JPH1010431A5 - - Google Patents

Info

Publication number
JPH1010431A5
JPH1010431A5 JP1996180013A JP18001396A JPH1010431A5 JP H1010431 A5 JPH1010431 A5 JP H1010431A5 JP 1996180013 A JP1996180013 A JP 1996180013A JP 18001396 A JP18001396 A JP 18001396A JP H1010431 A5 JPH1010431 A5 JP H1010431A5
Authority
JP
Japan
Prior art keywords
optical system
lens group
catadioptric
imaging optical
reflecting mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996180013A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1010431A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8180013A priority Critical patent/JPH1010431A/ja
Priority claimed from JP8180013A external-priority patent/JPH1010431A/ja
Priority to KR1019970021294A priority patent/KR980005328A/ko
Priority to DE19726058A priority patent/DE19726058A1/de
Publication of JPH1010431A publication Critical patent/JPH1010431A/ja
Publication of JPH1010431A5 publication Critical patent/JPH1010431A5/ja
Pending legal-status Critical Current

Links

JP8180013A 1996-06-20 1996-06-20 反射屈折光学系 Pending JPH1010431A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8180013A JPH1010431A (ja) 1996-06-20 1996-06-20 反射屈折光学系
KR1019970021294A KR980005328A (ko) 1996-06-20 1997-05-28 반사굴절 광학계
DE19726058A DE19726058A1 (de) 1996-06-20 1997-06-19 Katadioptrisches System zur Photolithographie

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8180013A JPH1010431A (ja) 1996-06-20 1996-06-20 反射屈折光学系

Publications (2)

Publication Number Publication Date
JPH1010431A JPH1010431A (ja) 1998-01-16
JPH1010431A5 true JPH1010431A5 (cg-RX-API-DMAC10.html) 2004-11-04

Family

ID=16075939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8180013A Pending JPH1010431A (ja) 1996-06-20 1996-06-20 反射屈折光学系

Country Status (3)

Country Link
JP (1) JPH1010431A (cg-RX-API-DMAC10.html)
KR (1) KR980005328A (cg-RX-API-DMAC10.html)
DE (1) DE19726058A1 (cg-RX-API-DMAC10.html)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09311278A (ja) 1996-05-20 1997-12-02 Nikon Corp 反射屈折光学系
JP3395801B2 (ja) 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
USRE38438E1 (en) 1994-08-23 2004-02-24 Nikon Corporation Catadioptric reduction projection optical system and exposure apparatus having the same
JPH08179204A (ja) 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3454390B2 (ja) 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
US6512631B2 (en) * 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
EP1079253A4 (en) * 1998-04-07 2004-09-01 Nikon Corp DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION
EP1293831A1 (en) * 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
DE69933973T2 (de) * 1998-07-29 2007-06-28 Carl Zeiss Smt Ag Katadioptrisches optisches system und damit ausgestattete belichtungsvorrichtung
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
JP4532647B2 (ja) 2000-02-23 2010-08-25 キヤノン株式会社 露光装置
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2004514943A (ja) 2000-11-28 2004-05-20 カール・ツアイス・エスエムテイ・アーゲー １５７ｎｍリソグラフィ用の反射屈折投影系
DE10127227A1 (de) 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
US7046459B1 (en) 2001-12-18 2006-05-16 Carl Zeiss Smt Ag Catadioptric reductions lens
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20180078354A (ko) 2004-05-17 2018-07-09 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
DE102005033564A1 (de) * 2005-07-19 2007-02-01 Carl Zeiss Smt Ag Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage oder eines digitalen Projektionssystems

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