JPH10112425A5 - - Google Patents
Info
- Publication number
- JPH10112425A5 JPH10112425A5 JP1996264383A JP26438396A JPH10112425A5 JP H10112425 A5 JPH10112425 A5 JP H10112425A5 JP 1996264383 A JP1996264383 A JP 1996264383A JP 26438396 A JP26438396 A JP 26438396A JP H10112425 A5 JPH10112425 A5 JP H10112425A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate processing
- substrate
- pattern
- light beam
- change
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26438396A JP3927629B2 (ja) | 1996-10-04 | 1996-10-04 | 基板処理工程モニター装置、及びこれを用いたデバイス製造方法 |
| US08/886,887 US6594012B2 (en) | 1996-07-05 | 1997-07-02 | Exposure apparatus |
| TW086109399A TW368682B (en) | 1996-07-05 | 1997-07-03 | Exposure apparatus |
| EP97304889A EP0816926A3 (en) | 1996-07-05 | 1997-07-04 | Exposure apparatus |
| KR1019970031226A KR100277110B1 (ko) | 1996-07-05 | 1997-07-05 | 노광장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26438396A JP3927629B2 (ja) | 1996-10-04 | 1996-10-04 | 基板処理工程モニター装置、及びこれを用いたデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10112425A JPH10112425A (ja) | 1998-04-28 |
| JPH10112425A5 true JPH10112425A5 (https=) | 2007-03-01 |
| JP3927629B2 JP3927629B2 (ja) | 2007-06-13 |
Family
ID=17402400
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26438396A Expired - Fee Related JP3927629B2 (ja) | 1996-07-05 | 1996-10-04 | 基板処理工程モニター装置、及びこれを用いたデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3927629B2 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001210580A (ja) | 2000-01-28 | 2001-08-03 | Mitsubishi Electric Corp | 半導体装置およびその製造方法ならびに半導体製造システム |
| JP4802481B2 (ja) | 2004-11-09 | 2011-10-26 | 株式会社ニコン | 表面検査装置および表面検査方法および露光システム |
| US7763404B2 (en) * | 2006-09-26 | 2010-07-27 | Tokyo Electron Limited | Methods and apparatus for changing the optical properties of resists |
| JP5375020B2 (ja) * | 2008-10-14 | 2013-12-25 | 株式会社ニコン | 接合評価方法、接合評価装置、基板貼り合わせ装置、接合評価ゲージおよび積層型半導体装置 |
-
1996
- 1996-10-04 JP JP26438396A patent/JP3927629B2/ja not_active Expired - Fee Related
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