JPH0823127A - Magnetoresistance element and manufacture - Google Patents

Magnetoresistance element and manufacture

Info

Publication number
JPH0823127A
JPH0823127A JP6153513A JP15351394A JPH0823127A JP H0823127 A JPH0823127 A JP H0823127A JP 6153513 A JP6153513 A JP 6153513A JP 15351394 A JP15351394 A JP 15351394A JP H0823127 A JPH0823127 A JP H0823127A
Authority
JP
Japan
Prior art keywords
glass
insulating layer
green sheet
resistor
ceramic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6153513A
Other languages
Japanese (ja)
Inventor
Koichi Ikemoto
浩一 池本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6153513A priority Critical patent/JPH0823127A/en
Publication of JPH0823127A publication Critical patent/JPH0823127A/en
Pending legal-status Critical Current

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  • Magnetic Heads (AREA)
  • Hall/Mr Elements (AREA)

Abstract

PURPOSE:To provide a magnetoresistance element that has a large resistance a small size and an element arranged nearest to and in parallel with a CONSTITUTION:A magnetoresistance element comprises an insulating layer 1 made of ceramic or glass, or compound of the glass and the ceramic, a conductor metallized layer 3 that is formed to connect between surfaces of the inside and outside or composing components at the inside or the outside of the insulating layer, a resistor of a predetermined shape formed on the surfaces of the inside or the outside of the insulating layer and a ferromagnetic thin film 2 of predetermined shape formed on the insulating material.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、磁界を作用させた時に
電気抵抗値が変化するという性質を利用して磁気の検
出、磁性体の存在や移動の検出を行なう磁気抵抗効果素
子及びその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention utilizes a property that an electric resistance value changes when a magnetic field is applied, to detect magnetism and to detect the presence or movement of a magnetic body and its manufacture. It is about the method.

【0002】[0002]

【従来の技術】近年の磁気抵抗効果素子では、消費電力
を小さくしたい、発熱量を小さくしたい等の目的で全体
の抵抗値を高くする必要がある場合、エレメント形状の
操作で対処がされている。具体的には例えば、強磁性体
膜厚を薄くすること、エレメント幅を細くすること、引
き回し数を増やす(エレメント長を大きくする)こと等
が行われている。
2. Description of the Related Art In recent magnetoresistive effect elements, when it is necessary to increase the overall resistance value for the purpose of reducing power consumption, reducing the amount of heat generation, etc., an element shape operation is used. . Specifically, for example, thinning the ferromagnetic film thickness, narrowing the element width, increasing the number of wirings (increasing the element length), and the like are performed.

【0003】[0003]

【発明が解決しようとする課題】しかしながら上記のよ
うな従来の構成では、以下4項目について制限が生じる
ため、別途抵抗体を付加しない場合には、全体抵抗値を
高くすることができないという問題があった。
However, in the conventional structure as described above, the following four items are limited, and therefore the total resistance value cannot be increased unless a resistor is added separately. there were.

【0004】1)磁気特性面、例えば近似式Hs=t/
w(Hs:飽和磁場,t:強磁性体膜厚,w:エレメン
ト幅)で表現できる飽和磁場に対して、エレメント幅を
細くすることに対する特性上の制限。2)物性値を得る
ことから来る強磁性体膜を薄くすることに対する制限。
3)素子のサイズと形状面から来るエレメント形成面積
を大きくすることに対する制限。4)フォトリソグラフ
ィー技術面から来るエレメント幅を細くすることに対す
る制限。
1) Magnetic characteristic surface, for example, approximate expression H s = t /
Limits on characteristics for reducing the element width with respect to a saturation magnetic field that can be expressed by w (H s : saturation magnetic field, t: ferromagnetic film thickness, w: element width). 2) Limitation on thinning the ferromagnetic film that comes from obtaining physical properties.
3) Limitation on increasing the element formation area that comes from the size and shape of the element. 4) Limitations on narrowing element widths coming from the photolithography side.

【0005】又、別途抵抗体を付加して高抵抗化を実現
した場合には、素子サイズが大きくなったり、エレメン
ト近傍に厚みの有る障害物が存在して素子を磁性体に最
も近接できず、かつ平行に設置できない構造になるとい
う問題があった。
In addition, when a high resistance is realized by adding a resistor separately, the element size becomes large and there is a thick obstacle near the element, so that the element cannot be closest to the magnetic body. Moreover, there is a problem that the structure cannot be installed in parallel.

【0006】本発明は上記課題に鑑み、サイズが小型で
あることと素子を磁性体に最も近傍かつ平行に設置でき
る特徴を有しながら、全体抵抗値が高い磁気抵抗効果素
子及びその製造方法を提供するものである。
In view of the above-mentioned problems, the present invention provides a magnetoresistive effect element having a high overall resistance value and a method of manufacturing the same, which is characterized in that it is small in size and that the element can be placed closest to and parallel to a magnetic body. It is provided.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するため
に本発明の磁気抵抗効果素子は、セラミック組成物また
はガラスもしくはガラスとセラミックの組成物からなる
絶縁層と、絶縁層の内部あるいは外表面上に形成された
所定の形状の抵抗体と、絶縁層表面に形成された所定の
形状の磁気抵抗効果薄膜と、この絶縁層の内部あるいは
外部に表裏面間及び各構成要素間を結ぶように形成され
た導体メタライズ層とで構成したものである。
In order to achieve the above object, the magnetoresistive effect element of the present invention comprises an insulating layer made of a ceramic composition or glass or a glass / ceramic composition, and the inner or outer surface of the insulating layer. A resistor having a predetermined shape formed on the upper surface, a magnetoresistive thin film having a predetermined shape formed on the surface of the insulating layer, and connecting the front and back surfaces and each component inside or outside of the insulating layer. It is composed of the formed conductor metallization layer.

【0008】また、本発明の製造方法は、セラミックま
たはガラスとセラミックの原料粉とバインダと可塑剤か
らなる生シートを作製する工程と、前記生シートにスル
ーホールを開口する工程と、前記生シートに導電ペース
トを印刷及びスルーホールに充填する工程と、前記生シ
ートに抵抗体ペーストを印刷する工程と、前記生シート
にガラスグレーズ用のガラスペーストを印刷する工程
と、前記生シートの複数板を張り合わせる工程と、前記
生シートを高温で焼成する工程と、得られた基板のガラ
スグレーズ面側に強磁性体の薄膜を形成する工程とを有
することを特徴とするものである。
Further, the manufacturing method of the present invention comprises the steps of producing a green sheet made of ceramic or glass, ceramic raw material powder, a binder and a plasticizer, a step of forming a through hole in the green sheet, and the green sheet. A step of printing a conductive paste on and filling the through holes, a step of printing a resistor paste on the green sheet, a step of printing a glass paste for glass glaze on the green sheet, and a plurality of plates of the green sheet. The method is characterized by including a step of laminating, a step of firing the green sheet at a high temperature, and a step of forming a thin film of a ferromagnetic material on the glass glaze surface side of the obtained substrate.

【0009】[0009]

【作用】この構成によれば、素子面には障害物は存在せ
ず、また、素子の二次元サイズ(面的広さ)を大きくせ
ず、また、厚み方向の基板内部及び素子裏面に別途抵抗
体を形成接続して全体抵抗値を高く調整できるために、
サイズが小型であることと素子を磁性体に最も近接かつ
平行に設置できる特徴を有しながら、全体抵抗値が高い
磁気抵抗効果素子が実現できる。
According to this structure, there are no obstacles on the device surface, the two-dimensional size (planar width) of the device is not increased, and the inside of the substrate in the thickness direction and the back surface of the device are separately provided. In order to adjust the overall resistance value by forming and connecting resistors,
It is possible to realize a magnetoresistive effect element having a high overall resistance value, while having a feature that the size is small and the element can be placed closest to and parallel to a magnetic body.

【0010】[0010]

【実施例】以下、本発明の第1の実施例の磁気抵抗効果
素子、及びその製造方法について図面を参照しながら説
明する。図1は本発明の第1の実施例における磁気抵抗
効果素子の上面図、図2は断面図、図3は下面図であ
る。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A magnetoresistive effect element according to a first embodiment of the present invention and a method of manufacturing the same will be described below with reference to the drawings. 1 is a top view of a magnetoresistive effect element according to a first embodiment of the present invention, FIG. 2 is a sectional view, and FIG. 3 is a bottom view.

【0011】図1,2,3において、1はセラミック組
成物またはガラスもしくはガラスとセラミックの組成物
からなる絶縁層、2は磁気抵抗効果をもつ強磁性体薄
膜、3は導体メタライズ層、4は抵抗体、5は電流供給
端子(+)、6はGND、7,8は出力端子(中間端
子)である。
1, 2 and 3, 1 is an insulating layer made of a ceramic composition or glass or a composition of glass and ceramics, 2 is a ferromagnetic thin film having a magnetoresistive effect, 3 is a conductor metallized layer, and 4 is Resistors 5 are current supply terminals (+), 6 are GND, and 7 and 8 are output terminals (intermediate terminals).

【0012】本発明の第1の実施例の磁気抵抗効果素子
は、ガラスとセラミック、例えば、ほう珪酸ガラスとア
ルミナを主成分とする基板の上にほう珪酸鉛系ガラスが
形成された絶縁層1の上に、ニッケル、鉄、コバルトの
うち一種以上を主成分とする、例えば、パーマロイから
なるストライプを折り返したような形状の強磁性体薄膜
2が形成され、基板の内部と裏面には、例えば、所望の
抵抗値に合わせた形状の酸化ルテニウム系の抵抗体4が
形成されている。絶縁層1の内部と表裏面上に、例え
ば、銀:パラジウムの比が80:20の導体メタライズ
層3が強磁性体薄膜2と抵抗体4を電気的に直列に接続
して形成され、特に裏面電極部は入出力端子となってい
る。エレメント形状面で、引き回し部を削除して小型化
も実現している。素子サイズは4.5×3.5(mm)で
ある。
The magnetoresistive effect element according to the first embodiment of the present invention is an insulating layer 1 in which lead borosilicate glass is formed on a substrate containing glass and ceramics such as borosilicate glass and alumina as main components. A ferromagnetic thin film 2 containing at least one of nickel, iron, and cobalt as a main component and having a shape like a folded stripe made of permalloy, for example, is formed on the top surface of the substrate. A ruthenium oxide-based resistor 4 having a shape adapted to a desired resistance value is formed. For example, a conductor metallization layer 3 having a silver: palladium ratio of 80:20 is formed inside the insulating layer 1 and on the front and back surfaces by electrically connecting the ferromagnetic thin film 2 and the resistor 4 in series. The back electrode part serves as an input / output terminal. In terms of the element shape, the routing part has been eliminated to achieve downsizing. The element size is 4.5 × 3.5 (mm).

【0013】図4に本発明の第2の実施例の磁気抵抗効
果素子の上面図、図5に同断面図、図6に同下面図を示
す。
FIG. 4 is a top view of the magnetoresistive effect element according to the second embodiment of the present invention, FIG. 5 is a sectional view of the same, and FIG. 6 is a bottom view of the same.

【0014】尚、導体メタライズ層3と抵抗体4の積層
数は欲しい抵抗値に合わせて増やすことができる。
The number of laminated layers of the conductor metallized layer 3 and the resistor 4 can be increased according to the desired resistance value.

【0015】導体メタライズ層3は上記の銀:パラジウ
ムの比が80:20のもの以外にも、その組成比が異な
るもの、例えば銀や金の単体でもかまわない。
The conductor metallized layer 3 may have a different composition ratio other than the above-mentioned silver: palladium ratio of 80:20, for example, silver or gold alone.

【0016】抵抗体4の接続箇所は欲しい抵抗値に合わ
せて可変である。一例として、図7に本発明の第1の実
施例の磁気抵抗効果素子の場合の等価回路を示す。
The connection point of the resistor 4 can be changed according to the desired resistance value. As an example, FIG. 7 shows an equivalent circuit in the case of the magnetoresistive effect element according to the first embodiment of the present invention.

【0017】次に、本発明の第2の実施例の製造方法に
つい説明する。ほう珪酸ガラス粉末とアルミナ粉末を重
量比で60対40となるように配合して無機成分とし、
有機バインダとしてポリビニルブチラール、ポリビニル
アルコール等、可塑剤としてジブチルフタレート(DB
P)、溶剤としてトルエンとエタノールの混合液(60
対40比)を無機成分100部、有機バインダ5部、ジ
ブチルフタレート(DBP)10部、トルエンとエタノ
ール30部の割合で混合し、湿式微粉砕を行ってスラリ
ーとした後、真空脱気処理によりスラリーから気泡を除
去し、粘度調整を行った。スラリーをドクターブレード
を用いてポリエステル支持体上に塗布し、炉を通して乾
燥し、0.3ミリの厚さのグリーンシートを作製した。
グリーンシートを支持体より取り外すと共に、パンチン
グにより開口してスルーホールを形成し、例えば銀:パ
ラジウムの比が80:20である導体ペーストをスルー
ホール内に充填し、さらに、表裏面上にパターンを印刷
して乾燥し、さらにシート抵抗が10〜1MΩとなる量
のルテニウム系グレーズ抵抗膜のペーストを所望の抵抗
値に合わせて印刷し乾燥して2種類以上のシートを用意
した。さらに、所望の抵抗値分のシートを重ね、70
℃,100kg/cm2で圧着し張り合わせた。シートの表
面側にガラスグレーズ用のガラスペーストを所定パター
ンに印刷し乾燥した。次に、850〜900℃でインア
ウト1時間保持した後、定温にて取り出した。次に、得
られた基板を真空蒸着機に設置し、所定の真空度に排気
した後、基板表面にパーマロイを0.1μmの厚さで蒸
着し、レジスト塗布、露光、現像、エッチング、レジス
ト剥離を経て、幅が10μmのパーマロイがストライプ
を折り返したような形状の感磁パターンを得た。所定の
チップサイズに基板を分割した後、裏面電極にリードを
取り付けた。リード接続には半田付け、ワイヤボンド、
バンプ等が行える。
Next, the manufacturing method of the second embodiment of the present invention will be explained. Borosilicate glass powder and alumina powder are blended in a weight ratio of 60:40 to form an inorganic component,
Polyvinyl butyral, polyvinyl alcohol, etc. as organic binder, dibutyl phthalate (DB
P), a mixed solution of toluene and ethanol as a solvent (60
(A ratio of 40) is mixed with 100 parts of an inorganic component, 5 parts of an organic binder, 10 parts of dibutyl phthalate (DBP), and 30 parts of toluene and ethanol, and wet pulverization is performed to form a slurry, followed by vacuum deaeration treatment. Bubbles were removed from the slurry and the viscosity was adjusted. The slurry was coated on a polyester support using a doctor blade and dried in an oven to prepare a green sheet having a thickness of 0.3 mm.
While removing the green sheet from the support, the through hole is formed by punching to form a through hole. For example, a conductor paste having a silver: palladium ratio of 80:20 is filled in the through hole, and a pattern is formed on the front and back surfaces. Two or more types of sheets were prepared by printing, drying, and then printing a paste of a ruthenium-based glaze resistance film in an amount such that the sheet resistance was 10 to 1 MΩ in accordance with a desired resistance value and drying. Further, stack the sheets for the desired resistance value, and
Bonded by pressure bonding at 100 kg / cm 2 . A glass paste for glass glaze was printed on the surface side of the sheet in a predetermined pattern and dried. Next, after holding in / out at 850 to 900 ° C. for 1 hour, the product was taken out at a constant temperature. Next, the obtained substrate is placed in a vacuum vapor deposition machine, and after evacuation to a predetermined vacuum degree, permalloy is vapor-deposited to a thickness of 0.1 μm on the substrate surface, resist coating, exposure, development, etching, and resist stripping. After that, a magneto-sensitive pattern having a shape in which permalloy having a width of 10 μm was folded back to form a stripe was obtained. After dividing the substrate into a predetermined chip size, a lead was attached to the back surface electrode. For lead connection, soldering, wire bond,
You can make bumps, etc.

【0018】エレメント以外の付加抵抗値として、10
〜900MΩを得ることができた。以上のように構成さ
れた磁気抵抗効果素子について、従来例の磁気抵抗効果
素子の感磁部を同様にして、素子の全体抵抗値の比較を
行なった。具体的には以下図4〜6と次に述べる図8の
比較である。
As an additional resistance value other than the elements, 10
It was possible to obtain ˜900 MΩ. With respect to the magnetoresistive effect element configured as described above, the magnetoresistance effect element of the conventional example was used in the same manner as in the magnetic sensitive section, and the overall resistance values of the elements were compared. Specifically, a comparison between FIGS. 4 to 6 and FIG. 8 described below is made.

【0019】比較の為の従来例の磁気抵抗効果素子を説
明する。図8はその上面図である。図8において、11
は絶縁基板、12は強磁性体薄膜、13は電流供給端子
(+)、14はGND、15,16は出力端子(中間端
子)である。
A conventional magnetoresistive element for comparison will be described. FIG. 8 is a top view thereof. In FIG. 8, 11
Is an insulating substrate, 12 is a ferromagnetic thin film, 13 is a current supply terminal (+), 14 is GND, and 15 and 16 are output terminals (intermediate terminals).

【0020】抵抗は13−14間の測定値である。従来
例では平均1.1KΩであったが、本発明品では平均
3.8MΩとなった。素子サイズは5.0×4.5(m
m)である。
Resistance is a measurement between 13-14. In the conventional example, the average was 1.1 KΩ, but in the product of the present invention, the average was 3.8 MΩ. Element size is 5.0 × 4.5 (m
m).

【0021】以上より明らかなように、本発明の磁気抵
抗効果素子は、1)サイズが従来例より小型である。
2)素子面を磁性体に最近接かつ平行に設置できる構造
であるる。3)全体抵抗値が従来例より、大きくかつそ
の設定できる範囲も広いことがわかる。
As is clear from the above, the magnetoresistive effect element of the present invention is 1) smaller in size than the conventional example.
2) The structure is such that the element surface can be placed closest to and parallel to the magnetic body. 3) It can be seen that the total resistance value is larger than that of the conventional example and the setting range thereof is wider.

【0022】以上のように本実施例によれば、エレメン
ト形状の操作のみによって全体抵抗値を得るのではな
く、また素子面に別途スペースと抵抗体を設けるという
構成ではなく、従来のエレメントのみからなる素子と同
等の形状において基板内に別途抵抗体を接続して希望の
高抵抗を得るという構成であるため、小型化と素子面の
平坦化と高抵抗化を全て満足する事ができないという従
来課題に対し、1)調整用抵抗体形成のためのスペース
が不要であるので小型化ができる、2)素子面の障害物
が無いので素子を磁性体に最も近接、かつ平行に設置で
きる、3)抵抗調整により高抵抗化できる、の3点全て
を満足する磁気抵抗効果素子が実現できた。
As described above, according to this embodiment, the entire resistance value is not obtained only by operating the element shape, and the space and the resistor are not separately provided on the element surface, but only the conventional element is used. Since it has a configuration in which a resistor is separately connected to the substrate in the same shape as the element to obtain the desired high resistance, it is not possible to satisfy all the requirements for downsizing, flattening of the element surface and high resistance. In order to solve the problem, 1) space is not required for forming the adjusting resistor, so that the size can be reduced. 2) Since there is no obstacle on the element surface, the element can be placed closest to and parallel to the magnetic body. ) It was possible to realize a magnetoresistive effect element satisfying all three points that the resistance can be increased by adjusting the resistance.

【0023】[0023]

【発明の効果】以上のように本発明によれば、エレメン
ト形状の操作によって全体抵抗値を得るのではなく、ま
た素子面に別途スペースと抵抗体を設けるという構成で
はなく、従来のエレメントのみからなる素子と同等の形
状において基板内に別途抵抗体を接続して希望の高抵抗
を得るという構成であるため、小型化と素子面の平坦化
と高抵抗化を全て満足する事ができないという従来課題
に対し、1)調整用抵抗体形成のためのスペースが不要
であるので小型化ができる、2)素子面の障害物が無い
ので素子を磁性体に最も近接、かつ平行に設置できる、
3)抵抗調整により高抵抗化できる、の3点全てを満足
する磁気抵抗効果素子が実現できるものである。
As described above, according to the present invention, the total resistance value is not obtained by manipulating the element shape, and a structure in which a space and a resistor are separately provided on the element surface is used. Since it has a configuration in which a resistor is separately connected to the substrate in the same shape as the element to obtain the desired high resistance, it is not possible to satisfy all the requirements for downsizing, flattening of the element surface and high resistance. In order to solve the problem, 1) the space for forming the adjusting resistor is not required, so that the size can be reduced. 2) Since there is no obstacle on the element surface, the element can be placed closest to and parallel to the magnetic body.
3) It is possible to realize a magnetoresistive effect element satisfying all three points that the resistance can be increased by adjusting the resistance.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例の磁気抵抗効果素子の上
面図
FIG. 1 is a top view of a magnetoresistive effect element according to a first embodiment of the present invention.

【図2】同磁気抵抗効果素子の断面図FIG. 2 is a sectional view of the magnetoresistive effect element.

【図3】同磁気抵抗効果素子の下面図FIG. 3 is a bottom view of the magnetoresistive effect element.

【図4】本発明の第2の実施例の磁気抵抗効果素子の上
面図
FIG. 4 is a top view of a magnetoresistive effect element according to a second embodiment of the present invention.

【図5】同磁気抵抗効果素子の断面図FIG. 5 is a sectional view of the magnetoresistive effect element.

【図6】同磁気抵抗効果素子の下面図FIG. 6 is a bottom view of the magnetoresistive effect element.

【図7】本発明の第1の実施例の磁気抵抗効果素子の等
価回路図
FIG. 7 is an equivalent circuit diagram of the magnetoresistive effect element according to the first embodiment of the present invention.

【図8】従来の強磁性体薄膜だけからなる磁気抵抗効果
素子の上面図
FIG. 8 is a top view of a conventional magnetoresistive effect element composed only of a ferromagnetic thin film.

【符号の説明】[Explanation of symbols]

1 絶縁層 2 磁気抵抗効果薄膜 3 導体メタライズ層 4 抵抗体 1 Insulating Layer 2 Magnetoresistive Thin Film 3 Conductor Metallization Layer 4 Resistor

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 セラミック組成物またはガラスもしくは
ガラスとセラミックの組成物からなる絶縁層と、この絶
縁層の内部あるいは外表面上に形成された所定の形状の
抵抗体と、前記絶縁層表面に形成された所定の形状の磁
気抵抗効果薄膜と、前記絶縁層の内部あるいは外部に
て、前記抵抗体及び前記磁気抵抗効果薄膜及び前記絶縁
層の表裏面間を結ぶように形成された導体メタライズ層
とを有する磁気抵抗効果素子。
1. An insulating layer made of a ceramic composition or glass or a composition of glass and ceramic, a resistor having a predetermined shape formed inside or on the outer surface of the insulating layer, and formed on the surface of the insulating layer. A magnetoresistive thin film having a predetermined shape, and a conductor metallized layer formed inside or outside the insulating layer so as to connect the front and back surfaces of the resistor, the magnetoresistive thin film, and the insulating layer. And a magnetoresistive effect element.
【請求項2】 セラミックまたはガラスとセラミックの
原料粉とバインダと可塑剤からなる生シートを作製する
工程と、前記生シートにスルーホールを開口する工程
と、前記生シートに導電ペーストを印刷及びスルーホー
ルに充填する工程と、前記生シートに抵抗体ペーストを
印刷する工程と、前記生シートにガラスグレーズ用のガ
ラスペーストを印刷する工程と、前記生シートの複数板
を張り合わせる工程と、前記生シートと前記に掲げる工
程によって印刷及び充填した物を高温で焼成する工程
と、前記焼成によって得られた基板のガラスグレーズ面
上に磁気抵抗効果薄膜を形成し所定形状の感磁部となす
工程とを有することを特徴とする磁気抵抗効果素子の製
造方法。
2. A step of producing a green sheet made of ceramic or glass, a ceramic raw material powder, a binder, and a plasticizer; a step of forming a through hole in the green sheet; and a step of printing a conductive paste on the green sheet. Filling the holes, printing a resistor paste on the green sheet, printing a glass paste for glass glaze on the green sheet, laminating a plurality of green sheets, the green sheet A step of baking the sheet and the printed and filled material by the steps listed above at a high temperature, and a step of forming a magnetoresistive thin film on the glass glaze surface of the substrate obtained by the baking to form a magnetic sensitive part of a predetermined shape, A method of manufacturing a magnetoresistive effect element, comprising:
JP6153513A 1994-07-05 1994-07-05 Magnetoresistance element and manufacture Pending JPH0823127A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6153513A JPH0823127A (en) 1994-07-05 1994-07-05 Magnetoresistance element and manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6153513A JPH0823127A (en) 1994-07-05 1994-07-05 Magnetoresistance element and manufacture

Publications (1)

Publication Number Publication Date
JPH0823127A true JPH0823127A (en) 1996-01-23

Family

ID=15564187

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6153513A Pending JPH0823127A (en) 1994-07-05 1994-07-05 Magnetoresistance element and manufacture

Country Status (1)

Country Link
JP (1) JPH0823127A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0418778A (en) * 1990-05-11 1992-01-22 Sony Magnescale Inc Magnetoresistive device
JPH0573974B2 (en) * 1987-12-24 1993-10-15 Sharp Kk
JPH0689801A (en) * 1992-09-09 1994-03-29 Nec Corp Chip type resistor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0573974B2 (en) * 1987-12-24 1993-10-15 Sharp Kk
JPH0418778A (en) * 1990-05-11 1992-01-22 Sony Magnescale Inc Magnetoresistive device
JPH0689801A (en) * 1992-09-09 1994-03-29 Nec Corp Chip type resistor

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