JPH08102472A - Palladium alloy thin wire for semiconductor device - Google Patents

Palladium alloy thin wire for semiconductor device

Info

Publication number
JPH08102472A
JPH08102472A JP6261230A JP26123094A JPH08102472A JP H08102472 A JPH08102472 A JP H08102472A JP 6261230 A JP6261230 A JP 6261230A JP 26123094 A JP26123094 A JP 26123094A JP H08102472 A JPH08102472 A JP H08102472A
Authority
JP
Japan
Prior art keywords
ppm
thin wire
palladium alloy
bonding
rare earth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6261230A
Other languages
Japanese (ja)
Inventor
Kiyoshi Furukawa
潔 古川
Koji Matsumoto
浩二 松本
Masanobu Matsuzawa
正信 松澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP6261230A priority Critical patent/JPH08102472A/en
Publication of JPH08102472A publication Critical patent/JPH08102472A/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45163Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
    • H01L2224/45164Palladium (Pd) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01004Beryllium [Be]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01014Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/0102Calcium [Ca]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01046Palladium [Pd]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01047Silver [Ag]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01049Indium [In]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01077Iridium [Ir]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/011Groups of the periodic table
    • H01L2924/01105Rare earth metals

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)

Abstract

PURPOSE: To obtain reliability in bonding with a long loop and short distance between wires, by constituting a thin wire which contains one or two or more kinds of a specific amount of rare earth elements, and Ag and Ca, and one or two or more kinds of Be, Ge, Si, In and Ir, with the residual part composed of Pd and inevitable impurities. CONSTITUTION: This thin wire contains the following: One or two or more kinds of rare earth element: 0.2-100wt.ppm Ag;1-500wt.ppm, Ca; 0.2-100wt.ppm; and one or two or more kinds of Be, Ge, Si; In and Ir: 0.2-100wt.ppm. The residual part is composed of Pd and inevitable impurities. The rare earth elements improve high temperature strength, and the amount is preferably 1-50wt.ppm. Ag and Ca improve the sphericity of a ball, and the amounts of Ag and Ca are preferably 10-500wt.ppm and 1-50wt.ppm, respectively. Be, Ge, Si, In and Ir improve the loop stability, and the amount is preferably 1-50wt.ppm. Thereby bonding is enabled with reliability higher than the conventional case.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、半導体装置のボンデ
ィングワイヤーとして使用するパラジウム合金細線に関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a palladium alloy thin wire used as a bonding wire for a semiconductor device.

【0002】[0002]

【従来の技術】一般に、半導体装置用パラジウム合金ボ
ンディングワイヤーとして、希土類元素の一種または二
種以上:0.0005〜2.0wt%を含有し、さらに
必要に応じて、Ca、Be、Geの一種または二種以
上:0.0005〜0.5wt%を含有し、残りがPd
および不可避不純物からなる組成を有することを特徴と
する半導体装置用パラジウム合金細線が知られており
(特公昭61−12011号公報参照)、さらに、Pd
またはPd合金にPdまたはPd合金より低い沸点を有
しPdと固溶する低沸点元素:25〜10000atp
pm、Zr、Y、希土類元素、Ca、Sr、Hfの一種
または二種以上:10〜200atppmを含有し、残
りがPdおよび不可避不純物からなる組成を有する半導
体装置用パラジウム合金細線が知られており(特開平5
−175270号公報参照)、これらのパラジウム合金
細線はいずれも高温強度に優れていることも知られてい
る。
2. Description of the Related Art Generally, one or more rare earth elements: 0.0005 to 2.0 wt% are contained as a palladium alloy bonding wire for semiconductor devices, and if necessary, one of Ca, Be and Ge. Or two or more kinds: 0.0005 to 0.5 wt% is contained, and the rest is Pd
Also known is a palladium alloy thin wire for semiconductor devices, which is characterized by having a composition comprising unavoidable impurities (see Japanese Patent Publication No. 61-12011), and further, Pd.
Alternatively, a low boiling point element having a boiling point lower than that of Pd or Pd alloy in Pd alloy and having a solid solution with Pd: 25 to 10,000 atp
One or more of pm, Zr, Y, rare earth elements, Ca, Sr, and Hf: 10 to 200 atppm is contained, and the remainder is a palladium alloy thin wire for a semiconductor device having a composition of Pd and inevitable impurities. (JP-A-5
It is also known that all of these palladium alloy thin wires have excellent high temperature strength.

【0003】[0003]

【発明が解決しようとする課題】しかし、近年の半導体
装置においては、接合点間隔が4mmを越えるような長
ループを形成し、しかもワイヤ相互間の距離を益々狭な
るようなボンディングが求められており、この要求に対
して、前記従来の高温強度の高いパラジウム合金細線で
は十分に信頼性のあるボンディングは得られなかった。
However, in recent semiconductor devices, there has been a demand for bonding that forms a long loop with a junction interval of more than 4 mm and further reduces the distance between wires. However, with respect to this requirement, sufficiently reliable bonding cannot be obtained with the above-mentioned conventional palladium alloy fine wire having high high-temperature strength.

【0004】[0004]

【課題を解決するための手段】そこで、本発明者らは、
従来よりも信頼性のあるボンディングができるパラジウ
ム合金細線を得るべく研究を行った結果、信頼性のある
ボンディングができるパラジウム合金細線は高温強度が
優れていることは勿論であるが、ボンディング時に形成
されるボールの真球性、ループの安定性、耐樹脂流れ
性、接合性などが優れていることが必要であり、これら
の特性を満たすパラジウム合金細線は、希土類元素の一
種または二種以上:0.2〜100wt.ppm、A
g:1〜5000wt.ppm、Ca:0.2〜100
wt.ppm、Be、Ge、Si、In、Irの一種ま
たは二種以上:0.2〜100wt.ppm、を含有
し、残りがPdおよび不可避不純物からなる組成を有す
るという知見を得たのである。
Means for Solving the Problems Accordingly, the present inventors have:
As a result of research to obtain a palladium alloy thin wire that can be bonded more reliably than before, it is obvious that a palladium alloy thin wire that can be bonded more reliably has excellent high-temperature strength. It is necessary that the ball has excellent sphericalness, loop stability, resin flow resistance, and bondability, and the palladium alloy thin wire satisfying these characteristics is one or more rare earth elements: 0 2-100 wt. ppm, A
g: 1 to 5000 wt. ppm, Ca: 0.2-100
wt. ppm, Be, Ge, Si, In, Ir, or two or more: 0.2 to 100 wt. It has been found that the composition has a content of ppm and the rest is Pd and inevitable impurities.

【0005】この発明は、かかる知見にもとづいてなさ
れたものであって、希土類元素の一種または二種以上:
0.2〜100wt.ppm、Ag:1〜5000w
t.ppm、Ca:0.2〜100wt.ppm、B
e、Ge、Si、In、Irの一種または二種以上:
0.2〜100wt.ppm、を含有し、残りがPdお
よび不可避不純物からなる組成を有する半導体素子用パ
ラジウム合金細線、に特徴を有するものである。
The present invention has been made on the basis of such findings, and one or more rare earth elements:
0.2-100 wt. ppm, Ag: 1 to 5000 w
t. ppm, Ca: 0.2-100 wt. ppm, B
One or more of e, Ge, Si, In, Ir:
0.2-100 wt. It is characterized by a palladium alloy thin wire for a semiconductor device, which has a composition containing Pd and the balance Pd and unavoidable impurities.

【0006】この発明の半導体素子用パラジウム合金細
線において、含有する成分組成を前記のごとく限定した
のは下記の理由によるものである。
In the palladium alloy fine wire for a semiconductor device of the present invention, the component composition contained is limited as described above for the following reason.

【0007】(a)希土類元素 希土類元素はパラジウム合金細線の高温強度を向上させ
る成分であるが、その含有量が0.2wt.ppm未満
では所望の効果が得られず、一方、希土類元素を100
wt.ppmを越えて含有させると、ボンディング時に
形成されるボールの真球性が劣化するので好ましくない
ことによるものである。希土類元素の含有量の一層好ま
しい範囲は1〜50wt.ppmである。
(A) Rare Earth Element A rare earth element is a component that improves the high temperature strength of a palladium alloy thin wire, but its content is 0.2 wt. If it is less than ppm, the desired effect cannot be obtained.
wt. This is because if the content is more than ppm, the sphericity of the ball formed during bonding deteriorates, which is not preferable. A more preferable range of the rare earth element content is 1 to 50 wt. It is ppm.

【0008】(b)Ag Agはパラジウム合金細線のボンディング時に形成され
るボールの真球性を向上させる成分であるが、その含有
量が1wt.ppm未満では所望の効果が得られず、一
方、Agを5000wt.ppmを越えて含有させる
と、線引き加工性が劣化するので好ましくないことによ
るものである。Agの含有量の一層好ましい範囲は10
〜500wt.ppmである。
(B) Ag Ag is a component that improves the sphericity of balls formed during the bonding of fine palladium alloy wires, but its content is 1 wt. If it is less than ppm, the desired effect is not obtained, while Ag is 5000 wt. This is because if it is contained in excess of ppm, wire drawing workability is deteriorated, which is not preferable. A more preferable range of the Ag content is 10
~ 500 wt. It is ppm.

【0009】(c)Ca CaはAgと共存してパラジウム合金細線のボンディン
グ時に形成されるボールの真球性を向上させる成分であ
るが、その含有量が0.2wt.ppm未満では所望の
効果が得られず、一方、Caを100wt.ppmを越
えて含有させると、線引き加工性が劣化するので好まし
くないことによるものである。Caの含有量の一層好ま
しい範囲は1〜50wt.ppmである。
(C) Ca Ca is a component that coexists with Ag to improve the sphericity of the ball formed during the bonding of the palladium alloy thin wire, but its content is 0.2 wt. If it is less than ppm, the desired effect cannot be obtained, while Ca is 100 wt. This is because if it is contained in excess of ppm, wire drawing workability is deteriorated, which is not preferable. A more preferable range of the Ca content is 1 to 50 wt. It is ppm.

【0010】(d)Be、Ge、Si、In、Ir これら成分は、AgおよびCaと共存してパラジウム合
金細線のループ安定性を向上させる成分であるが、それ
らの含有量が0.2wt.ppm未満では所望の効果が
得られず、一方、100wt.ppmを越えて含有させ
てと接合性が劣化するので好ましくないことによるもの
である。Be、Ge、Si、In、Irの含有量の一層
好ましい範囲は1〜50wt.ppmである。
(D) Be, Ge, Si, In, Ir These components coexist with Ag and Ca to improve the loop stability of the palladium alloy thin wire, but their content is 0.2 wt. If it is less than ppm, the desired effect cannot be obtained, while if it is 100 wt. This is because it is not preferable because if the content exceeds 0.0 ppm, the bondability deteriorates. A more preferable range of the content of Be, Ge, Si, In, Ir is 1 to 50 wt. It is ppm.

【0011】[0011]

【実施例】通常の真空溶解炉により表1〜表7に示され
る成分組成に調整されたPd合金を溶解し、得られたP
d合金溶湯を鋳造し、直径:55mm、長さ:150m
mのビレットを作製した。これらのビレットを溝ロー
ル、単頭伸線機により直径:8mmに減面し、その後、
連続伸線機により直径:25μmの極細線とした。さら
に最終処理として、環状炉において、温度およびスピー
ドを調整の上、引張り破断試験機で伸びが4%となるよ
うな焼鈍を行ない、本発明Pd合金細線1〜51および
従来Pd合金細線1〜9を作製した。
EXAMPLES Pd obtained by melting Pd alloys adjusted to the component compositions shown in Tables 1 to 7 in a normal vacuum melting furnace
Cast d alloy molten metal, diameter: 55mm, length: 150m
m billets were produced. These billets were reduced to a diameter of 8 mm with a groove roll and a single head wire drawing machine, and then
An ultrafine wire having a diameter of 25 μm was formed by a continuous wire drawing machine. Further, as a final treatment, in a ring furnace, after adjusting the temperature and speed, annealing was carried out by a tensile rupture tester so that the elongation was 4%. Was produced.

【0012】ついで、本発明Pd合金細線1〜51およ
び従来Pd合金細線1〜9について、それぞれ下記に示
す試験を行い、各種特性の評価を行い、その結果を表1
〜表7に示した。
The Pd alloy fine wires 1 to 51 of the present invention and the conventional Pd alloy fine wires 1 to 9 were subjected to the following tests to evaluate various characteristics, and the results are shown in Table 1.
~ Shown in Table 7.

【0013】高温強度試験 前記本発明Pd合金細線1〜51および従来Pd合金細
線1〜9を250℃で引っ張り試験し、切断強度を測定
した。
High temperature strength test The Pd alloy fine wires 1 to 51 of the present invention and the conventional Pd alloy fine wires 1 to 9 were subjected to a tensile test at 250 ° C to measure the cutting strength.

【0014】ボールの真球性試験 本発明Pd合金細線1〜51および従来Pd合金細線1
〜9の一端を加熱して、図1に示されるようにボールア
ップし、ボールの長軸および短軸の大きさを測定し、そ
の差を絶対値として求めた。
Ball Sphericality Test Pd Alloy Fine Wires 1 to 51 of the Present Invention and Conventional Pd Alloy Fine Wire 1
One end of ˜9 was heated and the ball was raised as shown in FIG. 1, the sizes of the long axis and the short axis of the ball were measured, and the difference was determined as an absolute value.

【0015】接合性試験 本発明Pd合金細線1〜51および従来Pd合金細線1
〜9を大気中でボールアップし、200℃でSi基板の
Al上の第1接合点にボンディングしたのち4mm離れ
た第2接合点にボンディングしてループを形成し、50
本中、1本でも接合しないものがあった場合を×、すべ
て接合した場合を○として示した。
Bondability test Pd alloy fine wires 1 to 51 of the present invention and conventional Pd alloy fine wires 1
Balls 9 to 9 in the air, are bonded to the first bonding point on Al of the Si substrate at 200 ° C., and are then bonded to the second bonding point 4 mm apart to form a loop.
In the examples, the case where even one piece was not joined was indicated by x, and the case where all were joined was indicated by o.

【0016】ループの安定性試験 本発明Pd合金細線1〜51および従来Pd合金細線1
〜9を第1接合点Aにボンディングしたのち4mm離れ
た第2接合点Bにボンディングしてループを形成し、図
2に示されるように、第1接合点Aと第2接合点Bを結
ぶ中心線からの曲り量(μm)の最大値を測定した。
Loop stability test Pd alloy fine wires 1 to 51 of the present invention and conventional Pd alloy fine wires 1
9 to 9 are bonded to the first bonding point A and then to the second bonding point B 4 mm apart to form a loop, and the first bonding point A and the second bonding point B are connected as shown in FIG. The maximum value of the bending amount (μm) from the center line was measured.

【0017】耐樹脂流れ性試験 本発明Pd合金細線1〜51および従来Pd合金細線1
〜9のループの安定性試験で得られた4mmのループを
170℃にてモールディングし、図2に示されるよう
に、第1接合点Aと第2接合点Bを結ぶ中心線からの樹
脂流れによる曲り量(μm)の最大値を測定した。
Resin flow resistance test Pd alloy fine wires 1 to 51 of the present invention and conventional Pd alloy fine wires 1
A 9 mm loop stability test of 4 mm was molded at 170 ° C., and as shown in FIG. 2, resin flow from the center line connecting the first joining point A and the second joining point B The maximum value of the bending amount (μm) was measured.

【0018】[0018]

【表1】 [Table 1]

【0019】[0019]

【表2】 [Table 2]

【0020】[0020]

【表3】 [Table 3]

【0021】[0021]

【表4】 [Table 4]

【0022】[0022]

【表5】 [Table 5]

【0023】[0023]

【表6】 [Table 6]

【0024】[0024]

【表7】 [Table 7]

【0025】[0025]

【発明の効果】表1〜表7に示された結果から、本発明
Pd合金細線1〜51は、従来Pd合金細線1〜9に比
べて、高温強度はほぼ同等であるが、ボールの真球性が
優れており、さらに、接合性、ループの安定性、耐樹脂
流れ性にも優れていることが分かる。上述のように、こ
の発明のパラジウム合金細線は、従来よりも信頼性のあ
るボンディングを行うことができ、半導体装置産業の発
展に大いに貢献し得るものである。
From the results shown in Tables 1 to 7, the Pd alloy fine wires 1 to 51 of the present invention have substantially the same high temperature strength as the conventional Pd alloy fine wires 1 to 9, but the true ball It can be seen that the spherical property is excellent, and further, the bonding property, the stability of the loop, and the resin flow resistance are also excellent. As described above, the palladium alloy thin wire of the present invention can perform more reliable bonding than before, and can greatly contribute to the development of the semiconductor device industry.

【図面の簡単な説明】[Brief description of drawings]

【図1】ボールの真球性試験において、ボールアップし
たボールの長軸および短軸を示す説明図である。
FIG. 1 is an explanatory view showing a major axis and a minor axis of a ball that has been ball-up in a ball sphericity test.

【図2】ループの安定性試験および耐樹脂流れ試験にお
いて測定する曲り量の説明図である。
FIG. 2 is an explanatory diagram of a bending amount measured in a loop stability test and a resin flow resistance test.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 希土類元素の一種または二種以上:0.
2〜100wt.ppm、 Ag:1〜5000wt.ppm、 Ca:0.2〜100wt.ppm、 Be、Ge、Si、In、Irの一種または二種以上:
0.2〜100wt.ppm、を含有し、残りがPdお
よび不可避不純物からなる組成を有することを特徴とす
る半導体装置用パラジウム合金細線。
1. One or more rare earth elements: 0.
2-100 wt. ppm, Ag: 1 to 5000 wt. ppm, Ca: 0.2-100 wt. One or more of ppm, Be, Ge, Si, In, Ir:
0.2-100 wt. A palladium alloy thin wire for a semiconductor device, which has a composition containing ppm, and the remainder being Pd and inevitable impurities.
JP6261230A 1994-09-30 1994-09-30 Palladium alloy thin wire for semiconductor device Pending JPH08102472A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6261230A JPH08102472A (en) 1994-09-30 1994-09-30 Palladium alloy thin wire for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6261230A JPH08102472A (en) 1994-09-30 1994-09-30 Palladium alloy thin wire for semiconductor device

Publications (1)

Publication Number Publication Date
JPH08102472A true JPH08102472A (en) 1996-04-16

Family

ID=17358954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6261230A Pending JPH08102472A (en) 1994-09-30 1994-09-30 Palladium alloy thin wire for semiconductor device

Country Status (1)

Country Link
JP (1) JPH08102472A (en)

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