JPH09139370A5 - - Google Patents

Info

Publication number
JPH09139370A5
JPH09139370A5 JP1996257414A JP25741496A JPH09139370A5 JP H09139370 A5 JPH09139370 A5 JP H09139370A5 JP 1996257414 A JP1996257414 A JP 1996257414A JP 25741496 A JP25741496 A JP 25741496A JP H09139370 A5 JPH09139370 A5 JP H09139370A5
Authority
JP
Japan
Prior art keywords
semiconductor device
manufacturing
layer
activated
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1996257414A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09139370A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP25741496A priority Critical patent/JPH09139370A/ja
Priority claimed from JP25741496A external-priority patent/JPH09139370A/ja
Publication of JPH09139370A publication Critical patent/JPH09139370A/ja
Publication of JPH09139370A5 publication Critical patent/JPH09139370A5/ja
Withdrawn legal-status Critical Current

Links

JP25741496A 1995-09-08 1996-09-06 半導体装置作製方法及び薄膜半導体装置作製方法 Withdrawn JPH09139370A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25741496A JPH09139370A (ja) 1995-09-08 1996-09-06 半導体装置作製方法及び薄膜半導体装置作製方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP7-256968 1995-09-08
JP25696895 1995-09-08
JP26252095 1995-09-16
JP7-262520 1995-09-16
JP25741496A JPH09139370A (ja) 1995-09-08 1996-09-06 半導体装置作製方法及び薄膜半導体装置作製方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2006235031A Division JP4476984B2 (ja) 1995-09-08 2006-08-31 半導体装置の作製方法

Publications (2)

Publication Number Publication Date
JPH09139370A JPH09139370A (ja) 1997-05-27
JPH09139370A5 true JPH09139370A5 (enExample) 2004-09-09

Family

ID=27334581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25741496A Withdrawn JPH09139370A (ja) 1995-09-08 1996-09-06 半導体装置作製方法及び薄膜半導体装置作製方法

Country Status (1)

Country Link
JP (1) JPH09139370A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004349583A (ja) * 2003-05-23 2004-12-09 Sharp Corp トランジスタの製造方法
JP5024765B2 (ja) * 2007-01-30 2012-09-12 株式会社フジクラ 酸化物基板の清浄化方法及び酸化物半導体薄膜の製造方法
JP2008214491A (ja) * 2007-03-05 2008-09-18 Ulvac Japan Ltd 表面処理方法
JP5961391B2 (ja) * 2011-01-26 2016-08-02 株式会社半導体エネルギー研究所 半導体装置の作製方法

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