JPH09255468A - Part management of single crystal pulling device and device therefor - Google Patents

Part management of single crystal pulling device and device therefor

Info

Publication number
JPH09255468A
JPH09255468A JP6690496A JP6690496A JPH09255468A JP H09255468 A JPH09255468 A JP H09255468A JP 6690496 A JP6690496 A JP 6690496A JP 6690496 A JP6690496 A JP 6690496A JP H09255468 A JPH09255468 A JP H09255468A
Authority
JP
Japan
Prior art keywords
single crystal
quality
component
parts
limit value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6690496A
Other languages
Japanese (ja)
Other versions
JP2959464B2 (en
Inventor
Masahiro Ogawa
正裕 小川
Yoshiyuki Kashiwabara
義之 柏原
Osamu Inoue
修 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Sitix Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Sitix Corp filed Critical Sumitomo Sitix Corp
Priority to JP6690496A priority Critical patent/JP2959464B2/en
Publication of JPH09255468A publication Critical patent/JPH09255468A/en
Application granted granted Critical
Publication of JP2959464B2 publication Critical patent/JP2959464B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method for managing life times of parts in a single crystal pulling device, quantitatively grasping the life times of the parts and enabling the quality stabilization of the pulled up single crystal and the reduction of products below standards, and a device used to perform the method. SOLUTION: This part management device 1 is equipped with a calculating part 2 for a regression coefficient and an alarming part 3, and connected to plural single crystal pulling devices 4. The calculating part 2 for the regression coefficient prescribes a life time for each of the parts based on the inputted data and feeds to the alarming part 3. When a datum on a number of uses or a used time of each of the parts obtained from the single crystal pulling up devices 4, reaches to a value prescribed by the calculating part 2 for the regression coefficient, the alarming part 3 judges that the part reaches to its life time and gives a warning by a method such as by buzzing or displaying on a displaying device to prompt the exchange of the part.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、半導体材料として
使用されるシリコン単結晶等の単結晶を成長させる単結
晶引き上げ装置における部品管理方法及びその実施に使
用する部品管理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a component management method in a single crystal pulling apparatus for growing a single crystal such as a silicon single crystal used as a semiconductor material, and a component management apparatus used for implementing the method.

【0002】[0002]

【従来の技術】結晶成長方法には種々の方法があるが、
その1つにチョクラルスキー法(CZ法)がある。図7
は、CZ法に用いられる結晶引上装置を示す模式的縦断
面図である。図中11は、有底円筒形状をなすチャンバで
あり、その上方にはチャンバ11より小径のプルチャンバ
12が同一軸心にて連結されている。チャンバ11内には坩
堝13が配設されており、坩堝13は有底円筒形状をなす黒
鉛坩堝13a と、この内側に嵌合された石英坩堝13b とか
ら構成されている。坩堝13は、図示しない昇降・回転機
構に接続された支持軸18に連結されて支持されており、
昇降および回転が可能なようになっている。坩堝13の外
側には、坩堝13と同心円筒状であるヒータ14が配設され
ている。またシードチャックにてその先端に種結晶16a
を脱着することが可能な引き上げ軸(ワイヤ)16が坩堝
13の中央上方に臨ませてある。引き上げ軸16も図示しな
い昇降・回転機構に連結されており、昇降、及び支持軸
18と同一軸心で支持軸18と同方向,逆方向の回転が可能
なようになしてある。
2. Description of the Related Art There are various crystal growth methods,
One of them is the Czochralski method (CZ method). Figure 7
FIG. 3 is a schematic vertical cross-sectional view showing a crystal pulling apparatus used for the CZ method. In the figure, 11 is a chamber having a cylindrical shape with a bottom, and a pull chamber having a smaller diameter than the chamber 11 is provided above it.
12 are connected at the same axis. A crucible 13 is disposed in the chamber 11, and the crucible 13 is composed of a graphite crucible 13a having a bottomed cylindrical shape and a quartz crucible 13b fitted inside the graphite crucible 13a. The crucible 13 is connected to and supported by a support shaft 18 connected to a lifting / rotating mechanism (not shown).
It can be raised and lowered and rotated. A heater 14 having a cylindrical shape concentric with the crucible 13 is disposed outside the crucible 13. In addition, a seed crystal 16a was attached to the tip of the seed chuck.
The lifting shaft (wire) 16 that can be attached and detached is a crucible
It is located above the center of 13. The lifting shaft 16 is also connected to an elevating / rotating mechanism (not shown) to elevate and lower the supporting shaft.
It has the same shaft center as 18 and can rotate in the same direction as the support shaft 18 but in the opposite direction.

【0003】結晶成長を行う場合は、まず坩堝13に結晶
用原料であるシリコン(Si)を充填し、坩堝13を所定方
向へ所定回転数にて回転させながら結晶用原料をヒータ
14にて加熱溶融する。そして図示しない真空ポンプにて
炉内の圧力を低圧に保持し、プルチャンバ12からチャン
バ11へ不活性ガスを導入する。また引き上げ軸16の先端
に種結晶16a を取り付け、種結晶16a を溶融液15に一旦
接触するまで降下させた後、坩堝13とは逆方向に回転さ
せながら上方へ引き上げる。そうすると種結晶16a の下
端に接触している溶融液15が凝固してSi単結晶17を成長
させることができる。
When performing crystal growth, first, the crucible 13 is filled with silicon (Si) which is a raw material for crystal, and the raw material for crystal is heated by rotating the crucible 13 in a predetermined direction at a predetermined rotational speed.
Heat and melt at 14. Then, the pressure inside the furnace is kept low by a vacuum pump (not shown), and an inert gas is introduced from the pull chamber 12 into the chamber 11. Further, a seed crystal 16a is attached to the tip of the pulling shaft 16, the seed crystal 16a is lowered until it comes into contact with the melt 15, and then the seed crystal 16a is pulled upward while rotating in the opposite direction to the crucible 13. Then, the melt 15 in contact with the lower end of the seed crystal 16a is solidified and the Si single crystal 17 can be grown.

【0004】CZ法にてSi単結晶17を引き上げる場合、
溶融液15からSiO が蒸発し、ヒータ14, 黒鉛坩堝13a 等
の黒鉛製部品にSiO が付着する。そうすると付着したSi
O と黒鉛とが反応してこれら部品の劣化を引き起こす。
また付着したSiO は引き上げ終了時に除去されるが、こ
のときに黒鉛製部品が磨耗してやはり部品が劣化する。
このような黒鉛製部品の劣化により、例えば炉内雰囲気
中の黒鉛濃度が高くなる等、炉内の雰囲気が悪化する。
これによりSi単結晶17中の不純物濃度が上昇したり、無
転位のSi単結晶17が得られる率が低下したりする。また
黒鉛製のヒータ14が劣化すると、発熱量分布に変化が生
じる。さらにヒータ14及び黒鉛坩堝13aの劣化により溶
融液15への入熱量が変化し、Si単結晶17中の初期酸素濃
度にばらつきが生じる等、規格外れの製品が発生する。
When pulling the Si single crystal 17 by the CZ method,
SiO 2 is evaporated from the melt 15 and adheres to graphite parts such as the heater 14 and the graphite crucible 13a. Then the attached Si
O and graphite react to cause deterioration of these parts.
Further, the adhered SiO is removed at the end of pulling up, but at this time, the graphite parts are worn and the parts are also deteriorated.
Due to such deterioration of the graphite part, the atmosphere in the furnace is deteriorated, for example, the graphite concentration in the atmosphere in the furnace is increased.
As a result, the impurity concentration in the Si single crystal 17 increases, or the rate at which the dislocation-free Si single crystal 17 is obtained decreases. Also, when the graphite heater 14 deteriorates, the calorific value distribution changes. Further, due to deterioration of the heater 14 and the graphite crucible 13a, the amount of heat input to the melt 15 is changed, and the initial oxygen concentration in the Si single crystal 17 is varied, resulting in non-standard products.

【0005】黒鉛製以外の部品においても、SiO の付着
により熱の反射率が経時的に変化(低下)し、ウェーハ
とした場合の酸化膜耐圧における良品率が低下すること
がある。また操業パラメータである、原料が全て溶融し
てから引き上げ開始までの時間(以下延引時間と称す
る)がトラブル等により長くなると、融液の汚染度が上
がるので、無転位結晶の引き上げ率が低下する。
Even in parts other than those made of graphite, the heat reflectance may change (decrease) over time due to the adhesion of SiO 2, and the yield rate of the oxide film in the case of a wafer may decrease. In addition, if the time from the start of melting all the raw materials until the start of pulling (hereinafter referred to as the pulling time), which is an operating parameter, becomes long due to a trouble or the like, the contamination degree of the melt increases, and thus the pulling rate of dislocation-free crystals decreases .

【0006】そこで黒鉛製部品の寿命を延ばすための従
来装置として、炉内部品にSiO が付着しないように、不
活性ガス導入部から離隔し且つ引き上げ室(チャンバ)
上部である位置に不活性ガス排気部を備えたシリコン単
結晶引き上げ装置が特開平6-16491号公報に開示されて
いる。また特開昭58−172292号公報には、前述したSiO
と黒鉛との反応を抑制するために、SiC をコーティング
した黒鉛発熱体が開示されている。
Therefore, as a conventional device for extending the life of graphite parts, a chamber for separating from the inert gas introduction part and a pull-up chamber (chamber) is provided so that SiO 2 does not adhere to the parts in the furnace.
Japanese Unexamined Patent Publication (Kokai) No. 6-16491 discloses a silicon single crystal pulling apparatus provided with an inert gas exhaust portion at the upper position. Further, JP-A-58-172292 discloses that the above-mentioned SiO
A graphite heating element coated with SiC in order to suppress the reaction between graphite and graphite is disclosed.

【0007】[0007]

【発明が解決しようとする課題】しかしながらこれら従
来装置では、部品の寿命延長を目的としているが、寿命
が近づいたときに部品を交換する時期を判定する手段に
ついては言及していない。従って部品の寿命の決定は経
験的な知見による外はなく、必要以上に部品の交換が行
われる可能性がある。さらに部品の品質は徐々に改善さ
れており、その都度部品交換までの期間を見直す必要が
あり、経験的知見のみで部品の寿命を的確に判断するこ
とは非常に困難である。
However, in these conventional devices, the purpose is to extend the service life of the parts, but there is no mention of means for determining the time to replace the parts when the service life approaches. Therefore, the life of a component is determined empirically, and the component may be replaced more than necessary. Further, the quality of parts is gradually improved, and it is necessary to review the period until the parts are replaced each time, and it is very difficult to accurately determine the life of the parts only by empirical knowledge.

【0008】本発明は、斯かる事情に鑑みてなされたも
のであり、操業条件,部品使用回数,累積使用時間等の
管理データと単結晶の品質とにおける関係を定式化する
ことにより、部品の寿命を定量的に把握し、引き上げ単
結晶の品質安定及び規格外品の低減を可能とする単結晶
引き上げ装置における部品管理方法及びその実施に使用
する装置を提供することを目的とする。
The present invention has been made in view of such circumstances, and by formulating the relationship between management data such as operating conditions, the number of times a part is used, and the cumulative use time, and the quality of a single crystal, It is an object of the present invention to provide a component management method for a single crystal pulling apparatus and a device used for carrying out the method, which can grasp the lifespan quantitatively and stabilize the quality of the pulled single crystal and reduce nonstandard products.

【0009】[0009]

【課題を解決するための手段】請求項1,3記載の発明
は、単結晶引き上げ装置の操業条件,部品使用回数,又
は部品使用時間について各部品毎に管理されている管理
データと引き上げ単結晶の品質との関係を求め、前記単
結晶の品質の下限値を設定し、該下限値を下回るときの
前記管理データの限界値を前記関係に基づいて判断し、
前記管理データを各部品毎に管理し、該管理データが前
記限界値に達した場合に、その部品について交換を促す
警告を発することを特徴とする。
According to the first and third aspects of the present invention, the operating data of the single crystal pulling apparatus, the number of times the parts are used, or the time when the parts are used are managed for each part and the pulling single crystal. The relationship between the quality of the single crystal, the lower limit of the quality of the single crystal is set, the limit value of the control data when the lower limit is less than is determined based on the relationship,
The management data is managed for each part, and when the management data reaches the limit value, a warning is issued to prompt replacement of the part.

【0010】部品の寿命管理を定量的に行えるので、部
品の交換時期を的確に把握することが容易になる。これ
により引き上げ単結晶の品質安定及び規格外品の低減が
可能であり、また必要以上に部品の交換が行われる可能
性も低減される。
Since the life management of the parts can be quantitatively performed, it becomes easy to accurately grasp the replacement time of the parts. This makes it possible to stabilize the quality of the pulled single crystal and reduce nonstandard products, and also reduce the possibility of exchanging parts more than necessary.

【0011】請求項2,4記載の発明は、前記管理デー
タと前記単結晶の品質との関係を回帰係数演算にて求め
ることを特徴とする。
The invention according to claims 2 and 4 is characterized in that the relationship between the management data and the quality of the single crystal is obtained by regression coefficient calculation.

【0012】管理データと、単結晶の品質との相関関係
を把握し、部品の寿命を正確に設定することができる。
By grasping the correlation between the control data and the quality of the single crystal, the life of the component can be set accurately.

【0013】[0013]

【発明の実施の形態】以下、本発明をその実施の形態を
示す図面に基づき具体的に説明する。図1は、本発明に
係る部品管理装置を示す模式的ブロック図である。部品
管理装置1は、回帰係数演算部2とアラーム部3とを備
え、複数の単結晶引き上げ装置4に接続されている。回
帰係数演算部2は、入力データに基づいて各部品の寿命
を設定し、アラーム部3へ与える。また各単結晶引き上
げ装置4から得られる、各部品の使用回数及び使用時間
並びに操業条件のデータは、回帰係数演算部2及びアラ
ーム部3へ与えられる。アラーム部3は、単結晶引き上
げ装置4から得られる、各部品の使用回数及び使用時間
のデータが、回帰係数演算部2にて設定された値に達す
ると、その部品が寿命に達したと判断し、その部品につ
いて交換を促すために、ブザーを鳴らす、表示装置に表
示する等の方法により警告する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described below with reference to the drawings showing the embodiments. FIG. 1 is a schematic block diagram showing a component management device according to the present invention. The component management device 1 includes a regression coefficient calculation unit 2 and an alarm unit 3, and is connected to a plurality of single crystal pulling devices 4. The regression coefficient calculation unit 2 sets the life of each component based on the input data and gives it to the alarm unit 3. Further, the number of times of use, the time of use, and the operating condition data of each component obtained from each single crystal pulling apparatus 4 are given to the regression coefficient calculation unit 2 and the alarm unit 3. The alarm unit 3 determines that the part has reached the end of life when the number of times of use and the time of use of each part obtained from the single crystal pulling apparatus 4 reach the values set by the regression coefficient calculation unit 2. However, in order to prompt replacement of the part, a warning is issued by sounding a buzzer, displaying on a display device, or the like.

【0014】図2は、本発明に係る部品管理装置におけ
る部品寿命の管理方法の処理手順を示すフローチャート
である。回帰係数演算部2への入力として、各部品使用
回数,各部品累積使用時間,各部品品質データ,各装置
操業パラメータ,単結晶品質下限値,及び多重回帰パラ
メータを与えておく(ステップS1)。引き上げ終了後
毎に、各引き上げ単結晶装置4から該当引き上げバッチ
における引き上げ時間が送信される(ステップS2)
と、回帰係数演算部2はその部品累積使用時間にその値
を加算し、また部品使用回数に1を加算する(ステップ
S3)。そしてこれらの値が寿命に達していないことを
確認した(ステップS4)後、このデータが数バッチ分
揃った時点で、回帰係数演算部2は(1) 式に示す係数行
列Ai (i=0,1,…)を求める多重回帰を行い(ス
テップS5)、この多重回帰により得られる各要因に関
する回帰係数を多重回帰パラメータとして回帰係数演算
部2へ与える。
FIG. 2 is a flow chart showing a processing procedure of a component life management method in the component management apparatus according to the present invention. The number of times each part is used, the cumulative usage time of each part, each part quality data, each device operation parameter, the single crystal quality lower limit value, and multiple regression parameters are given as inputs to the regression coefficient calculation unit 2 (step S1). After each pulling, the pulling time in the pulling batch is transmitted from each pulling single crystal device 4 (step S2).
Then, the regression coefficient calculation unit 2 adds the value to the component cumulative use time and adds 1 to the component use count (step S3). Then, after confirming that these values have not reached the end of their lives (step S4), at the time when this data has been collected for several batches, the regression coefficient calculation unit 2 calculates the coefficient matrix A i (i = 0, 1, ...) is performed (step S5), and the regression coefficient for each factor obtained by this multiple regression is given to the regression coefficient calculation unit 2 as a multiple regression parameter.

【0015】[0015]

【数1】 [Equation 1]

【0016】またこの多重回帰結果と、予め設定された
その部品の品質下限値とから部品の寿命を推定し、この
寿命のデータをアラーム部3へ出力する。これによりア
ラーム部3の寿命データがセットされ(ステップS
6)、次の送信データを待つ。ステップS4において、
各単結晶引き上げ装置4から得られる部品の使用回数デ
ータ又は使用時間データがこの寿命データに達すると、
アラーム部3はアラームを発生する(ステップS7)。
1つの部品を数炉でローテーションしながら使用する場
合でも、部品の番号を管理することにより、同様の処理
を行うことができる。
The life of the part is estimated from the result of the multiple regression and the preset lower limit of quality of the part, and the data of the life is output to the alarm unit 3. As a result, the life data of the alarm unit 3 is set (step S
6) Wait for the next transmission data. In step S4,
When the number-of-uses data or the usage-time data of the parts obtained from each single crystal pulling device 4 reaches this life data,
The alarm unit 3 issues an alarm (step S7).
Even when one component is used while being rotated in several furnaces, the same process can be performed by managing the component numbers.

【0017】図3は、黒鉛製部品Aの使用回数と、単結
晶の所要全域において無転位で引き上げられる本数率
(以下、無転位引き上げ率という)との関係の多重回帰
結果を示すグラフである。この部品Aでは無転位引き上
げ率は30回程度の使用により3割近く低減していること
が判る。図4は、延引時間と無転位引き上げ率との関係
の多重回帰結果を示すグラフである。延引時間が大きく
なると、無転位引き上げ率が悪化することが判る。図5
は、ヒータ使用回数と単結晶中酸素濃度との関係の多重
回帰結果を示すグラフである。このように単結晶中酸素
濃度はヒータの使用回数が増加するに伴い徐々に低下す
る。図6は、チャンバの使用回数と酸化膜耐圧良品率と
の関係の多重回帰結果を示すグラフである。このように
チャンバの経時変化で酸化膜耐圧良品率は低下する。
FIG. 3 is a graph showing the results of multiple regression of the relationship between the number of times the graphite part A is used and the number ratio of dislocation-free pulling (hereinafter referred to as dislocation-free pulling rate) in the entire required area of the single crystal. . It can be seen that with this part A, the dislocation-free pulling rate has been reduced by nearly 30% by using it about 30 times. FIG. 4 is a graph showing the results of multiple regression of the relationship between the extension time and the dislocation-free pulling rate. It can be seen that the dislocation-free pulling rate deteriorates as the pulling time increases. FIG.
FIG. 4 is a graph showing a multiple regression result of the relationship between the number of times the heater has been used and the oxygen concentration in a single crystal. Thus, the oxygen concentration in the single crystal gradually decreases as the number of times the heater is used increases. FIG. 6 is a graph showing a multiple regression result of the relationship between the number of times the chamber is used and the yield rate of the oxide film withstand voltage. In this way, the rate of non-defective oxide film breakdown voltage decreases with the aging of the chamber.

【0018】[0018]

【発明の効果】以上のように本発明では、操業条件,部
品使用回数,累積使用時間等の管理データと単結晶の品
質とにおける関係を定式化することにより、部品の寿命
を定量的に把握することができるので、引き上げ単結晶
の品質安定及び規格外品の低減が可能であり、また必要
以上に部品交換する可能性も低減される等、本発明は優
れた効果を奏する。
As described above, according to the present invention, the life of a component is quantitatively grasped by formulating the relation between the management data such as the operating condition, the number of times of use of the component, the cumulative use time and the quality of the single crystal. Therefore, it is possible to stabilize the quality of the pulled single crystal, reduce the nonstandard product, and reduce the possibility of exchanging parts more than necessary, and the present invention has excellent effects.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る部品管理装置を示す模式的ブロッ
ク図である。
FIG. 1 is a schematic block diagram showing a component management device according to the present invention.

【図2】本発明に係る部品管理方法の処理手順を示すフ
ローチャートである。
FIG. 2 is a flowchart showing a processing procedure of a component management method according to the present invention.

【図3】黒鉛製部品の使用回数と無転位引き上げ率との
関係の多重回帰結果を示すグラフである。
FIG. 3 is a graph showing a multiple regression result of the relationship between the number of times the graphite part is used and the dislocation-free pulling rate.

【図4】延引時間と無転位引き上げ率との関係の多重回
帰結果を示すグラフである。
FIG. 4 is a graph showing the results of multiple regression of the relationship between extension time and dislocation-free pulling rate.

【図5】ヒータ使用回数と単結晶中酸素濃度との関係の
多重回帰結果を示すグラフである。
FIG. 5 is a graph showing a multiple regression result of the relationship between the number of times the heater is used and the oxygen concentration in a single crystal.

【図6】チャンバの使用回数と酸化膜耐圧良品率との関
係の多重回帰結果を示すグラフである。
FIG. 6 is a graph showing a multiple regression result of the relationship between the number of times the chamber has been used and the yield rate of oxide film non-defective products.

【図7】CZ法に使用される単結晶引き上げ装置を示す
模式的縦断面図である。
FIG. 7 is a schematic vertical sectional view showing a single crystal pulling apparatus used in the CZ method.

【符号の説明】[Explanation of symbols]

1 部品管理装置 2 回帰係数演算部 3 アラーム部 4 単結晶引き上げ装置 1 parts management device 2 regression coefficient calculation unit 3 alarm unit 4 single crystal pulling device

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 単結晶引き上げ装置の操業条件,部品使
用回数,又は部品使用時間について各部品毎に管理され
ている管理データと引き上げ単結晶の品質との関係を求
め、前記単結晶の品質の下限値を設定し、該下限値を下
回るときの前記管理データの限界値を前記関係に基づい
て判断し、前記管理データを各部品毎に管理し、該管理
データが前記限界値に達した場合に、その部品について
交換を促す警告を発することを特徴とする部品管理方
法。
1. A relationship between management data managed for each part and the quality of the pulled single crystal regarding the operating condition of the single crystal pulling apparatus, the number of times of use of the part, or the time of use of the part is obtained, and the quality of the single crystal is calculated. When the lower limit value is set, the limit value of the management data when it falls below the lower limit value is determined based on the relationship, the management data is managed for each component, and the management data reaches the limit value. In addition, a parts management method is characterized in that a warning is issued to prompt replacement of the part.
【請求項2】 前記管理データと前記単結晶の品質との
関係を回帰係数演算にて求めることを特徴とする請求項
1記載の部品管理方法。
2. The part management method according to claim 1, wherein the relationship between the management data and the quality of the single crystal is calculated by regression coefficient calculation.
【請求項3】 単結晶引き上げ装置の操業条件,部品使
用回数,又は部品使用時間について各部品毎に管理され
ている管理データと引き上げ単結晶の品質との関係を予
め求めておき、予め設定された前記単結晶の品質の下限
値を下回るときの前記管理データの限界値を前記関係に
基づいて判断する手段と、前記管理データを各部品毎に
管理する手段と、該管理データが前記限界値に達した場
合に、その部品について交換を促す警告を発する手段と
を備えることを特徴とする部品管理装置。
3. The relationship between the operating data of the single crystal pulling apparatus, the number of times of use of the component, or the time of use of the component, which is managed for each component, and the quality of the pulled single crystal is obtained in advance and set in advance. A means for judging the limit value of the control data when it is below the lower limit value of the quality of the single crystal based on the relation, a means for managing the control data for each part, and the control data is the limit value. And a means for issuing a warning urging replacement of the part when the part management device has reached.
【請求項4】 前記管理データと前記単結晶の品質との
関係を回帰係数演算にて求める回帰係数演算部を備える
ことを特徴とする請求項3記載の部品管理装置。
4. The component management apparatus according to claim 3, further comprising a regression coefficient calculation unit that calculates a relationship between the management data and the quality of the single crystal by a regression coefficient calculation.
JP6690496A 1996-03-22 1996-03-22 Component management method and apparatus for single crystal pulling apparatus Expired - Fee Related JP2959464B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6690496A JP2959464B2 (en) 1996-03-22 1996-03-22 Component management method and apparatus for single crystal pulling apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6690496A JP2959464B2 (en) 1996-03-22 1996-03-22 Component management method and apparatus for single crystal pulling apparatus

Publications (2)

Publication Number Publication Date
JPH09255468A true JPH09255468A (en) 1997-09-30
JP2959464B2 JP2959464B2 (en) 1999-10-06

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Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2959464B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11228286A (en) * 1998-02-13 1999-08-24 Shin Etsu Handotai Co Ltd Production of single crystal
JP2017088462A (en) * 2015-11-13 2017-05-25 株式会社Sumco Method of manufacturing silicon single crystal
JP2019019035A (en) * 2017-07-20 2019-02-07 株式会社Sumco Method for manufacturing silicon single crystal
JP2021187718A (en) * 2020-06-02 2021-12-13 株式会社Sumco Managing method for semiconductor crystal manufacturing apparatus, manufacturing method for semiconductor crystal, and semiconductor crystal manufacture management system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11228286A (en) * 1998-02-13 1999-08-24 Shin Etsu Handotai Co Ltd Production of single crystal
JP2017088462A (en) * 2015-11-13 2017-05-25 株式会社Sumco Method of manufacturing silicon single crystal
JP2019019035A (en) * 2017-07-20 2019-02-07 株式会社Sumco Method for manufacturing silicon single crystal
JP2021187718A (en) * 2020-06-02 2021-12-13 株式会社Sumco Managing method for semiconductor crystal manufacturing apparatus, manufacturing method for semiconductor crystal, and semiconductor crystal manufacture management system

Also Published As

Publication number Publication date
JP2959464B2 (en) 1999-10-06

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