JPH10333030A - Precision copying lens - Google Patents

Precision copying lens

Info

Publication number
JPH10333030A
JPH10333030A JP9163329A JP16332997A JPH10333030A JP H10333030 A JPH10333030 A JP H10333030A JP 9163329 A JP9163329 A JP 9163329A JP 16332997 A JP16332997 A JP 16332997A JP H10333030 A JPH10333030 A JP H10333030A
Authority
JP
Japan
Prior art keywords
lens
surface
magnification side
side
reduction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9163329A
Other languages
Japanese (ja)
Inventor
Yoshiyuki Shimizu
義之 清水
Original Assignee
Nikon Corp
株式会社ニコン
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, 株式会社ニコン filed Critical Nikon Corp
Priority to JP9163329A priority Critical patent/JPH10333030A/en
Publication of JPH10333030A publication Critical patent/JPH10333030A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/24Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances

Abstract

(57) [Problem] To provide a precision copying lens having a sufficiently large numerical aperture, extremely high imaging performance, and a sufficiently small number of lenses. From the reduction magnification side W to the enlargement magnification side R,
A first lens group G 1 having a positive refractive power and a second lens group G 2 Metropolitan of positive refractive power, the first lens group G 1 has at least one negative lens, an aspheric lens surface of at least one surface has the door has at least two surfaces aspheric lens surface in the entire system, toward the magnification side from the reduction ratio side, and a lens surface r a having a convex surface facing the reduction magnification side, concave surface facing the magnification side and a lens surface r b toward a lens surface r c having a concave surface directed toward the reduction magnification side,
Double Gauss type lens configuration including a magnification lens surface having a convex surface directed toward the side r d, has only one set the entire system, the set double Gauss type lens configuration of the inside of the second lens group G 2 Are located in

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a lens used for precise copying, such as a projection lens used for manufacturing a semiconductor integrated circuit.

[0002]

The projection lens used in the manufacture of integrated circuits must have a maximum resolution determined by the numerical aperture of the lens and the wavelength of the light used. However, the shape of a fine pattern on a projection original (hereinafter, collectively referred to as a “reticle” in the present specification) such as a reticle and a mask is not limited to this. In order to accurately project the image on a wafer, it is required that the curvature, distortion, and other aberrations of the image plane are also corrected very strictly. That is, it is required to create an image as close as possible to a literal ideal image. Furthermore, as the size of the chip has increased, the size of the effective screen to be included has also increased. In order to satisfy these needs, the lens configuration is complicated, and about 30 lenses are required, and the design and manufacture thereof are becoming more and more difficult.
Accordingly, an object of the present invention is to provide a precision copying lens having a sufficiently large numerical aperture, extremely high imaging performance, and a sufficiently small number of lenses.

[0003]

Means for Solving the Problems The inventor of the present invention has been studying in order to solve the above-mentioned problems, and two sets of lens structures generally called a double Gaussian type are used in a conventional projection lens. Noticed that the number of lenses of the lens was increased. By introducing about two or more aspherical lens surfaces, a double Gaussian lens configuration can be realized while maintaining good imaging performance with a numerical aperture of 0.6 or more.
The inventors have found that the number of lenses can be reduced to a set, and thus the number of lenses of the entire system can be dramatically reduced, and the present invention has been completed. That is, the present invention comprises a first lens unit having a positive refractive power and a second lens unit having a positive refractive power from the reduction magnification side to the enlargement magnification side, and the first lens group includes at least one negative lens. A lens having at least one aspherical lens surface, at least two aspherical lens surfaces in the entire system, and a convex surface facing the reduction magnification side from the reduction magnification side to the enlargement magnification side. A double Gaussian lens configuration having a surface, a lens surface with a concave surface facing the magnification side, a lens surface with a concave surface facing the reduction magnification side, and a lens surface with a convex surface facing the magnification side. Having only one set, the one set of double Gaussian lens arrangements is a precision copying lens located in the second lens group. By employing at least two aspheric lens surfaces in this way, the number of components of a precision copying lens such as a projection lens can be reduced to, for example, half of the conventional one, that is, to about fifteen.

When the precision copying lens according to the present invention is used as a projection lens for semiconductor manufacturing, light rays travel from the magnification side (reticle side) to the reduction side (wafer side). The following description is based on the assumption that a light beam travels from an object (wafer) on the magnification side to an image plane (reticle) on the magnification side. The basic structure of the precision copying lens according to the present invention is roughly divided into two lens groups G 1 and G 2 .
The first arranged on the reduction magnification side, that is, on the object side (wafer side)
Lens group G 1 gives a shape close to the front group of the microscope objective lens, and the divergent light beam emitted from the object (wafer) substantially parallel state. On the other hand, as the second lens group G 2 disposed on the magnification side of the rear (reticle side), currently using a double Gauss-type camera lens known as well corrected most reliable type of aberration. Note that the lens arrangement of a double Gaussian is a symmetrical lens arrangement, thus it is the same be defined from either side, and a lens surface r a having a convex surface facing example the reduction ratio side (wafer side) , and a lens surface r b having a concave surface directed toward the magnification side (reticle side), towards a lens surface r c having a concave surface facing the reduction ratio side (wafer side), the convex surface on the magnification side (reticle side) lens Surface r d, and these lens surfaces r a , r
b, r c, r d refers to a lens disposed configured in this order.

In general, a microscope objective lens has a tendency for sagittal coma to curve negatively, and a double Gaussian lens, on the contrary, has a tendency for sagittal coma to curve positively. Therefore, by combining these lenses, the sagittal coma is corrected to a favorable state. This is the basic concept of the optical system according to the present invention. However, if a microscope objective lens and a Gaussian lens are combined, coma is not necessarily corrected. In other words, the above structure is a necessary condition but not a sufficient condition. In addition, there is a limit to aberration correction if the form of the prototype is used as it is, and it is desirable that aberrations generated from both lens groups G 1 and G 2 be as small as possible.

First, the configuration of the first lens group G 1 based on a microscope objective lens is, in principle, a continuation of a playless surface.
Originally, spherical aberration has a characteristic of being well corrected.
In order to reduce a light beam having a numerical aperture of about 0.6 to a substantially parallel state without generating a large spherical aberration, about five positive lenses are required with a refractive index of 1.5. Since the magnification in this case is about five times, the luminous flux corresponding to a numerical aperture of 0.6 is reduced to about 0.1. However, in this state, the characteristics of the microscope objective lens are directly inherited, so that the sagittal coma tends to curve negatively. Therefore to reduce this tendency, in order to prevent the generation of a large frame, the first lens group G 1 corresponding to the microscope objective lens in the present invention introduces at least one negative lens. However since the introduction of the negative lens, since the positive power of the first lens group G 1 is to be insufficient, it is necessary to increase the power of the positive lens in the first lens group G 1. Here, if the number of positive lenses is increased, the object of the present invention cannot be achieved. Therefore, in the present invention, the power is increased by increasing the curvature of the positive lens without increasing the number of constituent lenses, and the generation of aberrations due to this is prevented by employing an aspherical surface.

[0007] negative lens and aspheric contained this way the first lens group G 1, since it is an object mainly peripheral portion of the screen image to the prone coma correction generation of the effective diameter of the lens is relatively It is better to employ these on small surfaces. The reason for this is that the height at which the respective light beams emitted from the center and the periphery of the object (wafer) pass through the lens is greatly different overall, which is effective for correcting the coma in the peripheral portion. That is, it is desirable that the surface relatively close to the object (wafer) be an aspheric surface. As a specific configuration of the first lens group, a positive lens, a negative lens, and a concave surface on the reduction magnification side (wafer side) are sequentially arranged from the reduction magnification side (wafer side) to the enlargement magnification side (reticle side). It is preferable to have a configuration having two positive meniscus lenses directed toward.

[0008] The light beam which has become substantially parallel by the first lens group G 1 is imaged on an image plane (reticle) by the second lens group G 2 having a positive refractive power. Here, it is necessary to include another aspherical surface in order to satisfactorily correct spherical aberration, in addition to the aspherical surface for the purpose of correcting coma aberration. For this purpose, it is efficient to make the surface with a larger effective diameter and the light beam spread more aspherical. At the boundary between the two lens groups G 1 and G 2 , the light flux is close to parallel light, that is, since the light flux is spread, it is desirable that the surface near the boundary between the two lens groups G 1 and G 2 be aspheric. In the following embodiments, the aspherical surface is arranged in the second lens group G 2, but both lens group G 1, G 2 of the first lens group G 1 near the boundary
The lens surface on the side may be aspherical.

The second lens group G 2 using a double Gaussian lens can be a double Gaussian prototype as it is, but in order to bend light rays gently, the concave surface is directed to the magnification side (reticle side). a lens having a surface r b has a lens having a lens surface r c having a concave surface facing the reduction ratio side (wafer side), both it is preferable that the negative meniscus lens. For the same reason, while the lens having a lens and a lens surface r c having a lens surface r b, it is preferable to place at least one negative lens, and further, at least one of the negative lens It is preferable that the negative lens is formed in a biconcave shape. With such a configuration, the Petzval sum can be satisfactorily corrected while mainly suppressing an adverse effect on the frame.

[0010]

Embodiments of the present invention will be described with reference to the drawings. In each of the following embodiments, the precision copying lens according to the present invention is applied to a projection optical system of a semiconductor exposure apparatus. FIGS. 1, 3, 5, and 7 show first to fourth embodiments, respectively.
1 shows a cross-sectional view of a projection optical system according to an embodiment. Each of the projection optical systems according to the embodiments projects the pattern on the reticle R onto the wafer W at a reduction magnification, and performs positive refraction from the reduction magnification side, that is, the wafer W side, to the enlargement magnification side, that is, the reticle side. a first lens group G 1 of the force, and a second lens group G 2 Metropolitan of positive refractive power. The aperture stop AS has two lens groups G 1 ,
It is disposed between the G 2. In the drawing, the mark * indicates an aspheric lens surface.

Tables 1 to 4 show the first to fourth data, respectively.
The specifications of the embodiment will be described. In each table, the wafer W side is the object plane,
The reticle R side is shown as an image plane. In [main specifications], y is a maximum image height (light ray height on the reticle R), N
A indicates the object side (wafer W side) numerical aperture. In [Lens Specifications], the first column No is the number of the lens surface from the object side (wafer W side), the second column r is the radius of curvature of each lens surface, and the third column d is the next lens from each lens surface. distance to the surface, showing the fourth column is the number of each lens, the lens surface r a fifth column Gaussian lens configuration, r b, r c, the r d.

The lens surface marked with * in the first column indicates an aspherical surface, and the second column r for the aspherical lens surface indicates the radius of curvature of the vertex. The shape of the aspheric surface is y: height from the optical axis z: distance in the optical axis direction from the tangent plane to the aspherical surface r: vertex radius of curvature κ: conical coefficient A, B, C, D: aspherical surface coefficient Data] conic coefficient κ
And the aspheric coefficients A, B, C, and D are shown. The glass material of all the lenses in all the examples is synthetic quartz, and the refractive index of the synthetic quartz is n = 1.50839. The design wavelength λ of the lens is λ = 248.4 nm.

In each embodiment, five lenses L 1 to L 5 belong to the first lens group G 1 , and ten lenses L 6 to L 15 belong to the second lens group G 2 . Belong. Therefore, the whole system is composed of 15 lenses,
This is half the number of components in the conventional example. The first lens group G 1 of the first embodiment includes a positive lens L 1, a negative lens L 2, the three positive meniscus lens L 3 ~L 5 having a concave surface facing the reduction ratio side (wafer W side) And one aspheric lens surface r
With 3 . The second lens group G 2 has one aspheric lens surface r.
With 12 . Also, of the double Gaussian lens configuration,
Lens surface r with concave surface facing magnification side (reticle R side)
a lens L 9 having a b, a lens L 12 having a lens surface r c having a concave surface facing the reduction ratio side (wafer W side) are both negative meniscus lens, between the lenses L 9, L 12 , biconcave lens L 10 of two, L 11 are disposed.

The first lens group G 1 of the second embodiment includes a positive lens L 1 , a negative lens L 2, and two positive meniscus lenses L 3 having concave surfaces facing the reduction magnification side (wafer W side). and L 4, made up of a double-convex lens L 5, having an aspheric lens surface r 1 of the first surface. The second lens group G 2 having an aspherical lens surface r 12 of the first surface. Also, of the double Gauss type lens configuration, a lens L 12 having a lens L 9 and the lens surface r c having a lens surface r b are both negative meniscus lens, between the lenses L 9, L 12, biconcave lens L 10 of two, L 11 are disposed.

The first lens group G 1 of the third embodiment includes a positive lens L 1 , a negative lens L 2, and two positive meniscus lenses L 3 having concave surfaces facing the reduction magnification side (wafer W side). and L 4, made up of a double-convex lens L 5, having an aspheric lens surface r 1 of the first surface. The second lens group G 2 has two aspheric lens surfaces r 12 and r 12 .
Has 26 . Also, of the double Gaussian lens configuration,
Lens L 12 having a lens L 9 and the lens surface r c having a lens surface r b are both negative meniscus lens, between the lenses L 9, L 12, 2 pieces of a biconcave lens L 10, L
11 are located.

The first lens group G 1 of the fourth embodiment includes a positive lens L 1 , a negative lens L 2, and three positive meniscus lenses L 3 to L 3 having concave surfaces facing the reduction magnification side (the wafer W side). made L 5, having an aspheric lens surface of the third surface r 1, r 5, r 9 . The second lens group G 2 having an aspherical lens surface r 15, r 19 of the two surfaces. Also, of the double Gauss type lens configuration, a lens L 11 having a lens L 8 and the lens surface r c having a lens surface r b are both negative meniscus lens, between the lenses L 9, L 12, biconcave lens L 10 and the meniscus lens L 11 is disposed.

[0017]

[Table 1] [Main specifications] y = 54, NA = 0.63 [Lens specifications] Nord 0 ∞ 12.000 W 1 -412.3737 32.015 L 1 2 -48.0908 2.000 * 3 -74.9914 9.000 L 2 4 440.0919 33.447 5 -117.6334 26.050 L 3 6 -86.5393 2.608 7 -185.4456 51.184 L 4 8 -126.6760 58.837 9 -452.3392 45.000 L 5 10 -174.0447 36.481 11 - 30.578 AS * 12 863.8970 45.000 L 6 13 -619.2023 26.007 14 624.7659 42.343 L 7 15 -401.7493 2.000 16 175.5021 43.002 L 8 r a 17 1229.9919 2.000 18 195.0359 65.000 L 9 19 94.0609 21.600 r b 20 -298.7846 9.000 L 10 21 74.6685 21.665 22 -181.7479 80.000 L 11 23 370.2730 61.030 24 -94.4933 10.463 L 12 r c 25 -223.7255 2.000 26 3080.5003 28.011 L 13 27 -184.9088 2.000 r d 28 557.7267 27.021 L 14 29 -313.1645 2.000 30 244.4765 66.204 L 15 31 551.5976 104.452 32 ∞ R [ aspherical data] No = 3 κ = 0.0 A = -0.838669 × 10 -6 B = -0.120851 × 10 -9 C = -0.221456 × 10 -13 D = -0.322104 × 10 -17 No = 12 κ = 0.0 = -0.133559 × 10 -7 B = 0.112938 × 10 -13 C = -0.299594 × 10 -18 D = -0.157510 × 10 -22

[0018]

[Table 2] [Main specifications] y = 54, NA = 0 .63 [ Lens Data] No r d 0 ∞ 12.000 W * 1 -285.2904 19.137 L 1 2 -54.4743 2.523 3 -77.4934 55.752 L 2 4 -4040.8431 56.566 5 -336.3406 41.278 L 3 6 -142.4889 2.000 7 -3794.5868 31.973 L 4 8 -334.2358 2.000 9 1213.1931 45.000 L 5 10 -388.8907 62.346 11 - 56.232 AS * 12 15648.4082 45.000 L 6 13 -422.4152 2.000 14 409.0829 41.395 L 7 15 -826.4280 2.000 16 184.9031 44.411 L 8 r a 17 1162.2125 2.000 18 172.1969 65.000 L 9 19 97.7177 21.650 r b 20 -387.3645 15.000 L 10 21 69.8491 22.975 22 -167.5942 80.000 L 11 23 597.8696 52.022 24 -87.9543 15.000 L 12 r c 25 -254.4693 2.000 26 1304.4999 26.721 L 13 27 -206.8947 2.000 r d 28 588.3735 26.762 L 14 29 -292.5931 2.000 30 242.0915 41.896 L 15 31 730.7850 103.361 32 ∞ R [ aspherical data] No = 1 κ = 0.0 A = -0.277552 × 10 -6 B = 0.339384 × 10 -9 C = -0.213289 × 10 -12 D = 0.870635 × 10 -16 No = 12 κ = 0.0 A = -0.115626 × 10 -7 B = 0.171661 × 10 -13 C = -0.470891 × 10 -18 D = -0.299676 × 10 -23

[0019]

[Table 3] [Main specifications] y = 54, NA = 0 .63 [ Lens Data] No r d 0 ∞ 12.000 W * 1 -343.4103 38.622 L 1 2 -94.8805 2.000 3 -265.0377 59.951 L 2 4 762.1421 47.494 5 -424.8097 34.070 L 3 6 -174.9866 2.000 7 -822.7865 34.312 L 4 8 -237.0235 2.000 9 899.8952 45.000 L 5 10 -364.8016 68.188 11 - 62.074 AS * 12 1448.0526 45.000 L 6 13 -504.8813 2.000 14 370.2340 43.211 L 7 15 - 801.1447 2.000 16 183.4536 41.299 L 8 r a 17 878.5361 2.000 18 160.7184 57.613 L 9 19 89.8972 23.758 r b 20 -323.3084 15.000 L 10 21 71.7007 21.662 22 -182.7204 80.000 L 11 23 386.3882 51.701 24 -83.4276 15.000 L 12 r c 25 - 182.5485 2.000 * 26 2056.7360 26.345 L 13 27 -204.0595 2.000 r d 28 420.5864 26.676 L 14 29 -350.2068 2.000 30 237.0890 28.247 L 15 31 515.2003 104.777 32 ∞ 100.006 R [ aspherical data] No = 1 κ = 0.0 A = 0.175468 × 10 -6 B = 0.122760 × 10 -9 C = -0.757276 × 10 -13 D = 0.201173 × 10 -16 No = 12 κ = 0.0 A = -0.112281 × 10 -7 B = 0.326511 × 10 -13 C = -0.382247 × 10 -18 D = -0.598689 × 10 -23 No = 26 κ = 0.0 A = 0.177749 × 10 -7 B =- 0.769096 × 10 -12 C = -0.881895 × 10 -18 D = 0.119522 × 10 -20

[0020]

[Table 4] [Main specifications] y = 60, NA = 0.75 [Lens specifications] Nord 0 ∞ 11.000 W * 1 -451.9668 28.812 L 1 2 -51.3422 2.106 3 -54.3232 98.270 L 2 4 3964.7967 5.124 * 5 -4129.6700 85.627 L 3 6 -152.6636 1.000 7 -1109.5486 47.313 L 4 8 -294.0002 1.000 * 9 -1111.1011 61.292 L 5 10 -265.6806 130.298 11 - 10.000 AS 12 1549.5637 42.510 L 6 13 -3072.1449 2.651 14 477.7674 79.360 L 7 r a * 15 -332.1729 1.000 16 175.7794 100.173 L 8 17 106.9303 34.731 r b 18 -380.1037 13.600 L 9 * 19 167.4018 28.351 20 -145.5550 150.000 L 10 21 -2196.5821 36.153 22 -104.3517 52.125 L 11 r c 23 -185.2823 1.000 24 15580.9719 41.656 L 12 25 -278.1868 1.000 r d 26 311.7384 44.430 L 13 27 -1507.9969 1.000 28 356.1569 56.523 L 14 29 79374.1600 73.755 30 -442.6464 13.600 L 15 31 659.8543 94.542 32 ∞ R [ aspherical data] No = 1 κ = 0.0 A = 0.150092 × 10 -7 B = -0.208705 × 10 -10 C = 0.375337 × 10 -13 D = -0.148854 × 10 -16 No = 5 κ = 0.0 A = -0.342906 × 10 -7 B = 0.135963 × 10 -11 C = 0.684686 × 10 -17 D = -0.684736 × 10 -21 No = 9 κ = 0.0 A = -0.955961 × 10 -8 B = 0.221468 x 10 -13 C = -0.105327 x 10 -17 D = -0.233395 x 10 -22 No = 15 κ = 0.0 A = 0.789729 x 10 -8 B = -0.116109 x 10 -13 C = 0.356843 × 10 -18 D = 0.175759 × 10 -24 No = 19 κ = 0.0 A = 0.687489 × 10 -8 B = 0.107561 × 10 -11 C = 0.856171 × 10 -16 D = 0.586065 × 10 -20

FIGS. 2, 4, 6, and 8 show first to first examples, respectively.
13 shows spherical aberration, astigmatism, and distortion of the fourth example. Each aberration diagram is an aberration diagram with the reticle R side as an image plane. A dotted line in the astigmatism diagram represents a meridional image plane, and a solid line represents a sagittal image plane. As is clear from each aberration diagram,
It can be seen that each embodiment has extremely excellent imaging performance.

[0022]

As described above, according to the present invention, it is possible to obtain a precision copying lens having a sufficiently large numerical aperture, extremely high imaging performance, and a sufficiently small number of lenses.

[Brief description of the drawings]

FIG. 1 is a sectional view showing a lens configuration of a first embodiment of a precision copying lens according to the present invention.

FIG. 2 is a diagram showing various aberrations of the first embodiment.

FIG. 3 is a sectional view showing a lens configuration of a second embodiment.

FIG. 4 is a diagram showing various aberrations of the second embodiment.

FIG. 5 is a sectional view showing a lens configuration of a third embodiment.

FIG. 6 is a diagram showing various aberrations of the third embodiment.

FIG. 7 is a sectional view showing a lens configuration of a fourth embodiment.

FIG. 8 is a diagram showing various aberrations of the fourth embodiment.

[Explanation of symbols]

L 1 ~L 15 ... lens G 1, G 2 ... lens group W ... wafer R ... reticle AS ... aperture stop * aspheric lens surface

Claims (5)

    [Claims]
  1. A first lens group having a positive refractive power and a second lens group having a positive refractive power, wherein the first lens group has at least one negative lens element. A lens and at least one aspherical lens surface, the whole system having at least two aspherical lens surfaces, and a convex surface facing the reduction magnification side from the reduction magnification side to the enlargement magnification side. A double Gaussian lens configuration having a lens surface, a lens surface with a concave surface facing the magnification side, a lens surface with a concave surface facing the reduction magnification side, and a lens surface with a convex surface facing the magnification side A precision copying lens, wherein only one set is provided, wherein said one set of double Gaussian lens arrangements is disposed in said second lens group.
  2. 2. The first lens group includes a positive lens, a negative lens, and two positive meniscus lenses whose concave surfaces face the reduction magnification side from the reduction magnification side toward the magnification magnification side.
    The precision copying lens according to claim 1.
  3. 3. The precision copying lens according to claim 1, wherein said second lens group has at least one aspheric lens surface.
  4. 4. A lens having a lens surface having a concave surface facing the magnification side and a lens having a lens surface having a concave surface facing the reduction side are both meniscus negative lenses.
    The precision copying lens according to claim 1, 2 or 3.
  5. 5. A lens having at least one negative lens between a lens having a lens surface with a concave surface facing the enlargement magnification side and a lens having a lens surface with a concave surface facing the reduction magnification side, 5. The precision copying lens according to claim 1, wherein at least one of the negative lenses is formed in a biconcave shape.
JP9163329A 1997-06-04 1997-06-04 Precision copying lens Pending JPH10333030A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9163329A JPH10333030A (en) 1997-06-04 1997-06-04 Precision copying lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9163329A JPH10333030A (en) 1997-06-04 1997-06-04 Precision copying lens

Publications (1)

Publication Number Publication Date
JPH10333030A true JPH10333030A (en) 1998-12-18

Family

ID=15771793

Family Applications (1)

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Country Status (1)

Country Link
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1235092A2 (en) * 2001-02-23 2002-08-28 Nikon Corporation Projection optical system, projection apparatus and projection exposure method
US6459534B1 (en) 1999-06-14 2002-10-01 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus with the same, and device manufacturing method
US6606144B1 (en) 1999-09-29 2003-08-12 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
US6621555B1 (en) 1999-06-14 2003-09-16 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus with the same, and device manufacturing method
US6674513B2 (en) 1999-09-29 2004-01-06 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
US6862078B2 (en) 2001-02-21 2005-03-01 Nikon Corporation Projection optical system and exposure apparatus with the same
US6867922B1 (en) 1999-06-14 2005-03-15 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus using the same

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6459534B1 (en) 1999-06-14 2002-10-01 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus with the same, and device manufacturing method
US6867922B1 (en) 1999-06-14 2005-03-15 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus using the same
US6621555B1 (en) 1999-06-14 2003-09-16 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus with the same, and device manufacturing method
US6864961B2 (en) 1999-09-29 2005-03-08 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
US6674513B2 (en) 1999-09-29 2004-01-06 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
US6606144B1 (en) 1999-09-29 2003-08-12 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
US6862078B2 (en) 2001-02-21 2005-03-01 Nikon Corporation Projection optical system and exposure apparatus with the same
EP1235092A2 (en) * 2001-02-23 2002-08-28 Nikon Corporation Projection optical system, projection apparatus and projection exposure method
EP1235092A3 (en) * 2001-02-23 2004-06-23 Nikon Corporation Projection optical system, projection apparatus and projection exposure method
US6556353B2 (en) 2001-02-23 2003-04-29 Nikon Corporation Projection optical system, projection exposure apparatus, and projection exposure method

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