JPH09183853A5 - - Google Patents

Info

Publication number
JPH09183853A5
JPH09183853A5 JP1996246766A JP24676696A JPH09183853A5 JP H09183853 A5 JPH09183853 A5 JP H09183853A5 JP 1996246766 A JP1996246766 A JP 1996246766A JP 24676696 A JP24676696 A JP 24676696A JP H09183853 A5 JPH09183853 A5 JP H09183853A5
Authority
JP
Japan
Prior art keywords
group
formula
hydrocarbon groups
monovalent
fluorescent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996246766A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09183853A (ja
Filing date
Publication date
Priority claimed from US08/536,867 external-priority patent/US5583195A/en
Application filed filed Critical
Publication of JPH09183853A publication Critical patent/JPH09183853A/ja
Publication of JPH09183853A5 publication Critical patent/JPH09183853A5/ja
Pending legal-status Critical Current

Links

JP8246766A 1995-09-29 1996-09-19 螢光又は光増感マーカー染料で官能化された光硬化性エポキシシリコーン Pending JPH09183853A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/536867 1995-09-29
US08/536,867 US5583195A (en) 1995-09-29 1995-09-29 Photocurable epoxy silicones functionalized with fluorescent or photosensitizing marker dyes

Publications (2)

Publication Number Publication Date
JPH09183853A JPH09183853A (ja) 1997-07-15
JPH09183853A5 true JPH09183853A5 (https=) 2004-09-30

Family

ID=24140246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8246766A Pending JPH09183853A (ja) 1995-09-29 1996-09-19 螢光又は光増感マーカー染料で官能化された光硬化性エポキシシリコーン

Country Status (5)

Country Link
US (1) US5583195A (https=)
JP (1) JPH09183853A (https=)
DE (1) DE19639313B4 (https=)
FR (1) FR2739385B1 (https=)
GB (1) GB2305671B (https=)

Families Citing this family (21)

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US5998099A (en) * 1996-03-08 1999-12-07 Lucent Technologies Inc. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
US6071585A (en) * 1998-06-30 2000-06-06 Ncr Corporation Printable sheet with removable label and method for producing same
US6232362B1 (en) * 1999-05-04 2001-05-15 General Electric Company Self-sensitized epoxysilicones curable by ultraviolet light and method of synthesis therefor
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
US6268457B1 (en) 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
EP1190277B1 (en) * 1999-06-10 2009-10-07 AlliedSignal Inc. Semiconductor having spin-on-glass anti-reflective coatings for photolithography
EP1099737A1 (en) * 1999-11-12 2001-05-16 General Electric Company Radiation curable silicone composition
US6368400B1 (en) * 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
RU2196149C2 (ru) * 2001-03-30 2003-01-10 Кемеровский государственный университет Способ отверждения высокомолекулярного полидиметилсилоксанового каучука
KR20040075866A (ko) 2001-11-15 2004-08-30 허니웰 인터내셔날 인코포레이티드 포토리소그래피용 스핀-온 무반사 코팅
JP3874108B2 (ja) * 2002-08-13 2007-01-31 信越化学工業株式会社 エポキシ樹脂組成物
RU2229485C1 (ru) * 2002-11-10 2004-05-27 Кемеровский государственный университет Способ получения композиционного материала
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US7517929B2 (en) * 2004-12-03 2009-04-14 Momentive Performance Materials Inc. Star-branched silicone polymers as anti-mist additives for coating applications
US8198389B2 (en) * 2006-05-25 2012-06-12 The University Of Akron Mold release compounds using cycloaliphatic epoxide functionalized polydimethylsiloxane coatings and photo-initiated polymerization
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
CN105295050B (zh) * 2014-06-20 2017-11-21 北京化工大学 一类含硅氧链三芳基硫鎓盐及其在光固化环氧树脂中应用
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドHoneywell International Inc. オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
US11397185B2 (en) 2016-11-11 2022-07-26 National Institute Of Advanced Industrial Science And Technology Method for analyzing protein-containing sample

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US3427273A (en) * 1964-08-10 1969-02-11 Owens Illinois Inc Process for making luminescent organopolysiloxanes and compositions thereof
US3741932A (en) * 1972-04-10 1973-06-26 Minnesota Mining & Mfg Curable epoxy organopolysiloxanes having pendant chromophoric groups
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US4617238A (en) * 1982-04-01 1986-10-14 General Electric Company Vinyloxy-functional organopolysiloxane compositions
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