JPH09298155A5 - - Google Patents

Info

Publication number
JPH09298155A5
JPH09298155A5 JP1996139429A JP13942996A JPH09298155A5 JP H09298155 A5 JPH09298155 A5 JP H09298155A5 JP 1996139429 A JP1996139429 A JP 1996139429A JP 13942996 A JP13942996 A JP 13942996A JP H09298155 A5 JPH09298155 A5 JP H09298155A5
Authority
JP
Japan
Prior art keywords
layer
pattern
exposure
unit
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996139429A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09298155A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP13942996A priority Critical patent/JPH09298155A/ja
Priority claimed from JP13942996A external-priority patent/JPH09298155A/ja
Priority to KR1019970015622A priority patent/KR100468234B1/ko
Priority to US08/848,394 priority patent/US6204912B1/en
Publication of JPH09298155A publication Critical patent/JPH09298155A/ja
Publication of JPH09298155A5 publication Critical patent/JPH09298155A5/ja
Pending legal-status Critical Current

Links

JP13942996A 1996-05-08 1996-05-08 露光方法、露光装置及びマスク Pending JPH09298155A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP13942996A JPH09298155A (ja) 1996-05-08 1996-05-08 露光方法、露光装置及びマスク
KR1019970015622A KR100468234B1 (ko) 1996-05-08 1997-04-25 노광방법,노광장치및디스크
US08/848,394 US6204912B1 (en) 1996-05-08 1997-05-08 Exposure method, exposure apparatus, and mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13942996A JPH09298155A (ja) 1996-05-08 1996-05-08 露光方法、露光装置及びマスク

Publications (2)

Publication Number Publication Date
JPH09298155A JPH09298155A (ja) 1997-11-18
JPH09298155A5 true JPH09298155A5 (enExample) 2004-10-21

Family

ID=15244999

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13942996A Pending JPH09298155A (ja) 1996-05-08 1996-05-08 露光方法、露光装置及びマスク

Country Status (1)

Country Link
JP (1) JPH09298155A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100560978B1 (ko) * 1998-06-09 2006-06-20 삼성전자주식회사 노광 방법 및 이를 이용한 액정 표시 패널의 제조 방법
US6407786B1 (en) * 1999-06-09 2002-06-18 Sharp Kabushiki Kaisha Liquid crystal display device and method for fabricating the same
US20020127747A1 (en) * 2001-03-08 2002-09-12 Motorola, Inc. Lithography method and apparatus with simplified reticles
JP4365594B2 (ja) 2003-01-27 2009-11-18 シャープ株式会社 パターン形成方法、薄膜トランジスタ基板の製造方法、液晶表示装置の製造方法、及び露光マスク
JP5214904B2 (ja) 2007-04-12 2013-06-19 ルネサスエレクトロニクス株式会社 固体撮像素子の製造方法
JP6847936B2 (ja) * 2016-05-18 2021-03-24 タワー パートナーズ セミコンダクター株式会社 半導体装置の製造方法

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