JPH09320924A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPH09320924A
JPH09320924A JP8131509A JP13150996A JPH09320924A JP H09320924 A JPH09320924 A JP H09320924A JP 8131509 A JP8131509 A JP 8131509A JP 13150996 A JP13150996 A JP 13150996A JP H09320924 A JPH09320924 A JP H09320924A
Authority
JP
Japan
Prior art keywords
reticle
optical system
image
exposure
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8131509A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09320924A5 (enExample
Inventor
Atsuyuki Aoki
淳行 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8131509A priority Critical patent/JPH09320924A/ja
Publication of JPH09320924A publication Critical patent/JPH09320924A/ja
Publication of JPH09320924A5 publication Critical patent/JPH09320924A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8131509A 1996-05-27 1996-05-27 投影露光装置 Pending JPH09320924A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8131509A JPH09320924A (ja) 1996-05-27 1996-05-27 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8131509A JPH09320924A (ja) 1996-05-27 1996-05-27 投影露光装置

Publications (2)

Publication Number Publication Date
JPH09320924A true JPH09320924A (ja) 1997-12-12
JPH09320924A5 JPH09320924A5 (enExample) 2004-11-25

Family

ID=15059705

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8131509A Pending JPH09320924A (ja) 1996-05-27 1996-05-27 投影露光装置

Country Status (1)

Country Link
JP (1) JPH09320924A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004012245A1 (ja) * 2002-07-31 2004-02-05 Nikon Corporation 位置計測方法、位置制御方法、露光方法及び露光装置、並びにデバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004012245A1 (ja) * 2002-07-31 2004-02-05 Nikon Corporation 位置計測方法、位置制御方法、露光方法及び露光装置、並びにデバイス製造方法

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