JPH0411778A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH0411778A
JPH0411778A JP11478490A JP11478490A JPH0411778A JP H0411778 A JPH0411778 A JP H0411778A JP 11478490 A JP11478490 A JP 11478490A JP 11478490 A JP11478490 A JP 11478490A JP H0411778 A JPH0411778 A JP H0411778A
Authority
JP
Japan
Prior art keywords
drain
base
emitter
fet
type semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11478490A
Other languages
Japanese (ja)
Inventor
Susumu Sakamoto
進 阪本
Hideaki Katayama
秀昭 片山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP11478490A priority Critical patent/JPH0411778A/en
Publication of JPH0411778A publication Critical patent/JPH0411778A/en
Pending legal-status Critical Current

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  • Bipolar Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)

Abstract

PURPOSE:To prevent damage due to a thermal runaway by connecting the drain electrode of a P-channel FET to a gate electrode and composing its source and the base of an NPN transistor of the same P-type layers. CONSTITUTION:A P-FET is formed of a P-type semiconductor base 8, a P- channel 14 and an insulator 15, a drain is connected to a gate via a drain-gate electrode 16, and always opened. An NPN transistor is composed of N-type semiconductor collector 7, emitter 9, P-type semiconductor 8. Here, the drain electrode of a P-FET is connected to a gate electrode, and the source of a P-channel FET and the base 8 of an NPN transistor are formed of the same P-type layers. Then, a current from the base 3 of the NPN transistor to an emitter 2 becomes equal to the drain-source current of the P-FET. Thus, temperature coefficient from the drain-gate terminal to the emitter 2 is reduced to eliminate a damage due to a thermal runaway.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、熱による悪影響を除去した半導体装置に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor device that eliminates the adverse effects of heat.

〔従来の技術〕[Conventional technology]

第3図は従来のN P N 1−ランジスタ(以下、N
P N −T rという)の回路記号図、第4図は一例
としてブレーナ形N P N l−ランジスタの断面図
である。
Figure 3 shows a conventional N P N 1-transistor (hereinafter referred to as N
FIG. 4 is a cross-sectional view of a Brainer type N P N l-transistor as an example.

第3図において、1はコしフタ、2はエミッタ、3はベ
ースである。また、第4図において、7はN形半導体の
コレクタ、8はP形半導体のベース、91よN形半導体
のエミッタ、1oは半導体上部の電極と半導体とを絶縁
するための絶縁体、11は前記P形半導体のベース8と
外部回路を接続するためのベース電極、12は前記N形
半導体のエミッタ9と外部回路を接続するためのエミッ
タ電極である。
In FIG. 3, 1 is a lid, 2 is an emitter, and 3 is a base. Further, in FIG. 4, 7 is the collector of the N-type semiconductor, 8 is the base of the P-type semiconductor, 91 is the emitter of the N-type semiconductor, 1o is an insulator for insulating the semiconductor from the upper electrode of the semiconductor, and 11 is the A base electrode 12 is used to connect the base 8 of the P-type semiconductor to an external circuit, and an emitter electrode 12 is used to connect the emitter 9 of the N-type semiconductor to an external circuit.

次に動作について説明する。Next, the operation will be explained.

コレクタ1をエミッタ2より高い電圧にバイアスし、ベ
ース3よりエミッタ2へ電流を流すことにより、コレク
タ1からエミッタ2へ流れる電流をコ、)・ロールし増
幅作用を行う。
By biasing the collector 1 to a higher voltage than the emitter 2 and allowing current to flow from the base 3 to the emitter 2, the current flowing from the collector 1 to the emitter 2 is rolled and amplified.

〔発明が解決しようとする課題1 従来のN P N −T rては、ベース3からエミッ
タ2への電流は温度係数が正であるため高温になると、
ベース3からエミッタ2への電流が増加し、このため、
半導体の温度が上昇するという正帰還となる。このため
、熱暴走により破壊するという問題点があった。
[Problem to be solved by the invention 1] In the conventional N P N -T r, the current from the base 3 to the emitter 2 has a positive temperature coefficient, so when the temperature becomes high,
The current from base 3 to emitter 2 increases and thus
This results in positive feedback that the temperature of the semiconductor increases. For this reason, there was a problem of destruction due to thermal runaway.

乙の発明は、上記のような問題点を解消するためになさ
れたもので、従来のN P N 1−ランジスタ単体よ
り温度係数の小さな半導体装置を得ることにより、熱暴
走による破壊を引き起こしにくい半導体装置を提供する
ことを目的とする。
B's invention was made in order to solve the above-mentioned problems, and by obtaining a semiconductor device with a smaller temperature coefficient than the conventional N P N 1 transistor alone, it is possible to create a semiconductor device that is less prone to destruction due to thermal runaway. The purpose is to provide equipment.

〔課題を解決するための手段〕[Means to solve the problem]

この発明に係る半導体装置は、同一チップ内にNPN 
)ランジスタとPf−ヤネル電界効果1−ランジスタを
構成し、Pチャネル電界効果トランジスタのドレイン電
極とゲート電極を接続し、Pチャネル電界効果トランジ
スタのソースとN P N l−ラ′、/ジスタのベー
スを同一のP層で構成したものである。
The semiconductor device according to the present invention has NPN in the same chip.
) transistor and Pf-Yarnel field effect 1- constitute a transistor, connect the drain electrode and gate electrode of the P-channel field-effect transistor, and connect the source of the P-channel field-effect transistor and the base of the transistor are composed of the same P layer.

〔作用〕[Effect]

この発明においては、NPN!−ランジスタのベスに接
続されたPチャネル電界効果トランジスタの温度係数が
負であるため、Pチャネル電界効果トランジスタのドレ
イジ−ソース間の電流は温度の上昇とともに減少する。
In this invention, NPN! - Since the temperature coefficient of the P-channel field-effect transistor connected to the base of the transistor is negative, the drage-source current of the P-channel field-effect transistor decreases with increasing temperature.

このとき、N P N l−ランじスタへのベース電流
はPチャネル電界効果1−ラノシスタのドLイ、−ソー
ス間のsiと等しくなるため、温度が上昇した場合にN
PNI−ランジスタ単体に比へ、ベース電流の増加率は
小さくなり、熱暴走による破壊を引き起こしにくくなる
At this time, the base current to the N P N l - transistor becomes equal to the Si between the drain and the source of the P channel field effect transistor, so when the temperature rises, the N
Compared to a single PNI transistor, the rate of increase in base current is smaller, making it less likely to cause damage due to thermal runaway.

〔実施例〕〔Example〕

以下、この発明の一実施例を第1図、第2図について説
明する。
An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.

第1図はこの発明の回路図を示し、第2F!!J1よこ
の発明の一実施例として示すプし−ナ形のNPNl・ラ
シジスタ(以下、N P N −T rという)とPチ
ャネル電界効果j・ランジスタ(以下、P−FETとい
う)で構成した場合の半導体装置の断面図である。
FIG. 1 shows a circuit diagram of the invention, and the second F! ! J1 is shown as an embodiment of the present invention, and is composed of a pulley type NPN resistor (hereinafter referred to as NPN-Tr) and a P channel field effect resistor (hereinafter referred to as P-FET). FIG. 2 is a cross-sectional view of the semiconductor device of FIG.

第1図において、1はN P N −T rのコレクタ
、2はN P N −T rのエミッタ、3はN P 
N −T rのベースてあり、かっP−FETのソース
、4はP−FETのゲート、5はP−FETのドレイン
、6ばP−FETのゲート4とP−FETのドレイン5
を接続した端子である。また、第2図において、7はN
形半導体のコレクタ、8はP形半導体の′ゞ−ス・9は
N形半導体のエミッタ、1oは絶縁体、12はエミッタ
電極、13ばP形半導体のFL4 ン、11LttP−
FETヲディブレッションとするためのPチャネル、1
5は絶縁ゲート電界効果トランジスタを構成する絶縁体
、16は前記絶縁ゲート電界効果トランジスタのドレイ
ンとゲトを接続し、かつ外部回路と接続するためのドレ
イン−ゲート電極である。
In Figure 1, 1 is the collector of N P N -Tr, 2 is the emitter of N P N -Tr, and 3 is the collector of N P N -Tr.
The base of N-Tr is the source of P-FET, 4 is the gate of P-FET, 5 is the drain of P-FET, 6 is the gate 4 of P-FET and the drain 5 of P-FET.
This is the terminal connected to. Also, in Figure 2, 7 is N
collector of the P-type semiconductor, 8 is the base of the P-type semiconductor, 9 is the emitter of the N-type semiconductor, 1o is the insulator, 12 is the emitter electrode, 13 is the FL4 pin of the P-type semiconductor, 11LttP-
P channel for depletion of FET, 1
5 is an insulator constituting the insulated gate field effect transistor, and 16 is a drain-gate electrode for connecting the drain and gate of the insulated gate field effect transistor and for connecting to an external circuit.

次に動作について説明する。Next, the operation will be explained.

P形半導体のドレイ、、73.P形半導体のパス8.P
チヤネル14.絶縁体15によって構成されるP−FE
Tは、ドレイノーデー1〜電極16によりドレイン電極
−1・が接続され、P−FETのチャネルは常に開いて
いる。また、N形半導体のコしクタ7.P形半導体のベ
ース8.N形半導体のエミッタ9によりNPNTrが構
成される。
P-type semiconductor drain, 73. P-type semiconductor path 8. P
Channel 14. P-FE composed of insulator 15
T is connected to drain electrode -1 by drain node 1 to electrode 16, and the channel of the P-FET is always open. In addition, N-type semiconductor collector 7. Base of P-type semiconductor8. An NPNTr is configured by the N-type semiconductor emitter 9.

このときNPN−TrのP形半導体のベース8ばP−F
ETのソースとなっているため、第1図の回路構成とな
る。
At this time, the base 8 of the P-type semiconductor of the NPN-Tr is P-F.
Since it is the source of ET, it has the circuit configuration shown in FIG.

第1図の回路において、NPN−Trのベース3からエ
ミッタ2への電流はP−FETのドレイノーソース電流
と等しくなる。この場合、P−FETのドL・イノ−ソ
ース電流の温度係数は負であるため、N P N −T
 rが同一の構成である場合、NPN−Tr単体のべ一
−スからエミッタへの電流の温度係数より第1図の回路
のドレイン−デー1〜端子6からエミッタ2への温度係
数は小さくなる。、これにより、N P N−T r単
体より熱暴走による破壊を起こしにくくなる。
In the circuit of FIG. 1, the current from the base 3 to the emitter 2 of the NPN-Tr is equal to the drain-source current of the P-FET. In this case, the temperature coefficient of the do-L ino-source current of the P-FET is negative, so N P N -T
When r has the same configuration, the temperature coefficient from drain data 1 to terminal 6 to emitter 2 of the circuit in Figure 1 is smaller than the temperature coefficient of the current from the base to the emitter of a single NPN-Tr. . , This makes it less likely to cause damage due to thermal runaway than N P N-Tr alone.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、この発明は、同一チップ内にNP
NI−ラノジスクとデイプしツションPチャネル電界効
果I・ランンスタを構成し、Pチャネル電界効果トう、
ジスタのドし、イン電極とゲート電極を接続し、Pチャ
不/L電界効果トランジスタの・ノースと、NPNI−
ラ″/ジスタのベースを同一のP層で構成したので、熱
暴走による破壊に対し強い半導体装置が得られる。
As explained above, the present invention provides an NP in the same chip.
A P-channel field effect I-run star is formed by dipping with NI-Lanodisk, and a P-channel field effect is formed.
Connect the do and in electrodes of the transistor and the gate electrode, and connect the NPNI-
Since the bases of the transistors are made of the same P layer, a semiconductor device that is resistant to destruction due to thermal runaway can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明による回路図、第2図はこの発明の一
実施例を示す半導体装置の断面図、第3図は従来のN 
P N −T rの回路記号図、第4図は従来の半導体
装置の断面図である。 図において、1はコレクタ、2はエミッタ、3はベース
、4はゲート、5はドレイン、6はドレイン−ゲート端
子、7はN形半導体のコレクタ、8はP形半導体のベー
ス、9はN形半導体のエミッタ、10.15は絶縁体、
12はエミッタ電極、13はP形半導体のドレイン、1
4はPチャネル、16はドレイン−ゲート電極である。 なお、各図中の同一符号は同一または相当部分を示す。 代理人 大 岩 増 雄   (外2名)b Fトイン
ーグ一ト電ツ
FIG. 1 is a circuit diagram according to the present invention, FIG. 2 is a sectional view of a semiconductor device showing an embodiment of the present invention, and FIG. 3 is a conventional N
The circuit symbol diagram of P N -Tr, FIG. 4 is a sectional view of a conventional semiconductor device. In the figure, 1 is the collector, 2 is the emitter, 3 is the base, 4 is the gate, 5 is the drain, 6 is the drain-gate terminal, 7 is the collector of the N-type semiconductor, 8 is the base of the P-type semiconductor, 9 is the N-type Semiconductor emitter, 10.15 is an insulator,
12 is an emitter electrode, 13 is a drain of a P-type semiconductor, 1
4 is a P channel, and 16 is a drain-gate electrode. Note that the same reference numerals in each figure indicate the same or corresponding parts. Agent: Masuo Oiwa (2 others) b F Towing Itodentsu

Claims (1)

【特許請求の範囲】[Claims]  同一チップ内にNPNトランジスタとディプレッショ
ンPチャネル電界効果トランジスタを構成し、前記Pチ
ャネル電界効果トランジスタのドレイン電極とゲート電
極を接続し、前記Pチャネル電界効果トランジスタのソ
ースと、前記NPNトランジスタのベースを同一のP層
で構成したことを特徴とする半導体装置。
An NPN transistor and a depletion P-channel field-effect transistor are configured in the same chip, the drain electrode and gate electrode of the P-channel field-effect transistor are connected, and the source of the P-channel field-effect transistor and the base of the NPN transistor are the same. 1. A semiconductor device comprising a P layer.
JP11478490A 1990-04-28 1990-04-28 Semiconductor device Pending JPH0411778A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11478490A JPH0411778A (en) 1990-04-28 1990-04-28 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11478490A JPH0411778A (en) 1990-04-28 1990-04-28 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH0411778A true JPH0411778A (en) 1992-01-16

Family

ID=14646598

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11478490A Pending JPH0411778A (en) 1990-04-28 1990-04-28 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH0411778A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5456330A (en) * 1992-09-30 1995-10-10 Aisin Seiki Kabushiki Kaisha Return-to-neutral mechanism of rear wheel steering device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5456330A (en) * 1992-09-30 1995-10-10 Aisin Seiki Kabushiki Kaisha Return-to-neutral mechanism of rear wheel steering device

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