JPH0911004A - Hard layer covered cutting tool - Google Patents
Hard layer covered cutting toolInfo
- Publication number
- JPH0911004A JPH0911004A JP18077695A JP18077695A JPH0911004A JP H0911004 A JPH0911004 A JP H0911004A JP 18077695 A JP18077695 A JP 18077695A JP 18077695 A JP18077695 A JP 18077695A JP H0911004 A JPH0911004 A JP H0911004A
- Authority
- JP
- Japan
- Prior art keywords
- hard layer
- layer
- cutting tool
- ticn
- composite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明は、切削速度が２５０ｍ
／ｍｉｎを越える高速連続切削に対して優れた切削性能
を示す硬質層被覆切削工具に関するものである。This invention has a cutting speed of 250 m.
The present invention relates to a hard-layer-coated cutting tool that exhibits excellent cutting performance for high-speed continuous cutting exceeding 100 rpm.
【０００２】[0002]
【従来の技術】一般に、ＷＣを主成分とするＷＣ基超硬
合金からなる基体（以下、ＷＣ基超硬合金基体という）
またはＴｉＣＮを主成分とするサーメットからなる基体
（以下、ＴｉＣＮ基サーメット基体という）の表面に、
（Ｔｉ0.5 Ｓｉ0.5 ）Ｃの硬質層を被覆してなる硬質層
被覆切削工具は知られている（特開平１−３０６５５０
号公報参照）。2. Description of the Related Art Generally, a substrate made of WC-based cemented carbide containing WC as a main component (hereinafter referred to as WC-based cemented carbide substrate).
Alternatively, on the surface of a base body composed of cermet containing TiCN as a main component (hereinafter referred to as TiCN base cermet base body),
A hard layer-coated cutting tool obtained by coating a hard layer of (Ti 0.5 Si 0.5 ) C is known (JP-A-1-306550).
Reference).
【０００３】[0003]
【発明が解決しようとする課題】しかし、前記従来の
（Ｔｉ0.5 Ｓｉ0.5 ）Ｃ硬質層を被覆した硬質層被覆切
削工具は、高速連続切削に用いた場合には耐摩耗性が十
分でなく、したがって、満足のいく使用寿命が得られて
いない。However, the conventional hard layer-coated cutting tool coated with the (Ti 0.5 Si 0.5 ) C hard layer has insufficient wear resistance when used for high-speed continuous cutting. Therefore, a satisfactory service life is not obtained.
【０００４】[0004]
【課題を解決するための手段】そこで、本発明者は、上
述のような課題を解決し、高速連続切削に用いた場合に
も一層の長寿命を示す硬質層被覆切削工具を得るべく研
究を行った結果、（ａ）ＷＣ基超硬合金基体またはＴｉ
ＣＮ基サーメット基体の表面に、ＴｉＣ、ＴｉＣＮ、Ｔ
ｉＮの内の１種の単層または２種以上の複層を介して、
（Ｔｉ1-x Ｓｉx ）（Ｃ1-y Ｎy ）z ［ただし、0.01≦
ｘ≦0.45、0.01≦ｙ≦1.0 、0.5≦ｚ≦1.34］からなる
組成のＴｉとＳｉの複合炭窒化物硬質層および／または
複合窒化物硬質層を被覆した硬質層被覆切削工具は、高
速連続切削に用いた場合に従来よりも一層耐摩耗性に優
れかつ使用寿命が長くなる、（ｂ）前記（ａ）の硬質層
被覆切削工具の（Ｔｉ1-x Ｓｉx ）（Ｃ1-y Ｎy ）
z ［ただし、0.01≦ｘ≦0.45、0.01≦ｙ≦1.0 、0.5 ≦
ｚ≦1.34］からなる組成のＴｉとＳｉの複合炭窒化物硬
質層および／または複合窒化物硬質層の上に、さらにＴ
ｉＮ層を被覆しても良い、などの知見を得たのである。Therefore, the present inventor has conducted research to solve the above problems and obtain a hard-layer-coated cutting tool that exhibits a longer life even when used for high-speed continuous cutting. As a result, (a) WC-based cemented carbide substrate or Ti
On the surface of the CN-based cermet substrate, TiC, TiCN, T
via a single layer of iN or two or more layers of iN,
(Ti 1-x Si x ) (C 1-y N y ) z [where 0.01 ≦
x ≤ 0.45, 0.01 ≤ y ≤ 1.0, 0.5 ≤ z ≤ 1.34] and a hard layer-coated cutting tool coated with a composite carbonitride hard layer of Ti and Si and / or a composite nitride hard layer When used for cutting, it has better wear resistance and longer service life than before. (B) The hard layer-coated cutting tool (Ti 1-x Si x ) (C 1-y N y )
z [However, 0.01≤x≤0.45, 0.01≤y≤1.0, 0.5≤
z ≦ 1.34] on the composite carbonitride hard layer of Ti and Si and / or the composite nitride hard layer, and further T
They have obtained the knowledge that the iN layer may be covered.
【０００５】この発明は、かかる知見にもとづいて成さ
れたものであって、（１）ＷＣ基超硬合金基体またはＴ
ｉＣＮ基サーメット基体の表面に、ＴｉＣ、ＴｉＣＮ、
ＴｉＮの内の１種の単層または２種以上の複層を介し
て、（Ｔｉ1-x Ｓｉx ）（Ｃ1-y Ｎy ）z ［ただし、0.
01≦ｘ≦0.45、0.01≦ｙ≦1.0 、0.5≦ｚ≦1.34］から
なる組成のＴｉとＳｉの複合炭窒化物硬質層および／ま
たは複合窒化物硬質層を被覆した硬質層被覆切削工具、
（２）前記（１）のＴｉＣ、ＴｉＣＮ、ＴｉＮの内の１
種の単層または２種以上の複層の厚さは０．１〜３．０
μｍの範囲内にあり、かつ前記（Ｔｉ1-x Ｓｉx ）（Ｃ
1-y Ｎy ）z ［ただし、0.01≦ｘ≦0.45、0.01≦ｙ≦1.
0 、0.5 ≦ｚ≦1.34］からなる組成のＴｉとＳｉの複合
炭窒化物硬質層および／または複合窒化物硬質層の膜厚
は１〜１０μｍの範囲内にある硬質層被覆切削工具、
（３）前記（１）または（２）の硬質層被覆切削工具の
（Ｔｉ1-x Ｓｉx ）（Ｃ1-y Ｎy ）z ［ただし、0.01≦
ｘ≦0.45、0.01≦ｙ≦1.0 、0.5 ≦ｚ≦1.34］からなる
組成のＴｉとＳｉの複合炭窒化物硬質層および／または
複合窒化物硬質層の上に、さらに厚さ：０．１〜１．０
μｍのＴｉＮ層を被覆した硬質層被覆切削工具、に特徴
を有するものである。The present invention has been made on the basis of the above-mentioned findings. (1) WC-based cemented carbide substrate or T
On the surface of the iCN-based cermet substrate, TiC, TiCN,
(Ti 1-x Si x ) (C 1-y N y ) z [provided that 0.
01 ≤ x ≤ 0.45, 0.01 ≤ y ≤ 1.0, 0.5 ≤ z ≤ 1.34] Ti and Si composite carbonitride hard layer and / or hard layer coated cutting tool coated with a composite nitride hard layer,
(2) One of TiC, TiCN, and TiN in (1) above
The thickness of a single layer of one kind or a multilayer of two or more kinds is 0.1 to 3.0.
in the range of μm, and (Ti 1-x Si x ) (C
1-y N y ) z [where 0.01 ≦ x ≦ 0.45, 0.01 ≦ y ≦ 1.
0, 0.5 ≤ z ≤ 1.34] Ti and Si composite carbonitride hard layer and / or composite nitride hard layer having a composition of 1 to 10 µm.
(3) (Ti 1-x Si x ) (C 1-y N y ) z of the hard layer-coated cutting tool of the above (1) or (2) [where 0.01 ≦
x ≤ 0.45, 0.01 ≤ y ≤ 1.0, 0.5 ≤ z ≤ 1.34] on the composite carbonitride hard layer of Ti and Si and / or the composite nitride hard layer, and further, the thickness: 0.1 1.0
It is characterized by a hard layer coated cutting tool coated with a TiN layer having a thickness of μm.
【０００６】ｘ、ｙおよびｚの値を前記のごとく限定し
たのは、ｘ＜０．０１、ｘ＞０．４５であると所望の耐
摩耗性が得られないからであり、ｙ＜０．０１であると
所望の耐欠損性が得られないからであり、さらにｚ＜
０．５であると所望の耐摩耗性が得られず、ｚ＞１．３
４であると所望の耐欠損性が低下するとともに剥離が起
こりやすくなるからである。The values of x, y and z are limited as described above, because desired wear resistance cannot be obtained when x <0.01 and x> 0.45, and y <0. This is because if it is 01, the desired fracture resistance cannot be obtained, and z <
If 0.5, the desired wear resistance cannot be obtained, and z> 1.3.
When it is 4, the desired chipping resistance is lowered and peeling easily occurs.
【０００７】前記（Ｔｉ1-x Ｓｉx ）（Ｃ1-y Ｎy ）z
におけるｘ、ｙ、ｚの一層好ましい範囲は、0.01≦ｘ≦
0.30、0.3 ≦ｙ≦0.7 、0.9 ≦ｚ≦1.1 である。したが
って、ＷＣ基超硬合金基体またはＴｉＣＮ基サーメット
基体の表面に形成される一層好ましい硬質層は、Ｔｉと
Ｓｉの複合炭窒化物硬質層である。また、この発明の硬
質層被覆切削工具のＴｉとＳｉの複合炭窒化物硬質層お
よび／または複合窒化物硬質層の膜厚は１〜１０μｍの
範囲内にあることが好ましく、基体表面に形成されるＴ
ｉＣ、ＴｉＣＮ、ＴｉＮの内の１種の単層または２種以
上の複層の厚さは０．１〜３．０μｍの範囲内にあるこ
とが好ましく、さらに最外層のＴｉＮ層の厚さは０．１
〜１．０μｍの範囲内にあることが好ましい。しかし、
基体表面に形成される硬質層全体の厚さは１．５〜１
２．０μｍの範囲内に抑えなければならない。The above (Ti 1-x Si x ) (C 1-y N y ) z
The more preferable range of x, y, and z in 0.01 ≦ x ≦
0.30, 0.3 ≦ y ≦ 0.7, 0.9 ≦ z ≦ 1.1. Therefore, a more preferable hard layer formed on the surface of the WC-based cemented carbide substrate or the TiCN-based cermet substrate is a composite carbonitride hard layer of Ti and Si. Further, the film thickness of the composite carbonitride hard layer of Ti and Si and / or the composite nitride hard layer of the hard layer-coated cutting tool of the present invention is preferably in the range of 1 to 10 μm, and is formed on the substrate surface. T
The thickness of one single layer or two or more multi-layers of iC, TiCN, and TiN is preferably in the range of 0.1 to 3.0 μm, and the thickness of the outermost TiN layer is 0.1
It is preferably in the range of ˜1.0 μm. But,
The total thickness of the hard layer formed on the surface of the substrate is 1.5 to 1
It must be suppressed within the range of 2.0 μm.
【０００８】この発明の硬質層被覆切削工具における硬
質層は、通常のアーク放電式イオンプレーティング法、
マグネトロンスパッタリング法などにより成形すること
ができる。The hard layer in the hard layer-coated cutting tool of the present invention is formed by the usual arc discharge type ion plating method,
It can be formed by a magnetron sputtering method or the like.
【０００９】この発明の硬質層被覆切削工具の硬質層を
アーク放電式イオンプレーティング法により形成するに
は、真空装置内のＴｉターゲット上にアーク放電を発生
させ、Ｔｉを蒸発イオン化させると同時に非金属ガス
（窒素ガスおよび炭化水素ガス）を装置内に導入し、負
の基板電圧をかけた切削工具基板上に下層のＴｉＣ、Ｔ
ｉＣＮ、ＴｉＮの内の１種の単層または２種以上の複層
を形成する。In order to form the hard layer of the hard layer-coated cutting tool of the present invention by the arc discharge type ion plating method, an arc discharge is generated on a Ti target in a vacuum apparatus to vaporize and ionize Ti and at the same time A metal gas (nitrogen gas and hydrocarbon gas) was introduced into the device, and a lower layer TiC, T was formed on the cutting tool substrate to which a negative substrate voltage was applied.
One kind of iCN and TiN, or two or more kinds of multilayers are formed.
【００１０】次に、ＴｉとＳｉの混合物のターゲット上
にアーク放電を発生させ、ＴｉとＳｉを蒸発イオン化さ
せると同時に非金属ガス（窒素ガスおよび炭化水素ガ
ス）を装置内に導入し、負の基板電圧をかけてさらに
（Ｔｉ1-x Ｓｉx ）（Ｃ1-y Ｎy）z ［ただし、0.01≦
ｘ≦0.45、0.01≦ｙ≦1.0 、0.5 ≦ｚ≦1.34］からなる
硬質層を形成する。この場合、ＴｉとＳｉの比率はター
ゲットのＴｉ／Ｓｉ比率を、またメタル／ガス成分の比
率はメタル蒸発量／ガス導入量を調節したり、基板電圧
を変化させることにより制御する。また最外層のＴｉＮ
層は、必要に応じて前記下層のＴｉＮ層と同様にして形
成することができる。Next, an arc discharge is generated on the target of a mixture of Ti and Si to vaporize and ionize Ti and Si, and at the same time, a non-metal gas (nitrogen gas and hydrocarbon gas) is introduced into the apparatus to produce a negative gas. By applying a substrate voltage, (Ti 1-x Si x ) (C 1-y N y ) z [where 0.01 ≦
x ≦ 0.45, 0.01 ≦ y ≦ 1.0, 0.5 ≦ z ≦ 1.34] is formed. In this case, the Ti / Si ratio is controlled by adjusting the Ti / Si ratio of the target, and the metal / gas component ratio is controlled by adjusting the metal evaporation amount / gas introduction amount or by changing the substrate voltage. The outermost layer of TiN
The layer can be formed, if necessary, in the same manner as the lower TiN layer.
【００１１】この発明の硬質層被覆切削工具の硬質層を
マグネトロンスパッタリング法により形成するには、複
数の偶数個の蒸発源機構を持つマグネトロンスパッタリ
ング装置内にＴｉターゲット２枚と、ＴｉとＳｉの混合
物のターゲット複数枚をそれぞれ試料を挾んで対向させ
る。つぎに非金属ガス（窒素ガスおよび炭化水素ガス）
を装置内に導入し、対向ターゲット間にグロー放電をさ
せると同時にＴｉをスパッタリングイオン化させること
により負の基板電圧をかけた切削工具基板上に下層のＴ
ｉＣ、ＴｉＣＮ、ＴｉＮの内の１種の単層または２種以
上の複層を形成する。In order to form the hard layer of the hard layer-coated cutting tool of the present invention by the magnetron sputtering method, two Ti targets and a mixture of Ti and Si are placed in a magnetron sputtering device having an even number of evaporation source mechanisms. A plurality of targets of (1) are made to face each other while sandwiching the sample. Next, non-metal gas (nitrogen gas and hydrocarbon gas)
Is introduced into the apparatus to cause glow discharge between opposing targets and at the same time sputter ionize Ti to apply a negative substrate voltage to the cutting tool substrate.
A single layer of iC, TiCN, or TiN or a multilayer of two or more types is formed.
【００１２】次に、ＴｉとＳｉをスパッタリングイオン
化させることにより負の基板電圧をかけた切削工具基板
上に（Ｔｉ1-x Ｓｉx ）（Ｃ1-y Ｎy ）z ［ただし、0.
01≦ｘ≦0.45、0.01≦ｙ≦1.0 、0.5 ≦ｚ≦1.34］から
なる硬質層を形成する。ＴｉとＳｉの比率はターゲット
のＴｉ／Ｓｉ比率を、またメタル／ガス成分の比率はメ
タル蒸発量／ガス導入量を調節したり、基板電圧を変化
させることにより制御する。また最外層のＴｉＮ層は、
必要に応じて前記下層のＴｉＮ層と同様にして形成する
ことができる。Next, (Ti 1-x Si x ) (C 1-y N y ) z [however, 0. 1 is obtained on the cutting tool substrate to which a negative substrate voltage is applied by sputtering and ionizing Ti and Si.
01 ≦ x ≦ 0.45, 0.01 ≦ y ≦ 1.0, 0.5 ≦ z ≦ 1.34] is formed. The Ti / Si ratio is controlled by adjusting the Ti / Si ratio of the target, and the metal / gas component ratio is controlled by adjusting the metal evaporation amount / gas introduction amount or by changing the substrate voltage. The outermost TiN layer is
If necessary, it can be formed in the same manner as the lower TiN layer.
【００１３】[0013]
【実施例】ＩＳＯ規格Ｐ３０相当、ＳＮＧＡ１２０４０
８の形状を有するＷＣ基超硬合金製チップ、ＴｉＣＮ−
１２％ＷＣ−８％Ｃｏ−８％ＭｏＣ−７％Ｎｉ−５％Ｔ
ａＣの組成を有しＩＳＯ規格ＳＮＧＡ１２０４０８の形
状を有するＴｉＣＮ基サーメット製チップ、Ｔｉターゲ
ットおよび表１〜表２に示される比率のＴｉとＳｉの混
合物ターゲットを用意した。Example: ISO standard P30 equivalent, SNGA12040
WC-based cemented carbide tip having a shape of 8, TiCN-
12% WC-8% Co-8% MoC-7% Ni-5% T
A TiCN-based cermet chip having a composition of aC and a shape of ISO standard SNGA120408, a Ti target, and a mixture target of Ti and Si in the ratios shown in Tables 1 and 2 were prepared.
【００１４】このＷＣ基超硬合金製チップおよびＴｉＣ
Ｎ基サーメット製チップとＴｉターゲットおよび表１〜
表２に示される比率のＴｉとＳｉの混合物ターゲットを
通常のイオンプレーティング装置内に装着し、かかる状
態で前記イオンプレーティング装置内を排気して１×１
０-5Ｔｏｒｒの真空に保持し、昇温速度：６℃／ｍｉ
ｎ．で７００℃に昇温させ、つづいて、この温度に保持
しながら、５×１０-2ＴｏｒｒのＡｒガス雰囲気に保持
してイオンクリーニングした。This WC-based cemented carbide chip and TiC
N-based cermet chip and Ti target and Tables 1 to 1
The mixture target of Ti and Si in the ratio shown in Table 2 was mounted in an ordinary ion plating apparatus, and the inside of the ion plating apparatus was evacuated to 1 × 1 in such a state.
Maintaining a vacuum of 0 -5 Torr, heating rate: 6 ° C / mi
n. Then, the temperature was raised to 700 ° C., and then, while maintaining this temperature, it was maintained in an Ar gas atmosphere of 5 × 10 −2 Torr for ion cleaning.
【００１５】その後、Ｔｉターゲット上にアーク放電を
発生させてＴｉを加熱蒸発させイオン化させ、同時に窒
素ガスおよび／またはアセチレンガスを装置内に導入
し、任意の負の基板電圧をかける通常の方法によりＷＣ
基超硬合金製チップおよびＴｉＣＮ基サーメット製チッ
プ基体表面に表３〜表６に示されるＴｉＣ、ＴｉＣＮ、
ＴｉＮの内の１種の単層または２種以上の複層からなる
膜厚の下層を形成した。After that, an arc discharge is generated on the Ti target to heat and vaporize and ionize Ti, and at the same time, nitrogen gas and / or acetylene gas is introduced into the apparatus, and an arbitrary negative substrate voltage is applied by a usual method. WC
TiC, TiCN shown in Tables 3 to 6 on the surface of the base cemented carbide chip and the TiCN-based cermet chip substrate.
A lower layer having a thickness of one type of TiN or a multilayer of two or more types was formed.
【００１６】次に表１〜表２に示される比率のＴｉとＳ
ｉの混合物ターゲット上にアーク放電を発生させてＴｉ
とＳｉを加熱蒸発させイオン化させるとともに、供給口
より表１〜表２に示される比率の窒素ガスおよびアセチ
レンガスを導入し、表１〜表２に示される負の基板電圧
をかけることにより、前記下層の上に表３〜表６に示さ
れる膜厚を有しさらに表３〜表６に示されるＴｉとＳｉ
の複合硬質層を被覆し、さらに必要に応じてこの複合硬
質層の上にＴｉＮ層を形成してＷＣ基超硬合金製チップ
を基体とした本発明被覆チップ１〜１０、比較被覆チッ
プ１〜１０および従来被覆チップ１〜２並びにＴｉＣＮ
基サーメット製チップを基体とした本発明被覆チップ１
１〜２０、比較被覆チップ１１〜２０および従来被覆チ
ップ３〜４を作製した。前記下層、ＴｉとＳｉの複合硬
質層の組成（原子比）および最外層のＴｉＮはいずれも
ＥＰＭＡ分析により特定した。Next, Ti and S in the ratios shown in Tables 1 and 2 are used.
arcing on the target of the mixture of
And Si are heated and vaporized to be ionized, nitrogen gas and acetylene gas in the ratios shown in Tables 1 and 2 are introduced from the supply port, and the negative substrate voltage shown in Tables 1 and 2 is applied, thereby Ti and Si having the film thicknesses shown in Tables 3 to 6 on the lower layer and further shown in Tables 3 to 6
Of the present invention coated chips 1 to 10 and comparative coated chips 1 to 10 on which a WC-based cemented carbide chip is used as a base by coating a composite hard layer of No. 1 and a TiN layer on the composite hard layer if necessary. 10 and conventional coated chips 1-2 and TiCN
The coated chip 1 of the present invention based on a base cermet chip
1 to 20, comparative coated chips 11 to 20 and conventional coated chips 3 to 4 were produced. The composition (atomic ratio) of the lower layer, the composite hard layer of Ti and Si, and TiN of the outermost layer were all specified by EPMA analysis.
【００１７】[0017]
【表１】 [Table 1]
【００１８】[0018]
【表２】 [Table 2]
【００１９】[0019]
【表３】 [Table 3]
【００２０】[0020]
【表４】 [Table 4]
【００２１】[0021]
【表５】 [Table 5]
【００２２】[0022]
【表６】 [Table 6]
【００２３】実施例１ ＷＣ基超硬合金製チップを基体とした表３〜表４に示さ
れる本発明被覆チップ１〜１０、比較被覆チップ１〜１
０および従来被覆チップ１〜２を用いて、下記の条件の
連続乾式切削試験を実施した。 連続乾式切削試験条件 被削材：ＪＩＳ規格ＳＮＣＭ４３９（ブリネル硬さ：２
５０）の丸材、 切削速度：２５０ｍ／ｍｉｎ、 送り：０．３ｍｍ／ｒｅｖ．、 切込み：２．０ｍｍ、 の条件で乾式連続切削し、切刃の逃げ面の最大摩耗幅が
０．３ｍｍになったところを寿命とし、寿命に至る時間
（分）および摩耗形態を測定し、それらの測定結果を表
７に示した。Example 1 The coated chips 1 to 10 of the present invention and the comparative coated chips 1 to 1 shown in Tables 3 to 4 on the basis of chips made of WC-based cemented carbide.
0 and the conventional coated chips 1 and 2 were used to carry out a continuous dry cutting test under the following conditions. Continuous dry cutting test conditions Work material: JIS standard SNCM439 (Brinell hardness: 2
50) round material, cutting speed: 250 m / min, feed: 0.3 mm / rev. , Depth of cut: 2.0 mm, continuous dry cutting, the life when the maximum wear width of the flank of the cutting edge is 0.3 mm is measured, and the time (minute) to reach the life and the wear pattern are measured. The measurement results are shown in Table 7.
【００２４】[0024]
【表７】 [Table 7]
【００２５】表３〜表４および表７に示される結果か
ら、本発明被覆チップ１〜１０は比較被覆チップ１〜１
０および従来被覆チップ１〜２に比べて切削特性が優れ
ていることが分かる。From the results shown in Tables 3 to 4 and Table 7, the coated chips 1 to 10 of the present invention are comparative coated chips 1 to 1.
It can be seen that the cutting characteristics are superior to those of No. 0 and the conventional coated chips 1 and 2.
【００２６】実施例２ ＴｉＣＮ基サーメット製チップを基体とした表５〜表６
に示される本発明被覆チップ１１〜２０、比較被覆チッ
プ１１〜２０および従来被覆チップ３〜４を用いて、下
記の条件の連続乾式切削試験を実施した。 連続乾式切削試験条件 被削材：ＪＩＳ規格ＳＮＣＭ４３９（ブリネル硬さ：２
５０）の丸材、 切削速度：３００ｍ／ｍｉｎ、 送り：０．２ｍｍ／ｒｅｖ．、 切込み：２．０ｍｍ、 の条件で連続乾式切削し、切刃の逃げ面の最大摩耗幅が
０．３ｍｍになったところを寿命とし、寿命に至る時間
（分）および摩耗形態を測定し、それらの測定結果を表
８に示した。Example 2 Tables 5 to 6 based on TiCN-based cermet chips
Using the coated chips 11 to 20 of the present invention, the comparative coated chips 11 to 20 and the conventional coated chips 3 to 4 shown in FIG. Continuous dry cutting test conditions Work material: JIS standard SNCM439 (Brinell hardness: 2
50) round material, cutting speed: 300 m / min, feed: 0.2 mm / rev. , Depth of cut: 2.0 mm, continuous dry cutting was performed, and the life when the maximum wear width of the flank of the cutting edge was 0.3 mm was taken as the life, and the time (minute) to reach the life and the wear pattern were measured. The measurement results are shown in Table 8.
【００２７】[0027]
【表８】 [Table 8]
【００２８】表５〜表６および表８に示される結果か
ら、本発明被覆チップ１１〜２０は、比較被覆チップ１
１〜２０および従来被覆チップ３〜４に比べて切削性能
が優れていることが分かる。From the results shown in Table 5 to Table 6 and Table 8, the coated chips 11 to 20 of the present invention are the same as the comparative coated chip 1.
It can be seen that the cutting performance is excellent as compared with 1 to 20 and the conventional coated chips 3 to 4.
【００２９】[0029]
【発明の効果】前記実施例に示される結果から、この発
明の硬質層被覆切削工具は、従来の硬質層被覆切削工具
に比べて一層優れた性能を有し、工業上優れた効果をも
たらすものである。From the results shown in the above examples, the hard layer-coated cutting tool of the present invention has more excellent performance than the conventional hard layer-coated cutting tool, and brings about the industrially excellent effect. Is.
Claims (4)
ーメット基体表面に、ＴｉＣ、ＴｉＣＮ、ＴｉＮの内の
１種の単層または２種以上の複層を介して、（Ｔｉ1-x
Ｓｉx ）（Ｃ1-y Ｎy ）z ［ただし、0.01≦ｘ≦0.45、
0.01≦ｙ≦1.0 、0.5 ≦ｚ≦1.34］からなる組成のＴｉ
とＳｉの複合炭窒化物硬質層および／または複合窒化物
硬質層を被覆してなることを特徴とする硬質層被覆切削
工具。1. A surface of a WC-based cemented carbide substrate or a TiCN-based cermet substrate is coated with (Ti 1-x) through a single layer of TiC, TiCN or TiN or a multilayer of two or more types.
Si x ) (C 1-y N y ) z [where 0.01 ≦ x ≦ 0.45,
0.01≤y≤1.0, 0.5≤z≤1.34]
A hard-layer-coated cutting tool characterized by coating a composite carbonitride hard layer of Si and Si and / or a composite nitride hard layer.
ーメット基体表面にに形成されたＴｉＣ、ＴｉＣＮ、Ｔ
ｉＮの内の１種の単層または２種以上の複層の厚さは
０．１〜３．０μｍの範囲内にあり、かつ前記（Ｔｉ
1-x Ｓｉx ）（Ｃ1-y Ｎy ）z ［ただし、0.01≦ｘ≦0.
45、0.01≦ｙ≦1.0 、0.5 ≦ｚ≦1.34］からなる組成の
ＴｉとＳｉの複合炭窒化物硬質層および／または複合窒
化物硬質層の膜厚は１〜１０μｍの範囲内にあることを
特徴とする請求項１記載の硬質層被覆切削工具。2. A TiC, TiCN, or T formed on the surface of a WC-based cemented carbide substrate or a TiCN-based cermet substrate.
The thickness of one single layer or two or more multi-layers of iN is in the range of 0.1 to 3.0 μm, and (Ti
1-x Si x ) (C 1-y N y ) z [where 0.01 ≦ x ≦ 0.
45, 0.01 ≤ y ≤ 1.0, 0.5 ≤ z ≤ 1.34] and the thickness of the composite carbonitride hard layer of Ti and Si and / or the composite nitride hard layer is in the range of 1 to 10 µm. The hard layer-coated cutting tool according to claim 1.
z ［ただし、0.01≦ｘ≦0.45、0.01≦ｙ≦1.0 、0.5 ≦
ｚ≦1.34］からなる組成のＴｉとＳｉの複合炭窒化物硬
質層および／または複合窒化物硬質層の上に、さらに厚
さ：０．１〜１．０μｍのＴｉＮ層を被覆してなること
を特徴とする請求項１または２記載の硬質層被覆切削工
具。3. The (Ti 1-x Si x ) (C 1-y N y ).
z [However, 0.01≤x≤0.45, 0.01≤y≤1.0, 0.5≤
z ≦ 1.34] and a Ti / Si composite carbonitride hard layer and / or composite nitride hard layer having a composition of 0.1 to 1.0 μm in thickness. The hard layer-coated cutting tool according to claim 1 or 2.
の１種の単層または２種以上の複層、ＴｉとＳｉの複合
炭窒化物硬質層および／または複合窒化物硬質層、並び
にＴｉＮ層の合計の厚さは１．５〜１２．０μｍの範囲
内にあることを特徴とする請求項１、２または３記載の
硬質層被覆切削工具。4. A single layer or a multilayer of two or more of TiC, TiCN and TiN, a composite carbonitride hard layer and / or a composite nitride hard layer of Ti and Si, and a TiN layer. The hard-layer-coated cutting tool according to claim 1, 2 or 3, wherein the total thickness is in the range of 1.5 to 12.0 µm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18077695A JP3572728B2 (en) | 1995-06-23 | 1995-06-23 | Hard layer coated cutting tool |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18077695A JP3572728B2 (en) | 1995-06-23 | 1995-06-23 | Hard layer coated cutting tool |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0911004A true JPH0911004A (en) | 1997-01-14 |
| JP3572728B2 JP3572728B2 (en) | 2004-10-06 |
Family
ID=16089136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18077695A Expired - Lifetime JP3572728B2 (en) | 1995-06-23 | 1995-06-23 | Hard layer coated cutting tool |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3572728B2 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6586122B2 (en) | 2000-07-13 | 2003-07-01 | Hitachi Tool Engineering, Ltd. | Multilayer-coated cutting tool |
| JP2003231004A (en) * | 2002-02-12 | 2003-08-19 | Mitsubishi Materials Corp | Cutting tool made of surface covered cemented carbide providing excellent resistance to chipping by hard covered layer in high speed intermittent heavy cutting machining |
| EP1382709A1 (en) * | 2002-07-11 | 2004-01-21 | Sumitomo Electric Industries, Ltd. | Coated tool |
| JP2004338008A (en) * | 2003-05-14 | 2004-12-02 | Mitsubishi Materials Kobe Tools Corp | Cutting tool made of surface coated hard metal with hard coating layer exhibiting excellent chipping resistance in high-speed heavy cutting condition |
| US7294416B2 (en) * | 2003-03-25 | 2007-11-13 | Kobe Steel, Ltd. | Hard film |
| JP2008031517A (en) * | 2006-07-28 | 2008-02-14 | Tungaloy Corp | Coated member |
| JP2008075178A (en) * | 2006-08-24 | 2008-04-03 | Hitachi Tool Engineering Ltd | Thick coating film-coated member and thick coating film-coated member production method |
| JP2008275919A (en) * | 2007-04-27 | 2008-11-13 | Ulvac Japan Ltd | Film-depositing method of antireflection layer provided with antifouling layer |
| US20120164459A1 (en) * | 2010-12-23 | 2012-06-28 | Hon Hai Precision Industry Co., Ltd. | Coated article and method for making the same |
| US8440328B2 (en) | 2011-03-18 | 2013-05-14 | Kennametal Inc. | Coating for improved wear resistance |
| US20140037943A1 (en) * | 2012-08-03 | 2014-02-06 | Fih (Hong Kong) Limited | Coated article and method for making same |
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1995
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1174528A3 (en) * | 2000-07-13 | 2004-05-06 | Hitachi Tool Engineering Ltd. | Multilayer-coated cutting tool |
| US6586122B2 (en) | 2000-07-13 | 2003-07-01 | Hitachi Tool Engineering, Ltd. | Multilayer-coated cutting tool |
| JP2003231004A (en) * | 2002-02-12 | 2003-08-19 | Mitsubishi Materials Corp | Cutting tool made of surface covered cemented carbide providing excellent resistance to chipping by hard covered layer in high speed intermittent heavy cutting machining |
| EP1382709A1 (en) * | 2002-07-11 | 2004-01-21 | Sumitomo Electric Industries, Ltd. | Coated tool |
| US7060345B2 (en) | 2002-07-11 | 2006-06-13 | Sumitomo Electric Industries, Ltd. | Coated tool |
| US7758974B2 (en) | 2003-03-25 | 2010-07-20 | Kobe Steel, Ltd. | Hard film |
| US7294416B2 (en) * | 2003-03-25 | 2007-11-13 | Kobe Steel, Ltd. | Hard film |
| JP2004338008A (en) * | 2003-05-14 | 2004-12-02 | Mitsubishi Materials Kobe Tools Corp | Cutting tool made of surface coated hard metal with hard coating layer exhibiting excellent chipping resistance in high-speed heavy cutting condition |
| JP2008031517A (en) * | 2006-07-28 | 2008-02-14 | Tungaloy Corp | Coated member |
| JP2008075178A (en) * | 2006-08-24 | 2008-04-03 | Hitachi Tool Engineering Ltd | Thick coating film-coated member and thick coating film-coated member production method |
| JP2008275919A (en) * | 2007-04-27 | 2008-11-13 | Ulvac Japan Ltd | Film-depositing method of antireflection layer provided with antifouling layer |
| US20120164459A1 (en) * | 2010-12-23 | 2012-06-28 | Hon Hai Precision Industry Co., Ltd. | Coated article and method for making the same |
| US8709593B2 (en) * | 2010-12-23 | 2014-04-29 | Hong Fu Jin Precision Industry (Shenzhen) Co., Ltd. | Coated article and method for making the same |
| US8440328B2 (en) | 2011-03-18 | 2013-05-14 | Kennametal Inc. | Coating for improved wear resistance |
| US8859114B2 (en) | 2011-03-18 | 2014-10-14 | Kennametal Inc. | Coating for improved wear resistance |
| US20140037943A1 (en) * | 2012-08-03 | 2014-02-06 | Fih (Hong Kong) Limited | Coated article and method for making same |
| CN103572207A (en) * | 2012-08-03 | 2014-02-12 | 深圳富泰宏精密工业有限公司 | Plated piece and preparation method thereof |
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