JPH09293966A - Inner layer substrate its designing device - Google Patents

Inner layer substrate its designing device

Info

Publication number
JPH09293966A
JPH09293966A JP8131429A JP13142996A JPH09293966A JP H09293966 A JPH09293966 A JP H09293966A JP 8131429 A JP8131429 A JP 8131429A JP 13142996 A JP13142996 A JP 13142996A JP H09293966 A JPH09293966 A JP H09293966A
Authority
JP
Japan
Prior art keywords
dam
inner layer
small
dams
layer substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8131429A
Other languages
Japanese (ja)
Other versions
JP3796815B2 (en
Inventor
Toshiaki Takenaka
敏晃 竹中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Priority to JP13142996A priority Critical patent/JP3796815B2/en
Publication of JPH09293966A publication Critical patent/JPH09293966A/en
Application granted granted Critical
Publication of JP3796815B2 publication Critical patent/JP3796815B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide the inner layer substrate avoiding the running out of resin bonding agent and the production of air void as well as the designing device for arranging the dams on said inner layer substrate. SOLUTION: Within an inner layer substrate 1 used for a multilayer printed wiring board, this inner layer substrate 1 is provided with a plurality of circuit forming parts 11 and the dams for preventing running out of a resin bonding agent are scatter-formed in the outer periphery between the circuit forming parts 11 and a substrate edge 12. Besides, respectively a plurality of larger sized dams 21 and smaller sized dams 22 are mixed with one another. On the other hand, the gap dams 25 smaller than the larger dams 21 provided in the outer periphery 13 but larger than the smaller dams 22 are formed in the product gaps 24 between a plurality of the circuit forming parts 11.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【技術分野】本発明は,多層プリント配線板に用いる内
層基板,及びそれにダムを配置するための設計装置に関
する。
TECHNICAL FIELD The present invention relates to an inner layer substrate used for a multilayer printed wiring board and a designing device for disposing a dam therein.

【0002】[0002]

【従来技術】多層プリント配線板は,積層した複数の基
板を樹脂接着剤により互い固定し,その内部にも導体パ
タ─ンを形成したものである。そして,3枚以上の基板
を積層する場合には,上下の基板の間に1枚以上の内層
基板が配置される。該内層基板には,導体パタ─ンが形
成されている。即ち,図19に示すごとく,内層基板9
は,それぞれ導体パタ─ン910を形成した2つの回路
形成部91を有している。そして,回路形成部91と内
層基板の基板周縁92との間には,外周部93が形成さ
れ,該外周部93には,多数のダム95が設けてある。
また,両回路形成部91の間には,製品間隙95があ
り,この部分にもダム95が設けてある。
2. Description of the Related Art A multilayer printed wiring board is one in which a plurality of laminated substrates are fixed to each other by a resin adhesive, and a conductor pattern is formed inside thereof. When laminating three or more substrates, one or more inner layer substrates are arranged between the upper and lower substrates. A conductor pattern is formed on the inner layer substrate. That is, as shown in FIG.
Has two circuit forming portions 91 each having a conductor pattern 910 formed therein. An outer peripheral portion 93 is formed between the circuit forming portion 91 and the substrate peripheral edge 92 of the inner layer substrate, and a large number of dams 95 are provided on the outer peripheral portion 93.
Further, there is a product gap 95 between both circuit forming portions 91, and a dam 95 is also provided in this portion.

【0003】ダム95は厚み約35μmである。上記ダ
ム95は,上記のごとく,内層基板9を樹脂接着剤を介
してその上下の基板と接着するとき,上記樹脂接着剤が
両者の間から流出してしまったり,また両者のあいだに
エアボイドが発生することを防止するために設けたもの
である(特開平6─177538号公報)。なお,上記
のごとく積層,接着した後は,積層板を,上記内層基板
の切断線911に沿って切断し,個片基板とする。切断
線911は,回路形成部91の外周に位置している。
The dam 95 has a thickness of about 35 μm. As described above, the dam 95 causes the resin adhesive to flow out between the two when the inner layer substrate 9 is bonded to the upper and lower substrates through the resin adhesive as described above, and an air void is formed between the two. It is provided in order to prevent the occurrence (Japanese Patent Laid-Open No. 6-177538). After laminating and adhering as described above, the laminated board is cut along the cutting line 911 of the inner layer board to obtain an individual board. The cutting line 911 is located on the outer periphery of the circuit forming portion 91.

【0004】[0004]

【解決しようとする課題】しかしながら,上記従来の内
層基板9は,上記ダム95が同じ大きさであるため,ダ
ム95の間の間隙が比較的単純であり,樹脂接着剤が流
出し易く,上記樹脂接着剤の流出,エアボイドを生ずる
おそれがあった。また,近年は,高機能配線に伴って,
図20に示すごとく,上記導体パタ─ン910を設ける
回路形成部91の大きさが大きくなり,回路形成部91
の間の製品間隙96が小さくなっている。そのため,図
20に示すごとく,この製品間隙96に,外周部93に
配置するダム95と同じ大きさのダムを配置することが
できなくなっている。
However, in the conventional inner layer substrate 9, since the dams 95 have the same size, the gap between the dams 95 is relatively simple, and the resin adhesive easily flows out. There was a risk of resin adhesive flowing out and air voids. In addition, in recent years, along with high-performance wiring,
As shown in FIG. 20, the size of the circuit forming portion 91 in which the conductor pattern 910 is provided is increased.
The product gap 96 therebetween is small. Therefore, as shown in FIG. 20, it is impossible to arrange a dam having the same size as the dam 95 arranged in the outer peripheral portion 93 in the product gap 96.

【0005】本発明はかかる従来の問題点に鑑み,樹脂
接着剤の流出,エアボイドの発生がない内層基板,及び
該内層基板にダムを配置するための設計装置を提供しよ
うとするものである。
In view of the above conventional problems, the present invention aims to provide an inner layer substrate which does not cause outflow of a resin adhesive and air voids, and a design device for disposing a dam on the inner layer substrate.

【0006】[0006]

【課題の解決手段】請求項1の発明は,多層プリント配
線板に用いる内層基板において,該内層基板は,複数個
の回路形成部を有していると共に,上記回路形成部と基
板周縁との間の外周部には樹脂接着剤の流出を防止する
ためのダムを点在形成してなり,また,上記ダムは,そ
の形状が大きい大ダムとその形状が小さい小ダムとをそ
れぞれ複数個,混在して設けてあり,一方,上記複数の
回路形成部の間の製品間隙には,上記外周部に設けた上
記大ダムよりは小さく上記小ダム以上の大きさを有する
間隙ダムが形成されていることを特徴とする内層基板に
ある。
According to a first aspect of the present invention, in an inner layer substrate used for a multilayer printed wiring board, the inner layer substrate has a plurality of circuit forming portions, and the circuit forming portion and a board peripheral edge are provided. Dams for preventing the outflow of the resin adhesive are formed on the outer peripheral portion between the dams, and the dam has a large dam with a large shape and a plurality of small dams with a small shape. On the other hand, in the product gap between the plurality of circuit forming portions, a gap dam having a size smaller than the large dam provided on the outer peripheral portion and larger than the small dam is formed. The inner layer substrate is characterized in that

【0007】本発明において最も注目すべきことは,内
層基板における上記外周部に上記大ダムと小ダムとを混
在形成したこと,及び上記製品間隙には上記大ダムより
は小さく,小ダム以上の大きさを有する間隙ダムを設け
たことである。上記の大ダムの大きさは直径5.0〜1
0.0mm,小ダムの大きさは直径2.0〜4.0mm
とすることが好ましい。これらの大きさよりも小さい場
合には,外周部からの樹脂接着剤の流出,エアボイドの
発生を完全に防止し難い。 一方,これらの大きさより
も大きい場合には,外周部への大ダムと小ダムとの配置
が困難となるおそれがある。また,上記大ダム,小ダ
ム,間隙ダムは,例えば内層基板の表裏両面に配設す
る。
What is most noticeable in the present invention is that the large dam and the small dam are formed in a mixed manner on the outer peripheral portion of the inner layer substrate, and that the product gap is smaller than the large dam and smaller than the small dam. That is, a gap dam having a size is provided. The size of the above large dam is 5.0-1 in diameter
0.0mm, small dam size is 2.0-4.0mm
It is preferable that If the size is smaller than these, it is difficult to completely prevent the resin adhesive from flowing out from the outer peripheral portion and the generation of air voids. On the other hand, if the size is larger than these, it may be difficult to arrange the large dam and the small dam on the outer peripheral portion. Further, the large dam, the small dam, and the gap dam are arranged on both front and back surfaces of the inner layer substrate, for example.

【0008】次に,本発明の作用効果につき説明する。
本発明の内層基板においては,まず外周部には大ダムと
小ダムとを混在配置しているため,これらの間の通路が
複雑に曲折している。そのため,基板間に存在する空気
は,これらの通路から容易に放出される。一方,樹脂接
着剤の流出は生じない。
Next, the function and effect of the present invention will be described.
In the inner layer substrate of the present invention, since the large dam and the small dam are mixedly arranged in the outer peripheral portion, the passage between them is complicatedly bent. Therefore, the air existing between the substrates is easily released from these passages. On the other hand, the resin adhesive does not flow out.

【0009】それ故,樹脂接着剤の流出及びエアボイド
の発生を防止できる。また,製品間隙の間には上記大き
さの間隙ダムを設けているので,製品間隙が狭い場合で
もその広さに応じて任意の大きさの間隙ダムを配置で
き,樹脂接着剤の上記流出及びエアボイドの発生を防止
することができる。
Therefore, the outflow of the resin adhesive and the generation of air voids can be prevented. In addition, since the gap dam of the above size is provided between the product gaps, even if the product gap is narrow, a gap dam of any size can be arranged according to the width of the product gap, and the outflow and the outflow of the resin adhesive can be prevented. Generation of air voids can be prevented.

【0010】次に,請求項2の発明のように,上記間隙
ダムは上記小ダムと同じ大きさを有し,かつ複数列配置
することが好ましい。この場合には,間隙ダムは小ダム
と同じのため,両者の設計が容易となる。また,請求項
3の発明のように,上記外周部における大ダムは,2列
以上配置され,大ダムの間に小ダムが配置されているこ
とが好ましい(図5〜図7)。この場合には,これらの
間に形成される通路が複雑となり,樹脂接着剤の流出,
エアボイドの発生を一層防止できる。
Next, as in the invention of claim 2, it is preferable that the gap dam has the same size as the small dam and is arranged in a plurality of rows. In this case, since the gap dam is the same as the small dam, both can be easily designed. Further, as in the invention of claim 3, it is preferable that the large dams in the outer peripheral portion are arranged in two or more rows, and the small dams are arranged between the large dams (FIGS. 5 to 7). In this case, the passage formed between them becomes complicated, and the resin adhesive flows out,
The generation of air voids can be further prevented.

【0011】次に,請求項4の発明のように,上記大ダ
ムの配列の中心線の間には,小ダムが介設されているこ
とが好ましい(図7)。この場合にも,上記と同様に,
樹脂接着剤の流出,エアボイドの発生を一層防止でき
る。
Next, as in the invention of claim 4, it is preferable that a small dam is interposed between the center lines of the arrangement of the large dams (FIG. 7). In this case also, as above,
Outflow of resin adhesive and generation of air voids can be further prevented.

【0012】次に,請求項5の発明のように,多層プリ
ント配線板用の内層基板における,回路形成部と基板周
縁との間の外周部に,樹脂接着剤の流出を防止するため
の大ダムと小ダムとを,多数混在配置するための内層基
板の設計装置であって,内層基板の上記外周部に配置す
べき大ダム,小ダムの情報を読み込むダム情報読み込み
手段と,上記外周部の大きさを認識する外周部認識手段
と,上記外周部認識手段により認識された上記外周部
に,上記ダム情報読み込み手段により得られた大ダムを
複数個配置する大ダム配置手段と,上記大ダムを配置し
た後の上記外周部における残余部分の大きさを認識する
残余認識手段と,上記残余認識手段により認識された上
記残余部分に,上記ダム情報読み込み手段により得られ
た小ダムを複数個配置する小ダム配置手段とよりなるこ
とを特徴とする内層基板の設計装置がある。
Next, according to the invention of claim 5, in the inner layer substrate for the multilayer printed wiring board, a large portion for preventing the resin adhesive from flowing out to the outer peripheral portion between the circuit forming portion and the peripheral edge of the substrate. An apparatus for designing an inner layer substrate for arranging a large number of dams and small dams in a mixed manner, including dam information reading means for reading information on large dams and small dams to be arranged on the outer peripheral portion of the inner layer substrate, and the outer peripheral portion. And a large dam arranging means for arranging a plurality of large dams obtained by the dam information reading means on the outer peripheral part recognized by the outer peripheral part recognizing means. A plurality of small dams obtained by the dam information reading means are provided in the residual recognition means for recognizing the size of the residual portion in the outer peripheral portion after the dam is arranged, and the residual portion recognized by the residual recognition means. Distribution There are design apparatus of the inner layer substrate, wherein more becomes possible small dam arrangement means.

【0013】上記設計装置の作用につき説明する。上記
設計装置においては,まず上記ダム情報読み込み手段に
より,大ダムと小ダムの情報を読み込む。一方,内層基
板の外周部の大きさを外周部認識手段により認識する。
そして,上記により認識された外周部に対して,上記ダ
ム情報読み込み手段から得られた大ダムを複数個配置す
る。そして,上記外周部への大ダムの配置は,例えば,
外周部に大ダムが配置できなくなるまで,つまり,大ダ
ムを配置するスペ−スがなくなるまで行なう。
The operation of the designing device will be described. In the design apparatus, first, the dam information reading means reads the information on the large dam and the small dam. On the other hand, the size of the outer peripheral portion of the inner layer substrate is recognized by the outer peripheral portion recognition means.
Then, a plurality of large dams obtained from the dam information reading means are arranged on the outer peripheral portion recognized as described above. And, the arrangement of the large dam on the outer peripheral portion is, for example,
Repeat until the large dam cannot be placed on the outer circumference, that is, until the space for placing the large dam is exhausted.

【0014】次に,大ダムの配置が終わった後に,外周
部において大ダムが配置されていない残余部分を残余認
識手段により認識する。そして,上記残余部分に対し
て,上記小ダム配置手段により,小ダムを配置する。こ
れらの配置は,例えばCAD(Computor Ai
ded Design)装置により行なう。
Next, after the arrangement of the large dam is completed, the residual recognizing means recognizes the remaining portion on the outer peripheral portion where the large dam is not arranged. Then, the small dam is arranged on the remaining portion by the small dam arrangement means. These arrangements are, for example, CAD (Computer Ai).
ded Design) device.

【0015】上記設計装置により,上記外周部に対して
容易に,大ダムと小ダムを配置でき,前記のごとき優れ
た内層基板を得ることができる。また,大ダムと小ダム
を混在配置するので,小ダムのみを配置する場合に比べ
て,CADのデ−タ量を少なくすることができる。
With the above design apparatus, the large dam and the small dam can be easily arranged on the outer peripheral portion, and the excellent inner layer substrate as described above can be obtained. Moreover, since the large dam and the small dam are arranged in a mixed manner, the amount of CAD data can be reduced as compared with the case where only the small dam is arranged.

【0016】次に,請求項6の発明のように,上記内層
基板が複数個の回路形成部を有していると共に各回路形
成部の間には製品間隙を有している場合には,該製品間
隙の大きさを認識する製品間隙認識手段と,上記製品間
隙に,上記大ダムよりは小さく,上記小ダム以上の大き
さを有する間隙ダムを配置する間隙ダム配置手段を有す
ることが好ましい。これにより,複数個の回路形成部を
有する内層基板に対しても,その製品間隙に,容易に間
隙ダムを配置することができ,上記のごとき優れた内層
基板を得ることができる。
Next, when the inner layer substrate has a plurality of circuit forming portions and there is a product gap between the circuit forming portions as in the sixth aspect of the invention, It is preferable to have product gap recognizing means for recognizing the size of the product gap and gap dam arranging means for arranging a gap dam smaller than the large dam and larger than the small dam in the product gap. . As a result, the gap dam can be easily arranged in the product gap even for the inner layer substrate having a plurality of circuit forming portions, and the excellent inner layer substrate as described above can be obtained.

【0017】次に,請求項7の発明のように,大ダム配
置手段,小ダム配置手段及び間隙ダム配置手段は,それ
ぞれ上記大ダム,小ダム,間隙ダムが配置できなくなる
まで配置を繰り返す配置繰り返し手段を有することが好
ましい。これにより,外周部及び製品間隙に対して,大
ダム,小ダム,間隙ダムを可能な限り,配置することが
できる。
Next, as in the seventh aspect of the invention, the large dam arranging means, the small dam arranging means and the gap dam arranging means are arranged repeatedly until the large dam, the small dam and the gap dam cannot be arranged, respectively. It is preferable to have a repeating means. Thereby, the large dam, the small dam, and the gap dam can be arranged as much as possible with respect to the outer peripheral portion and the product gap.

【0018】次に,請求項8の発明のように,上記外周
部認識手段は,内層基板のサイズを読み込む内層基板サ
イズ読み込み手段と,回路形成部のサイズを読み込む回
路形成部サイズ読み込み手段と,内層基板に回路形成部
を配置するための配置情報を読み込む回路形成部配置情
報読み込み手段とを有することが好ましい。これによ
り,内層基板,それに設ける回路形成部の各サイズ,及
び内層基板に配置される回路形成部の位置の情報が得ら
れ,上記外周部及び製品間隙の大きさを容易に認識する
ことができる。
Next, as in the invention of claim 8, the outer peripheral portion recognizing means includes an inner layer board size reading means for reading the size of the inner layer board, and a circuit forming portion size reading means for reading the size of the circuit forming portion. It is preferable to have a circuit forming portion arrangement information reading means for reading arrangement information for arranging the circuit forming portion on the inner layer substrate. As a result, information on the sizes of the inner layer substrate, the circuit forming portions provided on the inner layer substrate, and the positions of the circuit forming portions arranged on the inner layer substrate can be obtained, and the sizes of the outer peripheral portion and the product gap can be easily recognized. .

【0019】次に,請求項9の発明のように,複数個配
置された大ダムの中心を通る縦中心線とこれに直交し大
ダムの中心を通る横中心線によって形成されるメッシュ
の間を,それぞれ2以上に縦方向及び横方向に分割する
分割線上に対して,小ダムの中心を配置するメッシュ分
割配置手段を有することが好ましい。これにより,上記
大ダムの中心を通る縦,横の中心線によって形成される
メッシュの間に,更に小ダムを配置することができ,小
ダムの配置が容易となる。
Next, between the meshes formed by a vertical center line passing through the center of the large dam and a horizontal center line orthogonal to the center line passing through the center of the large dam, as in the ninth aspect of the invention. It is preferable to have a mesh dividing and arranging means for arranging the center of the small dam on each of the dividing lines dividing the above into two or more in the vertical direction and the horizontal direction. Thereby, the small dam can be further arranged between the meshes formed by the vertical and horizontal center lines passing through the center of the large dam, and the small dam can be easily arranged.

【0020】[0020]

【発明の実施の形態】BEST MODE FOR CARRYING OUT THE INVENTION

実施形態例1 本発明の実施形態例にかかる内層基板につき,図1〜図
4を用いて説明する。本例の内層基板1は,図1に示す
ごとく,多層プリント配線板に用いる内層基板1におい
て,該内層基板1は,複数個の回路形成部11を有して
いると共に,上記回路形成部11と基板周縁12との間
の外周部13には樹脂接着剤の流出を防止するためのダ
ムを点在形成してなる。
Embodiment 1 An inner layer substrate according to an embodiment of the present invention will be described with reference to FIGS. As shown in FIG. 1, the inner layer board 1 of this example is the same as the inner layer board 1 used for a multilayer printed wiring board, and the inner layer board 1 has a plurality of circuit forming portions 11 and Dams for preventing the outflow of the resin adhesive are formed on the outer peripheral portion 13 between the substrate and the peripheral edge 12 of the substrate.

【0021】また,上記ダムは,その形状が大きい大ダ
ム21とその形状が小さい小ダム22とをそれぞれ複数
個,混在して設けてあり,一方,上記複数の回路形成部
11の間の製品間隙24には,上記外周部13に設けた
上記大ダム21よりは小さく上記小ダム22以上の大き
さを有する間隙ダム25が2列形成されている。
Further, the dam is provided with a plurality of large dams 21 each having a large shape and a plurality of small dams 22 each having a small shape in a mixed manner, while a product between the plurality of circuit forming portions 11 is provided. In the gap 24, two rows of gap dams 25, which are smaller than the large dam 21 provided on the outer peripheral portion 13 and have a size larger than that of the small dam 22, are formed.

【0022】そして,上記大ダム21,小ダム22及び
間隙ダム25は真円であり,これらは,図2,図3に示
すごとく,内層基板1の表裏両面に設けてある。また,
大ダム21は縦方向に2列配置され,大ダム21の中心
を通る横中心線における大ダム21の右側又は左側に小
ダム22が配置されている。本例において,上記各ダム
の直径は,大ダム21は6.0mm,小ダム22は3.
0mm,間隙ダム25は3.0mmであり,これらの厚
みは35μmである。
The large dam 21, the small dam 22 and the gap dam 25 are perfect circles, and they are provided on both the front and back surfaces of the inner layer substrate 1, as shown in FIGS. Also,
The large dams 21 are arranged in two rows in the vertical direction, and the small dams 22 are arranged on the right or left side of the large dam 21 in the horizontal center line passing through the center of the large dam 21. In this example, the diameter of each dam is 6.0 mm for the large dam 21 and 3.
0 mm, the gap dam 25 is 3.0 mm, and their thickness is 35 μm.

【0023】また,図4に示すごとく,上記回路形成部
11の中には導体パタ─ン115が形成されている。回
路形成部11の外周には,積層後において切断する切断
線111が形成されている。また,これら各ダムは,例
えば,内層基板1の回路形成部11に導体パタ─ン11
5を形成する際に,同時に形成する。即ち,銅張積層板
に用いて上記導体パタ─ン115を形成する際に,エッ
チング等により大ダム21,小ダム22,間隙ダム25
を形成する。また,これら各ダムの配置は,後述のごと
く,CADを用いた設計装置を用いて行なう。
Further, as shown in FIG. 4, a conductor pattern 115 is formed in the circuit forming portion 11. A cutting line 111 for cutting after stacking is formed on the outer periphery of the circuit forming portion 11. In addition, each of these dams is provided, for example, in the conductor pattern 11 in the circuit forming portion 11 of the inner layer substrate 1.
5 is formed at the same time. That is, when the conductor pattern 115 is formed on a copper clad laminate, the large dam 21, the small dam 22, and the gap dam 25 are etched by etching or the like.
To form Further, the arrangement of each of these dams is performed by using a design device using CAD as described later.

【0024】次に,本例の作用効果につき説明する。本
例の内層基板1においては,外周部13に,大ダム21
と小ダム22とを混在させているため,これらの間の通
路が複雑に曲折して形成される。そのため,樹脂接着剤
の流出,エアボイドの発生を防止できる。また,製品間
隙24には,上記大きさの間隙ダム25を設けてあるの
で,製品間隙24の間隔が狭くなっても,その広さに応
じて,任意の大きさの間隙ダムを配置でき,樹脂接着剤
の流出,エアボイドの発生を防止できる。
Next, the function and effect of this example will be described. In the inner layer substrate 1 of this example, the large dam 21 is formed on the outer peripheral portion 13.
Since the small dam 22 and the small dam 22 are mixed, the passage between them is complicatedly bent and formed. Therefore, the outflow of the resin adhesive and the generation of air voids can be prevented. Further, since the product gap 24 is provided with the gap dam 25 of the above size, even if the product gap 24 is narrow, a gap dam of any size can be arranged according to its size. It is possible to prevent outflow of resin adhesive and generation of air voids.

【0025】実施形態例2 本例は,図5に対するごとく,回路形成部11と基板周
縁12との間の外周部13に,2列の大ダム21を配置
すると共に,4つの大ダムによって囲まれる部分の中心
位置に小ダム22を配置した例である。そして,上記小
ダム22は,大ダム21の中心を通る各縦中心線31と
各横中心線32の間を,縦方向及び横方向にそれぞれ2
分割した分割線35,36のメッシュ上に形成されてい
る。
Embodiment 2 In this embodiment, as shown in FIG. 5, two rows of large dams 21 are arranged in the outer peripheral portion 13 between the circuit forming portion 11 and the substrate peripheral edge 12, and surrounded by four large dams. This is an example in which the small dam 22 is arranged at the center position of the portion to be covered. The small dam 22 has two vertical and horizontal lines between each vertical center line 31 and each horizontal center line 32 passing through the center of the large dam 21.
It is formed on the mesh of the divided dividing lines 35 and 36.

【0026】また,回路形成部11が大きく形成された
ことにより,間隔が小さくなった製品間隙24には,1
列の間隙ダムが形成されている。その他は実施形態例1
と同様である。本例においても実施形態例1と同様の効
果を得ることができる。
Further, since the circuit forming portion 11 is formed to be large, the product gap 24 having a small gap is
Row gap dams have been formed. Others are Embodiment 1
Is the same as In this example, the same effect as that of the first embodiment can be obtained.

【0027】実施形態例3 本例は,図6に示すごとく,実施形態例2において,縦
方向の外周部13が狭くなった場合の例を示している。
本例においては,縦方向の外周部13には1列の大ダム
21が形成されている。小ダム22は,大ダム21の各
横中心線32の間を2分割した分割線36と,上下の外
周部13における大ダム21の各縦中心線31の間を2
分割した分割線35(仮想線)とにより形成されるメッ
シュ上に設けられている。その他は実施形態例2と同様
である。本例においても,実施形態例2と同様の効果を
得ることができる。
Embodiment 3 As shown in FIG. 6, this embodiment shows an example in which the outer peripheral portion 13 in the vertical direction is narrowed in Embodiment 2.
In this example, one row of large dams 21 is formed on the outer peripheral portion 13 in the vertical direction. The small dam 22 divides the horizontal centerlines 32 of the large dam 21 into two, and the vertical centerline 31 of the large dam 21 in the upper and lower outer peripheral portions 13.
It is provided on the mesh formed by the dividing lines 35 (virtual lines) that have been divided. Others are the same as the second embodiment. In this example, the same effect as that of the second embodiment can be obtained.

【0028】実施形態例4 本例は,図7に示すごとく,外周部13において,大ダ
ム21の縦及び横の各中心線31,32の間に小ダム2
2を配置した例を示す。本例においては,上記各中心線
31,32の間の間隔が,実施形態例3の場合よりも大
きく取ってあり,各大ダム21の間に市松模様状に小ダ
ム22が配置されている。更に,外周部13において
は,回路形成部11に面する部分に小ダム21が配置さ
れている。その他は,実施形態例2と同様である。本例
においても実施形態例2と同様の効果を得ることができ
る。
Embodiment 4 In this embodiment, as shown in FIG. 7, in the outer peripheral portion 13, the small dam 2 is provided between the vertical and horizontal center lines 31 and 32 of the large dam 21.
An example in which 2 is arranged is shown. In this example, the distance between the center lines 31 and 32 is set larger than that in the third embodiment, and the small dams 22 are arranged in a checkered pattern between the large dams 21. . Further, in the outer peripheral portion 13, a small dam 21 is arranged in a portion facing the circuit forming portion 11. Others are the same as the second embodiment. Also in this example, the same effect as that of the second embodiment can be obtained.

【0029】実施形態例5 本例は,図8,図9に示すごとく,内層基板の設計装置
及びそのフロ─チャトを示す。本例の設計装置は,図8
及び図1,図5に示すごとく,多層プリント配線板用の
内層基板1における,回路形成部11と基板周縁12と
の間の外周部13に,樹脂接着剤の流出を防止するため
の大ダム21と小ダム22とを,多数混在配置するため
の内層基板1の設計装置である。
Fifth Embodiment As shown in FIGS. 8 and 9, this embodiment shows an apparatus for designing an inner layer substrate and its flow chart. The design device of this example is shown in FIG.
As shown in FIGS. 1 and 5, a large dam for preventing resin adhesive from flowing out to the outer peripheral portion 13 between the circuit forming portion 11 and the board peripheral edge 12 in the inner layer substrate 1 for a multilayer printed wiring board. This is a device for designing the inner layer substrate 1 for arranging a large number of 21 and small dams 22 mixedly.

【0030】該設計装置は,内層基板1の上記外周部1
3に配置すべき大ダム21,小ダム22の情報を読み込
むダム情報読み込み手段41と,上記外周部13の大き
さを認識する外周部認識手段42と,上記外周部認識手
段42により認識された上記外周部13に,上記ダム情
報読み込み手段41により得られた大ダム21を複数個
配置する大ダム配置手段431と,上記大ダム21を配
置した後の上記外周部13における残余部分の大きさを
認識する残余認識手段44と,上記残余認識手段44に
より認識された上記残余部分に,上記ダム情報読み込み
手段41により得られた小ダム22を複数個配置する小
ダム配置手段432とを有する。
The designing apparatus is such that the outer peripheral portion 1 of the inner layer substrate 1 is
It is recognized by the dam information reading means 41 for reading the information of the large dam 21 and the small dam 22 to be arranged in 3, the outer peripheral part recognizing means 42 for recognizing the size of the outer peripheral part 13, and the outer peripheral part recognizing means 42. A large dam arranging means 431 for arranging a plurality of large dams 21 obtained by the dam information reading means 41 on the outer peripheral portion 13, and a size of a remaining portion in the outer peripheral portion 13 after the large dam 21 is arranged. And a small dam arranging means 432 for arranging a plurality of small dams 22 obtained by the dam information reading means 41 in the residual portion recognized by the residual recognizing means 44.

【0031】また,上記製品間隙24の大きさを認識す
る製品間隙認識手段46と,上記製品間隙24に,上記
大ダム21よりは小さく,上記小ダム22以上の大きさ
を有する間隙ダム25を配置する間隙ダム配置手段43
3を有する。
A product gap recognition means 46 for recognizing the size of the product gap 24 and a gap dam 25 having a size smaller than the large dam 21 and larger than the small dam 22 are provided in the product gap 24. Gap dam placement means 43 to be placed
3

【0032】また,上記大ダム配置手段431,小ダム
配置手段432及び間隙ダム配置手段433は,それぞ
れ上記大ダム21,小ダム22,間隙ダム24が配置で
きなくなるまで配置を繰り返す配置繰り返し手段(図示
略)を有する。
The large dam arranging means 431, the small dam arranging means 432 and the gap dam arranging means 433 repeat the arrangement until the large dam 21, the small dam 22 and the gap dam 24 cannot be arranged, respectively. (Not shown).

【0033】また,上記外周部認識手段42は,内層基
板1のサイズを読み込む内層基板サイズ読み込み手段4
21と,回路形成部11のサイズを読み込む回路形成部
サイズ読み込み手段422と,内層基板1に回路形成部
を配置するための配置情報を読み込む回路形成部配置情
報読み込み手段423とを有する。
The outer peripheral portion recognizing means 42 reads the size of the inner layer board 1 and reads the inner layer board size reading means 4
21, a circuit formation portion size reading means 422 for reading the size of the circuit formation portion 11, and a circuit formation portion arrangement information reading means 423 for reading arrangement information for arranging the circuit formation portion on the inner layer substrate 1.

【0034】更に,複数個配置された大ダム21の中心
を通る縦中心線31とこれに直交し大ダム21の中心を
通る横中心線31によって形成されるメッシュの間を,
それぞれ2以上に縦方向及び横方向に分割する分割線3
5,36上に対して,小ダム22の中心を配置するメッ
シュ分割配置手段45を有する。
Further, between a mesh formed by a vertical centerline 31 passing through the center of the large dam 21 and a lateral centerline 31 orthogonal to the centerline 31 passing through the center of the large dam 21,
Dividing line 3 that divides vertically and horizontally into two or more
There is a mesh dividing and arranging means 45 for arranging the center of the small dam 22 with respect to 5, and 36.

【0035】次に,上記設計装置を用いて,内層基板に
大ダム,小ダム,間隙ダムを配置する方法につき,前記
図5(実施形態例2)に示した内層基板1を例にとって
説明する。まず,S(ステップ)101においては,内
層基板サイズ読み込み手段421により内層基板1のサ
イズを読み込む。次いでS102において回路形成部サ
イズ読み込み手段422により回路形成部11のサイズ
を読み込み,更にS103において,回路形成部配置情
報読み込み手段423により,回路形成部を内層基板の
どの位置に配置するかの情報を読み込む。
Next, a method of arranging a large dam, a small dam, and a gap dam on the inner layer substrate using the above design apparatus will be described by taking the inner layer substrate 1 shown in FIG. 5 (Embodiment 2) as an example. . First, in S (step) 101, the size of the inner layer substrate 1 is read by the inner layer substrate size reading means 421. Next, in step S102, the size of the circuit forming portion 11 is read by the circuit forming portion size reading means 422, and in step S103, the circuit forming portion placement information reading means 423 provides information on the position of the circuit forming portion on the inner layer substrate. Read.

【0036】そして,S104において,上記内層基板
1,回路形成部11のサイズ,及び内層基板1中への回
路形成部11の配置位置から,内層基板1の基板周縁1
2と回路形成部11との間に形成される外周部13を認
識する。
Then, in S104, based on the size of the inner layer substrate 1, the circuit forming portion 11 and the position of the circuit forming portion 11 in the inner layer substrate 1, the substrate peripheral edge 1 of the inner layer substrate 1 is determined.
The outer peripheral portion 13 formed between the circuit 2 and the circuit forming portion 11 is recognized.

【0037】次いで,S105において,ダム情報読み
込み手段41により,ダムの形状,直径等のダム情報を
読み込む。そして,S106において,大ダム配置手段
431により,上記外周部13に大ダム21を配置す
る。大ダム21は,上記図5(実施形態例2)において
説明したように,外周部に2列配置する。
Next, in S105, the dam information reading means 41 reads dam information such as the shape and diameter of the dam. Then, in S106, the large dam 21 is arranged on the outer peripheral portion 13 by the large dam arrangement means 431. The large dams 21 are arranged in two rows on the outer peripheral portion as described in FIG. 5 (second embodiment).

【0038】次に,大ダム21の配置が終了した後,S
107においては,残余認識手段44により,上記外周
部13において大ダム21が配置されていない残余部分
を認識する。そして,S108において,メッシュ分割
配置手段45,小ダム配置手段432により,上記図5
に示すごとく,大ダム21の周囲に小ダム22を配置す
る。小ダム22の配置は,上記残余部分を認識しなが
ら,小ダム22の配置が可能な残余部分がなくなるま
で,S107と108の間を繰り返して行なう。
Next, after the arrangement of the large dam 21 is completed, S
At 107, the residual recognizing means 44 recognizes the residual portion in the outer peripheral portion 13 where the large dam 21 is not arranged. Then, in step S108, the mesh dividing and arranging means 45 and the small dam arranging means 432 cause the above-mentioned FIG.
A small dam 22 is arranged around the large dam 21 as shown in FIG. The arrangement of the small dam 22 is repeated while recognizing the above-mentioned remaining portion until there is no remaining portion where the small dam 22 can be arranged.

【0039】次に,小ダム22の配置終了後には,S1
09において,製品間隙認識手段46により,回路形成
部11,11の間の製品間隙24の大きさを,上記内層
基板1,回路形成部11のサイズ,回路形成部11の配
置位置等の情報から認識する。そして,S110におい
て,間隙ダム配置手段433により,上記製品間隙24
に間隙ダム25を配置する。間隙ダム25の配置終了に
より,ダム配置プログラムは終了する。
Next, after the completion of the arrangement of the small dam 22, S1
At 09, the product gap recognizing means 46 determines the size of the product gap 24 between the circuit forming portions 11 and 11 from the information such as the size of the inner layer substrate 1, the circuit forming portion 11 and the arrangement position of the circuit forming portion 11. recognize. Then, in S110, the product gap 24 is generated by the gap dam placement means 433.
The gap dam 25 is placed in the. When the placement of the gap dam 25 is completed, the dam placement program ends.

【0040】次いで,上記ダム配置後の内層基板のデ−
タを,内層基板デ−タ出力手段47により出力し,プロ
ッタ装置49によりプリントアウトする。これら一連の
操作はCAD装置を用いて行なうことができる。
Next, the data of the inner layer substrate after the above-mentioned dam arrangement is
The data is output by the inner layer substrate data output means 47 and printed out by the plotter device 49. These series of operations can be performed using a CAD device.

【0041】実施形態例6 本例は,図10〜図16に示すごとく,外周部13への
大ダム21の配置,メッシュ分割配置手段45による小
ダム22の配置方法につき説明する。まず,図10に示
すごとく,外周部には2列の大ダム21を配置する。次
に,小ダム22の配置に当たっては,上記メッシュ分割
配置手段45により,大ダム21の各縦中心線31の間
を2分割する縦分割線35を形成し,一方大ダム21の
各横中心線32の間を2分割する横分割線36を形成す
る。次いで,この両分割線35,36によって形成され
るメッシュの交点に小ダム22を配置する。
Embodiment 6 As shown in FIGS. 10 to 16, this embodiment will explain the arrangement of the large dam 21 on the outer peripheral portion 13 and the arrangement method of the small dam 22 by the mesh division arrangement means 45. First, as shown in FIG. 10, two rows of large dams 21 are arranged on the outer peripheral portion. Next, when arranging the small dam 22, a vertical dividing line 35 that divides each vertical center line 31 of the large dam 21 into two is formed by the mesh dividing and arranging means 45, while each horizontal center of the large dam 21 is formed. A horizontal division line 36 that divides the space between the lines 32 into two is formed. Next, the small dam 22 is arranged at the intersection of the meshes formed by the dividing lines 35 and 36.

【0042】次に,図11は,上記中心線32と分割線
36の間を更に2分割し,即ち各中心線31の間を4分
割し,その位置に更に別の小さい小ダム221を形成す
る例を示している。図12は,上記中心線32と上記分
割線36の間を3分割して,小ダム223を形成する例
を示している。
Next, in FIG. 11, the center line 32 and the dividing line 36 are further divided into two, that is, the respective center lines 31 are divided into four, and another small dam 221 is formed at that position. An example is shown. FIG. 12 shows an example in which the small dam 223 is formed by dividing the space between the center line 32 and the dividing line 36 into three.

【0043】図13は,上記と同様にして,大ダム21
の中心線の間を複数に分割し,大ダム21と小ダム22
との間の対角線上に更に小さい小ダム224を配置した
例を示している。このようにして,大ダム21の中心線
間を任意に分割し,その分割線の交点に小ダム更には小
さい小ダムを配置することができる。
FIG. 13 shows the large dam 21 in the same manner as above.
The large dam 21 and small dam 22 are divided into multiple spaces between the centerlines of
It shows an example in which a smaller dam 224 is arranged on the diagonal between and. In this way, the center lines of the large dam 21 can be arbitrarily divided, and small dams and smaller small dams can be arranged at the intersections of the dividing lines.

【0044】実施形態例7 本例は,図14に示すごとく,大ダム21を外周部13
に配置する場合の例を示している。即ち,まず外周部1
3の任意の位置に第1の大ダム21を配置する(図14
A)。次に,第1の大ダム21を基準として下方へy2
移動した位置に第2の大ダム21を配置していく(同図
B)。
Embodiment 7 In this embodiment, as shown in FIG. 14, the large dam 21 is connected to the outer peripheral portion 13
The example shows the case of arranging in. That is, first, the outer peripheral portion 1
The first large dam 21 is arranged at an arbitrary position in FIG.
A). Next, with the first large dam 21 as a reference, downward y 2
The second large dam 21 is arranged at the moved position (B in the figure).

【0045】また,同図Cに示すごとく,第1の大ダム
21を基準として右方向へx2 移動した位置に第2の大
ダム21を配置する。また,同図Dに示すごとく,第1
の大ダム21を基準として,右方向へx3 ,下方向へy
3 移動した位置に第2の大ダム21を配置する。以下,
上記の配置方法に従って,前記実施形態例1〜5に示し
たごとく,大ダムを配置する。
Further, as shown in FIG. 6C, the second large dam 21 is arranged at a position moved x 2 to the right with reference to the first large dam 21. In addition, as shown in FIG.
As a reference a large dam 21, x 3 to the right, y downward
3 Place the second large dam 21 at the moved position. Less than,
According to the arrangement method described above, large dams are arranged as shown in the first to fifth embodiments.

【0046】実施形態例8 本例は,図15〜図18に示すごとく,大ダム21,小
ダム22,間隙ダム25を配置する(図15A)に当た
って,図15Bに示すごとく,外周部を上下のF領域と
左右のH領域に,また製品間隙24をG領域に区分し
て,それぞれ大ダム21,小ダム22,間隙ダム25を
配置する場合の例を示している。
Embodiment 8 In this embodiment, as shown in FIGS. 15 to 18, when the large dam 21, the small dam 22 and the gap dam 25 are arranged (FIG. 15A), the outer peripheral portion is vertically moved as shown in FIG. 15B. In the example, the large dam 21, the small dam 22 and the gap dam 25 are arranged in the F region and the left and right H regions, and the product gap 24 is divided into the G region.

【0047】即ち,まずF領域に関しては,図16Aに
示すごとく,左上端の基準点F1からx1 ,y1 ,の位
置に大ダム21を配置し,同図Bに示すごとく,右方向
へ大ダムを順次配置する。次いで,F領域において,大
ダム21の間の上下に,更に大ダムが配置できるか否か
調べる。この場合には同図に点線円で示すごとく,大ダ
ムがはみ出てしまいこの配置ができない。そこで,同図
Cに示すごとく,前記実施形態例7に示したごとく,分
割線によるメッシュを仮形成し,メッシュの交点に小ダ
ム22を形成する。
That is, for the F region, as shown in FIG. 16A, the large dam 21 is arranged at the position of x 1 , y 1 from the reference point F 1 at the upper left end, and as shown in FIG. Large dams are arranged in sequence. Then, in the F region, it is checked whether or not the large dams can be arranged above and below the large dams 21. In this case, as shown by the dotted circle in the figure, this dam cannot be placed because the large dam protrudes. Therefore, as shown in FIG. 6C, as shown in the seventh embodiment, a mesh with dividing lines is temporarily formed, and the small dam 22 is formed at the intersection of the meshes.

【0048】次に,製品間隙のG領域に関しては,図1
7Aに示すごとく,製品間隙が狭いために,F領域に配
置した大ダム21と同じ大きさのダム(点線円)219
を配置しようとしても,それがはみ出してしまう。そこ
で,図17Bに示すごとく,大ダムよりも小さい小ダム
22と同じ大きさの間隙ダム25を配置する。更に,同
図Cに示すごとく,この間隙ダム25の間で,かつその
上下に間隙ダムが形成できるか否か判断する。しかし,
この場合には間隙ダムが点線円で示すごとく,G領域か
らはみ出てしまう。そのため,間隙ダム25は1列のみ
となる。
Next, regarding the G region of the product gap, FIG.
As shown in FIG. 7A, since the product gap is small, a dam (dotted line circle) 219 having the same size as the large dam 21 arranged in the F region 219
If you try to place it, it will stick out. Therefore, as shown in FIG. 17B, a gap dam 25 having the same size as the small dam 22 smaller than the large dam is arranged. Further, as shown in FIG. 7C, it is judged whether or not a gap dam can be formed between the gap dams 25 and above and below the gap dams 25. However,
In this case, the gap dam extends out of the G area as shown by the dotted circle. Therefore, the gap dam 25 has only one row.

【0049】次に,H領域に関しては,図18Aに示す
ごとく,その左上端を基準点H1として,x1 ,y1
の位置に大ダム21を配置し,同図Bに示すごとく,下
方へ大ダム21を配置していく。また,大ダム21の間
の左右に,更に大ダムを配置できるか否か調べる。しか
し,同図Bに示すごとく,その大ダムは点線円で示すご
とく,左右にはみ出てしまい,配置できない。そこで,
同図Cに示しごとく,大ダム21の間の左右に小ダム2
2を配置する。この小ダム22の配置は,前記実施形態
例7に示した分割線を利用して行なう。
Next, regarding the H region, as shown in FIG. 18A, x 1 , y 1 ,
The large dam 21 is arranged at the position of, and the large dam 21 is arranged downward as shown in FIG. In addition, it is checked whether or not large dams can be arranged on the left and right between the large dams 21. However, as shown in Figure B, the large dam, as shown by the dotted circle, protrudes to the left and right and cannot be placed. Therefore,
As shown in Fig. C, small dams 2 are provided on the left and right between the large dams 21.
2 is arranged. The arrangement of the small dam 22 is performed by using the dividing line shown in the seventh embodiment.

【0050】以上述べた実施形態例5〜実施形態例8い
ずれにおいても,上記実施形態例1に示したと同様の優
れた内層基板を得ることができ,また内層基板に対する
ダムの配置を容易に行なうことができる。
In any of the fifth to eighth embodiments described above, the same excellent inner layer substrate as shown in the first embodiment can be obtained, and the dam can be easily arranged on the inner substrate. be able to.

【0051】[0051]

【発明の効果】本発明によれば,樹脂接着剤の流出,エ
アボイドの発生がない内層基板,及び該内層基板にダム
を配置するための設計装置を提供することができる。
As described above, according to the present invention, it is possible to provide an inner layer substrate free from the outflow of a resin adhesive and generation of air voids, and a designing device for disposing a dam on the inner layer substrate.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施形態例1における,内層基板の大ダム,小
ダム,間隙ダムの配置状態を示す説明図。
FIG. 1 is an explanatory diagram showing an arrangement state of a large dam, a small dam, and a gap dam of an inner layer substrate in a first embodiment.

【図2】実施形態例1における,図1のA−A線矢視断
面図。
FIG. 2 is a sectional view taken along the line AA of FIG. 1 in the first embodiment.

【図3】実施形態例1における,図1のB−B線矢視断
面図。
FIG. 3 is a cross-sectional view taken along the line BB of FIG. 1 in the first embodiment.

【図4】実施形態例1における,回路形成部の説明図。FIG. 4 is an explanatory diagram of a circuit forming unit according to the first embodiment.

【図5】実施形態例2における,内層基板の大ダム,小
ダム,間隙ダムの配置状態を示す説明図。
FIG. 5 is an explanatory diagram showing the arrangement of large dams, small dams, and gap dams on the inner layer substrate in the second embodiment.

【図6】実施形態例3における,内層基板の大ダム,小
ダム,間隙ダムの配置状態を示す説明図。
FIG. 6 is an explanatory diagram showing the arrangement of large dams, small dams, and gap dams on the inner layer substrate in the third embodiment.

【図7】実施形態例4における,内層基板の大ダム,小
ダム,間隙ダムの配置状態を示す説明図。
FIG. 7 is an explanatory diagram showing an arrangement state of large dams, small dams, and gap dams of the inner layer substrate in the fourth embodiment.

【図8】実施形態例5における,内層基板の設計装置の
ブロック線図。
FIG. 8 is a block diagram of an inner layer board designing apparatus according to a fifth embodiment.

【図9】実施形態例5における,ダム配置のフロ─チャ
─ト。
FIG. 9 is a flow chart of dam arrangement in the fifth embodiment.

【図10】実施形態例6における,大ダム,小ダムの配
置方法の説明。
FIG. 10 is an explanation of a method of arranging a large dam and a small dam in the sixth embodiment.

【図11】実施形態例6における,大ダムの間への小ダ
ム等の配置説明。
FIG. 11 is an explanation of the arrangement of small dams and the like between large dams in the sixth embodiment.

【図12】実施形態例6における,大ダムの間への小ダ
ム等の配置説明。
FIG. 12 is an explanation of the arrangement of small dams and the like between large dams in the sixth embodiment.

【図13】実施形態例6における,大ダムの間への小ダ
ム等の配置説明。
FIG. 13 is an explanation of arrangement of small dams and the like between large dams in the sixth embodiment.

【図14】実施形態例7における,大ダムの配置の説明
図。
FIG. 14 is an explanatory diagram of the arrangement of large dams in the seventh embodiment.

【図15】実施形態例8における,内層基板の,(A)
大ダム配置図,(B)領域説明図。
FIG. 15 (A) of the inner layer substrate in the eighth embodiment.
Large dam layout diagram, (B) area explanatory diagram.

【図16】実施形態例8における,F領域への(A)大
ダム配置図,(B)大ダム配線検討図,(C)大ダム,
小ダム配置図。
FIG. 16 is a layout diagram of (A) large dam in area F, (B) wiring diagram of large dam, and (C) large dam in embodiment 8;
Small dam layout diagram.

【図17】実施形態例8における,G領域への,(A)
間隙ダム配置検討図,(B)間隙ダム配置図,(C)上
下への間隙ダム配置検討図。
FIG. 17 (A) to the G region in the eighth embodiment.
Gap dam layout study, (B) Gap dam layout, (C) Gap dam layout study up and down.

【図18】実施形態例8における,H領域への,(A)
大ダム配置検討図,(B)左右への大ダム配置検討図,
(C)大ダム,小ダム配置図。
FIG. 18 (A) to the H region in the eighth embodiment
Large dam layout study, (B) Large dam layout study on left and right,
(C) Layout of large dam and small dam.

【図19】従来例における,内層基板へのダム配置説明
図。
FIG. 19 is an explanatory diagram of dam arrangement on the inner layer substrate in the conventional example.

【図20】従来例における,製品間隙の狭い内層基板へ
のダム配置説明図。
FIG. 20 is an explanatory diagram of dam placement on an inner layer substrate having a narrow product gap in a conventional example.

【符号の説明】[Explanation of symbols]

1...内層基板, 11...回路形成部, 115...導体パタ─ン, 12...基板周縁, 13...外周部, 21...大ダム, 22...小ダム, 24...製品間隙, 25...間隙ダム, 31,32...中心線, 35,36...分割線, 1. . . Inner layer substrate, 11. . . Circuit forming part, 115. . . Conductor pattern, 12. . . Substrate edge, 13. . . Outer periphery, 21. . . Great Dam, 22. . . Small dam, 24. . . Product gap, 25. . . Gap Dam, 31, 32. . . Centerline, 35, 36. . . Dividing line,

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 多層プリント配線板に用いる内層基板に
おいて,該内層基板は,複数個の回路形成部を有してい
ると共に,上記回路形成部と基板周縁との間の外周部に
は樹脂接着剤の流出を防止するためのダムを点在形成し
てなり,また,上記ダムは,その形状が大きい大ダムと
その形状が小さい小ダムとをそれぞれ複数個,混在して
設けてあり,一方,上記複数の回路形成部の間の製品間
隙には,上記外周部に設けた上記大ダムよりは小さく上
記小ダム以上の大きさを有する間隙ダムが形成されてい
ることを特徴とする内層基板。
1. An inner layer substrate used for a multilayer printed wiring board, wherein the inner layer substrate has a plurality of circuit forming portions, and a resin adhesive is applied to an outer peripheral portion between the circuit forming portions and the peripheral edge of the substrate. Dams for preventing the outflow of the agent are formed in a scattered manner, and the dam is provided with a plurality of large dams having a large shape and a plurality of small dams having a small shape in a mixed manner. An inner layer substrate is characterized in that a gap dam having a size smaller than the large dam provided in the outer peripheral portion and larger than the small dam is formed in the product gap between the plurality of circuit forming portions. .
【請求項2】 請求項1において,上記間隙ダムは上記
小ダムと同じ大きさを有し,かつ複数列配置されている
ことを特徴とする内層基板。
2. The inner layer substrate according to claim 1, wherein the gap dam has the same size as the small dam and is arranged in a plurality of rows.
【請求項3】 請求項1又は2において,上記外周部に
おける大ダムは2列以上配置され,その間に小ダムが配
置されていることを特徴とする内層基板。
3. The inner layer substrate according to claim 1, wherein the large dams in the outer peripheral portion are arranged in two or more rows, and the small dams are arranged between them.
【請求項4】 請求項1〜3のいずれか一項において,
上記大ダムの配置列の中心線の間には小ダムが介設され
ていることを特徴とする内層基板。
4. The method according to claim 1, wherein
An inner layer substrate, characterized in that a small dam is interposed between the center lines of the arrangement rows of the large dams.
【請求項5】 多層プリント配線板用の内層基板におけ
る,回路形成部と基板周縁との間の外周部に,樹脂接着
剤の流出を防止するための大ダムと小ダムとを,多数混
在配置するための内層基板の設計装置であって,内層基
板の上記外周部に配置すべき大ダム,小ダムの情報を読
み込むダム情報読み込み手段と,上記外周部の大きさを
認識する外周部認識手段と,上記外周部認識手段により
認識された上記外周部に,上記ダム情報読み込み手段に
より得られた大ダムを複数個配置する大ダム配置手段
と,上記大ダムを配置した後の上記外周部における残余
部分の大きさを認識する残余認識手段と,上記残余認識
手段により認識された上記残余部分に,上記ダム情報読
み込み手段により得られた小ダムを複数個配置する小ダ
ム配置手段とよりなることを特徴とする内層基板の設計
装置。
5. A large number of large dams and small dams for preventing resin adhesive from flowing out are mixedly arranged in an outer peripheral portion between a circuit forming portion and a peripheral edge of the substrate in an inner layer substrate for a multilayer printed wiring board. And a dam information reading means for reading information on a large dam and a small dam to be arranged on the outer peripheral portion of the inner layer board, and an outer peripheral portion recognizing means for recognizing the size of the outer peripheral portion. A large dam arranging means for arranging a plurality of large dams obtained by the dam information reading means on the outer peripheral part recognized by the outer peripheral part recognizing means, and the outer peripheral part after the large dam is arranged. It comprises a residual recognizing means for recognizing the size of the residual portion, and a small dam arranging means for arranging a plurality of small dams obtained by the dam information reading means in the residual portion recognized by the residual recognizing means. An inner layer substrate designing device characterized by the above.
【請求項6】 請求項5において,上記内層基板は複数
個の回路形成部を有していると共に各回路形成部の間に
は製品間隙を有しており,該製品間隙の大きさを認識す
る製品間隙認識手段と,上記製品間隙に,上記大ダムよ
りは小さく,上記小ダム以上の大きさを有する間隙ダム
を配置する間隙ダム配置手段とを有することを特徴とす
る内層基板の設計装置。
6. The inner layer substrate according to claim 5, wherein the inner layer substrate has a plurality of circuit forming portions and a product gap is provided between the circuit forming portions, and the size of the product gap is recognized. And a gap dam arranging means for arranging a gap dam having a size smaller than the large dam and larger than the small dam in the product gap. .
【請求項7】 請求項5または6において,大ダム配置
手段,小ダム配置手段及び間隙ダム配置手段は,それぞ
れ上記大ダム,小ダム,間隙ダムが配置できなくなるま
で配置を繰り返す配置繰り返し手段を有することを特徴
とする内層基板の設計装置。
7. The large dam arranging means, the small dam arranging means and the gap dam arranging means according to claim 5 or 6, wherein the large dam arranging means, the small dam arranging means and the gap dam arranging means are arranged repeatedly until the large dam, the small dam and the gap dam cannot be arranged. An apparatus for designing an inner layer substrate having.
【請求項8】 請求項5〜7のいずれか一項において,
上記外周部認識手段は,内層基板のサイズを読み込む内
層基板サイズ読み込み手段と,回路形成部のサイズを読
み込む回路形成部サイズ読み込み手段と,内層基板に回
路形成部を配置するための配置情報を読み込む回路形成
部配置情報読み込み手段とを有することを特徴とする内
層基板の設計装置。
8. The method according to claim 5, wherein
The outer peripheral part recognizing means reads an inner layer board size reading means for reading the size of the inner layer board, a circuit forming part size reading means for reading the size of the circuit forming part, and an arrangement information for arranging the circuit forming part on the inner layer board. An apparatus for designing an inner layer substrate, comprising: a circuit formation portion placement information reading means.
【請求項9】 請求項5〜8のいずれか一項において,
複数個配置された大ダムの中心を通る縦中心線とこれに
直交し大ダムの中心を通る横中心線によって形成される
メッシュの間を,それぞれ2以上に縦方向及び横方向に
分割する分割線上に対して,小ダムの中心を配置するメ
ッシュ分割配置手段を有することを特徴とする内層基板
の設計装置。
9. The method according to claim 5, wherein
A division that divides the mesh between a vertical centerline passing through the center of a large dam and a horizontal centerline orthogonal to it and passing through the center of the large dam into two or more vertical and horizontal directions. A device for designing an inner layer substrate, characterized by having a mesh dividing and arranging means for arranging a center of a small dam on a line.
JP13142996A 1996-04-26 1996-04-26 Inner layer substrate and design device thereof Expired - Fee Related JP3796815B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13142996A JP3796815B2 (en) 1996-04-26 1996-04-26 Inner layer substrate and design device thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13142996A JP3796815B2 (en) 1996-04-26 1996-04-26 Inner layer substrate and design device thereof

Publications (2)

Publication Number Publication Date
JPH09293966A true JPH09293966A (en) 1997-11-11
JP3796815B2 JP3796815B2 (en) 2006-07-12

Family

ID=15057760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13142996A Expired - Fee Related JP3796815B2 (en) 1996-04-26 1996-04-26 Inner layer substrate and design device thereof

Country Status (1)

Country Link
JP (1) JP3796815B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005277387A (en) * 2004-02-24 2005-10-06 Nippon Mektron Ltd Multilayer flexible circuit board and its manufacturing method
JP2015015317A (en) * 2013-07-03 2015-01-22 日本特殊陶業株式会社 Component built-in wiring board and manufacturing method of the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005277387A (en) * 2004-02-24 2005-10-06 Nippon Mektron Ltd Multilayer flexible circuit board and its manufacturing method
JP4597686B2 (en) * 2004-02-24 2010-12-15 日本メクトロン株式会社 Method for manufacturing multilayer flexible circuit board
US8004851B2 (en) 2004-02-24 2011-08-23 Nippon Mektron, Ltd. Multi-layer flexible printed circuit board and manufacturing method thereof
JP2015015317A (en) * 2013-07-03 2015-01-22 日本特殊陶業株式会社 Component built-in wiring board and manufacturing method of the same

Also Published As

Publication number Publication date
JP3796815B2 (en) 2006-07-12

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