JPH079373Y2 - Substrate transfer device for vapor phase growth equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION (a) Technical Field The present invention relates to a substrate transfer apparatus for a vapor phase growth apparatus.

A vapor phase growth apparatus is a vacuum chamber in which a cylindrical susceptor is mounted, a wafer is attached to this, a raw material gas is caused to flow from above, and a gas phase reaction is caused to grow a thin film on the wafer. is there.

Heat, light, plasma excitation, etc. are needed to excite the gas phase reaction. Although the thermal excitation type will be described here, the present invention can also be applied to other excitation types.

Since the susceptor for vapor phase growth has a cylindrical shape, a plurality of wafers can be attached to the side surface. For example, 4, 6, 8, 16, ... Wafers are mounted.

(B) Conventional Technology In a conventional vapor phase growth apparatus, in order to replace a substrate (referred to as a wafer), a vacuum chamber is opened and manually operated.

The processed wafer is removed from the susceptor with pinsets and the unprocessed wafer is attached to the susceptor.

This was done manually. It is inexpensive, but has the following drawbacks.

(I) The vacuum chamber must be opened and the vacuum sweep must be performed each time.

The cycle time of vapor phase growth becomes longer.

(Ii) Since the vacuum chamber is exposed to the atmosphere, the inside of the chamber may be contaminated.

(Iii) Opening the vacuum chamber to which poisonous substances are attached is dangerous for the operator.

(Iiii) Since thin and brittle wafers are manually handled, they may be damaged.

(C) Purpose It is an object of the present invention to provide a substrate transfer apparatus for a vapor phase growth apparatus in which a wafer can be automatically and efficiently exchanged without breaking a vacuum and without manual labor.

(D) Structure The apparatus of the present invention is provided with a preliminary chamber above which a vacuum chamber can be evacuated. A slide table is installed in the spare room so that it can move laterally. The wafer is attached to the wafer holder and is vertically aligned in the cassette. This cassette is set on the slide table.

The spare chamber and the vacuum chamber are connected by a connecting pipe.

There is a rod that can be raised and lowered, and the wafer holder is suspended at the tip of the rod and the wafer holder is transported from the cassette to the susceptor or from the susceptor to the cassette.

Since the lifting rod must be precisely positioned, it is mounted on the XYZ table.

A lateral transfer mechanism for moving the cassette horizontally is provided on the side of the auxiliary chamber. This moves the horizontal rod laterally by a mechanism utilizing a set of permanent magnets.

A vertical transfer mechanism for vertically moving the lifting rod is provided above the spare tsu.

This also moves the lifting rod up and down by a mechanism using a set of permanent magnets.

The wafer is not attached as it is but is attached to the wafer holder. Although the wafer is thin and fragile, the wafer holder has appropriate strength and thickness, and can be formed in a shape that is easy to hold. Therefore, it can be automatically transported, and can be accommodated in the cassette and attached to the susceptor.

An example of the present invention will be described with reference to the drawings.

FIG. 1 is a schematic vertical sectional view of a vapor phase growth apparatus having a substrate transfer mechanism of the present invention.

There is a vertical vacuum chamber 1 having a hemispherical top and a cylindrical body.

In the vacuum chamber 1, a cylindrical or polygonal tubular susceptor 2 is provided.

Since this is a cylindrical shape, it is sometimes called a barrel type susceptor.

On the outer peripheral surface of the susceptor 2, there is an appropriate number of wafer mounting seats 3. This has a mounting shape for attaching and detaching the wafer holder 4. The wafer 5 is attached to the wafer holder 4 so as not to drop.

A resistance heater 6 is attached inside the susceptor 2. This is a carbon resistor. A current is passed through the current introduction terminal 7.

The susceptor 2 and the wafer 5 are heated by the heater 6.

The susceptor 2 is supported by a susceptor rotating shaft 9 extending in the vertical direction. This is rotatably supported by a bearing or the like.

The bearing and the like are appropriately supported by a mechanism provided on the bottom plate 12.

The rotary drive mechanism 13 provided outside the vacuum chamber 1 transmits the rotational force to the rotary shaft 9.

On the outer circumference of the upper half of the vacuum chamber 1, a cooling water jacket 19
Is provided. Cooling water enters from the cooling water inlet 20, cools the vacuum chamber wall, and is discharged from the cooling water outlet 21.

The raw material gas is introduced into the vacuum chamber through the raw material gas introduction pipe 22 at the top.

The exhaust gas is exhausted from an exhaust port 23 below the vacuum chamber 1 by a vacuum exhaust device 24.

The above configuration is the same as that of a normal vapor phase growth apparatus.

Characteristic parts of the device of the present invention will now be described.

A vertical connecting pipe 26 is provided diagonally above the vacuum chamber 1 and vertically upward. This is a position where the wafer attachment seat 3 of the susceptor 2 is directly above the locus.

A valve chamber 27 is provided above the vertical connecting pipe 26, and a gate valve 28 is provided.

The gate valve 28 can be opened and closed. A spare chamber 30 is provided on the flange of the valve chamber 27.

The preliminary chamber 30 is a space that can accommodate a large number of wafer holders and can be evacuated.

The spare room 30 is a horizontally long space. A spare chamber lid 32 is provided on the flange 31 at one end so as to be openable and closable.

A peep window 33 is formed in the center of the auxiliary chamber lid 32. Thereby, the state of the wafer holder 4 can be observed.

A lower opening 34 and an upper opening 35 are formed in the same vertical line at the center of the preliminary chamber 30.

The lower opening 34 communicates with the gate valve 28 described above.

The upper opening 35 communicates with a vertical transfer mechanism 60 described later.

In the preliminary chamber 30, two rails 36 are installed horizontally in the longitudinal direction.

A slide table 37 is placed on the rail 36 so that it can travel horizontally.

A cassette 38 is placed on the slide table 37.

A plurality of wafer holders 4 are vertically placed on the cassette 38.

A folding rail 39 is arranged inside the rear end of the rail 36. The folding rail 39 can be extended to the outside (to the right in FIGS. 2 to 4), which is convenient for loading and unloading the cassette 38.

The lateral transfer mechanism 40 is fixed to the other end of the auxiliary chamber 30.

A fixed base 44 and a rod case 49 extend horizontally from the other end of the auxiliary chamber 30.

A rod case 49 is installed horizontally, in which the horizontal rod
50 is provided so as to be movable in the horizontal direction.

The tip of the horizontal rod 50 is fixed to the slide table 37.

A permanent magnet (not shown) is attached to the other end of the horizontal rod 50.

The magnet mechanism 52 provided outside the rod case 49 has a permanent magnet, which is attracted by the magnetic force of the permanent magnet of the horizontal rod. The magnet mechanism 52 is connected to the fixed base 44 so as to move along the longitudinal direction of the rod case 49 by the forward and reverse rotations of a motor (not shown). This is also used in the vertical transfer mechanism, so it will be explained later.

The vertical transfer mechanism 60 is installed directly above the upper opening 35 of the auxiliary chamber 30.

It has a fixed base 61 extending in the longitudinal direction. The fixed stand 61 has a rod case 67 that extends vertically downward in parallel with the fixed stand 61.
Is drooping.

A driving magnet 68 is provided around the rod case 67 so as to be vertically movable.

The driving magnet 68 is an annular magnet and is magnetized in the vertical direction. A part of the case of the driving magnet 68 is connected to the fixed base 61.

The case of the driving magnet moves up and down by forward and reverse rotation of a motor (not shown). Along with this, the driving magnet 68 also moves vertically.

In the rod case 67, there is a driven magnet 69. This is also vertically magnetized, but the direction of magnetization is opposite to that of the main magnet 68. Therefore, the driven magnet 69 is strongly attracted to the driving magnet 68. When the driving magnet 68 moves up and down, the driven magnet 69 moves accordingly.

When the motor rotates in the forward or reverse direction, the driving magnet 68 moves up or down, and the driven magnet 69 moves up or down accordingly.

A lifting rod 70 is attached to the driven magnet 69. The lifting rod 70 is a vertical shaft that carries the wafer holder.

The elevating rod 70 plays an extremely important role in the transfer of the wafer holder.

The elevating rod 70 is in a vacuum, and a magnet mechanism including a main magnet 68 and a follower magnet 69 is used to elevate and lower it from the outside.

The lifting rod 70 carries the wafer holder,
It can only move up and down. Therefore, the lifting rod
The positioning of 70 is extremely important.

The wafer mounting seat 3 of the susceptor 2 must be located directly below the lifting rod 70.

Therefore, the vertical transfer mechanism 60 is installed on the auxiliary chamber 30 via the XYZ table 71. The X and Y directions mean two horizontal directions. The Z direction is the vertical direction (actually the tilt direction).

The XYZ table 71 is composed of three combinations of a lower flange 72, a middle flange 73, and an upper flange 74.

The lower flange 72 is connected to the upper opening 35 of the auxiliary chamber 30.

The vertical transfer mechanism 60 is capable of XYZ displacement, and in order to maintain the vacuum of the rod case 67, a telescopic axis-perpendicular displacement bellows 75 is provided.

The bellows 75 is fixed to the lower flange 72 and the rod case 67 by a lower bellows collar 76 and an upper bellows collar 77, respectively.

The middle flange 73 and the upper flange 74 are the Z direction adjustment bolts 78.
Thus, the height direction and the inclination direction of the rod are adjustable. The upper end of the adjusting bolt 78 is tightened by upper and lower nuts 79.

There are four bolts that penetrate the inner flange 73 in two horizontal directions. Two are X-direction adjusting bolts 80, and two are Y-direction adjusting bolts 81.

FIG. 8 shows a plan view of this portion.

The rod case 67 is in the center of the middle flange 73.

The position of the rod case 67 can be moved in the X direction by adjusting the X direction adjustment bolt 80 located in the diagonal direction.

Similarly, the position of the rod case 67 can be moved in the Y direction by the Y direction adjusting bolt 81.

The height direction and the rod tilt direction are the Z direction adjustment bolt 78
Can be adjusted according to

In this way, the rod case 67 can be precisely positioned.

As a result, the position of the wafer suspending device 83 at the lower end of the elevating rod 70 is accurately determined.

The interior of the spare room 30 will be described.

The horizontal rod 50 can be moved left and right by the magnet mechanism 52. The drive source is a motor.

As the horizontal rod 50 expands and contracts, the slide table
37 moves on rail 36.

FIG. 2 is a plan view of a slide table, a cassette and the like. FIG. 3 is a vertical sectional view.

The slide table 37 is a substantially U-shaped horizontal member having no central portion.

A horizontal rod 50 is fixed to the center of the front frame of the slide table 37. Table bearings 84 are attached to the outer front and rear of the both side frames. These are wheels for rolling on the rail 36.

Guide grooves 85 are formed on the upper surfaces of both side frames of the slide table 37.

The guide groove 85 has a step portion 86 on the rear side. The guide groove 85 is slightly shallower behind the stepped portion 86.

The guide groove 85 is slightly deeper in front of the stepped portion 86, and the cassette bearings mounted on both sides of the cassette 38 are provided.
87 rolls in the guide groove 85.

The front end of the cassette 38 contacts the back of the front frame of the slide table 37, and the last one of the cassette bearings 87 is the stepped portion.
It is in contact with 86. At this position, the cassette 38 does not move forward or backward. This is the stop position.

At the end of the cassette 38 is a pull handle 88.

This is for pulling out the cassette 38 after opening the auxiliary chamber lid 32.

The space between the preliminary chamber flange 31 and the lid 32 has a structure that maintains airtightness.

The cassette 38 is a frame body without a bottom. However, the holder support mechanism 90 is supported in a cantilever manner from one frame.

The wafer holder 4 has a flat plate shape, but is a hexagonal plate in which the lower part is narrowed obliquely.

Holders are supported on the cassette 38 in a vertical arrangement. However, they are not closely arranged. In the space for 3 sheets,
It can accommodate 2 sheets. That is, the holder support mechanisms for two sheets are lined up, and the next is a gap.

When the portion with the holder support mechanism 90 is represented by H and the portion without the holder support mechanism 90 is represented by V, the inside of the cassette 38 is V ₁ H ₁ H ₂ V ₂ H ₃ H from front to back (from left to right in FIG. 2). ₄ V ₃ H ₅ and so on.

There are five spaces for accommodating the wafer holders, and two spaces are paired and one space is arranged at the end. A space sufficient for one wafer holder to pass is arranged between the pair and between the pair and one end portion. A space sufficient for one wafer holder to pass through is arranged outside the outermost pair, that is, outside the pair opposite to the one end portion.

Four wafer holders are stored in five spaces.
The remaining space for one wafer is left free because the wafer holder on which the processed wafer is mounted is removed from the susceptor and stored.

In other words, 5 wafer holders can be stored in the cassette so that the wafer holder of the cassette and the wafer holder of the susceptor can be exchanged, but since only the unprocessed 4 wafers are stored, the space for 1 wafer is left. is there.

In this example, five wafer holders can be accommodated. This corresponds to the number of wafer holders that can be attached to the susceptor being four in this case.

Since there are four wafer holders accommodated in the cassette and four wafer holders capable of performing vapor phase growth at the same time, this means that vapor phase growth can be performed once.

The number of wafer holders accommodated depends on the number n of wafer holders attached to the susceptor. The number A of wafers accommodated in the cassette is A = n × m + 1. Here, m is an integer.

There is one space for every two wafer holders, because this space is used to remove or insert the wafer holder from the cassette by the wafer suspending device 83. Thereby, the wafer holder at any position can be taken out. This point is important in the present invention.

This will be described with reference to FIGS. 2 and 3.

The elevating rod 70 penetrates the cassette frame, but is in a portion without the cantilevered holder support mechanism 90. Therefore, the slide table 37 and the cassette 38 can be moved back and forth with the elevating rod 70 penetrating the cassette frame.

Lifting rod 70 is at V ₂ in the cassette.

The wafer suspending device 83 extends laterally from the lower end of the elevating rod and can hold the wafer holder 4.

First, at the lower end of the _second wafer holder H ₂ , the wafer suspending device 83
And lift the lifting rod 70 to lift the wafer holder.
H ₂ comes out of the holder support mechanism 90.

The holder support mechanism 90 will be described with reference to FIGS. 9 and 10.

The holder support mechanism 90 is a fitting having an inclined surface that widens upward and narrows downward.

One end is supported by the cassette wall plate 91.

A low back plate 93 that has side plates 92, 92 on both sides and connects them.
There is.

The side plate has a shape in which the lower side is wide, but holding pieces 94, 94 are formed inside. The back sides of the holding pieces 94, 94 are inclined grooves 95, 95.

The wafer holder 4 is stably supported by the holder support mechanism 90 by being sandwiched between the back plate 93 and the holding pieces 94, 94 from the front and rear.

Correspondingly, the wafer holder 4 also has a middle inclined surface 97, a front contact surface 98, and a front inclined surface 99 on the lower sides of both sides.

FIG. 11 shows a cross section of only the wafer holder on the line WW in FIG. A rear recess 100 is formed in the center of the lower rear surface of the wafer holder 4.

The state is as follows with the wafer holder fitted.

The middle inclined surface 97 of the wafer holder 4 contacts the inclined grooves 95, 95 of the holder / support mechanism 90. The front contact surface 98 contacts the back surface of the holding piece 94. The front inclined surface 99 contacts the end surface of the holding piece 94.

Only the lower end of the wafer holder 4 is supported, but since the wafer holder 4 is sandwiched from the front and the back, the wafer holder 4 does not fall down.

Further, as can be seen in FIG. 9, since the side plates 92, 92 do not extend to the middle and are opened, the wafer holder can be lifted by the wafer suspending device 83 and inserted between the side plates. You can also

The lower part of the wafer holder 4 is V-shaped, and the holder support mechanism is also V-shaped.

This has the following advantages.

The wafer holder 4 is lifted, the cassette is moved, and the wafer holder is positioned in the void portion V of the cassette. Then, the wafer holder is lowered.

On the contrary, when inserting the wafer holder into the cassette, the wafer holder must be pulled up above the cassette frame, moved, and inserted into the holder support mechanism.

At this time, since the back plate 93 is low, the lifting height is small. The cassette can be moved back and forth in the state shown in FIG.

The wafer suspension 83 will be described with reference to FIGS.

A horizontal arm 101 extends horizontally from the lower end of the lifting rod 70. The tip of the lateral arm 101 becomes a vertical front piece 102 that is long in the vertical direction, and further continues from the lower end piece 103 to the vertical rear piece 104.

The vertical piece 102, the lower end piece 103, and the vertical piece 104 are U-shaped with an upward opening, and hold the lower end of the wafer holder 4.

As shown in FIG. 7, the lateral arm 101 contacts the front of the wafer holder 4. The vertical piece 104 fits into the rear recess 100 of the wafer holder 4. The lower end of the wafer holder 4 is sandwiched from the front and back.
Moreover, since the vertical rear piece 104 is fitted in the rear concave portion 100, the vertical rear piece 104 does not shake right and left.

In this way, the wafer holder 4 can convey the wafer holder 4 in the vertical direction.

The wafer mounting seat 3 of the susceptor 2 is a portion on which the wafer holder 4 is mounted. Therefore, the wafer holder 4 must be able to be gripped and the wafer holder 4 can be loaded from above.

Therefore, the support portion has a structure similar to the holder support mechanism 90 of the cassette 38.

There are four wafer mounting seats 3 on the side surface of the susceptor 2, one of which is shown in front view and cross-sectional view in FIG.
Shown in Figure 13.

The susceptor has a cylindrical shape, and the wafer holder has a vertically long rectangular shape. The wafer mounting seat is formed by removing the shape corresponding to the wafer holder from the outer peripheral surface of the susceptor.

The back plate portion 110 is a flat vertical surface and is a portion where the entire back surface of the wafer holder comes into contact.

Only the step 114 of the back plate 110 is a flat surface that is cut out from the outer peripheral surface. The step 114 hits the side surface of the wafer holder.

Below the stepped portion 114 is a holding piece 111 that becomes narrower toward the lower side. An inclined groove 112 is formed inside the holding piece 111.

Since the susceptor 2 has a truncated cone shape in which the lower part is slightly expanded, the line of intersection between the back plate portion 110 and the outer peripheral surface is an arc 113.

The wafer holder 4 is carried from the upper side to the lower side by the wafer suspending device 83 and fitted into the wafer mounting seat 3 from the upper side. The lower end of the wafer holder 4 is supported by the holding piece 111. Holding piece 1
Since the intermediate position of 11 is at the opening 115, the wafer suspending device 83 can be pulled out as it is.

(E) Function Attach the unprocessed wafer to the wafer holder. This is done in the atmosphere. Insert 4 such wafer holders into the cassette 38.
Put the pieces vertically.

The gate valve 28 is closed and the vacuum of the vacuum chamber 1 is maintained.

Fill the spare chamber 30 with nitrogen gas etc. to atmospheric pressure, and then cover the spare chamber.
Open 32. The folding rail 39 is pulled backward so that it is aligned with the upper surface of the slide table 37 on the same plane.

Apply the bearing 87 at the front end of the cassette 38 to the folding rail 39. The folding rail 39 and the slide table 37 are engraved with a continuous guide groove 85. When the cassette 38 is pushed forward, the cassette bearings 87 enter the guide groove 85 one after another, and when it is pushed further, the bearing 87 rolls in the guide groove 85, and the cassette 38 advances toward the slide table 37.

FIG. 4 shows the state in the middle of this.

Eventually, the last cassette bearing 87 is the guide groove.
It goes over the step 86 of 85 and falls downward. At the same time, the front end of the cassette 38 hits the front frame of the slide table 37 and stops.

The cassette 38 is now positioned with respect to the slide table 37.

Push up the folding rail 39.

The spare chamber lid 32 is closed. The preliminary chamber is evacuated (vacuum exhaust device is not shown).

The horizontal rod 50 of the horizontal transfer mechanism is moved to stop the wafer holder at a position where it can be lifted by the lifting rod 70.

Since the cassette has a space for every two wafers, the wafer holder at any position has a space on one side. Therefore, any wafer holder can be taken out.

In FIGS. 2 and 3, the second wafer holder H ₂ from the left is about to be taken out. From below, insert the wafer suspending device 83 into the lower side of the wafer holder in the H ₂ portion and lift it up. The wafer holder 4 is set higher than the cassette 38. Then, move the slide table 37 to suspend
The gap V ₂ should be located just below the wafer holder 4 suspended on 83.

The elevating rod 70 is lowered so as to pass through the space V ₂ so that the wafer holder 4 hung on the suspender 83 is lowered.

In the cassette, the gap and the part with the wafer holder support mechanism are lined up like V ₁ H ₁ H ₂ V ₂ H ₃ H ₄ V ₃ H ₅ , so H ₂
The wafer holder in the H ₃ portion can be moved in and out through the void V ₂ . The wafer holder for the H ₄ and H ₅ portions can be moved in and out through V ₃ . The wafer holder in the H ₁ part can be moved in and out through V ₁ .

If there are no voids in the middle and the wafer holder is tightly packed, it must be taken out or inserted in order from the front or the back.

In the present invention, it is possible to take out the wafer holder at any position and insert the wafer holder at any empty position.
Extremely efficient.

The susceptor 2 is arranged so that the wafer mounting seat 3 is located immediately below the lifting rod 70 at a fixed stop position.

Open the gate valve 28. The vacuum chamber 1 is also a vacuum,
The spare chamber 30 is also vacuum.

Lower the lifting rod 70. This is done by moving the main magnet 68 and the follower magnet 69.

Eventually, the back surface of the lower end of the wafer holder 4 contacts the back plate portion 110 of the susceptor mounting seat 3. The side surface of the wafer holder 4
It hits the step 114. The left and right positions are determined. Further descending, the front contact surface 98 and the middle inclined surface 97 of the wafer holder enter the holding piece 111 and the inclined groove 112 of the susceptor. Wafer hangers
When 83 is lowered, it will come out of the wafer holder.

Thus, one wafer holder could be attached to the susceptor.

The susceptor is rotated by a certain angle (90 ° in this example) and stopped at a certain position. Pull up the lifting rod 70.

The slide table 37 is moved so that the next wafer holder is hooked on the hanging tool 83. This can be any wafer holder.

In this way, four wafer holders can be attached to the susceptor.

The gate valve 28 is closed.

After that, a source gas is introduced, the heater 6 heats the susceptor and the wafer, and vapor phase growth is performed.

During vapor phase growth, the auxiliary chamber 30 is returned to atmospheric pressure again, and the auxiliary chamber lid 32 is opened.

The four wafer holders with the unprocessed wafers attached are housed in the cassette 38.

The auxiliary chamber lid 32 is closed and the auxiliary chamber 30 is evacuated.

When the vapor phase growth ends, the gate valve 28 is opened.

The cassette has one empty position.

Lower the elevating rod 70 and pull up one of the wafer holders on the wafer mounting seat to put it in the empty position of the cassette.

Next, insert a new wafer holder into the same wafer mounting seat. That is, the slide table 37 is moved so that the unprocessed wafer holder comes to the position of the hanging tool.
Lift this holder, lower it, and attach it to the susceptor.

That is, the wafer holder is continuously removed and attached to one wafer attachment seat.

In this way, the lifting rod 70 does not grip the wafer holder and rarely moves up and down in an empty state. The elevating and lowering rod 70 holds the wafer holder on which an unprocessed wafer is mounted when descending, and holds the wafer holder on which a processed wafer is mounted when ascending, and performs reciprocating transfer work. That is, the transportation time can be shortened, which is efficient.

This is not the case if the cassette structure is not such a structure, but one that is taken out and inserted in order.

First, the work of removing four wafer holders from the susceptor and putting them in the cassette is performed. Then, four unprocessed wafer holders are taken out from the cassette and attached to the susceptor. This means that the lifting rod will go up and down 8 times.

In the case of the present invention, it is 5 round trips.

The greater the number of wafer holders mounted, the greater the effect of shortening the transfer time.

The case where m is 1 has been described above.

Next, the case where m is 2 will be described.

In this case, the cassette is provided with nine wafer holder support mechanisms and accommodates eight wafer holders. One is left empty for processing and returning.

If the part with the wafer holder support mechanism is H and the part without it is V, the inside of the cassette is V ₁ H ₁ H ₂ V ₂ H ₃ H ₄ V ₃ H ₅ H ₆ V ₄ H ₇ H ₈ V ₅ H ₉ Becomes

Four of the eight unprocessed wafers stored in the cassette are inserted into the susceptor. After the vapor phase growth treatment, the untreated 4 sheets and the treated 4 sheets are exchanged one by one by reciprocating the elevating rod.

According to this structure, vapor phase growth can be performed twice without breaking the vacuum of the preliminary chamber, which is convenient.

When m is 3, 12 unprocessed wafers can be continuously processed, which is more suitable for mass production.

(F) Effect (1) Since the cassette is provided with the void portion, the wafer holder at an arbitrary position can be taken out.

(2) Since the cassette supports m × n + 1 wafer supporting mechanisms and a gap is provided, the lifting rod can carry out both reciprocating transfer work, and the wafer holder inserted in the susceptor and the wafer holder mounted on the cassette can be efficiently replaced. Can be carried out and the transport time can be shortened.

(3) The lifting rod can be accurately positioned by using the XYZ table 71. Therefore, the wafer holder can be taken out from the susceptor and the wafer holder can be inserted into the susceptor accurately.

(4) A rail is provided in the spare room so that the slide table can move on the rail. A guide groove is provided on the slide table so that the cassette bearing rolls there. Further, a step portion is formed in the guide groove.

Therefore, it is easy to insert and position the cassette.

(5) The horizontal rod and the lifting rod are moved by the magnet mechanism. Therefore, it is possible to operate an object in vacuum from the atmosphere. Since the movable mechanism is in the atmosphere, maintenance and inspection is easy. The movable mechanism generates dust, but since it is not in a vacuum, it does not stain the inside of the device.

(6) With the above configuration, the wafer can be automatically replaced without opening the vacuum chamber.

It is safe because it does not open the vacuum chamber.

Since there is no need to pinch a thin wafer and replace it, there is little risk of wafer damage.

Since the vacuum chamber remains vacuum, it is not contaminated by the gas and dust contained in the atmosphere.

[Brief description of drawings]

FIG. 1 is a schematic vertical sectional view of a vapor phase growth apparatus of the present invention. FIG. 2 is a plan view of the interior of the spare room. FIG. 3 is a front view of the interior of the spare room. FIG. 4 is a front view of the cassette when moving in and out. FIG. 5 is a rear view of the state in which the wafer holder is suspended by the wafer suspender. FIG. 6 is a sectional view taken along line VI-VI in FIG. FIG. 7 is a front view of the state where the wafer holder is suspended by the wafer suspender. FIG. 8 is an enlarged sectional view taken along the line VIII-VIII in FIG. FIG. 9 is a plan view of the holder support mechanism in the cassette. FIG. 10 is a front view of the holder support mechanism in the cassette. FIG. 11 is a transverse sectional view of the wafer holder taken along the line WW in FIG. Figure 12 is a front view of the susceptor. FIG. 13 is a partial cross-sectional view of the wafer mounting seat. 1 ... Vacuum chamber 2 ... Susceptor 3 ... Wafer mounting seat 4 ... Wafer holder 5 ... Wafer 6 ... Heater 7 ... Current introduction terminal 9 ... Susceptor rotating shaft 12 ... Bottom plate 13 ... Rotation drive mechanism 17 ...... Cooling water inlet 18 …… Cooling water outlet 19 …… Cooling water jacket 20 …… Cooling water inlet 21 …… Cooling water outlet 22 …… Raw gas introduction pipe 23 …… Exhaust port 24 …… Vacuum exhaust device 26 …… Vertical connecting pipe 27 …… Valve chamber 28 …… Gate valve 30 …… Spare chamber 31 …… Flange 32 …… Spare chamber lid 33 …… Peep window 34 …… Lower opening 35 …… Upper opening 36 …… Rail 37 …… Slide table 38 …… Cassette 39 …… Folding rail 40 …… Horizontal transfer mechanism 44 …… Fixed stand 49 …… Rod case 50 …… Horizontal rod 52 …… Magnet mechanism 60 …… Vertical transfer mechanism 61 …… Fixed stand 67 ...... Rod case 68 …… Drive magnet 69 …… Drive magnet 70 …… Rising and lowering Ted 71 …… XYZ table 72 …… Lower flange 73 …… Middle flange 74 …… Upper flange 75 …… Axis vertical displacement bellows 76 …… Lower bellows flange 77 …… Upper bellows flange 78 …… Z direction adjustment bolt 79 …… Nut 80 …… X direction adjusting bolt 81 …… Y direction adjusting bolt 82 …… Bolt 83 …… Wafer hanging device 84 …… Table bearing 85 …… Guide groove 86 …… Step portion 87 …… Casting bearing 88 …… Puller 90 …… Holder support mechanism 91 …… Cassette wall plate 92 …… Side plate 93 …… Back plate 94 …… Holding piece 95 …… Inclined groove 97 …… Middle inclined surface 98 …… Front contact surface 99 …… Front inclined surface 100 …… Rear recess 101 …… Side arm 102 …… Vertical piece 103 …… Bottom piece 104 …… Vertical rear piece 110 …… Back plate part 111 …… Holding piece 112 …… Inclined groove 113 …… Arc 114… … Step 115 …… Opening

Front page continuation (72) Kazuo Mori Kazuo Mori, 47 Umezu Takaunecho, Ukyo-ku, Kyoto Prefecture Nissin Electric Co., Ltd. Itami Works Co., Ltd. (72) Tadayuki Okubo 1-1-1 Kunyokita, Itami City, Hyogo Prefecture Sumitomo Electric Industries Itami Works Co., Ltd.

Claims (5)

[Scope of utility model registration request] 1. A vertical vacuum chamber 1, and a vacuum chamber 1.
A susceptor 2 which is rotatably provided in the inside and has a substantially cylindrical shape, and on which an appropriate number of wafers can be attached to the outer surface,
A heater or a lamp for heating the susceptor 2, a susceptor rotating shaft 9 supporting the susceptor 2, a rotary drive mechanism for rotating the susceptor rotating shaft 9, and a raw material gas introduction for introducing a raw material gas to the top of the vacuum chamber 1. A vacuum exhaust device for exhausting exhaust gas from below the pipe 22 and the vacuum chamber 1.
A substrate transfer apparatus for a vapor phase growth apparatus including 24, which is connected directly above the vacuum chamber 1 through a vertical connecting pipe 26 and a gate valve 28 and can be opened and closed by drawing a vacuum.
30, a vertical transfer mechanism 60 provided above the auxiliary chamber 30 to elevate the elevating rod 70, a cassette 38 provided in the auxiliary chamber 30 and capable of accommodating a plurality of wafer holders 4 mounted on the vertical shaft, and a cassette 38. For moving the room horizontally 30
A horizontal transfer mechanism 40 provided on the side of the cassette and a wafer suspending device 83 provided at the tip of the elevating rod 70.
In 38, a holder supporting mechanism 90 for vertically arranging and supporting the wafer holders 4 is supported in a cantilever manner, and a portion of the cassette 38 where the holder supporting mechanism 90 does not exist is arranged so that the elevating rod 70 penetrates. 90 is a substrate transfer apparatus of a vapor phase growth apparatus, wherein two 90 are arranged side by side in the running direction of the slide table 37 through one void. 2. A vertical vacuum chamber 1, and a vacuum chamber 1.
A susceptor 2 which is rotatably provided in the inside and has a substantially cylindrical shape, and on which an appropriate number of wafers can be attached to the outer surface,
A heater or a lamp for heating the susceptor 2, a susceptor rotating shaft 9 supporting the susceptor 2, a rotary drive mechanism for rotating the susceptor rotating shaft 9, and a raw material gas introduction for introducing a raw material gas to the top of the vacuum chamber 1. A vacuum exhaust device for exhausting exhaust gas from below the pipe 22 and the vacuum chamber 1.
A substrate transfer apparatus for a vapor phase growth apparatus including 24, which is connected directly above the vacuum chamber 1 through a vertical connecting pipe 26 and a gate valve 28 and can be opened and closed by drawing a vacuum.
30, a vertical transfer mechanism 60 provided above the auxiliary chamber 30 to elevate the elevating rod 70, a cassette 38 provided in the auxiliary chamber 30 and capable of accommodating a plurality of wafer holders 4 mounted on the vertical shaft, and a cassette 38. For moving the room horizontally 30
A horizontal transfer mechanism 40 provided on the side of the cassette and a wafer suspending device 83 provided at the tip of the elevating rod 70.
In 38, the holder supporting mechanism 90 for supporting the wafer holders 4 in the vertical direction is cantilevered by an integral multiple of the number of wafers that can be mounted on the susceptor +1 and the holder supporting mechanism 90 of the cassette 38 does not exist. Is arranged so that the lifting rod 70 penetrates, and the holder support mechanism 90 is
A substrate transfer apparatus for a vapor phase growth apparatus, characterized in that each of them is provided side by side in the traveling direction of the slide table 37, and the remaining one is also provided through a space for one. 3. A vertical vacuum chamber 1, and a vacuum chamber 1.
A susceptor 2 which is rotatably provided in the inside and has a substantially cylindrical shape, and on which an appropriate number of wafers can be attached to the outer surface,
A heater or a lamp for heating the susceptor 2, a susceptor rotating shaft 9 supporting the susceptor 2, a rotary drive mechanism for rotating the susceptor rotating shaft 9, and a raw material gas introduction for introducing a raw material gas to the top of the vacuum chamber 1. A vacuum exhaust device for exhausting exhaust gas from below the pipe 22 and the vacuum chamber 1.
A substrate transfer apparatus of a vapor phase growth apparatus including 24, a preliminary chamber 30 that can be connected to a vacuum chamber by a vertical connecting pipe and a gate valve to draw a vacuum, and can be opened and closed.
A vertical transfer mechanism 60 provided above the spare chamber 30 for raising and lowering the raising and lowering rod 70, a cassette 38 provided in the spare chamber 30 capable of accommodating a plurality of wafer holders 4 with wafers mounted vertically, and a cassette 38 horizontally. The vertical transfer mechanism 60, which has the horizontal transfer mechanism 40 provided on the side of the preliminary chamber 30 for moving and the wafer suspending device 83 provided at the tip of the elevating rod 70 and which elevates the elevating rod 70, is a preliminary device. A substrate transfer apparatus for a vapor phase growth apparatus, which is installed on an XYZ table 71 provided on a chamber 30 and is capable of adjusting horizontal two directions and a tilt of a rod. 4. A vertical vacuum chamber 1, and a vacuum chamber 1.
A susceptor 2 which is rotatably provided inside and can mount an appropriate number of wafers on its outer surface, a susceptor rotating shaft 9 for rotating the susceptor 2, and a rotational drive for rotating the susceptor rotating shaft 9. A mechanism, a raw material gas introduction pipe 22 for introducing a raw material gas into the top of the vacuum chamber 1, and a vacuum exhaust device for exhausting exhaust gas from below the vacuum chamber 1.
A substrate transfer apparatus for a vapor phase growth apparatus including 24, which is connected directly above the vacuum chamber 1 through a vertical connecting pipe 26 and a gate valve 28 and which can be opened and closed by drawing a vacuum.
A vertical transfer mechanism 60 provided above the spare chamber 30 for raising and lowering the raising and lowering rod 70; a cassette 38 provided in the spare chamber 30 capable of accommodating a plurality of wafer holders 4 with wafers mounted vertically; and a cassette 38. The horizontal transfer mechanism 40 provided on the side of the auxiliary chamber 30 for moving horizontally and the lifting rod
It has a wafer suspending device 83 provided at the tip of 70, and a rail 36 is laid horizontally in the preliminary chamber 30, and it can travel on the rail 36 and can be moved by the horizontal rod 50 of the lateral transfer mechanism 40. A slide table 37 for
A guide groove 85 having a stepped portion 86 in the middle is provided on the 37, and the cassette bearings 87 on both sides of the cassette 38 roll in the guide groove 85.
Holder support mechanism for supporting and arranging the holders in the vertical direction
The cantilever 90 is supported, and the portion of the cassette 38 where the holder support mechanism 90 does not exist is arranged so that the raising and lowering rod 70 penetrates, and the cassette 38 carried on the slide table 37 has a guide groove.
Positioned by step 86 of 85, slide table 37
A foldable rail 39 having a guide groove 85 is foldably provided at the rear part of the foldable rail, and the foldable rail 39 is opened when the auxiliary chamber lid 32 is opened.
39 is extended to be continuous on the same plane as the slide table 37, and the cassette 38 is taken out or pushed in from the folding rail 39, and the holder support mechanism 90 of the cassette 38 is divided into two by two via one void. A substrate transfer apparatus for a vapor phase growth apparatus, which is arranged side by side in a traveling direction of a slide table 37. 5. A vertical vacuum chamber 1 and a vacuum chamber 1.
A susceptor 2 which is rotatably provided inside and can mount a proper number of wafers on its outer surface, a heater or a lamp for heating the susceptor 2, and a susceptor rotating shaft for supporting the susceptor 2. 9, a rotary drive mechanism for rotating the susceptor rotation shaft 9, a raw material gas introduction pipe 22 for introducing a raw material gas to the upper top of the vacuum chamber 1, and a vacuum exhaust device 24 for exhausting exhaust gas from below the vacuum chamber 1. A substrate transfer apparatus for a vapor phase growth apparatus including: a preparatory chamber 30 which is connected directly above the vacuum chamber 1 through a vertical connecting pipe 26 and a gate valve 28 and which can be evacuated and opened and closed.
A vertical transfer mechanism 60 provided above the spare chamber 30 for raising and lowering the raising and lowering rod 70, a cassette 38 provided in the spare chamber 30 capable of accommodating a plurality of wafer holders 4 with wafers mounted vertically, and a cassette 38 horizontally. It has a horizontal transfer mechanism 40 provided on the side of the preliminary chamber 30 for moving and a wafer suspending device 83 provided at the tip of the lifting rod 70, and the vertical transfer mechanism and the horizontal transfer mechanism are provided in the preliminary chamber 30. A fixed base that is mounted, a rod case that is supported by the fixed base and can communicate with the preliminary chamber 30 that can be evacuated to a vacuum, a rod that can be moved forward and backward inside the rod case, and a driven magnet that is mounted at the rear end of the rod. It consists of a main drive magnet that is movably provided along the fixed base, and the main drive magnet moves forward and backward, and the driven magnet moves accordingly, so that the rod moves forward and backward. Horizontal rod 50 of Hua mechanism 40
Is to move the slide table 37 with the cassette 38 installed in the spare room 30 back and forth, and the vertical transfer mechanism.
The lifting rod 70 of 60 is configured to suspend the wafer holder 4 on the wafer suspending device 83 and convey the wafer holder 4 between the cassette 38 and the wafer holder mounting seat 3 of the susceptor 2. .