JPH09119815A5 - - Google Patents

Info

Publication number
JPH09119815A5
JPH09119815A5 JP1996224836A JP22483696A JPH09119815A5 JP H09119815 A5 JPH09119815 A5 JP H09119815A5 JP 1996224836 A JP1996224836 A JP 1996224836A JP 22483696 A JP22483696 A JP 22483696A JP H09119815 A5 JPH09119815 A5 JP H09119815A5
Authority
JP
Japan
Prior art keywords
optical signal
light
frequency
light source
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996224836A
Other languages
English (en)
Japanese (ja)
Other versions
JP3922742B2 (ja
JPH09119815A (ja
Filing date
Publication date
Priority claimed from US08/520,029 external-priority patent/US5610716A/en
Application filed filed Critical
Publication of JPH09119815A publication Critical patent/JPH09119815A/ja
Publication of JPH09119815A5 publication Critical patent/JPH09119815A5/ja
Application granted granted Critical
Publication of JP3922742B2 publication Critical patent/JP3922742B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP22483696A 1995-08-28 1996-08-27 フィルム厚の測定方法及び装置 Expired - Fee Related JP3922742B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/520,029 US5610716A (en) 1995-08-28 1995-08-28 Method and apparatus for measuring film thickness utilizing the slope of the phase of the Fourier transform of an autocorrelator signal
US520,029 1995-08-28

Publications (3)

Publication Number Publication Date
JPH09119815A JPH09119815A (ja) 1997-05-06
JPH09119815A5 true JPH09119815A5 (enExample) 2004-07-29
JP3922742B2 JP3922742B2 (ja) 2007-05-30

Family

ID=24070903

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22483696A Expired - Fee Related JP3922742B2 (ja) 1995-08-28 1996-08-27 フィルム厚の測定方法及び装置

Country Status (4)

Country Link
US (1) US5610716A (enExample)
EP (1) EP0762077B1 (enExample)
JP (1) JP3922742B2 (enExample)
DE (1) DE69631400T2 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10267610A (ja) * 1997-03-26 1998-10-09 Kowa Co 光学測定装置
US6198540B1 (en) 1997-03-26 2001-03-06 Kowa Company, Ltd. Optical coherence tomography have plural reference beams of differing modulations
US6088100A (en) * 1997-07-14 2000-07-11 Massachusetts Institute Of Technology Three-dimensional light absorption spectroscopic imaging
US6753972B1 (en) * 1998-04-21 2004-06-22 Hitachi, Ltd. Thin film thickness measuring method and apparatus, and method and apparatus for manufacturing a thin film device using the same
RU2152588C1 (ru) * 1998-05-22 2000-07-10 НИИ Российский центр лазерной физики при Санкт-Петербургском государственном университете Способ измерения оптической толщины плоскопараллельных прозрачных объектов
US6034774A (en) * 1998-06-26 2000-03-07 Eastman Kodak Company Method for determining the retardation of a material using non-coherent light interferometery
US6034772A (en) * 1998-10-29 2000-03-07 Eastman Kodak Company Method for processing interferometric measurement data
US6067161A (en) * 1998-10-29 2000-05-23 Eastman Kodak Company Apparatus for measuring material thickness profiles
US6038027A (en) * 1998-10-29 2000-03-14 Eastman Kodak Company Method for measuring material thickness profiles
US6157037A (en) * 1998-12-04 2000-12-05 Photosense, Llc Sensing device and method for measuring emission time delay during irradiation of targeted samples
US6806969B2 (en) * 2001-10-19 2004-10-19 Agilent Technologies, Inc. Optical measurement for measuring a small space through a transparent surface
US7133137B2 (en) * 2002-06-27 2006-11-07 Visx, Incorporated Integrated scanning and ocular tomography system and method
US7206076B2 (en) * 2003-11-04 2007-04-17 Lumetrics, Inc. Thickness measurement of moving webs and seal integrity system using dual interferometer
JP2005283387A (ja) * 2004-03-30 2005-10-13 Sumitomo Osaka Cement Co Ltd 厚さ測定装置ならびに厚さ測定方法
GB0415766D0 (en) 2004-07-14 2004-08-18 Taylor Hobson Ltd Apparatus for and a method of determining a characteristic of a layer or layers
US7310151B2 (en) * 2004-08-30 2007-12-18 Chian Chiu Li Interferometric optical apparatus and method using wavefront division
CN100516772C (zh) * 2004-09-09 2009-07-22 鸿富锦精密工业（深圳）有限公司 光学信号处理装置及方法
US7515275B2 (en) * 2006-07-18 2009-04-07 Institut National D'optique Optical apparatus and method for distance measuring
JP5124424B2 (ja) * 2008-11-17 2013-01-23 株式会社キーエンス 光学式変位計
CN103630239B (zh) * 2013-02-19 2017-05-03 中国科学院电子学研究所 分辨率增强傅里叶微光谱仪
US20150022658A1 (en) 2013-07-16 2015-01-22 University Of North Carolina At Charlotte Noise reduction techniques, fractional bi-spectrum and fractional cross-correlation, and applications
EP3620292A1 (fr) * 2018-09-07 2020-03-11 Aisapack Holding SA Procédé et dispositif de fabrication d'une soudure d'emballage

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5341205A (en) * 1991-01-15 1994-08-23 The United States Of America As Represented By The Secretary Of The Navy Method for characterization of optical waveguide devices using partial coherence interferometry
US5321501A (en) * 1991-04-29 1994-06-14 Massachusetts Institute Of Technology Method and apparatus for optical imaging with means for controlling the longitudinal range of the sample
US5323229A (en) * 1992-08-31 1994-06-21 Science Applications International Corporation Measurement system using optical coherence shifting interferometry

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