JPH0839014A - Cleaning device - Google Patents
Cleaning deviceInfo
- Publication number
- JPH0839014A JPH0839014A JP6177346A JP17734694A JPH0839014A JP H0839014 A JPH0839014 A JP H0839014A JP 6177346 A JP6177346 A JP 6177346A JP 17734694 A JP17734694 A JP 17734694A JP H0839014 A JPH0839014 A JP H0839014A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- brush
- tank
- photomask
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 169
- 239000007788 liquid Substances 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 7
- 238000003825 pressing Methods 0.000 claims description 2
- 239000011521 glass Substances 0.000 abstract description 7
- 235000008733 Citrus aurantifolia Nutrition 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 abstract description 3
- 235000011941 Tilia x europaea Nutrition 0.000 abstract description 3
- 239000004571 lime Substances 0.000 abstract description 3
- 239000012530 fluid Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 description 7
- 230000003749 cleanliness Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 230000005587 bubbling Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical compound [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910021344 molybdenum silicide Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、フォトマスクや半導体
ウエハなどを洗浄する洗浄装置に関し、特に、ブラシス
クラブ洗浄により洗浄を行う洗浄装置のブラシ洗浄に適
用して有効な技術に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device for cleaning a photomask, a semiconductor wafer and the like, and more particularly to a technique effectively applied to brush cleaning of a cleaning device for cleaning by brush scrub cleaning.
【０００２】[0002]
【従来の技術】本発明者が検討したところによれば、ブ
ラシスクラブ洗浄を用いた洗浄装置において、ブラシそ
れ自体の洗浄は、洗浄液を満たした洗浄槽内でブラシを
回転させる方法、洗浄液を満たした洗浄槽内で清浄な空
気または炭酸ガスなどによりバブリングさせる方法や洗
浄液を満たした洗浄槽内で超音波を発生させ超音波洗浄
する方法などがある。2. Description of the Related Art According to a study conducted by the present inventor, in a cleaning apparatus using brush scrub cleaning, the cleaning of the brush itself is performed by a method of rotating the brush in a cleaning tank filled with the cleaning solution, There are a method of bubbling with clean air or carbon dioxide gas in the cleaning tank, a method of generating ultrasonic waves in the cleaning tank filled with the cleaning solution and ultrasonic cleaning.
【０００３】なお、これらのブラシそれ自体の洗浄方法
について詳しく説明してある例としては、それぞれ特開
昭５９−１９５６５０号公報、特開昭５９−１９５６５
１号公報および特公平１−９６２１号公報がある。Incidentally, examples of the methods for cleaning these brushes themselves are described in detail, for example, in JP-A-59-195650 and JP-A-59-19565.
There are Japanese Patent Publication No. 1 and Japanese Patent Publication No. 1-9621.
【０００４】[0004]
【発明が解決しようとする課題】ところが、上記のよう
なブラシそれ自体の洗浄技術では、次のような問題点が
あることが本発明者により見い出された。However, the present inventor has found that the above-mentioned cleaning technique for the brush itself has the following problems.
【０００５】すなわち、これらのブラシそれ自体の洗浄
方法では、ブラシの汚れを完全に落とすことが困難であ
り、たとえば、フォトマスクの洗浄時にブラシの汚れが
フォトマスクに付着してしまい、パターン欠陥などを発
生させてしまう恐れがある。That is, it is difficult to completely remove the stains on the brushes by the cleaning method of these brushes themselves. For example, the stains on the brushes adhere to the photomask when cleaning the photomask, resulting in pattern defects. May occur.
【０００６】また、バブリングによる洗浄では、バブリ
ング装置などが必要となり、超音波洗浄による洗浄で
は、超音波発生器などが必要となってしまい、洗浄装置
自体が高価となってしまう。Further, cleaning by bubbling requires a bubbling device and the like, and cleaning by ultrasonic cleaning requires an ultrasonic generator and the like, and the cleaning device itself becomes expensive.
【０００７】本発明の目的は、ブラシスクラブ洗浄を行
う洗浄装置において、ブラシそれ自体を確実に洗浄する
洗浄装置を提供することにある。An object of the present invention is to provide a cleaning device for cleaning brush itself in a cleaning device for brush scrub cleaning.
【０００８】本発明の前記ならびにその他の目的と新規
な特徴は、本明細書の記述および添付図面から明らかに
なるであろう。The above and other objects and novel features of the present invention will become apparent from the description of the present specification and the accompanying drawings.
【０００９】[0009]
【課題を解決するための手段】本願において開示される
発明のうち、代表的なものの概要を簡単に説明すれば、
以下のとおりである。Of the inventions disclosed in the present application, a representative one will be briefly described below.
It is as follows.
【００１０】すなわち、本発明の洗浄装置は、被洗浄物
を洗浄するブラシを洗浄する洗浄槽と、洗浄槽の下部に
設けられ、ブラシを洗浄する洗浄体と、ブラシを洗浄体
に圧接する移動手段と、ブラシを回転させる回転手段
と、洗浄槽内に洗浄液を注入する洗浄液供給手段とを設
け、洗浄液供給手段により洗浄液が絶えず満たされた洗
浄槽内の洗浄体に移動手段によってブラシを圧接させ、
回転手段によってブラシを回転させて洗浄するものであ
る。That is, the cleaning apparatus of the present invention has a cleaning tank for cleaning a brush for cleaning an object to be cleaned, a cleaning body provided under the cleaning tank, for cleaning the brush, and a movement for pressing the brush against the cleaning body. Means, a rotating means for rotating the brush, and a cleaning liquid supply means for injecting the cleaning liquid into the cleaning tank, and the brush is brought into pressure contact with the cleaning body in the cleaning tank constantly filled with the cleaning liquid by the cleaning liquid supply means by the moving means. ,
The rotating means cleans the brush by rotating it.
【００１１】また、本発明の洗浄装置は、洗浄槽それ自
体が、ブラシを洗浄する洗浄体となるものである。Further, in the cleaning apparatus of the present invention, the cleaning tank itself serves as a cleaning body for cleaning the brush.
【００１２】さらに、本発明の洗浄装置は、洗浄体が、
ブラシを痛めない低摩擦係数の材質よりなるものであ
る。Further, in the cleaning apparatus of the present invention, the cleaning body is
It is made of a material with a low coefficient of friction that does not damage the brush.
【００１３】[0013]
【作用】上記した本発明の洗浄装置によれば、洗浄液が
満たされている洗浄槽中において、ブラシを洗浄体に圧
接させながら回転させて洗浄することにより、効率よく
短時間でブラシに付着している異物を除去することがで
きる。According to the above-described cleaning apparatus of the present invention, in a cleaning tank filled with a cleaning liquid, the brush is rotated while being pressed against the cleaning body for cleaning, so that the brush efficiently adheres to the brush in a short time. Foreign substances that are present can be removed.
【００１４】また、上記した本発明の洗浄装置によれ
ば、洗浄体をブラシを痛めない低摩擦係数の材質にする
ことによって、ブラシを痛めることなく確実にブラシに
付着している異物を除去することができる。Further, according to the above-described cleaning apparatus of the present invention, the cleaning body is made of a material having a low friction coefficient that does not damage the brush, so that the foreign matter adhering to the brush can be reliably removed without damaging the brush. be able to.
【００１５】それによって、ブラシの清浄度が保たれ、
ブラシそれ自体の汚れによる被洗浄物への異物の再付着
がなくなり、製品の品質を向上することができる。As a result, the cleanliness of the brush is maintained,
It is possible to improve the quality of the product by eliminating the re-adhesion of foreign matter to the object to be cleaned due to the dirt of the brush itself.
【００１６】[0016]
【実施例】以下、本発明の実施例を図面に基づいて詳細
に説明する。Embodiments of the present invention will now be described in detail with reference to the drawings.
【００１７】（実施例１）図１は、本発明の実施例１に
よるフォトマスクを洗浄する洗浄装置における要部構成
図、図２（ａ）は、本発明の実施例１による洗浄装置に
おけるフォトマスク支持部の側面図、（ｂ）は、その平
面図、図３（ａ）は、本発明の実施例１による洗浄装置
におけるブラシ部の側面図、（ｂ）は、その底面図であ
る。(Embodiment 1) FIG. 1 is a schematic diagram of a main part of a cleaning apparatus for cleaning a photomask according to Embodiment 1 of the present invention, and FIG. 2A is a photo of the cleaning apparatus according to Embodiment 1 of the present invention. 3B is a side view of the mask support portion, FIG. 3B is a plan view thereof, FIG. 3A is a side view of the brush portion in the cleaning apparatus according to the first embodiment of the present invention, and FIG.
【００１８】本実施例１において、半導体装置の回路パ
ターン像が形成されているフォトマスク１を洗浄する洗
浄装置２には、フォトマスク１を搭載する搭載台３が設
けられている。In the first embodiment, the cleaning device 2 for cleaning the photomask 1 on which the circuit pattern image of the semiconductor device is formed is provided with the mounting table 3 on which the photomask 1 is mounted.
【００１９】この搭載台３のそれぞれのコーナ部には、
図２（ａ),（ｂ）に示すように、支持用ピン４が設けら
れ、この支持用ピン４によりフォトマスク１が固定され
る。At each corner of the mounting table 3,
As shown in FIGS. 2A and 2B, supporting pins 4 are provided, and the photomask 1 is fixed by the supporting pins 4.
【００２０】また、搭載台３の下面は円柱状からなる支
持体５に固定されており、この支持体５の下端は回転用
モータ６と連結されており、回転用モータ６を駆動する
ことによって搭載台３を回転させる。Further, the lower surface of the mounting table 3 is fixed to a columnar support 5, and the lower end of this support 5 is connected to a rotation motor 6, and the rotation motor 6 is driven to drive the rotation motor 6. Rotate the mounting table 3.
【００２１】さらに、搭載台３の斜め上側および斜め下
側には、フォトマスク１の洗浄中にフォトマスク１に対
して、たとえば、アルカリ性または中性の界面活性材や
超純水などの洗浄液を噴射する洗浄液ノズル７，７ａが
設けられている。Further, a cleaning liquid such as an alkaline or neutral surface-active material or ultrapure water is applied to the photomask 1 on the obliquely upper and lower sides of the mounting table 3 during the cleaning of the photomask 1. Cleaning liquid nozzles 7 and 7a for jetting are provided.
【００２２】また、搭載台３の側部には、フォトマスク
１を洗浄する、たとえば、ナイロン製のブラシ８を洗浄
するための洗浄槽９が設けられている。そして、洗浄槽
９の下部には、ブラシ８を洗浄する洗浄体１０が固定さ
れている。A cleaning tank 9 for cleaning the photomask 1, for example, a nylon brush 8, is provided on the side of the mounting table 3. A cleaning body 10 for cleaning the brush 8 is fixed to the lower part of the cleaning tank 9.
【００２３】この洗浄体１０は、たとえば、石英ガラ
ス、ライムソーダガラスや低膨張ガラスなどのガラス、
アルミニウム、ステンレスまたはセラミックスなどのブ
ラシ８を痛めることのない低摩擦係数の材質から構成さ
れている。The cleaning body 10 is made of, for example, quartz glass, lime soda glass, low expansion glass, or the like.
The brush 8 is made of a material such as aluminum, stainless steel or ceramics that does not damage the brush 8.
【００２４】また、洗浄体１０は、所定の基板表面にク
ロム膜やモリブデンシリサイド膜などの低摩擦係数の金
属膜をスパッタリングまたは蒸着などにより形成した構
成でもよい。The cleaning body 10 may have a structure in which a metal film having a low friction coefficient such as a chromium film or a molybdenum silicide film is formed on the surface of a predetermined substrate by sputtering or vapor deposition.
【００２５】さらに、洗浄槽９の上方には、洗浄槽９に
洗浄液を供給するための洗浄液ノズル（洗浄液供給手
段）７ｂが設けられている。また、洗浄槽９に供給され
る洗浄液は、フォトマスク１を洗浄する洗浄液と同じも
のである。Further, a cleaning liquid nozzle (cleaning liquid supply means) 7b for supplying the cleaning liquid to the cleaning tank 9 is provided above the cleaning tank 9. The cleaning liquid supplied to the cleaning tank 9 is the same as the cleaning liquid for cleaning the photomask 1.
【００２６】さらに、搭載台３と洗浄槽９との中間部の
位置には、上下移動モータ（移動手段）１１が設けられ
ており、この上下移動モータ１１は、支持体５ａの一方
の端部と連結しており、上下移動モータ１１を動作させ
ることにより支持体５ａを上下移動させることができ
る。Further, a vertical movement motor (moving means) 11 is provided at a position intermediate between the mounting table 3 and the cleaning tank 9, and the vertical movement motor 11 is provided at one end of the support 5a. The support 5a can be moved vertically by operating the vertical movement motor 11.
【００２７】また、支持体５ａの他方の端部は、回転用
モータ６ａと連結されており、この回転用モータ６ａは
支持体５ｂの一方の端部と固定されており、回転用モー
タ６ａにより回転させることができる。The other end of the support 5a is connected to a rotation motor 6a, and this rotation motor 6a is fixed to one end of the support 5b. It can be rotated.
【００２８】さらに、支持体５ｂの他方の端部は、回転
用モータ（回転手段）６ｂに固定されており、回転用モ
ータ６ｂと支持体５ｃの一方の端部とが連結されてお
り、回転用モータ６ｂを駆動することによって支持体５
ｃを所定の方向に回転させることができる。Further, the other end of the support 5b is fixed to a rotation motor (rotating means) 6b, and the rotation motor 6b and one end of the support 5c are connected to each other to rotate. Support 5 by driving motor 6b for
c can be rotated in a predetermined direction.
【００２９】また、支持体５ｃの他方の端部には、ブラ
シ支持台１２が固定されている。このブラシ支持台１２
には、図３（ａ),（ｂ）に示すように、フォトマスクの
洗浄を行うブラシ８が十字状に固定されている。A brush support 12 is fixed to the other end of the support 5c. This brush support 12
As shown in FIGS. 3A and 3B, a brush 8 for cleaning the photomask is fixed in a cross shape.
【００３０】次に、本実施例の作用について説明する。Next, the operation of this embodiment will be described.
【００３１】まず、洗浄液ノズル７ｂから絶えず洗浄液
が供給され、オーバーフロー状態となっている洗浄槽９
内にブラシ８を浸すために、回転用モータ６ａを動作さ
せ、ブラシ支持台１２を洗浄槽９上に移動させる。First, the cleaning liquid is constantly supplied from the cleaning liquid nozzle 7b, and the cleaning tank 9 is in an overflow state.
In order to immerse the brush 8 therein, the rotation motor 6a is operated to move the brush support 12 onto the cleaning tank 9.
【００３２】そして、上下移動モータ１１により支持体
５ａを下方向に移動させ、ブラシ８を洗浄槽９内に潜入
させ、ブラシ８と洗浄体１０とを圧接させる。Then, the support 5a is moved downward by the vertical movement motor 11, the brush 8 is submerged in the cleaning tank 9, and the brush 8 and the cleaning body 10 are brought into pressure contact with each other.
【００３３】次に、ブラシ８と洗浄体１０とが圧接した
状態で回転用モータ６ｂを駆動し、ブラシ支持台１２を
所定の時間だけ回転させ、ブラシ８の洗浄を行う。この
ブラシ８と洗浄体１０とを直接圧接させて、ブラシ８を
回転させることによりブラシ８に付着している異物の除
去を行う。Next, the brush 8 is cleaned by driving the rotation motor 6b while the brush 8 and the cleaning body 10 are in pressure contact with each other to rotate the brush support 12 for a predetermined time. The brush 8 and the cleaning body 10 are directly brought into pressure contact with each other, and the brush 8 is rotated to remove foreign matter adhering to the brush 8.
【００３４】そして、ブラシ８の洗浄が終了すると、回
転用モータ６ｂの作動を停止させ、上下移動モータ１１
により支持体５ａを上方向に移動させる。その後、回転
用モータ６ａを駆動することによって、支持体５ｂを回
転させ、フォトマスク１の洗浄を行う位置に移動させ
る。When the cleaning of the brush 8 is completed, the operation of the rotation motor 6b is stopped and the vertical movement motor 11 is operated.
The support 5a is moved upward by. Then, by driving the rotation motor 6a, the support 5b is rotated and moved to a position where the photomask 1 is cleaned.
【００３５】搭載台３上に搭載されたフォトマスク１
は、搭載台３のそれぞれのコーナ部に搭載台３の搭載面
と垂直に設けられた支持用ピン４により固定されてい
る。Photomask 1 mounted on mounting table 3
Are fixed to the respective corners of the mounting table 3 by supporting pins 4 provided perpendicularly to the mounting surface of the mounting table 3.
【００３６】そして、回転用モータ６を動作させ、フォ
トマスク１を搭載した搭載台３を所定の方向に回転させ
る。また、この時、洗浄液ノズル７，７ａからは洗浄液
が絶えず噴射されている。Then, the rotation motor 6 is operated to rotate the mounting table 3 on which the photomask 1 is mounted in a predetermined direction. At this time, the cleaning liquid is continuously ejected from the cleaning liquid nozzles 7 and 7a.
【００３７】次に、上下移動モータ１１によりブラシ８
を下方向に移動させ、フォトマスク１とブラシ８を圧接
させる。そして、その状態で回転用モータ６ｂも作動さ
せ、ブラシ８を回転させフォトマスク１の洗浄を行う。Next, the brush 8 is moved by the vertical movement motor 11.
Is moved downward, and the photomask 1 and the brush 8 are brought into pressure contact with each other. Then, in that state, the rotation motor 6b is also operated to rotate the brush 8 to clean the photomask 1.
【００３８】また、この時の搭載台３を回転させる回転
用モータ６とブラシ８を回転させる回転用モータ６ｂと
の回転は、それぞれ反対方向とする。At this time, the rotation motor 6 for rotating the mounting table 3 and the rotation motor 6b for rotating the brush 8 rotate in opposite directions.
【００３９】そして、フォトマスク１の洗浄が終了する
と、回転用モータ６，６ｂを停止させ、上下移動モータ
１１によって上方向にブラシ支持台１２を移動させる。When the cleaning of the photomask 1 is completed, the rotation motors 6 and 6b are stopped and the vertical movement motor 11 moves the brush support 12 upward.
【００４０】よって、各々のフォトマスク１の洗浄前に
ブラシ８の洗浄を行うことになり、これらの操作を繰り
返すことによってブラシ８の洗浄度を保持することがで
きる。Therefore, the brush 8 is cleaned before cleaning each photomask 1, and the cleaning degree of the brush 8 can be maintained by repeating these operations.
【００４１】それにより、本実施例１によれば、ブラシ
８を痛めることなく、フォトマスク１の洗浄を行う前
に、ブラシ８を洗浄体１０に圧接させながら回転させて
洗浄するので、ブラシ８の清浄度を確実に保持すること
ができる。Thus, according to the first embodiment, the brush 8 is rotated while being pressed against the cleaning body 10 before cleaning the photomask 1 without damaging the brush 8, and thus the brush 8 is cleaned. The cleanliness of can be reliably maintained.
【００４２】（実施例２）図４は、本発明の実施例２に
よるフォトマスクを洗浄する洗浄装置における要部構成
図である。(Embodiment 2) FIG. 4 is a schematic view of the essential parts of a cleaning apparatus for cleaning a photomask according to Embodiment 2 of the present invention.
【００４３】本実施例２においては、ブラシ８を洗浄す
る洗浄槽９ａそれ自体が、洗浄体１０（前記実施例１に
示す）と同一の材質により形成されるものである。In the second embodiment, the cleaning tank 9a itself for cleaning the brush 8 is made of the same material as the cleaning body 10 (shown in the first embodiment).
【００４４】この場合も、前記実施例１と同様に、たと
えば、石英ガラス、ライムソーダガラスや低膨張ガラス
などのガラス、アルミニウム、ステンレスまたはセラミ
ックスなどのブラシ８を痛めることのない低摩擦係数の
材質から構成されている。Also in this case, as in the first embodiment, for example, a material such as quartz glass, glass such as lime soda glass or low expansion glass, aluminum, stainless steel or ceramics having a low friction coefficient that does not damage the brush 8 is used. It consists of
【００４５】また、洗浄槽９ａの底部表面にクロム膜や
モリブデンシリサイド膜などの低摩擦係数の金属膜をス
パッタリングまたは蒸着などにより形成してもよい。A metal film having a low friction coefficient such as a chromium film or a molybdenum silicide film may be formed on the bottom surface of the cleaning tank 9a by sputtering or vapor deposition.
【００４６】ブラシ８の洗浄は、前記実施例１と同様
に、回転用モータ６ａおよび上下移動モータ１１によ
り、洗浄液ノズル７ｂから絶えず洗浄液が供給され、オ
ーバーフロー状態となっている洗浄槽９ａ内にブラシ８
を潜入させ、ブラシ８と洗浄槽９ａの底部とを圧接させ
る。As in the case of the first embodiment, the brush 8 is cleaned by continuously supplying the cleaning liquid from the cleaning liquid nozzle 7b by the rotating motor 6a and the vertical moving motor 11 into the cleaning tank 9a in the overflow state. 8
Is infiltrated, and the brush 8 and the bottom of the cleaning tank 9a are brought into pressure contact with each other.
【００４７】そして、ブラシ８と洗浄槽９ａとが圧接し
た状態で回転用モータ６ｂを所定の時間だけ回転させ、
ブラシ８の洗浄を行う。このブラシ８と洗浄槽９ａとを
直接圧接させて、ブラシ８を回転させることによりブラ
シ８に付着している異物を除去する。Then, the rotation motor 6b is rotated for a predetermined time while the brush 8 and the cleaning tank 9a are in pressure contact with each other,
The brush 8 is washed. The brush 8 and the cleaning tank 9a are directly brought into pressure contact with each other, and the brush 8 is rotated to remove foreign matters adhering to the brush 8.
【００４８】そして、ブラシ８の洗浄が終了すると、回
転用モータ６ｂの動作を停止させ、上下移動モータ１
１、回転用モータ６ａによりブラシ８をフォトマスク１
の洗浄位置まで移動させ、フォトマスク１の洗浄を行
う。よって、これらの操作を繰り返し行いブラシ８の清
浄度を保持する。When the cleaning of the brush 8 is completed, the operation of the rotation motor 6b is stopped and the vertical movement motor 1
1. Photomask 1 for brush 8 by rotation motor 6a
The photomask 1 is washed by moving it to the washing position. Therefore, these operations are repeated to maintain the cleanliness of the brush 8.
【００４９】それにより、本実施例２においても、ブラ
シ８を痛めることなく、フォトマスク１の洗浄を行う前
に、ブラシ８を洗浄槽９ａに圧接させながら回転させて
洗浄するので、ブラシ８の清浄度を確実に保持すること
ができる。As a result, also in the second embodiment, the brush 8 is rotated while being pressed against the cleaning tank 9a before cleaning the photomask 1 without damaging the brush 8. The cleanliness can be reliably maintained.
【００５０】以上、本発明者によってなされた発明を実
施例に基づき具体的に説明したが、本発明は前記実施例
に限定されるものではなく、その要旨を逸脱しない範囲
で種々変更可能であることはいうまでもない。Although the invention made by the present inventor has been specifically described based on the embodiments, the present invention is not limited to the embodiments, and various modifications can be made without departing from the scope of the invention. Needless to say.
【００５１】たとえば、本実施例１，２では、フォトマ
スク１を洗浄する洗浄装置２について記載したが、ブラ
シスクラブ洗浄により洗浄が行われる半導体ウエハ、半
導体素子が形成された半導体基板、磁気ディスク用ヘッ
ド、プリント基板および液晶ディスプレイなどの洗浄装
置におけるブラシまたは洗浄用スポンジの洗浄について
も効果は同様である。For example, in the first and second embodiments, the cleaning device 2 for cleaning the photomask 1 is described. However, a semiconductor wafer to be cleaned by brush scrub cleaning, a semiconductor substrate on which semiconductor elements are formed, a magnetic disk are used. The same effect can be obtained by cleaning a brush or a cleaning sponge in a cleaning device such as a head, a printed circuit board and a liquid crystal display.
【００５２】[0052]
【発明の効果】本願によって開示される発明のうち、代
表的なものによって得られる効果を簡単に説明すれば、
以下のとおりである。The effects obtained by the typical ones of the inventions disclosed in this application will be briefly described as follows.
It is as follows.
【００５３】（１）本発明によれば、洗浄液中におい
て、被洗浄物を洗浄するブラシを洗浄体に圧接させなが
ら回転させることによって、効率よく短時間でブラシに
付着している異物を除去することができる。(1) According to the present invention, in a cleaning liquid, a brush for cleaning an object to be cleaned is rotated while being pressed against a cleaning body to efficiently remove foreign matter adhering to the brush in a short time. be able to.
【００５４】（２）また、本発明では、洗浄体が、ブラ
シを痛めることのない低摩擦係数の材質またはブラシを
痛めることのない低摩擦係数の金属膜を形成した表面と
することによって確実にブラシに付着している異物をブ
ラシを痛めることなく除去することができる。(2) Further, according to the present invention, the cleaning body is surely made to be a material having a low friction coefficient which does not damage the brush or a surface on which a metal film having a low friction coefficient which does not damage the brush is formed. Foreign substances adhering to the brush can be removed without damaging the brush.
【００５５】（３）さらに、本発明においては、上記
（１),（２）により、ブラシの清浄度が保たれ、ブラシ
それ自体の汚れによる被洗浄物への異物の再付着がなく
なり、製品の品質を向上することができる。(3) Further, in the present invention, the cleanliness of the brush is maintained by the above (1) and (2), and the re-adhesion of foreign matter to the object to be cleaned due to the stain of the brush itself is eliminated, and the product Can improve the quality of.
【００５６】（４）また、本発明によれば、バブリング
装置や超音波発生器などが不要となり、洗浄装置のコス
トを低減することができる。(4) Further, according to the present invention, a bubbling device, an ultrasonic generator, etc. are not required, and the cost of the cleaning device can be reduced.
【図１】本発明の実施例１によるフォトマスクを洗浄す
る洗浄装置における要部構成図である。FIG. 1 is a configuration diagram of essential parts in a cleaning device for cleaning a photomask according to a first embodiment of the present invention.
【図２】（ａ）は、本発明の実施例１による洗浄装置に
おけるフォトマスク支持部の側面図、（ｂ）は、その平
面図である。2A is a side view of a photomask supporting portion in the cleaning apparatus according to the first embodiment of the present invention, and FIG. 2B is a plan view thereof.
【図３】（ａ）は、本発明の実施例１による洗浄装置に
おけるブラシ部の側面図、（ｂ）は、その底面図であ
る。FIG. 3A is a side view of a brush unit in the cleaning apparatus according to the first embodiment of the present invention, and FIG. 3B is a bottom view thereof.
【図４】本発明の実施例２によるフォトマスクを洗浄す
る洗浄装置における要部構成図である。FIG. 4 is a configuration diagram of a main part in a cleaning device for cleaning a photomask according to a second embodiment of the present invention.
１ フォトマスク ２ 洗浄装置 ３ 搭載台 ４ 支持用ピン ５ 支持体 ５ａ 支持体 ５ｂ 支持体 ５ｃ 支持体 ６ 回転用モータ ６ａ 回転用モータ ６ｂ 回転用モータ（回転手段） ７ 洗浄液ノズル ７ａ 洗浄液ノズル ７ｂ 洗浄液ノズル（洗浄液供給手段） ８ ブラシ ９ 洗浄槽 ９ａ 洗浄槽 １０ 洗浄体 １１ 上下移動モータ（移動手段） １２ ブラシ支持台 DESCRIPTION OF SYMBOLS 1 Photomask 2 Cleaning device 3 Mounting base 4 Supporting pin 5 Supporting body 5a Supporting body 5b Supporting body 5c Supporting body 6 Rotating motor 6a Rotating motor 6b Rotating motor (rotating means) 7 Cleaning liquid nozzle 7a Cleaning liquid nozzle 7b Cleaning liquid nozzle (Cleaning liquid supply means) 8 Brush 9 Cleaning tank 9a Cleaning tank 10 Cleaning body 11 Vertical movement motor (moving means) 12 Brush support base
───────────────────────────────────────────────────── フロントページの続き (72)発明者 原 睦美 東京都千代田区大手町二丁目６番２号 日 立電子エンジニアリング株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Mutsumi Hara 2-6-2 Otemachi 2-chome, Chiyoda-ku, Tokyo Hirtitsu Electronics Engineering Co., Ltd.
Claims (3)
洗浄する洗浄装置であって、前記被洗浄物を洗浄するブ
ラシを洗浄する洗浄槽と、前記洗浄槽の下部に設けら
れ、前記ブラシを洗浄する洗浄体と、前記ブラシを前記
洗浄体に圧接する移動手段と、前記ブラシを回転させる
回転手段と、前記洗浄槽内に洗浄液を注入する洗浄液供
給手段とを設け、前記移動手段により洗浄液が満たされ
た前記洗浄槽内の前記洗浄体と前記ブラシとを圧接さ
せ、前記回転手段によって前記ブラシを回転させて洗浄
することを特徴とする洗浄装置。1. A cleaning device for cleaning an object to be cleaned by brush scrub cleaning, comprising: a cleaning tank for cleaning a brush for cleaning the object to be cleaned; and a cleaning tank provided below the cleaning tank for cleaning the brush. A cleaning unit, a moving unit for pressing the brush against the cleaning unit, a rotating unit for rotating the brush, and a cleaning liquid supplying unit for injecting a cleaning liquid into the cleaning tank are provided, and the cleaning unit is filled with the cleaning liquid. A cleaning device, wherein the cleaning body and the brush in the cleaning tank are brought into pressure contact with each other, and the brush is rotated by the rotating means to perform cleaning.
ることを特徴とする請求項１記載の洗浄装置。2. The cleaning apparatus according to claim 1, wherein the cleaning tank itself is the cleaning body.
摩擦係数の材質よりなることを特徴とする請求項１また
は２記載の洗浄装置。3. The cleaning apparatus according to claim 1, wherein the cleaning body is made of a material having a low friction coefficient that does not damage the brush.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6177346A JPH0839014A (en) | 1994-07-29 | 1994-07-29 | Cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6177346A JPH0839014A (en) | 1994-07-29 | 1994-07-29 | Cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0839014A true JPH0839014A (en) | 1996-02-13 |
Family
ID=16029367
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6177346A Pending JPH0839014A (en) | 1994-07-29 | 1994-07-29 | Cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0839014A (en) |
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|---|---|---|---|---|
| KR100795622B1 (en) * | 2005-03-30 | 2008-01-17 | 다이닛뽕스크린 세이조오 가부시키가이샤 | Substrate treatment apparatus and substrate treatment method |
| JP2009224383A (en) * | 2008-03-13 | 2009-10-01 | Tokyo Electron Ltd | Substrate cleaning device, substrate cleaning method, and storage medium |
| JP2013210576A (en) * | 2012-03-30 | 2013-10-10 | Hoya Corp | Methods for manufacturing substrate, mask blank, mask for transfer, and reflective mask |
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| JP2015032756A (en) * | 2013-08-05 | 2015-02-16 | 東京エレクトロン株式会社 | Substrate cleaning device, and back cleaning method and cleaning mechanism of substrate |
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| JP2020053586A (en) * | 2018-09-27 | 2020-04-02 | 芝浦メカトロニクス株式会社 | Brush cleaning apparatus, substrate processing apparatus, and brush cleaning method |
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-
1994
- 1994-07-29 JP JP6177346A patent/JPH0839014A/en active Pending
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100795622B1 (en) * | 2005-03-30 | 2008-01-17 | 다이닛뽕스크린 세이조오 가부시키가이샤 | Substrate treatment apparatus and substrate treatment method |
| JP2009224383A (en) * | 2008-03-13 | 2009-10-01 | Tokyo Electron Ltd | Substrate cleaning device, substrate cleaning method, and storage medium |
| TWI423365B (en) * | 2008-03-13 | 2014-01-11 | Tokyo Electron Ltd | Coating, developing device, and coating and developing method |
| KR101389632B1 (en) * | 2008-03-13 | 2014-04-29 | 도쿄엘렉트론가부시키가이샤 | Coating-developing apparatus and coating-developing method |
| JP2013210576A (en) * | 2012-03-30 | 2013-10-10 | Hoya Corp | Methods for manufacturing substrate, mask blank, mask for transfer, and reflective mask |
| CN103506340A (en) * | 2012-06-29 | 2014-01-15 | 北京七星华创电子股份有限公司 | Spraying device |
| JP2015032756A (en) * | 2013-08-05 | 2015-02-16 | 東京エレクトロン株式会社 | Substrate cleaning device, and back cleaning method and cleaning mechanism of substrate |
| JP2017176978A (en) * | 2016-03-29 | 2017-10-05 | 王子ホールディングス株式会社 | Transportation component purifier, safety device for purifier and method for manufacturing web |
| JP2020053586A (en) * | 2018-09-27 | 2020-04-02 | 芝浦メカトロニクス株式会社 | Brush cleaning apparatus, substrate processing apparatus, and brush cleaning method |
| US11367629B2 (en) | 2019-01-30 | 2022-06-21 | Ebara Corporation | Cleaning apparatus of cleaning tool, substrate processing apparatus, and cleaning method of cleaning tool |
| KR102078554B1 (en) * | 2019-04-25 | 2020-02-19 | 윤여철 | Apparatus for collection waste oil of compressor |
| CN113118100A (en) * | 2019-12-31 | 2021-07-16 | 清华大学 | Wafer cleaning device and cleaning method |
| CN113118100B (en) * | 2019-12-31 | 2022-09-06 | 清华大学 | Wafer cleaning device and cleaning method |
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