JPH09134875A - 露光方法及び露光装置 - Google Patents

露光方法及び露光装置

Info

Publication number
JPH09134875A
JPH09134875A JP8229597A JP22959796A JPH09134875A JP H09134875 A JPH09134875 A JP H09134875A JP 8229597 A JP8229597 A JP 8229597A JP 22959796 A JP22959796 A JP 22959796A JP H09134875 A JPH09134875 A JP H09134875A
Authority
JP
Japan
Prior art keywords
exposure
photosensitive material
pattern
enhancing layer
original plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8229597A
Other languages
English (en)
Japanese (ja)
Inventor
Soichi Yamato
壮一 大和
Kazuya Okamoto
和也 岡本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8229597A priority Critical patent/JPH09134875A/ja
Priority to KR1019960038473A priority patent/KR19980017970A/ko
Priority to US08/708,580 priority patent/US5902716A/en
Publication of JPH09134875A publication Critical patent/JPH09134875A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8229597A 1995-05-05 1996-08-30 露光方法及び露光装置 Pending JPH09134875A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8229597A JPH09134875A (ja) 1995-09-05 1996-08-30 露光方法及び露光装置
KR1019960038473A KR19980017970A (ko) 1995-05-05 1996-09-05 노광방법 및 노광장치
US08/708,580 US5902716A (en) 1995-09-05 1996-09-05 Exposure method and apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP7-228399 1995-09-05
JP22839995 1995-09-05
JP8229597A JPH09134875A (ja) 1995-09-05 1996-08-30 露光方法及び露光装置

Publications (1)

Publication Number Publication Date
JPH09134875A true JPH09134875A (ja) 1997-05-20

Family

ID=26528227

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8229597A Pending JPH09134875A (ja) 1995-05-05 1996-08-30 露光方法及び露光装置

Country Status (2)

Country Link
JP (1) JPH09134875A (ko)
KR (1) KR19980017970A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2005017483A1 (ja) * 2003-08-18 2007-10-04 株式会社ニコン 照度分布の評価方法、光学部材の製造方法、照明光学装置、露光装置および露光方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2005017483A1 (ja) * 2003-08-18 2007-10-04 株式会社ニコン 照度分布の評価方法、光学部材の製造方法、照明光学装置、露光装置および露光方法
JP4599632B2 (ja) * 2003-08-18 2010-12-15 株式会社ニコン 照度分布の評価方法、光学部材の製造方法、照度測定装置、露光装置および露光方法

Also Published As

Publication number Publication date
KR19980017970A (ko) 1998-06-05

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