JPH08157321A - Cosmetic - Google Patents

Cosmetic

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Publication number
JPH08157321A
JPH08157321A JP33011494A JP33011494A JPH08157321A JP H08157321 A JPH08157321 A JP H08157321A JP 33011494 A JP33011494 A JP 33011494A JP 33011494 A JP33011494 A JP 33011494A JP H08157321 A JPH08157321 A JP H08157321A
Authority
JP
Japan
Prior art keywords
histamine
skin
hyaluronic acid
antagonist
cosmetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33011494A
Other languages
Japanese (ja)
Inventor
Tetsuya Sayo
哲也 佐用
Shingo Sakai
進吾 酒井
Michiko Kamio
美智子 神尾
Shintaro Inoue
紳太郎 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanebo Ltd
Original Assignee
Kanebo Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanebo Ltd filed Critical Kanebo Ltd
Priority to JP33011494A priority Critical patent/JPH08157321A/en
Publication of JPH08157321A publication Critical patent/JPH08157321A/en
Pending legal-status Critical Current

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  • Cosmetics (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)

Abstract

PURPOSE: To obtain a cosmetic comprising histamine H1 -antagonist(s) or salt(s) thereof, having inhibitory action on the decomposition of hyarulonic acid, thus effective for remedying the chapped skin and dried skin. CONSTITUTION: This cosmetic contains at least one kind of histamine H1 - antagonist or salt thereof, having inhibitory action on the decomposition of hyarulonic acid important for skin dampishness and firmness, therefore, can remedy chapped or dried skin. The histamine H1 -antagonist is esp. pref. chlorpheniramine, pyrilamine, diphenhydramine, tripelennamine, brompheniramine, cyclizine, or promethazine. The salt thereof is e.g. a hydrochloride, hydrobromide, sulfate, acetate, fumarate, maleate, tartrate. This cosmetic can take such a form as gel, cream, spray, cataplasm, lotion, pack, milky lotion, or powder.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ヒアルロン酸の分解を
阻害する、荒れ肌および乾燥肌に有効な化粧料に関す
る。
TECHNICAL FIELD The present invention relates to a cosmetic composition which inhibits the decomposition of hyaluronic acid and is effective for rough and dry skin.

【0002】[0002]

【従来の技術】ヒアルロン酸は、細胞間隙への水分の保
持、組織内にジェリー状のマトリックスを形成すること
に基づく細胞の保持、皮膚の潤滑性と柔軟性の保持、機
械的障害などの外力への抵抗、および、細菌感染の防止
など多くの機能を有している(BIO INDUSTR
Y、8巻、346頁、1991年)。また、皮膚のヒア
ルロン酸は歳をとるにつれ減少し、その結果小ジワやか
さつきなどの老化をもたらすといわれている。
2. Description of the Related Art Hyaluronic acid is used to retain water in cell spaces, retain cells based on the formation of a jelly-like matrix in tissues, maintain skin lubricity and flexibility, and exert external forces such as mechanical damage. It has many functions such as resistance to bacteria and prevention of bacterial infection (BIO INDUSTR
Y, vol. 8, p. 346, 1991). It is said that hyaluronic acid in the skin decreases with age, resulting in aging such as wrinkles and roughness.

【0003】したがってヒアルロン酸の分解を阻害する
ことにより皮膚の潤滑性と柔軟性を保ち、肌荒れ、ある
いは皮膚の乾燥を防止すると考えられる。
Therefore, it is considered that by inhibiting the decomposition of hyaluronic acid, the lubricity and flexibility of the skin are maintained and the skin is prevented from becoming rough or the skin is dried.

【0004】そのため、ヒアルロン酸の分解阻害を目的
として、ヒアルロン酸を分解するヒアルロニダーゼの活
性阻害成分を用いた種々の化粧料が提案されている。し
かし近年、ヒト皮膚線維芽細胞には従来から知られてい
るヒアルロニダーゼが存在しないことが報告された
(B.B.A.,172,70,1990)。したがっ
てヒアルロニダーゼ活性阻害成分を用いた化粧料に、ヒ
アルロン酸分解阻害効果は望めないと考えられる。
Therefore, for the purpose of inhibiting the degradation of hyaluronic acid, various cosmetics have been proposed which use an active inhibitory component of hyaluronidase which degrades hyaluronic acid. However, in recent years, it has been reported that conventionally known hyaluronidase does not exist in human skin fibroblasts (BBA, 172, 70, 1990). Therefore, it is considered that cosmetics using a hyaluronidase activity-inhibiting ingredient cannot be expected to have a hyaluronic acid decomposition inhibiting effect.

【0005】[0005]

【発明が解決しようとする課題】したがって本発明の目
的とするところは、ヒアルロニダーゼを用いた従来の評
価法を用いず、本発明者が開発したヒト皮膚由来細胞を
用いた評価法を用いてヒアルロン酸の分解によって生理
的に機能の低下した皮膚、すなわち荒れ肌および乾燥肌
に有効な化粧料を提供するにある。
Therefore, it is an object of the present invention to use hyaluronidase using the evaluation method using human skin-derived cells developed by the present inventor, without using the conventional evaluation method using hyaluronidase. It is an object of the present invention to provide a cosmetic composition which is effective for physiologically deteriorated skin due to acid decomposition, that is, rough skin and dry skin.

【0006】[0006]

【課題を解決するための手段】上述の目的は、ヒスタミ
ンH1-アンタゴニストまたはその塩を含有することを特
徴とする化粧料によって達成される。
The above object is achieved by a cosmetic composition containing a histamine H 1 -antagonist or a salt thereof.

【0007】以下、本発明の構成について詳説する。The structure of the present invention will be described below in detail.

【0008】本発明で用いられるヒスタミンH1-アンタ
ゴニストとしては、特に制限されないが、たとえばエタ
ノールアミン型のジフェンヒドラミン、エチレンジアミ
ン型のピリラミン、トリプレナミン、アルキルアミン型
のクロルフェニラミン、ブロムフェニラミン、ピペラジ
ン型のサイクリジン、フェノチアジン型のプロメタジン
等が挙げられる。
The histamine H 1 -antagonist used in the present invention is not particularly limited, and examples thereof include ethanolamine-type diphenhydramine, ethylenediamine-type pyrilamine, triprenamine, alkylamine-type chlorpheniramine, brompheniramine, and piperazine-type. Examples thereof include cyclidine and phenothiazine type promethazine.

【0009】ヒスタミンH1-アンタゴニストの塩として
は、特に限定されないが、特に薬学的に許容されている
塩酸塩、臭化水素酸塩、硫酸塩、リン酸塩等の無機酸
塩、および酢酸塩、フマール酸塩、マレイン酸塩、酒石
酸塩、クエン酸塩、p−トルエンスルホン酸塩等の有機
酸塩を挙げることができる。
The salt of histamine H 1 -antagonist is not particularly limited, but particularly pharmaceutically acceptable inorganic acid salts such as hydrochloride, hydrobromide, sulfate and phosphate, and acetate. , Fumarate, maleate, tartrate, citrate, p-toluenesulfonate, and other organic acid salts.

【0010】これらのヒスタミンH1-アンタゴニストま
たはその塩は、1種類または2種類以上を組み合わせて
用いることが可能である。
These histamine H 1 -antagonists or salts thereof can be used alone or in combination of two or more.

【0011】本発明に利用するヒスタミンH1-アンタゴ
ニストまたはその塩の配合量としては、適用対象物によ
り異なり、一概には規定できないが、化粧料総量基準を
100として0.001〜0.5重量%(以下%と略記
する。)が好ましく、特に好ましくは0.01〜0.1
%である。
The amount of the histamine H 1 -antagonist or salt thereof used in the present invention varies depending on the object of application and cannot be specified unconditionally, but 0.001 to 0.5% by weight based on 100 as the total amount of cosmetics. % (Hereinafter abbreviated as%) is preferable, and 0.01 to 0.1 is particularly preferable.
%.

【0012】本発明の化粧料に使用される賦形剤または
補助剤としては、通常、同目的に使用されるものから剤
形に応じて適宜選択すればよく、特に限定されるもので
はないが、たとえば、ワセリン、スクワラン等の炭化水
素、ステアリルアルコール等の高級アルコール、ミリス
チン酸イソプロピルなどの高級脂肪酸低級アルキルエス
テル、ラノリン酸等の動物性油脂、グリセリン、プロピ
レングリコール等の多価アルコール、グリセリン脂肪酸
エステル、モノステアリン酸ポリエチレングリコール、
ポリエチレンアルキルエーテルリン酸等の界面活性剤、
パラオキシ安息香酸メチル、パラオキシ安息香酸ブチル
等の防腐剤、蝋、樹脂、各種香料、各種色素、クエン酸
ナトリウム、炭酸ナトリウム、乳酸等の各種無機塩や各
種酸、水、およびエタノール等が挙げらる。
The excipient or auxiliary agent used in the cosmetic of the present invention may be appropriately selected from those generally used for the same purpose according to the dosage form, and is not particularly limited. , For example, hydrocarbons such as petrolatum and squalane, higher alcohols such as stearyl alcohol, lower fatty acid lower alkyl esters such as isopropyl myristate, animal oils and fats such as lanolinic acid, polyhydric alcohols such as glycerin and propylene glycol, glycerin fatty acid esters , Polyethylene glycol monostearate,
Surfactants such as polyethylene alkyl ether phosphate,
Preservatives such as methyl paraoxybenzoate and butyl paraoxybenzoate, waxes, resins, various fragrances, various pigments, various inorganic salts such as sodium citrate, sodium carbonate, lactic acid, various acids, water, and ethanol. .

【0013】本発明の化粧料の形態としては、液剤、固
形剤あるいは半固形剤のいずれでもよく、好ましくはゲ
ル、クリーム、スプレー剤、貼付剤、ローション、パッ
ク類、乳液、パウダー等が挙げられる。
The cosmetics of the present invention may be in the form of liquids, solids or semisolids, preferably gels, creams, sprays, patches, lotions, packs, emulsions, powders and the like. .

【0014】[0014]

【実施例】以下、試験例、比較例、実施例をもって更に
詳しく説明する。尚、試験例に先立ち、ヒアルロン酸の
分解阻害試験方法を示す。また表2〜5中の配合量は、
重量%を示す。
EXAMPLES Hereinafter, more detailed description will be given with reference to test examples, comparative examples and examples. Prior to the test example, a test method for inhibiting the degradation of hyaluronic acid will be shown. In addition, the compounding amounts in Tables 2 to 5 are
Indicates weight percent.

【0015】(1)MEM培地の調製法 Minimum Essential Medium
(大日本製薬製、10−101) 10.6gにそれぞれ
終濃度として1%(V/V)Non Essentia
l Amino Acid(大日本製薬製、16−81
0) 、1mMピルビン酸ナトリウム(大日本製薬製、1
6−820)、1.2%(W/V)炭酸水素ナトリウ
ム、蒸留水を加えて1lとした後、炭酸ガスを吹き込ん
でpHを約7にした(以下MEM培地と略記する)。
(1) Method for preparing MEM medium Minimum Essential Medium
(Dainippon Pharmaceutical Co., Ltd., 10-101) 10.6 g each with a final concentration of 1% (V / V) Non Essentia
l Amino Acid (Dainippon Pharmaceutical Co., 16-81
0) 1 mM sodium pyruvate (manufactured by Dainippon Pharmaceutical Co., Ltd., 1
6-820), 1.2% (W / V) sodium hydrogencarbonate and distilled water were added to make 1 liter, and then carbon dioxide gas was blown to bring the pH to about 7 (hereinafter abbreviated as MEM medium).

【0016】(2)ウシ胎仔血清(FBS)の非働化 FBS(Irvine Scientific製) を5
6℃で30分間加熱処理した。
(2) Inactivation of fetal bovine serum (FBS) FBS (manufactured by Irvine Scientific)
Heat treatment was performed at 6 ° C. for 30 minutes.

【0017】(3)細胞添加用高分子トリチウムヒアル
ロン酸の調製方法 正常ヒト線維芽細胞株〔デトロイト551株(ATCC
CCL 110)〕の細胞数を10%(V/V)の非
働化FBSを含むMEM培地にて2×105 個/mlに
調整し、225cm2 のフラスコに50mlいれ、3日
間培養しコンフルエント状態にした、その後ヒアルロン
酸の前駆体であるトリチウムグルコサミン(Ameri
can Radiolabeled Chemical
s Inc.製)を培養系に添加し(10μCi/ml )、さ
らに3日間培養したのち、培養液からトリチウムラベル
されたヒアルロン酸をUnderhillらの方法
(J.Cell Biology,82,475(19
79))によって精製し、さらにゲルろ過カラムにより
分子量100万以上の高分子トリチウムヒアルロン酸
(比放射活性,0.1μCi/ μg )を調製した。これを細胞
培養系への添加用高分子トリチウムヒアルロン酸とし
た。
(3) Method for Preparing Polymer Tritium Hyaluronic Acid for Cell Addition Normal human fibroblast cell line [Detroit 551 strain (ATCC
CCL 110)] cell number was adjusted to 2 × 10 5 cells / ml with MEM medium containing 10% (V / V) inactivated FBS, 50 ml was put in a 225 cm 2 flask and cultured for 3 days to be confluent. And then tritiated glucosamine (Ameri), the precursor of hyaluronic acid.
can Radiolabeled Chemical
s Inc. Was added to the culture system (10 μCi / ml), and the mixture was further cultured for 3 days. Then, tritiated hyaluronic acid was added to the culture solution by the method of Underhill et al. (J. Cell Biology, 82, 475 (19).
79)) and further, high molecular weight tritium hyaluronic acid (specific radioactivity, 0.1 μCi / μg) having a molecular weight of 1,000,000 or more was prepared by a gel filtration column. This was used as polymer tritium hyaluronic acid for addition to the cell culture system.

【0018】(4)ヒアルロン酸の分解および分解阻害
の試験方法 正常ヒト線維芽細胞株〔デトロイト551株(ATCC
CCL 110)〕の細胞数を10%(V/V)の非
働化FBSを含むMEM培地にて1.5x105 個/m
lに調整し、12穴プレート(ファルコン製)に0.8
mlずつ播種し、95%(V/V)空気−5%(V/
V)炭酸ガスの雰囲気下、37℃で3日間静置培養し、
さらに、MEM培地のみに培地交換し、1日間培養し
た。その後、高分子トリチウムヒアルロン酸を含む(1
4000DPM/ml)MEM培地を調製し、培地交換
をし、3日間培養を行った。なお培地交換時、最終濃度
10μMになるようにヒスタミンと各種アンタゴニスト
調製液を添加した。
(4) Test Method for Degradation and Degradation Inhibition of Hyaluronic Acid Normal human fibroblast cell line [Detroit 551 strain (ATCC
CCL 110)], the cell number is 1.5 × 10 5 cells / m 2 in MEM medium containing 10% (V / V) inactivated FBS.
Adjust to 1 and 0.8 on a 12-well plate (Falcon)
ml seeds, 95% (V / V) air-5% (V / V
V) Incubation at 37 ° C. for 3 days in an atmosphere of carbon dioxide gas,
Further, the medium was replaced with only the MEM medium, and the cells were cultured for 1 day. Then, the polymer containing tritium hyaluronan (1
4000 DPM / ml) MEM medium was prepared, the medium was exchanged, and the cells were cultured for 3 days. When the medium was replaced, histamine and various antagonist preparation solutions were added so that the final concentration was 10 μM.

【0019】(5)ヒアルロン酸分解およびヒアルロン
酸分解阻害の評価方法 培養終了後、培養液を回収し、100℃で5分間加熱処
理を行った後、培地1mlをセファロースCL─2Bカ
ラム(内径1cm,長さ60cm)にアプライし以下の
条件でゲルろ過を行った。 流速:0.6ml/min 分画:4ml/1Fraction 分画総数:25 更に分子量10万以下のヒアルロン酸が溶出するフラク
ション10〜25の26本を集め、[3H]放射活性を測
定し低分子化したヒアルロン酸の量を求めた。さらに、
ヒアルロン酸分解率およびヒアルロン酸分解率分解阻害
率は数1および数2によって求めた。
(5) Evaluation method of hyaluronic acid decomposition and inhibition of hyaluronic acid decomposition After the completion of the culture, the culture solution was recovered and heat-treated at 100 ° C. for 5 minutes, and 1 ml of the medium was added to a Sepharose CL-2B column (internal diameter: 1 cm , 60 cm in length) and gel filtration was performed under the following conditions. Flow rate: 0.6 ml / min Fraction: 4 ml / 1 Fraction Total number: 25 Furthermore, 26 fractions 10 to 25 in which hyaluronic acid having a molecular weight of 100,000 or less is eluted are collected, and [ 3 H] radioactivity is measured to measure low molecular weight. The amount of converted hyaluronic acid was determined. further,
The hyaluronic acid decomposition rate and the hyaluronic acid decomposition rate and the decomposition inhibition rate were determined by the equations 1 and 2.

【0020】[0020]

【数1】ヒアルロン酸分解率(%)=B/A×100 A=ヒスタミン添加によるヒアルロン酸分解量 B=ヒスタミン+アンタゴニスト添加によるヒアルロン
酸分解量
[Formula 1] Degradation rate of hyaluronic acid (%) = B / A x 100 A = Degradation amount of hyaluronic acid by addition of histamine B = Degradation amount of hyaluronic acid by addition of histamine + antagonist

【0021】[0021]

【数2】分解阻害率(%)=(1−B/A)×100 A=ヒスタミン添加によるヒアルロン酸分解量 B=ヒスタミン+アンタゴニスト添加によるヒアルロン
酸分解量
[Equation 2] Degradation inhibition rate (%) = (1-B / A) × 100 A = Amount of hyaluronic acid decomposed by adding histamine B = Amount of hyaluronic acid decomposed by adding histamine + antagonist

【0022】試験例1〜3、比較例1〜2 ヒスタミンH1-アンタゴニストとしてクロルフェニラミ
ン、ピリラミン、ジフェンヒドラミンを濃度が10μM
になるように調整した水溶液(試験例1〜3)を、また
比較例1として、精製水を用い、比較例2として従来知
られている牛精巣由来ヒアルロニダーゼの阻害剤である
グリチルリチン(炎症、4巻、4号、437(198
4))を濃度が10μM になるように調整した水溶液を
用いて、上述の(1)〜(5)の方法によって試験を行
った。
Test Examples 1 to 3, Comparative Examples 1 to 2 Histamine H 1 -Chlorpheniramine, pyrilamine and diphenhydramine as antagonists were used at a concentration of 10 μM.
Glycyrrhizin (inflammation, 4) which is an inhibitor of a bovine testis-derived hyaluronidase conventionally known as Comparative Example 2 is prepared by using an aqueous solution (Test Examples 1 to 3) prepared as follows, and purified water as Comparative Example 1. Volume 4, Issue 437 (198
The test was carried out by the methods (1) to (5) described above using an aqueous solution in which the concentration of 4)) was adjusted to 10 μM.

【0023】[0023]

【表1】 [Table 1]

【0024】表1に示したように、アンタゴニストであ
るクロルフェニラミン、ピリラミン、ジフェンヒドラミ
ン(試験例1〜3)はいずれもヒアルロン酸の分解を阻
害したが、比較例1およびヒアルロニダーゼの阻害剤で
あるグリチルリチン(比較例2)は全く効果を示さなか
った。
As shown in Table 1, all of the antagonists chlorpheniramine, pyrilamine and diphenhydramine (Test Examples 1 to 3) inhibited the degradation of hyaluronic acid, but they were inhibitors of Comparative Example 1 and hyaluronidase. Glycyrrhizin (Comparative Example 2) showed no effect.

【0025】この結果からヒスタミンH1-アンタゴニス
トはヒアルロン酸分解抑制剤として有効である。また本
発明に利用のヒスタミンH1-アンタゴニストはヒアルロ
ン酸分解が亢進している皮膚の改善に有効であると考え
られる。
From these results, the histamine H 1 -antagonist is effective as a hyaluronic acid decomposition inhibitor. Further, the histamine H 1 -antagonist used in the present invention is considered to be effective in improving the skin in which hyaluronic acid decomposition is accelerated.

【0026】次に本発明の実施例を挙げる。Next, examples of the present invention will be described.

【0027】実施例1〜4(クリーム) 下記に示す組成でクリームを調製した。Examples 1 to 4 (Cream) Creams were prepared with the compositions shown below.

【0028】[0028]

【表2】 [Table 2]

【0029】調製法: 成分(A)を80℃で均一に混
合溶解した後 それに成分(B)を混合溶解した(混合
液I)。これとは別に、成分(D)を80℃で均一に混
合溶解した後、それに成分(C)を混合溶解した(混合
液II)。つぎに、混合液Iに、徐々に混合液IIを加え
て、充分攪拌しながら30℃まで冷却し、クリームを得
た。
Preparation method: The component (A) was uniformly mixed and dissolved at 80 ° C., and then the component (B) was mixed and dissolved (mixed solution I). Separately from this, the component (D) was uniformly mixed and dissolved at 80 ° C., and then the component (C) was mixed and dissolved therein (mixed liquid II). Next, the mixed solution II was gradually added to the mixed solution I and cooled to 30 ° C. with sufficient stirring to obtain a cream.

【0030】実施例5〜8(ローション) 下記に示す組成でローションを調製した。Examples 5 to 8 (lotion) Lotions were prepared with the compositions shown below.

【0031】[0031]

【表3】 [Table 3]

【0032】調製法: 各成分を混合溶解して、ローシ
ョンを調製した。
Preparation Method: Each component was mixed and dissolved to prepare a lotion.

【0033】実施例9〜12(ゲル) 下記に示す組成でゲルを調製した。Examples 9 to 12 (gel) Gels were prepared with the compositions shown below.

【0034】[0034]

【表4】 [Table 4]

【0035】調製法: (A)を一部の精製水(D)で
膨潤させ、残りの精製水(D)で成分(C)を溶解させ
た後、両者を均一に混合した(混合液I)。成分(B)
を均一に混合 解させた(混合液II)。混合液Iに混合
液IIを加えて分散し、ゲルを得た。
Preparation method: (A) was swollen with a part of purified water (D), the component (C) was dissolved with the remaining purified water (D), and then both were uniformly mixed (mixed solution I). ). Ingredient (B)
Were mixed and dissolved uniformly (mixture II). The mixed solution II was added to the mixed solution I and dispersed to obtain a gel.

【0036】実施例13〜16(ヘアトニック) 下記に示す組成でゲルを調製した。Examples 13 to 16 (hair tonic) Gels were prepared with the compositions shown below.

【0037】[0037]

【表5】 [Table 5]

【0038】調製法: 香料可溶化剤で香料を溶解した
後、常温で攪拌しながらエタノールに加えて溶解し、成
分(B)を順次加えて溶解した(混合液I)。成分
(C)を溶解させ、攪拌しながら混合液Iに加えて均一
にした後、ろ過してヘアトニックを得た。
Preparation method: After the perfume was dissolved with the perfume-solubilizing agent, it was added to ethanol while stirring at room temperature and dissolved, and the component (B) was sequentially added and dissolved (mixed solution I). The component (C) was dissolved and added to the mixed solution I with stirring to make the mixture uniform, and then filtered to obtain a hair tonic.

【0039】[0039]

【発明の効果】以上の様に、本発明により皮膚の潤いや
はりに重要なヒアルロン酸の分解を抑制し、荒れ肌や乾
燥肌を改善することができる化粧料が提供できることは
明らかである。
INDUSTRIAL APPLICABILITY As described above, it is apparent that the present invention can provide a cosmetic composition capable of suppressing the degradation of hyaluronic acid, which is important for moisturizing the skin, and improving rough and dry skin.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 A61K 31/44 ADS 31/495 31/54 45/00 AEM (72)発明者 井上 紳太郎 神奈川県小田原市寿町5丁目3番28号 鐘 紡株式会社生化学研究所内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical indication location A61K 31/44 ADS 31/495 31/54 45/00 AEM (72) Inventor Shintaro Inoue Odawara, Kanagawa 5-3 28, Kotobuki-cho, Kanebo Biotechnology Research Institute

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ヒスタミンH1-アンタゴニストまたはそ
の塩を含有することを特徴とする化粧料。
1. A cosmetic comprising a histamine H 1 -antagonist or a salt thereof.
【請求項2】 ヒスタミンH1-アンタゴニストがクロル
フェニラミン、ピリラミン、ジフェンヒドラミントリプ
レナミン、ブロムフェニラミン、サイクリジン、プロメ
タジンから選ばれる1種または2種以上であることを特
徴とする請求項1記載の化粧料。
2. The histamine H 1 -antagonist is one or more selected from chlorpheniramine, pyrilamine, diphenhydramine triprenamine, brompheniramine, cyclidine, promethazine, and the like. Cosmetics.
JP33011494A 1994-12-05 1994-12-05 Cosmetic Pending JPH08157321A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33011494A JPH08157321A (en) 1994-12-05 1994-12-05 Cosmetic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33011494A JPH08157321A (en) 1994-12-05 1994-12-05 Cosmetic

Publications (1)

Publication Number Publication Date
JPH08157321A true JPH08157321A (en) 1996-06-18

Family

ID=18228960

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33011494A Pending JPH08157321A (en) 1994-12-05 1994-12-05 Cosmetic

Country Status (1)

Country Link
JP (1) JPH08157321A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2594274A1 (en) * 2010-06-04 2013-05-22 Kao Corporation Novel hyaluronic acid decomposition-promoting factor and inhibitor thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2594274A1 (en) * 2010-06-04 2013-05-22 Kao Corporation Novel hyaluronic acid decomposition-promoting factor and inhibitor thereof
EP2594274A4 (en) * 2010-06-04 2013-11-20 Kao Corp Novel hyaluronic acid decomposition-promoting factor and inhibitor thereof
US9056096B2 (en) 2010-06-04 2015-06-16 Kao Corporation Hyaluronic acid decomposition-promoting factor and inhibitor thereof

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