JPH1010429A - ２回結像光学系 - Google Patents

２回結像光学系

Info

Publication number
JPH1010429A
JPH1010429A JP8179881A JP17988196A JPH1010429A JP H1010429 A JPH1010429 A JP H1010429A JP 8179881 A JP8179881 A JP 8179881A JP 17988196 A JP17988196 A JP 17988196A JP H1010429 A JPH1010429 A JP H1010429A
Authority
JP
Japan
Prior art keywords
optical system
image
imaging optical
lens
aspherical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8179881A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1010429A5 (enExample
Inventor
Yuutou Takahashi
友刀 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8179881A priority Critical patent/JPH1010429A/ja
Priority to US08/877,920 priority patent/US6157498A/en
Publication of JPH1010429A publication Critical patent/JPH1010429A/ja
Priority to US09/679,267 priority patent/US6392822B1/en
Priority to US10/086,472 priority patent/US6867931B2/en
Publication of JPH1010429A5 publication Critical patent/JPH1010429A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8179881A 1996-06-19 1996-06-19 ２回結像光学系 Pending JPH1010429A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP8179881A JPH1010429A (ja) 1996-06-19 1996-06-19 ２回結像光学系
US08/877,920 US6157498A (en) 1996-06-19 1997-06-18 Dual-imaging optical system
US09/679,267 US6392822B1 (en) 1996-06-19 2000-10-04 Dual-imaging optical system
US10/086,472 US6867931B2 (en) 1996-06-19 2002-02-28 Dual-imaging optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8179881A JPH1010429A (ja) 1996-06-19 1996-06-19 ２回結像光学系

Publications (2)

Publication Number Publication Date
JPH1010429A true JPH1010429A (ja) 1998-01-16
JPH1010429A5 JPH1010429A5 (enExample) 2004-10-21

Family

ID=16073540

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8179881A Pending JPH1010429A (ja) 1996-06-19 1996-06-19 ２回結像光学系

Country Status (1)

Country Link
JP (1) JPH1010429A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0869383A3 (en) * 1997-04-01 1999-09-08 Nikon Corporation Catadioptric optical system
WO1999052004A1 (en) * 1998-04-07 1999-10-14 Nikon Corporation Projection exposure apparatus and method, and reflection refraction optical system
US6512641B2 (en) 1998-06-08 2003-01-28 Nikon Corporation Projection exposure apparatus and method
JP2003504687A (ja) * 1999-07-07 2003-02-04 ケーエルエー−テンカー テクノロジィース コーポレイション ブロードバンド紫外線カタディオプトリックイメージングシステム
US6717746B2 (en) 2001-05-22 2004-04-06 Carl Zeiss Semiconductor Manufacturing Technologies Ag Catadioptric reduction lens
US7046459B1 (en) 2001-12-18 2006-05-16 Carl Zeiss Smt Ag Catadioptric reductions lens

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0869383A3 (en) * 1997-04-01 1999-09-08 Nikon Corporation Catadioptric optical system
WO1999052004A1 (en) * 1998-04-07 1999-10-14 Nikon Corporation Projection exposure apparatus and method, and reflection refraction optical system
US6707616B1 (en) 1998-04-07 2004-03-16 Nikon Corporation Projection exposure apparatus, projection exposure method and catadioptric optical system
US6512641B2 (en) 1998-06-08 2003-01-28 Nikon Corporation Projection exposure apparatus and method
US6639732B2 (en) 1998-06-08 2003-10-28 Nikon Corporation Projection exposure apparatus and method
JP2003504687A (ja) * 1999-07-07 2003-02-04 ケーエルエー−テンカー テクノロジィース コーポレイション ブロードバンド紫外線カタディオプトリックイメージングシステム
JP4761684B2 (ja) * 1999-07-07 2011-08-31 ケーエルエー−テンカー コーポレイション ブロードバンド紫外線カタディオプトリックイメージングシステム
US6717746B2 (en) 2001-05-22 2004-04-06 Carl Zeiss Semiconductor Manufacturing Technologies Ag Catadioptric reduction lens
US7006304B2 (en) 2001-05-22 2006-02-28 Carl Zeiss Smt Ag Catadioptric reduction lens
US7046459B1 (en) 2001-12-18 2006-05-16 Carl Zeiss Smt Ag Catadioptric reductions lens

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