JPH0820758A - Adhesive - Google Patents

Adhesive

Info

Publication number
JPH0820758A
JPH0820758A JP15323594A JP15323594A JPH0820758A JP H0820758 A JPH0820758 A JP H0820758A JP 15323594 A JP15323594 A JP 15323594A JP 15323594 A JP15323594 A JP 15323594A JP H0820758 A JPH0820758 A JP H0820758A
Authority
JP
Japan
Prior art keywords
core
shell
particles
conductive adhesive
adhesive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP15323594A
Other languages
Japanese (ja)
Inventor
Eiji Horikoshi
英二 堀越
Hitoaki Date
仁昭 伊達
Makoto Usui
誠 臼居
Katsuhide Natori
勝英 名取
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15323594A priority Critical patent/JPH0820758A/en
Publication of JPH0820758A publication Critical patent/JPH0820758A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29199Material of the matrix
    • H01L2224/2929Material of the matrix with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29299Base material
    • H01L2224/293Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/8119Arrangement of the bump connectors prior to mounting
    • H01L2224/81191Arrangement of the bump connectors prior to mounting wherein the bump connectors are disposed only on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/8385Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
    • H01L2224/83851Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester being an anisotropic conductive adhesive
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives

Landscapes

  • Connections Effected By Soldering, Adhesion, Or Permanent Deformation (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

PURPOSE:To obtain a conductive adhesive suitable for bonding electronic components to a circuit board by adding a conductive filler which is composed of a core and a shell and in which the hardness of the core is higher than that of the shell, and the resistivity of the shell is lower than that of the core to an adhesive. CONSTITUTION:An adhesive prepared by adding a filler to an adhesive. The filler is the one which is composed of a core and a shell surrounding the core and in which the hardness of the core is higher than that of the shell, while the resistivity of the core is lower than that of the core. Because the resistivity of the conductive filler is low, this adhesive can give a bond having a resistance lower than the conventional one between, for example, a bump and a pad. Further, because the conductive filler has sufficient hardness, the bond does not collapse even when a stress is exerted thereon, and the electrical resistance between, for example, a bump and a pad can be long kept at the initial value. Therefore, it is possible to bond electronic components with a reliability better than the conventional.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は接着材に係り、特に電子
部品の接合に用いる導電性接着材に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an adhesive material, and more particularly to a conductive adhesive material used for joining electronic parts.

【0002】近年、導電性接着材は半田に代わる電子部
品の接合材料として使用される傾向が強くなってきてい
る。このために電子部品用導電性接着材として要求され
る様々な特質を満たす導電性接着材を開発することは、
信頼性の高い電子回路組立体を製造する上で重要であ
る。
In recent years, conductive adhesives have been increasingly used as a bonding material for electronic parts instead of solder. For this reason, it is necessary to develop a conductive adhesive that satisfies various characteristics required as a conductive adhesive for electronic parts.
It is important in manufacturing a reliable electronic circuit assembly.

【0003】[0003]

【従来の技術】従来から使用されている導電性接着材の
一例に、導電フィラーとしてNi粒子を用いた導電性接
着材がある。
2. Description of the Related Art An example of a conductive adhesive material that has been conventionally used is a conductive adhesive material that uses Ni particles as a conductive filler.

【0004】図5はこの導電性接着材1の使用状態を示
す図である。
FIG. 5 is a view showing a usage state of the conductive adhesive material 1.

【0005】同図において、導電性接着材1は、絶縁体
である接着材2に、Ni粒子である導電フィラー3が添
加してある構成を有する。
In FIG. 1, the conductive adhesive 1 has a structure in which a conductive filler 3 which is Ni particles is added to an adhesive 2 which is an insulator.

【0006】電子部品7本体は導電性接着材1によって
基板6に固定され、かつ電子部品7のバンプ4は、基板
6のパッド5へ固定される。
The body of the electronic component 7 is fixed to the substrate 6 by the conductive adhesive material 1, and the bumps 4 of the electronic component 7 are fixed to the pads 5 of the substrate 6.

【0007】図6は図5中のバンプ4とパッド5及びこ
の周囲の部分を拡大して示したものである。
FIG. 6 is an enlarged view of the bumps 4, the pads 5 and their peripheral portions in FIG.

【0008】Ni粒子3は、導電性を有する。しかし通
常Ni粒子3の添加量が数%の導電性接着材1自身は絶
縁性を示す。図6に示すように、電子部品のバンプ4部
と、基板6上のパッド5部は近接しており、Ni粒子3
は、バンプ4とパッド5との隙間に入り込み両者の間に
挟み込まれる。挟み込まれたNi粒子3がバンプ4とパ
ッド5の間を電気的に接続する。
The Ni particles 3 have conductivity. However, the conductive adhesive material 1 itself, in which the addition amount of the Ni particles 3 is usually several percent, is insulative. As shown in FIG. 6, the bump 4 part of the electronic component and the pad 5 part on the substrate 6 are close to each other, and the Ni particles 3
Enters the gap between the bump 4 and the pad 5 and is sandwiched between them. The sandwiched Ni particles 3 electrically connect the bumps 4 and the pads 5.

【0009】上記した構成のNi粒子3を添加した導電
性接着材1は、当接している電子部品のバンプ4と、基
板のパッド5トの間を電気的接続を確保し、隣接するバ
ンプ4間、或いはパッド5間の絶縁性を維持しながら電
子部品7を基板6へ接着するものである。
The conductive adhesive 1 containing the Ni particles 3 having the above-mentioned structure secures an electrical connection between the bump 4 of the electronic component which is in contact with the pad 5 of the substrate, and the adjacent bump 4 The electronic component 7 is adhered to the substrate 6 while maintaining the insulation between the pads or between the pads 5.

【0010】また、導電性接着材の別の従来例に、導電
フィラーとしてAu粒子を用いた導電性接着材の例があ
る。
Another conventional conductive adhesive material is a conductive adhesive material using Au particles as a conductive filler.

【0011】図7はこの導電性接着材11を示す図であ
る。
FIG. 7 is a view showing this conductive adhesive material 11.

【0012】電子部品用導電性接着材11は、絶縁体で
ある接着材12にAu粒子13を添加してなる構成を有
する。
The conductive adhesive material 11 for electronic parts has a structure in which Au particles 13 are added to the adhesive material 12 which is an insulator.

【0013】図8は、図7中のバンプ4とパッド5の部
分を拡大して示したものである。
FIG. 8 is an enlarged view of the bump 4 and the pad 5 in FIG.

【0014】一部のAu粒子13がバンプ4とパッド5
の間に挟み込まれている。この挟み込まれているAu粒
子13によってバンプ4とパッド5が電気的に接続され
ている。
Some of the Au particles 13 are bumps 4 and pads 5.
Sandwiched between. The bumps 4 and the pads 5 are electrically connected by the Au particles 13 sandwiched therebetween.

【0015】[0015]

【発明が解決しようとする課題】図5の導電性接着材1
には、電気抵抗を低くすることが困難であるという問題
があった。
The conductive adhesive 1 shown in FIG.
Has a problem that it is difficult to reduce the electric resistance.

【0016】即ち、図5に示すように、導電性接着材1
を使用して電子部品7を基板6に接続した場合に、バン
プ4とパッド5との間の電気抵抗は4〜10mΩと比較
的高かった。これは、Niの体積抵抗率が6.9μΩ・
cm(図9参照)と比較的高いことによるものと考えら
れる。
That is, as shown in FIG. 5, the conductive adhesive 1
When the electronic component 7 was connected to the substrate 6 by using, the electrical resistance between the bump 4 and the pad 5 was relatively high at 4 to 10 mΩ. This is because the volume resistivity of Ni is 6.9 μΩ.
cm (see FIG. 9), which is considered to be relatively high.

【0017】図6の導電性接着材11は、電気的接続の
信頼性が低いという問題があった。
The conductive adhesive 11 of FIG. 6 has a problem that the reliability of electrical connection is low.

【0018】即ち、図8に示すように導電性接着材11
を使用して電子部品7を基板6に接続した場合に、バン
プ4とパッド5の間に挟まれたAu粒子13は導電性接
着材11の膨張、収縮によって圧縮力を受けた時に潰れ
るように変形してしまう。Au粒子13は、一旦潰れる
ともとの状態に回復しない。このためAu粒子13は、
バンプ4とパッド5から離れてしまう可能性がある。
That is, as shown in FIG. 8, the conductive adhesive 11
When the electronic component 7 is connected to the substrate 6 by using, the Au particles 13 sandwiched between the bumps 4 and the pads 5 are crushed when receiving a compressive force due to expansion and contraction of the conductive adhesive 11. It will be transformed. The Au particles 13 do not recover to the original state once they are crushed. Therefore, the Au particles 13
The bump 4 and the pad 5 may be separated from each other.

【0019】図7の電子回路組立体に対して、−40℃
から105℃まで温度を変化させる熱衝撃試験を500
回繰り返したところ、バンプ4とパッド5の間の電気抵
抗は約3倍にまで増加した。
-40 ° C. for the electronic circuit assembly of FIG.
From 500 to 105 ° C for thermal shock test
Repeatedly, the electric resistance between the bump 4 and the pad 5 increased to about three times.

【0020】そこで、本発明は以上の点を鑑み、電子部
品の基板への接着に適した導電性接着材を提供すること
を目的とする。
Therefore, in view of the above points, an object of the present invention is to provide a conductive adhesive material suitable for bonding electronic components to a substrate.

【0021】[0021]

【課題を解決するための手段】本発明は、導電フィラー
を添加してなる導電性接着材において、導電フィラー
を、核と、核を被覆する殻とよりなる構成とすると共
に、核は、殻より高い硬度を有する材料であり、かつ殻
は、核より低い体積抵抗率を有する材料製である構成と
した。
According to the present invention, in a conductive adhesive containing a conductive filler, the conductive filler is composed of a core and a shell covering the core, and the core is a shell. It was made of a material having a higher hardness, and the shell was made of a material having a lower volume resistivity than the core.

【0022】[0022]

【作用】請求項1記載の発明において、導電フィラー
を、核と、この核を被覆する殻とよりなる構成としたこ
とは、導電フィラーに、核と殻、両方の特性を併せ持た
せるように作用する。
In the invention according to claim 1, the conductive filler is composed of a core and a shell covering the core, so that the conductive filler has both characteristics of the core and the shell. To work.

【0023】核を殻より高い硬度を有する材料とした構
成は、圧縮力が加わった場合に、潰れることを防ぐよう
に作用する。
The structure in which the core is made of a material having a hardness higher than that of the shell acts to prevent the core from being crushed when a compressive force is applied.

【0024】[0024]

【実施例】本発明の実施例を図面と共に説明する。Embodiments of the present invention will be described with reference to the drawings.

【0025】図1は、本発明の一実施例の導電性接着材
21の概略構成図である。
FIG. 1 is a schematic configuration diagram of a conductive adhesive material 21 according to an embodiment of the present invention.

【0026】導電性接着材21は、接着材22中に、導
電フィラーとしてAu被膜Ni粒子23を5vol%添
加した構成である。
The conductive adhesive material 21 has a structure in which 5 vol% of Au coated Ni particles 23 are added to the adhesive material 22 as a conductive filler.

【0027】接着材22は、エポキシ系樹脂に、イミダ
ゾールを樹脂でコーテイ ングしたカプセル型の硬化材を
混入してなる構成である。導電性接着材21は一液タイ
プのものである。
The adhesive 22 is made of an epoxy resin mixed with a capsule-type curing material obtained by coating imidazole with the resin. The conductive adhesive 21 is a one-component type.

【0028】図2は本発明の要部を成すAu被膜Ni粒
子23の構成を示す。
FIG. 2 shows the structure of the Au-coated Ni particles 23 forming the essential part of the present invention.

【0029】粒子23は、核を構成するNi粒子25
(粒径d=7±3μm)と、この表面を覆う膜厚が0.
5〜1μmのAu膜24とよりなる。
The particles 23 are Ni particles 25 which form the nucleus.
(Particle size d = 7 ± 3 μm) and the film thickness covering this surface is 0.
The Au film 24 has a thickness of 5 to 1 μm.

【0030】Au膜24は無電解メッキにより形成して
ある。
The Au film 24 is formed by electroless plating.

【0031】図9に示すように、Niは硬度が70H
V、体積抵抗率が6.9μΩ・cmである。Auは硬度
が25HV、体積抵抗率が2.2μΩ・cmである。
As shown in FIG. 9, Ni has a hardness of 70H.
V, volume resistivity is 6.9 μΩ · cm. Au has a hardness of 25 HV and a volume resistivity of 2.2 μΩ · cm.

【0032】硬度について見ると、Ni>Auである。In terms of hardness, Ni> Au.

【0033】体積抵抗率について見ると、Au<Niで
ある。
Looking at the volume resistivity, Au <Ni.

【0034】図3は、上記の導電性接着材21を用いて
電子部品7を基板6に接着した状態を示す。
FIG. 3 shows a state in which the electronic component 7 is bonded to the substrate 6 using the above-mentioned conductive adhesive material 21.

【0035】先ず、導電性接着材21を基板6上に塗布
する。この上からバンプ4を有する電子部品7を押しつ
けて、パッド5とバンプ4を接続し、電子部品7と基板
6との接続、固定を完了する。接着材22が熱硬化型の
樹脂であるため、上記接着の工程は加熱しながら行な
う。
First, the conductive adhesive material 21 is applied onto the substrate 6. The electronic component 7 having the bump 4 is pressed from above, the pad 5 and the bump 4 are connected, and the connection and fixing of the electronic component 7 and the substrate 6 are completed. Since the adhesive 22 is a thermosetting resin, the above-mentioned bonding process is performed while heating.

【0036】接続を完了した接合部分であるバンプ4と
パッド5の間の抵抗を測定したところ、抵抗値は1〜2
mΩであった。この値は電子部品7と基板6を接続する
のに充分に低い値である。また、抵抗値は長期に亘って
安定していた。
When the resistance between the bump 4 and the pad 5, which is the joint portion where the connection is completed, is measured, the resistance value is 1 to 2.
It was mΩ. This value is low enough to connect the electronic component 7 and the substrate 6. Moreover, the resistance value was stable over a long period of time.

【0037】更に、接着材22の膨張、収縮による応力
に対するAu被膜Ni粒子23の耐性を評価した。上記
の電子部品7を基板6に接合した電子回路組立体を作製
して、これに−40℃から105℃まで温度を周期的に
変化させる熱衝撃を500回繰り返す試験を行なった。
バンプ4とパッド5の間の抵抗値は初期の値と同じであ
った上記の結果より、上記の導電性接着材21は、電子
部品7のバンプ4とパッド5とを、従来に比べて、低い
抵抗値で、かつ長期に亘って電気的接続を保証した状態
で信頼性良く接続できることが分かった。
Further, the resistance of the Au-coated Ni particles 23 to the stress due to the expansion and contraction of the adhesive 22 was evaluated. An electronic circuit assembly in which the electronic component 7 was joined to the substrate 6 was produced, and a test was repeated 500 times in which a thermal shock of periodically changing the temperature from −40 ° C. to 105 ° C. was repeated.
The resistance value between the bumps 4 and the pads 5 was the same as the initial value. From the above results, the conductive adhesive 21 described above makes the bumps 4 and the pads 5 of the electronic component 7 different from the conventional ones. It was found that a low resistance value and a reliable connection can be achieved in a state where electrical connection is guaranteed for a long time.

【0038】本発明の効果を実証するために、Ni粒子
3を添加した従来の接着材を用いて、上記電子回路組立
体と同様の電子回路組立体を作製した。接続後のバンプ
4とパッド5間の抵抗は4〜10mΩと高かった。
In order to demonstrate the effect of the present invention, an electronic circuit assembly similar to the above electronic circuit assembly was prepared using a conventional adhesive material containing Ni particles 3. The resistance between the bump 4 and the pad 5 after connection was as high as 4 to 10 mΩ.

【0039】またAu粒子13を添加した従来の接着材
11を用いて、上記電子回路組立体と同様の電子回路組
立体を作製した。前記と同様の熱衝撃試験によっても抵
抗は初期の3倍まで増加した。上記した各材料の硬度、
及び抵抗率の指標となる体積抵抗率をまとめて図9に示
す。
An electronic circuit assembly similar to the above electronic circuit assembly was prepared by using the conventional adhesive material 11 containing the Au particles 13. The thermal shock test similar to the above also increased the resistance to three times the initial value. The hardness of each of the above materials,
9 and the volume resistivity, which is an index of resistivity, are collectively shown in FIG.

【0040】尚、本発明は上記実施例に限定されるもの
では無い。例えば、導電フィラーは、核が殻に比べて硬
度の高い材料であり、殻が核に比べて体積抵抗率が低い
材料であれば良い。また、本発明は一液型に限らず二液
型接着材でも良い。
The present invention is not limited to the above embodiment. For example, the conductive filler may be a material whose core has a higher hardness than the shell and whose shell has a lower volume resistivity than the core. Further, the present invention is not limited to a one-component type adhesive, and may be a two-component type adhesive material.

【0041】[0041]

【発明の効果】本発明によれば、導電フィラーの電気抵
抗が低いため、例えばバンプとパッドとを従来に比べて
低抵抗で接続することが出来る。
According to the present invention, since the electric resistance of the conductive filler is low, it is possible to connect, for example, the bump and the pad with a lower resistance than the conventional one.

【0042】また、導電フィラーは充分な硬度を有して
いるため、応力が加わっても潰れること無く、例えばバ
ンプとパッドとの間の電気抵抗を初期の値に、長期に亘
って保つことが出来る。従って電子部品を従来に比べて
信頼性良く接続することが出来る。
Further, since the conductive filler has a sufficient hardness, it does not collapse even if stress is applied, and for example, the electric resistance between the bump and the pad can be kept at the initial value for a long time. I can. Therefore, it is possible to connect the electronic parts with higher reliability than the conventional one.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の導電性接着材の概略構成図
である。
FIG. 1 is a schematic configuration diagram of a conductive adhesive material according to an embodiment of the present invention.

【図2】図1のAu被覆Ni粒子の構成図である。FIG. 2 is a structural diagram of Au-coated Ni particles shown in FIG.

【図3】図1の導電性接着材を電子部品と基板の接着に
使用した状態を示す図である。
FIG. 3 is a diagram showing a state in which the conductive adhesive material of FIG. 1 is used to bond an electronic component and a substrate.

【図4】図3中、Au被覆Ni粒子がバンプとパッドに
挟み込まれた状態を拡大して示す図である。
FIG. 4 is an enlarged view showing a state in which Au-coated Ni particles are sandwiched between bumps and pads in FIG.

【図5】従来の一例の導電性接着材を、電子部品と基板
の接着に使用した状態を示す図である。
FIG. 5 is a diagram showing a state where a conductive adhesive material of a conventional example is used for bonding an electronic component and a substrate.

【図6】図5中、Ni粒子がバンプとパッドに挟み込ま
れた状態を拡大して示す図である。
6 is an enlarged view showing a state where Ni particles are sandwiched between bumps and pads in FIG. 5. FIG.

【図7】従来の別の例の導電性接着材を、電子部品と基
板の接着に使用した状態を示す図である。
FIG. 7 is a diagram showing a state in which another conventional conductive adhesive is used for bonding an electronic component and a substrate.

【図8】図7中、Au粒子がバンプとパッドに挟み込ま
れた状態を拡大して示す図である。
FIG. 8 is an enlarged view showing a state where Au particles are sandwiched between bumps and pads in FIG. 7;

【図9】導電フィラーを構成する各材料の硬度及び体積
抵抗率を示す図である。
FIG. 9 is a diagram showing hardness and volume resistivity of each material constituting the conductive filler.

【符号の説明】[Explanation of symbols]

4 電子部品のバンプ 5 基板のパッド 6 回路基板 7 電子部品 21 Au被覆Ni粒子を添加した導電性接着材 22 接着材 23 Au被覆Ni粒子 24 Au膜(殻) 25 Ni粒子(核) 4 Bumps of Electronic Parts 5 Pads of Substrate 6 Circuit Board 7 Electronic Parts 21 Electronic Conductive Adhesive with Au Coated Ni Particles 22 Adhesive 23 Au Coated Ni Particles 24 Au Film (Shell) 25 Ni Particles (Nucleus)

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H05K 3/32 B 8718−4E (72)発明者 名取 勝英 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification number Internal reference number FI Technical indication location H05K 3/32 B 8718-4E (72) Inventor Katsuhide Natori 1015 Kamitadanaka, Nakahara-ku, Kawasaki-shi, Kanagawa Within Fujitsu Limited

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 接着材にフィラーを添加してなる接着材
において、 該フィラーを、核と、該核を被覆する殻とよりなる構成
とすると共に、該核は、該殻より高い硬度を有し、かつ
該殻は、該核より低い抵抗率を有することを特徴とする
接着材。
1. An adhesive comprising a filler added to the adhesive, wherein the filler comprises a core and a shell covering the core, and the core has a hardness higher than that of the shell. And the shell has a lower resistivity than the core.
JP15323594A 1994-07-05 1994-07-05 Adhesive Withdrawn JPH0820758A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15323594A JPH0820758A (en) 1994-07-05 1994-07-05 Adhesive

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15323594A JPH0820758A (en) 1994-07-05 1994-07-05 Adhesive

Publications (1)

Publication Number Publication Date
JPH0820758A true JPH0820758A (en) 1996-01-23

Family

ID=15558013

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15323594A Withdrawn JPH0820758A (en) 1994-07-05 1994-07-05 Adhesive

Country Status (1)

Country Link
JP (1) JPH0820758A (en)

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