JPH08311310A - Epoxy resin composition for sealing and semiconductor device using the same - Google Patents

Epoxy resin composition for sealing and semiconductor device using the same

Info

Publication number
JPH08311310A
JPH08311310A JP11944495A JP11944495A JPH08311310A JP H08311310 A JPH08311310 A JP H08311310A JP 11944495 A JP11944495 A JP 11944495A JP 11944495 A JP11944495 A JP 11944495A JP H08311310 A JPH08311310 A JP H08311310A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
group
organic functional
sealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP11944495A
Other languages
Japanese (ja)
Inventor
Chihiro Kuroda
千尋 黒田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP11944495A priority Critical patent/JPH08311310A/en
Publication of JPH08311310A publication Critical patent/JPH08311310A/en
Withdrawn legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE: To obtain an epoxy resin composition for sealing capable of protecting water penetration and excellent in moisture resistance by blending powdery silica obtained by treating with a specific surface treating agent and forming a thick coupling layer on the surface of the powdery silica. CONSTITUTION: This epoxy resin composition for sealing is constituted of powdery silica the surface of which is treated with (A) an epoxy resin (preferably a novolak-based epoxy resin, etc.), (B) a curing agent (preferable a phenolic resin such as a phenolic novolak resin, etc.) and (C) a produced material expressed by formula I [n is 1-3, R is CH3 or CH2 CH3 ; X is an organic functional group having vinyl, methacryl on the terminal] and obtained by heating plural silane coupling agents having different terminals of the organic functional groups. The component C, e.g. can be obtained by using 0.21 pt.wt. silicon compound of formula II having an epoxy on the terminal of the organic functional group as the silane coupling agent and 0.19 pt.wt. silicon compound of formula III having an amino on the terminal of the organic functional group, reacting the both silicon compounds by heating and dipping 84 pts.wt. powdery silica in the reaction product.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体素子等の封止に用
いられる封止用エポキシ樹脂組成物、及び、その組成物
を用いた半導体装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an encapsulating epoxy resin composition used for encapsulating semiconductor elements and the like, and a semiconductor device using the composition.

【0002】[0002]

【従来の技術】半導体素子を物理的、化学的に保護し、
且つ固着するための封止材料として、エポキシ樹脂、硬
化剤、及び、シリカ粉末を構成材料とするエポキシ樹脂
組成物が知られおり、これらエポキシ樹脂組成物で封止
した半導体装置が多用されている。近年、多様な使用方
法、及び生産性向上の要求に伴って、耐湿性の向上が求
められている。例えば、実装の際に、長期間湿度の高い
状態で保管された後に、半田に直接浸漬されるなど、急
激に高温下にさらされると、エポキシ樹脂組成物が硬化
した硬化物にクラックが発生し易い事態となっている。
2. Description of the Related Art A semiconductor element is physically and chemically protected,
As an encapsulating material for fixing, an epoxy resin composition containing an epoxy resin, a curing agent, and silica powder as constituent materials is known, and a semiconductor device encapsulated with these epoxy resin compositions is widely used. . 2. Description of the Related Art In recent years, there has been a demand for improved moisture resistance in accordance with various usage methods and demand for improved productivity. For example, during mounting, if the epoxy resin composition is rapidly exposed to high temperatures, such as being directly immersed in solder after being stored in a high humidity condition for a long time, cracks may occur in the cured product of the epoxy resin composition. It's an easy situation.

【0003】[0003]

【発明が解決しようとする課題】本発明は上述の事実に
鑑みてなされたもので、その目的とするところは、耐湿
性が優れた封止用エポキシ樹脂組成物、及び、この封止
用エポキシ樹脂組成物を用いた半導体装置を提供するこ
とにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above facts, and an object thereof is to provide a sealing epoxy resin composition having excellent moisture resistance, and this sealing epoxy. It is to provide a semiconductor device using a resin composition.

【0004】[0004]

【課題を解決するための手段】本発明の請求項1に係る
封止用エポキシ樹脂組成物は、エポキシ樹脂、硬化剤、
及び、表面処理したシリカ粉末を構成材料とする封止用
エポキシ樹脂組成物であって、上記シリカ粉末は、下記
一般式〔1〕で表された、有機官能基の末端基が異な
る、複数のシランカップリング剤どおしを加熱反応した
生成物で表面処理したものであることを特徴とする。
The epoxy resin composition for encapsulation according to claim 1 of the present invention is an epoxy resin, a curing agent,
And a sealing epoxy resin composition comprising a surface-treated silica powder as a constituent material, wherein the silica powder has a plurality of organic functional groups having different terminal groups represented by the following general formula [1]. It is characterized in that the silane coupling agent is surface-treated with a product obtained by reacting with heat.

【0005】[0005]

【化2】 Embedded image

【0006】〔式中、n=1、2、3を示し、Rは−C
3 ,−CH2 CH3 を示し、Xは末端基がビニル基、
メタクリル基、エポキシ基、アミノ基、メルカプト基の
いずれかを有する有機官能基を示す。〕 本発明の請求項2に係る半導体装置は、請求項1記載の
封止用エポキシ樹脂組成物で封止されてなることを特徴
とする。
[Wherein n = 1, 2, 3 is shown, and R is -C
H 3, shows a -CH 2 CH 3, X end group is a vinyl group,
An organic functional group having any one of a methacrylic group, an epoxy group, an amino group and a mercapto group is shown. A semiconductor device according to claim 2 of the present invention is characterized by being encapsulated with the epoxy resin composition for encapsulation according to claim 1.

【0007】以下、本発明を詳細に説明する。本発明の
封止用エポキシ樹脂組成物は、エポキシ樹脂、硬化剤、
及び、表面処理したシリカ粉末を構成材料とする。
Hereinafter, the present invention will be described in detail. The epoxy resin composition for sealing of the present invention is an epoxy resin, a curing agent,
Also, the surface-treated silica powder is used as a constituent material.

【0008】上記エポキシ樹脂としては、例えば、ビス
フェノールA系エポキシ樹脂、ビスフェノールF系エポ
キシ樹脂、ノボラック系エポキシ樹脂、ビフェニル型エ
ポキシ樹脂、脂環式エポキシ樹脂等が挙げられる。これ
らは単独、あるいは2種以上を併用して使用される。な
かでも、硬化物のガラス転移温度(Tg)が良好な点か
らノボラック系エポキシ樹脂、ビフェニル型エポキシ樹
脂が適している。
Examples of the epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin, biphenyl type epoxy resin and alicyclic epoxy resin. These may be used alone or in combination of two or more. Of these, novolac-based epoxy resins and biphenyl-type epoxy resins are suitable because the cured product has a good glass transition temperature (Tg).

【0009】上記硬化剤としては、例えば、フェノール
ノボラック樹脂、酸無水物、アミン類等が挙げられる。
これらは単独、あるいは2種以上を併用して使用され
る。なかでも、フェノールノボラック樹脂等のフェノー
ル樹脂が適している。なお、硬化剤の配合割合は特に制
限がなく、適宜選定すればよい。
Examples of the curing agent include phenol novolac resin, acid anhydrides, amines and the like.
These may be used alone or in combination of two or more. Of these, phenol resins such as phenol novolac resins are suitable. The mixing ratio of the curing agent is not particularly limited and may be appropriately selected.

【0010】本発明において、特徴的に用いられる表面
処理したシリカ粉末は、前記一般式〔1〕で表された、
有機官能基の末端基が異なる、複数のシランカップリン
グ剤どおしを加熱反応した生成物で表面処理したもので
ある。
The surface-treated silica powder characteristically used in the present invention is represented by the above general formula [1],
It is a product obtained by surface-treating a plurality of silane coupling agents having different organic functional group end groups with a product obtained by heating and reacting with each other.

【0011】上記複数のシランカップリング剤は有機官
能基の末端基が異なる。2種のシランカップリング剤を
用いる場合は、片方のシランカップリング剤は有機官能
基の末端基としてエポキシ基を有していれば、他方のシ
ランカップリング剤は有機官能基の末端基にエポキシ基
以外のビニル基、メタクリル基、アミノ基、メルカプト
基のいずれかを有している。この有機官能基の末端基が
異なるシランカップリング剤どおしを加熱反応すると、
重合し、分子量の大きな生成物を作製する。上記生成物
でシリカ粉末を表面処理すると、厚みの厚いカップリン
グ層がシリカ粉末の表面に形成されるため、水分の浸入
を抑えることができる。その結果、上記シリカ粉末を構
成材料としたエポキシ樹脂組成物の耐湿性が良好にな
る。
The plurality of silane coupling agents differ in the terminal groups of the organic functional groups. When two kinds of silane coupling agents are used, one silane coupling agent has an epoxy group as the terminal group of the organic functional group, and the other silane coupling agent has an epoxy group at the terminal group of the organic functional group. It has a vinyl group, a methacryl group, an amino group, or a mercapto group other than the group. When a silane coupling agent having a different end group of this organic functional group is heated and reacted,
Polymerize to make high molecular weight products. When the silica powder is surface-treated with the above product, a thick coupling layer is formed on the surface of the silica powder, so that infiltration of water can be suppressed. As a result, the moisture resistance of the epoxy resin composition containing the silica powder as a constituent material is improved.

【0012】上記有機官能基の末端基が異なるシランカ
ップリング剤の配合比は、有機官能基の末端基が等モル
となるよう配合することが好ましい。上記シランカップ
リング剤どおしの加熱反応の条件は、温度100℃〜1
50℃、時間0.5〜2時間が適している。温度が10
0℃未満で0.5時間より下まわると十分な生成物が得
られず、温度が150℃時間2時間を超えると、シラン
カップリング剤どおしの反応が進行しすぎ、生成物がシ
リカ粉末と十分に反応しなくなる恐れがある。上記シラ
ンカップリング剤として、具体的には、有機官能基の末
端基にエポキシ基を有するものとして下記構造式
〔2〕、〔3〕で表されるケイ素化合物が挙げられ、有
機官能基の末端基にアミノ基を有するものとして下記構
造式〔4〕、〔5〕で表されるケイ素化合物が挙げられ
る。
The compounding ratio of the silane coupling agents having different end groups of the organic functional groups is preferably such that the end groups of the organic functional groups are equimolar. The conditions for the heating reaction of the above silane coupling agent are a temperature of 100 ° C to 1
Suitable is 50 ° C. and time of 0.5 to 2 hours. Temperature is 10
When the temperature is lower than 0 ° C and lower than 0.5 hours, a sufficient product cannot be obtained, and when the temperature is higher than 150 ° C for 2 hours, the reaction with the silane coupling agent proceeds too much and the product is silica. May not fully react with powder. Specific examples of the silane coupling agent include silicon compounds represented by the following structural formulas [2] and [3] as those having an epoxy group at the terminal group of the organic functional group. Examples of those having an amino group as a group include silicon compounds represented by the following structural formulas [4] and [5].

【0013】[0013]

【化3】 Embedded image

【0014】[0014]

【化4】 [Chemical 4]

【0015】[0015]

【化5】 Embedded image

【0016】[0016]

【化6】 [Chemical 6]

【0017】本発明の封止用エポキシ樹脂組成物は、上
述のエポキシ樹脂、硬化剤、及び、表面処理したシリカ
粉末と共に、必要に応じて、硬化促進剤、染みだし防止
剤、難燃化剤、離型剤、着色剤等を適宜含有する。上記
硬化促進剤としては、第3級アミン、イミダゾール類、
有機リン化合物等が挙げられ、上記染みだし防止剤は成
形の際に樹脂の染みだしを防止するもので、シリコンオ
イル等が挙げられる。上記難燃化剤としては、三酸化ア
ンチモン、水和アルミナ等が挙げられ、上記離型剤とし
ては、天然カルナバ、ステアリン酸、ステアリン酸塩等
が挙げられ、上記着色剤としては、カーボンブラック、
金属酸化物等の顔料等が挙げられる。
The encapsulating epoxy resin composition of the present invention contains, as necessary, a curing accelerator, a bleeding inhibitor, and a flame retardant together with the above-mentioned epoxy resin, curing agent and surface-treated silica powder. , A release agent, a colorant and the like are appropriately contained. Examples of the curing accelerator include tertiary amines, imidazoles,
Organic phosphorus compounds and the like can be mentioned, and the above-mentioned exudation preventive agent prevents exudation of resin at the time of molding, and silicone oil and the like can be mentioned. Examples of the flame retardant include antimony trioxide, hydrated alumina and the like, examples of the release agent include natural carnauba, stearic acid, stearate and the like, and examples of the colorant include carbon black and
Examples include pigments such as metal oxides.

【0018】上述の配合成分をミキサ、ブレンダー等を
用いて均一に混合した後に、ニーダー、ロール等を用い
て混練してエポキシ樹脂組成物が得られる。なお、混練
した後に、必要に応じて冷却固化し、粉砕して粉状とし
たり、粒状にして用いられる。
After the above-mentioned components are uniformly mixed by using a mixer, a blender or the like, they are kneaded by using a kneader, a roll or the like to obtain an epoxy resin composition. After kneading, it is cooled and solidified if necessary, and pulverized into powder or granules for use.

【0019】上記封止用エポキシ樹脂組成物を用い、圧
縮成形、トランスファー成形、射出成形等のより、半導
体素子等を封止し、半導体装置が得られる。上記半導体
装置は、上記封止用エポキシ樹脂組成物で封止されてな
るので、水分の浸入が少ない。従って、耐湿性が優れ
る。
A semiconductor device is obtained by encapsulating a semiconductor element or the like by compression molding, transfer molding, injection molding or the like using the encapsulating epoxy resin composition. Since the semiconductor device is encapsulated with the encapsulating epoxy resin composition, it is less susceptible to water intrusion. Therefore, the moisture resistance is excellent.

【0020】[0020]

【作用】本発明の請求項1に係る封止用エポキシ樹脂組
成物は、前記一般式〔1〕で表された、有機官能基の末
端基が異なる、複数のシランカップリング剤を加熱反応
し、得られた分子量の大きな生成物で表面処理したシリ
カ粉末を構成材料とする。このため、上記シリカ粉末は
厚みの厚いカップリング層が形成されるので、水分の浸
入を抑えることができる。
The epoxy resin composition for encapsulation according to claim 1 of the present invention is obtained by heating and reacting a plurality of silane coupling agents represented by the general formula [1] with different organic functional end groups. The silica powder surface-treated with the obtained product having a large molecular weight is used as a constituent material. For this reason, since the silica powder forms a thick coupling layer, infiltration of water can be suppressed.

【0021】本発明の請求項2に係る半導体装置は、請
求項1記載の封止用エポキシ樹脂組成物で封止されてな
るので、水分の浸入が少ない。
Since the semiconductor device according to the second aspect of the present invention is encapsulated with the encapsulating epoxy resin composition according to the first aspect, moisture infiltration is small.

【0022】[0022]

【実施例】【Example】

実施例1 シリカ粉末を次のようにして表面処理した。シランカッ
プリング剤として、有機官能基の末端基にエポキシ基を
有する前記構造式〔2〕で表されるケイ素化合物0.2
1重量部(以下部と記す)と、有機官能基の末端基にア
ミノ基を有する前記構造式〔4〕で表されるケイ素化合
物0.19部を用い、100℃で2時間加熱反応を行っ
た。得られた生成物にシリカ粉末84部を浸漬し、表面
処理をした。
Example 1 The silica powder was surface-treated as follows. As the silane coupling agent, a silicon compound represented by the structural formula [2] having an epoxy group at the terminal group of the organic functional group 0.2
Using 1 part by weight (hereinafter referred to as “part”) and 0.19 part of the silicon compound represented by the above structural formula [4] having an amino group at the terminal group of the organic functional group, a heating reaction is performed at 100 ° C. for 2 hours. It was 84 parts of silica powder was dipped in the obtained product for surface treatment.

【0023】エポキシ樹脂組成物は次の配合で作製し
た。上記条件で得られた表面処理したシリカ粉末に、ビ
フェニル型エポキシ樹脂(油化シェル株式会社製:YX
4000H、エポキシ当量195)3.0部、ナフタレ
ン型エポキシ樹脂(大日本インキ株式会社製:EXA4
750、エポキシ当量182)4.5部、硬化剤として
フェノールノボラック樹脂(三井東圧化学株式会社製、
OH当量180)5.0部、硬化促進剤として2−エチ
ルイミダゾール0.1部、難燃化剤として三酸化アンチ
モン1.6部、染みだし防止剤としてシリコーンオイル
0.6部、離型剤として天然のカルナバ0.3部、着色
剤としてカーボンブラック0.5部を配合し、ミキサで
均一に混合した。その後、ニーダーで混練し、封止用エ
ポキシ樹脂組成物を得た。
The epoxy resin composition was prepared by the following formulation. The surface-treated silica powder obtained under the above conditions was mixed with a biphenyl type epoxy resin (Yuka Kabushiki Kaisha: YX
4000H, epoxy equivalent 195) 3.0 parts, naphthalene type epoxy resin (manufactured by Dainippon Ink and Chemicals: EXA4
750, epoxy equivalent 182) 4.5 parts, phenol novolac resin (manufactured by Mitsui Toatsu Chemicals Inc., as a curing agent,
OH equivalent 180) 5.0 parts, 2-ethylimidazole 0.1 part as a curing accelerator, antimony trioxide 1.6 parts as a flame retardant, silicone oil 0.6 part as a bleeding inhibitor, release agent As a colorant, 0.3 part of natural carnauba and 0.5 part of carbon black as a colorant were mixed and uniformly mixed with a mixer. Then, the mixture was kneaded with a kneader to obtain an epoxy resin composition for sealing.

【0024】実施例2 シランカップリング剤として、実施例1と同じものを用
い、120℃で1時間加熱反応を行った。得られた生成
物にシリカ粉末を浸漬し、表面処理をした以外は、実施
例1と同様にして封止用エポキシ樹脂組成物を得た。
Example 2 As the silane coupling agent, the same one as in Example 1 was used, and a heating reaction was carried out at 120 ° C. for 1 hour. An epoxy resin composition for encapsulation was obtained in the same manner as in Example 1, except that silica powder was dipped in the obtained product to perform surface treatment.

【0025】比較例1 シリカ粉末を次のようにして表面処理した。シランカッ
プリング剤として、有機官能基の末端基にエポキシ基を
有する前記構造式〔2〕で表されるケイ素化合物0.4
部を用い、シリカ粉末84部を浸漬し、表面処理をし
た。上記シリカ粉末を用いた以外は実施例1と同様にし
て封止用エポキシ樹脂組成物を得た。
Comparative Example 1 Silica powder was surface-treated as follows. As a silane coupling agent, a silicon compound represented by the above structural formula [2] having an epoxy group at the terminal group of an organic functional group 0.4
The surface treatment was performed by immersing 84 parts of silica powder. An epoxy resin composition for sealing was obtained in the same manner as in Example 1 except that the above silica powder was used.

【0026】比較例1 シリカ粉末を次のようにして表面処理した。シランカッ
プリング剤として、有機官能基の末端基にアミノ基を有
する前記構造式〔4〕で表されるケイ素化合物0.4部
を用い、シリカ粉末84部を浸漬し、表面処理をした。
上記シリカ粉末を用いた以外は実施例1と同様にして封
止用エポキシ樹脂組成物を得た。
Comparative Example 1 Silica powder was surface-treated as follows. As the silane coupling agent, 0.4 part of the silicon compound represented by the above structural formula [4] having an amino group at the terminal group of the organic functional group was used, and 84 parts of silica powder was dipped in the surface treatment.
An epoxy resin composition for sealing was obtained in the same manner as in Example 1 except that the above silica powder was used.

【0027】[0027]

【表1】 [Table 1]

【0028】得られた実施例1〜2、及び比較例1〜2
の封止用エポキシ樹脂組成物の耐湿性を評価した。耐湿
性は評価用サンプルを作製し、湿度の高い状態で長期間
保管した後に、半田に浸漬し、硬化物のクラックの発生
度合いで判定した。先ず、得られた封止用エポキシ樹脂
組成物をトランスファー成形機を用い成形し、半導体素
子等を封止した評価用サンプルを5個作製した。次に、
上記評価用サンプルを、温度120℃、湿度100%R
Hの雰囲気中に98時間保管した後に、温度240℃の
半田槽に30秒間浸漬した。硬化物を目視観察し、クラ
ック発生の有無を測定した。
The obtained Examples 1-2 and Comparative Examples 1-2
The moisture resistance of the encapsulating epoxy resin composition was evaluated. The moisture resistance was evaluated by making a sample for evaluation, storing it for a long time in a high humidity state, immersing it in solder, and then determining the degree of cracking of the cured product. First, the obtained epoxy resin composition for encapsulation was molded using a transfer molding machine to prepare five evaluation samples in which semiconductor elements and the like were encapsulated. next,
The above evaluation sample was tested at a temperature of 120 ° C. and a humidity of 100% R.
After being stored in an H 2 atmosphere for 98 hours, it was immersed in a solder bath at a temperature of 240 ° C. for 30 seconds. The cured product was visually observed and the presence or absence of cracks was measured.

【0029】クラック発生数は表2に示すとおり、実施
例1は0個、実施例2は1個であり、比較例1及び比較
例2は5個全てに発生していた。
As shown in Table 2, the number of cracks was 0 in Example 1, 1 in Example 2, and all 5 in Comparative Examples 1 and 2.

【0030】[0030]

【表2】 [Table 2]

【0031】[0031]

【発明の効果】本発明の請求項1記載の封止用エポキシ
樹脂組成物を用いると、厚みの厚いカップリング層を形
成しているので、水分の浸入が少ないため、耐湿性の優
れた封止層を得ることができる。
When the epoxy resin composition for encapsulation according to claim 1 of the present invention is used, since a thick coupling layer is formed, infiltration of water is small, and thus a sealing having excellent moisture resistance is obtained. A stop layer can be obtained.

【0032】本発明の請求項2記載の半導体装置は、上
記封止用エポキシ樹脂組成物で封止されてなるので、耐
湿性が良好である。
Since the semiconductor device according to the second aspect of the present invention is encapsulated with the encapsulating epoxy resin composition, it has good moisture resistance.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 エポキシ樹脂、硬化剤、及び、表面処理
したシリカ粉末を構成材料とする封止用エポキシ樹脂組
成物であって、上記シリカ粉末は、下記一般式〔1〕で
表された、有機官能基の末端基が異なる、複数のシラン
カップリング剤どおしを加熱反応した生成物で表面処理
したものであることを特徴とする封止用エポキシ樹脂組
成物。 【化1】 〔式中、n=1、2、3を示し、Rは−CH3 ,−CH
2 CH3 を示し、Xは末端基がビニル基、メタクリル
基、エポキシ基、アミノ基、メルカプト基のいずれかを
有する有機官能基を示す。〕
1. A sealing epoxy resin composition comprising an epoxy resin, a curing agent, and surface-treated silica powder as constituent materials, wherein the silica powder is represented by the following general formula [1]: An epoxy resin composition for encapsulation, which is obtained by surface-treating a plurality of silane coupling agents having different organic functional groups with each other by heating and reacting the products. Embedded image Wherein indicates n = 1, 2, 3, R is -CH 3, -CH
2 CH 3 and X represents an organic functional group whose terminal group has any one of a vinyl group, a methacrylic group, an epoxy group, an amino group and a mercapto group. ]
【請求項2】 請求項1記載の封止用エポキシ樹脂組成
物で封止されてなることを特徴とする半導体装置。
2. A semiconductor device which is encapsulated with the epoxy resin composition for encapsulation according to claim 1.
JP11944495A 1995-05-18 1995-05-18 Epoxy resin composition for sealing and semiconductor device using the same Withdrawn JPH08311310A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11944495A JPH08311310A (en) 1995-05-18 1995-05-18 Epoxy resin composition for sealing and semiconductor device using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11944495A JPH08311310A (en) 1995-05-18 1995-05-18 Epoxy resin composition for sealing and semiconductor device using the same

Publications (1)

Publication Number Publication Date
JPH08311310A true JPH08311310A (en) 1996-11-26

Family

ID=14761561

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11944495A Withdrawn JPH08311310A (en) 1995-05-18 1995-05-18 Epoxy resin composition for sealing and semiconductor device using the same

Country Status (1)

Country Link
JP (1) JPH08311310A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1595919A1 (en) * 2004-05-13 2005-11-16 Nitto Denko Corporation Epoxy resin composition for semiconductor encapsulation and semiconductor device using the same
CN100391995C (en) * 2004-05-13 2008-06-04 日东电工株式会社 Epoxy resin composition for semiconductor encapsulation and semiconductor device using the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1595919A1 (en) * 2004-05-13 2005-11-16 Nitto Denko Corporation Epoxy resin composition for semiconductor encapsulation and semiconductor device using the same
KR100774798B1 (en) * 2004-05-13 2007-11-07 닛토덴코 가부시키가이샤 Epoxy resin composition for semiconductor encapsulation and semiconductor device using the same
CN100391995C (en) * 2004-05-13 2008-06-04 日东电工株式会社 Epoxy resin composition for semiconductor encapsulation and semiconductor device using the same

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