JPH09272987A5 - - Google Patents

Info

Publication number
JPH09272987A5
JPH09272987A5 JP1997022669A JP2266997A JPH09272987A5 JP H09272987 A5 JPH09272987 A5 JP H09272987A5 JP 1997022669 A JP1997022669 A JP 1997022669A JP 2266997 A JP2266997 A JP 2266997A JP H09272987 A5 JPH09272987 A5 JP H09272987A5
Authority
JP
Japan
Prior art keywords
ceramic layer
ceramic
layer
heat
resistant member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997022669A
Other languages
English (en)
Japanese (ja)
Other versions
JP4226669B2 (ja
JPH09272987A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP02266997A priority Critical patent/JP4226669B2/ja
Priority claimed from JP02266997A external-priority patent/JP4226669B2/ja
Publication of JPH09272987A publication Critical patent/JPH09272987A/ja
Publication of JPH09272987A5 publication Critical patent/JPH09272987A5/ja
Application granted granted Critical
Publication of JP4226669B2 publication Critical patent/JP4226669B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP02266997A 1996-02-05 1997-02-05 耐熱部材 Expired - Fee Related JP4226669B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02266997A JP4226669B2 (ja) 1996-02-05 1997-02-05 耐熱部材

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP1856596 1996-02-05
JP8-18565 1996-02-05
JP02266997A JP4226669B2 (ja) 1996-02-05 1997-02-05 耐熱部材

Publications (3)

Publication Number Publication Date
JPH09272987A JPH09272987A (ja) 1997-10-21
JPH09272987A5 true JPH09272987A5 (cg-RX-API-DMAC10.html) 2004-10-21
JP4226669B2 JP4226669B2 (ja) 2009-02-18

Family

ID=26355261

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02266997A Expired - Fee Related JP4226669B2 (ja) 1996-02-05 1997-02-05 耐熱部材

Country Status (1)

Country Link
JP (1) JP4226669B2 (cg-RX-API-DMAC10.html)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3510993B2 (ja) * 1999-12-10 2004-03-29 トーカロ株式会社 プラズマ処理容器内部材およびその製造方法
US7166200B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate in a plasma processing system
US7204912B2 (en) 2002-09-30 2007-04-17 Tokyo Electron Limited Method and apparatus for an improved bellows shield in a plasma processing system
US7147749B2 (en) 2002-09-30 2006-12-12 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
US7166166B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7137353B2 (en) 2002-09-30 2006-11-21 Tokyo Electron Limited Method and apparatus for an improved deposition shield in a plasma processing system
US6837966B2 (en) 2002-09-30 2005-01-04 Tokyo Electron Limeted Method and apparatus for an improved baffle plate in a plasma processing system
US6798519B2 (en) 2002-09-30 2004-09-28 Tokyo Electron Limited Method and apparatus for an improved optical window deposition shield in a plasma processing system
CN1249789C (zh) 2002-11-28 2006-04-05 东京毅力科创株式会社 等离子体处理容器内部件
JP4597972B2 (ja) 2003-03-31 2010-12-15 東京エレクトロン株式会社 処理部材上に隣接するコーティングを接合する方法。
US7291566B2 (en) 2003-03-31 2007-11-06 Tokyo Electron Limited Barrier layer for a processing element and a method of forming the same
US7552521B2 (en) 2004-12-08 2009-06-30 Tokyo Electron Limited Method and apparatus for improved baffle plate
US7601242B2 (en) 2005-01-11 2009-10-13 Tokyo Electron Limited Plasma processing system and baffle assembly for use in plasma processing system
WO2007013184A1 (ja) 2005-07-29 2007-02-01 Tocalo Co., Ltd. Y2o3溶射皮膜被覆部材およびその製造方法
JP4571561B2 (ja) 2005-09-08 2010-10-27 トーカロ株式会社 耐プラズマエロージョン性に優れる溶射皮膜被覆部材およびその製造方法
US7854966B2 (en) 2006-02-06 2010-12-21 Hamilton Sundstrand Corporation Coating process for fatigue critical components
US7648782B2 (en) 2006-03-20 2010-01-19 Tokyo Electron Limited Ceramic coating member for semiconductor processing apparatus
US7850864B2 (en) 2006-03-20 2010-12-14 Tokyo Electron Limited Plasma treating apparatus and plasma treating method
JP5081418B2 (ja) * 2006-08-28 2012-11-28 パナソニック株式会社 Ｌｅｄパッケージ
US9341118B2 (en) * 2009-12-29 2016-05-17 Rolls-Royce Corporation Various layered gas turbine engine component constructions
WO2012053517A1 (ja) * 2010-10-19 2012-04-26 独立行政法人物質・材料研究機構 耐熱ボンドコート層を設けたＮｉ基超合金部材
JPWO2014083630A1 (ja) * 2012-11-28 2017-01-05 株式会社日立製作所 遮熱コーティング部材
EP2884048A1 (de) * 2013-12-13 2015-06-17 Siemens Aktiengesellschaft Wärmedämmbeschichtung einer Turbinenschaufel

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