JPH0845779A - Plating base electrode forming method of electronic component - Google Patents

Plating base electrode forming method of electronic component

Info

Publication number
JPH0845779A
JPH0845779A JP18226894A JP18226894A JPH0845779A JP H0845779 A JPH0845779 A JP H0845779A JP 18226894 A JP18226894 A JP 18226894A JP 18226894 A JP18226894 A JP 18226894A JP H0845779 A JPH0845779 A JP H0845779A
Authority
JP
Japan
Prior art keywords
plating
base electrode
baking
plating base
nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18226894A
Other languages
Japanese (ja)
Other versions
JP3092455B2 (en
Inventor
Takeshi Kimura
猛 木村
Osamu Yamashita
修 山下
Kazu Takada
和 高田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP06182268A priority Critical patent/JP3092455B2/en
Publication of JPH0845779A publication Critical patent/JPH0845779A/en
Application granted granted Critical
Publication of JP3092455B2 publication Critical patent/JP3092455B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

PURPOSE:To improve adhesion of plating by interposing, densely arranging, and baking the same metal powder as the metal for plating, on a plating substratum electrode. CONSTITUTION:Many multilayered ceramic capacitors 7 wherein plating substratum electrode coating is finished are put in a box. The same nickel powder as plating metal is introduced and sufficiently mixed. The mixture is taken out from the box, and nickel which is left without adhering to the multilayered ceramic capacitor 7 is separated from the multilayer capacitor. The multilayered capacitors 7 to which nickel powder adhere are densly arranged on a jig 6 and baked. After baking, the multilayered ceramic capacitors 7 are separated from the jig 6. Thereby continuity of nickel plating is maintained, and soldering quality can be ensured.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は積層セラミックコンデン
サ等の電子部品のメッキ下地電極形成方法に関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a plating base electrode for electronic parts such as a laminated ceramic capacitor.

【0002】[0002]

【従来の技術】従来の技術を積層セラミックコンデンサ
を例に説明する。積層セラミックコンデンサはセラミッ
ク粉末と有機バインダを混練した後、リバースロール法
等によりシート化する。このシートを所定の面積に切断
し、パラジウム等の内部電極ペーストをシートの片側に
スクリーン印刷を行い乾燥させる。その後さらにその上
に別のシートを貼る。所望の積層数が得られるまでこの
印刷−シート貼りの作業を繰り返し行い、所定の圧力を
かけ、所定の寸法に切断しグリーンチップを焼成し、図
1に示す焼成済チップ1を得る。その後この両端部に銀
を主成分としセラミックとの接着を目的とした少量のガ
ラスフリット(以下GFと略す)を含む導電塗料を塗布
し所定の温度によって焼付けを行い図1に示すメッキ下
地電極2を形成する。その後図1に示す様にニッケルメ
ッキ3、ハンダメッキ4の順にメッキ処理を行い完成品
となる積層セラミックコンデンサ5を得る。
2. Description of the Related Art A conventional technique will be described by taking a multilayer ceramic capacitor as an example. The laminated ceramic capacitor is formed into a sheet by a reverse roll method or the like after kneading the ceramic powder and the organic binder. This sheet is cut into a predetermined area, and internal electrode paste such as palladium is screen-printed on one side of the sheet and dried. Then put another sheet on it. This printing-sheeting operation is repeated until the desired number of layers is obtained, a predetermined pressure is applied, the green chip is cut into a predetermined size, and the green chip is baked to obtain the baked chip 1 shown in FIG. Thereafter, a conductive paint containing a small amount of glass frit (hereinafter abbreviated as GF) containing silver as a main component for the purpose of adhering to the ceramic is applied to both ends of the both ends and baked at a predetermined temperature to perform plating base electrode 2 shown in FIG. To form. Thereafter, as shown in FIG. 1, nickel plating 3 and solder plating 4 are plated in this order to obtain a finished monolithic ceramic capacitor 5.

【0003】[0003]

【発明が解決しようとする課題】図1に示すメッキ下地
電極2の焼付け時(600℃以上)導電塗料中に含まれ
るGFが、メッキ下地電極2の表面に出てくるため、メ
ッキ下地電極2が接触した状態にて焼付けを行うと表面
に出たGFによって、図2に示す様にメッキ3,4付前
の積層セラミックコンデンサ5同士がくっついてしまう
という欠点があった。そこで焼付けを行う時、積層セラ
ミックコンデンサはおたがいが接触しない様にしなくて
はならず生産性に課題があった。
When the plating undercoat electrode 2 shown in FIG. 1 is baked (at 600 ° C. or higher), GF contained in the conductive paint comes out on the surface of the plating undercoat electrode 2, so that the plating undercoat electrode 2 is formed. When baking is performed in the state of contacting with each other, there is a drawback that the GF exposed on the surface causes the monolithic ceramic capacitors 5 before plating 3 and 4 to stick to each other as shown in FIG. Therefore, there is a problem in productivity because it is necessary to prevent the monolithic ceramic capacitors from contacting each other when baking is performed.

【0004】また、焼付け時のくっつきを防ぐためアル
ミナ、ジルコニア等のセラミック粉末を、焼付け前の積
層セラミックコンデンサ5に散布し、メッキ下地電極2
同士が接触する部分にこのセラミック粉末を介在させる
ことによって、焼付け時のメッキ下地電極2のくっつき
を防げることはわかっていた。しかし、メッキ下地電極
2表面のGFとセラミック粉末が反応し、それがメッキ
下地電極2表面に付着し、メッキ処理をほどこす際、セ
ラミック粉末が付着した部分にはメッキが付かずハンダ
付け性が劣化するという課題があった。
Further, in order to prevent sticking at the time of baking, ceramic powder such as alumina or zirconia is sprinkled on the laminated ceramic capacitor 5 before baking, and the plating base electrode 2
It has been known that by interposing this ceramic powder in the portions where they come into contact with each other, sticking of the plating base electrode 2 during baking can be prevented. However, GF on the surface of the plating base electrode 2 reacts with the ceramic powder, which adheres to the surface of the plating base electrode 2, and when the plating treatment is performed, the portion to which the ceramic powder adheres is not plated and solderability is improved. There was a problem of deterioration.

【0005】そこで本発明は、メッキの付着性を高める
ことを目的とするものである。
Therefore, the present invention aims to enhance the adhesion of plating.

【0006】[0006]

【課題を解決するための手段】そしてこの目的を達成す
るために本発明は、導電塗料の焼付け時において、メッ
キ下地電極上にメッキを行う金属と同一の金属粉末を介
在させて密に配列し焼付けることを特徴とする。
To achieve this object, according to the present invention, when a conductive coating material is baked, it is densely arranged on the plating base electrode with the same metal powder as the metal to be plated interposed. Characterized by baking.

【0007】[0007]

【作用】金属粉末はメッキ下地電極焼付け時にメッキ下
地電極同士の接触を防ぎ焼付け後のメッキ下地電極同士
のくっつきが防げる。またこの金属粉末はメッキ下地電
極上にメッキを行う金属と同一の金属粉末のため、金属
粉末がメッキ下地電極表面のGFと反応し、メッキ下地
電極表面に付着しても、その後のメッキ処理時、金属メ
ッキとの連続性が保て、ハンダ付け性能を保証すること
ができる。
[Function] The metal powder prevents contact between the plating undercoat electrodes during baking of the plating undercoat electrodes, and prevents sticking of the plating undercoat electrodes after baking. Also, since this metal powder is the same metal as the metal that is plated on the plating base electrode, even if the metal powder reacts with GF on the surface of the plating base electrode and adheres to the surface of the plating base electrode, the subsequent plating treatment , Continuity with metal plating can be maintained and soldering performance can be guaranteed.

【0008】[0008]

【実施例】以下積層セラミックコンデンサを例に説明す
る。
EXAMPLE A multilayer ceramic capacitor will be described below as an example.

【0009】図3は焼付けに用いる箱状の治具6とその
上に密に配列されたメッキ下地電極用導電塗料が塗布さ
れた積層セラミックコンデンサ7の平面図であり、円内
はその拡大図である。本発明による積層セラミックコン
デンサ7のメッキ下地電極焼付け方法は次の様である。
FIG. 3 is a plan view of a box-shaped jig 6 used for baking and a monolithic ceramic capacitor 7 on which a conductive paint for a plating undercoat electrode densely arranged is applied, in which an enlarged view is shown in a circle. Is. The method of baking the plating base electrode of the monolithic ceramic capacitor 7 according to the present invention is as follows.

【0010】まず、メッキ下地電極2塗布済の積層セラ
ミックコンデンサ10万個から20万個が充分に入る様
な箱を用意し、その箱の中にこの塗布済の積層セラミッ
クコンデンサ7を10万個から20万個入れ、その後メ
ッキ金属と同じニッケル粉末(平均粒径3〜4μm)を
積層セラミックコンデンサ1万個に対して約1g以上投
入する。1g以下ではメッキ下地電極2同士のくっつき
に対する効果は低下するので注意が必要である。その後
この箱を上下左右にニッケル粉末と塗布済の積層セラミ
ックコンデンサ7が充分に混合されるように振る。その
後積層セラミックコンデンサ7が落下せず、ニッケル粉
末のみが落下する様なふるいの上に、この箱から混合物
を取り出し、積層セラミックコンデンサ7に付着せず残
ったニッケルと積層セラミックコンデンサを分離する。
その後図3に示す様に治具6上にニッケル粉末が付着し
た積層セラミックコンデンサ7を密に配列し600℃か
ら800℃の温度にて約1時間焼付けを行う。
First, a box is prepared in which 100,000 to 200,000 of the monolithic ceramic capacitors coated with the plating base electrode 2 can be sufficiently stored, and 100,000 of the coated monolithic ceramic capacitors 7 are placed in the box. Then, 200,000 pieces of nickel powder (average particle diameter of 3 to 4 μm) same as the plated metal are put into 10,000 pieces of monolithic ceramic capacitors. It should be noted that the effect of sticking the plating base electrodes 2 to each other is reduced when the amount is 1 g or less. Thereafter, the box is shaken vertically and horizontally so that the nickel powder and the applied laminated ceramic capacitor 7 are sufficiently mixed. After that, the mixture is taken out of this box on a sieve in which the laminated ceramic capacitor 7 does not fall and only the nickel powder falls, and the nickel not remaining on the laminated ceramic capacitor 7 and the laminated ceramic capacitor are separated.
Thereafter, as shown in FIG. 3, the monolithic ceramic capacitors 7 having nickel powder adhered on the jig 6 are densely arranged and baked at a temperature of 600 ° C. to 800 ° C. for about 1 hour.

【0011】焼付けが終了した後、治具6と積層セラミ
ックコンデンサ7を分離する。この際積層セラミックコ
ンデンサ7のメッキ下地電極2同士のくっつきは認めら
れなかった。
After the baking is completed, the jig 6 and the monolithic ceramic capacitor 7 are separated. At this time, no sticking between the plating base electrodes 2 of the monolithic ceramic capacitor 7 was observed.

【0012】その後メッキ処理を行ったが確認の結果ニ
ッケルメッキの連続性は保たれており、ハンダ付け性能
においてもそれを保証することができた。
After that, a plating treatment was performed, but as a result of confirmation, the continuity of nickel plating was maintained, and it was possible to guarantee that in the soldering performance as well.

【0013】[0013]

【発明の効果】以上の様に本発明は、メッキ下地電極用
の導電塗料塗布済の電子部品本体に、メッキ下地電極と
同一の金属粉末を付着させて焼付けを行うことにより、
焼付け治具上に密に配列することが可能となり、生産性
の向上が図れる。またメッキの連続性が保てるためハン
ダ付け性能をそこなうことはない。
As described above, according to the present invention, the same metal powder as that of the plating base electrode is adhered to the electronic component body which has been coated with the conductive coating material for the plating base electrode, and baking is performed.
Since it is possible to arrange them densely on the baking jig, the productivity can be improved. Also, because the plating continuity can be maintained, the soldering performance is not compromised.

【図面の簡単な説明】[Brief description of drawings]

【図1】積層セラミックコンデンサの断面図FIG. 1 is a sectional view of a monolithic ceramic capacitor.

【図2】積層セラミックコンデンサのメッキ下地電極焼
付け後に発生するメッキ下地電極同士のくっつきを示す
平面図
FIG. 2 is a plan view showing sticking of the plating undercoat electrodes to each other after baking of the plating undercoat electrodes of the multilayer ceramic capacitor.

【図3】(a)は本発明の一実施例で、治具上に積層セ
ラミックコンデンサを密に配列した時の平面図 (b)は(a)のB部拡大平面図
FIG. 3A is an embodiment of the present invention, and is a plan view of a multilayer ceramic capacitor densely arranged on a jig. FIG. 3B is an enlarged plan view of a portion B of FIG. 3A.

【符号の説明】[Explanation of symbols]

2 メッキ下地電極 3 ニッケルメッキ 4 ハンダメッキ 6 治具 7 積層セラミックコンデンサ 2 Plating base electrode 3 Nickel plating 4 Solder plating 6 Jig 7 Multilayer ceramic capacitor

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 電子部品本体に導電塗料の焼付けによっ
てメッキ下地電極を形成する際に、導電塗料が被着され
た多数の電子部品を、メッキ下地電極上にメッキを行う
金属と同一の金属粉末を介在させ密に配列して焼付ける
ことを特徴とする電子部品のメッキ下地電極形成方法。
1. When forming a plating base electrode by baking a conductive paint on the body of an electronic component, a large number of electronic components coated with the conductive paint are plated with the same metal powder as the metal on which the plating base electrode is plated. A method of forming a plating base electrode for an electronic component, which comprises densely arranging and baking.
JP06182268A 1994-08-03 1994-08-03 Method for forming base electrode for plating electronic components Expired - Fee Related JP3092455B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP06182268A JP3092455B2 (en) 1994-08-03 1994-08-03 Method for forming base electrode for plating electronic components

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06182268A JP3092455B2 (en) 1994-08-03 1994-08-03 Method for forming base electrode for plating electronic components

Publications (2)

Publication Number Publication Date
JPH0845779A true JPH0845779A (en) 1996-02-16
JP3092455B2 JP3092455B2 (en) 2000-09-25

Family

ID=16115293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06182268A Expired - Fee Related JP3092455B2 (en) 1994-08-03 1994-08-03 Method for forming base electrode for plating electronic components

Country Status (1)

Country Link
JP (1) JP3092455B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006344820A (en) * 2005-06-09 2006-12-21 Tdk Corp Method of manufacturing ceramic electronic component

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006344820A (en) * 2005-06-09 2006-12-21 Tdk Corp Method of manufacturing ceramic electronic component
JP4618010B2 (en) * 2005-06-09 2011-01-26 Tdk株式会社 Manufacturing method of ceramic electronic component

Also Published As

Publication number Publication date
JP3092455B2 (en) 2000-09-25

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