccentrically rotated by the rotation of the support to abut on the outer peripheral surface of the substrate and to carry out this substrate. A holding portion for holding, a lever having one end attached to a lower end of the support protruding from the lower surface side of the rotary table, and a rotatable and rotatable rotary table provided on the rotary table and provided on an outer peripheral surface thereof. An engagement arm is provided for engaging the other end of the lever, and prevents rotation with respect to the rotary table to rotate the rotary table in a predetermined direction. Opening and closing by selectively rotating each of the supports via the engagement arm and the lever in a locking direction in which the respective holding portion approaches the outer peripheral surface of the substrate and a release direction in which the respective supporting portions separate from the outer peripheral surface of the substrate. When the support is rotated in the lock direction by the opening and closing cylinder, the support is separately biased in the lock direction so that each holding portion elastically abuts on the outer peripheral surface of the substrate. A spin processing device comprising: an urging means for making contact with the spin processing device. 3. The spin according to claim 1, wherein the support is provided so that the center of rotation is coincident with the outer peripheral surface of the substrate held by the holder of each support. Processing equipment. 4. Two of the plurality of supports, which are adjacent in the circumferential direction of the rotary table, are prevented from rotating in the locking direction at a position where these holding portions contact the outer peripheral surface of the substrate. The urging force of the urging means for urging the two supports in the locking direction is set to be stronger than the urging force of the urging means for urging the other supports in the locking direction. The spin processing device according to claim 1 or 2, wherein 5. The biasing means is provided with one end connected to the lever and the other end connected to the rotary table, and when the support is rotated by a predetermined angle or more, a biasing direction with respect to the support is provided. 3. The spin processing apparatus according to claim 2, wherein the torsion spring is an inverted torsion spring. 6. The apparatus according to claim 5, wherein the rotation of the support in the locking direction is prevented by a stopper at a position where the biasing force of the inverted torsion spring against the support does not become zero. Spin processing device.