JPH0812329B2 - Projection lens - Google Patents
Projection lensInfo
- Publication number
- JPH0812329B2 JPH0812329B2 JP61262729A JP26272986A JPH0812329B2 JP H0812329 B2 JPH0812329 B2 JP H0812329B2 JP 61262729 A JP61262729 A JP 61262729A JP 26272986 A JP26272986 A JP 26272986A JP H0812329 B2 JPH0812329 B2 JP H0812329B2
- Authority
- JP
- Japan
- Prior art keywords
- lens
- negative
- group
- convex surface
- surface facing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Lenses (AREA)
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は、IC、LSI等の集積回路を製造する投影露光
装置で、特に波長248.5nmを発光スペクトルとするエキ
シマレーザーを光源とする投影レンズに関するものであ
る。Description: TECHNICAL FIELD The present invention relates to a projection exposure apparatus for manufacturing integrated circuits such as ICs and LSIs, and in particular to a projection lens using an excimer laser having a light emission spectrum of a wavelength of 248.5 nm as a light source. It is about.
（従来の技術と問題点） 露光波長が短くなれば、レンズによる吸収が問題であ
り、使用できる材質も制限される。248.5nmの波長に
は、溶融石英が用いられるが、溶融石英は屈折率が低い
ので、ペッツバール和を小さくし、全面均一な超高解像
力を有するレンズを少ない構成枚数で実現するのが困難
である。レンズの構成枚数を増やすことは、高性能化の
手法であるが、吸収が大きくなり製造上、組立調整上好
ましくない。(Prior Art and Problems) As the exposure wavelength becomes shorter, absorption by the lens becomes a problem, and usable materials are limited. Fused quartz is used for the wavelength of 248.5 nm, but since fused silica has a low refractive index, it is difficult to reduce the Petzval sum and to realize a lens with ultra-high resolution that is uniform over the entire surface with a small number of constituent elements. . Increasing the number of constituent lenses is a method of improving performance, but it is not preferable in terms of manufacturing and assembling and adjusting because it increases absorption.
（問題点を解決するための手段） ステッパーのレンズは、きわめて高性能な全面の均一
性が必要である。これを実現する基本の条件はペッツバ
ール和が小さいことであるが、ペッツバール和を小さく
する手段は系中の負の屈折面を強くするのでサジタルフ
レアの原因になりやすい。そのため本発明のレンズは第
１、第２群を夫々小さな負のパワーとし、２つの群の主
点間隔を負にとることで合成パワーが正となるような構
成にしてペッツバール和を小さくした。さらに物体側像
側の主点間隔を負の大きな値とすることにより、物像間
距離と縮小倍率が一定であっても全系の焦点距離が大き
くでき、したがって系を構成する個々のレンズのパワー
が小さくできる。(Means for Solving Problems) Stepper lenses require extremely high-performance uniformity over the entire surface. The basic condition for achieving this is that the Petzval sum is small, but the means for reducing the Petzval sum strengthens the negative refracting surface in the system and is therefore likely to cause sagittal flare. Therefore, in the lens of the present invention, the first and second groups have a small negative power, respectively, and the distance between the principal points of the two groups has a negative value so that the combined power is positive, thereby reducing the Petzval sum. Furthermore, by setting the distance between the principal points on the object side to the image side to a large negative value, the focal length of the entire system can be increased even if the object-image distance and the reduction ratio are constant, and therefore the individual lens components of the system Power can be reduced.
本発明では第１群レンズを物体側に凸面を向けた１枚
の負レンズで構成し、第２群レンズを負の焦点距離で、
２−１、２−２、２−３の３部分で構成し、２−１部は
２枚の正レンズとし、２−２部は物体側から順に物体に
凸面を向けた負のメニスカスレンズ、負レンズ、像側に
凸面を向けた負のメニスカスレンズで、２−３部は少な
くとも３枚のメニスカスレンズを有する正レンズのみの
構成で、物像間の共役距離をＬ、全系の焦点距離をｆ、
第１、第２群の焦点距離を夫々f1、f2、２−２部の焦点
距離と中心厚をそれぞれf22、Ｄとするとき （１） 0.2L＜ｆ＜0.5L （２） 0.8＜f1/f2＜2.5 （３） 2.5＜|D/f22|＜3.2 なる条件を満足させることで解決した。In the present invention, the first group lens is composed of one negative lens having a convex surface facing the object side, and the second group lens is a negative focal length,
2-1 is a positive meniscus lens, and 2-2 is a negative meniscus lens whose convex surface faces the object in order from the object side. A negative lens, a negative meniscus lens with a convex surface facing the image side, and the 2-3 part is composed of only positive lenses having at least three meniscus lenses. The conjugate distance between object images is L, and the focal length of the entire system is F,
When the focal lengths of the first and second groups are f 1 and f 2 , respectively, and the focal lengths and center thicknesses of the 2-2 part are f 22 and D, respectively (1) 0.2L <f <0.5L (2) 0.8 <F 1 / f 2 <2.5 (3) Solved by satisfying the condition 2.5 <| D / f 22 | <3.2.
（作用） 全系の焦点距離が大きいことは画角を小さくできるこ
とであって、全面の均一性の実現を容易にする。系を構
成する個々のレンズパワーが小さいことは良好な収差補
正及び構成枚数を少なくできる可能性にほかならない。
条件（１）の下限をこえるときは上述した効果が充分で
なく、上限を外れるとコマ収差の悪化とステッパーに要
求されるテレセントリック条件からのずれが大きくなる
ので好ましくない。(Function) The fact that the focal length of the entire system is large means that the angle of view can be made small, which facilitates realization of uniformity over the entire surface. The fact that the individual lens powers that make up the system are small is nothing but the possibility of achieving good aberration correction and reducing the number of constituent lenses.
If the lower limit of the condition (1) is exceeded, the above-mentioned effect is not sufficient, and if the upper limit of the condition (1) is not satisfied, coma aberration is deteriorated and deviation from the telecentric condition required for the stepper becomes large, which is not preferable.
条件（２）は、第１群と第２群のパワーの関係を与え
るものである。The condition (2) gives a relationship between the powers of the first group and the second group.
下限をこえれば第１群のパワーが第２群に対し強くな
るので、第２群中の正のパワーの負担が増大し、収差補
正の全面均一性が保てず、構成枚数を増やすなどの対策
が必要である。If the value goes below the lower limit, the power of the first lens group becomes stronger than that of the second lens group, so that the burden of the positive power in the second lens group is increased, the overall uniformity of aberration correction cannot be maintained, and the number of components is increased. Measures are required.
第２群は負の焦点距離であるが全体の構成形状は補正
能力の大きいガウス型に類似したものである。ガウス型
の構成における収差上の問題点はサジタルフレアの発生
であるが、これはガウス型の向かい合った強い凹面が原
因になっている。しかし、この負パワーを小さくすれば
ペッツバール和が増大し、またf2＜０の条件が実現でき
ない。The second lens group has a negative focal length, but the overall configuration is similar to that of the Gaussian type, which has a large correction capability. The aberrational problem in the Gaussian configuration is the occurrence of sagittal flare, which is due to the strong concave surfaces of the Gaussian type facing each other. However, if this negative power is reduced, the Petzval sum increases, and the condition of f 2 <0 cannot be realized.
そこで向かい合った凹面の中間に負レンズを配し、外
側の負レンズの形状を同心状に近づけることにより、ペ
ッツバール和の増加を防ぎサジタルのフレア補正の効果
を高めた。しかも２−２部の中心厚Ｄを条件（３）のよ
うに大きく与えることにより２−２部を構成する個々の
パワーを小さくすると共に両外側の正の屈折面における
軸上光束と斜光束の光線高の差を大きくしてフレア除去
の効果を高めた。下限をこえるときはフレアの除去の効
果が十分でなく上限をこえるときは、コンパクトさが失
われるので好ましくない。Therefore, by placing a negative lens in the middle of the concave surfaces facing each other and making the shape of the outer negative lens close to the concentric shape, the effect of sagittal flare correction was enhanced by preventing an increase in Petzval sum. Moreover, by giving a large central thickness D of the 2-2 part as in the condition (3), the individual powers forming the 2-2 part are reduced and the axial and oblique light beams on the positive refraction surfaces on both outer sides are reduced. The effect of flare removal was enhanced by increasing the difference in ray height. Above the lower limit, the effect of flare removal is not sufficient, and above the upper limit, compactness is lost, which is not preferable.
（実施例） 以下実施例を示す。(Example) An example is shown below.
第１図は第１実施例のレンズ構成図、第２図は第２実
施例のレンズ構成図、第３図及び第４図は第１実施例及
び第２実施例における各収差を表す収差図である。FIG. 1 is a lens configuration diagram of the first example, FIG. 2 is a lens configuration diagram of the second example, and FIGS. 3 and 4 are aberration diagrams showing respective aberrations in the first and second examples. Is.
実施例においてriは物体側より順に第ｉ番目のレンズ
面の曲率半径、diは物体側より順に第ｉ番目のレンズ間
隔及び空気間隔である。In the embodiment, ri is the radius of curvature of the i-th lens surface in order from the object side, and di is the i-th lens interval and air interval in order from the object side.
硝材のSiO2は溶融石英であり波長248.5nmでの屈折率
は1.521130である。The glass material SiO 2 is fused silica and has a refractive index of 1.521130 at a wavelength of 248.5 nm.
各実施例は何れも縮小倍率1/5、NA＝0.3、有効な像面
範囲10×10mmのものである。In each of the embodiments, the reduction ratio is 1/5, NA is 0.3, and the effective image plane range is 10 × 10 mm.
第１実施例 第２実施例 （発明の効果） 本発明の投影レンズは以上の条件を満足することでフ
レアを発生することなくペッツバール和を小さくでき、
全面均一な解像力を実現することができた。First embodiment Second embodiment (Effect of the Invention) The projection lens of the present invention can reduce the Petzval sum without causing flare by satisfying the above conditions,
It was possible to achieve uniform resolution over the entire surface.
【図面の簡単な説明】 第１図は第１実施例のレンズ構成図、第２図及び第３図
は第１実施例及び第２実施例における各収差を表す収差
図である。 図中、Ｉ、IIは各々第１、第２レンズ群、II1、II2、II
3は各々第２−１、第２−２、第２−３レンズ群、Ｙは
像高、Ｍはメリデオナル像面、Ｓはサジタル像面であ
る。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a lens configuration diagram of a first example, and FIGS. 2 and 3 are aberration diagrams showing respective aberrations in the first example and the second example. In the figure, I and II are the first and second lens groups, II 1 , II 2 and II, respectively.
Reference numeral 3 is each of the 2-1, 2-2, and 2-3 lens groups, Y is an image height, M is a meridional image plane, and S is a sagittal image plane.
Claims (1)
の負レンズよりなり、第２群レンズは負の焦点距離であ
って、２−１、２−２、２−３の３部分で構成されてお
り、２−１部は２枚の正レンズよりなり、２−２部は物
体側から順に物体に凸面を向けた負のメニスカスレン
ズ、負レンズ、像側に凸面を向けた負のメニスカスレン
ズよりなり、２−３部は少なくとも３枚のメニスカスレ
ンズを有する正レンズのみの構成であって、物像間の共
役距離をＬ、全系の焦点距離をｆ、第１、第２群の焦点
距離を夫々f1、f2、２−２部の焦点距離と中心厚をそれ
ぞれf22、Ｄとするとき （１） 0.2L＜ｆ＜0.5L （２） 0.8＜f1/f2＜2.5 （３） 2.5＜|D/f22|＜3.2 なる条件を満足することを特徴とする投影レンズ。1. The first group lens is composed of one negative lens having a convex surface facing the object side, and the second group lens has a negative focal length. It consists of 3 parts, the 2-1 part consists of two positive lenses, and the 2-2 part has a negative meniscus lens with a convex surface facing the object in order from the object side, a negative lens, and a convex surface facing the image side. The negative part of the negative meniscus lens is composed of only a positive lens having at least three meniscus lenses, the conjugate distance between object images is L, the focal length of the entire system is f, the first, When the focal lengths of the second lens group are f 1 and f 2 , respectively, and the focal lengths and center thicknesses of the 2-2 part are f 22 and D, respectively (1) 0.2L <f <0.5L (2) 0.8 <f 1 / f 2 <2.5 (3) 2.5 <| D / f 22 | <3.2 The projection lens is characterized by satisfying the condition.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61262729A JPH0812329B2 (en) | 1986-11-06 | 1986-11-06 | Projection lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61262729A JPH0812329B2 (en) | 1986-11-06 | 1986-11-06 | Projection lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63118115A JPS63118115A (en) | 1988-05-23 |
| JPH0812329B2 true JPH0812329B2 (en) | 1996-02-07 |
Family
ID=17379776
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61262729A Expired - Lifetime JPH0812329B2 (en) | 1986-11-06 | 1986-11-06 | Projection lens |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0812329B2 (en) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3396935B2 (en) * | 1993-11-15 | 2003-04-14 | 株式会社ニコン | Projection optical system and projection exposure apparatus |
| JP3360387B2 (en) * | 1993-11-15 | 2002-12-24 | 株式会社ニコン | Projection optical system and projection exposure apparatus |
| JP3395801B2 (en) | 1994-04-28 | 2003-04-14 | 株式会社ニコン | Catadioptric projection optical system, scanning projection exposure apparatus, and scanning projection exposure method |
| USRE38438E1 (en) | 1994-08-23 | 2004-02-24 | Nikon Corporation | Catadioptric reduction projection optical system and exposure apparatus having the same |
| JPH08179204A (en) * | 1994-11-10 | 1996-07-12 | Nikon Corp | Projection optical system and projection aligner |
| USRE38465E1 (en) | 1994-12-14 | 2004-03-16 | Nikon Corporation | Exposure apparatus |
| JP3500745B2 (en) * | 1994-12-14 | 2004-02-23 | 株式会社ニコン | Projection optical system, projection exposure apparatus, and projection exposure method |
| JP3454390B2 (en) | 1995-01-06 | 2003-10-06 | 株式会社ニコン | Projection optical system, projection exposure apparatus, and projection exposure method |
| JP3819048B2 (en) | 1995-03-15 | 2006-09-06 | 株式会社ニコン | Projection optical system, exposure apparatus including the same, and exposure method |
| JP3624973B2 (en) * | 1995-10-12 | 2005-03-02 | 株式会社ニコン | Projection optical system |
| JP3750123B2 (en) † | 1996-04-25 | 2006-03-01 | 株式会社ニコン | Projection optical system |
| JP3864399B2 (en) * | 1996-08-08 | 2006-12-27 | 株式会社ニコン | Projection exposure apparatus, projection optical system used in the projection exposure apparatus, and device manufacturing method |
| US5852490A (en) * | 1996-09-30 | 1998-12-22 | Nikon Corporation | Projection exposure method and apparatus |
| JP3757536B2 (en) * | 1996-10-01 | 2006-03-22 | 株式会社ニコン | Projection optical system, exposure apparatus including the same, and device manufacturing method |
| JPH116957A (en) * | 1997-04-25 | 1999-01-12 | Nikon Corp | Projection optical system, projection exposure system and projection exposure method |
| JP3925576B2 (en) | 1997-07-24 | 2007-06-06 | 株式会社ニコン | Projection optical system, exposure apparatus including the optical system, and device manufacturing method using the apparatus |
| US6700645B1 (en) | 1998-01-22 | 2004-03-02 | Nikon Corporation | Projection optical system and exposure apparatus and method |
| JPH11214293A (en) | 1998-01-22 | 1999-08-06 | Nikon Corp | Projection optical system and aligner therewith, and device manufacture |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5336326B2 (en) * | 1972-12-26 | 1978-10-02 | ||
| JPS60140310A (en) * | 1983-12-28 | 1985-07-25 | Canon Inc | Projecting lens |
-
1986
- 1986-11-06 JP JP61262729A patent/JPH0812329B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63118115A (en) | 1988-05-23 |
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