JPH09245331A - Magnetic head - Google Patents
Magnetic headInfo
- Publication number
- JPH09245331A JPH09245331A JP8048774A JP4877496A JPH09245331A JP H09245331 A JPH09245331 A JP H09245331A JP 8048774 A JP8048774 A JP 8048774A JP 4877496 A JP4877496 A JP 4877496A JP H09245331 A JPH09245331 A JP H09245331A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic head
- amorphous carbon
- hard amorphous
- recording medium
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は高密度磁気記憶装置
における、磁気記録媒体の記録、再生に用いる磁気ヘッ
ドに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head used for recording and reproducing on a magnetic recording medium in a high density magnetic storage device.
【０００２】[0002]
【従来の技術】磁気記憶装置はコンピュータの外部記憶
装置として広く用いられており、将来的には動画の記録
再生にも用いられるため、その記録密度は著しく向上し
ている。磁気ヘッドは磁気記憶装置において磁気記録媒
体への信号の書き込み、あるいは書き込まれた信号の再
生をするためのもので、アルミナと炭化チタンからなる
セラミックス（Ａｌ2 Ｏ3 −ＴｉＣ）等の非磁性のスラ
イダに記録と再生のための素子を搭載しており、現在は
半導体製造プロセスを利用した薄膜磁気ヘッド、さらに
は高密度記録に対応するために磁気抵抗効果（ＭＲ）素
子を利用したＭＲヘッドなどが用いられている。2. Description of the Related Art A magnetic storage device is widely used as an external storage device of a computer and will be used for recording and reproducing moving images in the future, so that its recording density has been remarkably improved. The magnetic head is for writing signals to a magnetic recording medium or reproducing the written signals in a magnetic storage device, and is made of a non-magnetic material such as ceramics (Al 2 O 3 —TiC) made of alumina and titanium carbide. A slider is equipped with an element for recording and reproducing, and at present, a thin film magnetic head using a semiconductor manufacturing process, and an MR head using a magnetoresistive effect (MR) element for high density recording. Is used.
【０００３】磁気ヘッドと磁気記録媒体は装置停止中は
接触しており、記録・再生時には磁気記録媒体が高速回
転し、磁気ヘッドは磁気記録媒体に対して一定の間隔で
浮上するという、いわゆるコンタクト・スタート・スト
ップ（ＣＳＳ）動作が繰り返されている。また磁気ヘッ
ドの浮上姿勢を安定にし、常に磁気記録媒体との間隔を
一定に保持するためにスライダには空気浮上面（ＡＢ
Ｓ）が形成されている。したがって磁気記録媒体はＣＳ
Ｓ動作の開始時および停止時においてＡＢＳと接触・摺
動する。さらに磁気ヘッドが浮上中になんらかの擾乱に
よって磁気記録媒体に高速で接触する場合もある。この
ようにして磁気記録媒体は頻繁に磁気ヘッドと接触・摺
動し、磨耗・損傷が発生するため、その表面には厚さ数
十ｎｍの保護膜および数ｎｍの潤滑層が形成されてい
る。The magnetic head and the magnetic recording medium are in contact with each other while the apparatus is stopped, the magnetic recording medium rotates at high speed during recording and reproduction, and the magnetic head floats above the magnetic recording medium at a constant interval. -Start / stop (CSS) operation is repeated. Further, in order to stabilize the flying posture of the magnetic head and always keep a constant distance from the magnetic recording medium, the slider has an air bearing surface (AB
S) is formed. Therefore, the magnetic recording medium is CS
It contacts / slides with the ABS at the start and stop of the S operation. Further, the magnetic head may come into contact with the magnetic recording medium at high speed due to some disturbance while the magnetic head is flying. In this way, the magnetic recording medium frequently contacts and slides with the magnetic head, and wear and damage occur. Therefore, a protective film having a thickness of several tens nm and a lubricating layer having a thickness of several nm are formed on the surface thereof. .
【０００４】さらに最近では磁気ヘッドのＡＢＳにも保
護膜を設け、耐磨耗性を向上させるといった提案がなさ
れている。従来技術について図２を用いて説明する。た
とえば特開平４−３６４２１７号公報においては、セラ
ミック材料からなるスライダ１の一方の面には、隆起し
てレール状に延びる一対の空気浮上面３が形成され、空
気浮上面３の前端一定領域には所定の傾斜角を有するチ
ャンファ５が形成され、相対する磁気ディスク板が回転
したときにスライダ１に浮上量を与えるようになってい
る。また、空気浮上面３の後端の側面には、磁気記録の
検出素子２が空気浮上面３に露出するように配置されて
いる。空気浮上面３上に珪素（Ｓｉ）６とアモルファス
水素添加炭素７とからなる１２５オングストローム程度
の膜厚の保護膜を設けている。この場合のＳｉ層６はス
ライダ１とアモルファス水素添加炭素７との密着層とし
ての役割があり、これはスライダ材料であるＡｌ2 Ｏ3
−ＴｉＣとアモルファス水素添加炭素との密着力が小さ
く、僅かな力によって容易に剥離してしまうためであ
る。またアモルファス水素添加炭素は耐磨耗性、潤滑性
に優れることが知られており、磁気記録媒体を機械的損
傷から保護するために設けるものである。More recently, it has been proposed to provide a protective film on the ABS of the magnetic head to improve the abrasion resistance. A conventional technique will be described with reference to FIG. For example, in Japanese Unexamined Patent Application Publication No. 4-364217, a pair of air-bearing surfaces 3 that are raised and extend like rails are formed on one surface of a slider 1 made of a ceramic material, and the front end of the air-bearing surface 3 has a fixed area. A chamfer 5 having a predetermined inclination angle is formed so as to give a flying height to the slider 1 when the opposing magnetic disk plates rotate. A magnetic recording detection element 2 is arranged on the side surface of the rear end of the air-bearing surface 3 so as to be exposed on the air-bearing surface 3. A protective film made of silicon (Si) 6 and amorphous hydrogenated carbon 7 and having a thickness of about 125 Å is provided on the air bearing surface 3. In this case, the Si layer 6 has a role as an adhesion layer between the slider 1 and the amorphous hydrogenated carbon 7, which is Al 2 O 3 which is a slider material.
This is because the adhesion between -TiC and amorphous hydrogenated carbon is small, and it is easily peeled off by a slight force. Amorphous hydrogenated carbon is known to have excellent wear resistance and lubricity, and is provided to protect the magnetic recording medium from mechanical damage.
【０００５】磁気記憶装置における記録密度の向上の為
には、記録・再生時の磁気ヘッドと磁気記録媒体の間の
距離、すなわち浮上量の低減は必須の技術であり、将来
は２０ｎｍ以下の浮上量が要求されている。このため磁
気ヘッド保護膜の膜厚に対してもさらに薄膜化が必須で
あり、その膜厚としては１０ｎｍ以下、望ましくは５ｎ
ｍ以下が要求されている。In order to improve the recording density in a magnetic storage device, it is an essential technique to reduce the distance between the magnetic head and the magnetic recording medium at the time of recording / reproducing, that is, the flying height. In the future, the flying height will be 20 nm or less. Quantity is required. For this reason, it is indispensable to further reduce the thickness of the magnetic head protective film, and the thickness is 10 nm or less, preferably 5 n.
m or less is required.
【０００６】[0006]
【発明が解決しようとする課題】しかしながら、従来の
密着層と炭素膜といった２層構造の場合、保護膜の厚さ
に対する炭素系膜の実質的な厚さが中間層の厚さの分だ
け減じられているため、１０ｎｍ以下の膜厚になると本
来磁気記録媒体を保護するための炭素系膜はきわめて薄
くなり、耐磨耗性が失われる。また、炭素系膜の厚さを
維持するために、中間層の厚さを減らすことで保護膜の
薄化を行うと、保護膜のスライダとの密着力が低下し外
力によって剥離し易くなる。そのため、従来技術による
磁気ヘッドでは保護膜の極薄化は困難であり、高密度磁
気記録に要求される磁気記録媒体との狭ギャップ化を十
分に行うことができない。また、従来技術では中間層を
形成する工程が必要なため磁気ヘッド形成の工程が複雑
になる。However, in the case of the conventional two-layer structure including the adhesion layer and the carbon film, the substantial thickness of the carbon-based film relative to the thickness of the protective film is reduced by the thickness of the intermediate layer. Therefore, when the film thickness is 10 nm or less, the carbon-based film originally intended to protect the magnetic recording medium becomes extremely thin and wear resistance is lost. Further, if the thickness of the intermediate layer is reduced to reduce the thickness of the protective film in order to maintain the thickness of the carbon-based film, the adhesion of the protective film to the slider is reduced, and the protective film is easily peeled off by an external force. Therefore, it is difficult for the conventional magnetic head to make the protective film extremely thin, and it is not possible to sufficiently narrow the gap with the magnetic recording medium required for high-density magnetic recording. Further, in the conventional technique, the step of forming the intermediate layer is required, and thus the step of forming the magnetic head becomes complicated.
【０００７】本発明の目的は、中間層を設けることなし
に密着力が高く耐摺動性に優れた極薄の保護膜を摺動面
に有することで、磁気記録媒体とのギャップを狭くし、
超高密度磁気記憶装置に対応できる磁気ヘッドを提供す
ることにある。An object of the present invention is to provide a very thin protective film having high adhesion and excellent sliding resistance on the sliding surface without providing an intermediate layer, thereby narrowing the gap with the magnetic recording medium. ,
An object of the present invention is to provide a magnetic head that can be applied to an ultra high density magnetic storage device.
【０００８】[0008]
【課題を解決するための手段】本発明は、スライダ上に
硬質非晶質炭素膜からなる保護膜を設けることを特徴と
する磁気ヘッドにおいて、硬質非晶質炭素膜が水素を含
有し、かつ炭素と容易に結合する元素、もしくは炭素中
に容易に拡散しかつスライダ材料中の非金属元素と容易
に結合する元素を含有していることを特徴としている。According to the present invention, in a magnetic head characterized in that a protective film made of a hard amorphous carbon film is provided on a slider, the hard amorphous carbon film contains hydrogen, and It is characterized by containing an element that easily bonds with carbon or an element that easily diffuses into carbon and easily bonds with a non-metal element in the slider material.
【０００９】ここで、上記の硬質非晶質炭素膜に含まれ
る水素は全元素に対して１０原子％以上３０原子％以下
であることが望ましく、元素は炭素に対して１原子％以
上１０原子％以下であることが望ましい。さらに、硬質
非晶質炭素膜からなる保護膜は、磁気ヘッドと磁気記録
媒体間が狭ギャップ化され、かつ耐摺動性が得られるよ
う、厚さ１ｎｍ以上３０ｎｍ以下、望ましくは１０ｎｍ
以下である。Here, the hydrogen contained in the hard amorphous carbon film is preferably 10 atom% or more and 30 atom% or less with respect to all elements, and the element is 1 atom% or more and 10 atom% with respect to carbon. % Or less is desirable. Further, the protective film made of a hard amorphous carbon film has a thickness of 1 nm or more and 30 nm or less, preferably 10 nm so that a gap between the magnetic head and the magnetic recording medium is narrowed and sliding resistance is obtained.
It is as follows.
【００１０】水素を硬質非晶質炭素膜に含有させると、
膜中の炭素原子のダングリングボンドが水素で終端さ
れ、膜の硬度が向上し耐磨耗性および摺動性が向上す
る。When hydrogen is contained in the hard amorphous carbon film,
The dangling bonds of carbon atoms in the film are terminated with hydrogen, and the hardness of the film is improved and the wear resistance and slidability are improved.
【００１１】炭素中に容易に拡散する元素としてはＳｉ
が挙げられる。Ｓｉは炭素とＳｉ−Ｃ結合を形成するの
で、硬質非晶質炭素膜にＳｉを含有させると、炭素原子
と化学結合して炭素原子のネットワークに取り込まれ
る。さらに、Ｓｉは酸素や金属元素とも反応しやすいの
で、硬質非晶質炭素膜とスライダの界面ではＳｉがスラ
イダ材料として酸化物を用いた場合にはスライダ材料中
の酸素や金属元素と化学結合する。そのため、硬質非晶
質炭素膜はＳｉを含有することによってスライダと強固
に付着するようになる。Si is an element that easily diffuses into carbon.
Is mentioned. Since Si forms a Si—C bond with carbon, when Si is contained in the hard amorphous carbon film, it is chemically bonded to the carbon atom and is incorporated into the network of carbon atoms. Furthermore, since Si easily reacts with oxygen and metal elements, Si chemically bonds with oxygen and metal elements in the slider material at the interface between the hard amorphous carbon film and the slider when oxide is used as the slider material. . Therefore, the hard amorphous carbon film will firmly adhere to the slider by containing Si.
【００１２】また、炭素中に容易に拡散しかつスライダ
材料中の非金属元素と容易に結合する元素としては、ス
ライダの材料によって種々選択されるが、例えば、鉄
（Ｆｅ）、アルミニウム（Ａｌ）はＳｉと比べて炭素と
の反応性は低いが炭素中に拡散しやすく、硬質非晶質炭
素膜中に容易に取り込まれる。また、Ｆｅ、Ａｌの酸化
物の標準生成エンタルピーは室温で−１０００ｋＪ／ｍ
ｏｌ〜−１７００ｋＪ／ｍｏｌ程度と大きいので、Ｆ
ｅ、Ａｌは酸素と反応しやすい。そのため、硬質非晶質
炭素膜中のＦｅ、Ａｌはスライダとして酸化物を使用す
ると、酸素原子と化学結合し、その結果、Ｆｅ、Ａｌを
含有する硬質非晶質炭素膜はスライダに強固に付着する
ようになる。以上のような性質を有する元素を含有する
硬質非晶質炭素膜はスライダと強固に付着するので、密
着のための中間層を設ける必要がない。使用するスライ
ダ材料によって効果のある添加元素を表１に示す。The element that easily diffuses in carbon and easily combines with the non-metal element in the slider material is selected variously depending on the material of the slider. For example, iron (Fe), aluminum (Al) Has a lower reactivity with carbon than Si, but easily diffuses into carbon and is easily incorporated into the hard amorphous carbon film. The standard enthalpy of formation of Fe and Al oxides is -1000 kJ / m at room temperature.
Since it is as large as about ol to −1700 kJ / mol, F
e and Al easily react with oxygen. Therefore, Fe and Al in the hard amorphous carbon film chemically bond with oxygen atoms when an oxide is used as the slider, and as a result, the hard amorphous carbon film containing Fe and Al firmly adheres to the slider. Come to do. Since the hard amorphous carbon film containing the elements having the above-mentioned properties adheres strongly to the slider, it is not necessary to provide an intermediate layer for adhesion. Table 1 shows additional elements effective depending on the slider material used.
【００１３】[0013]
【表１】 なお、使用する基板としてはＴｉＮのような良導体はヘ
ッド基板には不適である。[Table 1] As a substrate to be used, a good conductor such as TiN is not suitable for the head substrate.
【００１４】本発明による磁気ヘッドはこのように高硬
度でスライダとの密着力が強い硬質非晶質炭素膜から成
る極薄化された保護膜を有するので、磁気記録媒体との
ギャップを小さくして用いることができる。Since the magnetic head according to the present invention has an extremely thin protective film made of a hard amorphous carbon film having such a high hardness and a strong adhesion to the slider, the gap with the magnetic recording medium is reduced. Can be used.
【００１５】[0015]
【発明の実施の形態】発明の実施の形態について磁気ヘ
ッドの斜視図である図１を用いて説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the invention will be described with reference to FIG. 1 which is a perspective view of a magnetic head.
【００１６】Ａｌ2 Ｏ3 −ＴｉＣ焼結体を用いたスライ
ダ１の空気浮上面３上に、硬質非晶質炭素膜４をグラフ
ァイトを高周波（ｒｆ）マグネトロンスパッタ法でスパ
ッタリングして形成した。スパッタリングガスにはアル
ゴンガスと水素ガスの混合ガスを用い、 Ｓｉ、Ｆｅ、
Ａｌを硬質非晶質炭素膜４に含有させるために、グラフ
ァイトターゲット上にそれぞれのペレットを設置してグ
ラファイトと同時にスパッタリングした。硬質非晶質炭
素膜４の厚さは膜の形成時間によって制御した。A hard amorphous carbon film 4 was formed on the air bearing surface 3 of the slider 1 using an Al 2 O 3 -TiC sintered body by sputtering graphite with a high frequency (rf) magnetron sputtering method. As a sputtering gas, a mixed gas of argon gas and hydrogen gas is used, and Si, Fe,
In order to contain Al in the hard amorphous carbon film 4, each pellet was placed on a graphite target and simultaneously sputtered with graphite. The thickness of the hard amorphous carbon film 4 was controlled by the film formation time.
【００１７】このようにして形成した硬質非晶質炭素膜
４に含まれる水素量は、水素前方散乱とラザフォード後
方散乱による分析の結果、アルゴンガスと水素ガスの混
合比によって、膜の全元素に対して最大４０原子％の水
素を含むことが確認された。また、オージェ電子分光法
による分析の結果、硬質非晶質炭素膜４が含有するＳ
ｉ、Ｆｅ、Ａｌの量は炭素ターゲット上に設置するペレ
ットの数と大きさによって制御されることが確認され
た。The amount of hydrogen contained in the hard amorphous carbon film 4 thus formed was determined by hydrogen forward scattering and Rutherford back scattering. On the other hand, it was confirmed that it contained a maximum of 40 atomic% hydrogen. In addition, as a result of analysis by Auger electron spectroscopy, S contained in the hard amorphous carbon film 4 is
It was confirmed that the amounts of i, Fe, and Al were controlled by the number and size of pellets placed on the carbon target.
【００１８】硬質非晶質炭素膜からなる保護膜の耐磨耗
性および潤滑性の、水素、Ｓｉ、Ｆｅ、Ａｌ含有量によ
る変化を密着力測定およびコンタクトスタートストップ
（ＣＳＳ）サイクルを繰り返しながら摩擦係数μを測定
するＣＳＳ−μ試験法によって評価した。ここでは、Ｃ
ＳＳ−μ試験には直径３．５インチの磁気記録媒体を用
い、磁気記録媒体にかかる磁気ヘッドの接触荷重を８
ｇ、磁気記録媒体の回転数を毎分３６００回転とした。The abrasion resistance and lubricity of the protective film made of a hard amorphous carbon film are changed by the contents of hydrogen, Si, Fe and Al, and the friction is measured by repeating the adhesion force measurement and the contact start stop (CSS) cycle. It was evaluated by the CSS-μ test method, which measures the coefficient μ. Here, C
A 3.5 inch diameter magnetic recording medium was used for the SS-μ test, and the contact load of the magnetic head on the magnetic recording medium was 8
g, the number of rotations of the magnetic recording medium was 3600 rpm.
【００１９】図３に、水素を含まず、Ｓｉを５原子％含
有した厚さ５ｎｍの硬質非晶質炭素膜を磁気ヘッドの空
気浮上面の保護膜としたときの、ＣＳＳサイクルによる
磁気ヘッドと磁気記録媒体間の摩擦係数の変化を示す。
ＣＳＳ回数２万回後には摩擦係数は試験開始時の２倍以
上になっている。試験後に、試料表面を金属顕微鏡で観
察すると、磁気記録媒体と磁気ヘッドの両方に磨耗痕な
いしは剥離痕が認められた。図４に、水素を２０原子
％、Ｓｉを５原子％含有した厚さ５ｎｍの硬質非晶質炭
素膜を磁気ヘッドの空気浮上面の保護膜としたときの、
ＣＳＳサイクルによる磁気ヘッドと磁気記録媒体間の摩
擦係数の変化を示す。ＣＳＳ２万回後の摩擦係数は試験
開始時と同程度である。試験後に試料表面を観察した結
果、磁気ヘッド、磁気記録媒体ともに損傷は認められな
かった。硬質非晶質炭素膜に含有される水素とＳｉ、Ｆ
ｅ、Ａｌの量を変えた試料についてＣＳＳによる摩擦係
数の増大量と磁気ヘッドや磁気記録媒体の損傷の関係を
調べたところ、ＣＳＳ２万回後の摩擦係数がＣＳＳ開始
時の１．５倍以下の試料では磁気ヘッドや磁気記録媒体
に損傷がみられなかったが、ＣＳＳ２万回後の摩擦係数
がＣＳＳ開始時の１．５倍以上の試料では損傷が生じ
た。このことから、摩擦係数の変化から膜の耐摺動性が
判断でき、ＣＳＳ２万回後の摩擦係数がＣＳＳ開始時の
１．５倍以下の硬質非晶質炭素膜が耐摺動性に優れてい
ると判断される。FIG. 3 shows a magnetic head by CSS cycle when a hard amorphous carbon film having a thickness of 5 nm containing 5 atomic% of Si containing no hydrogen was used as a protective film for the air bearing surface of the magnetic head. 4 shows changes in the friction coefficient between magnetic recording media.
After 20,000 CSS cycles, the friction coefficient is more than double that at the start of the test. After the test, when the surface of the sample was observed with a metallurgical microscope, abrasion marks or peeling marks were found on both the magnetic recording medium and the magnetic head. FIG. 4 shows a case where a hard amorphous carbon film having a thickness of 5 nm and containing 20 atomic% of hydrogen and 5 atomic% of Si was used as a protective film on the air bearing surface of a magnetic head.
4 shows changes in the friction coefficient between the magnetic head and the magnetic recording medium due to the CSS cycle. The friction coefficient after CSS 20,000 times is about the same as at the start of the test. As a result of observing the surface of the sample after the test, no damage was found on either the magnetic head or the magnetic recording medium. Hydrogen and Si, F contained in the hard amorphous carbon film
The relationship between the increase in the friction coefficient due to CSS and the damage to the magnetic head and the magnetic recording medium was examined for samples with different amounts of e and Al. The friction coefficient after CSS 20,000 times was 1.5 times or less than that at the start of CSS. No damage was observed in the magnetic head and the magnetic recording medium in the sample No. 1, but the sample in which the friction coefficient after CSS 20,000 times was 1.5 times or more that at the start of CSS was damaged. From this, the sliding resistance of the film can be judged from the change in the friction coefficient, and a hard amorphous carbon film having a friction coefficient of 1.5 times or less after CSS 20,000 times is excellent in sliding resistance. It is determined that
【００２０】図５にＳｉを５原子％含む厚さ５ｎｍの硬
質非晶質炭素膜の水素含有量を変えたときの、磁気ヘッ
ドと磁気記録媒体の摩擦係数のＣＳＳ試験による変化を
示す。摩擦係数の変化は、ＣＳＳ２万回後の摩擦係数と
試験開始時の摩擦係数の比（試験後の摩擦係数を試験開
始時の摩擦係数で除した値）で表してある。水素を含有
させるとＣＣＳ試験による摩擦係数の変化が小さくな
り、水素含有量が１０原子％以上３０原子％以下の範囲
でＣＳＳ２万回後の摩擦係数はＣＳＳ試験開始時の１．
５倍以下となる。FIG. 5 shows the change in friction coefficient between the magnetic head and the magnetic recording medium by the CSS test when the hydrogen content of the hard amorphous carbon film of 5 nm thick containing 5 atomic% of Si was changed. The change in the friction coefficient is represented by the ratio of the friction coefficient after CSS 20,000 times and the friction coefficient at the start of the test (a value obtained by dividing the friction coefficient after the test by the friction coefficient at the start of the test). When hydrogen is contained, the change in the friction coefficient by the CCS test becomes small, and when the hydrogen content is in the range of 10 atom% or more and 30 atom% or less, the friction coefficient after CSS 20,000 times is 1.
It will be 5 times or less.
【００２１】図６に水素を２０原子％含む厚さ５ｎｍの
硬質非晶質炭素膜にＳｉを含有させたときの、磁気ヘッ
ドと磁気記録媒体の摩擦係数のＣＳＳ試験による変化を
示す。摩擦係数の変化は、ＣＳＳ２万回後の摩擦係数と
試験開始時の摩擦係数の比（試験後の摩擦係数を試験開
始時の摩擦係数で除した値）で表してある。Ｓｉを含有
させるとＣＳＳ試験による摩擦係数の変化は小さくな
り、Ｓｉ含有量が１原子％以上１０原子％以下でＣＳＳ
２万回後の摩擦係数はＣＳＳ試験開始時の１．５倍より
も小さい。金属元素がＦｅ、Ａｌの場合にもＳｉを含有
させたときと同様に、その含有量が１原子％以上１０原
子％以下のときＣＳＳ２万回後の摩擦係数はＣＳＳ開始
時の１．５倍よりも小さくなる。FIG. 6 shows a change in the friction coefficient between the magnetic head and the magnetic recording medium by the CSS test when Si is contained in a hard amorphous carbon film having a thickness of 5 nm and containing 20 atomic% of hydrogen. The change in the friction coefficient is represented by the ratio of the friction coefficient after CSS 20,000 times and the friction coefficient at the start of the test (a value obtained by dividing the friction coefficient after the test by the friction coefficient at the start of the test). When Si is included, the change in the friction coefficient by the CSS test becomes small, and when the Si content is 1 atom% or more and 10 atom% or less, the CSS
The friction coefficient after 20,000 times is smaller than 1.5 times that at the start of the CSS test. Even when the metal elements are Fe and Al, the friction coefficient after CSS 20,000 times is 1.5 times that at the start of CSS when the content is 1 atom% or more and 10 atom% or less, as in the case of containing Si. Will be smaller than.
【００２２】以上から、硬質非晶質炭素膜が含有する水
素は１０原子％以上３０原子％以下、Ｓｉ、Ｆｅ、Ａｌ
は１原子％以上１０原子％以下が望ましい。From the above, hydrogen contained in the hard amorphous carbon film is 10 atomic% or more and 30 atomic% or less, Si, Fe, Al.
Is preferably 1 atom% or more and 10 atom% or less.
【００２３】[0023]
【実施例】磁気ヘッドの保護膜の厚さを５ｎｍとしたと
きの、保護膜の磁気ヘッドへの密着力とＣＳＳ試験によ
る評価結果を表２に示す。ＣＳＳ試験の判定は、摩擦係
数がＣＳＳ２万回によってＣＳＳ開始時の１．５倍以上
になった試料を不合格とした。ＣＳＳ試験後の顕微鏡観
察から、不合格となった比較例１、比較例２の磁気ヘッ
ドでは保護膜に傷が、比較例３、比較例５、比較例７の
磁気ヘッドでは保護膜の剥離が、比較例４、比較例６、
比較例８の磁気ヘッドでは粉状の生成物が確認された。EXAMPLES Table 2 shows the adhesion of the protective film to the magnetic head and the evaluation results of the CSS test when the thickness of the protective film of the magnetic head was 5 nm. In the judgment of the CSS test, a sample having a friction coefficient of 20,000 times or more, which is 1.5 times or more of that at the start of CSS, was rejected. From the microscopic observation after the CSS test, the magnetic heads of Comparative Example 1 and Comparative Example 2 which failed were scratched on the protective film, and the magnetic heads of Comparative Example 3, Comparative Example 5 and Comparative Example 7 were peeled off. Comparative Example 4, Comparative Example 6,
In the magnetic head of Comparative Example 8, powdery products were confirmed.
【００２４】ここでは、空気浮上面の保護膜としての硬
質非晶質炭素膜の厚さを５ｎｍとしたが、厚さを１ｎｍ
まで薄くした場合にも同様の結果が得られた。また、２
種以上の金属元素を組み合わせた場合にも添加金属が１
種類の場合と同様の結果が得られた。Here, the thickness of the hard amorphous carbon film as the protective film on the air bearing surface is set to 5 nm, but the thickness is 1 nm.
Similar results were obtained when the thickness was reduced to. Also, 2
Even when combining more than one kind of metal element, the added metal is 1
Similar results were obtained as for the type.
【００２５】[0025]
【表２】 [Table 2]
【００２６】[0026]
【発明の効果】以上説明したように、本発明による磁気
ヘッドは、中間層を設けなくとも優れた耐摺動性を示す
保護膜を有する。したがって、中間層を設ける場合と比
べて保護膜を薄くすることができ、磁気記録媒体との間
を狭くして使用することができる。As described above, the magnetic head according to the present invention has the protective film exhibiting excellent sliding resistance without providing the intermediate layer. Therefore, the protective film can be thinner than in the case where the intermediate layer is provided, and the space between the protective film and the magnetic recording medium can be narrowed for use.
【図１】本発明による磁気ヘッド保護膜の斜視図であ
る。FIG. 1 is a perspective view of a magnetic head protection film according to the present invention.
【図２】従来技術による磁気ヘッド保護膜の斜視図であ
る。FIG. 2 is a perspective view of a magnetic head protection film according to a conventional technique.
【図３】水素を含まず、Ｓｉを５原子％含有した厚さ５
ｎｍの硬質非晶質炭素膜を磁気ヘッド保護膜としたとき
の、ＣＳＳサイクルによる磁気ヘッドと磁気記録媒体間
の摩擦係数の変化を示す図である。FIG. 3 is a thickness 5 that does not contain hydrogen and contains 5 atomic% of Si.
FIG. 6 is a diagram showing a change in friction coefficient between a magnetic head and a magnetic recording medium due to a CSS cycle when a hard amorphous carbon film of nm is used as a magnetic head protective film.
【図４】水素を２０原子％、Ｓｉを５原子％含有した厚
さ５ｎｍの硬質非晶質炭素膜を磁気ヘッド保護膜とした
ときの、ＣＳＳサイクルによる磁気ヘッドと磁気記録媒
体間の摩擦係数の変化を示す図である。FIG. 4 is a friction coefficient between a magnetic head and a magnetic recording medium by a CSS cycle when a hard amorphous carbon film having a thickness of 5 nm and containing 20 atomic% of hydrogen and 5 atomic% of Si is used as a magnetic head protective film. It is a figure which shows the change of.
【図５】Ｓｉを５原子％含有した厚さ５ｎｍの硬質非晶
質炭素膜の水素含有量を変えたときの、ＣＳＳ２万回に
よる磁気ヘッドと磁気記録媒体間の摩擦係数の変化量を
示す図である。FIG. 5 shows the amount of change in the friction coefficient between the magnetic head and the magnetic recording medium due to CSS 20,000 times when the hydrogen content of the hard amorphous carbon film having a thickness of 5 nm containing 5 atomic% of Si was changed. It is a figure.
【図６】水素を２０原子％含有した厚さ５ｎｍの硬質非
晶質炭素膜のＳｉ含有量を変えたときの、ＣＳＳ２万回
による磁気ヘッドと磁気記録媒体間の摩擦係数の変化量
を示す図である。FIG. 6 shows the amount of change in the friction coefficient between the magnetic head and the magnetic recording medium due to CSS 20,000 times when the Si content of the hard amorphous carbon film having a thickness of 5 nm and containing 20 atomic% of hydrogen was changed. It is a figure.
１ 磁気ヘッドスライダ ２ 検出素子 ３ 空気浮上面 ４ 硬質非晶質炭素膜 ５ チャンファ ６ 厚さ1〜5nmのSi層 ７ 厚さ25nm以下のアモルファス水素添加炭素 1 magnetic head slider 2 detection element 3 air floating surface 4 hard amorphous carbon film 5 chamfer 6 Si layer with a thickness of 1 to 5 nm 7 amorphous hydrogenated carbon with a thickness of 25 nm or less
Claims (5)
上面上に保護膜を有する磁気ヘッドにおいて、該保護膜
は水素および、炭素と容易に結合する元素を少なくとも
１種以上含有する硬質非晶質炭素から成ることを特徴と
する磁気ヘッド。1. A magnetic head having a protective film on at least an air-bearing surface of a magnetic head slider, wherein the protective film is made of hard amorphous carbon containing hydrogen and at least one element that easily bonds with carbon. A magnetic head characterized by being formed.
上面上に保護膜を有する磁気ヘッドにおいて、該保護膜
は水素と、水素以外の元素を少なくとも１種以上含有す
る硬質非晶質炭素よりなり、前記元素は炭素中に容易に
拡散し、かつスライダ材料中の非金属元素と容易に結合
する性質を有していることを特徴とする磁気ヘッド。2. A magnetic head having a protective film on at least the air bearing surface of a magnetic head slider, wherein the protective film comprises hydrogen and hard amorphous carbon containing at least one element other than hydrogen. A magnetic head characterized in that the element has a property of easily diffusing into carbon and easily binding to a non-metal element in a slider material.
原子％以上３０原子％以下であることを特徴とする請求
項１または２記載の磁気ヘッド。3. The amount of hydrogen contained in the hard amorphous carbon is 10.
The magnetic head according to claim 1 or 2, wherein the content is at least 30 atomic% and at least 30 atomic%.
が炭素に対して１原子％以上１０原子％以下であること
を特徴とする請求項１ないし３のいずれかに記載の磁気
ヘッド。4. The magnetic head according to claim 1, wherein the content of the element contained in the hard amorphous carbon is 1 atom% or more and 10 atom% or less with respect to carbon. .
１ｎｍ以上３０ｎｍ以下であることを特徴とする請求項
１ないし４のいずれかに記載の磁気ヘッド。5. The magnetic head according to claim 1, wherein the protective film made of hard amorphous carbon has a thickness of 1 nm or more and 30 nm or less.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8048774A JP2956570B2 (en) | 1996-03-06 | 1996-03-06 | Magnetic head |
| JP33619598A JP3244068B2 (en) | 1996-03-06 | 1998-11-26 | Magnetic head and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8048774A JP2956570B2 (en) | 1996-03-06 | 1996-03-06 | Magnetic head |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33619598A Division JP3244068B2 (en) | 1996-03-06 | 1998-11-26 | Magnetic head and its production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09245331A true JPH09245331A (en) | 1997-09-19 |
| JP2956570B2 JP2956570B2 (en) | 1999-10-04 |
Family
ID=12812622
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8048774A Expired - Fee Related JP2956570B2 (en) | 1996-03-06 | 1996-03-06 | Magnetic head |
| JP33619598A Expired - Fee Related JP3244068B2 (en) | 1996-03-06 | 1998-11-26 | Magnetic head and its production |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33619598A Expired - Fee Related JP3244068B2 (en) | 1996-03-06 | 1998-11-26 | Magnetic head and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (2) | JP2956570B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001015147A1 (en) * | 1999-08-23 | 2001-03-01 | Sony Corporation | Magnetic recording and reproducing device |
| US6385013B1 (en) | 1998-06-09 | 2002-05-07 | Nec Corporation | Contact type magnetic disc apparatus |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5077293B2 (en) * | 2001-12-17 | 2012-11-21 | 住友電気工業株式会社 | Method for producing amorphous carbon coating and sliding part with amorphous carbon coating |
| JP4360082B2 (en) * | 2001-12-17 | 2009-11-11 | 住友電気工業株式会社 | Method for producing amorphous carbon coating and sliding part with amorphous carbon coating |
-
1996
- 1996-03-06 JP JP8048774A patent/JP2956570B2/en not_active Expired - Fee Related
-
1998
- 1998-11-26 JP JP33619598A patent/JP3244068B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6385013B1 (en) | 1998-06-09 | 2002-05-07 | Nec Corporation | Contact type magnetic disc apparatus |
| US6671129B2 (en) | 1998-06-09 | 2003-12-30 | Nec Corporation | Contact type magnetic disc apparatus |
| WO2001015147A1 (en) * | 1999-08-23 | 2001-03-01 | Sony Corporation | Magnetic recording and reproducing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3244068B2 (en) | 2002-01-07 |
| JPH11224416A (en) | 1999-08-17 |
| JP2956570B2 (en) | 1999-10-04 |
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