JPH08201320A - X-ray analyzer - Google Patents
X-ray analyzerInfo
- Publication number
- JPH08201320A JPH08201320A JP7034478A JP3447895A JPH08201320A JP H08201320 A JPH08201320 A JP H08201320A JP 7034478 A JP7034478 A JP 7034478A JP 3447895 A JP3447895 A JP 3447895A JP H08201320 A JPH08201320 A JP H08201320A
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- Prior art keywords
- ray
- characteristic
- light
- rays
- background
- Prior art date
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- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、試料から発生する測定
対象の元素からの特性Ｘ線とそのバックグラウンドにつ
いて、正確に測定できるＸ線分析装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an X-ray analyzer capable of accurately measuring characteristic X-rays from an element to be measured generated from a sample and the background thereof.
【０００２】[0002]
【従来の技術】例えば、蛍光Ｘ線分析装置において、試
料に含まれる元素から発生する特性Ｘ線から、この特性
Ｘ線に近い波長のバックグラウンドの影響を取り除きた
い場合に、従来は、単一の検出器または分光素子を両者
の回折角の差に相当する角度だけ移動させて、両者の強
度を測定し、前者の強度から後者の強度を差し引いてい
る。しかし、両者の強度の測定において検出器または分
光素子を移動させるので、機械的な精度を確保するのが
困難であり、正確な測定ができない。そこで、本件出願
人は先に、特性Ｘ線とそのバックグラウンドとを、単一
の分光素子で分光し、単一の検出器の前に隣接して設け
た２つの受光スリットにそれぞれ焦点を結ばせて、この
２つの受光スリットを交互に開放することにより、検出
器や分光素子を移動させることなく、それぞれ測定しよ
うとする装置を提案した（特願平６−２９２３６１
号）。2. Description of the Related Art For example, in a fluorescent X-ray analyzer, when it is desired to remove the influence of a background having a wavelength close to the characteristic X-ray from the characteristic X-ray generated from an element contained in a sample, conventionally, a single The detector or the spectroscopic element is moved by an angle corresponding to the difference between the diffraction angles of the two, the intensities of the two are measured, and the intensity of the latter is subtracted from the intensity of the former. However, since the detector or the spectroscopic element is moved in the measurement of the intensities of both, it is difficult to ensure mechanical accuracy, and accurate measurement cannot be performed. Therefore, the applicant of the present invention first disperses the characteristic X-rays and the background thereof with a single spectroscopic element, and focuses each on two light-receiving slits provided adjacently in front of a single detector. Then, by alternately opening these two light-receiving slits, an apparatus for measuring each without moving a detector or a spectroscopic element was proposed (Japanese Patent Application No. 6-292361).
issue).
【０００３】[0003]
【発明が解決しようとする課題】ところが、この従来の
技術による装置では、弯曲分光素子を１つ用いただけで
あるので、測定対象元素が重元素であって特性Ｘ線とそ
のバックグラウンドとの回折角の差異が１度以内であれ
ば両方の強度測定が可能であるが、測定対象元素が窒素
等の超軽元素であって特性Ｘ線とそのバックグラウンド
との回折角の差異が１０度程度もあると、単一の分光素
子でこれら回折角を同時に満たすことはできないので、
両方の強度測定が不可能である。However, since the apparatus according to this prior art uses only one curved spectroscopic element, the element to be measured is a heavy element and the characteristic X-ray and its background are not reflected. Both strengths can be measured if the difference in bending angle is within 1 degree, but the element to be measured is an ultralight element such as nitrogen and the difference in diffraction angle between the characteristic X-ray and its background is about 10 degrees. If so, a single spectroscopic element cannot satisfy these diffraction angles at the same time.
Both intensity measurements are not possible.
【０００４】本発明は、前記従来の問題に鑑みてなされ
たもので、試料から発生する測定対象の元素が窒素等の
超軽元素であっても、特性Ｘ線とそのバックグラウンド
について、検出器や分光素子を移動させることなく、正
確に測定できるＸ線分析装置を提供することを目的とす
る。The present invention has been made in view of the above-mentioned conventional problems. Even if the element to be measured generated from the sample is an ultralight element such as nitrogen, the characteristic X-ray and its background are detected by the detector. It is an object of the present invention to provide an X-ray analysis apparatus that can perform accurate measurement without moving the or spectral element.
【０００５】[0005]
【課題を解決するための手段】前記目的を達成するため
に、請求項１のＸ線分析装置は、１次Ｘ線を発生するＸ
線源と、１次Ｘ線が照射された試料から発生する２次Ｘ
線を通過させる発散スリットを有する発散スリット部材
と、前記発散スリット部材を通過した発散２次Ｘ線の通
路に互いに並列に配置された２枚の弯曲分光素子と、前
記２枚の弯曲分光素子でそれぞれ回折された測定対象の
元素からの特性Ｘ線とそのバックグラウンドを通過させ
る受光スリット装置と、前記受光スリット装置を通過し
た前記特性Ｘ線とそのバックグラウンドが入射される単
一の検出器とを備えており、前記受光スリット装置は、
前記特性Ｘ線とそのバックグラウンドの一方と他方をそ
れぞれ通過させる受光スリットを２つ開口した受光スリ
ット部材と、前記２つの受光スリットのいずれかを選択
的に開放して、前記特性Ｘ線とそのバックグラウンドと
のいずれかを前記検出器に入射させる選択開放手段とを
備えている。In order to achieve the above object, the X-ray analysis apparatus according to claim 1 is an X-ray generating primary X-ray.
Radiation source and secondary X generated from sample irradiated with primary X-ray
A divergence slit member having a divergence slit for passing a ray, two curved spectroscopic elements arranged in parallel with each other in a passage of a divergent secondary X-ray passing through the divergent slit member, and the two curved spectroscopic elements A light-receiving slit device for passing the characteristic X-rays from the element to be measured and its background, which are diffracted, respectively, and a single detector to which the characteristic X-rays passing through the light-receiving slit device and its background are incident. Is provided, the light receiving slit device,
A light-receiving slit member having two light-receiving slits for allowing the characteristic X-ray and one of the background and the other of the background to pass through, respectively, and selectively opening one of the two light-receiving slits to obtain the characteristic X-ray and the characteristic light. Selective opening means for causing either of the background and the detector to enter.
【０００６】[0006]
【作用および効果】請求項１のＸ線分析装置では、試料
から発生する測定対象の元素からの特性Ｘ線とそのバッ
クグラウンドについて、それぞれに対応した２枚の弯曲
分光素子を用いて分光し、単一の検出器の前に隣接して
設けた２つの受光スリットにそれぞれ焦点を結ばせて、
この２つの受光スリットを交互に開放するので、測定対
象の元素が窒素等の超軽元素であっても、検出器や分光
素子を移動させることなく、正確に測定できる。In the X-ray analyzer according to claim 1, the characteristic X-rays from the element to be measured generated from the sample and the background thereof are separated by using two curved spectroscopic elements corresponding to each of them, Focus on each of the two light-receiving slits provided in front of a single detector,
Since these two light receiving slits are opened alternately, even if the element to be measured is an ultralight element such as nitrogen, accurate measurement can be performed without moving the detector or the spectroscopic element.
【０００７】[0007]
【実施例】以下、本発明の実施例を図面にしたがって説
明する。図１において、実施例のＸ線分析装置は、ま
ず、１次Ｘ線２を発生するＸ線源１と、試料台１９に取
り付けられ１次Ｘ線２を照射された試料３から発生する
２次Ｘ線５，６を通過させる発散スリットＰ1 ，Ｐ2 を
有する発散スリット部材４とを備えている。また、この
発散スリットＰ1 ，Ｐ2 を通過した２条の２次Ｘ線５，
６の通路にＸ線分光器２０を備えている。このＸ線分光
器２０は、発散スリットＰ1 ，Ｐ2 を通過した２条の２
次Ｘ線５，６のそれぞれの通路に互いに格子面１１，１
２が平行になるように配置され、２次Ｘ線５，６がそれ
ぞれ入射角度θ1 ，θ2 で入射されて、測定対象の元素
からの特性Ｘ線１４とそのバックグラウンド１５とをそ
れぞれ回折する人工格子からなる弯曲した第１および第
２分光素子７，８を備えている。Embodiments of the present invention will be described below with reference to the drawings. In FIG. 1, the X-ray analysis apparatus according to the embodiment first generates from an X-ray source 1 that generates primary X-rays 2 and a sample 3 that is attached to a sample table 19 and that is irradiated with primary X-rays 2 A divergence slit member 4 having divergence slits P 1 and P 2 for passing the next X-rays 5 and 6 is provided. Further, the two secondary X-rays 5, which have passed through the divergence slits P 1 and P 2 ,
An X-ray spectroscope 20 is provided in the passage 6. This X-ray spectroscope 20 has two lines of 2 which have passed through the divergence slits P 1 and P 2.
Lattice planes 11 and 1 are formed in the passages of the next X-rays 5 and 6, respectively.
2 are arranged in parallel, secondary X-rays 5 and 6 are incident at incident angles θ 1 and θ 2 , respectively, and the characteristic X-ray 14 from the element to be measured and its background 15 are diffracted, respectively. The curved first and second spectroscopic elements 7 and 8 made of artificial lattices are provided.
【０００８】さらに、このＸ線分析装置は、弯曲分光素
子７，８で回折された特性Ｘ線１４とそのバックグラウ
ンド１５を通過させる受光スリット装置１６と、その受
光スリット装置１６を通過した特性Ｘ線１４とそのバッ
クグラウンド１５が入射される単一の検出器１７とを備
えている。ここで、受光スリット装置１６は、特性Ｘ線
１４とそのバックグラウンド１５の一方と他方をそれぞ
れ通過させる受光スリットＱ1 ，Ｑ2 を２つ開口した受
光スリット部材９と、２つの受光スリットＱ1，Ｑ2 の
いずれかを選択的に開放して、特性Ｘ線１４とそのバッ
クグラウンド１５とのいずれかを検出器１７に入射させ
る移動スリットＱ3 を開口した移動スリット部材１０と
を備えている。Further, this X-ray analysis apparatus has a light-receiving slit device 16 for passing the characteristic X-rays 14 diffracted by the curved spectroscopic elements 7 and 8 and the background 15 thereof, and a characteristic X-ray passing through the light-receiving slit device 16. It comprises a line 14 and a single detector 17 whose background 15 is incident. Here, the light-receiving slit device 16 includes a light-receiving slit member 9 having two light-receiving slits Q 1 and Q 2 for allowing one and the other of the characteristic X-ray 14 and the background 15 to pass therethrough, and two light-receiving slits Q 1. , Q 2 are selectively opened, and a moving slit member 10 having a moving slit Q 3 that allows one of the characteristic X-ray 14 and its background 15 to enter the detector 17 is provided. .
【０００９】なお、前記入射角度θ2 は入射角度θ1 よ
りも大きいものとし、第１分光素子７の格子面間隔ｄ1
と第２分光素子８の格子面間隔ｄ2 とは、以下のような
関係がある。まず、ブラッグの条件から、分光しようと
する特性Ｘ線１４とそのバックグラウンド１５の波長を
それぞれλ1 ，λ2 とすると、 ２ｄ1 × sinθ1 ＝λ1 …（１） ２ｄ2 × sinθ2 ＝λ2 …（２） ここで、λ2 は、λ1 と回折角にして１度から１０度程
度の差異があり、λ1 より既知である。また、発散スリ
ットＰ1 ，Ｐ2 を通過した２条の２次Ｘ線５，６のなす
角度をφとし、その２次Ｘ線５，６の分光素子７，８へ
のそれぞれの入射点、すなわち分光素子７，８それぞれ
の下面中央の点Ａ，Ｂを通る格子面１１，１２に対する
法線１３を考えると、幾何学的な関係から、 θ1 ＝θ2 −φ …（３）It is assumed that the incident angle θ 2 is larger than the incident angle θ 1 , and the lattice spacing d 1 of the first spectroscopic element 7 is
And the lattice spacing d 2 of the second spectroscopic element 8 have the following relationship. First, assuming that the characteristic X-rays 14 to be spectrally separated and the wavelengths of their backgrounds 15 are λ 1 and λ 2 , respectively, under the Bragg condition, 2d 1 × sin θ 1 = λ 1 (1) 2d 2 × sin θ 2 = in λ 2 ... (2) where, lambda 2 is in the lambda 1 and the diffraction angle there is a difference of about 10 degrees 1 degree, it is known from lambda 1. Further, the angle formed by the two secondary X-rays 5 and 6 passing through the divergence slits P 1 and P 2 is φ, and the incident points of the secondary X-rays 5 and 6 on the spectroscopic elements 7 and 8, respectively. That is, considering the normal line 13 to the lattice planes 11 and 12 passing through the points A and B at the center of the lower surface of the light-splitting elements 7 and 8, respectively, θ 1 = θ 2 −φ (3) from the geometrical relationship.
【００１０】以上の関係から、以下のように、第１分光
素子７における格子面間隔ｄ1 および入射角度θ1 なら
びに第２分光素子８における格子面間隔ｄ2 および入射
角度θ2 を適切に設定できる。仮にある格子面間隔ｄ1
の第１分光素子７を採用したとすると、第１分光素子７
における入射角度θ1 は、分光しようとする特性Ｘ線１
４の波長λ1 から、（１）式を変形した次の（４）式で
決定される。 θ1 ＝ sin-1（λ1 ／２ｄ1 ） …（４） 第１分光素子７における入射角度θ1 が決定されると、
第２分光素子８における入射角度θ2 は、発散スリット
Ｐ1 ，Ｐ2 を通過した２条の２次Ｘ線５，６のなす角度
φを決めれば、（３）式を変形した次の（５）式で決定
される。 θ2 ＝θ1 ＋φ …（５）From the above relationships, the lattice plane spacing d 1 and the incident angle θ 1 in the first spectroscopic element 7 and the lattice plane spacing d 2 and the incident angle θ 2 in the second spectroscopic element 8 are appropriately set as follows. it can. If there is a lattice spacing d 1
If the first spectroscopic element 7 is adopted, the first spectroscopic element 7
The incident angle θ 1 at is the characteristic X-ray 1
The wavelength λ 1 of 4 is determined by the following equation (4) which is a modification of the equation (1). θ 1 = sin −1 (λ 1 / 2d 1 ) ... (4) When the incident angle θ 1 in the first spectroscopic element 7 is determined,
The incident angle θ 2 in the second spectroscopic element 8 is obtained by modifying the formula (3) by determining the angle φ formed by the two secondary X-rays 5 and 6 that have passed through the divergence slits P 1 and P 2. It is determined by the equation (5). θ 2 = θ 1 + φ (5)
【００１１】第２分光素子８における入射角度θ2 が決
定されると、第２分光素子８の格子面間隔ｄ2 は、
（２）式を変形した次の（６）式で決定される。 ｄ2 ＝λ2 ／２ sinθ2 …（６） ここで、第１分光素子７の格子面間隔ｄ1 と第２分光素
子８の格子面間隔ｄ2 は、式（１）から（６）を満たす
ものであれば、必ずしも異なるとは限らず、同一とする
こともできる。When the incident angle θ 2 at the second spectroscopic element 8 is determined, the lattice spacing d 2 of the second spectroscopic element 8 becomes
It is determined by the following expression (6) which is a modification of expression (2). d 2 = λ 2/2 sinθ 2 ... (6) where the lattice spacing d 1 of the first spectral element 7 lattice spacing d 2 of the second spectral element 8, from equation (1) to (6) As long as they satisfy the conditions, they are not necessarily different and may be the same.
【００１２】なお、本実施例では、湾曲した分光素子
７，８を用いるので、例えば、発散スリットＰ1 を通過
した一方の２次Ｘ線５は、第１分光素子７の下面への入
射点に係わらず、下面中央の点Ａでなくても同様に入射
角度θ1 をもって回折する。すなわち、図１において
は、簡単のため、発散スリットＰ1 を通過した一方の２
次Ｘ線５については、第１分光素子７の下面中央の点Ａ
に入射する２次Ｘ線５を代表例として図示したが、実際
には発散スリットＰ1 から第１分光素子７の下面全体へ
広がる２次Ｘ線である。In this embodiment, since the curved spectroscopic elements 7 and 8 are used, for example, one secondary X-ray 5 that has passed through the divergence slit P 1 is incident on the lower surface of the first spectroscopic element 7. Regardless of the above, even if it is not the point A at the center of the lower surface, the light is diffracted at the incident angle θ 1 . That is, in FIG. 1, for simplification, one of the two slits passing through the divergence slit P 1
Regarding the next X-ray 5, a point A at the center of the lower surface of the first spectroscopic element 7
Although the secondary X-ray 5 incident on is illustrated as a representative example, it is actually a secondary X-ray that spreads from the divergence slit P 1 to the entire lower surface of the first spectroscopic element 7.
【００１３】回折された特性Ｘ線１４についても、第１
分光素子７の下面中央の点Ａから受光スリットＱ1 に入
射する特性Ｘ線１４を代表例として図示したが、実際に
は、第１分光素子７の下面全体から、受光スリットＱ1
に集束する特性Ｘ線である。この状況は、第２分光素子
８に入射する他方の２次Ｘ線６および回折されたバック
グラウンド１５についても同様である。Regarding the diffracted characteristic X-ray 14 as well, the first
The characteristic X-ray 14 incident on the light receiving slit Q 1 from the point A at the center of the lower surface of the spectroscopic element 7 is shown as a representative example, but in reality, from the entire lower surface of the first spectroscopic element 7, the light receiving slit Q 1 is received.
It is a characteristic X-ray that is focused on. This situation is the same for the other secondary X-ray 6 incident on the second spectroscopic element 8 and the diffracted background 15.
【００１４】次に、第１実施例の作用について説明す
る。今、この装置を用いて試料３に含まれるある元素の
特性Ｘ線の強度Ｉを測定するものとする。Ｘ線源１から
発生した１次Ｘ線２が試料３に照射され、試料３から発
生した２次Ｘ線５は発散スリットＰ1 を通って発散角が
制御された状態で発散し、分光素子７に入射されて、所
望の特性Ｘ線１４に分光され、受光スリットＱ1 で焦点
を結び、移動スリットＱ3 を通過して、検出器１７へ入
射され、その強度Ｉm が測定される。この測定強度Ｉm
には、実際には求めようとする特性Ｘ線の真の強度Ｉの
他に、バックグラウンド強度Ｉb が含まれている。Next, the operation of the first embodiment will be described. Now, it is assumed that the intensity I of the characteristic X-ray of a certain element contained in the sample 3 is measured using this apparatus. The primary X-ray 2 generated from the X-ray source 1 is applied to the sample 3, and the secondary X-ray 5 generated from the sample 3 passes through the divergence slit P 1 and diverges in a state where the divergence angle is controlled. The light is incident on the beam No. 7 and is dispersed into the desired characteristic X-ray 14, focused at the light-receiving slit Q 1 , passes through the moving slit Q 3 , is incident on the detector 17, and the intensity I m thereof is measured. This measured intensity I m
Includes the background intensity I b in addition to the true intensity I of the characteristic X-ray to be actually obtained.
【００１５】一方、特性Ｘ線１４と回折角にして１度か
ら１０度程度波長の異なるバックグラウンドの２次Ｘ線
１５が、特性Ｘ線１４と同様に、試料３から発生し、発
散スリットＰ2 を通って発散角が制御された状態で発散
し、分光素子８で分光され、受光スリットＱ2 で焦点を
結んでいるが、移動スリット部材１０によって検出器１
７への入射を遮断されている。ここで、移動スリットＱ
3 が受光スリットＱ2の背後にくるよう移動スリット部
材１０を移動させると、バックグラウンド１５が検出器
１７へ入射されてその強度Ｉb が測定され、特性Ｘ線１
４は遮断される。前記特性Ｘ線１４の測定強度Ｉm か
ら、このバックグラウンド強度Ｉb を差し引くことによ
り、特性Ｘ線の真の強度Ｉが求められる。ここで、検出
器１７を単一としたのは、２つにしてそれぞれで特性Ｘ
線１４の測定強度Ｉm とバックグラウンド強度Ｉb とを
測定すると、検出器の検出特性の差によって正確な特性
Ｘ線の真の強度Ｉが求められないからである。On the other hand, a background secondary X-ray 15 having a diffraction angle different from that of the characteristic X-ray 14 by about 1 to 10 degrees is generated from the sample 3 similarly to the characteristic X-ray 14, and the divergence slit P is generated. It diverges in a state where the divergence angle is controlled through 2 and is dispersed by the spectroscopic element 8 and is focused at the light receiving slit Q 2 , but the moving slit member 10 causes the detector 1
Incident on 7 is blocked. Here, the moving slit Q
When the moving slit member 10 is moved so that 3 is behind the light receiving slit Q 2, the background 15 is incident on the detector 17 and its intensity I b is measured, and the characteristic X-ray 1
4 is cut off. By subtracting this background intensity I b from the measured intensity I m of the characteristic X-ray 14, the true intensity I of the characteristic X-ray can be obtained. Here, the reason why the detector 17 is single is that there are two detectors and the characteristic X is
This is because if the measured intensity I m of the line 14 and the background intensity I b are measured, an accurate true intensity I of the characteristic X-ray cannot be obtained due to the difference in the detection characteristics of the detector.
【００１６】以上のように、本実施例のＸ線分析装置で
は、試料３から発生する測定対象の元素からの特性Ｘ線
１４とそのバックグラウンド１５について、それぞれに
対応した２枚の弯曲分光素子７，８を用いて分光し、単
一の検出器１７の前に隣接して設けた２つの受光スリッ
トＱ1 ，Ｑ2 にそれぞれ焦点を結ばせて、この２つの受
光スリットＱ1 ，Ｑ2 を交互に開放するので、測定対象
の元素が窒素等の超軽元素であっても、検出器１７や分
光素子７，８を移動させることなく、正確に測定でき
る。As described above, in the X-ray analysis apparatus of this embodiment, two curved spectroscopic elements corresponding to the characteristic X-rays 14 from the element to be measured generated from the sample 3 and its background 15 are provided. 7,8 spectrally using, by bear two respective focal point receiving slit Q 1, Q 2 of which is provided adjacent to the front of a single detector 17, the two light-receiving slit Q 1, Q 2 Since the elements are alternately opened, even if the element to be measured is an ultralight element such as nitrogen, accurate measurement can be performed without moving the detector 17 or the spectroscopic elements 7 and 8.
【００１７】なお、本実施例では、図１において、格子
面１１，１２は平行で、より小さい入射角度θ1 で２次
Ｘ線５が入射される第１分光素子７で特性Ｘ線１４を回
折させ、より大きい入射角度θ2 で２次Ｘ線６が入射さ
れる第２分光素子８でバックグラウンド１５を回折させ
たが、その逆でもよく、格子面１１，１２が平行である
必要もない。また、例えば、第１分光素子７の下面中央
の点Ａから出た特性Ｘ線１４が、上側の受光スリットＱ
2 に入射し、第２分光素子８の下面中央の点Ｂから出た
バックグラウンド１５が、下側の受光スリットＱ1 に入
射するように配置することもできる。さらに、発散スリ
ットＰ1 ，Ｐ2 を１つだけとすることもできる。１次Ｘ
線２の試料３への入射点は、実際には１点Ｏのみでな
く、試料３の表面に分布しており、異なった入射点から
発生した２次Ｘ線を発散スリット部材４に設けた単一の
発散スリットを通過させることにより、本実施例と同様
に、２条の２次Ｘ線５，６をそれぞれ分光素子７，８へ
入射させることができるからである。In this embodiment, the grating planes 11 and 12 are parallel to each other in FIG. 1, and the characteristic X-ray 14 is emitted by the first spectroscopic element 7 on which the secondary X-ray 5 is incident at a smaller incident angle θ 1. The background 15 is diffracted and the background 15 is diffracted by the second spectroscopic element 8 on which the secondary X-ray 6 is incident at a larger incident angle θ 2 , but the opposite may be done and the grating surfaces 11 and 12 need to be parallel. Absent. Further, for example, the characteristic X-ray 14 emitted from the point A at the center of the lower surface of the first spectroscopic element 7 is the upper light-receiving slit Q.
It is also possible to arrange so that the background 15 that enters 2 and goes out from the point B at the center of the lower surface of the second spectroscopic element 8 enters the light receiving slit Q 1 on the lower side. Furthermore, it is possible to have only one divergence slit P 1 , P 2 . Primary X
The incident points of the line 2 on the sample 3 are actually distributed not only at one point O but also on the surface of the sample 3, and the secondary X-rays generated from different incident points are provided on the divergence slit member 4. This is because by passing through a single divergence slit, two secondary X-rays 5 and 6 can be made incident on the spectroscopic elements 7 and 8, respectively, as in this embodiment.
【図１】本発明の一実施例を示す側面図である。FIG. 1 is a side view showing an embodiment of the present invention.
１…Ｘ線源、２…１次Ｘ線、３…試料、４…発散スリッ
ト部材、５，６…試料から発生する２次Ｘ線、７，８…
分光素子、９…受光スリット部材、１０…選択開放手
段、１４…特性Ｘ線、１５…バックグラウンド、１６…
受光スリット装置、１７…検出器、Ｐ1 ，Ｐ2 …発散ス
リット、Ｑ1 ，Ｑ2 …受光スリット。1 ... X-ray source, 2 ... Primary X-ray, 3 ... Sample, 4 ... Divergence slit member, 5, 6 ... Secondary X-ray generated from sample, 7, 8 ...
Spectroscopic element, 9 ... Light receiving slit member, 10 ... Selective opening means, 14 ... Characteristic X-ray, 15 ... Background, 16 ...
Receiving slit device, 17 ... Detector, P 1 , P 2 ... Divergence slit, Q 1 , Q 2 ... Receiving slit.
Claims (1)
させる発散スリットを有する発散スリット部材と、 前記発散スリット部材を通過した発散２次Ｘ線の通路に
互いに並列に配置された２枚の弯曲分光素子と、 前記２枚の弯曲分光素子でそれぞれ回折された測定対象
の元素からの特性Ｘ線とそのバックグラウンドを通過さ
せる受光スリット装置と、 前記受光スリット装置を通過した前記特性Ｘ線とそのバ
ックグラウンドが入射される単一の検出器とを備え、 前記受光スリット装置は、前記特性Ｘ線とそのバックグ
ラウンドの一方と他方をそれぞれ通過させる受光スリッ
トを２つ開口した受光スリット部材と、前記２つの受光
スリットのいずれかを選択的に開放して、前記特性Ｘ線
とそのバックグラウンドとのいずれかを前記検出器に入
射させる選択開放手段とを備えたＸ線分析装置。1. An X-ray source for generating primary X-rays, a divergence slit member having a divergence slit for passing secondary X-rays generated from a sample irradiated with the primary X-rays, and the divergence slit member. The two curved spectroscopic elements arranged in parallel to each other in the passage of the divergent secondary X-rays that have passed through, and the characteristic X-rays from the element to be measured diffracted by the two curved spectroscopic elements and their backgrounds, respectively. A light-receiving slit device that passes the light-receiving slit device and a single detector that receives the characteristic X-rays that have passed through the light-receiving slit device and the background thereof are incident. A light-receiving slit member having two light-receiving slits for passing one and the other respectively, and either one of the two light-receiving slits are selectively opened so that the characteristic X-ray and its bag X-ray analysis apparatus having a selection opening means for entering either the ground to the detector.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03447895A JP3411705B2 (en) | 1995-01-30 | 1995-01-30 | X-ray analyzer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03447895A JP3411705B2 (en) | 1995-01-30 | 1995-01-30 | X-ray analyzer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08201320A true JPH08201320A (en) | 1996-08-09 |
| JP3411705B2 JP3411705B2 (en) | 2003-06-03 |
Family
ID=12415366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP03447895A Expired - Fee Related JP3411705B2 (en) | 1995-01-30 | 1995-01-30 | X-ray analyzer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3411705B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19820861A1 (en) * | 1998-05-09 | 1999-11-25 | Bruker Axs Analytical X Ray Sy | Simultaneous X-ray fluorescence spectrometer |
| JP2003014894A (en) * | 2001-06-27 | 2003-01-15 | Rigaku Corp | X-ray spectroscopic method and x-ray spectroscopic device |
| WO2004086018A1 (en) * | 2003-03-27 | 2004-10-07 | Rigaku Industrial Corporation | X-ray fluorescence analyzer |
| JP2010117369A (en) * | 2010-02-21 | 2010-05-27 | Rigaku Corp | X-ray spectroscopic analysis method and x-ray spectroscope |
| JP2013137273A (en) * | 2011-12-28 | 2013-07-11 | Techno X Co Ltd | X-ray fluorescence spectroscopy device and x-ray fluorescence analysis device |
-
1995
- 1995-01-30 JP JP03447895A patent/JP3411705B2/en not_active Expired - Fee Related
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19820861A1 (en) * | 1998-05-09 | 1999-11-25 | Bruker Axs Analytical X Ray Sy | Simultaneous X-ray fluorescence spectrometer |
| US6226347B1 (en) | 1998-05-09 | 2001-05-01 | Bruker Axs Analytical X-Ray Systems Gmbh | Simultaneous x-ray fluorescence spectrometer |
| DE19820861B4 (en) * | 1998-05-09 | 2004-09-16 | Bruker Axs Gmbh | Simultaneous X-ray fluorescence spectrometer |
| JP2003014894A (en) * | 2001-06-27 | 2003-01-15 | Rigaku Corp | X-ray spectroscopic method and x-ray spectroscopic device |
| JP4657506B2 (en) * | 2001-06-27 | 2011-03-23 | 株式会社リガク | X-ray spectroscopy method and X-ray spectrometer |
| WO2004086018A1 (en) * | 2003-03-27 | 2004-10-07 | Rigaku Industrial Corporation | X-ray fluorescence analyzer |
| JPWO2004086018A1 (en) * | 2003-03-27 | 2006-06-29 | 理学電機工業株式会社 | X-ray fluorescence analyzer |
| JP2010117369A (en) * | 2010-02-21 | 2010-05-27 | Rigaku Corp | X-ray spectroscopic analysis method and x-ray spectroscope |
| JP2013137273A (en) * | 2011-12-28 | 2013-07-11 | Techno X Co Ltd | X-ray fluorescence spectroscopy device and x-ray fluorescence analysis device |
| US9448191B2 (en) | 2011-12-28 | 2016-09-20 | Techno-X Co., Ltd. | X-ray fluorescence spectrometer and X-ray fluorescence analyzer |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3411705B2 (en) | 2003-06-03 |
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