JPH09129818A - Compound semiconductor device provided with buil-in temperature control element - Google Patents

Compound semiconductor device provided with buil-in temperature control element

Info

Publication number
JPH09129818A
JPH09129818A JP7282682A JP28268295A JPH09129818A JP H09129818 A JPH09129818 A JP H09129818A JP 7282682 A JP7282682 A JP 7282682A JP 28268295 A JP28268295 A JP 28268295A JP H09129818 A JPH09129818 A JP H09129818A
Authority
JP
Japan
Prior art keywords
temperature
semiconductor device
compound semiconductor
ptc
semiconductor chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7282682A
Other languages
Japanese (ja)
Inventor
Kazuhiro Takeuchi
一浩 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP7282682A priority Critical patent/JPH09129818A/en
Publication of JPH09129818A publication Critical patent/JPH09129818A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/49105Connecting at different heights
    • H01L2224/49109Connecting at different heights outside the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Thermistors And Varistors (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a compound semiconductor device wherein a chemical compound semiconductor chip is provided, and a current flowing in the chip can be limited, and also thermal runaway and deterioration of characteristics are prevented. SOLUTION: In this device, a lead frame 14 is sandwiched between a semiconductor chip 12 and a PTC (positive temperature coefficient thermistor) 13, which are encapsulated in the same package. When the temperature of the chip 12 rises, the temperature of the PTC 13 also rises. When the temperature of the PTC 13 exceeds a specific temperature which quickly changes the resistance, the PTC resistance value becomes several hundreds times large, so that the resistance value between the compound semiconductor chip 12 and outer electrode terminals becomes large. Hence a current becomes hard to flow in the compound semiconductor chip 12, and its operation is limited, so that deterioration of characteristics and breakdown at the time of high temperature can be prevented.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、温度制御素子を内
蔵した化合物半導体装置に関し、特に、ある一定の温度
を越えると半導体装置の回路電流が増加(熱暴走)する半
導体装置内に、前記温度より若干低い温度で抵抗値が上
昇するPTC(Positive Temperature Coefficient ther
mistor)を取り付けた半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a compound semiconductor device having a temperature control element built therein, and more particularly to a semiconductor device in which a circuit current of the semiconductor device increases (thermal runaway) when a temperature exceeds a certain temperature. PTC (Positive Temperature Coefficient ther) whose resistance value rises at a slightly lower temperature
mistor) is attached to the semiconductor device.

【0002】[0002]

【従来の技術】半導体装置に対する温度制御手段として
は、 ・従来法1:同一パッケ−ジ内に温度センサ−を内蔵
し、その外部出力によって半導体装置の外側から動作制
御する方法(特開平4−102365号公報参照)、 ・従来法2:素子内部に超電導層を付設し、温度上昇と
共に増加する抵抗値によって動作制御を行う方法(特開
平1−281768号公報参照)、 ・従来法3:負の温度係数を持つ素子を合わせて回路構
成することにより、温度係数の低い半導体装置とする方
法(特開平4−11778号公報参照)、 ・従来法4:電源回路内にバイメタル(温度スイッチ)を
内蔵させる方法、が知られている。以下、上記従来法1
〜4について図面を参照して説明する。
2. Description of the Related Art Conventional temperature control means for a semiconductor device is as follows: Conventional method 1: A method in which a temperature sensor is built in the same package and its operation is controlled from the outside of the semiconductor device by its external output (JP-A-4- 102365), Conventional method 2: a method of providing a superconducting layer inside the element and controlling operation by a resistance value that increases with temperature rise (see Japanese Patent Laid-Open No. 1-281768), conventional method 3: negative A method of forming a semiconductor device having a low temperature coefficient by forming a circuit by combining elements having a temperature coefficient of (see Japanese Patent Laid-Open No. 4-11778) .- Conventional method 4: A bimetal (temperature switch) is provided in a power supply circuit. A method of incorporating it is known. Hereinafter, the above-mentioned conventional method 1
4 will be described with reference to the drawings.

【0003】(従来法1)図4は、従来法1を説明する
ための「ダイオ−ドの内部構造を示す斜視図」であり、
このダイオ−ド41は、半導体ペレット42と温度センサ−
素子45とを同一の銅ベ−ス46上に塔載し、温度センサ−
の信号をダイオ−ド41のリ−ド端子43から取り出す構成
からなる。なお、図4において、44はボンディングワイ
ヤ−、47は熱伝導性の良好な接合剤、48は樹脂である。
この従来法1では、ダイオ−ド41のPN接合部の温度を
検出することができ、ダイオ−ド41内部の温度状態を知
ることができるものである。
(Conventional method 1) FIG. 4 is a "perspective view showing the internal structure of a diode" for explaining the conventional method 1.
This diode 41 includes a semiconductor pellet 42 and a temperature sensor.
The element 45 and the same copper base 46 are mounted on the tower, and the temperature sensor
Signal is taken out from the lead terminal 43 of the diode 41. In FIG. 4, 44 is a bonding wire, 47 is a bonding agent having good thermal conductivity, and 48 is a resin.
In this conventional method 1, the temperature of the PN junction of the diode 41 can be detected, and the temperature condition inside the diode 41 can be known.

【0004】(従来法2)図5は、従来法2を説明する
ための「半導体装置を示す断面図」である。図5中の57
は超電導層であり、この超電導層57は、図5に示すよう
に、電流経路に直列になるようにエミッタ層51とエミッ
タ電極54との間に接続されている。なお、図5におい
て、52はベ−ス層、53はコレクタ層、55はベ−ス電極、
56はコレクタ電極である。
(Conventional Method 2) FIG. 5 is a “cross-sectional view showing a semiconductor device” for explaining the conventional method 2. 57 in FIG.
Is a superconducting layer, and this superconducting layer 57 is connected between the emitter layer 51 and the emitter electrode 54 so as to be in series with the current path, as shown in FIG. In FIG. 5, 52 is a base layer, 53 is a collector layer, 55 is a base electrode,
56 is a collector electrode.

【0005】図5に示す半導体装置において、通常の使
用時(臨界電流以下及び臨界温度以下の使用時)では、
エミッタ電極54,超電導層57,エミッタ層51,ベ−ス層
52,コレクタ層53,コレクタ電極56を通る電流経路に2
次電流が流れる。ここで、何らかの原因で短絡電流が流
れようとすると、臨界電流を越えるため、超電導層57は
超電導破壊して抵抗が上がり、短絡電流が流れるのを防
止し、また、熱暴走過程で温度が上昇すると、臨界温度
前後で大きく抵抗が増加してこれを防止することができ
るものである。
In the semiconductor device shown in FIG. 5, in normal use (when used below the critical current and below the critical temperature),
Emitter electrode 54, superconducting layer 57, emitter layer 51, base layer
2 in the current path through 52, collector layer 53, and collector electrode 56
The next current flows. Here, if a short-circuit current tries to flow for some reason, the critical current is exceeded, so superconducting layer 57 prevents superconducting breakdown and increases the resistance, preventing a short-circuit current from flowing and increasing the temperature during the thermal runaway process. Then, the resistance is greatly increased around the critical temperature, and this can be prevented.

【0006】(従来法3)図6は、従来法3を説明する
ための図であって、(A)はその回路図であり、(B)は、
従来法3における「プレ−ナ形のNPNトランジスタと
Pチャネル電界効果トランジスタで構成した場合の半導
体装置」の断面図である。
(Conventional method 3) FIGS. 6A and 6B are views for explaining the conventional method 3, wherein FIG. 6A is a circuit diagram thereof and FIG.
FIG. 11 is a cross-sectional view of “a semiconductor device in the case of being configured with a planar NPN transistor and a P-channel field effect transistor” in Conventional Method 3.

【0007】従来法3における半導体装置では、図6
(B)に示すように、P形半導体のドレイン72、P形半導
体のベ−ス68、Pチャネル73、絶縁体74によって構成さ
れるPチャネル電界効果トランジスタ(以下“P−FE
T”と略記する)は、ドレイン・ゲ−ト電極75によりド
レイン・ゲ−トが接続され、P−FETのチャネルは常
に開いている。また、N形半導体のコレクタ67、P形半
導体のベ−ス68、N形半導体のエミッタ69によりNPN
トランジスタ(以下“NPN−Tr”と略記する)が構成
される。このとき、NPN−TrのP形半導体のベ−ス
68は、P−FETのソ−スとなっているため、図6(A)
の回路構成となる。
In the semiconductor device according to the conventional method 3, as shown in FIG.
As shown in (B), a P-channel field-effect transistor (hereinafter referred to as "P-FE") composed of a P-type semiconductor drain 72, a P-type semiconductor base 68, a P-channel 73, and an insulator 74.
(Abbreviated as "T") is connected to the drain gate by the drain gate electrode 75, and the channel of the P-FET is always open. Also, the collector 67 of the N-type semiconductor and the base of the P-type semiconductor. -68, NPN by emitter 69 of N type semiconductor
A transistor (hereinafter abbreviated as "NPN-Tr") is configured. At this time, the base of the P-type semiconductor of NPN-Tr
Since 68 is the source of the P-FET, FIG. 6 (A)
Circuit configuration.

【0008】図6(A)の回路において、NPN−Trの
ベ−ス63からエミッタ62への電流は、P−FETのドレ
イン−ソ−ス電流と等しくなる。この場合、P−FET
のドレイン−ソ−ス電流の温度係数は負であるため、N
PN−Trが同一の構成である場合、NPN−Tr単体
のベ−スからエミッタへの電流の温度係数より図6(A)
の回路のドレイン・ゲ−ト端子66からエミッタ62への温
度係数は小さくなる。これにより、NPN−Tr単体よ
り熱暴走による破壊を起し難くなるというものである。
In the circuit of FIG. 6A, the current from the base 63 of the NPN-Tr to the emitter 62 is equal to the drain-source current of the P-FET. In this case, P-FET
Since the temperature coefficient of the drain-source current of N is negative,
When the PN-Tr has the same configuration, the temperature coefficient of the current from the base to the emitter of the NPN-Tr alone is shown in FIG. 6 (A).
The temperature coefficient from the drain / gate terminal 66 to the emitter 62 of the circuit is reduced. This makes it more difficult for destruction due to thermal runaway to occur than the NPN-Tr alone.

【0009】(従来法4)図7は、従来法4を説明する
ための図であって、バイメタルをスイッチとして用いた
半導体装置の内部構造を示す斜視図である。従来法4の
半導体装置81は、図7に示すように、半導体ペレット8
2、リ−ド端子83、ボンディングワイヤ−84、銅ベ−ス8
5、バイメタル(温度スイッチ)86、セラミック87で構成
されており、電源回路内にバイメタル86からなる温度ス
イッチを内蔵させたものである。
(Conventional Method 4) FIG. 7 is a diagram for explaining Conventional Method 4, and is a perspective view showing the internal structure of a semiconductor device using a bimetal as a switch. As shown in FIG. 7, the semiconductor device 81 of the conventional method 4 has a semiconductor pellet 8
2, lead terminal 83, bonding wire 84, copper base 8
5. It is composed of a bimetal (temperature switch) 86 and a ceramic 87, and the temperature switch made of the bimetal 86 is built in the power supply circuit.

【0010】[0010]

【発明が解決しようとする課題】ところで、前記従来の
温度制御機能を持った半導体装置において、従来法1で
は、外部モニタ−を始めとする外部制御装置が必要であ
るため、装置全体が大きくなるという問題点を有してい
る。また、従来法2では、使用最高温度+50℃以上の温
度で抵抗値の変極点をもつ超電層を半導体素子上に製造
することが難しいという問題がある。
By the way, in the conventional semiconductor device having a temperature control function, the conventional method 1 requires an external control device such as an external monitor, so that the entire device becomes large. There is a problem. Further, in the conventional method 2, there is a problem that it is difficult to manufacture a superconducting layer having an inflection point of the resistance value on the semiconductor element at a temperature higher than the maximum operating temperature + 50 ° C.

【0011】一方、従来法3では、III−V族のウェハ
−によって作られる化合物半導体においては、負の温度
係数を持つ素子を作ることができないという問題があ
る。また、従来法4では、金属の温度収縮の差を利用し
ているため、パッケ−ジ内でバイメタルを固定できない
ものであり、そのため、パッケ−ジとしてモ−ルドパッ
ケ−ジを使用することができないという問題があった。
On the other hand, the conventional method 3 has a problem in that it is not possible to form an element having a negative temperature coefficient in a compound semiconductor made of a III-V group wafer. Further, in the conventional method 4, since the difference in the temperature shrinkage of the metal is utilized, the bimetal cannot be fixed in the package, and therefore the mold package cannot be used as the package. There was a problem.

【0012】本発明は、上記従来法1〜4の各問題点に
鑑み成されたものであって、その目的とするところは、
上記各問題点を解消し、或る温度以上において、化合物
半導体チップに流れる電流を制限することができ、その
動作を押さえて熱暴走や特性の悪化を防止する化合物半
導体装置を提供することにある。
The present invention has been made in view of the problems of the above-mentioned conventional methods 1 to 4, and its object is to:
It is an object of the present invention to solve the above problems and to provide a compound semiconductor device capable of limiting the current flowing through the compound semiconductor chip at a certain temperature or higher and suppressing its operation to prevent thermal runaway and deterioration of characteristics. .

【0013】[0013]

【課題を解決するための手段】本発明の半導体装置は、
化合物半導体素子からなる半導体装置と、回路的には該
半導体装置に電流を供給するためのリ−ド端子との間
に、そして、構造的には同一パッケ−ジ内になるよう
に、温度制御素子(PTC)を備えていることを特徴と
し、上記半導体素子の回路電流を前記化合物半導体基板
の温度変化に合わせて制御するようにしたものであり、
これにより前記の目的とする化合物半導体装置を提供す
るものである。
According to the present invention, there is provided a semiconductor device comprising:
Temperature control is performed between a semiconductor device including a compound semiconductor element and a lead terminal for supplying a current to the semiconductor device in terms of a circuit, and structurally in the same package. An element (PTC) is provided, and the circuit current of the semiconductor element is controlled according to the temperature change of the compound semiconductor substrate.
As a result, the above-mentioned object compound semiconductor device is provided.

【0014】即ち、本発明は、「化合物半導体基板上に
構成された半導体素子からなる半導体チップと温度制御
素子とを上記半導体チップの電源端子と外部電源端子と
の間に接続し、これらを樹脂によって同一パッケ−ジ内
に封入してなることを特徴とする化合物半導体装置。」
(請求項1)を要旨とする。
That is, according to the present invention, "a semiconductor chip composed of a semiconductor element formed on a compound semiconductor substrate and a temperature control element are connected between a power supply terminal of the semiconductor chip and an external power supply terminal, and these are connected by a resin. The compound semiconductor device is characterized by being enclosed in the same package according to ".
(Claim 1) is the gist.

【0015】また、本発明は、「温度制御素子上に、外
部端子となるメタルパタ−ンと上記温度制御素子自身の
電極である内部端子とを設け、半導体素子からなる半導
体チップの電極とボンディングワイヤ−にて電気的に接
続させ、これらを樹脂で覆った構成からなることを特徴
とする化合物半導体装置。」(請求項2)を要旨とする。
According to the present invention, "a metal pattern serving as an external terminal and an internal terminal serving as an electrode of the temperature controlling element itself are provided on the temperature controlling element, and an electrode of a semiconductor chip made of a semiconductor element and a bonding wire. The compound semiconductor device is characterized in that it is electrically connected by-and is covered with a resin. "(Claim 2).

【0016】[0016]

【発明の実施の形態】以下、本発明に係る温度制御素子
を内蔵した化合物半導体装置の実施の形態を挙げ、本発
明をより詳細に説明する。
BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in more detail below with reference to embodiments of a compound semiconductor device incorporating a temperature control element according to the present invention.

【0017】本発明は、前記したとおり、化合物半導体
チップからなる半導体装置において、バイアス供給端子
間に温度制御素子を備えていることを特徴とし、半導体
チップの回路電流を化合物半導体基板の温度変化に合わ
せて制御するようにしたものである。本発明で使用する
温度制御素子としては、抵抗急増温度が100〜200℃の範
囲にあり、その抵抗値が数Ωから数kΩに変化するよう
な材料で構成されているPTC(正特性サ−ミスタ)が好
ましい。
As described above, the present invention is characterized in that the semiconductor device including the compound semiconductor chip is provided with the temperature control element between the bias supply terminals, and the circuit current of the semiconductor chip changes with the temperature change of the compound semiconductor substrate. It is designed to be controlled together. The temperature control element used in the present invention has a PTC (Positive Characteristic Servo) which is made of a material whose resistance increase temperature is in the range of 100 to 200 ° C. and whose resistance value changes from several Ω to several kΩ. Mista) is preferred.

【0018】[0018]

【作用】本発明に係る化合物半導体装置では、上記のよ
うなPTC(正特性サ−ミスタ)を備えているので、或る
一定の温度以上になると、このPTCの抵抗値が数百倍
以上になることから、その温度以上では、化合物半導体
チップに流れる電流を制限することができ、その動作を
押さえて熱暴走や特性の悪化を防止するという作用が生
じる。
Since the compound semiconductor device according to the present invention is provided with the PTC (positive temperature coefficient thermistor) as described above, the resistance value of the PTC becomes several hundred times or more at a certain temperature or higher. Therefore, above that temperature, the current flowing through the compound semiconductor chip can be limited, and the operation is suppressed to prevent thermal runaway and deterioration of characteristics.

【0019】[0019]

【実施例】次に、本発明の実施例を挙げ、本発明を具体
的に説明するが、本発明は、以下の実施例により限定さ
れるものではなく、前記した本発明の要旨を逸脱しない
範囲内で種々の変更、変形が可能である。
EXAMPLES Next, the present invention will be specifically described with reference to examples of the present invention, but the present invention is not limited to the following examples and does not deviate from the gist of the present invention. Various changes and modifications are possible within the range.

【0020】(実施例1)図1は、本発明の一実施例
(実施例1)である半導体装置の断面図、図2は、図1の
半導体装置の構成及び各電源端子に電源を取り付けた概
略図である。
(Embodiment 1) FIG. 1 shows an embodiment of the present invention.
(First Embodiment) FIG. 2 is a cross-sectional view of a semiconductor device, and FIG. 2 is a schematic view of the structure of the semiconductor device of FIG. 1 and a power supply attached to each power supply terminal.

【0021】本実施例1に係る半導体装置11では、図1
に示すように、化合物半導体チップ(以下単に“チップ1
2”という)とPTC13とがリ−ドフレ−ム14を挟む構造
となっており、これによりPTC13は、チップ12全体の
温度とほぼ同一にすることができる。なお、図1中の15
はボンディングワイヤ−であり、16は樹脂である。
In the semiconductor device 11 according to the first embodiment, as shown in FIG.
As shown in, the compound semiconductor chip (hereinafter simply referred to as “chip 1
2 ") and the PTC 13 sandwich the lead frame 14 so that the temperature of the PTC 13 can be almost the same as the temperature of the entire chip 12. 15 in FIG.
Is a bonding wire, and 16 is a resin.

【0022】次に、本実施例1に係る半導体装置11にお
いて、熱暴走や特性の悪化となる、保証温度外の或る一
定の危険な温度の至る原因(保証温度外での使用,実装
不備,過入力,過電圧等)が与えられた場合について、
その動作を説明する。この説明にあたり、半導体装置11
の保証温度の上限を80℃、危険となる下限温度を120
℃、チップ12の駆動電圧VD=4V、消費電流ID=400m
Aとし、また、PTC13は、抵抗値急変温度が120℃で
その抵抗値が数Ωから1kΩに変化するような材料で構
成されており、使用するVD電源の上限電流が600mAで
あるとする。
Next, in the semiconductor device 11 according to the first embodiment, the cause of a certain dangerous temperature outside the guaranteed temperature, which causes thermal runaway and deterioration of characteristics (use outside the guaranteed temperature, mounting defect) , Over-input, over-voltage, etc.)
The operation will be described. In this explanation, the semiconductor device 11
The guaranteed upper limit of the temperature is 80 ℃, and the dangerous lower limit is 120.
℃, chip 12 drive voltage V D = 4V, current consumption I D = 400m
Also, the PTC 13 is made of a material whose resistance value sudden change temperature is 120 ° C. and its resistance value changes from several Ω to 1 kΩ, and the upper limit current of the V D power supply to be used is 600 mA. .

【0023】この場合、半導体装置11の温度が120℃未
満の場合、PTC13の抵抗値は数Ωのため、半導体装置
11の消費電流は、使用しているVD電源の許容電流値内
である。これに対して、半導体装置11の温度が120℃を
越えると、PTC13の抵抗値は1KΩを越えるため、使
用しているVD電源では、チップ12が動作するに必要な
電流の約100分の1ぐらいしか該チップ12に供給すること
ができなくなる。このため、このチップ12は動作が止ま
るようになる。このように図1及び図2に示す本実施例
1に係る半導体装置11では、ある特定温度以上において
動作を止めることになり、熱暴走や特性悪化を防止する
ことができる利点を有する。
In this case, when the temperature of the semiconductor device 11 is lower than 120 ° C., the resistance value of the PTC 13 is several Ω, so that the semiconductor device 11
The current consumption of 11 is within the allowable current value of the V D power supply used. On the other hand, when the temperature of the semiconductor device 11 exceeds 120 ° C., the resistance value of the PTC 13 exceeds 1 KΩ, so that the V D power supply used is about 100 minutes of the current required for the chip 12 to operate. Only about 1 can be supplied to the chip 12. Therefore, the chip 12 stops operating. As described above, in the semiconductor device 11 according to the first embodiment shown in FIGS. 1 and 2, the operation is stopped at a certain temperature or higher, and there is an advantage that thermal runaway and characteristic deterioration can be prevented.

【0024】(実施例2)図3は、本発明の他の実施例
(実施例2)である半導体装置を説明する図であって、
(A)は、その半導体装置の断面図であり、(B)は、その
半導体装置の上面図である。
(Embodiment 2) FIG. 3 shows another embodiment of the present invention.
FIG. 6 is a diagram illustrating a semiconductor device according to (Example 2),
(A) is a sectional view of the semiconductor device, and (B) is a top view of the semiconductor device.

【0025】本実施例2に係る半導体装置31は、図3
(A),(B)に示すように、PTC33上に外部端子となる
メタルパタ−ン35とPTC33自身の電極である内部端子
36を設け、化合物半導体チップ32の電極とボンディング
ワイヤ−34にて電気的に接続させ、樹脂37で覆ったもの
である。
The semiconductor device 31 according to the second embodiment is shown in FIG.
As shown in (A) and (B), a metal pattern 35 serving as an external terminal on the PTC 33 and an internal terminal serving as an electrode of the PTC 33 itself.
36 is provided, is electrically connected to the electrode of the compound semiconductor chip 32 by the bonding wire 34, and is covered with the resin 37.

【0026】このため、本実施例2に係る半導体装置31
では、PTC33は前記実施例1に比べて化合物半導体チ
ップ32により近い温度になるという利点がある。なお、
電流を制限する働きは、前記実施例1と同じであるた
め、その説明は省略する。
Therefore, the semiconductor device 31 according to the second embodiment.
Then, there is an advantage that the temperature of the PTC 33 becomes closer to that of the compound semiconductor chip 32 as compared with the first embodiment. In addition,
Since the function of limiting the current is the same as that of the first embodiment, the description thereof will be omitted.

【0027】[0027]

【発明の効果】本発明は、以上詳記したように、化合物
半導体チップからなる半導体装置において、バイアス供
給端子間にPTCを内蔵し、或る一定の温度以上になる
とPTCの抵抗値が数百倍以上になるようにしたので、
その温度以上では、化合物半導体チップに流れる電流を
制限することができ、その動作を押さえて熱暴走や特性
の悪化を防止するという効果を有する。
As described in detail above, according to the present invention, in a semiconductor device composed of a compound semiconductor chip, a PTC is built in between bias supply terminals, and the resistance value of the PTC becomes several hundreds at a certain temperature or higher. Since it has been doubled,
Above that temperature, the current flowing through the compound semiconductor chip can be limited, and the operation thereof can be suppressed to prevent thermal runaway and deterioration of characteristics.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例(実施例1)である半導体装置
の断面図。
FIG. 1 is a sectional view of a semiconductor device according to an embodiment (Example 1) of the present invention.

【図2】図1の半導体装置の構成図及び各電源端子に電
源を取り付けた概略図。
2A and 2B are a configuration diagram of the semiconductor device of FIG. 1 and a schematic diagram in which a power source is attached to each power source terminal.

【図3】本発明の他の実施例(実施例2)である半導体装
置を説明する図であって、(A)はその半導体装置の断面
図、(B)は(A)の半導体装置の上面図。
3A and 3B are diagrams illustrating a semiconductor device according to another embodiment (Embodiment 2) of the present invention, in which (A) is a cross-sectional view of the semiconductor device and (B) is a semiconductor device of (A). Top view.

【図4】従来法1を説明する図であって、ダイオ−ドの
内部構造を示す斜視図。
FIG. 4 is a perspective view showing the internal structure of the diode, which is a view for explaining the conventional method 1.

【図5】従来法2を説明する図であって、半導体装置の
断面図。
FIG. 5 is a view for explaining the conventional method 2, which is a cross-sectional view of the semiconductor device.

【図6】従来法3を説明する図であって、(A)はその回
路図、(B)は従来法3の半導体装置の断面図。
6A and 6B are diagrams illustrating Conventional Method 3, in which FIG. 6A is a circuit diagram thereof and FIG. 6B is a cross-sectional view of a semiconductor device in Conventional Method 3.

【図7】従来法4を説明する図であって、バイタメタル
をスイッチとして用いた半導体装置の内部構造を示す斜
視図。
FIG. 7 is a perspective view showing the internal structure of a semiconductor device using a bitametal as a switch for explaining the conventional method 4;

【符号の説明】[Explanation of symbols]

11 半導体装置 12 チップ(化合物半導体チップ) 13 PTC 14 リ−ドフレ−ム 15 ボンディングワイヤ− 16 樹脂 31 半導体装置 32 化合物半導体チップ 33 PTC 34 ボンディングワイヤ− 35 メタルパタ−ン(外部端子) 36 内部端子(PTCの電極) 37 樹脂 41 ダイオ−ド 42 半導体ペレット 43 リ−ド端子 44 ボンディングワイヤ− 45 温度センサ−素子 46 銅ベ−ス 47 接合剤 48 樹脂 51 エミッタ層 52 ベ−ス層 53 コレクタ層 54 エミッタ電極 55 ベ−ス電極 56 コレクタ電極 57 超電導層 61 コレクタ 62 エミッタ 63 ベ−ス 64 ゲ−ト 65 ドレイン 66 ドレイン・ゲ−ト端子 67 N形半導体のコレクタ 68 P形半導体のベ−ス 69 N形半導体のエミッタ 70 絶縁体 71 エミッタ電極 72 P形の半導体のドレイン 73 Pチャネル 74 絶縁体 75 ドレイン・ゲ−ト電極 81 半導体装置 82 半導体ペレット 83 リ−ド端子 84 ボンディングワイヤ− 85 銅ベ−ス 86 バイメタル(温度スイッチ) 87 セラミック 11 semiconductor device 12 chip (compound semiconductor chip) 13 PTC 14 lead frame 15 bonding wire-16 resin 31 semiconductor device 32 compound semiconductor chip 33 PTC 34 bonding wire-35 metal pattern (external terminal) 36 internal terminal (PTC) Electrode) 37 Resin 41 Diode 42 Semiconductor pellet 43 Lead terminal 44 Bonding wire 45 Temperature sensor element 46 Copper base 47 Bonding agent 48 Resin 51 Emitter layer 52 Base layer 53 Collector layer 54 Emitter electrode 55 Base Electrode 56 Collector Electrode 57 Superconducting Layer 61 Collector 62 Emitter 63 Base 64 Gate 65 Drain 66 Drain Gate Terminal 67 N-type Semiconductor Collector 68 P-type Semiconductor Base 69 N-type Semiconductor Emitter 70 Insulator 71 Emitter electrode 72 P-type semiconductor drain 73 P channel 74 Insulator 75 Drain gate electrode 81 Semiconductor device 82 Semiconductor pellet 83 Lead terminal 84 Bonding wire-85 Copper base 86 Bimetal (temperature switch) 87 Ceramic

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 化合物半導体基板上に構成された半導体
素子からなる半導体チップと温度制御素子とを上記半導
体チップの電源端子と外部電源端子との間に接続し、こ
れらを樹脂によって同一パッケ−ジ内に封入してなるこ
とを特徴とする化合物半導体装置。
1. A semiconductor chip composed of a semiconductor element formed on a compound semiconductor substrate and a temperature control element are connected between a power supply terminal of the semiconductor chip and an external power supply terminal, and these are packaged in the same package with a resin. A compound semiconductor device, characterized in that it is encapsulated inside.
【請求項2】 温度制御素子上に、外部端子となるメタ
ルパタ−ンと上記温度制御素子自身の電極である内部端
子とを設け、半導体素子からなる半導体チップの電極と
ボンディングワイヤ−にて電気的に接続させ、これらを
樹脂で覆った構成からなることを特徴とする化合物半導
体装置。
2. A metal pattern serving as an external terminal and an internal terminal serving as an electrode of the temperature controlling element itself are provided on the temperature controlling element, and an electric wire is electrically connected to an electrode of a semiconductor chip including the semiconductor element and a bonding wire. A compound semiconductor device characterized in that the compound semiconductor device is configured to be connected to a substrate and covered with a resin.
【請求項3】 前記温度制御素子として、抵抗急増温度
が100〜200℃の範囲にあるPTC(正特性サ−ミスタ)を
用いることを特徴とする請求項1又は2に記載の化合物
半導体装置。
3. The compound semiconductor device according to claim 1, wherein a PTC (Positive Characteristic Thermistor) having a resistance increase temperature in the range of 100 to 200 ° C. is used as the temperature control element.
JP7282682A 1995-10-31 1995-10-31 Compound semiconductor device provided with buil-in temperature control element Pending JPH09129818A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7282682A JPH09129818A (en) 1995-10-31 1995-10-31 Compound semiconductor device provided with buil-in temperature control element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7282682A JPH09129818A (en) 1995-10-31 1995-10-31 Compound semiconductor device provided with buil-in temperature control element

Publications (1)

Publication Number Publication Date
JPH09129818A true JPH09129818A (en) 1997-05-16

Family

ID=17655690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7282682A Pending JPH09129818A (en) 1995-10-31 1995-10-31 Compound semiconductor device provided with buil-in temperature control element

Country Status (1)

Country Link
JP (1) JPH09129818A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6331763B1 (en) 1998-04-15 2001-12-18 Tyco Electronics Corporation Devices and methods for protection of rechargeable elements
JP2002280746A (en) * 2001-03-20 2002-09-27 Polytronics Technology Corp Printed circuit board with embedded function element
WO2012002764A2 (en) * 2010-07-01 2012-01-05 Electronics And Telecommunications Research Institute Metal-semiconductor convergence electric circuit devices and electric circuit systems using the same
US20130087786A1 (en) * 2010-07-01 2013-04-11 Electronics And Telecommunications Research Institute Metal-semiconductor convergence electric circuit devices and electric circuit systems using the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5254995U (en) * 1975-10-18 1977-04-20
JPH01245585A (en) * 1988-03-26 1989-09-29 Nec Corp Semiconductor laser device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5254995U (en) * 1975-10-18 1977-04-20
JPH01245585A (en) * 1988-03-26 1989-09-29 Nec Corp Semiconductor laser device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6331763B1 (en) 1998-04-15 2001-12-18 Tyco Electronics Corporation Devices and methods for protection of rechargeable elements
US6914416B2 (en) 1998-04-15 2005-07-05 Tyco Electronics Corporation Electrical device including a voltage regulator mounted on a variable resistor
JP2002280746A (en) * 2001-03-20 2002-09-27 Polytronics Technology Corp Printed circuit board with embedded function element
WO2012002764A2 (en) * 2010-07-01 2012-01-05 Electronics And Telecommunications Research Institute Metal-semiconductor convergence electric circuit devices and electric circuit systems using the same
WO2012002764A3 (en) * 2010-07-01 2012-04-12 Electronics And Telecommunications Research Institute Metal-semiconductor convergence electric circuit devices and electric circuit systems using the same
US20130087786A1 (en) * 2010-07-01 2013-04-11 Electronics And Telecommunications Research Institute Metal-semiconductor convergence electric circuit devices and electric circuit systems using the same
KR101438588B1 (en) * 2010-07-01 2014-09-15 한국전자통신연구원 Metal-semiconductor convergence electric circuit device and electric circuit system using the same
US9035427B2 (en) 2010-07-01 2015-05-19 Electronics And Telecommunications Research Institute Metal-semiconductor convergence electric circuit devices and electric circuit systems using the same

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